Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.

Abstract: The present invention relates to a treating agent for liquid crystal alignment, which is an agent for liquid crystal alignment to be used for a method in which polarized ultraviolet rays or electron rays are irradiated on a polymer thin film formed on a substrate in a predetermined direction relative to the substrate plane, and said substrate is used for aligning liquid crystal without rubbing treatment, wherein said agent for liquid crystal alignment contains a polymer compound having photochemically reactive groups in the polymer main chain and a glass transition temperature of at least 200° C.

Abstract: A method of treating reaction injection molded polyurethane, polyurethane/urea and polyurea polymers comprising exposing a reaction injection molded polyurethane, polyurethane/urea or polyurea polymer to an amount of infrared energy sufficient to increase the temperature of the polymer to at least 180° C., and then maintaining the temperature of the polymer at or above that temperature, for a time sufficient to increase the Gardner impact property, as measured using ASTMD-3029, when compared to the same polymer which has been heated to the same temperature and maintained thereat for the same time in a convection oven. The invention produces marked improvements in impact, heat sag and heat distortion temperature properties, and thus is particularly suited to rapid preparation of parts using a mass production conveyor and is particularly well-suited to preparation of parts which are to be subjected to later high temperature processes, such as the “E-coat” process.

Abstract: The present invention discloses methods for enhancing the wear-resistance of polymers, the resulting polymers, and in vivo implants made from such polymers. One aspect of this invention presents a method whereby a polymer is irradiated, preferably with gamma radiation, then thermally treated, such as by remelting of annealing. The resulting polymeric composition preferably has its most oxidized surface layer removed. Another aspect of the invention presents a general method for optimizing the wear resistance and desirable physical and/or chemical properties of a polymer by crosslinking and thermally treating it. The resulting polymeric compositions is wear-resistant and may be fabricated into an in vivo implant.

Abstract: The present invention relates to a cinnamatic photo-polymerization type homopolymeric or copolymeric alignment material, in which polymaleimide is singly used as the main chain, or is combined with styrene, hydroxystyrene or acrylonitrile to form a copolymer so as to be used as the main chain, or polyimide is used as the main chain.

Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) in which Ar is a phenylene ring having p- and/or m-bonds, Ar′ is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit, X, N and M, independently of one another are 0 or 1, Y is 0, 1, 2 or 3, P is 1, 2, 3 or 4, is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.

Abstract: Disclosed is a composition which comprises (a) a polymer containing at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, wherein said photosensitivity-imparting substituents are hydroxyalkyl groups; (b) at least one member selected from the group consisting of photoinitiators and sensitizers; and (c) an optional solvent. Also disclosed are processes for preparing the above polymers and methods of preparing thermal ink jet printheads containing the above polymers.

Abstract: A novel process for producing mouldings, especially contact lenses, is described, comprising the following steps: a) introducing into a mould a prepolymer containing photo crosslinkable groups that is liquid at room temperature or is readily meltable and is substantially free of solvents; b) initiating the photo cross-linking for a period of <20 minutes; c) opening the mould, so that the moulding can be removed for the mould. In accordance with the process according to the invention, it is possible especially to produce contact lenses having valuable properties.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula wherein x is an integer of 0 or 1, A is one of several specified groups, such as B is one of several specified groups, such as or mixtures thereof, and n is an integer representing the number of repeating monomer units, with a halomethyl alkyl ether, an acetyl halide, and methanol in the presence of a halogen-containing Lewis acid catalyst, thereby forming a halomethylated polymer.

Abstract: A composition which comprises a mixture of (A) a first component comprising a polymer, at least some of the monomer repeat units of which have at least one photosensitivity-imparting group thereon, said polymer having a first degree of photosensitivity-imparting group substitution and being of the formulae specified in the claims, and (B) a second component which comprises either (1) a polymer having a second degree of photosensitivity-imparting group substitution lower than the first degree of photosensitivity-imparting group substitution, wherein said second degree of photosensitivity-imparting group substitution may be zero, wherein the mixture of the first component and the second component has a third degree of photosensitivity-imparting group substitution which is lower than the first degree of photosensitivity-imparting group substitution and higher than the second degree of photosensitivity-imparting group substitution, or (2) a reactive diluent having at least one photosensitivity-imparting group per

Abstract: Disclosed is a composition comprising a polymer with a weight average molecular weight of from about 1,000 to about 100,000, said polymer containing at least some monomer repeat units with a first, photosensitivity-imparting substituent which enables crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer also containing a second, thermal sensitivity-imparting substituent which enables further crosslinking or chain extension of the polymer upon exposure to temperatures of about 140.degree. C.

Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups, as specified in the claims, and B is one of several groups, as specified in the claims or mixtures thereof, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.

Abstract: A method is provided for making crosslinked acidic polymers useful as ion conductive membranes, such as crosslinked sulfonated polyether ketones, sulfonated polysulfones, sulfonated polystyrenes, and other acidic polymers, by crosslinking with a species which generates an acidic functionality. The crosslinker preferably binds to acid functions by conversion of acid groups to imide functionality, which, due to the acidity of the N-H bonds therein, compensate for the acidity lost by the occupation of the acid groups and thus preserve membrane conductivity while contributing to membrane strength and resistance to swelling.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##

Abstract: A polymeric film includes at least one irradiated water soluble layer. A process for making a water soluble film includes the steps of extruding a water soluble film; and irradiating the water soluble film. Using electron beam irradiation, a water soluble film's solubility rate can be increased.

Abstract: A treating method for liquid crystal alignment, which comprises applying polarized ultraviolet or electron rays to a polymer thin film formed on a substrate, in a predetermined direction relative to the substrate surface, and using the substrate to align liquid crystal without rubbing treatment, wherein the polymer thin film is a polyimide resin containing a repeating unit of the formula (I): ##STR1## (wherein R.sup.1 is a tetravalent organic group having an alicyclic structure, and R.sup.2 is a bivalent organic group), which is obtained by dehydration ring-closure of a polyimide precursor having a reduced viscosity of from 0.05 to 3.0 dl/g (in N-methyl-2-pyrrolidone at temperature of 300.degree. C. at a concentration of 0.

Abstract: Disclosed is an improved composition comprising a photopatternable polymer containing at least some monomer repeat units with photosensitivity-imparting substituents, said photopatternable polymer being of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. Also disclosed is a process for preparing a thermal ink jet printhead with the aforementioned polymer and a thermal ink jet printhead containing therein a layer of a crosslinked or chain extended polymer of the above formula.

Abstract: A negatively operating photoresist composition comprising: (a) a polyimide precursor containing repeating structural units of formula (1) ##STR1## the composition comprises in all as many structural units of formula (I), which have residues R.sub.2, that the composition can be developed by means of aqueous-alkaline developers for photoresists, which are free of organic solvents.

Abstract: Disclosed is a composition which comprises a polymer containing at least some monomer repeat units with water-solubility- or water-dispersability-imparting substituents and at least some monomer repeat units with photosensitivity-imparting substituents which enable crosslinking or chain extension of the polymer upon exposure to actinic radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3## or mixtures thereof, and n is an integer representing the number of repeating monomer units. In one embodiment, a single functional group imparts both photosensitivity and water solubility or dispersability to the polymer. In another embodiment, a first functional group imparts photosensitivity to the polymer and a second functional group imparts water solubility or dispersability to the polymer.

Abstract: A process for modifying the surfaces of a polymer, ceramic, ITO or glass by irradiating energized ion particles onto the surfaces of the polymer, ceramic, ITO or glass, while blowing a reactive gas directly over the surface of the polymer, ceramic, ITO or glass under a vacuum condition, to decrease the wetting angle of the surface. The process can be widely used in the fields of polymers because it provides effects of increasing the spreading of aqueous dyestuffs, increasing adhesive strength with other materials and inhibition of light scattering by decreasing the wetting angle of the material surface.

Abstract: A dental cement system containing a photocurable ionomer, reactive powder and water undergoes both a conventional setting reaction and a photocuring reaction.The cement system can provide a long working time and can be cured on demand by exposure to an appropriate source of radiant energy. The surface of the cement cured in this manner is then hard enough to allow subsequent clinical procedures to be performed, while the ongoing chemical-cure "setting" reaction hardens the remainder of the cement.

Abstract: A method for irradiating and modifying high molecular weight organic polymers with high energy radiation so that the radiation impinges only in a distinct pattern which is less than the width of the polymer so as to cause controlled chain scission and continuity in molecular weight distribution. The method improves the flow rate and millability of the polymers.

Abstract: A method for the anionic photoinitiation of polymerization or crosslinking of a substrate by irradiating a mixture of a substrate and a photoinitiator, where the photoinitiator is an inorganic transition metal complex which releases on irradiation a polymerization initiating substance consisting essentially of an anionically charged nucleophile that initiates the polymerization or crosslinking reaction, under conditions that allow the anion to initiate polymerization. FIG. 3 is plot of percentage polymerization of ethyl .alpha.-cyanoacrylate containing different concentration of Reineckate's anion.

Abstract: New photosensitive polyamic acid precursors are disclosed which have the formula: ##STR1## where Z is a tetravalent organic radical which contains at least one aromatic ring, Z' is a divalent organic radical which contains at least one aromatic ring, and R* is a photo polymerizable group. Particularly preferred compounds include BPDA-PDA and BPDA-ODA polyamic acid precursors. The precursor compositions within the practice of this invention are i-line, g-line, and i-/g-line active and show good photoresolution. The films formed exhibit excellent self-adhesion and adhesion to glass ceramic and silicon wafer substrates have low internal stress, a very low degree of solvent swelling, high thermal stability, and excellent mechanical properties such as high modulus/tensile strength and high elongation at break.

Abstract: Disclosed is a process which comprises the steps of (a) providing a polymer containing at least some monomer repeat units with halomethyl group substituents which enable crosslinking or chain extension of the polymer upon exposure to a radiation source which is electron beam radiation, x-ray radiation, or deep ultraviolet radiation, said polymer being of the formula ##STR1## wherein x is an integer of 0 or 1, A is one of several groups as specified in the claims, B is one of several groups as specified in the claims, and n is an integer representing the number of repeating monomer units, and (b) causing the polymer to become crosslinked or chain extended through the photosensitivity-imparting groups. Also disclosed is a process for preparing a thermal ink jet printhead by the aforementioned curing process.

Abstract: This invention provides an improved method and apparatus for non-contact quantum mechanical heating of thermoplastic fibers by resonant energy absorption of laser energy by the fiber. In one embodied form, the unique method for continuous heating of thermoplastic fibers comprises the steps of: a) preparing a thermoplastic synthetic fiber for heat treatment; b) illuminating the fiber with a beam of radiation from a carbon monoxide continuous wave laser beam of resonant frequency for the prescribed fiber being treated; c) traversing the fiber to be treated across the path of the laser beam in a direction perpendicular to the beam of radiation from the laser source; d) adjusting the rate of traversement of the fiber to maintain the temperature of the thermoplastic fiber within a temperature range of about five percent below the melting point of the thermoplastic fiber to continuously heat the fiber by resonant energy absorption of the laser beam.

Abstract: By using a polyamic acid ester comprising the following structural units (1a), (1b) and (1c) as a photosensitive resin and a sulfonamide compound or a specific glycol ether acetate as a stabilizer, a photo-sensitive resin composition excellent especially in viscosity stability can be obtained, and by using the above photosensitive resin and a specific developer, a relief pattern of high resolution can be formed.

Abstract: In order to produce a polymer electrolyte membrane from sulfonated, aromatic polyether ketone, an aromatic polyether ketone of the formula (I) ##STR1## in which Ar is a phenylene ring having p- and/or m-bonds,Ar' is a phenylene, naphthylene, biphenylene, anthrylene or another divalent aromatic unit,X, N and M, independently of one another are 0 or 1,Y is 0, 1, 2 or 3,P is 1, 2, 3 or 4,is sulfonated and the sulfonic acid is isolated. At least 5% of the sulfonic groups in the sulfonic acid are converted into sulfonyl chloride groups, and these are reacted with an amine containing at least one crosslinkable substituent or a further functional group, and unreacted sulfonyl chloride groups are subsequently hydrolyzed. The resultant aromatic sulfonamide is isolated and dissolved in an organic solvent, the solution is converted into a film, and the crosslinkable substituents in the film are then crosslinked.In specific cases, the crosslinkable substituents can be omitted.

Abstract: Thermoplastic molding materials containA) from 5 to 94% by weight of a partly aromatic, semicrystalline copolyamide composed essentially ofa.sub.1) from 30 to 44 mol % of units which are derived from terephthalic acid,a.sub.2) from 6 to 20 mol % of units which are derived from isophthalic acid,a.sub.3) from 43 to 49.5 mol % of units which are derived from hexamethylenediamine, anda.sub.4) from 0.5 to 7 mol % of units which are derived from aliphatic cyclic diamines of 6 to 30 carbon atoms,the molar percentages of components a.sub.1) to a.sub.4) together giving 100% andB) from 5 to 94% by weight of an ASA or ABS or SAN polymer or of a C.sub.1 -C.sub.18 -alkyl ester of (meth)acrylic acid or of a mixture thereof,C) from 1 to 30% by weight of an adhesion promoter which contains from 0.

Abstract: The composition comprises (A) a specified polyimide precursor and (B) at least one member selected from the group consisting of a sensitizer, a photopolymerization initiator and a combination thereof. The above process comprises applying a solution of the above photosensitive resin composition on a substrate, followed by drying to form a film; exposing the film to light, followed by developing with an aqueous alkaline solution to form a patterned film; and curing the patterned film. The composition has little ionic impurities mixed therein during the preparation of the composition; is excellent in storage stability in the state of a solution; can be developed with an aqueous alkaline solution, which does not cause the problems such as a problem to health and a problem to the treatment of waste liquids, within a short time; and exhibits a good sensitivity even when formed a thick film, thereby readily providing a patterned resinous film.

Abstract: The epoxidation of alkyds containing anhydrides or diacids with cycloaliphatic unsaturation results in epoxy resins which cure rapidly in UV light to produce uniform films without the use of flow modifiers. The fatty acid portion of the alkyd functions as an internal plasticizer. Crosslinking occurs through oxirane rings in both the anhydride and fatty acid moieties of the alkyd to produce hard, but not brittle films. Excellent water resistance is obtained without thermal post curing.

Abstract: A polyimide obtained by reacting an acid dianhydride such as catechol bistrimellitate dianhydride, bisphenol A bistrimellitate dianhydride, etc. with a diamine such as 4,4'-diamino-3,3',5,5'-tetraisopropyl-diphenylmethane, etc. has high solubility in organic solvents and good moldability at low temperatures, and can provide a thermosetting resin composition together with a polymaleimide.

Abstract: A method of forming heat-resistant raised print on a substrate using a thermographic radiation-curable powder by a thermographic process that includes radiation curing. The powders include free radical photoinitiated compositions of acrylated polymers and acrylate-modified aminoamides, and cationic photoinitiated compositions of resins using sulfonium salts.

Abstract: The invention relates to a method for synthesis of poly(L-leucine). Without any initiator and solvent poly(L-leucine) has been made from L-leucine-N-carboxy anhydride as starting material in the solid state by irradiation with gamma ray. There is only one step in the entire synthetic processing, and the polymerization yield is 100% and the process is a very simple, safe and convenient method. The poly(L-leucine) is one of the best materials for temporary wound dressing.

Abstract: Photo-crosslinkable materials comprising a linear polyamide and a 2-substituted anthraquinone as photo-crosslinking agent, the 2-substituted anthraquinone preferably being 2-acrylamidooanthraquinone, 2-acryloxyanthraquinone or 2-benzoylaminoanthraquinone.

Abstract: An optical glass fiber coated with a protective layer of photocurable polyimide coating which can be prepared from the polymeric condensation product of 6FDA, DMDE, and a photosensitizing moiety. More particularly, the present invention relates to a photocurable polyimide coated glass fiber useful for optic applications.

Abstract: An alternating copolymer comprising a repeating unit of the formula:-Z-(X-Y).sub.n - (I)wherein n is at least 2, X is O, S, Se or Te, and Y and Z are independently an aromatic or substituted aromatic group, and at least one other repeating unit, which is useful as a photosensitive material used in a spatial light modulator.

Abstract: A photosensitive resin composition containing 0.5 to 15 parts by weight of a compound generating an acid by light irradiation in 100 parts by weight of a polyamic acid amide having an alkoxysilane having a specified structure at its terminals are provided,which composition has superior resolution properties, a small shrinkage of volume, a superior adhesion onto a substrate, and can prepare a polyimide by baking.

Abstract: The present invention provides a silicon-containing polyamic acid derivative which is represented by the formula (VI) ##STR1## and which has a logarithmic viscosity number of 0.1 to 5.0 dl/g at 30.degree. C. in N-methyl-2-pyrrolidone, said silicon-containing polyamic acid derivative being obtained by reacting A mol of a tetracarboxylic acid derivative, B mol of a diamine, and C mol of an aminosilicon compound so as to meet the relations of the equations (IV) and (V): ##EQU1## A photosensitive resin composition using this silicon-containing polyamic acid derivative can be easily manufactured, permits the formation of a negative type sharp relief pattern, can inhibit film reduction at the time of curing by baking, and is excellent in adhesive properties to substrates, heat stability and shelf stability.

Abstract: New photosensitive polyamic acid precursors are disclosed which have the formula: ##STR1## where Z is a tetravalent organic radical which contains at least one aromatic ring, Z' is a divalent organic radical which contains at least one aromatic ring, and R* is a photosensitive group. Particularly preferred compounds include BPDA-PDA and BPDA-ODA polyamic acid precursors. The precursor compositions within the practice of this invention are i-line, g-line, and i-/g-line active and show good photoresolution. The films formed exhibit excellent self-adhesion and adhesion to glass ceramic and silicon wafer substrates have low internal stress, a very low degree of solvent swelling, high thermal stability, and excellent mechanical properties such as high modulus/tensile strength and high elongation at break.

Abstract: Polyamide, polyurea, polyhydrazide, and polyurethane materials having substantially modified surfaces which are antimicrobial are disclosed. The disclosure also relates to selective ultraviolet (UV) photon irradiation, high energy electron irradiation low energy electron irradiation for preparing such antimicrobial, polymeric materials. The disclosure further provides methods for controlling microorganisms, and products made from the antimicrobial, polymeric materials of this invention.

Abstract: The invention relates generally to polymers exhibiting second order nonlinear optical properties, and characterized by high thermal stability. Disclosed are polymers prepared by a polycondensation reaction between an aromatic dianhydride and a compound selected from the group consisting of a di(alkylamino)amine and an aromatic diamine. Most preferred are polymers that are the products of a polycondensation reaction between 1,2,4,5-benzenetetracarboxylic dianhydride and nitro(N,N-diethylamino)stilbene, wherein the polymer is imidized by further heat treatment.

Abstract: Negative photoresists, and electronic devices comprising dielectric polyimide films resulting from such photoresists. The Photoresists comprise polyamic acids, which have been neutralized with tertiary amines containing double bonds of the acrylic family, the amines including acrylamines, alkylacrylamines such as for example methacrylamines, ethacrylamines, and the like. Also methods of making such amines in high purity.

Abstract: Disclosed is a novel polyimide precursor having an aromatic polyamide ester structure containing amido groups and carboxylic acid ester groups composed of carboxylic groups and organic groups bonded thereto by ester linkage, wherein the ester groups comprise 20 to 80 mole %, based on the total molar amount of the ester groups, of groups each independently selected from the group consisting of a methyl group, an ethyl group, an n-propyl group, an isopropyl group and an allyl group and 20 to 80 mole %, based on the total molar amount of the ester groups, of organic groups each independently selected from organic groups having 4 to 11 carbon atoms and containing a terminal ethylenic double bond.

Abstract: A method of curing an organic dielectric layer, such as polyimide, used in a multichip module is disclosed. The method comprises heating the uncured polyimide layer to a temperature above its glass transition temperature, and irradiating the layer with a uniform flux of electrons, as in an e-beam apparatus. The process reduces deterioration at the interface between the dielectric films and the metal layers which when high temperature thermal curing is utilized, and reduces the stress of the resulting film. Multiple dielectric layers can be applied in this manner.

Abstract: The invention relates to a process for producing chain extended polyamide compositions which comprise one or more polyamides and one or more lactamyl phosphites.

Abstract: Molding materials are composed ofA) from 40 to 100% by weight of a copolyamide based ona.sub.1) from 1 to 20 mol%, based on the copoly- amide, of at least one monomer that contains at least one olefinic double bond (monomers a.sub.1) from the group of the.alpha..sub.1) olefinically unsaturated lactams,.alpha..sub.2) olefinically unsaturated aminocarboxylic acids,.alpha..sub.3) olefinically unsaturated dicarboxylic acids,.alpha..sub.4) olefinically unsaturated diamines, anda2) from 80 to 99 mol%, based on the copolyamide, of at least one monomer that contains no olefinic double bonds (monomers a2) from the group of the.beta..sub.1) lactams.beta..sub.2) aminocarboxylic acids,.beta..sub.3) dicarboxylic acids,.beta..sub.4) diamines, andB) from 0 to 35% by weight of an impact modifying rubber,C) from 0 to 50% by weight of a filler and/or reinforcing agent,D) from 0 to 20% by weight of a flame retardant, andE) from 0 to 10% by weight of further additives and processing aids.

Abstract: A photosensitive cover coating agent forming an insulating, protective coating having superior compatibility, sensitivity, heat resistance, adhesion, electrical properties and flexibility is provided,which coating agent is obtained by mixing a polymer (A) of repetition units of the formula ##STR1## wherein R.sup.1 is ##STR2## R.sup.2 is a divalent organic group, a compound (B) containing two or more (meth)acryloyl groups in one molecule,a compound (C) of the formula ##STR3## wherein Z is a divalent aliphatic or alicyclic group, R.sup.3 is H, monovalent organic group or characteristic group and R.sup.4 is H or --Z--R.sup.3, in 0.01 to 0.80 mol equivalent based on compound (B), the total quantity of (B) and (C) being 20 to 200 wt. parts per 100 wt. parts of (A), anda photopolymerization initiator or a sensitizing agent (D), in 0.5 to 20 wt. parts per 100 wt. parts of (A).

Abstract: A process for forming a polymer (and the polymer formed thereby) for passivation, resist and bonding uses, for example, that is thermally stable at relatively high temperatures in excess of 400.degree. C., but is sensitive to electromagnetic radiation. The process includes forming a heteroatom ring polymer that includes a chain formed of a large number of closed aromatic rings such as polyimide groups. According to the present teaching, intervening moieties, (that is, chemical groupings) in the form of open ring precursors of the aromatic rings, such as polyamic acid groups are introduced between the successive closed aromatic rings, which destroy and/or delimit the colinear character and the coplanar character typical of the successive aromatic rings, thus rendering the aromatic rings sensitive to structural change by electromagnetic radiation exposure, and soluble in common organic solvents, but with the exposed HRP insoluble in resist developers.

Abstract: An improved method of laminating a metal foil or sheet to a polyimide material is provided. A solution of a precursor of an intractable (i.e. thermosetting) polyimide is applied to a substrate and the solvent is removed to form a dry tack-free film. Thereafter, a solution of a precursor of a thermoplastic polyimide is applied onto the first film of polyimide and the solvent is removed to form a dry tack-free second film. Both films are then cured concomitantly at a sufficiently rapid rate and low temperature to effect substantial imidization of the polyimide precursors of both films without substantial crosslinking or densification of the polyimides in either of the films. Thereafter, a metal sheet or foil is laminated onto the thermoplastic polyimide film according to the following process. The thermoplastic film is contacted with the sheet or foil of metal to be laminated thereto.