Abstract: A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf—S—Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.

Abstract: The present invention provides a resist composition, including: (A) a sulfonium salt containing an anion and a cation, the cation including a partial structure shown by the following general formula (A1); and (B) a polymer compound containing a repeating unit shown by the following general formula (B1). The present invention provides a resist composition that causes few defects and is excellent in lithography performance, having regulated acid diffusion, in photolithography using a high energy beam as a light source, and a resist patterning process using this resist composition.

Abstract: The present disclosure relates to novel fluoromonomer and fluorooligomer compounds, a photopolymerizable composition including these compounds, methods for producing these compounds, and a hydrophobic film using the photopolymerizable composition.

Abstract: A method of treating a material to achieve at least one of reducing surface wettability of the material or reducing fluid transport through the material includes exposing the material to a composition including a solution of a polymer portion and carbon dioxide for a period of time. The polymer portion includes at least one of a polyfluoroacrylate or a copolymer of a fluoroacrylate and a comonomer. A pressure of the composition is maintained above the cloud point of the polymer portion at a concentration thereof in the carbon dioxide for the period of time.

Abstract: Acid generators comprising a carbocyclic aryl or heteroaromatic group substituted with at least one acetate moiety are provided. These acid generators are particularly useful as a photoresist composition component.

Abstract: The present invention provides a water-soluble silicone macromer. The water-soluble silicone macromer has a general formula: E-(M1)x-(M2)y, wherein M1 is a repeating unit which is derived from a silicone containing monomer, M2 is a repeating unit which is derived from a first hydrophilic monomer, and E is an ethylenically unsaturated group. The amount of M1 is in a range of 30-60 wt % based on the total weight of the water-soluble silicone macromer, and the amount of M2 is in a range of 40-70 wt % based on the total weight of the water-soluble silicone macromer. A silicone hydrogel composition containing the water-soluble silicone macromer and a silicone hydrogel lens made of the silicone hydrogel composition are also provided herein.

Abstract: The present invention provides: a biological electrode composition formable a living body contact layer for a biological electrode which is excellent in conductivity and biocompatibility, as well as light in the weight thereof and producible at a low cost, and in addition, which does not cause a significant decrease in the conductivity thereof regardless of under a water-wet condition and a dry condition; a polymer compound which can be suitably used for the biological electrode composition; a polymerizable monomer suitable as a raw material of the polymer compound; a biological electrode having a living body contact layer formed of the biological electrode composition; and a method for producing the same; and wherein, the polymerizable monomer is represented by the following general formula (1).

Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.

Abstract: Disclosed are a copolymer, porous membranes made from the copolymer, and a method of treating fluids using the porous membranes to remove metal ions, for example, from fluids originating in the microelectronics industry, wherein the copolymer includes polymerized monomeric units I and II, wherein monomeric unit I is of the formula A-X—CH2—B, wherein A is Rf—(CH2)n, Rf is a perfluoro alkyl group of the formula CF3—(CF2)x—, wherein x is 3-12, n is 1-6, X is O or S, and B is vinylphenyl, the monomeric unit II is haloalkyl styrene, and optionally wherein the halo group of haloalkyl is replaced with an optional substituent, for example, ethylenediamine tetra acetic acid, iminodiacetic acid, or iminodisuccinic acid.

Abstract: New high molecular weight fluoropolymers (fluoropolymer surfactants) are provided that are useful in compositions for use as fire extinguishing concentrates. The fluoropolymers contain C4-C6 perfluoroalkyl groups, and substantially lack perfluoroalkyl groups containing more than 6 fluorine-substituted carbon atoms.

Abstract: An AB-type block copolymer for use in printed circuit board (PCB) fabrication is provided having a structure represented by the following formula: wherein R1 is a silane pendant group that includes a silicon-containing moiety capable of bonding to a glass surface, and wherein R2 is a matrix-reactive pendant group that includes at least one moiety (e.g., a vinyl-, allyl-, amine-, amide- or epoxy-containing moiety) capable of reacting with a base polymer.

Abstract: The present invention comprises a composition and method of use for providing cleanability to paint comprising an aqueous emulsion of Formula (I) wherein the composition of Formula (I) is a random copolymer; wherein said composition of formula (I) further comprises residue from a hydrophilic chain transfer agent. The compositions of the present invention provide durability to coating compositions, while also providing surface effects such as increased water and oil contact angles, enhanced dirt pickup resistance, and enhanced cleanability to the coating films. For these reasons, the composition of the present invention is particularly suitable for use as additives to exterior coatings and paints.

Abstract: A water-resistant/oil-resistant agent for paper containing (I) a fluorine-containing copolymer including repeating units derived from: (a) a fluorine-containing monomer that has a fluoroalkyl group and that is represented by general formula (1): CH2?C(—X)—C(?O)—Y—Z—Rf (where X is a hydrogen atom, a linear or branched alkyl group having 1-21 carbon atoms, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or the like; Y is —O— or —NH—; Z is an aliphatic group having 1-10 carbon atoms, an aromatic group having 6-10 carbon atoms, a cycloaliphatic group, or the like; and Rf is a linear or branched fluoroalkyl group having 1-6 carbon atoms), and (b) a (meth)acrylate monomer containing no fluorine atoms; and (II) a polypropylene glycol compound. Also disclosed is a method for treating paper, a treated paper and a composition for treating paper containing the water-resistant/oil resistant agent.

Abstract: A coating material including a perfluorocarbon sulfonic acid resin which is a copolymer including a polymerization unit represented by —(CF2—CFZ)—, in the formula, Z being H, Cl, F, or a C1-C3 perfluoroalkyl group, and a polymerization unit represented by —(CF2—CF(—O—(CF2)m—SO3H))—, in the formula, m being an integer of 1 to 12, and the perfluorocarbon sulfonic acid resin has an equivalent weight EW of 200 to 1000. Also disclosed is a laminate including a base material and a hydrophilic layer formed from the coating material.

Abstract: To provide a fluorinated compound having an RF group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH2?C(CH3)COO(CH2)nPhXCrF2r+1??(I) (in the formula (I), n is an integer of from 0 to 2, Ph is a phenylene group, X is a single bond or a C1-4 alkylene group containing an etheric oxygen atom, and r is an integer of from 2 to 6).

Abstract: A copolymer comprising the polymerized product of an electron-sensitizing acid deprotectable monomer, such as the monomer having the formula (XX), and a comonomer: wherein Ra is H, F, —CN, C1-10 alkyl, or C1-10 fluoroalkyl; Rx and Ry are each independently a substituted or unsubstituted C1-10 alkyl group or C3-10 cycloalkyl group; Rz is a substituted or unsubstituted C6-20 aromatic-containing group or C6-20 cycloaliphatic-containing group; wherein Rx and Ry together optionally form a ring; and wherein at least one of Rx, Ry and Rz is halogenated. A photoresist and coated substrate comprising the copolymer, and a method of making an electronic device using the photoresist, are also disclosed.

Abstract: To provide a water/oil repellent composition which can give water/oil repellency to a surface of an article and has excellent durability (wash durability and heavy-rain durability), a method for producing such a composition, and an article which has water/oil repellency and is less susceptible to deterioration of water/oil repellency when it is washed or in heavy rain. A water/oil repellent composition which comprises a copolymer having polymerized units derived from monomer (a), polymerized units derived from monomer (b) and polymerized units derived from monomer (c). Here, monomer (a) is a compound represented by the formula: (Z—Y)nX; wherein Z is a C1-6 perfluoroalkyl group or the like; Y is a bivalent organic group or a single bond; n is 1 or 2; and X is a polymerizable unsaturated group; monomer (b) is a (meth)acrylate having no polyfluoroalkyl group and having an C20-30 alkyl group; and monomer (c) is vinylidene chloride.

Abstract: A resist composition including a resin component which generates acid upon exposure and exhibits changed solubility in a developing solution under the action of acid, the resin component including a resin component having a structural unit represented by a general formula (a0-0-1) shown below in which R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R0-1 represents a single bond or a divalent linking group, each of R2, R3 and R4 independently represents a linear, branched or cyclic alkyl group which may have a non-aromatic substituent, or R3 and R4 may be bonded to each other to form a ring together with the sulfur atom, and X represents a non-aromatic divalent linking group or a single bond.

Abstract: A negative resist composition comprising a polymer comprising recurring units (a) of formula (1) and having a Mw of 1,000-500,000 as base resin is provided. R1 is H or methyl, X is a single bond or —C(?O)—O—R4—, R2 is a single bond or C1-C4 alkylene, R3 is C2-C8 alkylene, R4 is a single bond or C1-C4 alkylene, and 0<a?1.0. The composition exhibits a high resolution due to controlled acid diffusion and forms a resist film which is unsusceptible to swell in the developer and hence to pattern collapse.

Abstract: An ion conducting membrane for fuel cells involves coupling a compound having a sulfonic acid group with a polymeric backbone. Each of the compounds having a sulfonic acid group and the polymeric backbone are first functionalized with a halogen.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having (a) a repeating unit represented by the specific formula; a resist film formed using the actinic ray-sensitive or radiation-sensitive resin composition; a pattern forming method comprising (i) a step of forming a film by using the actinic ray-sensitive or radiation-sensitive resin composition, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using a developer to form a pattern; a method for manufacturing an electronic device, comprising the pattern forming method; and an electronic device manufactured by the manufacturing method of an electronic device.

Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.

Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (P) comprising any of repeating units (A) of general formula (I) below, each of which contains an ionic structural moiety that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid in a side chain of the resin.

Abstract: A negative pattern is formed by coating a resist composition comprising a polymer comprising recurring units having a tertiary ester type acid labile group having a plurality of methyl or ethyl groups on alicycle and an acid generator onto a substrate, prebaking, exposing to high-energy radiation, baking, and developing in an organic solvent developer so that the unexposed region of resist film is dissolved away and the exposed region of resist film is not dissolved. The resist composition exhibits a high dissolution contrast during organic solvent development and forms a fine hole or trench pattern of dimensional uniformity.

Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W1 represents a group which is formed by polymerization reaction of a group containing a polymerizable group; Y1 and Y2 each independently represents a divalent linking group; Y3 represents a carbonyl group or an alkylene group; R2 and R3 each independently represents a fluorine atom or a fluorinated alkyl group; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.

Abstract: The present invention relates to a polymer comprising the reaction product of: (a) a compound of Formula (3), or a mixture thereof: defined herein and (b) at least one ethylenically unsaturated monomer having a functional group. The present invention also relates to a polymer having at least one carbamate linkage prepared by: (i) reacting (a) at least one diisocyanate, polyisocyanate, or mixture thereof, having isocyanate groups, and (b) at least one fluorinated compound selected from the formula (2): defined herein and (ii) optionally reacting with (c) water, a linking agent, or a mixture thereof. The polymers are useful as additives in coating compositions and film forming foams, which impart surface effects to substrates coated with such compositions and to film forming foams.

Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca

Abstract: The present invention provides an electrolyte having high conductivity even under high-temperature low-humidification conditions (e.g. at a temperature of 100 to 120° C. and a humidity of 20 to 50% RH) and thereby makes it possible to realize a higher performance fuel cell. The present invention is a fluoropolymer electrolyte having an equivalent weight (EW) of not less than 250 but not more than 700 and a proton conductivity of not lower than 0.10 S/cm as measured at a temperature of 110° C. and a relative humidity of 50% RH and comprising a COOZ group- or SO3Z group-containing monomer unit, wherein Z represents an alkali metal, an alkaline earth metal, hydrogen atom or NR1R2R3R4 in which R1, R2, R3 and R4 each independently represents an alkyl group containing 1 to 3 carbon atoms or hydrogen atom.

Abstract: A n-type ladder copolymer including, a n-type ladder copolymer formed with alternating perylene and pyridine units having chemical structure A having two end groups, where perylene units having at least one solubilizing group attaching at position(s) 1, 6, 7, and/or 12, where R1, R2, R3, and R4 solubilizing group(s) are each independently selected from the group consisting of aryl, alkyl aryl, alkoxy aryl, and aryloxy aryl, and where n repeat units ranging from about 4 to about 400

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit (A) represented by the specific formula (I) capable of generating an acid on the side chain of the resin upon irradiation with an actinic ray or radiation, and a resist film formed with the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising: exposing the resist film, and developing the exposed resist film, and a method for manufacturing a semiconductor device, containing the pattern forming method, and a semiconductor device manufactured by the manufacturing method of the semiconductor device.

Abstract: Disclosed are a hydrophilic photoacid generator prepared by copolymerization of a first (meth)acrylic acid ester having a structure represented by the following Formula 1 or 2, with a polymerizable monomer selected from the group consisting of a second (meth)acrylic acid ester, an olefin-based compound and a mixture thereof, each of which contains a functional group selected from the group consisting of a hydroxyl group, a carboxyl group, a lactone group, a nitrile group and a halogen group: wherein respective substituents are defined in the specification, and a resist composition comprising the same. The hydrophilic photoacid generator is uniformly dispersed in a resist film, thus improving a line edge roughness of resist patterns.

Abstract: The present disclosure relates to a blue dye compound for a color filter and a coloring resin composition for a color filter containing the same. Since the blue resin composition according to the present disclosure, which contains the novel triarylmethane blue dye compound or the polymer dye compound obtained using the same as a monomer, has superior solubility in an organic solvent such as propylene glycol monomethyl ether acetate (PGMEA), cyclohexanone, etc. as well as superior miscibility with another pigment and high brightness, it can be used to prepare a color filter exhibiting superior heat resistance, light resistance and brightness.

Abstract: A functional TFE copolymer fine powder is described, wherein the TFE copolymer is a polymer of TFE and at least one functional comonomer, and wherein the TFE copolymer has functional groups that are pendant to the polymer chain. The functional TFE copolymer fine powder resin is paste extrudable and expandable. Methods for making the functional TFE copolymer are also described. The expanded functional TFE copolymer material may be post-reacted after expansion.

Abstract: A wound dressing and a method of making the wound dressing is described herein. The wound dressing is formed of an absorbent substrate formed of one or more layers and a low-adherence layer disposed on the substrate. The low-adherence layer can be disposed within at least a portion of the substrate. The low-adherence layer is formed of a mixture of at least one highly fluorinated polymer and at least one acidic polymer. The at least one highly fluorinated polymer has a fluorine content greater than the fluorine content of the at least one acidic polymer.

Abstract: A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition ensures an effective sensitivity, makes more uniform the distribution and diffusion of the acid generating component in a resist film, and suppresses deactivation of acid at the substrate interface. The pattern can be formed to a profile which is improved in LER and undercut.

Abstract: Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.

Abstract: A process for reducing the amount of soluble polymeric fractions in a sulfonyl fluoride polymer. The process comprises contacting the sulfonyl fluoride polymer with a fluorinated fluid followed by separation of the polymer from the fluid. The fluorinated fluid is selected from hydrofluoroethers and hydrofluoropolyethers. The invention further relates to sulfonyl fluoride polymers obtainable by the process and having a heat of fusion not exceeding 4 J/g and containing less than 15% by weight of polymeric fractions having an average content of monomeric units comprising a sulfonyl functional group exceeding 24 mole %. The sulfonyl fluoride polymers so obtained are particularly suitable for the preparation of ionomeric membranes for use in electrochemical devices.

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

Abstract: The present invention pertains to semi-crystalline fluoropolymer [polymer (F)] comprising: —recurring units derived from vinylidene fluoride (VDF); —from 10% to 50% by moles [with respect to the total moles of recurring units of polymer (F)] of recurring units derived from trifluoroethylene (TrFE); and—from 0.01% to 10% by moles [with respect to the total moles of recurring units of polymer (F)] of recurring units derived from at least one monomer comprising an azide group [monomer (Az)], to a process for its manufacture, to a crosslinkable composition comprising the same, to a process for crosslinking the same and to a method for manufacturing one of electrical and electronic devices using the same.

Abstract: A composition for forming a liquid immersion upper layer film includes a polymer component including a polymer having a structural unit represented by a formula (1); and a solvent. R1 represents a carboxy group or a group represented by a formula (2); X represents a single bond, a divalent hydrocarbon group having 1 to 20 carbon atoms or a divalent fluorinated hydrocarbon group having 1 to 20 carbon atoms; R2 represents a hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), a fluorinated hydrocarbon group having 1 to 20 carbon atoms and a valency of (n+1), or one of these groups each including between adjacent two carbon atoms thereof —CO—, —COO—, —O—, —NR?—, —CS—, —S—, —SO—, —SO2— or a combination thereof; and R3 represents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms.

Abstract: It has been discovered by in present invention that, compared with a fluorosurfactant having only one betaine group per molecule, a fluorosurfactant having a plurality of betaine groups per molecule is superior in its ability to undergo electrostatic interaction with other components of a fire fighting composition thereby improving the performance of the fire fighting composition. Previously known fluorosurfactants comprise only one betaine group per molecule. In contrast, the present invention provides for a fluorobetaine copolymer containing a plurality of betaine groups.

Abstract: Described herein is an oligomer according to formula I: (I) wherein Y is an anionic group selected from the group consisting of: sulfates, carboxylates, phosphate, phosphonate, and sulfonate, wherein each X1, X2, and X3 are independently selected from F, Cl, H, and CF3; R is a linking group; each Z1 and Z2 is independently selected from F and CF3; m is at least 2; and R1 and R2 are end groups, wherein the oligomer comprises substantially no pendant functional groups, except those selected from the group consisting of: sulfates, carboxylates, phosphate, phosphonate, and sulfonate.

Abstract: This invention pertains to fluoroallylsulfonyl azide compounds of formula: CF2?CF—CF2—Rf—SO2N3 formula (I) wherein Rf is a divalent (per)fluorinated group, optionally comprising one or more than one ethereal oxygen atom [monomer (Az)], which are useful as functional monomers in fluoropolymers, to the fluoropolymers which comprise recurring units derived from such fluoroallylsulfonyl azide compounds, to a process for their manufacture, to a curable compound comprising the same and to a method for crosslinking the same.

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Abstract: A method for the preparation of a fluoropolymer by means of emulsion polymerization of a reaction mixture in an aqueous medium is disclosed wherein the reaction mixture includes a fluoromonomer having the structure of wherein R1, R2, and R3 are each independently hydrogen atoms, alkyl groups, substituted alkyl groups, or halogens, wherein at least one of R1, R2, and R3 is a fluorine atom, and wherein R is each independently a substituent on the styrenic ring, n is an integer from 0 to 5 representing the number of the substituents on the styrenic ring; b) an emulsion stabilizer combination comprising: i) an anionic surfactant; and, ii) a cationic surfactant or a non-ionic surfactant; and, c) a free-radical initiator.

Abstract: Subject It is to provide a polymerizable compound having a high polymerization reactivity, a high conversion yield and a high solubility in a liquid crystal composition, a polymerizable composition including the compound, a liquid crystal composite prepared from the composition and a liquid crystal display device containing this composite. Means for Solving the Subject A compound represented by formula (1). In this formula, for example, P1 and P2 are —SCO—CH?CH2; Sp1 and Sp2 are a single bond; ring A1, ring A2, ring A3 and ring A4 are 1,4-phenylene; Z1, Z2 and Z3 are a single bond; and a is 1, and b and c is 0.

Abstract: A curable composition for imprints, which is excellent in patternability and in line edge roughness, is provided. The curable composition for imprints comprises at least one kind of polymerizable monomer (A) and at least one kind of photopolymerization initiator (B). The polymerizable monomer (A) comprises at least two fluorine-containing groups selected from a fluoroalkyl group and a fluoroalkylether group and each of two of the fluorine-containing groups is connected with each other through a linking group having at least two carbon atoms.

Abstract: To provide a curable composition which has favorable insulating property and liquid repellency, and from which a cured film having liquid repellency capable of being sufficiently converted to be liquid-philic even by irradiation with ultraviolet light having a wavelength of at least 300 nm, can be formed; an article having a cured film obtained by curing the curable composition and its production process. A cured film is formed by using a curable composition comprising a polymer having units (u1) based on a compound represented by the following formula (m1): wherein R1=a hydrogen atom, a methyl group or the like; R2=a bivalent organic group or the like; Cf=a C1-20 fluoroalkyl group or the like, X?O, S, N or NH; m=1 to 2; n=0 to 4; k=0 to 1; and Z=a (meth)acryloyl group or the like.

Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.