Heterocyclic Nitrogen In The Component Patents (Class 510/265)
  • Patent number: 8921295
    Abstract: A biodegradable concentrated neutral detergent composition comprises various chelate compounds, various corrosion inhibitors, an alkaline compound, at least one sequestrant, various surfactants and hydrotropes, and water. The detergent can be highly concentrated, has a good long term shelf life, and when diluted is very effective in cleaning metals such as surgical instruments and prevents corrosion resistance of the metal even in a hard water environment.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: December 30, 2014
    Assignee: American Sterilizer Company
    Inventors: Ann Maria Kneipp, Nancy-Hope E. Kaiser, Althea Noel Johnson
  • Patent number: 8845930
    Abstract: The invention provides a method for pre-treating a metal surface with a corrosion inhibitor prior to painting, a method for inhibiting corrosion in a cooling system, wherein the cooling system includes a metal surface and a coolant; and a method for inhibiting corrosion of a reinforcement steel in concrete wherein the method comprising the step of adding to a concrete mixture an anti-corrosive mixture.
    Type: Grant
    Filed: November 28, 2005
    Date of Patent: September 30, 2014
    Assignee: Pigmentan Ltd.
    Inventors: Gregory Pipko, Zvi Miller
  • Publication number: 20140011715
    Abstract: Melamine derivatives and mixtures thereof with aqueous systems, a process for inhibiting corrosion of metals and metal alloys with melamine derivatives and mixtures thereof and the use of melamine derivatives and mixtures thereof as corrosion inhibitors for aqueous systems, for example water/oil mixtures, especially in the field of cleaning compositions, cooling fluids, oilfield chemicals or lubricants.
    Type: Application
    Filed: July 2, 2013
    Publication date: January 9, 2014
    Applicant: BASF SE
    Inventors: Roland BOEHN, Benjamin SCHAEFER, Christian BITTNER, Fabien Jean BRAND, Peter HAENGGI
  • Patent number: 8361237
    Abstract: The present invention is a formulation for wet clean removal of post etch and ash residue from a semiconductor substrate having a CoWP feature, comprising; Deionized water; Organic acid; Amine and/or quaternary ammonium hydroxide; wherein the formulation is compatible with the CoWP feature and either (a) the molar ratio of amine and/or quaternary ammonium hydroxide to organic acid provides a pH in the range of 7-14; or (b) the formulation includes a corrosion inhibitor. A method of using the formulation is also described.
    Type: Grant
    Filed: November 24, 2009
    Date of Patent: January 29, 2013
    Assignee: Air Products and Chemicals, Inc.
    Inventors: Aiping Wu, Madhukar Bhaskara Rao, Eugene C. Baryschpolec
  • Publication number: 20120316097
    Abstract: A detergent composition for metal according to the present invention contains a specific non-ionic surfactant, a specific nitrogen-containing organic compound, a specific carboxylic acid or salt thereof, and a specific alkanol amine, and has a pH of at least 9 that is measured at 25° C. when the detergent composition is diluted to 1% by mass of an aqueous solution. According to the present invention, the detergent composition for metal having excellent corrosion inhibition properties, excellent effluent treatment properties, excellent foaming suppressing properties and excellent liquid stability in addition to high detergent properties for metal, can be provided.
    Type: Application
    Filed: February 23, 2011
    Publication date: December 13, 2012
    Applicant: LION CORPORATION
    Inventors: Shigeru Maeyama, Kei Tamura, Akira Shinohara, Keita Someya
  • Publication number: 20120021963
    Abstract: A biodegradable concentrated neutral detergent composition comprises various chelate compounds, various corrosion inhibitors, an alkaline compound, at least one sequestrant, various surfactants and hydrotropes, and water. The detergent can be highly concentrated, has a good long term shelf life, and when diluted is very effective in cleaning metals such as surgical instruments and prevents corrosion resistance of the metal even in a hard water environment.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 26, 2012
    Applicant: AMERICAN STERILIZER COMPANY
    Inventors: Ann Maria Kneipp, Nancy-Hope E. Kaiser, Althea Noel Johnson
  • Patent number: 7825078
    Abstract: Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.
    Type: Grant
    Filed: February 1, 2005
    Date of Patent: November 2, 2010
    Assignee: Mallinckrodt Baker, Inc.
    Inventor: Seiji Inaoka
  • Patent number: 7731803
    Abstract: The present invention is directed to a composition, and a process employing same, for descaling, cleaning and inhibiting the corrosion of process equipment made of steel by including an inhibitory effective amount of acridine orange in the composition.
    Type: Grant
    Filed: November 14, 2003
    Date of Patent: June 8, 2010
    Assignee: Saudi Arabian Oil Company
    Inventor: Abdulghani Jaralla
  • Publication number: 20090011132
    Abstract: The present invention is a cleaning composition for use with firearms and industrial items in which all of the components of the composition are biodegradable. The selected components of the composition also have a combined flashpoint of over 200° F. The low volatility of the composition enhances the safety factor by its reduced flammability in conjunction with the low odor and other benefits obtained by the biodegradability of the composition. The composition essentially comprises a hydrocarbon solvent and a lubricant which effectively removes the fouling present within the interior arm of a firearm bore and at the same time lubricates and protects the firearm bore to help prevent the formation of rust.
    Type: Application
    Filed: September 16, 2008
    Publication date: January 8, 2009
    Applicant: OGRE MFG.LLC
    Inventor: John A. Thompson
  • Patent number: 7238653
    Abstract: Cleaning solutions for photoresist are disclosed which are useful for cleaning a semiconductor substrate in the last step of development when photoresist patterns are formed. Also, methods for forming photoresist patterns using the same are disclosed. The disclosed cleaning solution comprises H2O as a solution, a surfactant which is phosphate-alcoholamine salt represented by Formula 1, and an alcohol compound. The disclosed cleaning solution has lower surface tension than that of distilled water which has been used for conventional cleaning solutions, thereby improving resistance to photoresist pattern collapse and stabilizing the photoresist pattern formation. wherein R, x, y, z, a and b are as defined in the specification.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: July 3, 2007
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun Su Lee, Cheol Kyu Bok, Young Sun Hwang, Sung Koo Lee, Seung Chan Moon, Ki Soo Shin
  • Patent number: 7018964
    Abstract: The cleaning composition of this invention comprises, as effective components, a compound (A) represented by the formula (1) and a nonionic surfactant (B): wherein R1 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms and R2 represents a hydrogen atom or a straight-chain or branched-chain alkyl group having 1 to 5 carbon atoms. The cleaning composition of the invention is excellent in detergency and is satisfactory in respect of environmental protection properties, odor and flammability. An article to be cleaned can be cleaned by coming into contact with this cleaning composition.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: March 28, 2006
    Assignee: Arakawa Chemical Industries, Ltd.
    Inventors: Junichi Maeno, Shugo Kawakami, Kazutaka Zenfuku
  • Patent number: 6773873
    Abstract: A semi-aqueous cleaning formulation useful for removing particles from semiconductor wafer substrates formed during a dry etching process for semiconductor devices, the cleaning formulation comprising a buffering system a polar organic solvent, and a fluoride source.
    Type: Grant
    Filed: March 25, 2002
    Date of Patent: August 10, 2004
    Assignee: Advanced Technology Materials, Inc.
    Inventors: Ma. Fatima Seijo, William A. Wojtczak, David Bernhard, Thomas H. Baum, David Minsek
  • Patent number: 6541435
    Abstract: Engine cleaner compositions are reported comprising a single phase solution comprising a polar solvent having a Hildebrand solubility parameter of about 10 cal½ cm−3/2 or greater; a non-polar solvent, immiscible with the polar solvent, having a Hildebrand solubility parameter of about 10 cal½ cm−3/2 or less; and a fugitive cosolvent having a higher evaporation rate than the polar solvent and the non-polar solvent. The engine cleaner compositions are suitable for cleaning internal combustion engines.
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 1, 2003
    Assignee: 3M Innovative Properties Company
    Inventor: Kenneth G. Gatzke
  • Patent number: 6465404
    Abstract: Aqueous cleaning compositions in which the pH is controlled comprise an acidic metal cleaning compound; at least one nitrogen containing compound to provide a stabilized pH; an emulsifier, a nonionic surfactant and optionally at least one water soluble solvent having a vapor pressure of less than 4 mm Hg at 20° C.
    Type: Grant
    Filed: March 20, 2001
    Date of Patent: October 15, 2002
    Assignee: BBJ Environmental Solutions, Inc.
    Inventors: Herman Scriven, II, Robert G. Baker, Garland Corey
  • Patent number: 6387859
    Abstract: A cleaner composition for removing from within a microelectronic fabrication a copper containing residue layer in the presence of a copper containing conductor layer, and a method for stripping from within a microelectronic fabrication the copper containing residue layer in the presence of the copper containing conductor layer. The cleaner composition comprises: (1) a hydroxyl amine material; (2) an ammonium fluoride material; and (3) a benzotriazole (BTA) material. The cleaner composition contemplates the method for stripping from within the microelectronic fabrication the copper containing residue layer in the presence of the copper containing conductor layer.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: May 14, 2002
    Assignee: Chartered Semiconductor Manufacturing Ltd.
    Inventor: Kwok Keung Paul Ho
  • Patent number: 6350395
    Abstract: A stabilizer composition comprising a) an N-alkyl morpholine and b) a straight-chain or cyclic aliphatic amine containing no hetroatoms other than N with a boiling point of at least 150° C. The stabilizer composition is useful for stabilizing a halogenated hydrocarbon against degradation.
    Type: Grant
    Filed: June 16, 2000
    Date of Patent: February 26, 2002
    Assignee: The Dow Chemical Company
    Inventor: Marius Kuemin
  • Patent number: 6281180
    Abstract: An automatic dishwashing detergent composition is described which contains an effective amount of a defined water soluble cationic or amphoteric polymer and a phosphate or nonphosphate builder. The polymers are soluble or dispersible to at least 0.01% by weight in distilled water at 25° C. A method of using the polymers to prevent fading or corrosion of dishware is also described.
    Type: Grant
    Filed: September 15, 1999
    Date of Patent: August 28, 2001
    Assignee: Lever Brothers Company, division of Conopco, Inc.
    Inventors: Alla Tartakovsky, Joseph Oreste Carnali, Richard Gerald Gary
  • Patent number: 6239089
    Abstract: Aqueous cleaning solution concentrates with elevated levels of N-alkyl-2-pyrrolidone solubilized therein, comprising a surfactant formulation incorporating at least one N-alkyl-2-pyrrolidone, the alkyl group of which has 6 to 12 carbon atoms, and a C6-10 alkane sulfonate hydrotrope for the N-alkyl-2-pyrrolidone in a hydrotrope/pyrrolidone weight ratio of 0.9 to 5.0%.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: May 29, 2001
    Assignee: Church & Dwight Co., Inc.
    Inventors: Francis R. Cala, Jennifer Lynn Kester
  • Patent number: 6211132
    Abstract: An acidic aqueous liquid composition for deburring/degreasing/cleaning metal, in particular aluminum, parts by mass finishing has as its active ingredients: (A) a nonionic surfactant containing halogen atoms, (B) nitrogen based surfactants such as n-alkyl pyrrolidone, builders such as silicates and boric acid, hydrotropes, corrosion inhibitors, and sequestering agents.
    Type: Grant
    Filed: June 14, 1999
    Date of Patent: April 3, 2001
    Assignee: Henkel Corporation
    Inventors: John R Pierce, Lawrence R Carlson, William J Wittke
  • Patent number: 6124253
    Abstract: An alkaline, aqueous metal-cleaning composition capable of effectively removing industrial-type soil contaminants from a metal surface at temperatures as low as ambient temperature and in the absence of substantial agitation contains (A) an active-ingredient portion containing (1) an alkalinity-providing component, and (2) a surfactant mixture containing: (a) at least one first non-ionic, ethoxylated linear primary alcohol surfactant having a hydrophobic carbon chain length of from 9 to 11 carbon atoms and being ethoxylated with (i) an average of 2.5 moles of ethylene oxide or (ii) an average of 5.0 moles of ethylene oxide; and (b) at least one second non-ionic, ethoxylated linear primary alcohol surfactant having a hydrophobic carbon chain length of from 9 to 11 carbon atoms and being ethoxylated with an average of 6.0 moles of ethylene oxide; and (B) an aqueous portion.
    Type: Grant
    Filed: September 16, 1997
    Date of Patent: September 26, 2000
    Assignee: Church & Dwight Co., Inc.
    Inventors: Alfredo Vinci, Steven A. Bolkan, Paul E. DeCastro, Lisa M. Kurschner
  • Patent number: 5972874
    Abstract: This invention relates to stable microemulsion cleaners having decreased volatile organic content comprising (a) a non polar, organic hydrocarbon solvent system comprising (i) an aromatic solvent and/or (ii) an aliphatic solvent, (b) an ethoxylate of an aromatic or aliphatic hydrophobe; (c) a glycol ether or ethylene glycol; a primary amino alcohol; water; and other components for specific applications. These cleaners can be used for removing oil, grease, and baked-on carbon deposits from metal surfaces, and are particularly useful as engine shampoos and cleaners for air coolers.
    Type: Grant
    Filed: April 8, 1997
    Date of Patent: October 26, 1999
    Assignee: Ashland Inc.
    Inventors: Bruce L. Libutti, Joseph Mihelic
  • Patent number: 5958857
    Abstract: The present invention relates to a cleaning composition for cleaning airct wheel wells. The cleaning composition broadly comprises from about 0.1 to about 15% of a D-limonene composition, containing less than 0.5% of a stabilizing anti-oxidant, acting as a solvent for said greasy soils, from about 0.1% to about 5.0% of a material for increasing the flash point of said cleaning composition above 140.degree. F., such as an isoparrafinic hydrocarbon solvent, from about 10% to about 50% of a mixture of linear alcohol ethoxylates having a HLB in the range of 2 to 15 as a stabilizer, and the balance water. The cleaning composition may also contain from 0.1% to about 10% capryolamphopropionate, from about 0.1% to about 15% dipropylene glycol, from about 0.1% to about 5.0% benzotriazole, and 0.1% to about 5.0% sodium bicarbonate.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: September 28, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Philip Bevilacqua, Jr., Kenneth G. Clark, David L. Gauntt
  • Patent number: 5958298
    Abstract: The anti-corrosive draining agent for use in a rinsing process includes a polyoxyalkylene alkyl ether as an essential component. The anti-corrosive draining agent further includes an amine compound as an essential component, wherein the polyoxyalkylene alkyl ether (a) and the amine compound (b) are contained in a blending weight ratio (a/b) of from 99/1 to 80/20. The rinsing process using water following a cleaning process, includes the steps of adding the above anti-corrosive draining agent to a rinsing water, and rinsing an object in the rinsing water.
    Type: Grant
    Filed: October 11, 1995
    Date of Patent: September 28, 1999
    Assignee: Kao Corporation
    Inventors: Eiji Nagoshi, Kozo Kitazawa
  • Patent number: 5925196
    Abstract: The present invention relates to a cleaning composition for cleaning airct wheel wells. The cleaning composition broadly comprises from about 0.1 to about 15% of a D-limonene composition, containing less than 0.5% of a stabilizing anti-oxidant, acting as a solvent for said greasy soils, from about 0.1% to about 5.0% of a material for increasing the flash point of said cleaning composition above 140.degree. F., such as an isoparrafinic hydrocarbon solvent, from about 10% to about 50% of a mixture of linear alcohol ethoxylates having a HLB in the range of 2 to 15 as a stabilizer, and the balance water. The cleaning composition may also contain from 0.1% to about 10% capryolamphopropionate,from about 0.1% to about 15% dipropylene glycol, from about 0.1% to about 5.0% benzotriazole, and 0.1% to about 5.0% sodium bicarbonate.
    Type: Grant
    Filed: November 2, 1998
    Date of Patent: July 20, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Philip Bevilacqua, Jr., Kenneth G. Clark, David L. Gauntt
  • Patent number: 5902415
    Abstract: An alkali metal cleaning composition for cleaning metal and for inhibiting corrosion of metal. The composition is composed of an alkali carbonate salt, a surfactant, and a corrosion inhibitor. A preferred corrosion inhibitor is an alkali metal silicate. Additional metal corrosion inhibitors such as a combination of a triazole compound and an alkali metal borate also can be employed. Such alkali carbonate compositions are readily water soluble and remain in solution over prolonged storage periods.
    Type: Grant
    Filed: January 29, 1998
    Date of Patent: May 11, 1999
    Assignee: Church & Dwight Co., Inc.
    Inventors: Steven Dunn, Gale A. Byrnes
  • Patent number: 5880078
    Abstract: The present invention relates to a cleaning composition having utility in eaning aircraft exterior surfaces. The cleaning composition comprises from about 15% to about 40% of a mixture of linear alcohol ethoxylates having a HLB in the range of about 5.0 to about 15.0, from about 5% to about 25% capric diethanolamide, and the balance water. The mixture of linear alcohol ethoxylates comprises from about 5% to about 15% of a first linear alcohol ethoxylate having a HLB in the range of about 5.0 to 9.5 and from about 10% to about 25% of a second linear alcohol ethoxylate having a HLB in the range of about 10 to 15. The cleaning composition also includes from about 0.1% to about 5% of capryloamphopropionate, from about 0.1% to about 5.0% benzotriazole, from about 0.1% to about 5.0% of an inhibitor for reducing corrosion of magnesium parts, and from about 0.1% to about 5.0% of an inhibitor for reducing corrosion of cadmium plated steel parts.
    Type: Grant
    Filed: September 4, 1997
    Date of Patent: March 9, 1999
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Philip Bevilacqua, Jr., Kenneth G. Clark, David L. Gauntt
  • Patent number: 5747439
    Abstract: An alkali metal cleaning composition for cleaning metal and for inhibiting corrosion of metal. The composition is composed of an alkali carbonate salt, a surfactant, and a corrosion inhibitor. A preferred corrosion inhibitor is an alkali metal silicate. Additional metal corrosion inhibitors such as a combination of a triazole compound and an alkali metal borate also can be employed. Such alkali carbonate compositions are readily water soluble and remain in solution over prolonged storage periods.
    Type: Grant
    Filed: April 2, 1996
    Date of Patent: May 5, 1998
    Assignee: Church & Dwight Co, Inc.
    Inventors: Steven Dunn, Gale A. Byrnes
  • Patent number: 5712236
    Abstract: A metal cleaning composition useful in an aqueous solution comprises an alkali metal salt and a corrosion inhibitor. The corrosion inhibitor is provided in the form of zinc phosphate compounds such as zinc orthophosphate.
    Type: Grant
    Filed: August 2, 1995
    Date of Patent: January 27, 1998
    Assignee: Church & Dwight Co., Inc.
    Inventors: Steven A. Bolkan, Steve Dunn, Gale Byrnes
  • Patent number: 5668096
    Abstract: A cleaning and passivating treatment for metals comprising an amphoteric surfactant which is a caprylic acid derivative of imidazoline compounds. The treatment is substantially free of amines, alkanolamines and phosphates. The preferred treatment includes small quantities of borate ions and molybdate ions. In addition a nonionic surfactant may be added as a foam control agent.
    Type: Grant
    Filed: November 4, 1996
    Date of Patent: September 16, 1997
    Assignee: BetzDearborn Inc.
    Inventors: Edward A. Rodzewich, Barry P. Gunagan
  • Patent number: 5634979
    Abstract: The invention is a cleaning solution for degreasing metal articles which contains at least one chlorine-free nonionic surfactant with an HLB in the range of 6.5 to 9.5; a second chlorine-free nonionic surfactant with an HLB in the range of above 9.5 to about 14; a chlorinated nonionic surfactant, and an alkalinizing agent and optionally also one or more of anionic or amphoteric surfactant; hydrotroping agents; solubilizers; organic builders, and corrosion inhibitors. The preferred composition of the invention can replace a vapor degreasing process for cleaning oil, grease, and waxy-type contaminants from metal articles to the level of cleanliness required in the aerospace industry.
    Type: Grant
    Filed: December 22, 1994
    Date of Patent: June 3, 1997
    Assignee: Henkel Corporation
    Inventors: Lawrence R. Carlson, Philip M. Johnson, Dennis A. Kent