Specified Rate-affecting Material Contains Sulfur Patents (Class 522/27)
  • Patent number: 5739177
    Abstract: A dental composition containing an acid such as maleic acid, phosphoric acid or citric acid; an organosulfonate and/or an organosulfinate such as an acid group-containing (meth)acrylate monomer having in the molecules thereof a carboxyl group or a phosphoric acid group, a sodium benzenesulfonate or a sodium p-toluenesulfinate; a water-soluble organic solvent such as ethanol or propanol; and the water: but without substantially containing any polymerizable monomer except the above acid group-containing (meth)acrylate monomer, or further containing a hydroxy- or a dihydroxyalkyl (meth)acrylate monomer. For adhesion of a dental filling material to teeth, the composition of the invention is used as a pre-treatment agent on teeth prior to applying an adhesive. This makes it possible to treat enamel and dentin simultaneously and to accomplish strong adhesive strength to both of them.
    Type: Grant
    Filed: June 6, 1996
    Date of Patent: April 14, 1998
    Assignee: Tokuyama Corporation
    Inventors: Hideki Ohno, Mikio Kimura, Satoru Fuchigami, Makoto Oguri
  • Patent number: 5739174
    Abstract: A photocurable composition comrpising: (a) a photopolymerizable silane or siloxane containing epoxycylohexyl group(s), (b) a photoinitiator, and (c) a photosensitizer, wherein the photosensitizer comprises at least one material selected from the group consisting of sulfolene, sulfolene derivatives, isatin and isatin derivatives.
    Type: Grant
    Filed: May 17, 1996
    Date of Patent: April 14, 1998
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Fujio Hara
  • Patent number: 5731363
    Abstract: A photopolymerizable composition comprising an addition-polymerizable compound having at least one ethylenic unsaturated double bond, at least one specific sensitizing dye such as the following formula (I), and a titanocene compound: ##STR1## The substituents in formula (I) are defined in the specification.
    Type: Grant
    Filed: February 28, 1996
    Date of Patent: March 24, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yasuo Okamoto, Syunichi Kondo
  • Patent number: 5728747
    Abstract: A free radical polymerization process for the preparation of polymer comprising:a first heating and photoinitiating with ultraviolet light of a mixture comprised of a stable free radical agent, and at least one polymerizable monomer compound;optionally cooling said mixture;a second heating of said mixture at a temperature of from about 100.degree. C. to about 160.degree. C.;isolating the polymer product formed; andoptionally washing and drying said polymer.
    Type: Grant
    Filed: August 8, 1996
    Date of Patent: March 17, 1998
    Assignee: Xerox Corporation
    Inventors: Peter M. Kazmaier, Barkev Keoshkerian, Rafik O. Loutfy, Karen A. Moffat, Michael K. Georges, Gordon K. Hamer, Richard P. N. Veregin
  • Patent number: 5721288
    Abstract: A photopolymerizable composition is described, comprising components (i) a compound having at least one addition-polymerizable ethylenically unsaturated bond, (ii) a compound represented by the following formula (I): ##STR1## and (iii) an activating agent which generates an active radical upon light irradiation in the co-presence of component (ii). The substituents in formula (I) are defined in the specification.
    Type: Grant
    Filed: February 9, 1996
    Date of Patent: February 24, 1998
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Yoshimasa Aotani, Tadahiro Sorori
  • Patent number: 5703140
    Abstract: A photopolymerizable composition is disclosed, comprising at least (i) a compound having an addition-polymerizable ethylenically unsaturated bond, and (ii) an oxime ether compound. The photopolymerizable composition of the present invention shows high sensitivity to active light rays over a wide range of from ultraviolet ray to visible light and at the same time, the photosensitive material using the photopolymerizable composition of the present invention is improved in the storage stability. Further, the development precipitate generated from the developer waste after development of the photosensitive material is restrained.
    Type: Grant
    Filed: January 23, 1996
    Date of Patent: December 30, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kazuto Kunita, Syunichi Kondo
  • Patent number: 5700849
    Abstract: A photopolymerizable composition is disclosed, which comprises an addition-polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by the following formula (I): ##STR1## wherein the all symbols are defined in the disclosure, and a titanocene compound.
    Type: Grant
    Filed: February 23, 1996
    Date of Patent: December 23, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Syunichi Kondo, Kazuo Fujita
  • Patent number: 5691100
    Abstract: A material for the formation of a pattern is provided which has a wide exposure latitude and is less liable to cause a dimensional change of a pattern with a change in exposure. The material comprises (A) a compound having a capability of producing an acid upon irradiation with an active beam, (B) a compound capable of producing a base or increasing its basicity, (C) a compound having at least one bond clearable with an acid and/or (D) a compound insoluble in water but soluble in an aqueous alkaline solution.
    Type: Grant
    Filed: March 29, 1996
    Date of Patent: November 25, 1997
    Assignee: Hoechst Japan Limited
    Inventors: Takanori Kudo, Seiya Masuda, Yoshiaki Kinoshita, Klaus Przybilla, Natsumi Endo, Natsumi Suehiro, Hiroshi Okazaki
  • Patent number: 5691394
    Abstract: A photopolymerizable composition is disclosed, comprising an addition polymerizable compound having at least one ethylenically unsaturated double bond, a sensitizing dye represented by formula (I) and a titanocene compound. The photopolymerizable composition exhibits high sensitivity to active light rays over a wide region of from ultraviolet light to visible light.
    Type: Grant
    Filed: February 7, 1996
    Date of Patent: November 25, 1997
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Syunichi Kondo
  • Patent number: 5639802
    Abstract: The present invention relates to a novel class of compounds which absorb light at wavelengths greater than 350 nm and are useful as fluorescers or as photoinitiators. The present invention provides compounds of the formulas (I) and (II) and their equivalents (the nomenclature of the compounds used herein is based on the numbering of positions as shown in formula (I)): ##STR1## where: when W is .dbd.O, W.sup.1 is hydrogen or --OR.sup.9 and when W is .dbd.NR.sup.+.sub.2, W is hydrogen or --NR.sub.2, A is hydrogen, alkenyl, alkyl or an election withdrawing group, and the remaining groups are as defined in the disclosure.
    Type: Grant
    Filed: November 23, 1993
    Date of Patent: June 17, 1997
    Assignee: Spectra Group Limited, Inc.
    Inventors: Douglas C. Neckers, Yubai Bi
  • Patent number: 5629354
    Abstract: Improved photopolymerization initiator systems are comprised of a spectral sensitizer that sensitizes in the ultraviolet or visible regions of the spectrum and an N-aryl, O-aryl or S-aryl polycarboxylic acid co-initiator. The improved initiator systems are incorporated in photo-polymerizable compositions containing one or more addition-polymerizable ethylenically-unsaturated compounds to form compositions suitable for the preparation of radiation-sensitive layers in lithographic printing plates adapted to be imagewise-exposed with ultraviolet- or visible-light-emitting lasers such as argon-ion lasers and frequency doubled Nd:YAG lasers. Such plates are able to effectively meet the dual requirements of very high photospeed and very good shelf-life required in computer-to-plate systems.
    Type: Grant
    Filed: February 28, 1995
    Date of Patent: May 13, 1997
    Assignee: Eastman Kodak Company
    Inventors: Paul R. West, Jeffery A. Gurney
  • Patent number: 5618856
    Abstract: There are disclosed herein a visible light sensitizer for a photopolymerizing initiator and/or a photocrosslinking agent which comprises a thiobarbituric acid derivative compound of the general formula (A) or (B): ##STR1## a photopolymerizable and/or a photocrosslinkable composition in which the thiobarbituric acid derivative compound is used, and a hologram recording medium in which the composition is used.
    Type: Grant
    Filed: June 16, 1995
    Date of Patent: April 8, 1997
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoko Yoshinaga, Naosato Taniguchi, Shin Kobayashi
  • Patent number: 5593812
    Abstract: The sensitivity of a photoresist to actinic light is improved by the addition of certain dyes. The photoresist includes a polymer matrix, a photosensitive acid generator and at least one compound selected from the group consisting of dyes containing at least one heterosulphur atom such as 2,2.sup.1,5.sup.1,2"-terthiophene and its derivatives; thianthrene and its derivatives, and 4,6-diphenylthieno(3,4-d)-1,3-dioxol-2-one-5,5-dioxide; phenylsulfone and its derivatives; and 4,5-diphenyl-1,3-dioxol-2-one; 3,4-bis(acetoxymethyl)furan; chelidonic acid and its derivatives; and 5,7,12,14-pentacenetetrone. Resist images on a substrate are formed from the compositions.
    Type: Grant
    Filed: February 17, 1995
    Date of Patent: January 14, 1997
    Assignee: International Business Machines Corporation
    Inventors: Edward D. Babich, Karen E. Petrillo, John P. Simons, David E. Seeger
  • Patent number: 5543262
    Abstract: A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
    Type: Grant
    Filed: February 24, 1995
    Date of Patent: August 6, 1996
    Assignee: International Paper Company
    Inventors: Maria T. Sypek, John R. Delude, Paul A. Perron
  • Patent number: 5411995
    Abstract: Xanthate, dithiocarbamate and dithiophosphate salts of transition metals, together with a coinitiator selected from organic halogen and tertiary amine compounds provide light activated initiator systems for radically polymerizable ethylenically unsaturated compounds such as (meth)acrylate esters.
    Type: Grant
    Filed: April 8, 1993
    Date of Patent: May 2, 1995
    Assignee: Loctite Corporation
    Inventor: Darchun B. Yang
  • Patent number: 5384229
    Abstract: The present invention provides photoimageable compositions, processes and articles of manufacture. In particular, the invention provides a process comprising electrophoretically applying a coating layer of a photoimageable composition onto a conductive surface, the composition comprising a material that contains one or more photoacid labile groups. The photoimageable compositions of the invention preferably comprise a photoacid generator, a material that contains one or more acid-clearable functional groups, and a carrier resin that contains one or more functional groups that are, or can be treated to be, at least partially ionized.
    Type: Grant
    Filed: May 7, 1992
    Date of Patent: January 24, 1995
    Assignee: Shipley Company Inc.
    Inventors: Daniel Y. Pai, Stephen S. Rodriguez, Roger F. Sinta
  • Patent number: 5322762
    Abstract: A highly stable photopolymerizable composition which is highly photosensitive to visible light, which can be hardened using a visible light laser, such as an argon laser, which provides excellent contrast between non-irradiated portions and the substrate under red light, and, moreover, which provides excellent contrast between the portions irradiated by the laser and the portions not irradiated. The photopolymerizable composition consists of 100 parts by weight of a resin which is hardenable under visible light having an irradiation energy mainly consisting of light rays in the 400 nm to 700 nm visible light region; 0.02 to 0.5 parts by weight of at least one dye selected from the group consisting of Victoria Pure Blue, anthraquinone dyes, monoazo dyes, and merocyanine dyes, these dyes having maximum absorption wavelengths from 550 to 700 nm; 0.1 to 5 parts by weight of the leuco dye 4,4'-(phenylmethylene bis[N,N-diethylbenzene amine]; and 0.1 to 5 parts by weight of tribromomethylphenyl sulphone.
    Type: Grant
    Filed: April 13, 1993
    Date of Patent: June 21, 1994
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kenji Kushi, Chiho Tokuhara
  • Patent number: 5321053
    Abstract: A dental composition comprising a vinyl monomer containing at least one acidic group in the molecule thereof and an initiator capable of photopolymerizing said monomer by visible light, characterized in that said initiator consisting essentially of:(a) a photosensitizer selected from an .alpha.-diketone, a quinone and a derivative thereof, and,(b) an accelerator selected from a compound containing at least one mercapto group in the molecule thereof is provided by the present invention.
    Type: Grant
    Filed: February 6, 1990
    Date of Patent: June 14, 1994
    Assignee: Kuraray Co., Ltd.
    Inventors: Kenichi Hino, Junichi Yamauchi, Koji Nishida
  • Patent number: 5300536
    Abstract: The present invention relates to a catalytic composition for photopolymerization, which comprises an alpha-diketone and a hydrazone or a silane compound which has a silicon atom carrying a hydrogen, and also relates to a photopolymerizable composition which comprises a vinyl compound capable of radical polymerization and the above catalytic composition. The catalytic composition is markedly improved in photopolymerization activity and the photopolymerizable composition uniformly cures.
    Type: Grant
    Filed: September 28, 1992
    Date of Patent: April 5, 1994
    Assignee: Toagosei Chemical Industry Co., Ltd.
    Inventors: Shin Takahashi, Yoshiaki Fujimoto
  • Patent number: 5298532
    Abstract: The invention relates to an accelerated photoiniferter polymerization method which involves the addition of a polymerization accelerating amount of a at least one metal compound accelerator during the photoiniferter polymerization process.Preferably, the metal compound or compounds used are represented by the general formula M.sub.x L.sub.z whereinM is a cation having a valency of z of a metal which is selected from the group consisting of tin, zinc, cobalt, titanium, palladium, and lead;x is an integer of at least 1;L is an anion having a valency of x which is selected from the group consisting of C.sub.1-20 alkyl, --aryl, --OR, ##STR1## NO.sub.3.sup.-, SO.sub.4.sup.-, and PO.sub.4.sup.-3 ; R is selected from the group consisting C.sub.1-20 alkyl and aryl; andz is an integer of at least 1.Most preferably, the metal compound is selected from the group consisting of stannous 2-ethylhexanoate, zinc 2-ethylhexanoate and mixtures thereof.
    Type: Grant
    Filed: February 28, 1992
    Date of Patent: March 29, 1994
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Mahfuza B. Ali
  • Patent number: 5284735
    Abstract: A photopolymerizable composition having high sensitivity and broad development latitude comprises a radical-polymerizable compound having two or more ethylenically unsaturated double bonds in the molecule, a photoinitiator, an organic high-molecular compound, and a substituted ethylene compound.
    Type: Grant
    Filed: February 2, 1993
    Date of Patent: February 8, 1994
    Assignee: Okamoto Chemical Industry Co., Ltd.
    Inventor: Hiroaki Okamoto
  • Patent number: 5283160
    Abstract: A photopolymerisable composition comprising a polymerisable olefinically unsaturated compound and a photoinitiator composition(a) a photoinitiator comprising an anthraquinone compound having in the 2-position a substituent of the formula:--X COR.sup.1wherein R.sup.1 represents an optionally substituted hydrocarbyl radical and X represents ##STR1## wherein R.sup.2 represents hydrogen or an optionally substituted hydrocarbyl radical, and(b) a hydrogen donor capable of reducing the photoinitiator when the latter is in an excited state.
    Type: Grant
    Filed: November 10, 1992
    Date of Patent: February 1, 1994
    Assignee: Zeneca Limited
    Inventors: N. S. Allen, R. T. Cook, C. H. McLean, I. A. Weddell
  • Patent number: 5279923
    Abstract: A photosensitive resin composition comprising (a) a compound having a group unstable to acids, (b) a compound generating an acid when exposed to actinic light, and (c) a benzotriazole derivative is suitable for forming a positive type photosensitive anionic electrodeposition coating material and is usable for producing printed circuit boards.
    Type: Grant
    Filed: November 27, 1992
    Date of Patent: January 18, 1994
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Masahiko Hiro, Toshihiko Akahori, Shigeo Tachiki
  • Patent number: 5275910
    Abstract: A positive radiation-sensitive resist composition comprising an alkali-soluble resin, a radiation-sensitive ingredient and a phenol compound represented by the general formula (I): ##STR1## wherein R.sub.1, R.sub.2 and R.sub.3 independently of one another each represent a hydrogen atom, an alkyl group or an alkoxy group and n represents 1, 2 or 3.
    Type: Grant
    Filed: October 14, 1992
    Date of Patent: January 4, 1994
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hiroshi Moriuma, Hirotoshi Nakanishi, Yasunori Uetani
  • Patent number: 5252682
    Abstract: A cationically initiated curable resin system is provided using polyester dicyclopentadiene oligomer blended with monomer having vinyl ether end groups and a cationic initiator. A process for preparing the resin system and a process of coating are also provided.
    Type: Grant
    Filed: December 17, 1992
    Date of Patent: October 12, 1993
    Assignee: Zircon Corporation
    Inventor: Charles E. Bayha
  • Patent number: 5230982
    Abstract: A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound, an ionic dye/reactive counter ion complex capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or crosslinking of the polymerizable or crosslinkable compound, and a disulfide represented by the structure ##STR1## wherein X is selected from the group consisting of S and O except in a specific case in which the disulfide is derived from one or more tetrazolyl groups; n represents 0 or 1; A represents the residue of the ring containing the N, C and X atoms, the ring containing five or six members and, in addition, said ring members may be fused to an aromatic ring; and R.sup.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: July 27, 1993
    Assignee: The Mead Corporation
    Inventors: Paul D. Davis, Jacqueline G. Truini, David A. Hutchings
  • Patent number: 5217805
    Abstract: Ultraviolet radiation curable controllable release composition comprises polyepoxypolysiloxane, silicone-free polyfunctional epoxide normally incompatible with the epoxypolysiloxane, and compatibilizing monofunctional epoxide. The composition is useful as a release layer in adhesive roll and sheet materials.
    Type: Grant
    Filed: October 15, 1991
    Date of Patent: June 8, 1993
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Carl R. Kessel, Daniel K. McIntyre
  • Patent number: 5217760
    Abstract: Xanthate, dithiocarbamate and dithiophosphate salts of transition metals, together with a coinitiator selected from organic halogen and tertiary amine compounds provide light activated initiator systems for radically polymerizable ethylenically unsaturated compounds such as (meth)acrylate esters.
    Type: Grant
    Filed: July 20, 1990
    Date of Patent: June 8, 1993
    Assignee: Loctite Corporation
    Inventor: Darchun B. Yang
  • Patent number: 5198402
    Abstract: Aryl triflate compounds can generate a strong acid when exposed to irradiation of radiation and can be used as an acid generator in a radiologically-acid-producing agent system and a radiosensitive composition.
    Type: Grant
    Filed: October 18, 1991
    Date of Patent: March 30, 1993
    Assignee: Hitachi Chemical Company Ltd.
    Inventors: Makoto Kaji, S. Peter Pappas
  • Patent number: 5124236
    Abstract: A photopolymerizable composition is disclosed, which comprises a photopolymerizable compound and a photopolymerization initiator comprising a cationic dye, an organic boron compound and a compound having an --SH group in the molecule thereof, and which can be used for making printing plates, as resist materials for making printed circuit boards, as color proof materials, etc.The photopolymerizable composition can be applied for an image-forming process utilizing microcapsules, which comprises the steps of encapsulating the photopolymerizable composition with a color image-forming material in the core of microcapsules, coating the microcapsules on a support to form a photosensitive sheet, imagewise exposing the photosensitive sheet, superposing the photosensitive sheet on an image-receiving sheet, pressing the whole surface of the assembly to rupture the microcapsules at the unexposed portions, and transferring the color image-forming material into the image-receiving sheet.
    Type: Grant
    Filed: July 6, 1988
    Date of Patent: June 23, 1992
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Jun Yamaguchi, Shintaro Washizu, Fumiaki Shinozaki
  • Patent number: 5093385
    Abstract: The invention relates to an accelerated photoiniferter polymerization method which involves the addition of a polymerization accelerating amount of a at least one metal compound accelerator during the photoiniferter polymerization process.Preferably, the metal compound or compounds used are represented by the general formula M.sub.x L.sub.z whereinM is a cation having a valency of z of a metal which is selected from the group consisting of tin, zinc, cobalt, titanium, palladium, and lead;x is an integer of at least 1;L is an anion having a valency of x which is selected from the group consisting of C.sub.1-20 alkyl, -aryl, --OR, ##STR1## NO.sub.3.sup.--, SO.sub.4.sup..dbd., and PO.sub.4.sup.-3 ; R is selected from the group consisting C.sub.1-20 alkyl and aryl; andz is an integer of at least 1.Most preferably, the metal compound is selected from the group consisting of stannous 2-ethylhexanoate, zinc 2-ethylhexanoate and mixtures thereof.
    Type: Grant
    Filed: December 21, 1989
    Date of Patent: March 3, 1992
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Mahfuza B. Ali
  • Patent number: 5091439
    Abstract: Compounds of the formula ##STR1## in which a is 1, 2, or 3, R.sup.1 is an uncharged, carbocyclic or heterocyclic aromatic ring, unsubstituted or substituted, R.sup.2 is an unsubstituted or substituted cyclopentadienyl or indenyl anion, and .vertline.X.vertline..sup.a- is an a-valent anion, are suitable for use as latent curing catalysts for two-component polyurethane coatings which are activated by irradiation with actinic light or by heating.
    Type: Grant
    Filed: November 18, 1988
    Date of Patent: February 25, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Godwin Berner, Manfred Rembold, Franciszek Sitek, Werner Rutsch
  • Patent number: 5089536
    Abstract: An energy polymerizable composition and process therefore, comprising a cationically polymerizable material and a catalytically effective amount of an ionic salt of an organometallic complex cation as polymerization initiator, said ionic salt of an organometallic complex cation being capable of adding an intermediate strength nucleophile or upon photolysis capable of liberating at least one coordination site, said metal in said organometallic complex cation being selected from elements of Periodic Groups IVB, VB, VIB, VIIB, and VIIIB are disclosed. Certain of the organometallic metallic polymerization initiators are novel cationic salts.
    Type: Grant
    Filed: November 22, 1982
    Date of Patent: February 18, 1992
    Assignee: Minnesota Mining and Manufacturing Company
    Inventor: Michael C. Palazzotto
  • Patent number: 5073476
    Abstract: Iron (II)-aromatic compound complexes mixed with electron acceptors as an oxidizing agent are suitable initiators for the polymerization by irradiation of organic material which can be polymerized by cations and/or free radicals. The composition composed of the polymerizable material and of the initiator mixture is suitable for the production of protective coatings and can be used as a photographic recording material.
    Type: Grant
    Filed: May 10, 1984
    Date of Patent: December 17, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Kurt Meier, Giuliano Eugster, Franz Schwarzenbach, Hans Zweifel
  • Patent number: 5047442
    Abstract: A photopolymerizable composition comprising a vinylic compound, a sulfur-containing compound and an .alpha.-diketone is disclosed. The sulfur-containing compound may be a mercaptobenzoic acid or a polysulfide.
    Type: Grant
    Filed: August 2, 1988
    Date of Patent: September 10, 1991
    Assignee: Mitsubishi Rayon Company Limited
    Inventors: Isao Sasaki, Nobuhiro Mukai
  • Patent number: 5034307
    Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the metal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
    Type: Grant
    Filed: August 21, 1990
    Date of Patent: July 23, 1991
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Francissek Sitek
  • Patent number: 4985471
    Abstract: A radiation curable pressure sensitive adhesive composition comprising:(A) 100 parts by weight of a hydrogenated polybutadiene liquid oligomer which has one or more ethylenically unsaturated terminal radicals in its molecule and in which 70% or more of intramolecular carbon-carbon double bonds has been hydrogenated;(B) from 0.2 to 20 parts by weight of a chain transfer agent; and(C) from 0.001 to 1.0 parts by weight of a thermal polymerization inhibitor selected from metal complexes of N-nitrosophenylhydroxylamine;has an excellent storage stability and curing property and can provide pressure sensitive adhesive tapes which have excellent heat resistance and weatherability and are suitably used as surface protecting films.
    Type: Grant
    Filed: April 19, 1988
    Date of Patent: January 15, 1991
    Assignee: Hitachi Chemical Company Ltd.
    Inventors: Tomohisa Ohta, Hiroyuki Hagiwara, Hisashige Kanbara, Akihiko Dobashi, Yasuyuki Seki
  • Patent number: 4970136
    Abstract: Titanocenes with, for example, .pi.-cyclopentadienyl ligands in which one or two carbo- or heterocyclic aromatic rings are bonded to the titanium, the aromatic rings being substituted by fluorine in at least one of the two ortho-positions relative to the matal-carbon bond and being substituted by at least one free or etherified or esterified polyoxaalkylene radical, are suitable as photoinitiators for the photopolymerization of ethylenically unsaturated substrates.
    Type: Grant
    Filed: June 5, 1989
    Date of Patent: November 13, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Riediker, Eginhard Steiner, Harry Beyeler, Manfred Rembold, Franciszek Sitek
  • Patent number: 4966934
    Abstract: A biologically compatible adhesive dental primer that is shelf stable as a single component adhesive and includes a mixture of an adhesive promoting and polymerizable monomer system having a free radical polymerizable monomer or prepolymer having ethylenic unsaturation and a phosphorus containing adhesion promoter which is free from halogen atoms bonded directly to a phosphorus atom, and optionally a free radical polymerization catalyst, and an accelerator for the catalyst.
    Type: Grant
    Filed: June 21, 1989
    Date of Patent: October 30, 1990
    Assignee: Dentsply Research & Development Corp.
    Inventors: Chin-Teh Huang, Gordon B. Blackwell
  • Patent number: 4937159
    Abstract: A photohardenable composition comprising a free radical addition polymerizable or crosslinkable compound and an ionic dye-counter ion compound, said compound being capable of absorbing actinic radiation and producing free radicals which initiate free radical polymerization or crosslinking of said compound; and photosensitive materials incorporating the same.
    Type: Grant
    Filed: December 7, 1988
    Date of Patent: June 26, 1990
    Assignee: The Mead Corporation
    Inventors: Peter Gottschalk, Douglas C. Neckers, Gary B. Schuster, Paul C. Adair, S. Peter Pappas
  • Patent number: 4918114
    Abstract: A process for preparing a telechelic vinyl resin of a low molecular weight having alkoxysilylalkyl thioether groups at both termini, which comprises subjecting 1 to 20 parts by weight of one or more of a disulfide compound, 0.01 to 1 part by weight of one or more of a tetrasulfide compound, and 100 parts by weight of a vinyl monomer to photopolymerization reaction, a part of the vinyl monomer being optionally substituted with a monomer having an alkoxysilyl group, and the resin prepared by said process. The resin of the present invention provides a crosslinkable resin having an excellent physical strength after curing and can be used for paints, adhesives, sealants, pressure-sensitive adhesives and the like.
    Type: Grant
    Filed: November 30, 1988
    Date of Patent: April 17, 1990
    Assignee: Sunstar Giken Kabushiki Kaisha
    Inventors: Akira Kuriyama, Hiromu Okamoto
  • Patent number: 4916169
    Abstract: A process for the addition of compounds containing silicon-bonded hydrogen to compounds containing aliphatic unsaturation and compositions suitable for said process. The process is activated by visible radiation and is conducted in the presence of a platinum complex having one cyclopentadienyl group that is eta-bonded to the platinum atom and three aliphatic groups that are sigma-bonded to the platinum atom and a sensitizer that is capable of absorbing visible light and is capable of transferring energy to said platinum complex such that the hydrosilation reaction is initiated upon exposure to visible light. The invention also provides for use in the aforementioned process.
    Type: Grant
    Filed: September 9, 1988
    Date of Patent: April 10, 1990
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Larry D. Boardman, Joel D. Oxman
  • Patent number: 4874685
    Abstract: The present invention provide a dye-sensitized photopolymerizable composition comprising a free radical addition polymerizable material, and a photoinitiator, the photoinitiator consisting essentially of a photoreducible dye, a thiol, and an N,N'-dialkylaniline.
    Type: Grant
    Filed: November 27, 1987
    Date of Patent: October 17, 1989
    Assignee: The Mead Corporation
    Inventor: Paul C. Adair
  • Patent number: 4859572
    Abstract: A photographic imaging system is disclosed comprised of a hardenable organic component containing ethylenic unsaturation sites and an initiator system for ethylenic addition. The initiator system is comprised of an electron acceptor activator, an electron donor activator, and, acting as a photosensitizer, a dye capable of absorbing imaging radiation. The dye has a reduction potential related to that of the electron acceptor activator and an oxidation potential related to that of the electron donor activator to permit each to release a free radical upon excitation of the photosensitizer by exposure to actinic radiation.
    Type: Grant
    Filed: May 2, 1988
    Date of Patent: August 22, 1989
    Assignee: Eastman Kodak Company
    Inventors: Samir Y. Farid, Roger E. Moody
  • Patent number: 4826888
    Abstract: A photopolymerizable composition comprising a vinyl monomer, a mercaptocarboxylic acid/.alpha.-diketone photopolymerization initiator and a storage stabilizer. The composition may admit of a filler, and exhibits excellent mechanical strength, storage stability, color and resistance to coloring, and availability.
    Type: Grant
    Filed: April 2, 1986
    Date of Patent: May 2, 1989
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Isao Sasaki, Nobuhiro Mukai, Hitoshi Ige
  • Patent number: 4816495
    Abstract: A biologically compatible adhesive that is shelf stable as a single component adhesive and includes a mixture of an adhesive promoting and polymerizable monomer system having a free radical polymerizable monomer or prepolymer having ethylenic unsaturation and a phosphorus containing adhesion promoter which is free from halogen atoms bonded directly to a phosphorus atom, a free radical polymerization catalyst, and an accelerator for the catalyst, the accelerator selected from the group consisting of sulfinic acid or salt thereof, amine or amine salt and mixtures thereof.
    Type: Grant
    Filed: December 9, 1986
    Date of Patent: March 28, 1989
    Assignee: Dentsply Research & Development Corp.
    Inventors: Gordon B. Blackwell, Chin-Teh Huang
  • Patent number: 4813875
    Abstract: Disclosed is a new urethane polyacrylate having at least one terminal isocyanato acrylic pendent radical. Preferably the molecular chain within the acrylate caps has been extended with a polyhydroxy compound just before final end capping with isocyanato acrylic. The isocyanato acrylic is preferably isocyanato ethyl methacrylate and the urethane is diisocyanate capped polyether and the polyether radical is oxyalkylene. The method for producing the urethane polyacrylate involves end capping a polyol with diisocyanate yielding a reaction product with two reactive equivalents of isocyanate and then capping less than all of the isocyanate with a hydroxyacrylate, after which the remaining isocyanate is reacted with polyol to provide chain extension. The chain extending polyol is then capped with a isocyanato acrylic.
    Type: Grant
    Filed: November 26, 1986
    Date of Patent: March 21, 1989
    Assignee: Dentsply Research & Development Corp.
    Inventor: Pamela H. Hare
  • Patent number: 4810618
    Abstract: A photopolymerizable composition comprises at least one polymerizable compound having at least one ethylenically unsaturated bond therein and at least one photopolymerization initiator and optionally at least one linear organic high molecular weight polymer and characterized in that the photopolymerization initiator comprises a specific combination of two kinds of compounds, for instance, 2,4,6-tris(trichloromethyl)-s-triazine and compound (12) represented by the following formula: ##STR1## The photopolymerizable composition exhibits a high sensitivity to extremely wide range of actinic rays extending from ultraviolet light to visible light and is useful for manufacturing PS plates and photoresist layer for use in making print circuit-boards or the like.
    Type: Grant
    Filed: January 11, 1988
    Date of Patent: March 7, 1989
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Mitsuru Koike, Koichi Kawamura
  • Patent number: 4777190
    Abstract: A photopolymerizable composition comprising a vinylic compound, a sulfur-containing compound and an .alpha.-diketone is disclosed. The sulfur-containing compound may be a mercaptobenzoic acid or a polysulfide.
    Type: Grant
    Filed: August 15, 1985
    Date of Patent: October 11, 1988
    Assignee: Mitsubishi Rayon Company Limited
    Inventors: Isao Sasaki, Nobuhiro Mukai
  • Patent number: 4742092
    Abstract: The curable organopolysiloxane composition of the invention is formulated with two kinds of crosslinking agents including an organosilane compound having 2 or 3 isopropenyloxy groups in a molecule and an organopolysiloxane having at least 2 mercapto groups in a molecule added to the base ingredient of a hydroxy-terminated diorganopolysiloxane together with a curing catalyst and a photosensitizer. The composition has two-way curability by the condensation reaction in the presence of atmospheric moisture between the silanolic hydroxy groups and the isopropenyloxy groups and by the ultraviolet-induced addition reaction between the isopropenyloxy groups and the mercapto groups to exhibit very reliable curing behavior giving a cured rubbery elastomer having excellent properties.
    Type: Grant
    Filed: October 14, 1986
    Date of Patent: May 3, 1988
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshio Inoue, Masatoshi Arai