1,2 Epoxy Patents (Class 522/170)
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Patent number: 12094507Abstract: To provide a hologram recording composition that can further improve diffraction characteristics and transparency of a hologram. The present technology provides a hologram recording composition containing a heteropoly acid, a photopolymerizable monomer, a photopolymerization initiator, and a sensitizing dye having absorption in a visible light region in the presence of an acid. The present technology also provides a hologram recording medium including at least a photocurable resin layer containing a heteropoly acid, a photopolymerizable monomer, a photopolymerization initiator, and a sensitizing dye having absorption in a visible light region in the presence of an acid. Furthermore, the present technology also provides a diffraction optical element using the hologram recording medium. Moreover, the present technology also provides an optical device, an optical component, and an image display device using the diffraction optical element.Type: GrantFiled: October 21, 2019Date of Patent: September 17, 2024Assignee: Sony Group CorporationInventors: Eri Igarashi, Takahiro Ohe, Hisaya Hara, Kenshiro Kawasaki, Daisuke Hobara
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Patent number: 12030988Abstract: The present application relates to an encapsulating composition and an organic electronic device comprising the same, and provides an encapsulating composition which can effectively block moisture or oxygen introduced into an organic electronic device from the outside to secure the lifetime of the organic electronic device, can implement a top-emitting organic electronic device, can be applied in an inkjet method, can provide a thin display and can effectively prevent interference of an electromagnetic field due to a low dielectric constant.Type: GrantFiled: September 30, 2019Date of Patent: July 9, 2024Assignee: LG Chem, Ltd.Inventors: Mi Lim Yu, Joon Hyung Kim, Ji Won Kwak, Kook Hyun Choi, Yung Jong Lee
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Patent number: 11965055Abstract: A waterborne polyurethane acrylate emulsion, comprising the following raw material components: a polyurethane acrylate prepolymer and a polyurethane acrylate oligomer. After ultraviolet curing, the waterborne polyurethane acrylate emulsion exhibits excellent mechanical strength and good wear resistance. The matt coatings produced therefrom has a fine matt fineness after curing.Type: GrantFiled: December 24, 2021Date of Patent: April 23, 2024Assignee: Zhejiang UVCHEM Special Coatings Co., LtdInventors: Bo Lv, Yuping Wang, Ligang Yu, Fuliang Peng
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Patent number: 11851600Abstract: An optical component and a electro optical devices comprising the optical component. Further, a cholesteric polymerizable liquid crystalline (LC) material, preferably utilized in an optical component in accordance with the present invention, a process for the production of the cholesteric polymerizable LC material, a process to convert the cholesteric polymerizable material into a polymer film, a polymer film obtainable from the cholesteric polymerizable LC material, and the use of the polymer films in an optical component or device comprising a polymer film.Type: GrantFiled: November 18, 2021Date of Patent: December 26, 2023Assignee: Merck Patent GmbHInventors: Stephen Mulcahy, Owain Llyr Parri
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Patent number: 11846755Abstract: Provided is a hard coating film. The hard coating film includes a base layer and a hard coating layer disposed on the base layer and having a pencil hardness of 4H or higher. A surface elongation at break of the hard coating film falls within a predetermined range, as measured by a certain method. The hard coating film shows excellent durability under high-temperature/high-humidity conditions, has no microcracks formed after repeated folding, and shows excellent pencil hardness.Type: GrantFiled: February 10, 2020Date of Patent: December 19, 2023Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.Inventors: Jong Nam Ahn, Byoung Sun Ko, Jin Su Park, Tae Sug Jang, Keon Hyeok Ko, Ho Chul Yoon
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Patent number: 11840631Abstract: Provided are a polyimide-based film, a window cover film, and a display device including the same. In detail, provided is a polyimide-based film whose solubility in an ethyl cellosolve solvent satisfies the following Equation 1: ( FW 1 - FW 2 ) FW 1 × 100 ? 50 ? % [ Equation ? ? 1 ] wherein FW1 is a weight of an initial film before being immersed in a solvent, and FW2 is a weight of the film measured after the film is immersed in an ethyl cellosolve solvent, left at 60° C. for 2 hours, and cooled to room temperature, the solvent is removed, and the film is dried at 80° C. for 4 hours.Type: GrantFiled: September 29, 2020Date of Patent: December 12, 2023Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.Inventor: Jong Nam Ahn
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Patent number: 11820920Abstract: The present invention relates to a composition for use as an adhesive, paint, coating, resin, (surface) size, composite, gel or hydrogel, said composition comprising microfibrillated cellulose (“MFC”). In addition to microfibrillated cellulose, these compositions comprise at least one solvent, said solvent preferably comprising or consisting of water, and at least one compound that is (a) capable of polymerizing, or has already partly or fully, polymerized, and that (b) has at least two groups available for hydrogen bonding, preferably OH groups, that are capable of crosslinking with at least one functional group of the microfibrillated cellulose.Type: GrantFiled: August 14, 2018Date of Patent: November 21, 2023Assignee: Borregaard ASInventors: Synnøve Holtan, Katérina Liapis, Tom Stylo, Jan Berg
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Patent number: 11760816Abstract: Provided is an unsaturated double bond-containing compound capable of sufficiently advancing a crosslinking reaction or a curing reaction when used for a coating material or the like and having oxygen absorption performance. The present invention also provides an oxygen absorbent containing the unsaturated double bond-containing compound and a resin composition containing the same. Provided are an unsaturated double bond-containing compound represented by general formula (I), an oxygen absorbent containing the same, and a resin composition.Type: GrantFiled: November 21, 2018Date of Patent: September 19, 2023Assignee: KURARAY CO., LTD.Inventors: Daiki Noguchi, Takashi Fukumoto, Katsuji Ujita, Keiji Kubo
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Patent number: 11760817Abstract: Embodiments in accordance with the present invention encompass compositions comprising a soluble photoacid generator, a organopalladium compound, a photosensitizer and one or more olefinic monomers which undergo vinyl addition polymerization when said composition is exposed to a suitable actinic radiation to form a substantially transparent film. The monomers employed therein have a range of optical and mechanical properties, and thus these compositions can be tailored to form films having various opto-electronic properties. Accordingly, compositions of this invention are useful in various applications, including as coatings, encapsulants, fillers, leveling agents, among others.Type: GrantFiled: June 8, 2021Date of Patent: September 19, 2023Assignee: PROMERUS, LLCInventors: Paul D Byrne, Brian Knapp
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Patent number: 11638979Abstract: A polishing pad for a semiconductor fabrication operation includes a polishing region and a window region, wherein both regions are made of an interpenetrating polymer network formed from a free-radically polymerized material and a cationically polymerized material.Type: GrantFiled: June 9, 2020Date of Patent: May 2, 2023Assignee: Applied Materials, Inc.Inventors: Uma Sridhar, Sivapackia Ganapathiappan, Ashwin Murugappan Chockalingam, Rajeev Bajaj, Daniel Redfield, Mayu Felicia Yamamura, Yingdong Luo, Nag B. Patibandla
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Patent number: 11613509Abstract: A conventional polymerization inhibitor is for example an agent to scavenge radicals generated during storage of a radical polymerizable compound and used to stably handle the radical polymerizable compound, but is unnecessary when the radical polymerizable compound is to be subjected to radical polymerization reaction, and is preferably removed at the time of the radical polymerization reaction. The object of the present invention is to obviate inconvenience of removing the polymerization inhibitor at the time of radical polymerization. The radical polymerization control agent contained in a radical polymerizable composition of the present invention functions as a radical polymerization inhibitor for example stored in a dark place, but loses its radical polymerization inhibiting effect when polymerization is initiated while being irradiated with light at a certain specific wavelength at the time of polymerization.Type: GrantFiled: June 27, 2018Date of Patent: March 28, 2023Assignee: Kawasaki Kasei Chemicals Ltd.Inventors: Shunichi Himori, Keita Iuchi
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Patent number: 11614647Abstract: Exemplary embodiments enable a high-luminance and high-contrast image to be displayed so that there are no defects resulting from deforming an image display part, the curable resin composition has a uniform thickness, and air bubbles are prevented in the curable resin composition. A method for producing an image display apparatus includes coating a curable resin composition onto a base and/or protective part, arranging the base and the protective part to face each other, and forming a cured resin layer between the base and the protective part, wherein the curable resin composition has a curing shrinkage ratio of 5% or less and includes polyurethane acrylate and isobornyl acrylate, and the cured resin layer has a storage modulus of 1×107 Pa or less at 25° C. and a light transmittance in a visible region of 90% or more, and wherein the curable resin composition coated onto the base or the protective part has a pattern with a prescribed shape.Type: GrantFiled: November 19, 2020Date of Patent: March 28, 2023Assignee: DEXERIALS CORPORATIONInventors: Tomoyuki Toyoda, Yusuke Kamata, Yoshihisa Shinya
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Patent number: 11518921Abstract: Provided is an antistatic polyimide-based film. More particularly, as an antistatic polyimide-based film for a window cover for protecting a surface of a display device, a window cover film having a protective film formed on the polyimide-based film provides an improvement to a problem of not being used as a film for a display window cover because a portion of the protective film remains on a base layer or a hard coating layer without being peeled off due to static electricity in the protective film or the base layer, or a hard coating layer, or the hard coating layer is peeled off with some or all of the protective film when the protective film is peeled off.Type: GrantFiled: September 28, 2020Date of Patent: December 6, 2022Assignees: SK Innovation Co., Ltd., SK ie technology Co., Ltd.Inventors: Jong Nam Ahn, Hye Jin Kim
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Patent number: 11515245Abstract: The present invention relates to a method for manufacturing an insulating layer for a semiconductor package which can improve reliability and have excellent heat resistance by removing pores generated in the insulating layer during manufacture of an insulating layer for a semiconductor package using magnetic characteristics, and an insulating layer for a semiconductor package obtained using the method for manufacturing the insulating layer for a semiconductor package.Type: GrantFiled: December 12, 2018Date of Patent: November 29, 2022Assignee: LG CHEM, LTD.Inventors: Minsu Jeong, You Jin Kyung, Byung Ju Choi, Woo Jae Jeong, Kwang Joo Lee, Eunbyurl Cho
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Patent number: 11456406Abstract: Provided is a silicon bulk thermoelectric conversion material in which thermoelectric performance is improved by reducing the thermal conductivity as compared with the prior art. In the silicon bulk thermoelectric conversion material, the ZT is greater than 0.2 at room temperature with the elemental silicon. In the silicon bulk thermoelectric conversion material, a plurality of silicon grains have an average of 1 nm or more and 300 nm or less, a first hole have an average of 1 nm or more and 30 nm or less present in the plurality of silicon grains and surfaces of the silicon grains, and a second hole have an average of 100 nm or more and 300 nm or less present between the plurality of silicon grains, wherein the aspect ratio of a crystalline silicon grain is less than 10.Type: GrantFiled: December 26, 2018Date of Patent: September 27, 2022Assignee: JAPAN SCIENCE AND TECHNOLOGY AGENCYInventors: Junichiro Shiomi, Makoto Kashiwagi, Takashi Kodama
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Patent number: 11385541Abstract: A radiation-curable resin composition, suitable for use in 3D printing, and to the production method thereof, i.e. the method for producing three-dimensional objects using radiation by means of 3D printing of the laser, DLP or LCD type, with successive photopolymerisable layers. The radiation-curable resin composition comprises one or more epoxy-acrylic resins and polymethyl methacrylate, graphene, halloysite nanotubes and one or more photoinitiators.Type: GrantFiled: April 2, 2018Date of Patent: July 12, 2022Assignee: Centro Tecnologico De Nanomateriales Avanzados, S.L.Inventor: Karla Daniela Mora Barrios
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Patent number: 11370047Abstract: A method of manufacturing a mounting substrate, the method includes: transferring part or all of a plurality of devices on a device substrate onto a wiring substrate, and temporarily fixing the transferred devices to the wiring substrate with use of a fixing layer having viscosity, the device substrate including a support substrate and the plurality of devices fixed on the support substrate; and performing a reflow process on the wiring substrate to electrically connect the transferred devices with the wiring substrate, and thereby forming the mounting substrate.Type: GrantFiled: May 6, 2014Date of Patent: June 28, 2022Assignee: Sony Semiconductor Solutions CorporationInventors: Hiizu Ootorii, Kiwamu Adachi, Takeshi Mizuno
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Patent number: 11217554Abstract: Thermally conductive adhesive materials having a first metallic component with a high melting point metal; a second metallic component having a low melting point metal; a fatty acid, an optional amine, an optional triglyceride and optional additives. Also provided are methods of making the same and uses thereof for adhering electronic components to substrates.Type: GrantFiled: June 7, 2018Date of Patent: January 4, 2022Assignee: Ormet Circuits, Inc.Inventors: Matthew Wrosch, Catherine A. Shearer
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Patent number: 11180594Abstract: Radiation curable compositions for additive fabrication processes, the components cured therefrom, and their use in particle image velocimetry testing methods are described and claimed herein. Such compositions include compounds which induce free-radical polymerization, optionally compounds which induce cationic polymerization, a filler constituent, and a light absorbing component, wherein the compositions are configured to possess certain absorbance values at wavelengths commonly utilized in particle image velocimetry testing. In another embodiment, the compositions include a fluoroantimony-modified compound. Such compositions may be used in particle imaging velocimetry testing methods, wherein the test object utilized is created via additive fabrication and is of a substantially homogeneous construction.Type: GrantFiled: December 19, 2018Date of Patent: November 23, 2021Assignee: Covestro (Netherlands) B.V.Inventors: Kangtai Ren, Robin Papachristopoulos
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Patent number: 11034798Abstract: A coating composition with a stable shelf-life for forming a transparent coating upon eyeglass lenses or other substrates having improved abrasion resistance and tintability. The composition comprising a silicone-based binder component, a curing agent component, and being substantially free of volatiles. The binder component comprises the partial hydrolysis product of an epoxy-functional alkoxysilane, a polyglycidylether, and an acrylic monomer. The curing agent component comprises a cationic photoinitiator and a free radical photoinitiator.Type: GrantFiled: December 17, 2020Date of Patent: June 15, 2021Inventor: Gerald Treadway
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Patent number: 11028286Abstract: A dual curable silicone composition, comprising: (a) a silicone resin comprising at least one epoxy group, (b) a silicone polymer comprising at least one epoxy group and at least one hydrolyzable group, (c) a catalytic amount of onium salt photo catalyst, (d) a catalytic amount of condensation catalyst, wherein the composition is curable when exposed to UV radiation, H2O, or UV radiation and H2O.Type: GrantFiled: July 24, 2018Date of Patent: June 8, 2021Assignee: Dow Silicones CorporationInventors: Junying Liu, Nanguo Liu, Joel McDonald
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Patent number: 10854357Abstract: Provided is a coating material for forming a conductive release layer capable of forming a conductive release layer having high adhesion to a film base material, suppressing deterioration in conductivity over time in the air, and having a sufficient releasing property. The coating material for forming a conductive release layer of the present invention contains a conductive composite including a ?-conjugated conductive polymer and a polyanion, an epoxy compound having an epoxy group, a curable silicone, a polyester resin, and an organic solvent.Type: GrantFiled: July 6, 2017Date of Patent: December 1, 2020Assignee: SHIN-ETSU POLYMER CO., LTD.Inventors: Sou Matsubayashi, Kohei Kanto
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Patent number: 10633553Abstract: The present technology provides a heteroatom-containing polycarbonate polyfunctional-vinyl ether molecule of formula (I) and processes of preparing thereof. The present technology further provides a heteroatom-containing acrylate molecule of formula (II). An ink or coating formulation including an energy curable high reactivity heteroatom-containing polycarbonate polyfunctional-vinyl ether molecule of formula (I) or an energy curable high reactivity heteroatom-containing acrylate molecule of formula (II) is provided.Type: GrantFiled: September 23, 2016Date of Patent: April 28, 2020Assignee: BASF SEInventors: Sebastian Berger, Paul Share
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Patent number: 10377919Abstract: The present disclosure relates to a hard-coating cured material which contains a siloxane resin component including an epoxy group and a preparing method of the hard-coating cured material. Especially, by using a special polymerization method like a cationic polymerization and a moisture-heat treatment, it is possible to provide a hard-coating film having both superior flexibility and high surface hardness that cannot be obtained from conventional coating compositions.Type: GrantFiled: October 15, 2014Date of Patent: August 13, 2019Assignee: KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Byeong-Soo Bae, Gwang-Mun Choi, Ji-Hoon Ko
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Patent number: 10093778Abstract: An interpenetrating polymer network (IPN) adhesive comprises an acrylated polymer system curable by radiation, and a flexible epoxy system thermally curable after the acrylated polymer system is cured.Type: GrantFiled: October 15, 2014Date of Patent: October 9, 2018Assignee: THE BOEING COMPANYInventor: Gary Robert Weber
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Patent number: 10023772Abstract: Provided are a pressure-sensitive adhesive composition, a pressure-sensitive adhesive optical laminate, a pressure-sensitive adhesive polarizing plate and a display device. The pressure-sensitive adhesive composition offers a pressure-sensitive adhesive that has excellent durability and processability in manufacturing due to increased hardness even when the pressure-sensitive adhesive layer is formed thinner than a typical adhesive composition, and that can prevent a pressure mark and leakage of the pressure-sensitive adhesive, as well as a bending problem generated when applied on an optical member such as a polarizing plate, etc.Type: GrantFiled: July 31, 2017Date of Patent: July 17, 2018Assignee: LG Chem, Ltd.Inventors: Yong Su Park, Se Woo Yang, Suk Ky Chang, Min Soo Park, Eun Suk Park
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Patent number: 9834678Abstract: To provide a radiation-curable silicone composition which provides a cured product whose odor is decreased, particularly is odorless, and has excellent curability and releasing properties. A radiation-curable silicone composition including the following components (A) and (B): (A) an epoxy group-containing cation-polymerizable organopolysiloxane which is represented by the following average composition formula (1): R1aR2bSiO(4-a-b)/2 (1) and (B) an iodonium salt having a cation moiety represented by the following general formula (2) in an effective amount to cure said component (A), [(R3)—I—(R3)]+ (2) wherein R3 is, independently of each other, a substituted or unsubstituted monovalent aromatic hydrocarbon group having 15 to 26 carbon atoms, wherein said component (A) may be accompanied by any other compounds volatilizing during heating at 105 degrees C. for 3 hours, a content of said compounds is at most 2.0 mass %, based on a total amount of component (A) and said compound.Type: GrantFiled: March 2, 2015Date of Patent: December 5, 2017Assignee: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Kenji Tanaka, Shinji Irifune, Shunji Aoki
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Patent number: 9751337Abstract: An inkjet printing method for producing images durable for outdoor usage includes the steps of: a) inkjet printing on a substrate a UV curable colorless primer including monofunctional monomers in a range of 40 wt % to 65 wt % based on the total weight of the UV curable colorless primer; b) at least partially UV curing the inkjet printed UV curable colorless primer; and c) inkjet printing on the at least partially cured UV curable colorless primer one or more UV curable color inkjet inks including monofunctional monomers in a range of 30 wt % to 60 wt % based on the total weight of the UV curable color inkjet inks; wherein a ratio of the wt % monofunctional monomers in the UV curable colorless primer over the wt % monofunctional monomers in the one or more UV curable color inkjet inks is between 0.65 and 2.10.Type: GrantFiled: April 29, 2015Date of Patent: September 5, 2017Assignee: AGFA GRAPHICS NVInventor: Koen Steert
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Patent number: 9695107Abstract: A curable sensitizer that exhibits a radical-polymerization sensitizing ability that conventional sensitizers do not have in a polymerization reaction using radicals, and is easily available at a low cost, a photocurable material containing the sensitizer, a cured product of the photocurable material, and a material for a wiring harness containing the photocurable material. The curable sensitizer contains an alcohol (meth)acrylate synthesized from an alcohol having one or more hydroxy groups and two or more oxygen atoms in a molecule and a (meth) acrylate ingredient selected from a (meth)acrylic acid and a derivative thereof. An ester bond is formed between one of the hydroxy groups of the alcohol and the (meth)acrylate ingredient. The sensitizer is capable of increasing curability of a curable material when mixed in the material. The photocurable material contains the curable sensitizer and a photoinitiator. The material for the wiring harness contains the photocurable material.Type: GrantFiled: May 22, 2013Date of Patent: July 4, 2017Assignees: SUMITOMO WIRING SYSTEMS, LTD., SUMITOMO ELECTRIC INDUSTRIES, LTD., KYUSHU UNIVERSITY, AUTONETWORKS TECHNOLOGIES, LTD.Inventors: Tatsuya Hase, Makoto Mizoguchi
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Method for producing vinyl ester urethane resins based on dianhydrohexitol compounds and use thereof
Patent number: 9550852Abstract: Disclosed is a method for producing vinyl ester urethane resins, in which a dianhydrohexitol-compound is reacted with a diisocyanate in the presence of a monomeric radically co-polymerizable compound as a solvent and the product is reacted with a hydroxy-substituted (meth)acrylate. As a result, vinyl ester urethane resins based on dianhydrohexitol-compounds and also based on renewable raw materials can be obtained in a simple manner with high yields. The resins are suitable as binding agents in chemical fixing engineering.Type: GrantFiled: October 22, 2013Date of Patent: January 24, 2017Assignee: Hilti AktiengesellschaftInventors: Michael Leitner, Beate Gnass -
Patent number: 9354518Abstract: The present invention provides a silicone composition that includes an epoxy-functional organopolysiloxane resin and an epoxy-functional organosiloxane oligomer, and a method of preparing optical waveguides using the silicon composition. The present invention also provides a cured silicon composition, and an optical waveguide that includes the cured silicon composition.Type: GrantFiled: May 23, 2012Date of Patent: May 31, 2016Assignee: Dow Corning CorporationInventors: Duane Raymond Bujalski, Jon Vierling Degroot, Jr., David J. Deshazer, Shedric Oneal Glover, Karen L. Hueston, John Ladouce
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Publication number: 20150099070Abstract: There is provided a composition for curing a resist underlayer film used as an underlayer of a resist for nanoimprint in nanoimprint lithography of a pattern forming process by heat-baking, light-irradiation or both of them to form the resist underlayer film. A composition for forming a resist underlayer film used for nanoimprint in a pattern forming process using nanoimprint by performing heat-baking, light-irradiation, or both of them, the composition comprising a silicon atom-containing polymerizable compound (A), a polymerization initiator (B) and a solvent (C). The polymerizable compound (A) may contain silicon atoms in a content of 5 to 45% by mass. The polymerizable compound (A) may be a polymerizable compound having at least one cation polymerizable reactive group, a polymerizable compound having at least one radical polymerizable reactive group, or a combination of them, and the polymerization initiator (B) may be a photopolymerization initiator.Type: ApplicationFiled: December 15, 2014Publication date: April 9, 2015Inventors: Satoshi TAKEI, Tomoya OHASHI
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Publication number: 20150093585Abstract: The present application relates to a hard-coating resin composition including a siloxane resin, a preparing method of a siloxane cured hard-coating article using same and an optical film including the siloxane cured hard-coating article.Type: ApplicationFiled: December 11, 2014Publication date: April 2, 2015Inventors: Byeong-Soo BAE, Ji-Hoon KO, Gwang-Mun CHOI
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Patent number: 8987344Abstract: A hard coating composition including at least the following components (A) to (E): Component (A): A poly(methyl)glycidyl ether compound derived from a chain aliphatic polyol or a chain aliphatic polyether polyol, which may or may not contain a hydroxyl group, Component (B): A silsesquioxane compound containing a cationic polymerizable group, Component (C): A silicate compound, Component (D): A silane compound containing a cationic polymerizable group, or a partial condensed compound thereof, or a mixture thereof, and Component (E): A cationic photopolymerization initiator, wherein the composition includes 5 to 40 parts by weight of the component (A), 60 to 95 parts by weight of the total of the components (B), (C) and (D), and 0.1 to 10 parts by weight of the component (E), each based on 100 parts by weight of the total of the components (A) to (D).Type: GrantFiled: January 16, 2007Date of Patent: March 24, 2015Assignees: Mitsui Chemicals, Inc., Agency for Science, Technology and ResearchInventors: Norio Nakayama, Toshihiko Takaki, Chaobin He, Khine Yi Mya, Yang Xiao
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Patent number: 8980968Abstract: A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,Type: GrantFiled: February 1, 2011Date of Patent: March 17, 2015Assignee: Canon Kabushiki KaishaInventors: Hyo Takahashi, Ken Ikegame, Masako Shimomura
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Patent number: 8980971Abstract: A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group.Type: GrantFiled: May 21, 2013Date of Patent: March 17, 2015Assignee: DSM IP Assets B.V.Inventors: Masahiro Ueda, Katsuyuki Takase, Takahiko Kurosawa
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Patent number: 8975003Abstract: The invention provides a photosensitive negative resin composition containing (a) an epoxy-group-containing compound, (b) a first onium salt containing a cation portion structure represented by (b1) and an anion portion structure represented by (b2), and (c) a second onium salt containing a cation portion structure represented by (c1) and an anion portion structure represented by (c2).Type: GrantFiled: December 2, 2011Date of Patent: March 10, 2015Assignee: Canon Kabushiki KaishaInventors: Hyou Takahashi, Masako Shimomura, Ken Ikegame
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Publication number: 20150060113Abstract: A photocurable composition includes an acid-generating compound, a multifunctional epoxy resin, and an epoxysilane oligomer represented by the following Structure (I): wherein R1 is a substituted or unsubstituted alkyl group, R2 is a substituted or unsubstituted linear, branched, or cyclic alkyl group or an alkyl ether residue substituted with an epoxide, R3 is hydrogen or a substituted or unsubstituted alkyl, and x+y?2. The photocurable composition can be provided as a photoresist layer on a substrate, and can then be imprinted to form a pattern of micro-channels. These micro-channels can be filled with a conductive composition (ink) and used to form an entrenched pattern of micro-wires to provide a transparent conductive electrode.Type: ApplicationFiled: September 4, 2013Publication date: March 5, 2015Inventors: Yongcai Wang, John Andrew Lebens, John DiCillo
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Patent number: 8968862Abstract: A double-sided polarizer includes a polarizing film, a first adhesive layer formed on one surface of the polarizing film, a second adhesive layer formed on the other surface of the polarizing film, a first transparent film formed on the first adhesive layer, and a second transparent film formed on the second adhesive layer, wherein the first adhesive layer and the second adhesive layer are formed of an active energy line-curable adhesive and the first adhesive layer is 0.1 ?m to 3 ?m thick, and there is also provided an optical device including the double-sided polarizer.Type: GrantFiled: October 12, 2012Date of Patent: March 3, 2015Assignee: LG Chem, Ltd.Inventors: Eun-Mi Seo, Hwa-Sub Shim, Jee-Hyon Min, Nam-Jeong Lee, Kyun-Il Rah, Jun-Wuk Park, Eun-Soo Huh, Yi-Rang Lim
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Publication number: 20150044623Abstract: Liquid radiation curable resin compositions for additive manufacturing comprising: from about 5 to about 30 wt % of an oxetane; a (meth)acrylate component; a cationic photoinitiator; a free-radical photoinitiator; and from about 50 to about 80 wt % of an epoxy, which further comprises a cycloaliphatic epoxy component, and an epoxy component having an aromatic glycidyl ether group, wherein the majority of the epoxy is the cycloaliphatic epoxy component are described and claimed. Also described and claimed is a process for using the liquid radiation curable resins for additive manufacturing to create molds for dental aligners, and the three-dimensional molds made from the liquid radiation curable resins for additive manufacturing.Type: ApplicationFiled: August 7, 2014Publication date: February 12, 2015Inventor: Beth RUNDLETT
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Patent number: 8952078Abstract: This invention relates to a printing ink and in particular to an ink for ink-jet printing which is cured by irradiation. The ink comprises at least one radiation-curable monomer; at least one passive thermoplastic resin; at least one radical photoinitiator; and at least one colouring agent; wherein the ink has a viscosity of less than 100 mPas at 25° C., and wherein the at least one passive resin is present at 2 to 15 wt % based on the total weight of the ink and has a molecular weight of 1,500 to 70,000.Type: GrantFiled: July 4, 2007Date of Patent: February 10, 2015Assignee: Sericol LimitedInventor: Nigel Paul Gould
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Publication number: 20150028524Abstract: In one embodiment, a resist material to be used in an imprint process includes a diluent monomer having a hydroxyl group and at least one functional group selected from a vinyl ether group, an epoxy group and an oxetanyl group. The material further includes a dendrimer having at least two reactive groups for photo-cationic polymerization. The material further includes a photo-acid generator as a polymerization initiator.Type: ApplicationFiled: December 13, 2013Publication date: January 29, 2015Applicant: KABUSHIKI KAISHA TOSHIBAInventors: Kei Kobayashi, Seiji Morita
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Publication number: 20150024213Abstract: A liquid coating composition to protect electronic elements on a circuit board includes a heat curable resin composition, a photocurable resin, a photoinitiator, a curing agent, and a solvent. The heat curable resin composition includes poly(acrylic acid) oligomer and at least one compound selected from the group consisting of an epoxy resin and polyester polyol. The curing agent includes at least one compound selected from the group consisting of dicarboxylic anhydride and isocyanate. A method for applying and solidifying the liquid coating composition to form a cured film on a substrate and a resulting composite structure are also provided.Type: ApplicationFiled: July 11, 2014Publication date: January 22, 2015Inventors: CHWAN-HWA CHIANG, CHIEH-HSIANG WANG
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Patent number: 8937116Abstract: The present invention relates to a sheet for forming a hard coating and a method of formation thereof. The present invention can provide a transfer material or a surface protection sheet having a high refractive index and superior physical properties, such as hardness, friction resistance, abrasion resistance, chemical resistance, transparency, luster, and the like, for forming a hard coating on the surface of various molded products, including resin molded products or wood products, and a method for forming a hard coating from such transfer material or surface protection sheets.Type: GrantFiled: February 9, 2011Date of Patent: January 20, 2015Assignee: LG Hausys, Ltd.Inventors: Yun-Bong Kim, Won-Kook Kim, Dong-Joo Gwon, Yang-Gu Kang, Jin-Woo Kim, Mu-Seon Ryu
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Publication number: 20150004374Abstract: A plasticized ultraviolet or electron beam (UV/EB) cationically cured coating, such as a release layer or print from UV/EB cured inks, comprises polymers with a reactive plasticizer incorporated therein. The cured coating contains the plasticizing additives permanently attached to the polymer matrix, locking them in place, and permanently flexibilizing the cured coating. The cured coating finds use on varied substrates including printable substrates used in conventional printers and those with release layers for adhesive labels. Coating formulations which form these cationically cured coatings comprise cationically polymerizable monomers and/or oligomers, a reactive plasticizer which is food grade, cosmetic grade, medical grade or biologically benign when incorporated in the polymer backbone, and a catalyst.Type: ApplicationFiled: June 28, 2013Publication date: January 1, 2015Inventors: Steven Nahm, Larry G. Venable
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Publication number: 20150005408Abstract: The present invention relates to (meth)acrylated compounds (A) prepared from (a) at least one cyclic ether polyol, (b) at least one linking compound (b1) and/or (b2), wherein the linking compound (b1) is selected from cyclic compounds (b11) containing at least one (I) group in the cycle where X=O or NH, from hydroxy acids (b12) and/or from alkylene oxides (b13) containing from 2 to 4 carbon atoms and the linking compound (b2) is selected from epihalohydrins or polyisocyanates, (c) a (meth)acrylating compound; and to their use in radiation curable compositions for the coatings, inks, overprint varnishes, adhesives and composites.Type: ApplicationFiled: March 22, 2013Publication date: January 1, 2015Inventors: Luc Lindekens, JoAnn Arceneaux, Ruben Cleymans, Ichiro Nagakawa, Fumio Tanabiki, Hideo Hibiu
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Patent number: 8921445Abstract: Curable adhesive compositions are provided that exhibit a high refractive index.Type: GrantFiled: April 12, 2010Date of Patent: December 30, 2014Assignee: Mitsui Chemicals, Inc.Inventors: Yassin Turshani, Omar Mohamed Buazza
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Patent number: 8921501Abstract: An ultraviolet (UV) curable resin composition is provided which includes 25 to 45 parts by weight of a modified epoxy acrylate oligomer; and 10 to 25 parts by weight of a urethane acrylate oligomer. Further provided is a metal sheet that is transparent and corrosion resistant, impact resistant, scratch resistant, adhesive, anti-corrosive, and bendable (workable) by forming a coating film on the surface of a metal material such as a steel material, specifically a steel sheet, using the UV curable resin composition mentioned above.Type: GrantFiled: November 12, 2009Date of Patent: December 30, 2014Assignees: Noroo Holdings Co., Ltd., PoscoInventors: Jin Tae Kim, Sang Gon Kim, Jae Ryung Lee, Jung Su Kim, Moon Jae Kwon, Chang Se Byeon
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Patent number: 8916624Abstract: Improvedly storage stable dental compositions useful for the preparation of dental prostheses and for dental restoration containing a uniquely pretreated dental filler material.Type: GrantFiled: April 22, 2010Date of Patent: December 23, 2014Assignee: Bluestar Silicones France SASInventors: Jean-Marc Frances, Sophie Schneider
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Publication number: 20140342100Abstract: UV curable coating composition includes a non hydrolyzed epoxy- alkoxy-silane, polyfunctional acrylate and/or epoxy compounds and a cationic and/or free-radical photo-initiator; with polyfunctional acrylate and/or epoxy compounds representing more than 40 weight % of the total dry matter and the composition being without any hydrolyzed epoxy-alkoxy-silane. This composition is coated and cured on an optical substrate.Type: ApplicationFiled: January 3, 2012Publication date: November 20, 2014Applicant: ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE)Inventor: Robert Alan Valeri