Fluorine-containing Monomer Contains A Sulfur Atom Patents (Class 526/243)
  • Patent number: 10471396
    Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: November 12, 2019
    Assignee: Pall Corporation
    Inventors: Frank Okezie Onyemauwa, Hassan Ait-Haddou
  • Patent number: 10343122
    Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.
    Type: Grant
    Filed: August 15, 2016
    Date of Patent: July 9, 2019
    Assignee: Pall Corporation
    Inventors: Frank Okezie Onyemauwa, Hassan Ait-Haddou
  • Patent number: 9956447
    Abstract: New high molecular weight fluoropolymers (fluoropolymer surfactants) are provided that are useful in compositions for use as fire extinguishing concentrates. The fluoropolymers contain C4-C6 perfluoroalkyl groups, and substantially lack perfluoroalkyl groups containing more than 6 fluorine-substituted carbon atoms.
    Type: Grant
    Filed: September 25, 2013
    Date of Patent: May 1, 2018
    Assignee: TYCO FIRE & SECURITY GMBH
    Inventors: Thomas Joseph Martin, Ming Li
  • Patent number: 9879110
    Abstract: An AB-type block copolymer for use in printed circuit board (PCB) fabrication is provided having a structure represented by the following formula: wherein R1 is a silane pendant group that includes a silicon-containing moiety capable of bonding to a glass surface, and wherein R2 is a matrix-reactive pendant group that includes at least one moiety (e.g., a vinyl-, allyl-, amine-, amide- or epoxy-containing moiety) capable of reacting with a base polymer.
    Type: Grant
    Filed: November 21, 2014
    Date of Patent: January 30, 2018
    Assignee: International Business Machines Corporation
    Inventors: Dylan J. Boday, Joseph Kuczynski, Timothy C. Mauldin
  • Patent number: 9777170
    Abstract: The present invention comprises a composition and method of use for providing cleanability to paint comprising an aqueous emulsion of Formula (I) wherein the composition of Formula (I) is a random copolymer; wherein said composition of formula (I) further comprises residue from a hydrophilic chain transfer agent. The compositions of the present invention provide durability to coating compositions, while also providing surface effects such as increased water and oil contact angles, enhanced dirt pickup resistance, and enhanced cleanability to the coating films. For these reasons, the composition of the present invention is particularly suitable for use as additives to exterior coatings and paints.
    Type: Grant
    Filed: February 23, 2015
    Date of Patent: October 3, 2017
    Assignee: THE CHEMOURS COMPANY TT, LLC
    Inventors: Anilkumar Raghavanpillai, Timothy Pellenbarg, Hau-Nan Lee, James J. Hughes, Kai Qi, John Russell Crompton, Jr., Brad M Rosen
  • Patent number: 9464384
    Abstract: A water-resistant/oil-resistant agent for paper containing (I) a fluorine-containing copolymer including repeating units derived from: (a) a fluorine-containing monomer that has a fluoroalkyl group and that is represented by general formula (1): CH2?C(—X)—C(?O)—Y—Z—Rf (where X is a hydrogen atom, a linear or branched alkyl group having 1-21 carbon atoms, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or the like; Y is —O— or —NH—; Z is an aliphatic group having 1-10 carbon atoms, an aromatic group having 6-10 carbon atoms, a cycloaliphatic group, or the like; and Rf is a linear or branched fluoroalkyl group having 1-6 carbon atoms), and (b) a (meth)acrylate monomer containing no fluorine atoms; and (II) a polypropylene glycol compound. Also disclosed is a method for treating paper, a treated paper and a composition for treating paper containing the water-resistant/oil resistant agent.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: October 11, 2016
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tetsuya Uehara, Kayo Kusumi, Michio Matsuda
  • Patent number: 9340648
    Abstract: A coating material including a perfluorocarbon sulfonic acid resin which is a copolymer including a polymerization unit represented by —(CF2—CFZ)—, in the formula, Z being H, Cl, F, or a C1-C3 perfluoroalkyl group, and a polymerization unit represented by —(CF2—CF(—O—(CF2)m—SO3H))—, in the formula, m being an integer of 1 to 12, and the perfluorocarbon sulfonic acid resin has an equivalent weight EW of 200 to 1000. Also disclosed is a laminate including a base material and a hydrophilic layer formed from the coating material.
    Type: Grant
    Filed: January 31, 2011
    Date of Patent: May 17, 2016
    Assignees: ASAHI KASEI E-MATERIALS CORPORATION, DAIKIN INDUSTRIES, LTD.
    Inventors: Yuko Iizuka, Naoto Miyake, Tadashi Ino, Masahiro Kondo, Katsuhiko Imoto
  • Patent number: 9206113
    Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(CH3)COO(CH2)nPhXCrF2r+1??(I) (in the formula (I), n is an integer of from 0 to 2, Ph is a phenylene group, X is a single bond or a C1-4 alkylene group containing an etheric oxygen atom, and r is an integer of from 2 to 6).
    Type: Grant
    Filed: March 5, 2012
    Date of Patent: December 8, 2015
    Assignee: Asahi Glass Company, Limited
    Inventor: Taiki Hoshino
  • Patent number: 9182662
    Abstract: A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.
    Type: Grant
    Filed: January 29, 2013
    Date of Patent: November 10, 2015
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Owendi Ongayi, James W. Thackeray
  • Patent number: 9115234
    Abstract: To provide a water/oil repellent composition which can give water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability), a method for producing such a composition, and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A water/oil repellent composition which comprises a copolymer having polymerized units derived from monomer (a), polymerized units derived from monomer (b) and polymerized units derived from monomer (c). Here, monomer (a) is a compound represented by the formula: (Z—Y)nX; wherein Z is a C1-6 perfluoroalkyl group or the like; Y is a bivalent organic group or a single bond; n is 1 or 2; and X is a polymerizable unsaturated group; monomer (b) is a (meth)acrylate having no polyfluoroalkyl group and having an C20-30 alkyl group; and monomer (c) is vinylidene chloride.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: August 25, 2015
    Assignee: Asahi Glass Company, Limited
    Inventors: Minako Shimada, Kazunori Sugiyama, Yuuichi Oomori
  • Patent number: 9104101
    Abstract: A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.
    Type: Grant
    Filed: February 22, 2012
    Date of Patent: August 11, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kensuke Matsuzawa, Jun Iwashita, Yoshitaka Komuro, Masatoshi Arai
  • Publication number: 20150147698
    Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.
    Type: Application
    Filed: November 25, 2014
    Publication date: May 28, 2015
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Jun Hatakeyama, Masayoshi Sagehashi
  • Patent number: 9040596
    Abstract: An ion conducting membrane for fuel cells involves coupling a compound having a sulfonic acid group with a polymeric backbone. Each of the compounds having a sulfonic acid group and the polymeric backbone are first functionalized with a halogen.
    Type: Grant
    Filed: December 28, 2011
    Date of Patent: May 26, 2015
    Assignee: GM Global Technology Operations LLC
    Inventors: Timothy J. Fuller, Lijun Zou, Michael R. Schoeneweiss
  • Publication number: 20150132688
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.
    Type: Application
    Filed: January 26, 2015
    Publication date: May 14, 2015
    Applicant: FUJIFILM Corporation
    Inventors: Natsumi YOKOKAWA, Shuji HIRANO, Hiroo TAKIZAWA, Wataru NIHASHI
  • Patent number: 9029471
    Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.
    Type: Grant
    Filed: September 30, 2008
    Date of Patent: May 12, 2015
    Assignee: E I du Pont du Nemours and Company
    Inventors: Romain Severac, Agnes Ibos, Lamia Heuze, Renaud Laloux-Walther
  • Patent number: 9023581
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Grant
    Filed: June 14, 2011
    Date of Patent: May 5, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Publication number: 20150118628
    Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.
    Type: Application
    Filed: December 23, 2014
    Publication date: April 30, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi KAWABATA, Hideaki TSUBAKI, Hiroo TAKIZAWA, Natsumi YOKOKAWA
  • Patent number: 9017931
    Abstract: A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a tertiary ester type acid labile group having a plurality of methyl or ethyl groups on alicycle and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, baking, and developing in an organic solvent developer so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high dissolution contrast during organic solvent development and forms a fine hole or trench pattern of dimensional uniformity.
    Type: Grant
    Filed: August 16, 2013
    Date of Patent: April 28, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Jun Hatakeyama, Masayoshi Sagehashi, Teppei Adachi
  • Patent number: 9017924
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W1 represents a group which is formed by polymerization reaction of a group containing a polymerizable group; Y1 and Y2 each independently represents a divalent linking group; Y3 represents a carbonyl group or an alkylene group; R2 and R3 each independently represents a fluorine atom or a fluorinated alkyl group; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: April 28, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Yoshiyuki Utsumi
  • Publication number: 20150112036
    Abstract: The present invention relates to a polymer comprising the reaction product of: (a) a compound of Formula (3), or a mixture thereof: defined herein and (b) at least one ethylenically unsaturated monomer having a functional group. The present invention also relates to a polymer having at least one carbamate linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, having isocyanate groups, and (b) at least one fluorinated compound selected from the formula (2): defined herein and (ii) optionally reacting with (c) water, a linking agent, or a mixture thereof. The polymers are useful as additives in coating compositions and film forming foams, which impart surface effects to substrates coated with such compositions and to film forming foams.
    Type: Application
    Filed: October 17, 2013
    Publication date: April 23, 2015
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: Roman B. LARICHEV, Michael Henry OBER, John SINICROPI
  • Patent number: 9005874
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: April 14, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Patent number: 8993682
    Abstract: The present invention provides an electrolyte having high conductivity even under high-temperature low-humidification conditions (e.g. at a temperature of 100 to 120° C. and a humidity of 20 to 50% RH) and thereby makes it possible to realize a higher performance fuel cell. The present invention is a fluoropolymer electrolyte having an equivalent weight (EW) of not less than 250 but not more than 700 and a proton conductivity of not lower than 0.10 S/cm as measured at a temperature of 110° C. and a relative humidity of 50% RH and comprising a COOZ group- or SO3Z group-containing monomer unit, wherein Z represents an alkali metal, an alkaline earth metal, hydrogen atom or NR1R2R3R4 in which R1, R2, R3 and R4 each independently represents an alkyl group containing 1 to 3 carbon atoms or hydrogen atom.
    Type: Grant
    Filed: March 12, 2009
    Date of Patent: March 31, 2015
    Assignees: Asahi Kasei E-Materials Corporation, Daikin Industries, Ltd.
    Inventors: Kohei Kita, Takahiko Murai, Naoki Sakamoto, Naoto Miyake, Tadashi Ino, Noriyuki Shinoki, Masaharu Nakazawa, Masahiro Kondo, Takashi Yoshimura
  • Patent number: 8993713
    Abstract: A n-type ladder copolymer including, a n-type ladder copolymer formed with alternating perylene and pyridine units having chemical structure A having two end groups, where perylene units having at least one solubilizing group attaching at position(s) 1, 6, 7, and/or 12, where R1, R2, R3, and R4 solubilizing group(s) are each independently selected from the group consisting of aryl, alkyl aryl, alkoxy aryl, and aryloxy aryl, and where n repeat units ranging from about 4 to about 400
    Type: Grant
    Filed: May 16, 2013
    Date of Patent: March 31, 2015
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: William W. Lai, Alfred Baca
  • Publication number: 20150086912
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit (A) represented by the specific formula (I) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.
    Type: Application
    Filed: November 26, 2014
    Publication date: March 26, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Takeshi KAWABATA, Hideaki TSUBAKI, Hiroo TAKIZAWA, Natsumi YOKOKAWA
  • Patent number: 8980526
    Abstract: Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: wherein respective substituents are defined in the specification, and a resist composition comprising the same. The hydrophilic photoacid generator is uniformly dispersed in a resist film, thus improving a line edge roughness of resist patterns.
    Type: Grant
    Filed: December 13, 2012
    Date of Patent: March 17, 2015
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Dae Kyung Yoon, Kyoung Jin Ryu, Sung Jae Lee, Hyun Sang Joo
  • Publication number: 20150060744
    Abstract: The present disclosure relates to a blue dye compound for a color filter and a coloring resin composition for a color filter containing the same. Since the blue resin composition according to the present disclosure, which contains the novel triarylmethane blue dye compound or the polymer dye compound obtained using the same as a monomer, has superior solubility in an organic solvent such as propylene glycol monomethyl ether acetate (PGMEA), cyclohexanone, etc. as well as superior miscibility with another pigment and high brightness, it can be used to prepare a color filter exhibiting superior heat resistance, light resistance and brightness.
    Type: Application
    Filed: February 27, 2013
    Publication date: March 5, 2015
    Inventors: Soonhyun Park, Jeong Gi Kim, Jung Rok Kim, Do Kyung Lee, Heon Park
  • Publication number: 20150045524
    Abstract: A functional TFE copolymer fine powder is described, wherein the TFE copolymer is a polymer of TFE and at least one functional comonomer, and wherein the TFE copolymer has functional groups that are pendant to the polymer chain. The functional TFE copolymer fine powder resin is paste extrudable and expandable. Methods for making the functional TFE copolymer are also described. The expanded functional TFE copolymer material may be post-reacted after expansion.
    Type: Application
    Filed: October 24, 2014
    Publication date: February 12, 2015
    Inventors: Ping Xu, Jack J. Hegenbarth, Xin Kang Chen
  • Patent number: 8951710
    Abstract: A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.
    Type: Grant
    Filed: August 4, 2014
    Date of Patent: February 10, 2015
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Daisuke Domon, Satoshi Watanabe
  • Patent number: 8951599
    Abstract: A wound dressing and a method of making the wound dressing is described herein. The wound dressing is formed of an absorbent substrate formed of one or more layers and a low-adherence layer disposed on the substrate. The low-adherence layer can be disposed within at least a portion of the substrate. The low-adherence layer is formed of a mixture of at least one highly fluorinated polymer and at least one acidic polymer. The at least one highly fluorinated polymer has a fluorine content greater than the fluorine content of the at least one acidic polymer.
    Type: Grant
    Filed: November 15, 2012
    Date of Patent: February 10, 2015
    Assignee: International Business Machines Corporation
    Inventors: Robert D. Allen, Christopher E. Bannister, Jere J. Brophy, Richard A. DiPietro
  • Patent number: 8945814
    Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
    Type: Grant
    Filed: September 16, 2013
    Date of Patent: February 3, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: James F. Cameron, Vipul Jain, Paul J. LaBeaume, Jin Wuk Sung, James W. Thackeray
  • Patent number: 8940846
    Abstract: A process for reducing the amount of soluble polymeric fractions in a sulfonyl fluoride polymer. The process comprises contacting the sulfonyl fluoride polymer with a fluorinated fluid followed by separation of the polymer from the fluid. The fluorinated fluid is selected from hydrofluoroethers and hydrofluoropolyethers. The invention further relates to sulfonyl fluoride polymers obtainable by the process and having a heat of fusion not exceeding 4 J/g and containing less than 15% by weight of polymeric fractions having an average content of monomeric units comprising a sulfonyl functional group exceeding 24 mole %. The sulfonyl fluoride polymers so obtained are particularly suitable for the preparation of ionomeric membranes for use in electrochemical devices.
    Type: Grant
    Filed: June 22, 2011
    Date of Patent: January 27, 2015
    Assignee: Solvay Specialty Polymers Italy S.p.A.
    Inventors: Luca Merlo, Alessandro Veneroni, Elvira Pagano, Claudio Oldani
  • Publication number: 20150010857
    Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).
    Type: Application
    Filed: September 4, 2014
    Publication date: January 8, 2015
    Applicant: FUJIFILM CORPORATION
    Inventors: Natsumi YOKOKAWA, Hiroo TAKIZAWA, Hideaki TSUBAKI
  • Publication number: 20150005456
    Abstract: The present invention pertains to semi-crystalline fluoropolymer [polymer (F)] comprising: —recurring units derived from vinylidene fluoride (VDF); —from 10% to 50% by moles [with respect to the total moles of recurring units of polymer (F)] of recurring units derived from trifluoroethylene (TrFE); and—from 0.01% to 10% by moles [with respect to the total moles of recurring units of polymer (F)] of recurring units derived from at least one monomer comprising an azide group [monomer (Az)], to a process for its manufacture, to a crosslinkable composition comprising the same, to a process for crosslinking the same and to a method for manufacturing one of electrical and electronic devices using the same.
    Type: Application
    Filed: December 6, 2012
    Publication date: January 1, 2015
    Inventors: Alessio Marrani, Ivan Wlassics, Vito Tortelli, Ivan Falco
  • Publication number: 20140377707
    Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR?—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.
    Type: Application
    Filed: September 20, 2013
    Publication date: December 25, 2014
    Applicant: JSR CORPORATION
    Inventors: Shinya MINEGISHI, Kiyoshi TANAKA, Kazunori KUSABIRAKI
  • Patent number: 8916058
    Abstract: It has been discovered by in present invention that, compared with a fluorosurfactant having only one betaine group per molecule, a fluorosurfactant having a plurality of betaine groups per molecule is superior in its ability to undergo electrostatic interaction with other components of a fire fighting composition thereby improving the performance of the fire fighting composition. Previously known fluorosurfactants comprise only one betaine group per molecule. In contrast, the present invention provides for a fluorobetaine copolymer containing a plurality of betaine groups.
    Type: Grant
    Filed: March 14, 2008
    Date of Patent: December 23, 2014
    Assignee: E I du Pont de Nemours and Company
    Inventors: Romain Severac, Martial Jean-Jacques Pabon, Isabelle Deguerry, Guillaume Gamblin
  • Publication number: 20140357822
    Abstract: Described herein is an oligomer according to formula I: (I) wherein Y is an anionic group selected from the group consisting of: sulfates, carboxylates, phosphate, phosphonate, and sulfonate, wherein each X1, X2, and X3 are independently selected from F, Cl, H, and CF3; R is a linking group; each Z1 and Z2 is independently selected from F and CF3; m is at least 2; and R1 and R2 are end groups, wherein the oligomer comprises substantially no pendant functional groups, except those selected from the group consisting of: sulfates, carboxylates, phosphate, phosphonate, and sulfonate.
    Type: Application
    Filed: December 4, 2012
    Publication date: December 4, 2014
    Inventors: Zai-Ming Qiu, Miguel A. Guerra
  • Publication number: 20140329970
    Abstract: This invention pertains to fluoroallylsulfonyl azide compounds of formula: CF2?CF—CF2—Rf—SO2N3 formula (I) wherein Rf is a divalent (per)fluorinated group, optionally comprising one or more than one ethereal oxygen atom [monomer (Az)], which are useful as functional monomers in fluoropolymers, to the fluoropolymers which comprise recurring units derived from such fluoroallylsulfonyl azide compounds, to a process for their manufacture, to a curable compound comprising the same and to a method for crosslinking the same.
    Type: Application
    Filed: December 6, 2012
    Publication date: November 6, 2014
    Applicant: SOLVAY SPECIALTY POLYMERS ITALY S.P.A.
    Inventors: Ivan Wlassics, Vito Tortelli, Alessio Marrani
  • Patent number: 8877424
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: November 4, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
  • Patent number: 8871882
    Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.
    Type: Grant
    Filed: February 14, 2012
    Date of Patent: October 28, 2014
    Assignee: Akron Polymer Systems, Inc.
    Inventors: Xiaoliang Zheng, Dong Zhang, Jiaokai Jing, Ted Calvin Germroth, Frank W. Harris, Thauming Kuo, Bin Wang, Douglas Stephens McWilliams
  • Publication number: 20140306157
    Abstract: Subject It is to provide a polymerizable compound having a high polymerization reactivity, a high conversion yield and a high solubility in a liquid crystal composition, a polymerizable composition including the compound, a liquid crystal composite prepared from the composition and a liquid crystal display device containing this composite. Means for Solving the Subject A compound represented by formula (1). In this formula, for example, P1 and P2 are —SCO—CH?CH2; Sp1 and Sp2 are a single bond; ring A1, ring A2, ring A3 and ring A4 are 1,4-phenylene; Z1, Z2 and Z3 are a single bond; and a is 1, and b and c is 0.
    Type: Application
    Filed: April 2, 2014
    Publication date: October 16, 2014
    Applicants: JNC PETROCHEMICAL CORPORATION, JNC CORPORATION
    Inventors: Yasuyuki GOTOH, Masakazu YANO
  • Patent number: 8859071
    Abstract: A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.
    Type: Grant
    Filed: March 8, 2010
    Date of Patent: October 14, 2014
    Assignee: FUJIFILM Corporation
    Inventor: Kunihiko Kodama
  • Publication number: 20140287359
    Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.
    Type: Application
    Filed: June 10, 2014
    Publication date: September 25, 2014
    Inventors: Kazunori MORI, Satoru NARIZUKA, Fumihiro AMEMIYA, Masaki FUJIWARA
  • Publication number: 20140287200
    Abstract: To provide a curable composition which has favorable insulating property and liquid repellency, and from which a cured film having liquid repellency capable of being sufficiently converted to be liquid-philic even by irradiation with ultraviolet light having a wavelength of at least 300 nm, can be formed; an article having a cured film obtained by curing the curable composition and its production process. A cured film is formed by using a curable composition comprising a polymer having units (u1) based on a compound represented by the following formula (m1): wherein R1=a hydrogen atom, a methyl group or the like; R2=a bivalent organic group or the like; Cf=a C1-20 fluoroalkyl group or the like, X?O, S, N or NH; m=1 to 2; n=0 to 4; k=0 to 1; and Z=a (meth)acryloyl group or the like.
    Type: Application
    Filed: June 5, 2014
    Publication date: September 25, 2014
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: MASAHIRO ITO, KAORI TSURUOKA, YASUHIRO KUWANA, YUSUKE NAGAI, MIYAKO SASAKI
  • Publication number: 20140272707
    Abstract: A sulfonium salt having formula (1a) is provided wherein R1 is H, F, CH3 or CF3, R1a to R1m are each independently H or a monovalent hydrocarbon group, L is a single bond or divalent hydrocarbon group, X is a divalent alkylene group optionally substituted with fluorine, and n is 0 or 1. The sulfonium salt having a polymerizable anion provides for efficient scission of acid labile groups in a chemically amplified resist composition, and it is a very useful monomer from which a base resin for resist use is prepared.
    Type: Application
    Filed: February 4, 2014
    Publication date: September 18, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masahiro Fukushima, Jun Hatakeyama, Masaki Ohashi, Teppei Adachi
  • Publication number: 20140275400
    Abstract: The present invention provides methylene beta-diketone monomers, methods for producing the same, and compositions and products formed therefrom. In the method for producing the methylene beta-diketones of the invention, a beta-diketone is reacted with a source of formaldehyde in a modified Knoevenagel reaction optionally in the presence of an acidic or basic catalyst, and optionally in the presence of an acidic or non-acidic solvent, to form reaction complex. The reaction complex may be an oligomeric complex. The reaction complex is subjected to further processing, which may be vaporization by contact with an energy transfer means in order to isolate the beta-diketone monomer. The present invention further compositions and products formed from methylene beta-diketone monomers of the invention, including monomer-based products (e.g., inks, adhesives, coatings, sealants or reactive molding) and polymer-based products (e.g., fibers, films, sheets, medical polymers, composite polymers and surfactants).
    Type: Application
    Filed: October 18, 2012
    Publication date: September 18, 2014
    Inventors: Yangbin Chen, Adam G. Malofsky, Jeffrey M. Sullivan, Stanley C. Wojciak, Tanmoy Dey, Bernard M. Malofsky
  • Publication number: 20140255853
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W1 represents a group which is formed by polymerization reaction of a group containing a polymerizable group; Y1 and Y2 each independently represents a divalent linking group; Y3 represents a carbonyl group or an alkylene group; R2 and R3 each independently represents a fluorine atom or a fluorinated alkyl group; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Application
    Filed: March 4, 2014
    Publication date: September 11, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Yoshiyuki Utsumi
  • Publication number: 20140256894
    Abstract: The present invention relates to solar cells and discloses a difluoro benzotriazolyl organic semiconductor material and preparation method and use thereof. The organic semiconductor material is represented by formula (I), wherein both R1 and R2 are C1 to C20 alkyl, and n is an integer from 10 to 50. In the difluoro benzotriazolyl organic semiconductor material, since the 1,2,3-benzotriazole organic semiconductor material contains two fluorine atoms, the HOMO energy level is reduced by 0.11 eV, while the fluorine-substituted 1,2,3-benzotriazole has two imido groups with electron-withdrawing ability; the fluorine-substituted 1,2,3-benzotriazole is a heterocyclic compound with strong electron-withdrawing ability, and an alkyl chain can be easily introduced to the N-position of the N—H bond of the benzotriazole. The functional group of the alkyl chain can improve the solar energy conversion efficiency, thus solving the low efficiency problem of solar cells made of the organic semiconductor material.
    Type: Application
    Filed: September 23, 2011
    Publication date: September 11, 2014
    Applicant: OCEAN'S KING LIGHTING SCIENCE & TECHNOLOGY CO., LTD.
    Inventors: Mingjie Zhou, Ping Wang, Zhenhua Zhang, Jixing Chen
  • Patent number: 8829131
    Abstract: A fluorinated copolymer including at least one recurrent unit of the following formula (I): and at least one recurrent unit of the following formula (II): in which: RF represents a perfluorocarbon chain optionally including one or more oxygen atoms; X represents a halogen atom, OR with R representing a hydrogen atom or a cation; R1 represents a hydrocarbon chain or perfluorocarbon chain; and Z represents a perfluorocarbon chain.
    Type: Grant
    Filed: July 13, 2010
    Date of Patent: September 9, 2014
    Assignees: Commissariat a l'Energie Atomique et Aux Energies Alternatives, Centre National de la Recherche Scientifique
    Inventors: Aurélien Soules, Bruno Ameduri, Bernard Boutevin, Hervé Galiano
  • Patent number: 8822588
    Abstract: A fluorine-containing polymer has a repeating unit of the general formula (2) and is produced by homopolymerization or copolymerization with another polymerizable double bond-containing monomer. In general formula (2), W represents a linking group; R1 each independently represents a perfluoroalkyl group; Q represents a unit structure formed by cleavage of a double bond of a polymerizable double bond-containing group; and M+ represents a hydrogen cation, a metal ion or a quaternary ammonium ion.
    Type: Grant
    Filed: June 10, 2009
    Date of Patent: September 2, 2014
    Assignee: Central Glass Company, Limited
    Inventors: Yoshiharu Terui, Haruhiko Komoriya, Susumu Inoue, Takashi Kume
  • Publication number: 20140242519
    Abstract: A polymer for resist use is obtainable from a monomer having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are a monovalent hydrocarbon group, R4 to R9 are hydrogen or a monovalent hydrocarbon group, R10 is a monovalent hydrocarbon group or fluorinated hydrocarbon group, A1 is a divalent hydrocarbon group, k1 is 0 or 1, and n1A is 0, 1 or 2. A resist composition comprising the polymer displays a high dissolution contrast during organic solvent development.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 28, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Masayoshi Sagehashi, Koji Hasegawa, Kazuhiro Katayama