Solid Polymer Or Sicp Derived From Polycarboxylic Acid Or Derivative And Organic Amine Or From Organic Amine Salt Of A Polycarboxylic Acid Patents (Class 522/164)
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Patent number: 10875250Abstract: A method of analytically determining a laser power for laser sintering includes choosing a batch of powder material for building a plurality of test rods; selecting a range of laser power for building the test rods; determining a plurality of power increments within the selected range to define a plurality of laser power settings; programming a laser sintering machine to build at least one test rod at each laser power setting; constructing the test rods; wherein the optimal power is at least one watt below a lowest laser power setting associated with the formation of voids; identifying the laser power setting used to construct a respective test rod without formation of voids in the surface as an optimal laser power; and configuring the selective laser sintering machine with the optimal laser power when conducting a laser sintering process using the chosen batch of powder material.Type: GrantFiled: January 16, 2018Date of Patent: December 29, 2020Assignee: Hexcel CorporationInventors: Scott DeFelice, Anthony DeCarmine
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Patent number: 8835664Abstract: The present invention relates to a novel fluorinated compound, a composition comprising the same, and a method for manufacturing a film by using the same, and more particularly a novel compound having a structure in which one or more fluorine and acrylate-based functional groups are substituted in a silane core, a composition comprising the compound and photoinitiator, and a method for manufacturing a film by using the same. If the composition comprising the compound according to the present invention is used, it is possible to manufacture a film in which a refractive index is low, reflectivity is reduced, and transmissivity is increased.Type: GrantFiled: February 1, 2011Date of Patent: September 16, 2014Assignees: LG Chem, Ltd., Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Soon-Hwa Jung, Jin-Young Park, Yeong-Rae Chang, Eun-Kyoung Kim
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Publication number: 20140135376Abstract: The present invention relates to a polymer according to Formulas (1) or (2): The present invention further relates to nanogels and nanoparticles made of a polymer according to general Formulas (1) and (2). The nanogels may comprise a biologically active component such as siRNA, miRNA, DNA, an (oligo)peptide or a proteins.Type: ApplicationFiled: May 25, 2012Publication date: May 15, 2014Inventors: Johannes Franciscus Joseph Engbersen, Zinchenko Arkadi Vladimirovich
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Patent number: 8709552Abstract: The resin composition of the present invention is a resin composition characterized by including (a) a polyimide, a polybenzoxazole, a polyimide precursor or a polybenzoxazole precursor, (b) 1,5-dihydroxynaphthalene, 1,6-dihydroxynaphthalene, 1,7-dihydroxynaphthalene, or 2,3-dihydroxynaphthalene, and (c) a thermal cross-linking agent having a specific structure. By the use of the resin composition of the present invention, it is possible to reduce the transmittance in the visible region of a cured film while maintaining the transmittance of a resin film before curing.Type: GrantFiled: January 15, 2010Date of Patent: April 29, 2014Assignee: Toray Industries, Inc.Inventors: Kazuto Miyoshi, Mika Koshino, Masao Tomikawa
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Publication number: 20140011905Abstract: The present invention relates to novel polyamic acid; a photosensitive resin composition satisfying excellent flexibility and low stiffness and exhibiting excellent heat resistance and plating resistance; a dry film obtained from the photosensitive resin composition; and a circuit board including the dry film.Type: ApplicationFiled: March 19, 2012Publication date: January 9, 2014Applicant: LG CHEM, LTD.Inventors: You-Jin Kyung, Hee-Jung Kim, Kwang-Joo Lee, Jung-Hak Kim
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Patent number: 8551687Abstract: The present invention relates to a polyimide photosensitive resin composition that is capable of being developed by an alkali aqueous solution, and a dry film that is produced by the same, and more particularly to a photosensitive resin composition which comprises a) a polyamic acid, b) two or more (meth)acrylate—based compounds that include one or more double bonds between carbons, c) a photopolymerization initiator, d) a phosphorus—based flame retardant, and e) an organic solvent, and a dry film that is produced by the same.Type: GrantFiled: August 20, 2008Date of Patent: October 8, 2013Assignee: LG Chem, Ltd.Inventors: Kwang-Joo Lee, Heon-Sik Song, You-Jin Kyung, Joo-Eun Ko, Jung-Il Yoon, Jung-Jin Shim
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Patent number: 8536242Abstract: The present invention provides a photocurable composition which contains a photobase generator capable of generating a satisfactory amount of a base in a high quantum yield when irradiated even with a small quantity of light for a short time, and contains a curable compound that is rapidly cured by the generated base such that the composition is cured into a cured product. The photocurable composition comprises: a photobase generator (A) which is a salt of a carboxylic acid (a1-1) represented by the following formula (1-1) with a basic compound (a2), and a curable compound (B) which has, in one molecule thereof, at least two functional groups selected from among epoxy group, (meth)acryloyl group, isocyanato group, acid anhydride group, and alkoxysilyl group, where R1 to R7 in the above formula (1-1) each are hydrogen or an organic group, R1 to R7 may be the same or different, and two of R1 to R7 may be bonded to each other to form a ring structure.Type: GrantFiled: July 23, 2008Date of Patent: September 17, 2013Assignees: Sekisui Chemical Co., Ltd., Tokyo University of Science Educational Foundation Administrative OrganizationInventors: Hiroji Fukui, Shunsuke Kondo, Koji Arimitsu
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Patent number: 8461225Abstract: The present invention relates to methods for making oxidation resistant homogenized polymeric materials and medical implants that comprise polymeric materials, for example, ultra-high molecular weight polyethylene (UHMWPE). The invention also provides methods of making antioxidant-doped medical implants, for example, doping of medical devices containing cross-linked UHMWPE with vitamin E by diffusion and annealing the antioxidant doped UHMWPE in a super critical fluid, and materials used therein.Type: GrantFiled: August 18, 2006Date of Patent: June 11, 2013Assignee: The General Hospital CorporationInventors: Orhun K. Muratoglu, Ebru Oral
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Patent number: 8449100Abstract: An inkjet recording method of the invention includes at least: applying, onto a recording medium, an ink composition containing at least a pigment, a copolymer containing at least a fluorine atom, a water-soluble organic solvent, and water, thereby forming an image; drying the image by removing the water-soluble organic solvent and at least a part of the water from the recording medium; and heat-fixing the image onto the recording medium by bringing a surface of the image into contact with a heating member, and may further include other processes.Type: GrantFiled: March 15, 2010Date of Patent: May 28, 2013Assignee: FUJIFILM CorporationInventor: Tomoyuki Ohzeki
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Patent number: 8436132Abstract: Diamine compounds, which in particular are useful as precursors for the production of liquid crystal alignment layers, are represented by the general formula I: wherein A1 represents an organic group of 1 to 40 carbon atoms; A2 represents a hydrogen atom or an organic group of 1 to 40 carbon atoms.Type: GrantFiled: June 13, 2011Date of Patent: May 7, 2013Assignee: Rolic AGInventors: Guy Marck, Olivier Muller
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Patent number: 8362103Abstract: The invention provides a resin composition which develops excellent flame retardance after curing in spite of its being free from halogen-containing compounds and antimony compounds, which are liable to cause environmental load, and which can give a film meeting the recent sever demands for higher flexing resistance and insulation reliability. Specifically, the invention provides a resin composition which comprises (A) a polyimide precursor and (B) an adduct of an organophosphorus compound represented by formula (1) with a compound having four or more (meth)acrylate groups. It is preferable that the resin composition further contain (C) a phosphazene compound.Type: GrantFiled: April 30, 2008Date of Patent: January 29, 2013Assignee: Mitsui Chemicals, Inc.Inventors: Katsuhiko Funaki, Etsuo Ohkawado, Kousuke Hirota, Syuji Tahara
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Patent number: 8354459Abstract: An object of the present invention is to provide a method for producing a block copolymer solid in which microphase-separated structures are formed with good productivity. The present invention provides a method for producing a block copolymer solid in which a microphase-separated structure is formed, or an alloy, blend or composite solid containing a block copolymer in which a microphase-separated structure is formed, which comprises the following steps (1) to (3): (1) immersing a block copolymer solid or an alloy, blend or composite solid containing a block copolymer in a solvent in which each component is insoluble; (2) putting the solid obtained in (1) above in a pressure-resistant container; and (3) irradiating the solid or the solvent in (2) above with microwave.Type: GrantFiled: August 17, 2010Date of Patent: January 15, 2013Assignee: Japan Science and Technology AgencyInventors: Hiroshi Yabu, Takeshi Higuchi
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Patent number: 8349539Abstract: The invention pertains to an isocyanate-modified photosensitive polyimide. The photosensitive polyimide of the invention possesses excellent heat resistance, chemical resistance and flexibility, and can be used in a liquid photo resist composition or dry film photo resist composition, or used in a solder resist, coverlay film, or printed wiring board.Type: GrantFiled: August 3, 2009Date of Patent: January 8, 2013Assignee: Eternal Chemical Co., Ltd.Inventors: Meng-Yen Chou, Chuan-Zong Lee
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Publication number: 20120322911Abstract: The present invention discloses a new type of polyimide membrane with high permeances and high selectivities for gas separations and particularly for CO2/CH4 and H2/CH4 separations. The polyimide membranes have CO2 permeability of 50 Barrers or higher and single-gas selectivity for CO2/CH4 of 15 or higher at 50° C. under 791 kPa for CO2/CH4 separation. The polyimide membranes have UV cross-linkable functional groups and can be used for the preparation of UV cross-linked polyimide membranes having CO2 permeability of 20 Barrers or higher and single-gas selectivity for CO2/CH4 of 35 or higher at 50° C. under 791 kPa for CO2/CH4 separation.Type: ApplicationFiled: October 21, 2011Publication date: December 20, 2012Applicant: UOP LLC.Inventors: Chunqing Liu, Travis C. Bowen, Emily G. Harbert, Raisa Minkov, Syed A. Faheem, Zara Osman
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Patent number: 8329773Abstract: The invention relates to holographic media containing specific photopolymers, a process for the production thereof, and unsaturated glycidyl ether acrylate urethanes as writing monomers which are suitable for the preparation of photopolymers.Type: GrantFiled: February 16, 2010Date of Patent: December 11, 2012Assignee: Bayer MaterialScience AGInventors: Thomas Fäcke, Friedrich-Karl Bruder, Marc-Stephan Weiser, Thomas Rölle, Dennis Hönel
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POLYMER MEMBRANES PREPARED FROM AROMATIC POLYIMIDE MEMBRANES BY THERMAL TREATING AND UV CROSSLINKING
Publication number: 20120276300Abstract: The present invention discloses a new type of high performance polymer membranes prepared from aromatic polyimide membranes by thermal treating and crosslinking and methods for making and using these membranes. The polymer membranes were prepared from aromatic polyimide membranes by thermal treating under inert atmosphere followed by crosslinking preferably by using a UV radiation source. The aromatic polyimide membranes were made from aromatic polyimide polymers comprising both pendent hydroxy functional groups ortho to the heterocyclic imide nitrogen and cross-linkable functional groups in the polymer backbone. The membranes showed significantly improved selectivity and permeability for gas separations compared to the aromatic polyimide membranes without any treatment. The membranes can be fabricated into any convenient geometry and are not only suitable for a variety of liquid, gas, and vapor separations, but also can be used for other applications such as for catalysis and fuel cell applications.Type: ApplicationFiled: July 12, 2012Publication date: November 1, 2012Applicant: UOP LLCInventors: Chunqing Liu, Peter K. Coughlin, Man-Wing Tang, Raisa Minkov, Lubo Zhou -
Publication number: 20120251831Abstract: An object of the present invention is to provide a near infrared absorbent dye capable of providing a near infrared shielding filter with excellent transparency as well as high heat resistance and hygrothermal resistance. The near infrared absorbent dye is characterized in that it is made of the amorphous form of diimmonium salt represented by formula (1).Type: ApplicationFiled: December 16, 2010Publication date: October 4, 2012Applicant: JAPAN CARLIT CO., LTDInventors: Akinori Okayasu, Masaaki Tamura
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Patent number: 8269358Abstract: A bis(aminophenol) derivative having substituents at positions adjacent to two amino groups is provided. The bis(aminophenol) derivative is used as a raw material of a polyamide resin for a positive-tone photosensitive resin composition. A polyamide resin comprising bis(aminophenol) and a structure derived from a carboxylic acid is also provided, the bis(aminophenol) having substituents at positions adjacent to the two amino groups. A positive-tone photosensitive resin composition comprising a polybenzooxazole precursor resin, exhibiting high sensitivity and a high cyclization rate even when cured at a low temperature is provided. Also provided is a positive-tone photosensitive resin composition comprising a polyamide resin having an imide structure, an imide precursor structure, or an amide acid ester structure. The composition exhibits high sensitivity and produces a cured product having low water absorption even when cured at a low temperature.Type: GrantFiled: October 23, 2007Date of Patent: September 18, 2012Assignee: Sumitomo Bakelite Company LimitedInventor: Koji Terakawa
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Patent number: 8133550Abstract: A polybenzoxazole precursor is represented by the following formula (1): wherein R1a to R4a, R1b to R4b, X1, Y1 and m are defined in the specification.Type: GrantFiled: September 14, 2007Date of Patent: March 13, 2012Assignee: FUJIFILM CorporationInventors: Kenichiro Sato, Tsukasa Yamanaka
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Publication number: 20120059081Abstract: The invention relates to resins comprising acrylate groups that are liquid at 25° C., obtained in that polycarboxylic acids (a) comprising at least 2 carboxyl groups and at least 2 C atoms per molecule are converted in a first stage with polyamines (b) comprising at least 2 amino groups and at least 2 C atoms per molecule, such that an intermediate compound (z) results, said compound being terminated by carboxyl groups, and said compound (z) being functionalized in a second stage, such that the free carboxyl groups thereof are provided with one or more (meth)acrylate groups in one or more stages, said resins being suitable as radiation-curing compounds for producing coatings.Type: ApplicationFiled: April 30, 2010Publication date: March 8, 2012Inventors: Stefan Busch, Juergen Baro, Laurence Druene, Jean-Marc Ballin
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Publication number: 20110294913Abstract: A flexible material that comprises one or more types of polymers and may be used for drawing surface-adhesive rules having a pre-defined cross-section profile. Wherein the flexible material has attribute to reserve a shape of a profile of an orifice through which it is deposited from.Type: ApplicationFiled: May 16, 2011Publication date: December 1, 2011Inventors: MICHAEL ZIMMER, Aviv Ratzman, David Idan, Lior Dahan, Kostantin Spiryagin
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Electrode patterning layer comprising polyamic acid or polyimide, and electronic device employing it
Patent number: 8044441Abstract: Provided is an electrode patterning layer used for forming an electrode pattern of any optional shape depending on the difference in wettability with an electrode-forming solution, the electrode patterning layer employing a polyimide type resin which is highly reliable as an electronic material. The electrode patterning layer is prepared by irradiating a layer comprising a polyamic acid having repeating units at the formula (1) or a polyimide obtainable by cyclodehydration of such a polyamic acid, with ultraviolet ray in a pattern shape: wherein A is a tetravalent organic group, B is a bivalent organic group, each of A and B may be of a single type or plural types, and n is a positive integer, provided that at least one type of A is a tetravalent organic group having an alicyclic structure.Type: GrantFiled: June 19, 2006Date of Patent: October 25, 2011Assignee: Nissan Chemical Industries, Ltd.Inventors: Shinichi Maeda, Go Ono -
Publication number: 20110236602Abstract: Diamine compounds, which in particular are useful as precursors for the production of liquid crystal alignment layers, are represented by the general formula I: wherein A1 represents an organic group of 1 to 40 carbon atoms; A2 represents a hydrogen atom or an organic group of 1 to 40 carbon atoms.Type: ApplicationFiled: June 13, 2011Publication date: September 29, 2011Applicant: ROLIC AGInventors: Guy MARCK, Olivier MULLER
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Publication number: 20110236698Abstract: The present invention relates to a pulverulent composition for the manufacture of articles having a metallic appearance that is stable over time and an improved resistance to pencilling, said composition comprising: from 50 to 99.9% by weight of at least one thermoplastic polymer, from 0.1 to 5% by weight of at least one effect pigment, from 0 to 0.3% by weight of at least one metallic pigment relative to the total weight of the composition.Type: ApplicationFiled: July 10, 2009Publication date: September 29, 2011Applicant: Arkema FranceInventors: Gregory Filou, Cyrille Mathieu
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Patent number: 8008365Abstract: The present invention discloses methods for enhancing the wear-resistance of polymers, the resulting polymers, and in vivo implants made from such polymers. One aspect of this invention presents a method whereby a polymer is irradiated, preferably with gamma radiation, then thermally treated, such as by remelting of annealing. The resulting polymeric composition preferably has its most oxidized surface layer removed. Another aspect of the invention presents a general method for optimizing the wear resistance and desirable physical and/or chemical properties of a polymer by crosslinking and thermally treating it. The resulting polymeric compositions is wear-resistant and may be fabricated into an in vivo implant.Type: GrantFiled: December 4, 2006Date of Patent: August 30, 2011Assignee: Orthopaedic HospitalInventors: Fu-Wen Shen, Harry A. McKellop, Ronald Salovey
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Patent number: 8003709Abstract: The present invention discloses methods for enhancing the wear-resistance of polymers, the resulting polymers, and in vivo implants made from such polymers. One aspect of this invention presents a method whereby a polymer is irradiated, preferably with gamma radiation, then thermally treated, such as by remelting of annealing. The resulting polymeric composition preferably has its most oxidized surface layer removed. Another aspect of the invention presents a general method for optimizing the wear resistance and desirable physical and/or chemical properties of a polymer by crosslinking and thermally treating it. The resulting polymeric compositions is wear-resistant and may be fabricated into an in vivo implant.Type: GrantFiled: December 4, 2006Date of Patent: August 23, 2011Assignee: Orthopaedic HospitalInventors: Fu-Wen Shen, Harry A. McKellop, Ronald Salovey
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Patent number: 7977400Abstract: Using a photosensitive resin composition comprising a polyimide (a) having, at the end of the main chain, at least one group selected from the group consisting of a carboxyl group, a phenolic hydroxyl group, a sulfonic acid group and a thiol group, an unsaturated bond-containing polymerizable compound (b1) represented by the general formula (1), and a photopolymerization initiator (c), it is possible to conduct alkaline development and to form a polyimide film having excellent heat resistance, strength and elongation.Type: GrantFiled: March 14, 2006Date of Patent: July 12, 2011Assignee: Toray Industries, Inc.Inventors: Ryuichiro Taniguchi, Hiroko Mitsui, Mitsuhito Suwa
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Patent number: 7964666Abstract: The present invention is a thermoplastic resin composition which is obtained by adding a specific modified vinyl copolymer having a specific intrinsic viscosity to a composition comprising a styrene-based resin and a polyamide resin. The thermoplastic resin composition has excellent flowability and has a far better surface appearance than conventional ones while satisfactorily retaining rigidity, heat resistance, chemical resistance, and impact resistance at room and low temperatures.Type: GrantFiled: July 14, 2005Date of Patent: June 21, 2011Assignee: Toray Industries, Inc.Inventors: Takuya Morishita, Akiyoshi Tamai, Akiko Tanaka, Makiko Saito
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Publication number: 20110109855Abstract: A polyamic acid and a polyimide obtained by reacting a dianhydride and diamines. A substrate having a film of such polyimide or polyamic acid deposited thereon. A liquid crystal display containing a film of such polyimide as an alignment layer. A method for reducing the response times of a liquid crystal display and/or for improving the on-state- and off-state-transmission and/or the voltage holding ratio of a liquid crystal display, the method involving incorporating the polyimide as an alignment layer in the liquid crystal display. A method of producing a liquid crystal display involving depositing a film of the polyimide on a substrate.Type: ApplicationFiled: October 5, 2010Publication date: May 12, 2011Applicant: SONY CORPORATIONInventors: Pinar KILICKIRAN, Zakir HUSSAIN, David DANNER, Akira MASUTANI, Gabriele NELLES, Shunichi SUWA, Yuichi INOUE, Shuichi SHIMA
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Publication number: 20110065825Abstract: A method to reduce or minimize the reduction in molecular weight of a stent during processing is disclosed. The stent has a scaffolding including a polymer formulation comprising PLLA and polymandelide. The polymandelide reduces the molecular weight drop during processing, particularly during sterilization. The stent scaffolding can further include one or more additional stabilizing agents that additionally reduce the molecular weight drop during processing.Type: ApplicationFiled: September 14, 2009Publication date: March 17, 2011Inventors: Byron Lambert, Yunbing Wang, James Oberhauser
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Publication number: 20100304427Abstract: The present invention provides substrates useful for culturing cells under low serum or serum free conditions. The substrates are useful for conducting cell-based assays where there is interference from serum proteins. Methods are also provided for using the substrates of the present invention as well as methods for making the substrates of the present invention.Type: ApplicationFiled: May 26, 2010Publication date: December 2, 2010Inventors: Ronald A. Faris, Terry T. Goodrich, John S. Peanasky, Wanda J. Walczak
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Patent number: 7824844Abstract: The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3, where, R1, R3, and R4, are selected from H and C1-C6 alkyl, and R2, R5, R6, R7, R8, and R9 are selected from C1-C6 alkyl, and n=1-5. The invention also relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least 2 organic solvents, and where the antireflective coating composition has a liquid particle count at 0.2 micron of less than 100/ml after accelerated aging.Type: GrantFiled: January 19, 2007Date of Patent: November 2, 2010Assignee: AZ Electronic Materials USA Corp.Inventors: Zhong Xiang, Hengpeng Wu, Hong Zhuang, Eleazar Gonzalez, Mark O. Neisser
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Publication number: 20100272979Abstract: Diamine compounds, which in particular are useful as precursors for the production of liquid crystal alignment layers, are represented by the general formula I: wherein A1 represents an organic group of 1 to 40 carbon atoms; A2 represents a hydrogen atom or an organic group of 1 to 40 carbon atoms.Type: ApplicationFiled: May 14, 2010Publication date: October 28, 2010Applicant: Rolic AGInventors: Guy Marck, Olivier Muller
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Patent number: 7795325Abstract: An adhesive composition containing: (a) a thermoplastic resin; (b) a radical-polymerizable compound including two or more (meth)acryloyl groups; (c) a curing agent that generates a radical by photoirradiation of 150 to 750 nm and/or heating at 80 to 200° C.; and (d) a liquid rubber having a viscosity of 10 to 1000 Pa·s at 25° C.Type: GrantFiled: June 26, 2009Date of Patent: September 14, 2010Assignee: Hitachi Chemical Co., Ltd.Inventors: Shigeki Katogi, Hoko Suto, Masami Yusa
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Patent number: 7780896Abstract: A radiation crosslinked (50 kGy), pressure-treated UHMWPE material has been developed by applying compressive force on a crosslinked polymer in a direction orthogonal to an axial direction. The deformed material is then cooled while held in a deformed state. The resulting material is anisotropic, with enhanced strength oriented along the axial direction. The directionally engineered material is oxidatively stable even after four weeks of accelerated aging in a pressure vessel containing five atmospheres of oxygen (ASTM F2003). Because of its oxidative stability, the deformation processed material is a suitable candidate for air-permeable packaging and gas sterilization, which has thus far been reserved for remelted highly crosslinked UHMWPEs.Type: GrantFiled: December 4, 2008Date of Patent: August 24, 2010Assignee: Biomet Manufacturing Corp.Inventors: David W. Schroeder, Jordan H. Freedman, James E. Gunter, Brian D. Salyer, H. Gene Hawkins
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Patent number: 7767727Abstract: An autoxidisable architectural coating composition suitable for application to surfaces found in and around buildings at ambient temperatures and in natural daylight wherein surface autoxidation of the composition is promoted by a combination of low concentrations of metal ions (especially manganese or vanadium) and 2,2-dimethoxy-1,2-diphenylethan-1-one as photoinitiator. The composition avoids the need to use more than trace amounts cobalt ions which are rumoured to be carcinogenic yet achieves adequately fast rates of autoxidation. Preferably the use of cobalt is avoided altogether. The use of the low concentrations of the other metal ions reduces discoloration of the compositions often to levels below what is achieved using conventional cobalt promoters. Also a modification in which surface autoxidation is promoted by a combination of 2,2-dimethoxy-1,2-diphenylethan-1-one and trace amounts of cobalt ions in the absence of other surface autoxidation promoting metal ions.Type: GrantFiled: June 11, 2006Date of Patent: August 3, 2010Assignee: Imperial Chemical Industries PLCInventor: Philip Louis Taylor
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Publication number: 20100137124Abstract: In the present invention high performance cross-linked polybenzoxazole and polybenzothiazole polymer membranes and methods for making and using these membranes have been developed. The cross-linked polybenzoxazole and polybenzothiazole polymer membranes are prepared by: 1) first synthesizing polyimide polymers comprising pendent functional groups (e.g., —OH or —SH) ortho to the heterocyclic imide nitrogen and cross-linkable functional groups in the polymer backbone; 2) fabricating polyimide membranes from these polymers; 3) converting the polyimide membranes to polybenzoxazole or polybenzothiazole membranes by heating under inert atmosphere such as nitrogen or vacuum; and 4) finally converting the membranes to high performance cross-linked polybenzoxazole or polybenzothiazole membranes by a crosslinking treatment, preferably UV radiation. The membranes can be fabricated into any convenient geometry.Type: ApplicationFiled: March 27, 2009Publication date: June 3, 2010Inventors: Chunqing Liu, Man-Wing Tang, Raisa Serbayeva, Lubo Zhou
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Patent number: 7728049Abstract: Disclosed is a radiation-crosslinkable thermoplastic polymer composition, a process for the preparation thereof, an angioplasty balloon and a medical catheter made using such a composition. The composition contains a reactive monomer cross-linker facilitates cross-linking of the reaction product upon contact of the cross-linker-containing composition with energy from a radiation source.Type: GrantFiled: June 30, 2003Date of Patent: June 1, 2010Inventor: Alan M. Zamore
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Patent number: 7728048Abstract: the invention provides a composition having laser engraving properties, comprising a host material and a laser enhancing additive. The host material comprises a material, such as a polymer, modified by a first process, whereby the host material as modified by the first process has increased thermal conductivity as compared to the host material before the first process. The laser enhancing additive comprises a first quantity of at least one of copper potassium iodide (CuKI3), Copper Iodide (CuI), potassium iodide (KI), sodium iodide (NaI), and aluminum iodide (AlI), and a second quantity of at least one substance selected from the group consisting of zinc sulfide (ZnS), barium sulfide (BaS), alkyl sulfonate, and thioester.Type: GrantFiled: September 30, 2003Date of Patent: June 1, 2010Assignee: L-1 Secure Credentialing, Inc.Inventor: Brian Labrec
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Patent number: 7687118Abstract: A diamine compound is proposed as well as polymers, copolymers, polyamic acids, polyamic acid esters, or polyimides based on such compound. The compound is represented by one of the general formulae (Ia) and (Ib). It could be shown that such structures, in particular for a specific choice of the residue B, provide, if e.g. used as orientation layers, a photostable, vertically aligning material with an improved VHR.Type: GrantFiled: October 5, 2005Date of Patent: March 30, 2010Assignee: Rolic AGInventors: Zoubair Mohammed Cherkaoui, Thomas Bachels, Guy Marck, Olivier Müller, Andreas Schuster, Hubert Seiberle
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Publication number: 20100062273Abstract: A photosensitive resin composition includes an alkali-soluble resin having a polybenzoxazol precursor structure or a polyimide precursor structure, or both, and a photosensitizer, the alkali-soluble resin having a ratio ([A]/[B]) of a cyclization rate [A] (%) at 250° C. to a cyclization rate [B] (%) at 300° C. of 0.70 or more. According to the present invention, a photosensitive resin composition which is highly sensitive and has high productivity in the manufacture of semiconductor devices, a cured film, a protective film, an insulating film, and a semiconductor device and a display device using the cured film can be provided.Type: ApplicationFiled: February 18, 2008Publication date: March 11, 2010Applicant: SUMITOMO BAKELITE CO., LTDInventors: Hiroaki Makabe, Koji Terakawa
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Patent number: 7659322Abstract: The invention provides a method for preparing a polyanhydride by irradiating one or more diacids with microwave radiation in the presence of a carboxylic anhydride so as to acylate the one or more diacids to yield at least one prepolymer, and irradiating the prepolymer with microwave radiation so as to polymerize said prepolymer to yield the polyanhydride, as a homopolymer or a copolymer. High purity polyanhydrides can be prepared by this method. Reaction times compared to conventional melt polycondensations can be significantly reduced. Copolymer polyanhydrides can also be prepared by the microware radiation techniques described herein.Type: GrantFiled: December 16, 2005Date of Patent: February 9, 2010Assignee: Iowa State University Research Foundation, Inc.Inventors: Brandon M. Vogel, Surya K Mallapragada
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Patent number: 7649027Abstract: A process for producing a polymer, characterized in that a polymer having juts is produced by carrying out photopolymerization of at least one photopolymerizable polymerization precursor containing a photocurable compound having two or more unsaturated bonds by irradiation with active energy ray, optionally in the presence of at least one additive component for adding a polymer function, in a supercritical fluid or subcritical fluid; and a polymer having juts of 10 nm or more height, which height is 0.1-fold or more of the diameter of the juts, produced by the above process.Type: GrantFiled: December 24, 2004Date of Patent: January 19, 2010Assignee: Kansai Paint Co., Ltd.Inventor: Genji Imai
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Publication number: 20090312454Abstract: A three-dimensional object is manufactured from a powder of polymer material by selective sintering process by means of electromagnetic radiation of the powder, wherein the powder comprises a preselected polymer or copolymer and is subjected to selective sintering such that the manufactured three-dimensional object has a final crystallinity which is in such a range that the balance of properties, in particular mechanical properties including Young's modulus, tensile strength and elongation at break, is improved.Type: ApplicationFiled: May 18, 2009Publication date: December 17, 2009Applicant: EOS GmbH Electro Optical SystemsInventors: Martin Leuterer, Andreas Pfister, Frank Mueller, Alan Wood, Brian Wilson, Horst Sandner
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Patent number: 7576141Abstract: An adhesive composition containing: (a) a thermoplastic resin; (b) a radical-polymerizable compound including two or more (meth)acryloyl groups; (c) a curing agent that generates a radical by photoirradiation of 150 to 750 nm and/or heating at 80 to 200° C.; and (d) a liquid rubber having a viscosity of 10 to 1000 Pa·s at 25° C.Type: GrantFiled: May 27, 2005Date of Patent: August 18, 2009Assignee: Hitachi Chemical Co., Ltd.Inventors: Shigeki Katogi, Hoko Suto, Masami Yusa
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Publication number: 20090099278Abstract: Radiation-curable acrylated polyaminoamides obtainable by Michael addition of polyaminoamides containing terminal amine groups (A) and polyolester acrylates (B), the molar ratio of the acrylate groups in the polyolester acrylates (B) to the aminohydrogen groups in the polyaminoamides (A) being at least 1:1, characterized in that the polyaminoamides have an amine value above 115, are suitable as radiation-curable compounds for the production of coatings.Type: ApplicationFiled: October 15, 2008Publication date: April 16, 2009Applicant: Cognis IP Management GmbHInventors: Antoine Carroy, Jean-Marc Ballin, Laurence Druene, Morgan Garinet, Douglas Rhubright, Stefan Busch
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Patent number: 7514478Abstract: Powder coating binders having a glass temperature of ?35° C. containing at least one polymer and one or more radiation-curing reactive thinners, a process for the production of these powder coating binders and their use as a component of powder coatings.Type: GrantFiled: November 22, 2004Date of Patent: April 7, 2009Assignee: Bayer MaterialScience AGInventors: Thomas Fäcke, Jan Weikard, Peter Thometzek
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Patent number: 7491752Abstract: Photoreactive dendrimers comprising a core portion, branching units and terminal groups, wherein at least one terminal group and/or branching unit is a photoreactive group and wherein the photo reactive groups include preferably cinnamates, coumarins, benzylidenephthalimidines, benzylideneacetophenones, diphenylacetylenes stilbazoles, uracyl, quinolinone, maleinimides, or cinnamylidene acetic acid derivatives and are able to undergo photocyclization, in particular [2+2]-photocyclization.Type: GrantFiled: July 15, 2002Date of Patent: February 17, 2009Assignee: Rolic AGInventors: Guy Marck, Hubert Seiberle, Mohammed Ibn-Elhaj
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Patent number: 7345097Abstract: An autoxidisable architectural coating composition suitable for application to surfaces found in and around buildings at ambient temperatures and in natural daylight by unsophisticated users having no respiratory protection wherein surface autoxidation of the composition is promoted by a combination of low concentrations of metal ions (especially manganese or vanadium) and at least one photoinitiator. The composition avoids the need to use more than trace amounts cobalt ions which are rumoured to be carcinogenic yet achieves adequately fast rates of autoxidation. Preferably the use of cobalt is avoided altogether. The use of the low concentrations of the other metal ions reduces discolouration of the compositions often to levels below what is achieved using conventional cobalt promoters. It also improves gloss. Also a modification in which surface autoxidation is promoted by a combination of a photoinitiator and trace amounts of cobalt ions in the absence of other surface autoxidation promoting metal ions.Type: GrantFiled: September 10, 2004Date of Patent: March 18, 2008Assignee: Imperial Chemical Industries PLCInventor: Philip Louis Taylor
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Patent number: 7309724Abstract: In accordance with the present invention, there are provided novel thermosetting resin compositions which do not require solvent to provide a system having suitable viscosity for convenient handling. Invention compositions have the benefit of undergoing rapid cure. The resulting thermosets are stable to elevated temperatures, are highly flexible, have low moisture uptake and are consequently useful in a variety of applications, e.g., in adhesive applications since they display good adhesion to both the substrate and the device attached thereto.Type: GrantFiled: June 10, 2004Date of Patent: December 18, 2007Assignee: Henkel CorporationInventors: Stephen M. Dershem, Dennis B. Patterson, Jose A. Osuna, Jr.