Specified Rate-affecting Material Contains Sulfur Patents (Class 522/27)
  • Patent number: 10961345
    Abstract: The present invention discloses a curable composition comprising: an epoxy compound represented by the following Formula (1); and one selected from the group consisting of: a thermal cationic polymerization initiator, an acid anhydride-based curing agent and a curing accelerator, and a photo-cationic polymerization initiator as well as the cured product therefrom. The above described curable composition is useful in that it allows for the production of a cured product having a high heat resistance. (In the Formula (1), A represents CR17R18; B represents CR19R20; R1 to R20 each independently represents a substituent selected from the group consisting of a hydrogen atom, an alkyl group and an alkoxy group; and n represents 0 or 1, with the proviso that when n is 0, m represents 1, and when n is 1, m represents 0.
    Type: Grant
    Filed: March 22, 2017
    Date of Patent: March 30, 2021
    Assignee: ENEOS CORPORATION
    Inventors: Atsushi Kameyama, Ryuichi Ueno, Hisashi Sone, Shohei Takata, Takashi Seki
  • Patent number: 10907056
    Abstract: A low viscosity energy curable epoxy resin composition essentially free of solvent for preparing an ink composition comprising: (a) at least one divinylarene dioxide compound, (b) at least one cycloaliphatic epoxy resin, (c) at least one vinyl ether compound, (d) at least one cationic photoinitiator, (e) at least one pigment, and (f) optionally, at least one oxetane; wherein (i) the viscosity of the curable composition is less than or equal to about 50 mPa·s at 25° C., (ii) the composition cures at a relative humidity of greater than 30%, and (iii) the composition cures with an increase in cure time of less than 100% when the composition is cured at a relative humidity of at least 70% compared to that of a composition that is cured at a relative humidity of less than or equal to 45%. The curable epoxy resin composition is useful, for example, for preparing an ink composition; and more specifically for preparing a solventless low viscosity UV curable inkjet ink composition.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: February 2, 2021
    Assignee: Blue Cube IP LLC
    Inventors: Hamed Lakrout, Katherine Clement, Maurice J. Marks
  • Patent number: 10640687
    Abstract: Controlled radical initiators, reaction mixtures containing the controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, and crosslinked compositions formed from the crosslinkable compositions are provided. The controlled radical initiators are bis-dithiocarbamate or bis-dithiocarbonate compounds having a single carbon between the two dithiocarbamate or dithiocarbonate groups.
    Type: Grant
    Filed: March 23, 2018
    Date of Patent: May 5, 2020
    Assignee: 3M Innovative Properties Company
    Inventors: Kevin M. Lewandowski, Babu N. Gaddam, Stephen B. Roscoe, John L. Battiste
  • Patent number: 10392409
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: August 27, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
  • Patent number: 8980968
    Abstract: A photosensitive resin composition includes (a) a compound polymerizable in the presence of an acid, and (b) a photoacid generating agent including an onium salt having a cationic part structure represented by formula (b1) below and an anionic part structure represented by formula (b2) below, wherein the component (b) absorbs 50% or more of the amount of 365 nm wavelength light absorbed by the photosensitive resin composition,
    Type: Grant
    Filed: February 1, 2011
    Date of Patent: March 17, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hyo Takahashi, Ken Ikegame, Masako Shimomura
  • Patent number: 8901198
    Abstract: Disclosed herein are solventborne liquid UV-curable coating compositions comprising: a radiation curable compound comprising an acrylate-terminated compound having greater than two unsaturated sites, wherein the acrylate-terminated compound comprises a reaction product of reactants comprising: an adduct of a polyisocyanate, wherein the adduct of a polyisocyanate comprises a reaction product of reactants comprising a polyisocyanate comprising greater than two isocyanate groups and a compound having groups reactive with the isocyanate groups of the polyisocyanate; and an active hydrogen-containing acrylate; and a photoinitiator composition that includes a first photoinitiator composition for providing surface cure and a second photoinitiator composition for providing through cure of the resultant coating layer. Also disclosed are related multi-component composite coatings, coated substrates, and methods for coating a substrate.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: December 2, 2014
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Charles M. Kania, Kenneth T. Phelps, Kurt A. Humbert, Todd M. Roper, Jiping Shao, David C. Martin
  • Publication number: 20140329023
    Abstract: Method of producing a high voltage electrical insulation, in that (i) an ultra-violet radiation as well as thermally curable composition, comprising at least one UV-curable and heat-curable epoxy resin, at least one cationic photo-initiator and at least one cationic thermal-initiator, is provided, and that (ii) ultraviolet radiation as well as heat is applied to the curable composition in any desired sequence for a time long enough until complete curing of the curable composition is obtained and products obtained.
    Type: Application
    Filed: September 9, 2011
    Publication date: November 6, 2014
    Applicant: ABB RESEARCH LTD.
    Inventors: Anna Di Gianni, Lars E. Schmidt, Patrick Meier, Marco Sangermano
  • Patent number: 8846779
    Abstract: The present invention provides an energy ray-curable ink composition excellent in the continuous discharge property, and excellent in curability and adherability. The present invention relates to an energy ray-curable ink composition which contains a coloring agent, contains only a monofunctional monomer having an acrylic equivalent of 300 or less, and having one ethylenic double bond in one molecule, and a polyfunctional monomer having an acrylic equivalent of 150 or less, and having two or more ethylenic double bonds in one molecule as a polymerizable compound, contains an ?-aminoalkylphenone compound and a thioxanthone compound as a photopolymerization initiator, and contains a silicone compound having a polydimethylsiloxane structure as a surface conditioner.
    Type: Grant
    Filed: May 15, 2009
    Date of Patent: September 30, 2014
    Assignee: Hitachi Maxell, Ltd.
    Inventors: Katsuyuki Kito, Masayuki Oya, Satoshi Kobayashi
  • Patent number: 8741979
    Abstract: Readily emulsifyable silicone copolymers containing urethanesulfonamido linking groups are prepared by reacting a hydroxyl-functional organic polymer with a halo- or pseudohalo-sulfonyl isocyanate, and then reacting the halo- or pseudohalo-sulfonyl product with an organopolysiloxane bearing aminoalkyl groups, preferably in stoichiometric excess.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: June 3, 2014
    Assignee: Wacker Chemie AG
    Inventors: Christian Herzig, Christine Sivac
  • Patent number: 8735511
    Abstract: A curing resin composition that cures in two stages: photo cure and thermal cure, hardly contaminates a liquid or liquid crystals when in contact with, and provides high adhesive strength, particularly a curing composition that photocures sufficiently even when shadowed by TFT wires, a black matrix, etc. in photocuring; and a sealant, a sealant for ODF (one-drop-fill), and an LCD containing the curing resin composition.
    Type: Grant
    Filed: April 20, 2011
    Date of Patent: May 27, 2014
    Assignee: Adeka Corporation
    Inventors: Hirokatsu Shinano, Hiroya Fukunaga, Kazuyuki Itano
  • Patent number: 8557889
    Abstract: The invention provides an ink composition including a sensitizer represented by the following Formula (I), a photopolymerization initiator, and a polymerizable compound having an ethylenic unsaturated bond. In the Formula (I), R1, R6 and R8 each independently represent a hydrogen atom, a hydroxyl group, a halogen atom, a linear or branched alkyl group which may be substituted, or an alkoxy group which may be substituted. R2, R4, R5 and R7 each independently represent a hydrogen atom, a halogen atom, or a cyano group. R3 represents a hydrogen atom, a linear or branched alkyl group which may be substituted, or a cycloalkyl group which may be substituted.
    Type: Grant
    Filed: November 25, 2009
    Date of Patent: October 15, 2013
    Assignee: FUJIFILM Corporation
    Inventor: Tokihiko Matsumura
  • Patent number: 8507573
    Abstract: There is provided an inkjet ink which has satisfactory storage stability and inkjet ejection stability, exhibits excellent curability, and is capable of forming high quality images on coated paper by an inkjet system. Disclosed is an active energy ray curable inkjet ink composition comprising: 15-75% by weight of at least one polymerizable bifunctional monomer selected from the group consisting of dipropylene glycol diacrylate and 1,9-nonanediol diacrylate; and 1% by weight to 10% by weight of [4-(methylphenylthio)phenyl]phenylmethanone as a photopolymerization initiator.
    Type: Grant
    Filed: June 29, 2011
    Date of Patent: August 13, 2013
    Assignees: Toyo Ink SC Holdings Co., Ltd., Toyo Ink Co., Ltd.
    Inventors: Yuji Kameyama, Norio Suzuki, Yohei Konda, Kazuhiro Jonai
  • Patent number: 8349461
    Abstract: A photo-curing polysiloxane composition includes a polysiloxane, an o-naphthoquinonediazidesulfonate compound, and a solvent. The polysiloxane contains less than 30 wt % of a polysiloxane fraction having a molecular weight above 8,000, and 35 wt % to 60 wt % of a polysiloxane fraction having a molecular weight ranging from 500 to 2,000 when calculated from an integral molecular weight distribution curve obtained by plotting cumulative weight percentage versus molecular weight falling within a range between 500 and 50,000 measured by gel permeation chromatography. A protective film formed from the photo-curing polysiloxane composition and an element containing the protective film are also disclosed.
    Type: Grant
    Filed: August 19, 2011
    Date of Patent: January 8, 2013
    Assignee: Chi Mei Corporation
    Inventors: Ming-Ju Wu, Chun-An Shih
  • Publication number: 20120259031
    Abstract: Disclosed is a photocurable resin composition for additive fabrication comprising a polymerizable component that is polymerizable by free-radical polymerization, cat ionic polymerization, or both free-radical polymerization and cationic polymerization, and a photoinitiating system capable of initiating the free-radical polymerization, cationic polymerization, or both free-radical polymerization and cationic polymerization. The photocurable resin composition is a liquid at about 25° C., and is capable of curing to provide a solid upon irradiation with light emitted from a light emitting diode (LED), wherein the light has a wavelength of from about 100 nm to about 900 nm. Also disclosed is a three-dimensional article prepared from the photocurable resin composition for additive fabrication, and a process for preparing three-dimensional articles by additive fabrication.
    Type: Application
    Filed: December 16, 2010
    Publication date: October 11, 2012
    Applicant: DSM IP ASSETS, B.V.
    Inventors: Ken Dake, Jigeng Xu, Timothy Bishop
  • Patent number: 8236872
    Abstract: A photocationically polymerizable adhesive composition and an optical member, the photocationically polymerizable adhesive composition including about 75 to about 99.8 parts by weight of a compound including one of aliphatic epoxy, alicyclic epoxy, oxetane, and vinyl ether compounds, about 0.1 to about 5 parts by weight of a titanate coupling agent, and about 0.1 to about 20 parts by weight of a photopolymerization initiator, wherein a sum of weights of the compound, the titanate coupling agent, and the photopolymerization initiator is 100 parts by weight.
    Type: Grant
    Filed: April 22, 2011
    Date of Patent: August 7, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Cheong Hun Song, Hiroshi Ogawa, Tatsuhiro Suwa
  • Patent number: 8217095
    Abstract: The object of the present invention is to provide an active energy ray-curable ink-jet printing ink, including: a coloring agent; a compound having an ethylenic double bond; and a photo-polymerization initiator, wherein the photo-polymerization initiator includes a compound represented by general formula (1): (wherein A represents any one of —O—, —CH2—, —CH(CH3)—, and —C(CH3)2—; and each of R1 and R2 independently represents a hydrogen atom, a methyl group, or a trimethylsilyl group), and an ?-aminoketone-based compound and/or an acyl phosphine oxide-based compound, and 40% by mass or more of the compound represented by general formula (1) is included with respect to the total photo-polymerization initiator.
    Type: Grant
    Filed: October 28, 2005
    Date of Patent: July 10, 2012
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Hisao Yamaguchi, Yutaka Yamada, Naohito Saito, Osamu Oshima
  • Patent number: 8207239
    Abstract: The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound.
    Type: Grant
    Filed: October 17, 2011
    Date of Patent: June 26, 2012
    Assignees: DSM IP Assets B.V., JSR Corporation, Japan Fine Coatings Co. Ltd.
    Inventors: Katsuyuki Takase, Takayoshi Tanabe, Noriyasu Shinohara
  • Patent number: 8198343
    Abstract: A dental, paste/paste self-adhesive cement includes a polymerizable acidic monomer or monomer mixtures; a polymerizable non-acidic monomer or monomer mixtures, a photo-initiator and/or a co-initiator, a reducing agent such as a benzoylthiourea and other substituted benzoylthiourea, an oxidizing agent, a thermal stabilizer and a glass filler.
    Type: Grant
    Filed: April 25, 2008
    Date of Patent: June 12, 2012
    Assignee: DENTSPLY International Inc.
    Inventor: Huaibing Liu
  • Publication number: 20120129968
    Abstract: The invention relates to a liquid bis(acyl)phosphine oxide of formula (I): wherein R is C1-C18 alkyl, and wherein R is optionally substituted as described herein. The invention also relates to radiation curable compositions comprising liquid bis(acyl)phosphine oxide of formula (I).
    Type: Application
    Filed: June 21, 2011
    Publication date: May 24, 2012
    Inventor: Timothy Edward Bishop
  • Patent number: 8158326
    Abstract: A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
    Type: Grant
    Filed: August 13, 2008
    Date of Patent: April 17, 2012
    Assignee: Fujifilm Corporation
    Inventors: Kunihiko Kodama, Kenji Wada, Kaoru Iwato
  • Patent number: 8092869
    Abstract: There is provided an ink composition for ink jet recording, including (A) N-vinyllactam, (B) a compound having a partial structure represented by the following formula (I) and a polymerizable unsaturated bond, and (C) a radical polymerization initiator. In formula (I), R1 represents a hydrogen atom or an alkyl group, and R2 to R5 each independently represent a methyl group or an ethyl group.
    Type: Grant
    Filed: September 15, 2008
    Date of Patent: January 10, 2012
    Assignee: Fujifilm Corporation
    Inventors: Ippei Nakamura, Yuuichi Hayata
  • Publication number: 20120003435
    Abstract: There is provided an inkjet ink which has satisfactory storage stability and inkjet ejection stability, exhibits excellent curability, and is capable of forming high quality images on coated paper by an inkjet system. Disclosed is an active energy ray curable inkjet ink composition comprising: 15-75% by weight of at least one polymerizable bifunctional monomer selected from the group consisting of dipropylene glycol diacrylate and 1,9-nonanediol diacrylate; and 1% by weight to 10% by weight of [4-(methylphenylthio)phenyl]phenylmethanone as a photopolymerization initiator.
    Type: Application
    Filed: June 29, 2011
    Publication date: January 5, 2012
    Applicants: TOYO INK CO., LTD., TOYO INK SC HOLDINGS CO., LTD.
    Inventors: Yuji KAMEYAMA, Norio SUZUKI, Yohei KONDA, Kazuhiro JONAI
  • Publication number: 20110319513
    Abstract: A spray coatable adhesive composition used for bonding silicon dies to a rigid substrate, preferable a silicon substrate is disclosed. The adhesive composition includes an epoxy based resin, a thermal acid generator, a photoacid generator and a solvent. The epoxy based resin includes a mixture of a solid bisphenol A epoxy resin and a liquid or semi-liquid hydrogenated bisphenol A epoxy resin at a weight ratio ranging from about 80:20 to about 65:35. The adhesive composition has a low viscosity which allows it to be spray coated on a rigid substrate and form thin film adhesive which allows silicon dies to be bonded with precise placement on the silicon substrate.
    Type: Application
    Filed: June 24, 2011
    Publication date: December 29, 2011
    Inventors: Xiaoming Wu, Paul Dryer, David Rhine, Anna Pearson, Jeanne Marie Saldanha Singh, Richard Wells, Joel Provence
  • Patent number: 8048613
    Abstract: An alkali development-type solder resist includes (A) a carboxyl group-containing photosensitive resin obtained by reacting (a) a compound having two or more cyclic ether or thioether groups in the molecule with (b) an unsaturated monocarboxylic acid, reacting the product with (c) a polybasic acid anhydride, reacting the resulting resin with (d) a compound having a cyclic ether group and an ethylenic unsaturated group in the molecule, and reacting the product additionally with (c) a polybasic acid anhydride, (B) an oxime ester-based photopolymerization initiator containing a specific oxime ester group, (C) a compound having two or more ethylenic unsaturated groups in the molecule, and (D) a thermosetting component, wherein the dry film obtained by applying the composition has an absorbance of 0.3 to 1.2 per 25 ?m of the film thickness at a wavelength of 350 to 375 nm.
    Type: Grant
    Filed: October 13, 2008
    Date of Patent: November 1, 2011
    Assignee: Taiyo Ink Mfg. Co., Ltd.
    Inventors: Nobuhito Itoh, Yoko Shibasaki, Kenji Kato, Masao Arima
  • Publication number: 20110046255
    Abstract: The invention relates to a coating formulation for preparing a hydrophilic coating, wherein the hydrophilic coating formulation comprises a hydrophilic polymer, a supporting polymer comprising a backbone and at least 2 reactive moieties capable of undergoing polymerization reactions, a Norrish Type I photoinitiator and a Norrish Type II photoinitiator.
    Type: Application
    Filed: February 27, 2008
    Publication date: February 24, 2011
    Inventor: Marnix Rooijmans
  • Patent number: 7893129
    Abstract: Stable, highly filled cationic dental compositions useful for the production of dental prostheses and dental restoration materials contain: (1) at least one compound which is reactive cationically when activated, advantageously at least one UV- and cationically reactive oxirane-functionalized silicone; (2) at least one dental filler, advantageously SiO2; (3) at least one organic polymer or copolymer dispersant having an amine index less than or equal to 100 mg of potassium hydroxide per gram of dispersant, advantageously a polyurethane/acrylate copolymer or alkylammonium salt thereof; (4) at least one cationic photoinitiator, advantageously iodonium borate; and (5) optionally, at least one photosensitizer.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Patent number: 7893130
    Abstract: Dental compositions are described which are photocurable by radiation with a wavelength greater than 390 nm. The compositions include a cationically active compound, a dental filler, optionally a dispersant, a cationic photoinitiator and a photosensitizer which is a thioxanthone salt substituted by at least one group containing an ammonium function. The composition has the advantage of remedying the color stability problems of finished dental products after crosslinking.
    Type: Grant
    Filed: May 10, 2005
    Date of Patent: February 22, 2011
    Assignee: Bluestar Silicones France SAS
    Inventor: Jean-Marc Frances
  • Publication number: 20100304100
    Abstract: The present invention provides a low viscosity photocurable composition including (i) a cationically curable component comprising a polyglycidyl epoxy compound (II) a free radically active component (iii) a cationic photoinitiator (v) a free radical photoinitiator and optionally (iv) one or more optional components. The photocurable composition can be cured using rapid prototyping techniques to form clear, colorless three-dimensional articles having excellent mechanical properties.
    Type: Application
    Filed: November 21, 2008
    Publication date: December 2, 2010
    Inventor: John Wai Fong
  • Patent number: 7776940
    Abstract: Hardenable and hardened dental compositions, and articles including such hardenable and hardened compositions, are provided. In some embodiments, the hardenable dental compositions include an acid-generating component and an acid-reactive component including one or more acid-reactive groups. Upon irradiating, and optionally heating, the hardened compositions are useful, for example, for reducing the bond strength of orthodontic appliances adhered to tooth structures with the hardened compositions.
    Type: Grant
    Filed: December 20, 2005
    Date of Patent: August 17, 2010
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Joan V. Brennan, Babu N. Gaddam
  • Publication number: 20100190881
    Abstract: There are provided liquid radiation-curable compositions useful for the production of three-dimensional solid articles in solid freeform fabrication systems. The compositions include a cationically polymerizing alicyclic epoxide having at least two epoxy groups, at least one cationic photoinitiator; at least one free radical photoinitiator; and at least one dendritic polymer having either at least six hydroxyl functional groups or at least six (meth)acrylate functional groups.
    Type: Application
    Filed: January 28, 2009
    Publication date: July 29, 2010
    Inventor: Bettina Steinmann
  • Patent number: 7754780
    Abstract: A method for forming a pattern includes forming an etching object layer on a substrate, applying a resist on an etching object layer, the resist including a photo-initiator, and a liquid pre-polymer including a vinyl functional group and a hydrophilic functional group, shaping the resist using a mold plate having an imprint formed therein, and hardening the resist to form a resist pattern while the mold plate shaping the resist corresponding to the imprint.
    Type: Grant
    Filed: June 9, 2005
    Date of Patent: July 13, 2010
    Assignee: LG Display Co., Ltd.
    Inventor: Jin-Wuk Kim
  • Patent number: 7740482
    Abstract: Stable and substantially filled cationic dental compositions are described which include: (1) at least one cationically reactive compound (A); (2) at least one dental filler (B); (3) optionally, at least one dispersant (C) composed of at least one organic polymer or copolymer; (4) at least one cationic photoinitiator (D); and (5) optionally, at least one photosensitizer (E). The dental filler (B) is treated with at least one organosilicon coupling agent (F), and at least one compound (G). The organosilicon coupling agent (F) has at least one reactive function (rfA) directly linked to a silicon atom forming after activation of a chemical bond with the dental filler, and at least one reactive function (rfB) not directly linked to a silicon atom, forming after activation, a chemical bond with a reactive function (rfC) of the compound (G).
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: June 22, 2010
    Assignee: Bluestar Silicones France
    Inventors: Jean-Marc Frances, Martial Deruelle, Yves Giraud
  • Patent number: 7718713
    Abstract: A method of manufacturing super-absorbent polymer (SAP) which is powdery, insoluble in water, and able to absorb water, blood and urine with slight soluble substances. The method includes at least the following steps: mixing a monomer solution having at least 50 mol % of neutralized acrylic acid with polymerization initiators to synthesize a sticky precursor, wherein the monomer can be selected from acrylic acid, methacrylic acid, 2-acrylamido-2-methyl-propane sulfonic acid, or the mixtures thereof; mixing high hydrophilic epoxy compounds and polymerization initiators with the precursor and producing a gel via UV cross-linking; drying the gel at temperature of 100 to 250° C. to obtain a polymer; grinding and screening the polymer into constant particle size; coating the polymer with surface cross-linking agents; heating the polymer at temperature of 80 to 230° C.; and adding powdery inert inorganic salts into the polymer.
    Type: Grant
    Filed: October 2, 2006
    Date of Patent: May 18, 2010
    Assignee: Formosa Plastics Corporation
    Inventors: Kai Yao Shih, Cheng Chang Wu, Yung Chung Li
  • Patent number: 7714162
    Abstract: To provide such a base multiplying agent capable of being used for crosslinking reaction, for example of a epoxy compound and the like, that generates another base by action of a base, and can efficiently perform base multiplying reaction, and a base-reactive curable composition using the base multiplying agent. The base generating agent of the invention is represented by the following formula (1): (In the formula (1), X represents a hydrogen atom, a substituted alkyl group or an unsubstituted alkyl group; Y represents a substituted or unsubstituted alkylene chain; and n represents an integer of from 1 to 4.
    Type: Grant
    Filed: March 6, 2006
    Date of Patent: May 11, 2010
    Assignee: Sekisui Chemical Co., Ltd.
    Inventors: Kenichi Aoki, Kunihiro Ichimura, Motoi Nagano, Hiroji Fukui
  • Publication number: 20100041784
    Abstract: A radiation curable composition comprising a curable compound, a photo-initiator and a co-initiator characterized in that said co-initiator is represented by Formula (I), wherein MA is the residue of a mono- or oligofunctional Michael acceptor; L is a divalent linking group positioning the two tertiary amines in a 1-3 to 1-10 position, with the proviso that both amines are aliphatic; R1, R2 and R3 independently represent an optionally substituted alkyl group, an optionally substituted alkenyl group, an optionally substituted alkynyl group or an optionally substituted (hetero) alkaryl group; any two of R1, R2 and R3 may represent the necessary atoms to form a ring; any two of R1, R2 and R3 may represent the necessary atoms to form a ring with any of the atoms of the linking group L; n is an integer ranging from 1 to 6.
    Type: Application
    Filed: December 17, 2007
    Publication date: February 18, 2010
    Applicant: Agfa Graphics NV
    Inventors: Johan Loccufier, Roland Claes, Jaymes Van Luppen
  • Patent number: 7662541
    Abstract: A photosensitive resin composition and a photosensitive dry film which are excellent in both sensitivity and stability and are well-balanced in tent strength, resolution and plating non-staining are provided. The photosensitive resin composition comprises an alkali-soluble resin (A), a photopolymerizable compound (B) and a photopolymerization initiator (C), and the polymerization initiator (C) comprises a hexaarylbisimidazole based compound (C1) and a multifunctional thiol compound (C2) as essential components. The photosensitive dry film has at least a photosensitive resin layer formed from the photosensitive resin composition on a support film.
    Type: Grant
    Filed: November 22, 2005
    Date of Patent: February 16, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Teruhiro Uematsu, Naoya Katsumata
  • Patent number: 7625955
    Abstract: A porous article which is formed from a polymeric material, in which characteristics of the surface of the article provided by the polymeric material are modified by having grafted to it chains of polymerized vinyl monomer units, in which the chains each comprise a number of units of a first vinyl monomer and include a unit of a second vinyl monomer which is different from the first vinyl monomer. Preferably, the ratio of the number of units of the first vinyl monomer in each chain to the number of units of the second vinyl monomer is not more than about 60. When the number of second vinyl monomer units in each chain is one, the mean number of first vinyl monomer units in each chain will be not more than 60.
    Type: Grant
    Filed: August 11, 2003
    Date of Patent: December 1, 2009
    Assignee: Freudenberg Nonwovens LP
    Inventors: Giovanni Gentilcore, Tracy Hoar
  • Patent number: 7618683
    Abstract: An ink composition is provided that includes (A) an acid-generating compound having an anion represented by any one of Formulae (I) to (XI), (B) a cationically polymerizable compound, and (C) a colorant. (In the formulae, R1 to R3 independently denote a monovalent organic group, Rb1 to Rb3, Rf1, and Rf2 independently denote a perfluoroalkyl group, a perfluoroaryl group, or an aryl group substituted with at least one fluorine atom or perfluoroalkyl group, X1 to X3 independently denote a monovalent organic group, and Y1 denotes a hydrogen atom or a monovalent organic group.
    Type: Grant
    Filed: January 5, 2007
    Date of Patent: November 17, 2009
    Assignee: FUJIFILM Corporation
    Inventor: Tomotaka Tsuchimura
  • Patent number: 7601465
    Abstract: A holographic recording medium has a recording layer including a radical-polymerizable compound, a first photo-radical polymerization initiator (A) containing a titanocene compound, and a second photo-radical polymerization initiator (B) containing at least one compound selected from the group consisting of an amino acetophenone derivative, an acylphosphine oxide derivative, a benzyl derivative, and a thioxanthone derivative.
    Type: Grant
    Filed: March 28, 2006
    Date of Patent: October 13, 2009
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Rumiko Hayase, Akiko Hirao, Kazuki Matsumoto, Norikatsu Sasao
  • Patent number: 7595144
    Abstract: There is provided an anti-reflective coating forming composition for lithography comprising a polymer compound, a crosslinking compound, a crosslinking catalyst, a sulfonate compound and a solvent. The anti-reflective coating obtained from the composition has a high preventive effect for reflected light, causes no intermixing with photoresists, has a higher dry etching rate compared with photoresists, can form a photoresist pattern having no footing at the lower part, and can use in lithography process by use of a light such as ArF excimer laser beam and F2 excimer laser beam, etc.
    Type: Grant
    Filed: October 25, 2005
    Date of Patent: September 29, 2009
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Takahiro Kishioka, Tadashi Hatanaka, Shigeo Kimura
  • Publication number: 20090239966
    Abstract: This invention is to provide a method for surface-treatment of a water absorbent resin excelling in water absorption properties. This invention relates to a method for the surface-treatment of a water absorbent resin, which comprises: a) mixing 100 parts by weight of a water absorbent resin, 0.01-20 parts by weight of at least one radical polymerization initiator selected from the group-consisting of persulfates, hydrogen peroxide, and azo compounds, and a radically polymerizing compound and b) irradiating the resultant mixture with active energy rays. The treatment particularly exalts the absorption ratio against pressure and the saline flow conductivity.
    Type: Application
    Filed: December 9, 2005
    Publication date: September 24, 2009
    Applicant: NIPPON SHOKUBAI CO., LTD.
    Inventors: Makoto Matsumoto, Yoshiro Mitsukami, Hiroyuki Ikeuchi, Kazushi Torii, Taku Iwamura
  • Patent number: 7582685
    Abstract: A multi-photon reactive composition comprises an ethylenically unsaturated liquid polysilazane precursor, a multi-functional thiol additive, a multi-ethylenically-unsaturated additive different from the polysilazane, and a multi-photon photocuring composition. The invention can be used to provide ceramic-based microstructures as, for example, high temperature resistant materials, including devices such as microcombustors, micro-heat-exchangers, sensor and actuator systems, microfluidic devices, and micro-optics systems that can be used independently or integrated into other systems.
    Type: Grant
    Filed: December 27, 2005
    Date of Patent: September 1, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: David S. Arney, Feng Bai
  • Patent number: 7541389
    Abstract: Compositions are provided that include an electron donor and a sensitizing compound. More specifically, the electron donor is an arylsulfinate salt. Methods of polymerization are also provided that can be used to prepare polymeric material from a photopolymerizable composition that includes ethylenically unsaturated monomers and a photoinitiator system. The photoinitiator system includes an electron donor and a sensitizing compound.
    Type: Grant
    Filed: April 25, 2006
    Date of Patent: June 2, 2009
    Assignee: 3M Innovative Properties Company
    Inventors: Rajdeep S. Kalgutkar, Michael C. Palazzotto
  • Publication number: 20090092767
    Abstract: A stable viscosity coating composition, a method of forming the stable viscosity coating composition and a method for using the stable viscosity coating composition in a micro-molding imprint lithographic process, such as Step and Flash Imprint Lithography is disclosed. The stable viscosity coating composition may include at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and a stabilizer, wherein the stabilizer may be 9-anthracenemethanol, a substituted 9-anthracenemethanol, phenothiazine, or a substituted phenothiazine. The coating composition may include a radiation sensitive photoacid generator (PAG). The method of forming the coating composition comprises combining at least one vinyl ether having at least one vinyl ether group (—OCR?CR2), and at least one stabilizer.
    Type: Application
    Filed: December 16, 2008
    Publication date: April 9, 2009
    Inventors: Frances Anne Houle, Hiroshi Ito
  • Patent number: 7465758
    Abstract: Polymerizable compositions and methods are provided that include an ethylenically unsaturated compound and an arylsulfinate salt. The polymerizable compositions are useful as hardenable dental compositions.
    Type: Grant
    Filed: July 16, 2007
    Date of Patent: December 16, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Afshin Falsafi, Rajdeep S. Kalgutkar, Joel D. Oxman
  • Patent number: 7439277
    Abstract: A process for the preparation of a hydroperoxide functionalized rubber compound by the conversion of triplet state oxygen to singlet state oxygen in the presence of oxygen and a light-induced photoreductant. A dispersion of an unsaturated rubber component in a carrier solvent is introduced into a reactor containing a permeable catalyst bed comprising a light-induced photoreductant component supported on a particulate substrate component and passed through the catalyst bed. A gaseous oxidizing agent is passed through the catalyst bed in contact with the rubber-containing dispersion. The catalyst bed is irradiated with electromagnetic light radiation in the ultraviolet or visible light range at an intensity sufficient to convert triplet oxygen in the oxygenated rubber component to singlet oxygen. The oxygenated rubber component is then recovered from the reactor.
    Type: Grant
    Filed: May 19, 2005
    Date of Patent: October 21, 2008
    Assignee: Fina Technology, Inc.
    Inventors: Jay Reimers, Jose Sosa
  • Patent number: 7435526
    Abstract: A positive photosensitive composition comprises a compound capable of generating a specified sulfonic acid upon irradiation with one of an actinic ray and radiation and (B) a resin capable of decomposing under the action of an acid to increase the solubility in an alkali developer.
    Type: Grant
    Filed: June 14, 2004
    Date of Patent: October 14, 2008
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Toshiaki Aoai
  • Patent number: 7417075
    Abstract: A cationically polymerizable composition containing a cationically polymerizable compound and a cationic polymerization initiator, wherein a total content of a cationic compound, a metal compound and a strong acid compound contained in the cationically polymerizable composition is in the range of 1 to 500 ppm by weight based on the total weight of the cationically polymerizable composition.
    Type: Grant
    Filed: August 22, 2005
    Date of Patent: August 26, 2008
    Assignee: Konica Minolta Medical & Graphic, Inc.
    Inventor: Nobumasa Sasa
  • Publication number: 20080132587
    Abstract: Compositions having a curable unsaturated compound, an adhesion promoter and curing agent which have a peak exotherm of less than 50° C. are disclosed. The compositions when cured are flexible bioadhesives which are also disclosed. Non-curable diluents can be included in the compositions. Flexible bioadhesives formed on biological structures and having low peak exotherms upon curing of curable compositions to form the flexible bioadhesives are disclosed. Compositions having a curable unsaturated compound and a curing agent and a peak exotherm of less than 50° C. are included in the invention.
    Type: Application
    Filed: October 31, 2007
    Publication date: June 5, 2008
    Applicant: Britesmile Professional LLC
    Inventors: Robert Eric Montgomery, Anthony J. Cipolla
  • Patent number: 7365106
    Abstract: A cationically curable composition for dental use containing a cationic polymerization initiator (I) and cationically polymerizable monomers (II), the cationically polymerizable monomers (II) containing an oxetane compound and an epoxy compound or an alkenyl ether compound at a ratio of amounts that satisfy the conditions expressed by the following formula, (a×A):(b×B)=91:9 to 45:55 wherein A is a mol number of the oxetane compound, “a” is an average number of the oxetane functional group contained in one molecule of the oxetane compound, B is a mol number of the epoxy compound or the alkenyl ether compound, and “b” is an average number of the epoxy functional group contained in one molecule of the epoxy compound or an average number of the alkenyl ether functional group contained in one molecule of the alkenyl ether compound.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: April 29, 2008
    Assignees: Tokuyama Corporation, Tokuyama Dental Corporation
    Inventors: Takeshi Suzuki, Hideki Kazama