Processes Of Treating A Solid Polymer Or Sicp Derived From Silicon Containing Reactant; Or Compositions Therefore Patents (Class 522/148)
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Patent number: 7285579Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by U.V. or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, and appearance. The coating compositions may be clear or may contain fillers, dyes, and pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.Type: GrantFiled: March 15, 2005Date of Patent: October 23, 2007Assignee: Polyset Company, Inc.Inventor: Ramkrishna Ghoshal
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Patent number: 7276544Abstract: A process for producing intraocular lenses (IOLs) capable of absorbing blue light and ultraviolet light using photo curing. Intraocular lenses so produced block blue light and ultraviolet light from reaching the retina of an eye implanted with the IOL. By blocking blue light and ultraviolet light from reaching the retina, the IOL thereby prevents potential damage to the retina.Type: GrantFiled: September 8, 2003Date of Patent: October 2, 2007Assignee: Bausch & Lomb IncorporatedInventors: Yu-Chin Lai, Dominic V. Ruscio, George F. Green
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Patent number: 7241853Abstract: A block of intermediate transfer material for use in a printing apparatus having an intermediate transfer member, said intermediate transfer member being equipped with a heater to heat said intermediate transfer member to a temperature of at least about 40° C., said intermediate transfer member having a surface with a first shape, a marking material applicator situated to apply marking material in an imagewise pattern to the intermediate transfer member, and a transferring apparatus to transfer the imagewise pattern of marking material to a final recording substrate, said block of intermediate transfer material comprising a silicone polymer containing monomers of the formula wherein R1, R2, R3, R4, R5, x, y, and z are as defined herein, wherein the monomers can be directly bonded to each other or bonded through spacer groups, said block of intermediate transfer material having a surface with a second shape substantially the complement of the first shape.Type: GrantFiled: May 9, 2006Date of Patent: July 10, 2007Assignee: Xerox CorporationInventors: Clifford R. King, Wolfgang G. Wedler
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Patent number: 7223802Abstract: It is an object of the present invention to provide a high order silane composition that contains a polysilane having a higher molecular weight than conventionally, this being from the viewpoints of wettability when applying onto a substrate, boiling point and safety, and hence in particular enables a high-quality silicon film to be formed easily, and also a method of forming an excellent silicon film using the composition. The present invention attains this object by providing a high order silane composition containing a polysilane obtained through photopolymerization by irradiating a solution of a photopolymerizable silane or a photopolymerizable like-liquid silane with ultraviolet light. Moreover, the present invention provides a method of forming a silicon film comprising the step of applying such a high order silane composition onto a substrate.Type: GrantFiled: April 22, 2003Date of Patent: May 29, 2007Assignees: Seiko Epson Corporation, JSR CorporationInventors: Takashi Aoki, Masahiro Furusawa, Yasuo Matsuki, Haruo Iwasawa, Yasumasa Kateuchi
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Patent number: 7169825Abstract: Self-photoinitiating liquid oligomeric compositions are disclosed. The oligomeric compositions are formed from multifunctional mercaptans and Michael addition polyacrylate resins, synthesized from multifunctional acrylates and ?-dicarbonyl Michael donors, specifically ?-keto esters, ?-diketones, ?-ketoamides or ?-ketoanilides or combinations thereof The oligomeric compositions are provided along with uses thereof and methods of fabricating.Type: GrantFiled: July 29, 2003Date of Patent: January 30, 2007Assignee: Ashland Licensing and Intellectual Property LLCInventors: Sridevi Narayan-Sarathy, Michael Gould
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Patent number: 7157205Abstract: An intermediate layer composition having a silicon-containing polymer(A) having a specific structure and a pattern-forming process using the same.Type: GrantFiled: July 6, 2004Date of Patent: January 2, 2007Assignee: Fuji Photo Film Co., Ltd.Inventor: Yutaka Adegawa
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Patent number: 7109262Abstract: An aqueous effect coating material, comprising (A) at least one water-soluble, -dilutable and/or -dispersible binder, (B) at least one effect pigment, and (C) at least one silicon compound of the general formula I [(E)nL]Si(R1)(R2)(R3)??(I) in which the index and the variables are defined as follows: n is an integer from 1 to 5; E is a reactive functional group; L is an at least divalent, linking, organic group; R1 is a substituted or unsubstituted cycloalkoxy, alkoxy, aryloxy, cycloalkyl, alkyl or aryl radical; and R2 and R3 independently of one another are substituted or unsubstituted cycloalkoxy, alkoxy or aryloxy radicals or hydroxyl groups; preparation process, and its use.Type: GrantFiled: October 21, 2002Date of Patent: September 19, 2006Assignee: BASF Coatings AGInventor: Ekkehard Sapper
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Patent number: 7109251Abstract: The invention concerns a radiation-curable silicone coating based on silicones having a viscosity not more than 1500 mPa's, radiation-curable, comprising: (a) at least a liquid polyorganopolysiloxane polymer Pa with viscosity higher than 500 mPa's and having at least a terminal unit of formula [Z—Si (R1)(R2)—O—] (I), and (b) at least a polyorganopolysiloxane Pb, with viscosity less than 150 mPa's and having at least a unit of formula (I) defined above and/or at least a unit of type D of formula —[—(Si(R1)(Z)—O—]— (ii), Z being a crosslinkable and/or polymerizable group; (c) at least an efficient amount of at least an initiator consisting of onium borate.Type: GrantFiled: May 31, 2002Date of Patent: September 19, 2006Assignee: Rhodia ChimieInventors: Jean-Marc Frances, Véronique Hantin, Gérard Mignani, Michel Sciolla, Lucile Gambut-Garel
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Patent number: 7105585Abstract: A radiation-curable ink jet ink free of unreactive volatile organic compounds and comprising an alkyl (meth)acrylate in which the alkyl group has at least 8 carbon atoms, a poly(alkylene oxide) modified poly(dimethyl siloxane), further radiation curable material, and a pigment can be printed on nonporous substrates, particularly plastic substrates such as vinyl substrates, with good dot gain and appearance.Type: GrantFiled: September 20, 2004Date of Patent: September 12, 2006Assignee: Flint Ink CorporationInventor: Nathaniel R. Schwartz
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Patent number: 7105582Abstract: Compounds of the formula I are suitable photoinitiators which accumulates at the surface of the formulation in which R is for example phenyl and A is a surface-active radical of the formula III Y is a divalent group C3–C12cycloalkylene, C6–C12bicycloalkylene; C1–C6alkylenen-C3–C12cycloalkylene, C1–C6alkylene- C6–C12bicycloalkylene or C1–C10alkylene interrupted by one or more non-consecutive C3–C12cycloalkylene, —U—C3–C12cycloalkylene, C6–C12bicycloalkylene or —U—C6–C12bicycloalkylene; C1–C10alkylene interrupted by one or more non-consecutive O and C3–C12cycloalkylene, —U—C3–C12cycloalkylene, C6–C12bicycloalkylene and/or —U—C6–C12bicycloalkylene; U is U? or U? U? is —(CH2)aCOO—; U? is —Si(CH3)(CH3)— or —(CH2)a—Si(CH3)(CH3)—, a is a number from 1 to 10; b is a number from 0 to 10; with the proviso that they are, however, at least 1 if the methylene group in question is between two oxygen atoms.Type: GrantFiled: January 28, 2003Date of Patent: September 12, 2006Assignee: Ciba Specialty Chemicals Corp.Inventors: Gisèle Baudin, Tunja Jung
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Patent number: 7081494Abstract: The present invention has for its object to provide a curable composition which, despite its low viscosity, gives a cured product with a high gel fraction, low residual tack, low modulus, high elongation, and good flexibility. The present invention relates to a curable composition comprising the following two components: (A) a vinyl polymer having at least one crosslinking silyl group on the average per molecule: and (B) a photocurable substance, (C) an air oxidation-curable substance, (D) a high molecular plasticizer, (E) a reactive plasticizer or (F) a compound having one silanol group in its molecule and/or a compound capable of reacting with moisture to give a compound having one silanol group in the molecule.Type: GrantFiled: August 7, 2003Date of Patent: July 25, 2006Assignee: Kaneka CorporationInventors: Masayuki Fujita, Nobuhiro Hasegawa, Yoshiki Nakagawa
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Patent number: 7041712Abstract: A radiation-curable composition for an ink base, ink composition, outer primary composition, buffering material or matrix material for fiber optics includes, in the uncured state, a secondary amino or tertiary amino silicone-containing additive.Type: GrantFiled: December 23, 2002Date of Patent: May 9, 2006Assignee: DSM IP Assets B.V.Inventors: Edward J. Murphy, Edward P. Zahora, Nancy L. Coster, Glenn Evans
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Patent number: 7037954Abstract: An ocular lens material comprising a copolymer prepared by polymerization with heating of a monomer mixture and/or with irradiating a monomer mixture with ultraviolet ray by means of a molding method, the monomer mixture containing a polysiloxane macromonomer A, a Si-containing alkyl methacrylate B, a hydrophilic monomer C comprising NVP as C-1 and another hydrophilic monomer C-2, another monomer D and a crosslinkable monomer E comprising a crosslinkable monomer E-1 containing at least one group selected from acryloyl group, vinyl group and allyl group, and methacryloyl group, and a crosslinkable monomer E-2 containing at least two methacryloyl groups as main components, wherein (A+B)/C (weight ratio) is 30/70 to 70/30, A/B is 25/75 to 75/25, C-1/C-2 is 50/50 to 100/0, the amount of D is 0 to 20% by weight in the monomer mixture, which has high oxygen permeability, high mechanical strength, excellent surface wettability and low surface frictional property.Type: GrantFiled: August 27, 2003Date of Patent: May 2, 2006Assignee: Menicon Co., Ltd.Inventors: Masaki Baba, Tsuyoshi Watanabe, Kazuhiko Nakada
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Patent number: 6992117Abstract: An epoxy resin composition can be used for forming a film having excellent water-repellency on a substrate surface. The epoxy resin composition contains (a) an epoxy resin having at least two alicyclic epoxy groups, at least one perfluoroalkyl group having 6 to 12 carbon atoms, and at least one alkylsiloxane group and (b) a cationic polymerization catalyst. The alicyclic epoxy groups and the perfluoroalkyl group are present in branched chains of the epoxy resin, and the alkylsiloxane group is present in the main chain of the epoxy resin.Type: GrantFiled: January 13, 2003Date of Patent: January 31, 2006Assignee: Canon Kabushiki KaishaInventors: Akihiko Shimomura, Hiromichi Noguchi, Isao Imamura
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Patent number: 6991887Abstract: A composition containing a polymer, a crosslinker and a photo-activatable catalyst is placed on a substrate. The composition is exposed to a predetermined pattern of light, leaving an unexposed region. The light causes the polymer to become crosslinked by hydrosilylation. A solvent is used to remove the unexposed composition from the substrate, leaving the exposed pattern to become a sorbent polymer film that will absorb a predetermined chemical species when exposed to such chemical species.Type: GrantFiled: November 1, 2000Date of Patent: January 31, 2006Assignee: Battelle Memorial InstituteInventors: Jay W. Grate, David A. Nelson
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Patent number: 6984483Abstract: The invention relates to organically modified, stable in storage, UV curable, NIR permeable silicic acid polycondensates which are photostructurable in layers having a thickness of 1 to 150 ?m. The invention also relates to the production and use thereof as negative resists. The polycondensates according to the invention are obtainable by condensation of organically modified silanediols of the formula I with organically modified silanes of the formula II. Ar2Si(OH)2 ??(I) RSi(OR?)3 ??(II) The radicals are identical or different and have the following meaning: Ar=a radical having 6 to 20 carbon atoms and at least one aromatic group, R=an organic radical having 2 to 15 carbon atoms and at least one epoxy group and/or at least one C?C double bond, R?=methyl or ethyl. Condensation occurs without the addition of water. The molar ratio of said compounds I and II is 1:1.Type: GrantFiled: May 31, 2000Date of Patent: January 10, 2006Assignee: Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Christof Roscher, Ralf Buestrich
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Patent number: 6962948Abstract: Solventless siloxane epoxy-based coating compositions for use on metals, plastics, wood, and glass are disclosed. The compositions are cationically curable in air by heat or by electron beam radiation. The siloxane epoxy coating compositions exhibit excellent film properties after curing, such as good adhesion, flexibility, weatherability, and corrosion resistance even in the absence of a chromium-containing filler. The coating compositions may be clear or may contain fillers and/or pigments. A method for manufacturing a coated metal, plastic, wood, or glass substrate using the compositions is also disclosed, as well as the coated material manufactured by the method.Type: GrantFiled: August 7, 2003Date of Patent: November 8, 2005Assignee: Polyset Company, Inc.Inventor: Ramkrishna Ghoshal
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Patent number: 6946498Abstract: A coating composition comprising (1) an anionic surfactant comprising a sulfonic acid salt, (2) a sol of fine inorganic oxide particles, (3) a silicon compound having one acryl or methacryl group and a hydrolyzable group or a product of hydrolysis of the compound, (4) a compound having at least two photopolymerizable unsaturated groups, and (5) a photopolymerization initiator; and a coated article obtained by applying the coating composition to a base and then photocuring the coating. The coated article combines antifogging properties with abrasion resistance sufficient for practical use.Type: GrantFiled: June 6, 2002Date of Patent: September 20, 2005Assignee: Nippon Arc Co., Ltd.Inventor: Hisayuki Kayanoki
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Patent number: 6943204Abstract: A process for forming a surface modification on a polymer substrate and polymer substrates having such surface modifications. The process comprises the steps of absorbing a swelling monomer into the polymer substrate for a period of time in order to swell the polymer substrate; removing the swollen polymer from the swelling monomer; transferring the swollen polymer to a reaction mixture containing at least one functional monomer; polymerizing the functional monomer in the reaction mixture containing the swollen polymer substrate for a period of time; and removing the polymer from the reaction mixture. Because the surface modification produced by the process is a surface interpenetrating polymer network, the process is not sensitive to the reactive groups located on the surface of the polymer substrate. Further, the surface interpenetrating network bonds to the polymer substrate through caternary connections or other forms of chain entanglement and this is quite stable.Type: GrantFiled: August 26, 2003Date of Patent: September 13, 2005Assignee: Advanced Medical Optics Uppsala ABInventors: Yading Wang, Robert van Boxtel, Stephen Q. Zhou
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Patent number: 6921576Abstract: An active energy ray-curable antistatic coating composition contains (A) inorganic oxide fine particles having a side chain having a molecular weight of at least 300 and having a functional group and (B) an antistatic agent containing at least a quaternary ammonium salt group-containing polymer, a quaternary ammonium salt group-containing silane coupling agent and/or a hydrolysis condensate of the silane coupling agent, and optionally contains (C) a polyfunctional (meth)acrylate having at least 3 (meth)acryloyl groups in a molecule.Type: GrantFiled: October 9, 2002Date of Patent: July 26, 2005Assignee: Mitsubishi Chemical CorporationInventors: Makoto Terauchi, Noritaka Hosokawa, Kazuhide Hayama
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Patent number: 6919385Abstract: An energy-ray curing resin composition comprising a photopolymerizable resin component which can be cured by irradiation with an energy ray, a photopolymerization initiator component which makes it possible to cure the above photopolymerizable resin component by irradiation with an energy ray and a curing agent component used for curing at least one of the above photopolymerizable resin components by a method other than irradiation with an energy ray. To provide a high curability energy-ray curing resin composition which has a very high curing capacity as compared with those of conventional energy-ray curing resins and which is simple and has a high design freedom.Type: GrantFiled: February 4, 2003Date of Patent: July 19, 2005Assignee: Mitsubishi Heavy Industries, Ltd.Inventor: Noriya Hayashi
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Patent number: 6908953Abstract: The present invention is directed to polymerizable dental compositions containing (a) 3 to 80 wt. % of cycloaliphatic epoxides; b) 0 to 80 wt. % of an epoxide or a mixture of epoxides which are different from a); c) 3 to 85 wt. % of a filler material; d) 0.01 to 25 wt. % of initiators, inhibitors and/or accelerators; e) 0 to 25 wt. % of auxiliary agents, the individual percentages of which are in relation to the total weight. The new polymerizable agents are particularly suited as dental material.Type: GrantFiled: March 18, 2003Date of Patent: June 21, 2005Assignee: ESPE Dental AGInventors: Wolfgang Weinmann, Oswald Gasser, Rainer Guggenberger, Gunther Lechner, Wolfgang Soglowek, Joachim Zech
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Patent number: 6908723Abstract: A photo-patternable perfluorinated silane sol-gel material is presented that exhibits a high refractive index and propagation losses below 1 dB/cm at the telecommunication wavelengths. The sol-gels are produced with general formula [(CH2)n,R?—Si(O)2]x—[Si(O)4]y—[R?—Si(O)3]z—[R?(CH2)n—M(O)3]w—[R??(CH2)n—Si(O)3]v where O is oxygen, Si is silicon, M is a metal alkoxyde known to form bonds with organic compounds through oxygen donor ligands, and where , R? and R?? are photo cross-linkable groups, and where (CH2)n are alkyl spacers with n being an integer ?0. The sol-gels can be fabricated to produce complex waveguide structures directly onto silica-on-silicon substrates with low bending losses.Type: GrantFiled: August 15, 2002Date of Patent: June 21, 2005Assignee: NP Photonics, Inc.Inventors: Amir Fardad, Wei Liang, Yadong Zhang
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Patent number: 6899991Abstract: A photo-curable resin composition comprising (A) an organosiloxane-bearing polymer comprising recurring units of formula (1): wherein R1 to R4 are monovalent C1-C8 hydrocarbon, n is an integer of 1-1,000, and X is and having a Mw of 500-200,000, (B) a formalin-modified or formalin-alcohol-modified amino condensate, a phenol compound having on the average at least two methylol or alkoxymethylol radicals, or an epoxy compound having on the average at least two epoxy radicals, (C) a photoacid generator, and (D) a silicon compound of the formula: (R11)mSi(OR12)4?m wherein R11 is monovalent C1-C9 hydrocarbon, R12 is C1-C4 alkyl, m is 0-2, forms cured pattern films having dry etch resistance and improved adhesion to substrates.Type: GrantFiled: October 9, 2002Date of Patent: May 31, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Hideto Kato, Kazumi Noda, Toshihiko Fujii, Kazuhiro Arai, Satoshi Asai
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Patent number: 6897004Abstract: The intermediate layer material composition for a multilayer resist process in the present invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern separation and a line edge roughness in patterning an upper resist, and a pattern formation process using the intermediate layer material composition, in which the intermediate layer material composition for a multilayer resist process, comprises a polymer (component A) containing a repeating unit having on a side chain thereof a specific structure containing a silicon atom-oxygen atom bond, and the pattern formation process using the same.Type: GrantFiled: September 2, 2003Date of Patent: May 24, 2005Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuya Uenishi, Kenichiro Sato
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Patent number: 6887916Abstract: A latent material having various controlled shrinkage tensions and patterns and a method of making the same. The materials include polymer materials that are capable of absorbing microwave energy. Different degrees of shrinkage of the material may be controlled to create different tensions in the material. Additionally, various stereo and three-dimensional patterns may be generated on the material. These materials may be used in the formation of personal care articles. The materials are made by incorporating a polymer material onto the film, wherein the polymer material is capable of turning microwave energy into heat. Upon exposure to microwave radiation, the heat will cause the latent material to shrink. The use of different types and amounts of polymer materials will result in a latent material having different tensions and patterns.Type: GrantFiled: December 28, 2000Date of Patent: May 3, 2005Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Peiguang Zhou, Lance James Garrett, Jr.
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Patent number: 6875795Abstract: The invention provides a silicone composition curable by ultraviolet irradiation to give a cured film on a substrate surface exhibiting surface releasability against sticky surfaces. Advantageously, peeling works of a sticky surface from the cured surface of the inventive composition can be carried out with no or little generation of peeling noises which deteriolate the working environment. The composition comprises three different types of organopolysiloxane compounds of which the first is a so-called MQ siloxane, the second is a linear or cyclic diorganopolysiloxane having epoxy-containing substituents on the silicon atoms other than the chain terminal silicon atoms and the third is a straight or branched linear organopolysiloxane compound substituted by an epoxy-containing substituent on each of the chain terminal silicon atoms in a specified weight proportion of these three. The composition contains an onium salt compound as a photoreaction initiator to promote the ultraviolet-induced curing.Type: GrantFiled: June 16, 2003Date of Patent: April 5, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventor: Shinji Irifune
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Patent number: 6873026Abstract: A composition comprises a first component that provides a predetermined response to radiation, and a second component. Upon curing of the composition, portions of the first component bind together portions of the second component to form an inhomogeneous material having physical properties substantially determined by the second component. The function provided by the first component's response to radiation and the macroscopic properties determined by the second component are largely decoupled and thus may be separately optimized. Some embodiments provide photo-patternable low dielectric constant materials that may be advantageously employed in metal interconnect layers in integrated circuits, for example.Type: GrantFiled: March 4, 2002Date of Patent: March 29, 2005Assignee: Novellus Systems, Inc.Inventors: Paul E. Brunemeier, Archita Sengupta, Justin F. Gaynor, Robert H. Havemann
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Patent number: 6867242Abstract: The invention relates to a method for producing a sealed impregnation and/or release coating of flat joints, in particular of cylinder-head gaskets such as composite seals, metallic joints and multi-layered steel joints. The invention uses a silicone composition including at least a polyorganosiloxane A crosslinkable by a cationic and/or radical process by appropriate crosslinking functional groups, for example, of the alkenyl ether, acrylic, acrylate, epoxide and/or oxethane type; at least an initiator salt B selected among onium borates or an organometallic complex; and at least a reactive diluent C including a nonorganosilicon or organosilicon compound comprising in its structure at least a crosslinking functional group and optionally a secondary functional group different from the crosslinking functional group but capable of chemically reacting with a crosslinking functional group, for example of the hydroxyl, alkoxy and/or carboxyl type.Type: GrantFiled: June 8, 2000Date of Patent: March 15, 2005Assignee: Rhodia ChimieInventors: Jean-Marc Frances, Olivier Loubet
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Patent number: 6846852Abstract: This invention provides for compositions, which can be crosslinked by radiation to give elastomeric coatings, which comprises: (a) high-molecular weight siloxanes with multiple (meth)acrylate functional groups; and (b) reinforcing fillers selected from the group consisting of silicone resins and silicone dioxide fillers, wherein the siloxanes (a) have the general structure: [R3SiO1/2]a[(Z)nG—Ym—R2SiO1/2]a?[R2SiO2/2]b[(Z)nG—Ym—RSiO2/2]b?[RSiO3/2]c[SiO4/2]d.Type: GrantFiled: August 16, 2001Date of Patent: January 25, 2005Assignee: Goldschmidt AGInventors: John Allen, Thomas E. Hohenwarter, Jr., Peter Lersch, Ernest D. Moore, Angela Dawn Paez, Jörg Simpelkamp, Steven Paul Smith
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Patent number: 6846520Abstract: The present invention relates to an epoxy resin composition. The epoxy resin composition contains an epoxy resin and a cationic polymerization catalyst. The epoxy resin has at least two alicyclic epoxy groups, at least one perfluoroalkyl group having 6 to 12 carbon atoms, at least one alkylsiloxane group, and at least one cyclic group.Type: GrantFiled: January 2, 2003Date of Patent: January 25, 2005Assignee: Canon Kabushiki KaishaInventors: Akihiko Shimomura, Hiromichi Noguchi, Isao Imamura
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Patent number: 6844376Abstract: The invention provides a reaction product derived from an epoxy-functional acrylic monomer and an alkylaminoalkylene polyalkoxysilane or from a reaction product derived from acrylic acid and an epoxidized polyalkoxysilane.Type: GrantFiled: July 31, 2003Date of Patent: January 18, 2005Assignee: Henkel CorporationInventors: Anthony Francis Jacobine, Steven Thomas Nakos, Peter Albert Salamon, Hsien-Kun Chu
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Patent number: 6838490Abstract: The present invention relates to a novel fully vulcanized powdery silicone rubber, preparation and use thereof. The fully vulcanized powdery silicone rubber is prepared from an latex of organosilicon polymer or copolymer with lower molecular weight via irradiation of high-energy rays. The gel content of the obtained fully vulcanized powdery silicone rubber is at least 60% by weight. The fully vulcanized powdery silicone rubber can be combined with various plastics and is very easy to be dispersed into plastic matrix, and can be used as toughening agent, processing aids or as additives for cosmetics, ink, paint and coatings.Type: GrantFiled: June 15, 2001Date of Patent: January 4, 2005Assignees: China Petroleum & Chemical Corporation, Beijing Research Institute of Chemical Industry China Petroleum & Chemical CorporationInventors: Xiaohong Zhang, Jinliang Qiao, Genshuan Wei, Jianming Gao, Yiqun Liu, Shijun Zhang, Zhihai Song, Jiuqiang Li, Yicai Zhu
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Publication number: 20040265731Abstract: A photosensitive resin composition of the present invention contains a (A) soluble polyimide and a (b) (meth)acrylic compound, the (A) soluble polyimide being soluble in an organic solvent and being synthesized by using an acid dianhydride component and at least one of a diamine component containing a siloxane structure or an aromatic ring structure, and a diamine component having, in its structure, a hydroxyl group a carboxyl group or a carbonyl group, and the (B) (meth)acrylic compound having at least one carbon-carbon double bond, and preferably contains at least one of a (C) photo reaction initiator and a (D) fire retardant. With this arrangement, the photosensitive resin composition of the present invention is capable of having excellent properties. Especially, the photosensitive resin composition of the present invention is so excellently useful that it can be used for electronic parts and the like.Type: ApplicationFiled: April 23, 2004Publication date: December 30, 2004Inventors: Koji Okada, Kaoru Takagahara, Toshio Yamanaka
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Patent number: 6835420Abstract: The invention relates to a coating material which can be hardened thermally and, optionally, by using actinic radiation. Said coating material contains: A) a binding agent comprising at least two functional groups (a1) which can enter into thermal cross-linking reactions with complementary functional groups (b1) in cross-linking agent (B), and; (B) at least one cross-linking agent comprising at least two functional groups (b1) which can enter into thermal cross-linking reactions with complementary functional groups (a1) in binding agent (A). At least one binding agent (A) contains, in an integrally polymerized manner, at least one olefinically unsaturated polysiloxane macromonomer which contains, in the statistical mean, at least 3.0 double bonds per molecule. The invention also relates to the use of the coating material for producing highly scratch resistant multilayer transparent lacquers.Type: GrantFiled: February 14, 2002Date of Patent: December 28, 2004Assignee: BASF Coatings ACInventors: Ulrike Röckrath, Hubert Baumgart, Andrea Zumbrink, Stefan Silber, Thomas Farwick
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Patent number: 6828355Abstract: This invention relates to resin-reinforced silicone compositions curable upon exposure to radiation in the electromagnetic spectrum, which compositions when cured demonstrate improved elastomeric properties, such as tensile strength, modulus and elongation. The inventive resin-reinforced silicone compositions may alternatively be rendered curable by exposure to moisture. In addition, the inventive composition may be rendered curable by exposure to radiation in the electromagnetic spectrum, and exposure to moisture. The inventive silicone compositions are particularly well suited for use in electronic conformal coating and potting applications, as well as in automotive gasketing applications, pressure sensitive adhesive applications and the like.Type: GrantFiled: January 18, 2002Date of Patent: December 7, 2004Assignee: Henkel CorporationInventor: Hsien-Kun Chu
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Patent number: 6827985Abstract: A photocurable silicone composition which includes an additive which provides cure-through-volume of the overall composition. The additive is desirably a curable amino silyl-terminated polyorganosiloxane.Type: GrantFiled: November 4, 2002Date of Patent: December 7, 2004Assignee: Henkel CorporationInventors: Michael P. Levandoski, Alfred A. DeCato
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Publication number: 20040209972Abstract: A dual-cure silicone compound is provided that is useful as an encapsulating/potting compound. The dual-cure silicone exhibits both UV- and moisture-initiated curing mechanisms, with the UV-initiated curing mechanism providing very rapid curing compared to conventional dual-cure silicones. The dual-cure silicone is an elastomeric material on curing. In a preferred embodiment, the dual-cure silicone is made from a mixture of a first polysiloxane component having terminal mercapto and alkoxy functionality, and a second polysiloxane component having terminal vinyl and alkoxy functionality. Methods of making the first and second polysiloxane components also are disclosed.Type: ApplicationFiled: April 14, 2004Publication date: October 21, 2004Inventors: Brian R. Chambers, Steven L. Hannah, Ronald J. Raleigh
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Patent number: 6806040Abstract: A photosensitive composition for optical waveguides comprising of an organic oligomer, a polymerization initiator and a crosslinking agent, the organic oligomer being a silicone oligomer represented by the following formula (1), wherein X denotes hydrogen, deuterium, halogen, an alkyl group or an alkoxy group; m is an integer from 1 to 5; x and y represent the proportion of respective units, and neither x nor y is 0; and R1 denotes a methyl, ethyl, or isopropyl group; a production method thereof, and a polymer optical waveguide pattern formation method using the same.Type: GrantFiled: October 2, 2002Date of Patent: October 19, 2004Assignee: Nippon Telegraph and Telephone CorporationInventors: Seiji Toyoda, Saburo Imamura, Satoru Tomaru, Takashi Kurihara, Koji Enbutsu, Shoichi Hayashida, Tohru Maruno
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Patent number: 6770352Abstract: Disclosed is a film provided with a hardcoat which has high surface hardness and improved apparent scratch resistance. This film provided with a hardcoat comprises: a transparent substrate film; and, stacked on the transparent substrate film in the following order, a hardcoat and a slip layer. The hardcoat is formed of a cured product of a material comprising an ultraviolet-curable resin and a photopolymerization initiator which initiates the photopolymerization of the ultraviolet-curable resin upon exposure to ultraviolet light in its wavelength region other than the wavelength region absorbable by the transparent substrate film. The slip layer contains a slip agent.Type: GrantFiled: November 19, 2001Date of Patent: August 3, 2004Assignee: Dai Nippon Printing Co., Ltd.Inventors: Hiroko Suzuki, Fumihiro Arakawa
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Patent number: 6750309Abstract: The present invention relates to the preparation of a new class of materials, namely, an acrylate terminated or end-capped urethane/urea copolymer containing silicone soft segments capable of dual cure via unsaturated groups and dialkoxyl silanol groups. This new class of material is a reaction product of a partially methacrylated end-capped urethane polymer containing hard segment blocks and an amino alkylene dialkoxy end-capped siloxane block polymer, containing soft-segments. The aminoalkylene dialkoxysilane end-capped siloxane segment of this copolymer can include siloxane diol segments of various molecular weights (e.g., 1,000 to 20,000) end-capped with various alkylaminoalkylene trimethoxy silanes. This copolymer is therefore capable of dual cure via these functional groups.Type: GrantFiled: May 17, 2002Date of Patent: June 15, 2004Assignee: Henkel CorporationInventors: Hsien-Kun Chu, Steven T. Nakos
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Patent number: 6750290Abstract: The present invention relates to a curing epoxy resin composition permitting water repellent and ink repellent surface treatment. The epoxy resin composition contains (A) an alkylsiloxane-containing epoxy resin, (B) a cationic polymerization catalyst, and (C) a polyfunctional epoxy compound having a molecular weight of 300 or more, and a static viscosity of 1,000 cps or more at 25° C.Type: GrantFiled: April 17, 2002Date of Patent: June 15, 2004Assignee: Canon Kabushiki KaishaInventors: Isao Imamura, Hiromichi Noguchi, Akihiko Shimomura
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Patent number: 6750267Abstract: Disclosed herein are radiation-curable polymers, a method of preparing radiation-curable polymers and compositions containing radiation-curable polymers. Radiation-curable polymers and compositions containing radiation-curable polymers are useful as coatings and adhesives.Type: GrantFiled: December 24, 2001Date of Patent: June 15, 2004Assignees: University of Massachusetts Lowell, Dow Corning CorporationInventors: Rudolf Faust, Savvas Hadjikyriacou, Toshio Suzuki, Maneesh Bahadur
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Publication number: 20040110860Abstract: The invention concerns a radiation-curable silicone coating, comprising (a) at least a liquid polyorganosiloxane having a viscosity of about 10 to 10000 mPa's at 25° C. and bearing a crosslinkable/polymerisable function Fa on at least a M and/or T unit, and/or at least a crosslinkable/polymerisable function on at least a D unit; (b) at least a liquid linear polyorganosiloxane B having a viscosity of about 10 to 10000 mPa's at 25° C. and bearing two crosslinkable/polymerisable functions Fb on at least a M unit; (c) a cationic photoinitiator of onium borate type.Type: ApplicationFiled: May 19, 2003Publication date: June 10, 2004Inventor: Jean-Marc Frances
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Patent number: 6747071Abstract: The invention concerns dental compositions. Said composition comprises (1) a silicon crosslinkable and/or polymerizable by cation process; (2) an efficient amount of at least an initiator such as onium borate; (3) at least a photosensitizer; and (4) a dental filler present in the composition in a proportion of at least 10 wt. % relative to the composition total weight. Said dental compositions are useful for making dental prostheses or for dental restoration.Type: GrantFiled: June 25, 2001Date of Patent: June 8, 2004Assignee: Rhodia ChimieInventor: Jean-Marc Frances
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Patent number: 6737169Abstract: A polymer composition containing a specific silyl group-containing polymer, in which the maximum size of particles contained therein is 2 &mgr;m or less, and the number of particles having a size of 0.2 &mgr;m to 2 &mgr;m is 1,000 particles/ml or less. The composition may further contain a specific compound or at least one component selected from an organosilane represented by (R1)nSi(X)4-n, a hydrolyzate of the organosilane and a condensate of the organosilane. The composition is excellent in storage stability, high in hardness and excellent in mechanical strength such as wear resistance, so that a coating film having good taking-up properties even when no lubricant is contained, extremely smooth and having no difference in film thickness can be formed.Type: GrantFiled: January 30, 2002Date of Patent: May 18, 2004Assignee: JSR CorporationInventors: Mibuko Shimada, Nakaatsu Yoshimura, Yuichi Hashiguchi
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Patent number: 6723814Abstract: Membranes made from amphiphilic copolymers are disclosed. The amphiphilic copolymers can be ABA copolymers, where one of A and B is hydrophilic and the other is hydrophobic. The copolymers may be crosslinked to form more stable structures. Crosslinking can be accomplished using a variety of methods, including end to end polymerization of copolymers having terminal unsaturated groups. Molecules such as membrane proteins can be incorporated into the membrane to allow the transport there through of selected components.Type: GrantFiled: May 16, 2001Date of Patent: April 20, 2004Assignee: BioCure, Inc.Inventors: Wolfgang Meier, Corinne Nardin, Mathias Winterhalter
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Publication number: 20040068028Abstract: Novel aqueous dispersion comprising at least one polymer containing on average (i) at least one primary and/or secondary carbamate group, (ii) at least one functional group having at least one bond which may be activated with actinic radiation, and (iii) at least one dispersive ionic functional group; process for preparing it and its use for preparing coating materials, adhesives and sealing compounds which are curable thermally and with actinic radiation, and also novel coating materials, adhesives and sealing compounds consisting of or comprising the novel aqueous dispersion.Type: ApplicationFiled: February 6, 2003Publication date: April 8, 2004Inventors: Hubert Baumgart, Uwe Meisenburg, Petra Toboll, Karl-Heinz Joost, Reinhold Schwalm
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Publication number: 20040053162Abstract: The intermediate layer material composition for a multilayer resist process in the present invention, which is soluble in an organic solvent, excellent in storage stability, and has no problem with regard to a footing shape, a pattern separation and a line edge roughness in patterning an upper resist, and a pattern formation process using the intermediate layer material composition, in which the intermediate layer material composition for a multilayer resist process, comprises a polymer (component A) containing a repeating unit having on a side chain thereof a specific structure containing a silicon atom-oxygen atom bond, and the pattern formation process using the same.Type: ApplicationFiled: September 2, 2003Publication date: March 18, 2004Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Kazuya Uenishi, Kenichiro Sato
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Patent number: 6706841Abstract: A polyimide silicone resin composition comprising a polyimide silicone resin having recurring units of formula (1), a (meth)acrylic compound, and a polymerization initiator has fluidity at 25° C. despite the substantially absence of a solvent. In formula (1), X is a tetravalent organic group, Y is a divalent organic group, Z is a divalent organic group having an organosiloxane structure, p and q are positive numbers.Type: GrantFiled: May 8, 2002Date of Patent: March 16, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Michihiro Sugo, Akira Yamamoto, Hideto Kato