Processes Of Treating A Solid Polymer Or Sicp Derived From Silicon Containing Reactant; Or Compositions Therefore Patents (Class 522/148)
  • Publication number: 20020012872
    Abstract: A positive-type radiation-sensitive resin composition is provided.
    Type: Application
    Filed: June 12, 2001
    Publication date: January 31, 2002
    Inventors: Eiichi Kobayashi, Jun Numata, Mikio Yamachika, Masafumi Yamamoto
  • Publication number: 20020013382
    Abstract: Metal oxide nanoparticles having at least some surface acid sites functionalized with an adhesion promoter and at least some surface acid sites functionalized with a coupling agent. The nanoparticles are useful in forming composites comprising photopolymerizable matrix monomers, and are primarily suitable for dental and medical restoration. In a preferred embodiment, the metal oxide comprises zirconium, and the coupling agent is a zirconate.
    Type: Application
    Filed: November 29, 2000
    Publication date: January 31, 2002
    Inventors: Benjamin L. Furman, Stephen T. Wellinghoff, Henry R. Rawls, Hong Dixon, Barry K. Norling
  • Patent number: 6339112
    Abstract: The present invention relates to radiation curable compositions comprising at least one metallocene polyolefin. The radiation curable compositions are useful for a variety of applications, particularly as coatings and adhesives. The radiation curable composition may comprise a single metallocene polyolefin, or blend thereof. The ultraviolet curable compositions further comprise at least one photoinitiator and/or at least one photoinduced coupling agent. For pressure sensitive adhesive applications, the radiation curable composition also preferably comprises other ingredients such as a tackifying resins and plasticizers.
    Type: Grant
    Filed: November 13, 1998
    Date of Patent: January 15, 2002
    Assignee: H.B. Fuller Licensing & Financing Inc.
    Inventors: Thomas F. Kauffman, John P. Baetzold, Margarita Acevedo
  • Publication number: 20020002212
    Abstract: The invention relates to polymerizable compositions comprising
    Type: Application
    Filed: January 16, 2001
    Publication date: January 3, 2002
    Applicant: Espe Dental AG
    Inventors: Wolfgang Weinmann, Oswald Gasser, Rainer Guggenberger, Gunther Lechner, Wolfgang Soglowek, Joachim Zech
  • Publication number: 20020001710
    Abstract: A ceramer composition is provided that comprises a plurality of colloidal inorganic oxide particles and a free-radically curable binder precursor. The free-radically curable binder precursor comprises a fluorochemical component that further comprises at least two free-radically curable moieties and at least one fluorinated moiety. By virtue of the inclusion of the fluorochemical component, the ceramer compositions of the present invention can be used to provide ceramer composites and ceramer composite structures with excellent stain, oil and/or water repellency characteristics as well as a high level of abrasion resistance and hardness.
    Type: Application
    Filed: March 29, 2001
    Publication date: January 3, 2002
    Inventors: Soonkun Kang, George G.I. Moore, Thomas W. Rambosek
  • Publication number: 20010049400
    Abstract: A method of making improved optical quality polymers by normalizing the polymerization rates of the components of the monomer mix used is presented. The polymers produced by this process minimize the formation of separate domains and decrease the level of grit in contact lenses made from the polymers. Monomer reaction rates can be normalized by conducting the polymerization at elevated temperature.
    Type: Application
    Filed: October 25, 1999
    Publication date: December 6, 2001
    Inventors: AZAAM ALLI, JOHN B. ENNS, JAMES D. FORD, ROBERT N. LOVE, DAVID C. TURNER
  • Patent number: 6326126
    Abstract: The invention relates to a photocurable, negative-working mixture and a recording material which is obtained therefrom and which is suitable for the production of elastic relief printing plates. The mixture contains a) an elastomeric binder, b) a free-radical-polymerizable compound which is compatible with the binder and which has at least one terminal, ethylenically unsaturated group and a boiling point at normal pressure of over about 100° C. and c) a compound or a combination of compounds which are capable of initiating the polymerization of the compound (b) on exposure to actinic light. The binder is made up of the segments A, B and C, where A is a hydrophobic soft block having a glass transition temperature Tg of below about −30° C. B is a hydrophobic hard block having a glass transition temperature Tg of over about +30° C. and C is a polar block which is made up of vinyl monomers and/or heterocyclic compounds which can be polymerized by anionic ring opening.
    Type: Grant
    Filed: January 11, 1996
    Date of Patent: December 4, 2001
    Assignee: Agfa-Gevaert
    Inventor: Willi-Kurt Gries
  • Patent number: 6316516
    Abstract: The present invention relates to a composition for coating optical fibers which contains an oligomer capable of being polymerized, a monomer suitable to control the viscosity of the composition, and an adhesion promoter which includes a compound containing a cyclic structure interposed between at least two reactive silanes which are independently an alkoxysilane or a halosilane. Another composition of the present invention includes an oligomer capable of being polymerized, a monomer suitable to control the viscosity of the composition, an adhesion promoter which includes a compound containing a reactive silane group, and a carrier. The present invention also relates to optical fibers and methods of making such optical fibers using the compositions of the present invention.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: November 13, 2001
    Assignee: Corning Incorporated
    Inventors: Ching Kee Chien, Edward J. Fewkes, Eric H. Urruti, Michael J. Winningham
  • Patent number: 6296985
    Abstract: A positive photoresist composition comprising (a) an acid-decomposable polysiloxane having a structural unit represented by formula (IV): wherein Z′ is a phenyl ring substituted with an acid-decomposable group and (b) a compound which decomposes upon exposure to generate an acid.
    Type: Grant
    Filed: February 1, 2000
    Date of Patent: October 2, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuyoshi Mizutani, Shoichiro Yasunami
  • Patent number: 6291540
    Abstract: The invention concerns a novel method for preparing non-toxic resins crosslinkable under radiation in the presence of an initiator system. Said resins are prepared from compositions of an organic and/or silicon type comprising monomers, oligomers and/or polymers with organofunctional groups, and are cross-linked in the presence of an initiator system consisting of an onium salt with low toxicity whereof the cationic structure is [(CH(CH3)2—C6H4—)—I—(—R1)]+(I).
    Type: Grant
    Filed: March 10, 2000
    Date of Patent: September 18, 2001
    Assignee: Rhodia Chimie
    Inventors: Christian Priou, Jacques Richard
  • Patent number: 6277502
    Abstract: The invention relates to novel crosslinkable, photoactive silane derivatives of the formula I mixtures of silane derivatives of the formula I and mixtures of silane derivatives of the formula I with uncrosslinkable silane derivatives as usually used for silanizing inorganic, oxide-containing surfaces. The invention furthermore relates to the use of silane derivatives of the formula I and of mixtures which contain at least one silane derivative of the formula I as orientation layers for liquid crystals and for the production of unstructured or structured optical elements and multilayer systems.
    Type: Grant
    Filed: January 30, 1998
    Date of Patent: August 21, 2001
    Assignee: Rolic AG
    Inventors: Richard Buchecker, Guy Marck, Hubert Seiberle
  • Patent number: 6270941
    Abstract: Disclosed is a positive silicone-containing photosensitive composition comprising a water-insoluble and alkali-soluble silicon-containing polymer having a specific siloxane structure, a compound which generates an acid upon irradiation with actinic rays or radiation, and a polymer having a repeating unit of a specific structure and showing the enhanced solubility in an alkaline developing solution by the action of an acid.
    Type: Grant
    Filed: January 28, 2000
    Date of Patent: August 7, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Shoichiro Yasunami
  • Patent number: 6265462
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: January 28, 2000
    Date of Patent: July 24, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6262140
    Abstract: Compositions for producing replicated optical components are disclosed. A composition for making a large scale submaster optical component includes a mixture having an acrylated aliphatic urethane oligomer/monomer blend and a tripropylene glycol diacrylate. The mixture is combined with a number of other components including an isobornyl acrylate, an ultraviolet polymerizing varnish, a surfactant, and a photoinitiator. A composition for making a large scale replica optical component includes a mixture having an acrylated aliphatic urethane oligomer/monomer blend and a tripropylene glycol diacrylate. The mixture is combined with an isobornyl acrylate, a &bgr;-Carboxyethyl acrylate, a photoinitiator, and an N-vinyl-2-pyrrolidone. A composition for making a small scale submaster optical component includes an ultraviolet polymarizing varnish and a surfactant.
    Type: Grant
    Filed: July 13, 1999
    Date of Patent: July 17, 2001
    Assignee: Physical Optics Corporation
    Inventors: Gajendra Savant, Hagop Latchinian
  • Publication number: 20010007880
    Abstract: This invention pertains to a process for the manufacture of a hydrophilic polymeric product, consisting in causing a material comprising a crosslinked silicone polymer matrix and photoinitiator groups dispersed and immobilized within the polymer matrix to swell in a swelling solution comprising a solvent for swelling the crosslinked silicone polymer of the matrix of the material, a photopolymerizable hydrophilic monomer and optionally a crosslinking agent and a proton- or electron-donating coinitiator compound, when the material comprises photoactivable photoinitiator groups and does not comprise proton- or electron-donating coinitiator groups causing the photopolymerizable hydrophilic monomer to diffuse into the swollen material, and polymerizing, by irradiation, the photopolymerizable hydrophilic monomer.
    Type: Application
    Filed: December 28, 2000
    Publication date: July 12, 2001
    Applicant: Essilor International Compagnie Generale D'Optique
    Inventors: Brigitte Marchin, Dominique Baude, Jean-Pierre Vairon, Marine-Anne Dourges, Philippe Chaumont, Joel Steiner
  • Patent number: 6248803
    Abstract: A radiation-curable resin composition comprising (A) an organopolysiloxane having at least one acrylic functional group and (B) a photopolymerization initiator cures, upon exposure to radiation, into a flexible product having a gel fraction of at least 85% by weight.
    Type: Grant
    Filed: June 29, 1999
    Date of Patent: June 19, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tetsuo Nakanishi, Michihiro Sugo
  • Patent number: 6245828
    Abstract: The present invention is directed to polymerizable dental compositions containing a) 3 to 80 wt. % of cycloaliphatic epoxides; b) 0 to 80 wt. % of an epoxide or a mixture of epoxides which are different from a); c) 3 to 85 wt. % of a filer material; d) 0.01 to 25 wt. % of initiators, inhibitors and/or accelerators; e) 0 to 25 wt. % of auxiliary agents, the individual percentages of which are in relation to the total weight. The new polymerizable agents are particularly suited as dental material.
    Type: Grant
    Filed: September 21, 1998
    Date of Patent: June 12, 2001
    Assignee: ESPE Dental AG
    Inventors: Wolfgang Weinmann, Oswald Gasser, Rainer Guggenberger, Gunther Lechner, Wolfgang Soglowek, Joachim Zech
  • Patent number: 6238798
    Abstract: A ceramer composition is provided that comprises a plurality of colloidal inorganic oxide particles and a free-radically curable binder precursor. The free-radically curable binder precursor comprises a fluorochemical component that further comprises at least two free-radically curable moieties and at least one fluorinated moiety. By virtue of the inclusion of the fluorochemical component, the ceramer compositions of the present invention can be used to provide ceramer composites and ceramer composite structures with excellent stain, oil and/or water repellency characteristics as well as a high level of abrasion resistance and hardness.
    Type: Grant
    Filed: February 22, 1999
    Date of Patent: May 29, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Soonkun Kang, George G. I. Moore, Thomas W. Rambosek
  • Patent number: 6232363
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: April 25, 2000
    Date of Patent: May 15, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6232362
    Abstract: Photosensitized silicones having the formula MDnDEmD*pM are provided, wherein M is selected from the group consisting of R3SiO1/2 and R2ESiO1/2; wherein each R is independently selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbons, and E is an epoxide functionalized substituent selected from the group of epoxy either substitutents having the formula C6H11O2 or the group of alkyl cyclohexeneoxide substituents having the formula C8H13O; D has the formula R2SiO2/2, wherein each R is independently selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbons; DE has the formula RESiO2/2 wherein R is selected from the group consisting of monovalent hydrocarbon radicals having from 1 to 30 carbon atoms, and wherein E is an epoxide functionalized substituent selected from the group of epoxy ether substituents having the formula C6H11O2 or the group of alkyl cyclohexeneoxide substituents having the formula C8H13O; D* is defined as the rea
    Type: Grant
    Filed: May 4, 1999
    Date of Patent: May 15, 2001
    Assignee: General Electric Company
    Inventors: Robert F. Agars, Richard P. Eckberg
  • Patent number: 6225247
    Abstract: A precursor composition includes (1) at least one crosslinking compound represented by the formula: wherein: u and x are independently selected positive integers, v and w are independently selected integers greater than or equal to zero, R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof; A and E are independently selected from the group consisting of O, an aliphatic bridge, an aryl bridge and mixtures thereof; and R9 and R10 are unsubstituted or substituted vinyl or ethynyl groups, (2) at least one organosilicon compound containing at least two silicon hydride moieties per molecule, and (3) a hydrosilation catalyst, A cross-linked polymer is formed by reacting the crosslinking compound of formula I with the organosilicon compound via a hydrosilation reaction. A thermoset polymer is formed by thermally curing the crosslinked polymer.
    Type: Grant
    Filed: June 21, 1999
    Date of Patent: May 1, 2001
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Eric J. Houser
  • Patent number: 6218445
    Abstract: The invention concerns a composition cross-linkable under radiation. The composition includes at least one polyorganosiloxane with cross-linkable functional groups, a stabilizing amino agent, and an initiator system for hardening under radiation. The composition is stable for use and storage.
    Type: Grant
    Filed: January 10, 2000
    Date of Patent: April 17, 2001
    Assignee: Rhodia Chimie
    Inventors: Christian Priou, Andre Soldat, Stuart R. Kerr, III, Reeshemah Beaty
  • Patent number: 6211322
    Abstract: The invention relates to organopolysiloxanes comprising (meth)acrylate groups, to a process for their preparation and to their use as radiation-curing coating materials.
    Type: Grant
    Filed: March 1, 1999
    Date of Patent: April 3, 2001
    Assignee: Th. Goldschmidt AG
    Inventors: Hardi Döhler, Thomas Ebbrecht, Stefan Stadmüller
  • Patent number: 6207728
    Abstract: Disclosed is a photo-curable composition comprising the following components (A) to (C): (A) hydrolyzable silane compound represented by the general formula (1) or a hydrolyzate thereof: (R1)pSi(X)4−p (1) wherein R1 is a non-hydrolyzable organic group having 1 to 12 carbon atoms, X is a hydrolyzable group, and p is an integer of 0 to 3; (B) photo acid generator; and (C) dehydrating agent. By such constitution, it is possible to provide a photo-curable composition which has a rapid photo-curable rate, is excellent in characteristics such as storage stability, heat resistance, weather-ability, scratch resistance and the like, and is applicable to base materials having low heat resistance such as plastics, as well as a cured product obtained therefrom.
    Type: Grant
    Filed: June 17, 1999
    Date of Patent: March 27, 2001
    Assignee: JSR Corporation
    Inventors: Manabu Sekiguchi, Naoki Sugiyama, Hozumi Sato
  • Patent number: 6204304
    Abstract: The specification describes optical fiber coating materials and methods for making optical fiber gratings wherein the material of the optical fiber coatings comprises vinyl ether functionalized monomers, together with oligomeric or polymeric thickeners and a cationic photoinitiator. These coating materials are highly transparent to UV radiation used to write optical gratings in the optical fibers but still absorb sufficiently at other wavelengths to be cured effectively using UV radiation.
    Type: Grant
    Filed: September 28, 1998
    Date of Patent: March 20, 2001
    Assignee: Lucent Technologies Inc.
    Inventors: Francis Michael Houlihan, Mark Anthony Paczkowski, Debra Ann Simoff, Ulrike Varlemann, Nanze Patrick Wang
  • Patent number: 6204305
    Abstract: A method of forming a diffusion barrier on an article of a polymer blend of (i) a high surface energy polymer and (ii) a low surface energy polymer. Most commonly the low surface energy polymer is an organosilicon polymer, as a polysilane or a polysiloxane. The surface of the article is exposed to ozone and ultraviolet radiation to form a diffusion barrier.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: March 20, 2001
    Assignee: International Business Machines Corporation
    Inventors: Frank Daniel Egitto, Luis Jesus Matienzo, Bruce Otho Morrison, Jr.
  • Patent number: 6197842
    Abstract: This invention pertains to a process for the manufacture of a hydrophilic polymeric product, consisting in causing a material comprising a crosslinked silicone polymer matrix and photoinitiator groups dispersed and immobilized within the polymer matrix to swell in a swelling solution comprising a solvent for swelling the crosslinked silicone polymer of the matrix of the material, a photopolymerizable hydrophilic monomer and optionally a crosslinking agent and a proton- or electron-donating coinitiator compound, when the material comprises photoactivable photoinitiator groups and does not comprise proton- or electron-donating coinitiator groups causing the photopolymerizable hydrophilic monomer to diffuse into the swollen material, and polymerizing, by irradiation, the photopolymerizable hydrophilic monomer.
    Type: Grant
    Filed: December 18, 1998
    Date of Patent: March 6, 2001
    Assignee: Essilor International Compagnie Generale d'Optique
    Inventors: Brigitte Marchin, Dominique Baude, Jean-Pierre Vairon, Marine-Anne Dourges, Philippe Chaumont, Joël Steiner
  • Patent number: 6194482
    Abstract: UV-hardenable and thermally hardenable epoxy resins for the underfilling process in electrical and electronic components are provided. A new casting resin component has an increased storage stability at room temperature of at least 6 months and improved characteristics for the underfilling process including faster hardening and lower viscosity. Filler material with a maximum grain size of 20 &mgr;m and a siloxane component are provided in addition to the casting resin formulation.
    Type: Grant
    Filed: November 22, 1999
    Date of Patent: February 27, 2001
    Assignee: Siemens Aktiengesellschaft
    Inventors: Barbara Lehner, Recai Sezi
  • Patent number: 6191183
    Abstract: The instant invention pertains to a composition that can form silica thin films, wherein said composition performs well as a substrate planarizing coating when applied to a substrate and can be converted by exposure to high-energy radiation into silica thin film with an excellent electrical insulating performance. The composition for the formation of silica thin films comprises (A) a hydrogen silsesquioxane resin that contains at least 45 weight % hydrogen silsesquioxane resin with a molecular weight no greater than 1,500; and (B) solvent. A silica thin film is produced by evaporating the solvent (B), and then converting at least a portion of the hydrogen silsesquioxane resin (A) to silica by exposing the surface of the said substrate to high-energy radiation. The preferred substrate is a semiconductor substrate having at least one electrically conductive layer.
    Type: Grant
    Filed: October 5, 1999
    Date of Patent: February 20, 2001
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Akihiko Kobayashi, Katsutoshi Mine, Takashi Nakamura, Motoshi Sasaki, Kiyotaka Sawa
  • Patent number: 6187834
    Abstract: This invention relates to a radiation curable silicone coating composition comprising an alkoxylated resin-polymer organosilicone network containing radiation curable functionality and a cationic photoinitiator. The radiation curable silicone compositions of this invention are useful as fast curing low and high release coating compositions which are especially suitable for release of pressure sensitive adhesives.
    Type: Grant
    Filed: September 8, 1999
    Date of Patent: February 13, 2001
    Assignee: Dow Corning Corporation
    Inventors: Leroy Elton Thayer, James Steven Tonge, Gary Allen Vincent
  • Patent number: 6187836
    Abstract: Photopolymerizable compositions that include free radically active and cationically active functional groups, and methods for polymerizing such compositions, in which the onset of cationic polymerization is controllably delayed to extend the time between formation of a moldable gel and formation of a hardened solid.
    Type: Grant
    Filed: June 5, 1998
    Date of Patent: February 13, 2001
    Assignee: 3M Innovative Properties Company
    Inventors: Joel D. Oxman, Matthew C. Trom, Dwight W. Jacobs
  • Patent number: 6177143
    Abstract: Electron beam cured siloxane dielectric films and to a process for their manufacture which are useful in the production of integrated circuits. A siloxane polymer having in one aspect less than 40 Mole percent carbon containing substituents, and in another aspect at least approximately 40 Mole percent carbon containing substituents is cured by a wide beam electron beam exposure.
    Type: Grant
    Filed: January 6, 1999
    Date of Patent: January 23, 2001
    Inventors: Carl Treadwell, Jingjun Yang, Matthew Ross
  • Patent number: 6171698
    Abstract: A radiation curable coating composition for forming a primary polymeric coating on having good adhesion to a glass optical fiber is disclosed. The coating composition is formed by a mixture of a base radiation curable liquid composition capable of forming a polymeric coating; and a hydrolyzed coupling agent mixture comprising N-beta (aminoethyl)-gamma-aminopropylmethyldimethoxysilane, N-beta (aminoethyl)-gamma-aminopropyltrimethoxysilane, isocyanatopropyltriethoxysilane, and gamma-(trimethoxylsilyl)propylacrylate.
    Type: Grant
    Filed: August 19, 1999
    Date of Patent: January 9, 2001
    Assignee: Alcatel
    Inventors: Igor V. Khudyakov, Bob J. Overton, Michael Purvis
  • Patent number: 6136383
    Abstract: Radiation-curable preparations comprise at least one polymer which has ethylenically unsaturated double bonds and are used for the coating of mineral moldings.A process for coating mineral moldings, and also mineral moldings which have a coating cured by radiation, are also described.
    Type: Grant
    Filed: July 28, 1998
    Date of Patent: October 24, 2000
    Assignee: BASF Aktiengesellschaft
    Inventors: Manfred Schwartz, Klaus Menzel, Bertold Bechert, Erich Beck, Wolfgang Reich
  • Patent number: 6121340
    Abstract: The present invention relates to a photodefinable dielectric composition comprising a photoinitiator and a polycyclic addition polymer comprising polycyclic repeating units that contain pendant silyl functionalities containing hydrolyzable substituents. Upon exposure to a radiation source the photoinitiator catalyzes the hydrolysis of the hydrolyzable groups to effect the cure of the polymer and adhesion of the polymer to desired substrates.
    Type: Grant
    Filed: November 4, 1997
    Date of Patent: September 19, 2000
    Assignee: The B. F. Goodrich Company
    Inventors: Robert A. Shick, Saikumar Jayaraman, Edmund Elce, Brian L. Goodall
  • Patent number: 6121342
    Abstract: A photocationically curable composition and a process for producing the same are provided. The composition comprises, as the essential component, a condensation product having an oxetanyl group, which is a condensation product of a hydrolyzate of an organic silane compound having an oxetanyl group and being represented by the formula below, or of a mixture of said organic silane compound and a reactive silicone having a siloxane linkage-forming group: ##STR1## wherein R.sup.0 means an organic functional group having an oxetanyl group, and X means a hydrolyzable group. The composition forms cured coating films of high surface hardness, and is useful as hard coating agents.
    Type: Grant
    Filed: January 7, 1999
    Date of Patent: September 19, 2000
    Assignee: Toagosei Co., Ltd.
    Inventors: Hiroshi Suzuki, Akira Sumi, Takenao Yamamura
  • Patent number: 6114405
    Abstract: A method for preparing a film suitable for use as the light-modulating unit of an SPD light valve, which film comprises a cross-linked polymer matrix having droplets of a liquid light valve suspension distributed in the cross-linked polymer matrix. The light valve suspension comprises particles suspended in a liquid suspending medium. The method comprises admixing a UV cross-linkable liquid oligomer or polymer and the liquid light valve suspension, emulsifying the resulting admixture to form an emulsion of the liquid light valve suspension in the UV cross-linkable liquid oligomer or polymer, and cross-linking the UV cross-linkable liquid oligomer or polymer while the mixture is in the form of a thin layer of the emulsion by exposing the layer to UV radiation or to an electron beam, such that the film is not damaged due to such exposing. The oligomer or polymer and the particles are free of deleterious effects on one another.
    Type: Grant
    Filed: October 9, 1997
    Date of Patent: September 5, 2000
    Assignee: Research Frontiers Incorporated
    Inventors: Huifang Zhuang, Steven M. Slovak, Robert L. Saxe
  • Patent number: 6110593
    Abstract: Optical fiber primary coating systems are disclosed having excellent ribbon stripping and adhesion behavior. The coatings are radiation-curable. The excellent stripping and adhesion behavior can be inner piramry coating composition having a slip enhancing component and a high modulus outer primary coating composition. Combination of means can be employed. Stripping behavior can be measured by crack propagation and fiber friction measurements.
    Type: Grant
    Filed: May 21, 1998
    Date of Patent: August 29, 2000
    Assignee: DSM N.V.
    Inventors: David M. Szum, Chander P. Chawla, James R. Petisce, George Pasternack, Timothy E. Bishop, Paul E. Snowwhite, Edward P. Zahora
  • Patent number: 6096483
    Abstract: The present invention provides a curable composition which comprises (A) a base-generating substance which generates a base when exposed to the action of ultraviolet light, (B) a siloxane polymer which has silicon-hydrogen bonds (Si--H) capable of reacting with hydroxy groups under the effect of the base to form silicon-oxygen bonds (Si--O) and hydrogen molecules (H.sub.2), and (C) an acid substance. This composition is cured by irradiation with ultraviolet light. During this ultraviolet irradiation, a mask is placed between a coating film of the composition and the radiation source, and the uncured portions of the composition are dissolved and removed so that a pattern is formed. The residual portions are then heated to produce a pattern-cured product.
    Type: Grant
    Filed: March 31, 1997
    Date of Patent: August 1, 2000
    Assignee: Dow Corning Asia, Ltd.
    Inventors: Brian R. Harkness, Mamoru Tachikawa, Kasumi Takei
  • Patent number: 6087412
    Abstract: The invention relates to crosslinked polymers, which are polymerisation products of a polymerisable mixture that comprises the following components:a) a macromer of formula C ##STR1## wherein Macro is an m-valent radical of a macromer from which the number m of groups Rx.sub.x --H has been removed,each R.sub.x, independently of the others, is a bond, --O--, --NR.sub.N -- or --S-- wherein R.sub.N is hydrogen or lower alkyl,PI* is a bivalent radical of a photoinitiator,R.sub.aa is the moiety of a photoinitiator that forms the less reactive free radical on cleavage of the photoinitiator, andm is an integer from 1 to 100,b) a copolymerisable vinyl monomer andc) a copolymerisable crosslinker.The polymers are suitable especially for the production of mouldings, such as for contact lenses.
    Type: Grant
    Filed: September 12, 1997
    Date of Patent: July 11, 2000
    Assignee: Novartis AG
    Inventors: Peter Chabrecek, Dieter Lohmann, Kurt Dietliker
  • Patent number: 6069185
    Abstract: This invention relates to radiation curable compositions comprising an alkenyl ether functional polyisobutylene, a cationic photoinitiator, a free radical photoinitiator, and an alkenyl ether compound which is free of isobutylene units. The radiation curable compositions can further comprise an alkylphenol. This invention also relates to hydrocarbon silicone alkenyl ether compounds. The radiation curable compositions exhibit a low cure energy, have a high moisture vapor barrier, high damping characteristics, and a high refractive index, and provide a barrier to corrosive vapors and have maintained or enhanced modulus, tensile strength, and toughness.
    Type: Grant
    Filed: November 25, 1998
    Date of Patent: May 30, 2000
    Assignees: Dow Corning Asia, Ltd., Dow Corning Corporation
    Inventors: Maneesh Bahadur, Toshio Suzuki
  • Patent number: 6063828
    Abstract: A curable underfill encapsulant composition, suitable for use in semiconductor packaging, comprises one or more mono- or polyfunctional maleimide compounds, or one or more mono- or polyfunctional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, with a free radical curing agent, and optionally, one or more fillers.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: May 16, 2000
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Bodan Ma, Quinn K. Tong
  • Patent number: 6060559
    Abstract: The presence in curable polyolefin compositions of a moisture curable organosilicon compound containing at least one alkenyloxy group bonded to the silicon atoms improves the adhesion to a variety of substrates that is developed during the curing reaction of polyolefin compositions cured by a hydrosilation reaction. The organosilicon compound is preferably a reaction product of ingredients comprising 1) a silane or bis-silylalkane containing at least three silicon-bonded moisture-reactive groups per molecule and 2) an organic compound containing at least one carbinol group and at least one ethylenically unsaturated group.
    Type: Grant
    Filed: September 4, 1998
    Date of Patent: May 9, 2000
    Assignee: Dow Corning Corporation
    Inventors: Qian Jane Feng, Robert Edward Kalinowski, Kenneth Michael Lee, Michael Andrew Lutz, Michael James Owen, Susan Victoria Perz, Toshio Suzuki
  • Patent number: 6057381
    Abstract: A method is disclosed for preparing an electronic assembly using a reworkable underfill encapsulant in which the encapsulant is cured in situ from a curable composition comprising one or more mono-functional maleimide compounds, or one or more mono-functional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, a curing initiator and optionally, one or more fillers or adhesion promoters.
    Type: Grant
    Filed: July 2, 1998
    Date of Patent: May 2, 2000
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Bodan Ma, Quinn K. Tong, Chaodong Xiao
  • Patent number: 6048911
    Abstract: Coated optical fibers comprise a glass optical fiber and a radiation-cured coating formed from a radiation-curable liquid coating composition. The liquid coating composition comprises at least one aliphatic urethane acrylate oligomer, at least one acrylated or methacrylated compound selected from the group consisting of isobornyl acrylate, isobornyl methacrylate, alkanediol diacrylate, alkanediol dimethacrylates, alkoxylated derivatives thereof, and mixtures thereof, and a photoinitiator. In one embodiment, the compositions further include a silicone compatibility agent which reduces the coefficient of friction of the radiation-cured coating without disadvantageously effecting other physical properties of the liquid coating compositions or the cured coating, and particularly without disadvantageously effecting the optical clarity of the liquid coating compositions.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: April 11, 2000
    Assignee: Borden Chemical, Inc.
    Inventors: Paul J. Shustack, Daniel A. Wilson
  • Patent number: 6046250
    Abstract: A process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation and compositions suitable for said process. The process is activated by actinic radiation and is conducted in the presence of a platinum complex having one diolefin group that is eta-bonded to the platinum atom and two aryl groups that are sigma-bonded to the platinum atom and a free-radical photoinitiator that is capable of absorbing actinic radiation such that the hydrosilation reaction is initiated upon exposure to actinic radiation. The invention also provides compositions for use in the aforementioned process.
    Type: Grant
    Filed: December 13, 1990
    Date of Patent: April 4, 2000
    Assignee: 3M Innovative Properties Company
    Inventors: Larry D. Boardman, Joel D. Oxman
  • Patent number: 6037043
    Abstract: UV-hardenable and thermally hardenable epoxy resins for the underfilling process in electrical and electronic components are provided. A new casting resin component has an increased storage stability at room temperature of at least 6 months and improved characteristics for the underfilling process including faster hardening and lower viscosity. Filler material with a maximum grain size of 20 .mu.m and a siloxane component are provided in addition to the casting resin formulation.
    Type: Grant
    Filed: September 19, 1997
    Date of Patent: March 14, 2000
    Assignee: Siemens Aktiengesellscaft
    Inventors: Barbara Lehner, Recai Sezi
  • Patent number: 6022050
    Abstract: A release coating composition containing about 50 to about 75 wt. % of an epoxy functional silicone; about 8 to about 25 wt. % of a reactive solvent; about 5 to about 25 wt. % of a reactive diluent; about 6 to about 12 wt. % of a wax-treated silica powder; and, about 2 to about 4 wt. % of a photoinitiator is disclosed. The composition is useful in preparing a low-gloss release coating for use on linerless labels.
    Type: Grant
    Filed: September 2, 1998
    Date of Patent: February 8, 2000
    Assignee: Monarch Marking Systems, Inc.
    Inventor: James R. Kline
  • Patent number: 6020447
    Abstract: A process is provided that involves reductive coupling of polysilane precursors to form polysilane in the presence of ultrasonification. The resulting precursors, upon pyrolysis, lead to improved SiC ceramic product. Ultrasonification can be used to produce oligosilanes from precursors thereof, or polysilanes from monomers, dimers, trimers, or oligomers. Precursors can include Si:C in a ratio of about 1:1, and the invention allows formation of SiC having a Si:C ratio of about 1:1.
    Type: Grant
    Filed: March 28, 1997
    Date of Patent: February 1, 2000
    Assignee: Massachusetts Institute of Technology
    Inventors: Dietmar Seyferth, Toshiya Sugimoto, Pawel Czubarow
  • Patent number: 6015596
    Abstract: A fluorosilicon network polymer prepared by the reaction of a tetraholosilane of the formula 1: SiX4 with an organohologen compound of the formula 2: RZ , an insulating coating prepared therefrom, semiconductor devices coated therewith, and processes for producing the same. In said formulas, R represents at least monofluorinated alkyl or aryl; and X and Z represent each independently boromine, iodine or chlorine.
    Type: Grant
    Filed: October 27, 1997
    Date of Patent: January 18, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Takao Miwa, Akira Watanabe, Osamu Ito, Minoru Matsuda