Processes Of Treating A Solid Polymer Or Sicp Derived From Silicon Containing Reactant; Or Compositions Therefore Patents (Class 522/148)
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Patent number: 7825167Abstract: The invention relates to a dental composition comprising a) halogenated aryl alkyl ether component (A) comprising at least 1 aryl alkyl ether moiety, at least 1 halogen atom attached to each aryl residue of the aryl alkyl ether moieties, at least 2 unsaturated moieties, b) Si—H functional component (B), c) initiator (C), d) optionally filler (D), and e) optionally component (E) selected from modifiers, dyes, pigments, thixotropic agents, flow improvers, polymeric thickness, surfactants, odorous substances, diluting agent(s) and flavourings.Type: GrantFiled: July 14, 2004Date of Patent: November 2, 2010Assignee: 3M Espe AGInventor: Adrian S. Eckert
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Patent number: 7799842Abstract: A method of preparing a reinforced silicone resin film, the method comprising the steps of impregnating a fiber reinforcement in a hydrosilylation-curable silicone composition comprising a silicone resin and a photoactivated hydrosilylation catalyst; and exposing the impregnated fiber reinforcement to radiation having a wavelength of from 150 to 800 nm at a dosage sufficient to cure the silicone resin; wherein the reinforced silicone resin film comprises from 10 to 99% (w/w) of the cured silicone resin and the film has a thickness of from 15 to 500 ?m; and a reinforced silicone resin film prepared according to the method.Type: GrantFiled: May 11, 2006Date of Patent: September 21, 2010Assignee: Dow Corning CorporationInventors: Nicole Anderson, Bizhong Zhu
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Patent number: 7799843Abstract: A file is formed by coating a substrate with a film-forming composition including a compound having an alicyclic hydrocarbon structure and irradiating the coated composition with microwaves having a frequency of 5.8 GHz. An insulating film is formed by irradiating a film including a compound having a siloxane structure with microwave having a frequency of 5.8 GHz. These films possess excellent film properties such as dielectric constant and mechanical strength.Type: GrantFiled: February 25, 2009Date of Patent: September 21, 2010Assignee: FUJIFILM CorporationInventors: Makoto Muramatsu, Akira Asano, Kensuke Morita
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Patent number: 7771794Abstract: The present invention relates to an active energy ray-curable organopolysiloxane resin composition that comprises an organopolysiloxane resin having an epoxy group and an aromatic hydrocarbon group and a photopolymerization initiator, as well as to a light-transmitting component that comprises cured bodies produced by irradiating the aforementioned organopolysiloxane resin with active-energy rays in the presence of the aforementioned photopolymerization initiator, and to a method for manufacturing the aforementioned light-transmitting component.Type: GrantFiled: December 10, 2004Date of Patent: August 10, 2010Assignees: Dow Corning Corporation, Dow Corning Toray Company, Ltd.Inventors: Toshinori Watanabe, Takuya Ogawa, Kasumi Takeuchi, Makoto Yoshitake, Shedric O. Glover, Mary Kay Tomalia
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Publication number: 20100187001Abstract: A novel polyimide resin is formed by imidizing a diamine component including an amide group-containing siloxane diamine compound represented by the following formula (1) and an acid dianhydride component including an aromatic acid dianhydride such as 3,3?,4,4?-diphenylsulfone tetracarboxylic dianhydride. This novel polyimide resin utilizes a novel polyimide resin into which a reaction group capable of reacting with a crosslinking agent to form a crosslinking point is pre-introduced before imidization. The novel polyimide resin can confer a comparatively low elastic modulus and heat resistance to a dry film or a photosensitive cover film formed from a photosensitive polyimide resin composition containing the novel polyimide resin. In the formula (1), R1 and R2 are each independently an optionally-substituted alkylene group, m denotes an integer of 1 to 30, and n denotes an integer of 0 to 20.Type: ApplicationFiled: August 20, 2008Publication date: July 29, 2010Applicant: SONY CHEMICAL & INFORMATION DEVICE CORPORATIONInventors: Tomoyasu Sunaga, Hiroki Kanaya, Mamiko Nomura, Junichi Ishii
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Patent number: 7759406Abstract: The present invention provides a process for producing a polysilsesquioxane graft polymer (1) which includes applying ionizing radiation or heat to a mixture including a polysilsesquioxane compound (2) and a vinyl compound (3), a polysilsesquioxane compound including an iniferter group, and a pressure-sensitive adhesive and a pressure-sensitive adhesive sheet using the polymer. According to the present invention, a process for producing a polysilsesquioxane graft polymer which may be used as a pressure-sensitive adhesive exhibiting excellent heat resistance and cohesive force, and the like are provided. In the formula, A represents a linking group, R1 represents a hydrocarbon group which may have a substituent, R2 represents a hydrogen atom or the like, R3 represents a polar group or the like, R4 represents a hydrogen atom or the like, k1 to k3 represent arbitrary positive integers, 1 to n represent zero or an arbitrary positive integer (excluding the case where “m=n=0”), and Q represents an iniferter group.Type: GrantFiled: September 22, 2004Date of Patent: July 20, 2010Assignee: Lintec CorporationInventors: Taketo Kumon, Toshifumi Kageyama, Atsuko Kimura, Toshio Sugizaki, Osamu Moriya
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Patent number: 7745505Abstract: UV-crosslinkable acrylic hotmelt pressure sensitive adhesives comprising acrylic and vinyl monomers, and a polymerizable UV photoinitiator. The photoinitiator comprises a spacer comprising both ethylene oxide and urethane, or urea, carbonate, or siloxane functional groups. The ethylene oxide is directly bonded to the chromophore (e.g., benzophenone) moiety, while the urethane (or urea, carbonate, siloxane) is closely linked to the polymerizable moiety (e.g., styrenic C?C double bond).Type: GrantFiled: December 29, 2004Date of Patent: June 29, 2010Assignee: Henkel AG & Co. KGaAInventors: Yuxia Liu, Darwin Scott Bull
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Patent number: 7740482Abstract: Stable and substantially filled cationic dental compositions are described which include: (1) at least one cationically reactive compound (A); (2) at least one dental filler (B); (3) optionally, at least one dispersant (C) composed of at least one organic polymer or copolymer; (4) at least one cationic photoinitiator (D); and (5) optionally, at least one photosensitizer (E). The dental filler (B) is treated with at least one organosilicon coupling agent (F), and at least one compound (G). The organosilicon coupling agent (F) has at least one reactive function (rfA) directly linked to a silicon atom forming after activation of a chemical bond with the dental filler, and at least one reactive function (rfB) not directly linked to a silicon atom, forming after activation, a chemical bond with a reactive function (rfC) of the compound (G).Type: GrantFiled: May 2, 2008Date of Patent: June 22, 2010Assignee: Bluestar Silicones FranceInventors: Jean-Marc Frances, Martial Deruelle, Yves Giraud
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Publication number: 20100151144Abstract: A primer composition for a cured silicon-containing surface and its uses are provided. The composition comprises a polar organic solvent, an acrylic monomer, and an amino-containing silane having a formula of (R1O)x(R2)ySiR3NHR4, wherein each R1 independently represents H, C1-C12 hydrocarbonyl, or aryl, each R2 independently represents H, O, C1-C12 hydrocarbonyl, or aryl, R3 represents divalent C1-C6 hydrocarbonyl being substituted or unsubstituted with one or more aryl rings and the carbon atom chain of the hydrocarbonyl can be inserted with one or more aryl rings, R4 represents H, C1-C12 hydrocarbonyl, amino-C1-C12 hydrocarbonyl, or phenylamino, and x is 0, 1, 2 or 3, y is 0, 1 or 2, and the sum of x and y is 3. The amount of the acrylic monomer ranges from about 0.01 wt % to about 25 wt %, while the amount of the amino-containing silane ranges from about 1 wt % to about 35 wt %, based on the total weight of the composition.Type: ApplicationFiled: March 24, 2009Publication date: June 17, 2010Applicant: GREAT EASTERN RESINS INDUSTRIAL CO., LTD.Inventors: Shang-Hsin GUO, Wen-Ching TSAY
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Publication number: 20100144916Abstract: Disclosed herein is a composition comprising a crosslinked organic polymer; wherein the composition has a coefficient of friction that is in a range of ±30% of a coefficient of friction for a composition comprising the same organic polymer that is not crosslinked; and wherein the composition has a lower K factor than a K factor of the composition comprising the same organic polymer that is not crosslinked; the coefficient of friction and the K factor being measured in a thrust washer apparatus as per ASTM D-3702, where the counter stationary surface in the thrust washer apparatus comprises carbon steel having a Rockwell C hardness of 18 to 22 and a 12 to 16 micro-inch surface finish.Type: ApplicationFiled: December 8, 2008Publication date: June 10, 2010Applicant: SABIC INNOVATIVE PLASTICSInventors: Domenico La Camera, Alexis Chopin, Andre Kijkuit
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Patent number: 7728048Abstract: the invention provides a composition having laser engraving properties, comprising a host material and a laser enhancing additive. The host material comprises a material, such as a polymer, modified by a first process, whereby the host material as modified by the first process has increased thermal conductivity as compared to the host material before the first process. The laser enhancing additive comprises a first quantity of at least one of copper potassium iodide (CuKI3), Copper Iodide (CuI), potassium iodide (KI), sodium iodide (NaI), and aluminum iodide (AlI), and a second quantity of at least one substance selected from the group consisting of zinc sulfide (ZnS), barium sulfide (BaS), alkyl sulfonate, and thioester.Type: GrantFiled: September 30, 2003Date of Patent: June 1, 2010Assignee: L-1 Secure Credentialing, Inc.Inventor: Brian Labrec
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Publication number: 20100129587Abstract: Disclosed is a composition capable of imparting high hardness, abrasion resistance, excellent contamination resistance and durability of such contamination resistance even in the form of a thin film. Specifically disclosed is a composition including an organic polymer containing 5-30% by mass of a radically polymerizable monomer with a perfluoroalkyl group, 0.01-5% by mass of ?,?-dimercaptopolysiloxane, 5-40% by mass of a radically polymerizable monomer with a cationically photopolymerizable epoxy group and 25-75% by mass of another radically polymerizable monomer which is copolymerizable with the aforementioned substances. The organic polymer has a structure corresponding to a radically polymerized copolymer of the monomer mixture wherein the molar ratio of the mercapto group to the epoxy group is 0.0001-0.025 and/or a structure obtained by reacting a (meth)acrylic acid with the epoxy group of the radically polymerized copolymer.Type: ApplicationFiled: December 2, 2005Publication date: May 27, 2010Applicant: Mitsubishi Chemical CorporationInventor: Makoto Terauchi
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Patent number: 7709552Abstract: An organic/inorganic composite including a condensation product of an organic silicon compound represented by formula (I) as a major component; at least one kind of a photosensitive compound which is sensitive to light having a wavelength of 350 nm or less selected from the group consisting of metal chelate compounds, compounds of metal organic acid salts, metal compounds having 2 or more hydroxyl or hydrolyzable groups, hydrolyzates thereof, and condensation products thereof; and/or a compound derived from the photosensitive compound; RnSiX4-n??(I) wherein R represents an organic group in which carbon directly bonds to Si represented in the formula and X represents a hydroxyl or hydrolyzable group; n represents 1 or 2; R may be the same or different when n is 2; and X may be the same or different when (4-n) is 2 or more.Type: GrantFiled: February 16, 2006Date of Patent: May 4, 2010Assignee: Nippon Soda Co., Ltd.Inventors: Nobuo Kimura, Hiromoto Shibata, Kazuki Hasegawa
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Patent number: 7709551Abstract: The present invention relates to a coating composition for a film with low refractive index and a film prepared therefrom, and more precisely, a coating composition with low refractive index which contains dispersed porous organic/inorganic hybrid nano-particles or a colloid containing the dispersed nano-particles, a photocurable compound having unsaturated functional groups, photoinitiator or photosensitizer, or an organic siloxane thermosetting compound, and a solvent and a film prepared therefrom. According to the present invention, porous particles have been formed by using a structural regulator in a silane compound at a specific size, in order to be fitted for a film with low refractive index, and then the structural regulator has been eliminated by a simple process before forming the film, resulting in preparation of a film with extremely low refractive index at a low temperature of up to 120° C.Type: GrantFiled: June 1, 2006Date of Patent: May 4, 2010Assignee: LG Chem, Ltd.Inventors: Jung-Won Kang, Min-Jin Ko, Myung-Sun Moon, Bum-Gyu Choi, Jeong-Man Son, Dae-Ho Kang
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Publication number: 20100092690Abstract: A polymer cures by either radiation or moisture curing mechanisms, or both. The polymer is prepared by hydrosilylation. The polymer includes units of formula: (R22Si02/2)b, (R2Si03/2)c, (SiO4/2)d, (R1?)f, and (R23Si01/2)g, where each R1 is independently an oxygen atom or a divalent hydrocarbon group; each R1? is independently divalent hydrocarbon group; each R2 is independently a monovalent organic group that is free of terminal aliphatic unsaturation each X is independently a monovalent hydrolyzable group; each J is independently a monovalent epoxy functional organic group; subscript a has a value of 1 or more; subscript b has a value of 0 or more; subscript c has a value of 0 or more; subscript d has a value of 0 or more; subscript e has a value of 1 or more; subscript f has a value of 0 or more; subscript g has a value of 0 or more; subscript s is 1, 2, or 3; and subscript t is 1, 2, or 3.Type: ApplicationFiled: November 7, 2007Publication date: April 15, 2010Applicant: DOW CORNING CORPORATIONInventors: Khristopher Alvarez, Nick Shephard, James Tonge
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Publication number: 20100065871Abstract: An ultra violet light transmitting polymer is obtainable by the polymerisation of at least one compound having a substantially non UV absorbing core group comprising; linear or branched aliphatic hydrocarbons which may contain an aliphatic ring; or polydialkylsiloxanes. The compounds have at least one functional group comprising formula (A), (B) or (C):and each of the groups —R3— are, independently, linking groups which may be present or absent and, where present, may be a C1 to C10 hydrocarbon chain, which may contain an ether linkage. Methods for producing the polymers and uses for the polymers are also described.Type: ApplicationFiled: November 29, 2007Publication date: March 18, 2010Inventors: Richard A. Pethrick, Martin David Dawson, Erdan Gu, Allan R. Mackintosh, Alexander Jan-Christoph Kuehne
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Publication number: 20100069523Abstract: A polymer cures by both radiation and moisture curing mechanisms. The polymer is prepared by hydrosilylation. The polymer is useful in adhesive compositions. The polymer includes units of formulae (I), (R22Si02/2)b, (R2Si03/2)c, (Si04/2)d, (R1)f, and (R23SiO1/2)g, where each R1 is independently an oxygen atom or a divalent hydrocarbon group; each R1 is independently divalent hydrocarbon group; each R2 is independently a monovalent organic group that is free of terminal aliphatic unsaturation each X is independently a monovalent hydrolyzable group; each J is independently a monovalent epoxy functional organic group; subscript a has a value of 1 or more; subscript b has a value of 0 or more; subscript c has a value of 0 or more; subscript d has a value of 0 or more; subscript e has a value of 1 or more; subscript f has a value of 0 or more; subscript g has a value of 0 or more; subscript s is 1, 2, or 3; and subscript t is 1, 2, or 3.Type: ApplicationFiled: December 10, 2007Publication date: March 18, 2010Inventors: Khristopher Edward Alvarez, Nick Evan Shephard, James Tonge
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Publication number: 20090318580Abstract: An ultraviolet hardenable ink composition excelling in the wetting characteristic (repellence prevention) of ink having impacted a recording medium. There is provided an ultraviolet hardenable ink composition characterized by containing a polyester-modified polydimethylsiloxane as a surfactant in an amount of 0.01 to 1% based on the ultraviolet hardenable ink. Preferably, at least allyl glycol and/or a N-vinyl compound is contained as a polymerizable compound. Incorporation of the polyester-modified polydimethylsiloxane in the surfactant has realized enhancing of the wetting characteristic on all nonabsorptive material surfaces and avoiding of ink repellence.Type: ApplicationFiled: March 29, 2006Publication date: December 24, 2009Inventors: Keitaro Nakano, Takashi Oyanagi
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Publication number: 20090317560Abstract: A method of forming an ultraviolet curable paint coating is provided. First, an ultraviolet curable paint composition is formed by mixing, based on 100 parts by weight of the ultraviolet curable paint composition, 1 to 10 parts by weight of a photo-initiator, 5 to 20 parts by weight of an organosilane compound, 5 to 30 parts by weight of a binding agent, 0.1 to 15 parts by weight of a catalyst, and an ultraviolet curable resin, wherein a number of the functional group of the binding agent is more than that of the organosilane compound. Thereafter, a sub coating is formed by using the ultraviolet curable paint composition, and an ultraviolet curable paint coating is then formed by contacting the sub coating with a paint, wherein the unreacted hydroxyls of the sub coating react with the paint to facilitate the paint to adhere to a surface of the sub coating.Type: ApplicationFiled: August 27, 2009Publication date: December 24, 2009Applicant: COMPAL ELECTRONICS, INC.Inventors: Yi-Ching Lee, Jui-Tsen Huang, Po-Tau Liu, Chan-Ming Liu
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Publication number: 20090318581Abstract: A hardenable composition which comprises (1) a radical polymerizable monomer, (2) an organosilicon compound having epoxy group at one end, (3) an organosilicon compound having a radical polymerizable functional group at one end, (4) an amine compound, (5) a photochromic compound and (6) a photopolymerization initiator, wherein the compound of component (2) is a compound having silanol group or a group which forms silanol group by hydrolysis, and the compound of component (3) is a compound having silanol group or a group which forms silanol group by hydrolysis; and an optical member which comprises a photochromic coating layer formed by coating an optical substrate with the hardenable composition described above and hardening the composition. The photochromic coating layer in the optical member exhibits excellent adhesion with the optical substrate and a great strength of the film.Type: ApplicationFiled: May 31, 2006Publication date: December 24, 2009Inventors: Hiroshi Ota, Takeshi Imizu, Ken-ichi Shinde
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Patent number: 7629051Abstract: An optical film comprising a support and a layer containing a cured product of a composition which contains a fluorinated photopolymerization initiator and an ionizing radiation-curing compound.Type: GrantFiled: June 1, 2006Date of Patent: December 8, 2009Assignee: Fujifilm CorporationInventors: Yuuichi Fukushige, Hiroyuki Yoneyama
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Publication number: 20090284567Abstract: The invention provides a method for producing an ink jet recording head having a high durability and a high ink resistance and enabling a high-quality image recording by employing a material capable of reducing the internal stress and having satisfactory patterning characteristics. It also provides a method of producing such ink jet recording head with a high precision. A cationically photopolymerizable resin composition containing a condensate of a hydrolysable organosilane compound, employed as a material for forming a flow path forming member, enables a reduction of internal stress and a highly precise pattern in the flow path forming member thereby providing an ink jet recording head having a high durability and a high ink resistance and capable of high-quality printing over a prolonged time, and a producing method therefor.Type: ApplicationFiled: January 20, 2006Publication date: November 19, 2009Inventors: Etsuko Hino, Norio Ohkuma, Yoshikazu Saito, Mitsutoshi Noguchi, Helmut Schmidt, Carsten Becker-Willinger, Pamela Kalmes
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Publication number: 20090281208Abstract: Disclosed herein is a liquid coating material curable with actinic radiation, substantially or entirely free from organic solvents, comprising (A) at least two compounds of general formula X—O—Y(—OH)-Z-Gr wherein X is a C6-C14 aromatic radical, C5-C20 heterocyclic aromatic radical or C6-C30 alkyl radical, Y is a trivalent organic radical, Z is a linking functional group, and Gr is an organic radical comprising one group which can be activated with actinic radiation; with the proviso that at least one of the two compounds (A) comprises aromatic or heterocyclic aromatic radical X and at least one comprises alkyl radical X; (B) oligo- and polyurethanes and/or oligo- and polyesters comprising two or three groups which can be activated with actinic radiation; (C) color and/or effect pigments; (D) waxes; (E) matting agents; and (F) polysiloxane additives comprising groups which can be activated with actinic radiation, a process for preparing it, and use thereof.Type: ApplicationFiled: May 16, 2006Publication date: November 12, 2009Applicant: BASF COATINGS AKTIENGESELLSCHAFTInventors: Maxime Allard, Dominique Kauffer
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Publication number: 20090263631Abstract: This invention provides a film forming composition for nanoimprinting, which has excellent resistance to etching with oxygen gas, can prevent the separation of a transfer pattern, can eliminate a problem of a holing time on a substrate, and is also excellent in transferability, and photosensitive resist, a nanostructure, a method for pattern formation using the same, and a program for realizing the method for pattern formation. The film forming composition for nanoimprinting comprises a polymeric silicon compound having the function of causing a photocuring reaction. Preferably, the polymeric silicon compound has a functional group cleavable as a result of response to electromagnetic waves and causes a curing reaction upon exposure to electromagnetic waves. More preferred are siloxane polymer compounds, silicon carbide polymer compounds, polysilane polymer compounds, and silazane polymer compounds, or any mixture thereof.Type: ApplicationFiled: August 28, 2006Publication date: October 22, 2009Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Yoshinori Sakamoto, Naoki Yamashita, Kiyoshi Ishikawa
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Patent number: 7601781Abstract: The present invention has for its object to provide a curable composition which, despite its low viscosity, gives a cured product with a high gel fraction, low residual tack, low modulus, high elongation and good flexibility. The present invention relates to a curable composition comprising the following two components: (A) a vinyl polymer having at least one crosslinking silyl group on the average per molecule: and (B) a photocurable substance, (C) an air oxidation-curable substance, (D) a high molecular plasticizer, (E) a reactive plasticizer or (F) a compound having one silanol group in its molecule and/or a compound capable of reacting with moisture to give a compound having one silanol group in the molecule.Type: GrantFiled: March 17, 2008Date of Patent: October 13, 2009Assignee: Kaneka CorporationInventors: Masayuki Fujita, Nobuhiro Hasegawa, Yoshiki Nakagawa
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Publication number: 20090252932Abstract: An active energy ray-curable resin composition is handleable when it is formed into an uncured film. The resin composition cures quickly, is formable, and can be used to make a hard coat layer with a high hardness. Specifically, the active energy ray-curable resin composition of the present invention contains a vinyl polymer having alkoxysilyl groups in its side chain, along with a photoacid generator. In its uncured state, the active energy ray-curable resin composition has a glass transition temperature of 15° C. to 100° C.Type: ApplicationFiled: December 15, 2005Publication date: October 8, 2009Applicant: Kuraray Co., Ltd.Inventors: Takahiro Kitano, Hiroshi Matsugi, Takashi Imazu, Keiji Kubo, Masayasu Ogushi, Hirokazu Suzuki
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Patent number: 7595353Abstract: The invention provides a photocurable polymer composition having a fluorine-containing polymer and a fluorine-free polymer, and preferably further having a polymerizable double bond-containing compound and a photopolymerization initiator. The fluorine-containing polymer preferably includes a fluorosilsesquioxane skeleton.Type: GrantFiled: September 28, 2006Date of Patent: September 29, 2009Assignee: Chisso CorporationInventors: Hisanobu Minamisawa, Mikio Yamahiro, Akira Meguro
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Patent number: 7576142Abstract: The object of the present invention is to provide a polyorganosiloxane that has a specific structure and is superior to curability and a curable composition which is high in workability during curing, which leads to a cured product excellent in ultraviolet-ray transparency and heat resistance, and further wherein toughness thereof and occurrence of a crack by cyclic heat-cool are improved. The present polyorganosiloxane is one obtained by conducting hydrolysis and condensation of a silicon-containing organic compound represented by the general formula (1) below in the presence of an organic polyol compound having two or more hydroxyl groups and has an oxetanyl group.Type: GrantFiled: August 2, 2005Date of Patent: August 18, 2009Assignee: Toagosei Co., Ltd.Inventors: Kunikazu Tauchi, Hiroshi Suzuki
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Patent number: 7576140Abstract: The invention includes embodiments that relate to a method of improving the abrasion resistance of a plastic article. The method comprises: (a) providing a composition comprising at least one siloxane compound and at least one thermoplastic polymeric material; (b) forming an article from the composition of step (a); and (c) exposing the article formed in step (b) to an energy source selected from an electron beam source, a gamma radiation source, and a combination thereof. The invention also includes embodiments that relate to an article comprising an abrasion resistant surface.Type: GrantFiled: October 18, 2005Date of Patent: August 18, 2009Assignee: SABIC Innovative Plastics IP B.V.Inventors: Ryo Tamaki, Steven Thomas Rice, Hieu Minh Duong
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Patent number: 7566754Abstract: The invention relates to novel crosslinkable copolymers which are obtainable by (a) copolymerizing at least one hydrophilic monomer having one ethylenically unsaturated double bond and at least one crosslinker comprising two or more ethylenically unsaturated double bonds in the presence of a chain transfer agent having a functional group; and (b) reacting one or more functional groups of the resulting copolymer with an organic compound having an ethylenically unsaturated group. The crosslinkable copolymers of the invention are especially useful for the manufacture of biomedical mouldings, for example ophthalmic mouldings such as in particular contact lenses.Type: GrantFiled: August 10, 2007Date of Patent: July 28, 2009Assignee: Novartis AGInventors: Beat Müller, Alain Laurent, Veerle Coessens, Aaldert Rens Molenberg
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Patent number: 7560499Abstract: Novel blends of photo-initiators and photo-absorbers are disclosed. By the proper selection of the type and amount of absorber and initiator used in a composition, it is possible to regulate the conditions under which photo-induced reactions occur. In a specific embodiment, blends of UV initiators and photoabsorbers are used to control the conditions under which UV initiated polymerization occurs.Type: GrantFiled: June 10, 2005Date of Patent: July 14, 2009Assignee: Calhoun Vision, Inc.Inventors: Jagdish M. Jethmalani, Shiao H. Chang, Robert H. Grubbs
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Publication number: 20090149565Abstract: The present invention discloses method for making defect-free high performance mixed matrix membranes (MMMs) containing a continuous polymer matrix and dispersed molecular sieves such as AlPO-14 or UZM-5. These MMMs can be used for separations. The novel method for making defect-free high performance MMMs comprises: post treating the MMM at a temperature ?150° C. This new method results in a MMM with either no macrovoids or voids of less than 5 angstroms at the interface of the continuous polymer matrix and the molecular sieves. The MMMs are in the form of symmetric dense film, thin-film composite (TFC), asymmetric flat sheet or asymmetric hollow fiber. These MMMs have good flexibility and high mechanical strength, and exhibit high carbon dioxide/methane (CO2/CH4) selectivity and high CO2 permeance for CO2/CH4 separation. The MMMs are suitable for a variety of liquid, gas, and vapor separations.Type: ApplicationFiled: December 11, 2007Publication date: June 11, 2009Inventors: Chunqing Liu, Stephen T. Wilson, Stephen C. Houdek, David A. Lesch
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Publication number: 20090143496Abstract: Siloxane/urea copolymers contain pendant unsaturated groups crosslinkable by actinic radiation. The copolymers are suitable for use as non-creeping hotmelt adhesives and for other uses as well.Type: ApplicationFiled: November 24, 2005Publication date: June 4, 2009Applicant: WACKER CHEMIE AGInventor: Wolfgang Ziche
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Patent number: 7538144Abstract: A novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. The photoreactive polymers are useful in radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.Type: GrantFiled: June 29, 2005Date of Patent: May 26, 2009Assignee: Agfa Graphics, N.V.Inventors: Luc Vanmaele, Johan Loccufoer, Yu Chen, Holger Frey
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Patent number: 7534820Abstract: The present invention provides a novel photocurable composition containing an organic polymer having an epoxy group and/or oxetane group-containing silicon group at an end and a cationic photoinitiator. For example, the photocurable composition contains an organic polymer (A) having an epoxy group and/or oxetane group-containing silicon group at an end, and a cationic photoinitiator (B), the organic polymer (A) being produced by addition reaction between an organic polymer terminated with an unsaturated group and a hydrosilane compound having an epoxy group and/or an oxetane group.Type: GrantFiled: March 13, 2006Date of Patent: May 19, 2009Assignee: Kaneka CorporationInventors: Yoshiyuki Kohno, Hiroshi Ando
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Publication number: 20090105362Abstract: A method of preparing a reinforced silicone resin film, the method comprising the steps of impregnating a fiber reinforcement in a hydrosilylation-curable silicone composition comprising a silicone resin and a photoactivated hydrosilylation catalyst; and exposing the impregnated fiber reinforcement to radiation having a wavelength of from 150 to 800 nm at a dosage sufficient to cure the silicone resin; wherein the reinforced silicone resin film comprises from 10 to 99% (w/w) of the cured silicone resin and the film has a thickness of from 15 to 500 ?m; and a reinforced silicone resin film prepared according to the method.Type: ApplicationFiled: May 11, 2006Publication date: April 23, 2009Inventors: Nicole Anderson, Bizhong Zhu
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Patent number: 7517918Abstract: The present invention relates generally to a UV curable paint composition, a method for using the same and a coating composition made from the same. According to one embodiment, the paint composition includes a silicone modified aliphatic acrylated oligomer having fluorine substituted side chains in an amount by weight from 5% to 25%, an alkyl acrylate monomer in an amount by weight from 5% to 25%; a photoinitiator in an amount by weight from 0.1% to 5%; a plurality of pigment particles in an amount by weight from 0.1% to 5%; a nano-silver solution in a amount by weight from 0.1% to 5%; with remainder being solvent.Type: GrantFiled: August 18, 2006Date of Patent: April 14, 2009Assignee: Hon Hai Precision Industry Co., Ltd.Inventors: Chi-Chuang Ho, Chuan-De Huang
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Patent number: 7514482Abstract: Coating compositions yielding cured coatings that exhibit excellent abrasion-resistance and hardness for use on polymeric substrates such as the front side of optical lenses, in a manner that meets or exceeds the stringent requirements for such use. The compositions include the hydrolysis product of an epoxy functional alkoxy silane, a viscosity-reducing amount up to 50% by weight, solids basis, of a monomeric (silanol free) epoxy functional epoxy silane, and colloidal silica present in an amount sufficient to improve abrasion resistance as compared to a composition lacking the colloidal silica.Type: GrantFiled: July 25, 2005Date of Patent: April 7, 2009Assignee: The Walman Optical CompanyInventor: Gerald D. Treadway
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Patent number: 7507773Abstract: A radiation curable composition comprising a novel photoreactive polymer is disclosed comprising a dendritic polymer core with at least one initiating functional group and at least one co-initiating functional group. Suitable radiation curable compositions are varnishes, lacquers, printing inks and radiation curable ink-jet inks. The dendritic polymeric core is preferably a hyperbranched polymer.Type: GrantFiled: June 29, 2005Date of Patent: March 24, 2009Assignee: AGFA Graphics N.V.Inventors: Johan Loccufier, Luc Vanmaele, Roland Claes, Jaymes Van Luppen, Yu Chen, Holger Frey
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Publication number: 20080260337Abstract: Epoxy-functional polysiloxanes containing epoxy groups and hydrocarbyl groups free of aliphatic unsaturation, a silicone composition containing a polysiloxane selected from the aforementioned epoxy-functional polysiloxanes, a cured polysiloxane prepared by exposing the silicone composition to ultraviolet radiation, a coated optical fiber containing a cured polysiloxane, and a method of preparing a coated optical fiber.Type: ApplicationFiled: February 22, 2006Publication date: October 23, 2008Inventors: Maneesh Bahadur, Shedric O'Neal Glover, Ann Walstrom Norris
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Patent number: 7432313Abstract: A solvent-free polyimide silicone resin composition comprising (a) a polyimide silicone resin having repeating units represented by the following formula (1-1) and repeating units represented by the following formula (1-2), a film of said resin with a thickness of 100 ?m prepared on a quartz glass substrate having a light transmittance of 80% or higher at wavelengths of from 350 nm to 450 nm, (b) a reactive diluent, and (c) a photopolymerization initiator wherein X is a tetravalent organic group, Y is a divalent organic group, and Z is a divalent organic group represented by the following formula (2), wherein R1 may be different from each other and is a monovalent hydrocarbon group having 1 to 8 carbon atoms, which group may be substituted, R2 is a monovalent hydrocarbon group having a photopolymerizable group, a and b are each an integer of from 1 to 100 with a+b?100.Type: GrantFiled: September 9, 2005Date of Patent: October 7, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshinori Yoneda, Michihiro Sugo
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Publication number: 20080194726Abstract: A silicon-containing polytrimethylene homo- or copolyether wherein at least a portion of the polymer end groups are silicon-containing end groups having the formula: —OSi(X)(Y)(Z), where X and Y are groups that are easily displaceable from silicon by reaction with water and/or alcohols, and Z is selected from the group consisting of (a) C1-C20 linear or branched alkyl groups, (b) cycloaliphatic groups, (c) aromatic groups, each of (a), (b) and (c) being optionally substituted with a member selected from the group consisting of O, N, P and S, (d) hydrogen, and (e) groups that are easily displaceable from silicon by water and/or alcohol.Type: ApplicationFiled: March 27, 2008Publication date: August 14, 2008Inventor: Howard C. Ng
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Patent number: 7396861Abstract: Radiation curable compositions with a polymeric co-initiator are disclosed comprising a dendritic polymer core with at least one co-initiating functional group as an end group. The dendritic polymeric core is preferably a hyperbranched polymer. Industrial applications include varnishes, lacquers and printing inks. The polymeric co-initiator is especially useful in radiation curable inkjet ink.Type: GrantFiled: June 28, 2005Date of Patent: July 8, 2008Assignee: Agfa Graphics NVInventors: Johan Loccufier, Luc Vanmaele, Jaymes Van Luppen, Roland Claes
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Patent number: 7388038Abstract: The present invention has for its object to provide a curable composition which, despite its low viscosity, gives a cured product with a high gel fraction, low residual tack, low modulus, high elongation, and good flexibility. The present invention relates to a curable composition comprising the following two components: (A) a vinyl polymer having at least one crosslinking silyl group on the average per molecule: and (B) a photocurable substance, (C) an air oxidation-curable substance, (D) a high molecular plasticizer, (E) a reactive plasticizer or (F) a compound having one silanol group in its molecule and/or a compound capable of reacting with moisture to give a compound having one silanol group in the molecule.Type: GrantFiled: March 17, 2006Date of Patent: June 17, 2008Assignee: Kaneka CorporationInventors: Masayuki Fujita, Nobuhiro Hasegawa, Yoshiki Nakagawa
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Patent number: 7354628Abstract: The invention relates to a lubricant for medical devices. The inventive lubricant uses silicone epoxy and vinyl ether that both rapidly cure when exposed to ultraviolet light or an intense electron beam. The lubricants formulated with these components in combination with a secondary silicone component and a photoinitator offer improved performance when compared to lubricants formulated from the prior art method of using a RTV+silicone fluid materials. The speed of the UV/EB cure of the new components makes lubricants formed from them more compatible with high speed manufacturing processes by eliminating the delay of prior art lengthy cure steps.Type: GrantFiled: July 24, 2003Date of Patent: April 8, 2008Assignee: Covidien AGInventor: Gregory Alan Steube
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Patent number: 7348366Abstract: An elastomer blend is made by admixing fluoroelastomer and fluorinated silicone polymer (with optional filler and/or conductive particulate) into a polymeric admixture in weight ratios to provide a low vaporous hydrocarbon permeation rate and high thermal strain value in thermally robust elastomer cured from the blend. The blend is of especial use for making gaskets for use in high stress conditions at elevated operating temperatures.Type: GrantFiled: April 7, 2005Date of Patent: March 25, 2008Assignee: Freudenberg-NOK General PartnershipInventors: Francis Joseph Walker, Paul J. Hochgesang
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Patent number: 7332227Abstract: A non-volatile lubricious coating composition is provided for use with medical devices, such as hypodermic needles, catheters, and the like. The coating composition includes a first siloxane polymer having a very low viscosity less than about 50 centistokes, a second siloxane polymer having a high viscosity greater than about 1,000 centistokes, a reactive silicone polymer which is capable of crosslinking upon exposure to radiation, such as a UV curable silicone acrylate, and a photoinitiator to accelerate cross-linking of the reactive silicone polymer. The coating composition may further include an aminofunctional siloxane polymer to promote adhesion to metal surfaces when used with needles. The coating composition provides flowability without the need for any volatile organic solvent, and is capable of curing to provide adhesion and lubricity.Type: GrantFiled: March 4, 2004Date of Patent: February 19, 2008Assignee: Becton, Dickinson and CompanyInventors: Lori Hardman, Mark Spinti, Jie Jane Ren, An-Min Jason Sung, Brian James Pelkey, Shang-Ren Wu, Lawrence Korona
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Publication number: 20070287765Abstract: The invention provides radiation-curing coating materials composed of at least one silicone resin modified with vinylalkoxysilane and vinylcyclohexene oxide and of at least one epoxy-functionalized polysiloxane and of a cationic photoinitiator. Furthermore, coinitiators may also be a constituent of the mixture, in order to obtain increased reactivity of the formulation.Type: ApplicationFiled: May 11, 2007Publication date: December 13, 2007Applicant: Goldschmidt GmbHInventors: Stefan Busch, Hardi Doehler, Michael Ferenz, Sascha Herrwerth
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Patent number: 7297374Abstract: A single- or multi-photon reactive composition comprises a liquid polysilazane precursor, a multifunctional acrylate additive, and a single- or multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.Type: GrantFiled: December 29, 2004Date of Patent: November 20, 2007Assignee: 3M Innovative Properties CompanyInventors: David S. Arney, Feng Bai, Robert J. DeVoe, Catherine A. Leatherdale
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Patent number: 7297461Abstract: A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R2s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)?1 isType: GrantFiled: October 28, 2004Date of Patent: November 20, 2007Assignee: JSR CorporationInventors: Isao Nishimura, Tsutomu Shimokawa, Makoto Sugiura