Abstract: The disclosure relates to fatty diols and recombinant microorganisms for producing them. More particularly, the disclosure relates to recombinant microorganisms engineered to produce fatty diols via fermentation. Further encompassed is a process that uses the microorganisms to produce fatty diols from a simple carbon source.

Abstract: A liquid composition comprising (A) at least one polar organic solvent, selected from the group consisting of solvents exhibiting in the presence of from 0.06 to 4% by weight of dissolved tetramethylammonium hydroxide (B), the weight percentage being based on the complete weight of the respective test solution (AB), a constant removal rate at 50° C. for a 30 nm thick polymeric barrier anti-reflective layer containing deep UV absorbing chromophoric groups, (B) at least one quaternary ammonium hydroxide, and (C) at least one aromatic amine containing at least one primary amino group, a method for its preparation and a method for manufacturing electrical devices, employing the liquid composition as a resist stripping composition and its use for removing negative-tone and positive-tone photoresists and post etch residues in the manufacture of 3D Stacked Integrated Circuits and 3D Wafer Level Packagings by way of patterning Through Silicon Vias and/or by plating and bumping.

Abstract: Sulfate and sulfonate derivatives of unsaturated fatty alcohols, processes for making them, and methods of using them are disclosed. In one aspect, a monounsaturated fatty alcohol composition is made by reducing a metathesis-derived monounsaturated alkyl ester. The fatty alcohol composition is then converted to a sulfate or sulfonate derivative by one or more of alkoxylation, sulfation, sulfonation, and sulfitation. Of particular interest are the sulfate and ether sulfate derivatives.

Abstract: A photoresist and post etch cleaning solution for semiconductor wafers comprising: A. a polar aprotic solvent, B. an inorganic base; C. a co-solvent for said inorganic base; D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group; E. an organic base comprising an amine compound; and F. a nonionic surfactant bearing at least one ether group. The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.

Abstract: The present invention is directed to a cleaning formulation comprising a cleaning agent and an insect growth regulator (IGR) and to a method for indoor control of household insects comprising applying a cleaning formulation comprising a cleaning agent and an insect growth regulator (IGR).

Abstract: An aqueous cleaning composition comprising a surfactant, a polyamine, and propylene glycol. The combination of the polyamine and propylene glycol will provide low residue and increased shine during wet and dry wiping and will provide anti-fog properties to a substrate after cleaning. The use of either the polyamine alone or the propylene glycol alone will not provide results meeting all three tests.

Abstract: Detergent compositions and more specifically, to low pH detergent compositions comprising sulfated surfactants, organic acid, and polyamine compounds. Methods of making and using the same.

Abstract: Cleaning compositions for cleaning debris from a hard surface are described herein, the cleaning compositions include from about 0.001% to about 1% by weight of the composition of a thickener and from about 0.1% to about 50% by weight of the composition of an alkyl sulfate detergent surfactant that contains about 8 carbon atoms on the average, with substantially all of the alkyl groups having within two carbon atoms of the 8 average carbon atoms. They are high sudsing, have excellent soap scum removal and hard water deposit removal properties and are easy to rinse. A sprayer, methods of use and kits are also disclosed.

Abstract: Self-adhesive detergent compositions are described including a pH-sensitive color-changing system. The color-changing system is useful with certain acidic compositions and certain alkaline compositions. The compositions have a given color upon application to a hard surface, e.g., a toilet bowl. In one embodiment, when the self-adhesive composition is exposed to a water-based rinse, such as on flushing a toilet, the color-changing system provides the released cleaning portion of the composition, and thereby the water, with a color different from the color of the composition to indicate cleaning is occurring. In another embodiment, following exposure to a plurality of rinses, the color-changing system changes the color of the composition when the composition is near depletion to provide an “end-of-use” cue.

Abstract: Disclosed herein are methods of using compositions as enhanced oil recovery agents, cleaning agents or as agents that improve the function of surfactants, the compositions comprising a surfactant and a protein system, where the protein system comprises proteins and stress proteins obtained by the process of fermenting yeast to obtain a fermentation mixture; subjecting the fermentation mixture to stress conditions to obtain a post-fermentation mixture; and centrifuging the post-fermentation mixture and obtaining the supernatant; where the protein mixture retains its functionality under extreme conditions.

Abstract: The present invention relates, in part, to compositions including at least one hydrofluoro-olefin or hydrochlorofluoro-olefin solvent. Such compositions may optionally contain one or more alcohols or other co-solvent or agent and may be used to provide one or more cleaning applications.

Abstract: The present invention relates to detergent compositions containing a surfactant system comprising a highly branched surfactant as the primary surfactant. Specifically, the invention relates to detergent compositions containing a surfactant system comprising greater than about 25% of a highly branched surfactant.

Abstract: The present invention relates to detergent compositions containing a specific blend of isoprenoid-based surfactants to deliver high suds cleaning performance.

Abstract: An ADW composition comprising a builder and a water-soluble copolymer which comprises: (a) from about 30 to 60 mol % of the copolymer having a structural unit originating from a monoethylenic unsaturated dicarboxylic acid (or dicarboxylate) monomer having 4 to 6 carbon atoms or its anhydride at; (b) from about 30 to 60 mol % of the copolymer having a structural unit originating from a monoethylenic unsaturated monocarboxylic acid (or monocarboxylate) monomer having 3 to 8 carbon atoms; and (c) from about 5 to 15 mol % of the polymer having a structural unit originating from a monoethylenic unsaturated monomer having a sulfonic (or sulfonate) group; wherein the water-soluble copolymer has a weight average molecular weight of from about 1,000 to about 50,000 wherein the copolymer is polymerized with hydrogen peroxide.

Abstract: A surfactant composition comprising alkylarylsulfonate molecules wherein more than 30 wt. % of the alkylarylsulfonate molecules of the surfactant composition are species of the formula: [R—X—Ar(SO3)?]a[Mn+]b wherein: X is a linear acyclic aliphatic hydrocarbyl chain; R is bound to a non-terminal carbon atom of X and is selected from H and C1 to C3 alkyl groups; X and R together have 10 or less carbon atoms, preferably 9 or 10 carbon atoms, most preferably 10 carbon atoms; Ar is an aromatic group; M is a cation or cation mixture, n is selected from 1, 2 and 3; and a and b are selected such that the alkylarylsulfonate molecule is electroneutral.

Abstract: Disclosed herein are detergent compositions comprising a microbially produced fatty alcohol or fatty alcohol derivative thereof. Further disclosed are cleaning compositions and personal care compositions comprising a microbially produced fatty alcohol or fatty alcohol derivative thereof. Methods of using the foregoing are also disclosed.

Abstract: A stripping and cleaning composition for cleaning microelectronics substrates, the composition comprising: at least one organic stripping solvent, at least one nucleophilic amine, at least one non-nitrogen containing weak acid in an amount sufficient to neutralize from about 3% to about 75% by weight of the nucleophilic amine such that the stripping composition has an aqueous pH of from about 9.6 to about 10.9, said weak acid having a pK value in aqueous solution of 2.0 or greater and an equivalent weight of less than 140, at least one metal-removing compound selected from the group consisting of diethylene glycol and diethylene glycolamine, and water, and method for cleaning microelectronic substrates with these compositions.

Abstract: A removal composition is described, having a plurality of abrasive particles, an organic amine, antioxidant, biocide, colorant, corrosion inhibitor, cosolvent, defoamer, dye, enzyme, light stabilizer, odor masking agent, plasticizer, preservative, rust inhibitor, surfactant, thickener, or a combination comprising at least one of the foregoing; from 0 to 1% water, based on the total weight of the removal composition; and a ketal adduct of formula (1) wherein R1 is C1-6 alkyl, R2 is hydrogen or C1-3 alkyl, each R3, R4, and R5 is independently hydrogen or C1-6 alkyl, R6 and R7 are each independently hydrogen or C1-6 alkyl, a=0-3, and b=0-1.

Abstract: The invention relates to a photoprotective composition containing as liquid phase, an oil-in-water emulsion, emulsified with at least one dimeric surfactant comprising two surfactant units, which may be identical or different, each consisting of a hydrophilic head and a hydrophobic tail and connected to each other, via the hydrophilic heads, by means of a spacer group, at least one photoprotective system capable of screening out UV rays, containing at least one mineral nanopigment based on metal oxide, and optionally at least one organic, preferably hydrosoluble or liposoluble UV-A and/or UV-B screening agent, and at least one associative polymer comprising at least one C8-40 fatty chain, and also to a process for preparing such a photoprotective composition.

Abstract: Photoresist strippers and cleaning compositions of this invention are provided by non-aqueous cleaning compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise at least one polar organic solvent, at least one hydroxylated organic amine, and at least one corrosion inhibitor polymer having multiple hydroxyl- or amino-functional groups pendant from the polymer backbone.

Abstract: A process for making a useful cleaning product from an alkoxylate of a secondary alcohol which comprises: (a) partially sulfating a secondary alcohol alkoxylate with sulfur trioxide in a falling film sulfation reactor at a molar ratio of sulfur trioxide to secondary alcohol alkoxylate of less than 0.9 to produce a mixture comprising a sulfuric acid ester of the secondary alcohol alkoxylate and secondary alcohol alkoxylate which may comprise at least 50 percent by weight of the sulfuric acid ester of the secondary alcohol alkoxylate, (b) combining the mixture with a neutralizing agent in an amount sufficient to neutralize the sulfuric acid ester, and (c) optionally adding water to yield a useful cleaning product.

Abstract: A stripping agent composition for a resist, containing (A) 0.1 to 10% by weight of an amine; (B) 80 to 99% by weight of an organic solvent having a Hansen's solubility parameter of from 18 to 33 MPa1/2; (C) 0.01 to 3% by weight of a sugar; and (D) 0 to 5% by weight of water; a method for stripping a resist, including the step of stripping the resist with the stripping agent composition; and a method for manufacturing a semiconductor device, including the step of stripping a resist with the stripping agent composition. By using the stripping composition of the present invention, for example, a high-quality IC or LSI semiconductor device circuit, especially a compound semiconductor device circuit can be more economically advantageously manufactured.

Abstract: Back end photoresist strippers and residue compositions are provided by non-aqueous compositions that are essentially non-corrosive toward copper as well as aluminum and that comprise a polar organic solvent, a hydroxylated amine, and as a corrosion inhibitor fructose.

Abstract: A cleaning composition with a limited number of natural ingredients contains an anionic surfactant, a hydrophobic syndetic, and a hydrophilic syndetic. The cleaning composition can be used to clean laundry, soft surfaces, and hard surfaces and cleans as well or better than commercial compositions containing synthetically derived cleaning agents.

Abstract: Surfactant-containing compositions are described which include a protein component that has the effect of improving the surface-active properties of the surfactants contained in the compositions. The surfactant-containing compositions having the protein component demonstrate significantly lower critical micelle concentrations (CMC), reduced surface tensions, and reduced interfacial tensions than do comparable compositions having no protein component. In addition, the surfactant-containing compositions having the protein component has the effect of converting greasy waste contaminants to surface active materials.

Abstract: A composition for removing a photoresist includes about 5 to about 20 percent by weight of an alcoholamide compound, about 15 to about 60 percent by weight of a polar aprotic solvent, about 0.1 to about 6 percent by weight of an additive, and pure water. The alcoholamide compound is chemically structured as follows: where R1 is a hydroxyl group or a hydroxyalkyl group, and R2 is a hydrogen atom or a hydroxyalkyl group.

Abstract: The present invention relates to surfactant/solvent systems for liquid formulations comprising ?) one or more nonaromatic-based surfactants, ?) as solvent, one or more triester(s) of phosphoric acid with alcohols, preferably from the group consisting of 1) monohydric alkanols having 5 to 22 carbon atoms, for example with n-, i- or neo-pentanol, n-hexanol, n-octanol, 2-ethylhexanol, 2) diols or polyols, such as ethylene glycol, propylene glycol or glycerol, 3) aryl, alkylaryl, poly(alkyl)aryl and poly(arylalkyl)aryl alcohols, for example with phenol and/or cresol, octylphenol, nonylphenol, triisobutylphenol, tristyrylphenol, 4) alkoxylated alcohols obtained by reacting the alcohols mentioned above under 1), 2) or 3) with alkylene oxides, preferably (C1-C4)alkylene oxides, and 5) alkoxylated alcohols obtained by reacting monohydric alkanols having 1 to 4 carbon atoms and alkylene oxides.

Abstract: A method for cleaning articles using a surfactant which is effective in the formation of stable microbubbles is provided. The surfactant for microbubble formation contains a (poly)oxyalkylene adduct (A) of an active hydrogen atom-containing compound (a) represented by formula (1) Z-[(AO)n—H]p??(1) wherein Z is the residue of an active hydrogen-containing compound (a) with a valence of P resulting from removal of the active hydrogen atom or atoms; A is an alkylene group containing 1 to 8 carbon atoms; n is an integer of 1 to 400; and p is an integer of 1 to 100. The foaming power of a 0.02% by weight aqueous solution of the (poly)oxyalkylene adduct (A) as measured at 20° C. by the Ross Miles test is not higher than 50 mm.

Abstract: The present invention relates to the use of end groups Y, where Y stands for (formula I), where Rf stands for CF3—(CH2)r—, CF3—(CH2)r—O—, CF3—(CH2)r—S—, CF3CF2—S—, SF5—(CH2)r—, [CF3—(CH2)r]2N—, [CF3—(CH2)r]NH— or (CF3)2N—(CH2)r—, B stands for a single bond, O, NH, NR, CH2, C(O)—O, C(O), S, CH2—O, O—C(O), N—C(O), C(O)—N, O—C(O)—N, N—C(O)—N, O—SO2 or SO2—O, R stands for alkyl having 1 to 4 C atoms, b stands for 0 or 1 and c stands for 0 or 1, q stands for 0 or 1, where at least one radical from b and q stands for 1, and r stands for 0, 1, 2, 3, 4 or 5, as end group in surface-active compounds, to corresponding novel compounds, and to processes for the preparation of these compounds.

Abstract: A cleaning composition comprises a first surfactant and a second surfactant. The first surfactant is of the general formula R1-O-(A)mH, wherein R1 is an aliphatic hydrocarbon having from 10 to 16 carbon atoms, A is an alkyleneoxy group, and subscript m is a positive number. The second surfactant is of the general formula R2 -O-(B)nH, wherein R2 is an aliphatic hydrocarbon having from 12 to 15 carbon atoms, B is an alkyleneoxy group, and subscript n is a positive number. The cleaning composition has an average degree of alkoxylation of from about 3 to about 8 moles and an excess of the first surfactant relative to said second surfactant. The cleaning composition can further comprise a third surfactant in addition to the first and second surfactants. If employed, the third surfactant typically can comprise a linear alkyl sulfonate (LAS) and/or an alkyl ether sulfate (AES).

Abstract: An improved paint stripper is provided and comprises at least one paint-stripping agent modified with at least one heavy metal remediation agent. Optionally, one or more viscosity-modification agents, dispersants, or other additive is also included. The invention also provides a kit for making a heavy metal-remediating paint stripper, comprising a vessel containing a paint-stripping agent and a dissolvable packet containing a remediation agent. To use the kit, a painter or other laborer opens the vessel containing the paint-stripping agent and deposits therein the packet containing the remediation agent. The packet dissolves, thereby releasing the remediation agent into the stripping agent.

Abstract: Provided is a process for preparing a sulfuric acid amine salt (I) represented by the formula (I), which is a neutralization compound between a sulfated compound having a long chain alkyl or alkenyl group and an amine having a long chain alkyl or alkenyl group, useful as softener. wherein R31 is a linear or branched C18-36 alkyl or alkenyl group, or a group represented by the formula R36—(OA)n- (wherein R36 is a linear or branched C12-36 alkyl or alkenyl group, OA is an oxyalkylene group having 2 to 4 carbon atoms and n is a number of from 0.

Abstract: The present invention relates to aqueous compositions used to remove post etch organic and inorganic residue as well polymeric residues and contaminants from semiconductor substrates. The compositions are comprised of a water soluble organic solvent, a sulfonic acid and water.

Abstract: A composition for removing etching residue and a method using same are disclosed herein. In one aspect, there is provided a method for removing etching residue from a substrate comprising: contacting the substrate with a composition comprising water, an organic dicarboxylic acid, a buffering agent, a fluorine source, and optionally a water miscible organic solvent.

Abstract: Compositions containing water, an organic dicarboxylic acid, a buffering agent and fluorine source and optionally a water miscible organic solvent are capable of removing etching residue.

Abstract: The present invention is a detergent composition which contains alkali metal N-methyltaurate, alkali metal taurate or alkali metal hypotaurate salt of a specific organic acid or organic alkali N-methyltaurate, organic alkali taurate or organic alkali hypotaurate salt of a specific organic acid. The detergent composition of the present invention is an excellent detergent composition which has better foaming and foam quality, less pH dependence of the foaming, creamy foam, no creaking feeling or stretched feeling and no offensive odor.

Abstract: The invention relates to new detergent and conditioning hair-care compositions comprising (A) a washing base comprising an anionic surfactant and an amphoteric C10-C14 alkylbetaine surfactant, (B) a conditioning system comprising at least one cationic guar gum and at least one insoluble silicone, the silicone being introduced into the composition in non-emulsified form, and (C) a cosmetically acceptable medium, as well as a process of cleansing and conditioning the hair by application of the composition.

Abstract: A resist removing composition has an excellent capability for removing a resist, polymer, organometallic polymer and metal oxide and which does not attack underlying layers, and a resist removing method using the same. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, at least one selected from the group consisting of alkanolamine, a polar material having a dipole moment of 3 or greater and an attack inhibitor, and hydrogen peroxide or at least one of a fluoride-based reducing agent and a hydroxide-based reducing agent.

Abstract: A composition useful as a paint remover. The composition may include a carbonate, a dibasic ester and a mono-ester. The composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

Abstract: A method for the cleaning of a substrate having an organic compound such as a hydrogenic compound thereon, the method comprising the step of applying to the substrate a composition comprising a lignosulfonate and a microbially effective amount of microorganisms in an aqueous solution. The method is ideally practiced to achieve the microbial degradation of hydrocarbons and can be used as a parts washing solution and for cleaning substrates such as floors, decks of vessels, etc.

Abstract: A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resist removing agent includes alkoxy N-hydroxyalkyl alkanamide. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, and at least one compound selected from a group consisting of a polar material having a dipole moment of 3 or greater, an attack inhibitor and alkanolamine. A substrate having the resist thereon is brought into contact with the resist removing agent or resist removing composition to remove the resist.

Abstract: The present invention relates to certain alkylated 2-(2-hydroxyphenyl) benzenesulfinic acid and 2-(2-hydroxyphenyl)benzenesulfonic acid compounds and compositions which consist essentially of 2-(2-hydroxyphenyl) benzenesulfinic acid, 2-(2-hydroxyphenyl)benzenesulfonic acid and/or substituted derivatives thereof. The compositions of the invention are useful as hydrotropes and are also of use as, or as starting materials for, surfactants, and as starting materials for the synthesis of other useful chemicals such as, polymers and resins, solvents, adhesives and biocides.

Abstract: A resist removing agent and a resist removing composition, having an excellent capability for removing a resist and polymer and which does not attack underlying layers, a method for preparing the same and a resist removing method using the same. The resist removing agent includes alkoxy N-hydroxyalkyl alkanamide. The resist removing composition includes alkoxy N-hydroxyalkyl alkanamide, and at least one compound selected from a group consisting of a polar material having a dipole moment of 3 or greater, an attack inhibitor and alkanolamine. A substrate having the resist thereon is brought into contact with the resist removing agent or resist removing composition to remove the resist.

Abstract: A photoresist stripping composition suitable for both of the single wafer treatment method using an air knife process and a dipping photoresist stripping method. The composition comprises 5-15 weight % of alkanolamine, 35-55 weight % of sulfoxide or sulfone compound and 35-55 weight % of glycolether, and preferably further includes surfactant, and also 1-10 weight % of tetra methyl ammonium hydroxide or 3-15 weight % of benzenediol and 1-15 weight % of alkylsulfonic acid.

Abstract: A composition useful as a paint remover. The composition may include a carbonate, a dibasic ester and a mono-ester. The composition may also contain an organic sulfur-containing compound such as dimethyl sulfoxide (DMSO), a glycol ether, a ketone, or combination thereof. The composition may be used in a process for removing paint by applying it to a painted surface. The compositions have several important attributes, including low toxicity and high efficacy in removing paint and coatings.

Abstract: A liquid personal cleansing composition comprising: (a) from about 1% to about 15% by weight of short chain alkyl sulphate surfactant having an average from 8 to 10 carbon atoms on the alkyl chain and mixtures thereof; (b) from about 1% to about 15% by weight of C.sub.12 to C.sub.22 alkyl ethoxy sulphate surfactant having an average degree of ethoxylation of from about 1 to about 6; (c) from about 0.1% to about 10% of water-soluble auxiliary surfactant selected from anionic surfactant other than C.sub.8 to C.sub.10 alkyl sulphate, nonionic, zwitterionic and amphoteric and mixtures thereof; and optionally (d) from about 0.01% to about 5% of cationic conditioning polymer; and (e) water; wherein the ratio of short chain alkyl sulphate to alkyl ethoxy sulphate is in the range of from about 1:3 to about 3:1, more preferably from about 2:1 to about 1:2.

Abstract: A composition including an aprotic polar solvent such as DMSO, a non-protic water-soluble ether, a water-soluble thickener selected from acrylic acid polymers and an aliphatic amine having 6-20 carbon atoms.

Abstract: An improvement is described in compositions which are especially effective in disinfecting the surface being cleaned and in the removal of oily and greasy soil which contains a mixture of a disinfecting agent, a booster agent for the disinfecting agent, an anionic surfactant and a hydrocarbon ingredient, a water soluble cosurfactant, and water.

Abstract: The present invention relates to a stress stable lathering skin cleansing liquid composition comprising by weight parts of the liquid composition:(a) from about 0.5 parts to 10 parts of a stabilizer; for example trihydroxystearin;(b) from about 1 part to about 80 parts of lipid skin moisturizing agent;(c) from about 1 part to about 30 parts of surfactant having a combined CMC equilibrium surface tension value of from 15 to 50;(d) water;wherein said stress stable lathering skin cleansing liquid composition has a Lipid Deposition Value (LDV) of from about 5 to about 100 and wherein said composition is stable for at least two weeks at 100 F.

Abstract: A photoresist stripping composition is provided. The composition includes 10-30 weight % of alkanolamine, 10-35 weight % of dimethylsulfoxide, 30-50 weight % of N-methylpyrrolidone and 10-30 weight % of glycolether. The composition shows good stripping force and strips photoresist by a single-wafer treatment method using the air-knife process or by a dipping method.