Fluorine-containing Monomer Contains A Sulfur Atom Patents (Class 526/243)
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Publication number: 20110177983Abstract: Fluorinated polymers having first divalent units independently represented by formula (I) or formula (II) and second divalent units containing quaternary ammonium groups. Compositions containing the fluorinated polymer and solvent, methods of treating hydrocarbon-bearing formations using these compositions, and articles treated with the fluorinated polymers are disclosed. A method of making a composition containing the fluorinated polymer is also disclosed.Type: ApplicationFiled: July 15, 2009Publication date: July 21, 2011Inventors: Jimmie R. Baran, JR., George G.I. Moore
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Publication number: 20110177453Abstract: According to the present invention, there is provided a polymerizable fluorine-containing sulfonic acid onium salt of the following general formula (2) and a resin obtained by polymerization thereof. It is possible by the use of this sulfonate resin of the present invention to provide a resist composition with high resolution, board depth of focus tolerance (DOF), small line edge roughness (LER) and high sensitivity. In the formula, Z represents a substituted or unsubstituted C1-C6 straight or branched alkylene group, or a divalent moiety in which substituted or unsubstituted C1-C6 straight or branched alkylene groups are bonded in series to a divalent group obtained by elimination of two hydrogen atoms from an alicyclic or aromatic hydrocarbon; R represents a hydrogen atom, a halogen atom, or a C1-C3 alkyl or fluorine-containing alkyl group; and Q+ represents a sulfonium cation or an iodonium cation.Type: ApplicationFiled: October 8, 2009Publication date: July 21, 2011Applicant: CENTRAL GLASS COMPANY, LIMITEDInventors: Takashi Masubuchi, Kazunori Mori, Yuji Hagiwara, Satoru Narizuka, Kazuhiko Maeda
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Publication number: 20110171580Abstract: A positive resist composition comprising a polymer having a tetrahydrobenzocycloheptane-substituted secondary or tertiary carboxyl group ester as an acid labile group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness after exposure, a significant effect of suppressing acid diffusion rate, and improved etching resistance.Type: ApplicationFiled: January 7, 2011Publication date: July 14, 2011Inventors: Jun HATAKEYAMA, Takeru Watanabe, Seiichiro Tachibaba
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Publication number: 20110165519Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: ApplicationFiled: March 18, 2011Publication date: July 7, 2011Inventors: Nobuo ANDO, Ichiki TAKEMOTO, Isao YOSHIDA, Yukako HARADA
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Publication number: 20110159433Abstract: Provided are a radiation-sensitive composition including a compound (P) having a partial structure (A) having an ionic structural site and capable of decomposing upon irradiation with an actinic ray or radiation to generate an acid and a partial structure (B) having at least one phenolic hydroxyl group, a part or all of hydrogen atoms of the hydroxyl group or groups each being protected by a group capable of leaving by the action of an acid, wherein the ionic structural site of the partial structure (A) contained in the compound (P) is a structure capable of generating an acid anion in the compound (P) upon irradiation with an actinic ray or radiation; a pattern-forming method using the same; and a resin which is used in the composition.Type: ApplicationFiled: August 26, 2009Publication date: June 30, 2011Applicant: FUJIFILM CORPORATIONInventors: Hidenori Takahashi, Tomotaka Tsuchimura, Toru Tsuchihashi, Katsuhiro Yamashita, Naoyuki Nishikawa
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Publication number: 20110135871Abstract: A surface-treating agent comprises a fluoropolymer comprising (A) repeating units derived from a fluorine-containing monomer of the formula: (B) repeating units derived from a monomer free from a fluorine atom. The surface treating agent is excellent in water repellency, oil repellency and unsusceptibility to fouling even when the side chains are C4 or lower fluoroalkyl groups.Type: ApplicationFiled: February 17, 2011Publication date: June 9, 2011Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Ikuo YAMAMOTO, Tetsuya Masutani
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Patent number: 7956124Abstract: A composition which provides surface effects to substrates comprising a polymer containing at least one urea linkage prepared by (i) reacting (1) at least one organic diioscyanate, polyisocyanate, or mixture thereof, and (2) at least one fluorochemical compound of Formula I Rf—O(CF2CF2)r(CH2CH2)q(R1)sXH??Formula (I) ?wherein Rf is a linear or branched C1 to C7 perfluoroalkyl optionally interrupted by one to three oxygen atoms, r is 1 to 3, q is 1 to 3, s is 0 or 1, X is O, S, or NR2 wherein R2 is H, or C1 to C6 alkyl, and R1 is a divalent radical selected from —S(CH2)n—, p is 1 to 50, and R3, R4 and R5 are each independently H or C1 to C6 alkyl; (ii) and then reacting with (3) water, a linking agent, or a mixture thereof.Type: GrantFiled: November 20, 2008Date of Patent: June 7, 2011Assignee: E.I. du Pont de Nemours and CompanyInventors: Sheng Peng, Stephen James Getty, Timothy Edward Hopkins, Ying Wang
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Publication number: 20110123933Abstract: A polymer, including a polymerized monomer, the monomer being represented by the following Chemical Formula 1:Type: ApplicationFiled: September 27, 2010Publication date: May 26, 2011Inventors: Sang-Geun YUN, Sang-Jun Choi, Seung-Jib Choi, Sung-Jae Lee, Jin-Young Lee
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Patent number: 7947791Abstract: The present invention provides a fluorinated polymer excellent in the crosslinking reactivity, crosslinked rubber physical properties and chemical resistance, and its crosslinked rubber. A fluorinated polymer comprising repeating units (a) based on at least one monomer selected from the group consisting of ethylenic unsaturated compounds each having a hydroxyphenyl group, repeating units (b) based on at least one fluoromonomer selected from the group consisting of tetrafluoroethylene, hexafluoropropylene, vinylidene fluoride, 3,3,3-trifluoropropene, 1,3,3,3-tetrafluoropropene, 1,1,2-trifluoroethylene, vinyl fluoride, 1,2-difluoroethylene and CF2?CF—O—Rf (wherein Rf is a C1-8 saturated perfluoroalkyl group or a perfluoro(alkoxyalkyl) group) and, if necessary, repeating units (c) based on at least one hydrocarbon monomer selected from the group consisting of ethylene, propylene and CH2?CH—O—R1.Type: GrantFiled: March 19, 2009Date of Patent: May 24, 2011Assignee: Asahi Glass Company, LimitedInventors: Jumpei Nomura, Toshikazu Yoneda, Mitsuru Seki, Hiroki Kamiya, Hiroshi Funaki, Takehiro Kose
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Publication number: 20110117306Abstract: The present invention describes the synthesis of new sulforated fluorinated elastomers having very low glass transition temperatures (Tg), a good resistance to bases, oils and fuels and good properties of workability. These elastomers contain, by way of example, from 80 to 60 mole % of vinylidene fluoride (VDF) and 20 to 40 mole % of perfluoro(4-methyl-3,6-dioxaoct-7-ene) sulfonyl fluoride (PFSO2F). In this case, they are prepared by radical copolymerisation of VDF and PFSO2F in the presence of different organic initiators, for example, peroxides, peresters or diazo compounds.Type: ApplicationFiled: January 24, 2011Publication date: May 19, 2011Applicant: HYDRO-QUEBECInventors: BRUNO Michel AMEDURI, Michel Armand, Mario Boucher, Abdellatif Manseri
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Publication number: 20110118362Abstract: Disclosed are compositions containing copolymers with hydroxypropyl methacrylamide and methods of using the compositions to treat cardiopulmonary diseases are also disclosed.Type: ApplicationFiled: November 13, 2009Publication date: May 19, 2011Inventors: Randal Dull, Kristina Giantsos
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Patent number: 7935770Abstract: Provided are surface modified contact lenses formed from one or more fumaric- or itaconic-containing prepolymers having polymerizable functionality that is complimentary to polymerizable hydrophilic polymers.Type: GrantFiled: July 3, 2007Date of Patent: May 3, 2011Assignee: Bausch & Lomb IncorporatedInventor: Yu-Chin Lai
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Publication number: 20110095165Abstract: Disclosed herein are polymeric molds that can be used to make molded articles. The polymeric molds are made from cyclic olefin polymers that may be formed by ring opening metathesis polymerization (ROMP) of a polycyclic monomer having two or more reactive double bonds and a cyclic monomer comprising one reactive double bond. Fluorinated monomers may be used. The polymeric molds may be structured molds in that they have at least one microstructured feature having a dimension of less than about 2 mm, or less than about 500 um. The polymeric molds may also have a plurality of such microstructured features. Also disclosed herein are methods of making the polymeric molds, methods of making molded articles therefrom, and the molded articles.Type: ApplicationFiled: April 28, 2009Publication date: April 28, 2011Inventors: Joseph D. Rule, Kevin M. Lewandowski
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Publication number: 20110098433Abstract: Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.Type: ApplicationFiled: February 11, 2009Publication date: April 28, 2011Inventors: Haiwon Lee, Meehye Jeong, Ashok D. Sagar
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Patent number: 7932334Abstract: The present invention provides a resin which generates an acid by irradiation and is a salt of an organic cation and an anionic polymer wherein the anionic polymer has no carbon-carbon unsaturated bond. The present invention further provides a chemically amplified resist composition comprising the same.Type: GrantFiled: December 21, 2006Date of Patent: April 26, 2011Assignee: Sumitomo Chemical Company, LimitedInventors: Nobuo Ando, Ichiki Takemoto, Isao Yoshida, Yukako Harada
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Patent number: 7915337Abstract: A surface-treating agent comprises a fluoropolymer comprising (A) repeating units derived from a fluorine-containing monomer of the formula: (B) repeating units derived from a monomer free from a fluorine atom, and (C) optionally, repeating units derived from a crosslinkable monomer. The surface treating agent is excellent in water repellency, oil repellency and unsusceptibility to fouling even when the side chains are C4 or lower fluoroalkyl groups.Type: GrantFiled: April 27, 2004Date of Patent: March 29, 2011Assignee: Daikin Industries, Ltd.Inventors: Ikuo Yamamoto, Tetsuya Masutani
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Publication number: 20110065878Abstract: Embodiments of the present invention relate generally to non-self imagable and imagable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.Type: ApplicationFiled: September 17, 2010Publication date: March 17, 2011Applicants: PROMERUS LLC, TOKYO OHKA KOGYO CO., LTD.Inventors: Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence D. Seger, Keita Ishiduka, Kotaro Endo, Tomoyuki Ando
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Publication number: 20110065857Abstract: There is provided a fluorine-containing polymer having a repeating unit of the general formula (2) and produced by homopolymerization or copolymerization with an other polymerizable double bond-containing monomer. In the formula, W represents a linking group; R1 each independently represents a perfluoroalkyl group; Q represents a unit structure formed by cleavage of a double bond of a polymerizable double bond-containing group; and M+ represents a hydrogen cation, a metal ion or a quaternary ammonium ion. There is also provided an antistatic agent using the above fluorine-containing polymer such that the antistatic agent can impart antistatic performance to an article stably over a long time and show excellent transparency.Type: ApplicationFiled: June 10, 2009Publication date: March 17, 2011Applicant: Central Glass Company, LimitedInventors: Yoshiharu Terui, Haruhiko Komoriya, Susumu Inoue, Takashi Kume
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Patent number: 7902311Abstract: To provide an electrolyte polymer for polymer electrolyte fuel cells, made of a perfluorinated polymer having sulfonic groups, characterized in that in a test of immersing 0.1 g of the polymer in 50 g of a fenton reagent solution containing 3% of an aqueous hydrogen peroxide solution and 200 ppm of bivalent iron ions at 40° C. for 16 hours, the amount of eluted fluorine ions detected in the solution is not more than 0.002% of the total amount of fluorine in the polymer immersed. The electrolyte polymer of the present invention has very few unstable terminal groups and has an excellent durability, and therefore, is suitable as a polymer constituting an electrolyte membrane for polymer electrolyte fuel cells and a polymer contained in a catalyst layer.Type: GrantFiled: December 5, 2008Date of Patent: March 8, 2011Assignee: Asahi Glass Company, LimitedInventors: Nobuyuki Kasahara, Atsushi Watakabe, Tetsuji Shimohira, Hisao Kawazoe, Ichiro Terada
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Publication number: 20110045270Abstract: A composition comprises a polymer having a first pendant group selected from at least one perfluorinated ether group or perfluoroalkanesulfonamido group, a second pendant group comprising an ammonium group, wherein the second pendant group is free of silicon, and a third pendant group comprising an ammonium group and a reactive silicon-containing group. The polymer and composition are useful for protecting a substrate, for example, to render the substrate oil repellent, water repellent, or both, or to provide stain repellency to the substrate.Type: ApplicationFiled: November 26, 2008Publication date: February 24, 2011Inventors: Rudolf J. Dams, Thomas P. Klun, Inge Nuyts
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Publication number: 20110045271Abstract: A polymer is provided comprising a first pendant group selected from at least one of a perfluorinated ether group or a perfluoroalkanesulfonamido group, a second pendant group comprising an ammonium group, wherein the second pendant group is free of silicon, and a third pendant group comprising an ammonium group and a reactive siliconcontaining group. A composition comprising the polymer is provided. The polymer and composition are useful for protecting a substrate, for example, to render the substrate oil repellent, water repellent, or both, or to provide stain repellency to the substrate.Type: ApplicationFiled: November 26, 2008Publication date: February 24, 2011Inventors: Rudolf J. Dams, Suresh S. Iyer, Chetan P. Jariwala, Thomas P. Klun, Inge Nuyts
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Publication number: 20110045384Abstract: A method is provided for obtaining crosslinked polymers having pendent sulfonic acid groups by crosslinking through the sulfonic acid groups or their precursors with aromatic crosslinkers or aromatic pendent crosslinking groups to form aromatic sulfones. Such crosslinked polymers may be used to make polymer electrolyte membranes (PEM's) that may be used in electrolytic cells such as fuel cells.Type: ApplicationFiled: October 29, 2010Publication date: February 24, 2011Inventors: Naiyong Jing, Michael A. Yandrasits, Steven J. Hamrock
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Publication number: 20110009555Abstract: A fluorine-containing polymer comprising a fluoroalkyl alcohol (meth)acrylic acid derivative represented by a general formula, CnF2n+1(CH2CF2)a(CF2CF2)b(CH2CH2)cOCOCR?CH2 (in the formula, R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, preferably 2 to 4, a is an integer of 1 to 4, b is an integer of 0 to 3, and c is an integer of 1 to 3) containing in 5 to 100 wt % as a polymerization unit. A organic solvent solution or aqueous dispersion of the fluorine-containing polymer is effectively used as, for example, a surface-modifying agent such as a water- and oil-repellent or an oil barrier.Type: ApplicationFiled: July 16, 2008Publication date: January 13, 2011Applicant: UNIMATEC CO., LTD.Inventors: Satoshi Kurihara, Seiichiro Murata, Katsuyuki Sato, Masayosi Horiuti, Sumiko Mouri, Hideki Abe, Ji-Shan Jin
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Publication number: 20110003955Abstract: To provide an imide oligomer, excellent in thermal moldability, having excellent heat resistance as a thermally-cured polyimide resin, and that is obtainable easily and inexpensively. An imide oligomer including a nonaxisymmetric site derived from one nonaxisymmetric aromatic diamine molecule represented by below formula (1), only at a central portion of the oligomer chain, in the formula (1), W is a direct bond, —O—, —CH2—, —C2H4—, —C(CH3)2—, —CF2—, —C2F4—, —C(CF3)2—, —C(?O)—, —NH—, —NH—C(?O)—, —S—, —S(?O)—, or —S(?O)2—.Type: ApplicationFiled: July 28, 2008Publication date: January 6, 2011Applicant: DAIWA CAN COMPANYInventors: Hideo Nishino, Yasuyo Watanabe, Yoichiro Inoue
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Publication number: 20100330317Abstract: The present invention describes the synthesis of new fluorinated elastomers with very low glass transition temperatures (Tg), a good resistance to bases, gasoline and other carburants and good workability properties, these elastomers contain hexafluoropropene (HFP), perfluoro(4-methyl-3,6-dioxaoct-7-ene) sulfonyl fluoride (PFSO2F), vinylidene fluoride (VDF) and/or at least one fluorinated alkene and/or one vinyl perfluorinated ether. In a precise case, they are prepared by radical polymerisation of HFP and PFSO2F or by radical terpolymerisation HFP, PFSO2F and VDF in the presence of different organic initiator, such as peroxides, peresters or diazo compounds.Type: ApplicationFiled: September 9, 2010Publication date: December 30, 2010Applicant: HYDRO-QUEBECInventors: Bruno Michel AMEDURI, Michel Armand, Mario Boucher, Abdellatif Manseri
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Patent number: 7842389Abstract: There is provided a curable surface modifier comprising a resin which is soluble in a general purpose solvent and comprises a fluorine-containing ethylenic polymer containing, in at least a part of its side chain, a moiety A having a long polyfluoropolyether chain and/or a moiety B having a self-crosslinkable functional group, in which the resin contains both of the moieties A and B. The curable surface modifier improves properties of surfaces of various coating films, especially antireflection films, such as surface sliding property (decrease in a friction coefficient), surface hardness, abrasion resistance, chemical resistance and stain removability by wiping, thus being capable of imparting modified properties to the surfaces of original coating films.Type: GrantFiled: May 26, 2004Date of Patent: November 30, 2010Assignee: Daikin Industries, Ltd.Inventors: Mihoko Ohashi, Kazuyuki Sato, Takayuki Araki
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Publication number: 20100288962Abstract: Various fluoropolymers have been proposed for imparting oil and water repellency to leather. Commonly, these fluoropolymers are amphiphilic; i.e., they are made from at least one monomer which is hydrophobic and at least one monomer which is hydrophilic. The present invention identifies and remedies disadvantages associated with the ability of amphiphilic fluoropolymers to impart oil and water repellency to leather. Contrary to conventional thinking, it has now been discovered that the incorporation of hydrophilic groups in a fluoropolymer undesirably reduces its ability to impart water resistance to leather. Correspondingly, it has also been discovered that a fluoropolymer incorporating fewer or no hydrophilic groups imparts superior oil and water repellency to leather when compared to fluoropolymers incorporating more hydrophilic groups. Therefore, this invention provides fluoropolymers which incorporate reduced levels of hydrophilic groups.Type: ApplicationFiled: September 30, 2008Publication date: November 18, 2010Inventor: Romain Severac
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Patent number: 7833690Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.Type: GrantFiled: October 6, 2006Date of Patent: November 16, 2010Assignee: The University of North Carolina at CharlotteInventors: Kenneth E. Gonsalves, Mingxing Wang
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Publication number: 20100280200Abstract: A water permeable fluoropolymer article is described comprising a functional copolymer of TFE, PSVE and sulfonic acid pendant to the polymer chain, as well as methods of making the article. The method comprises providing a copolymer membrane comprising a microstructure characterized by nodes interconnected by fibrils, wherein said membrane, immersing said membrane in hot water for a period of time to render the membrane water permeable.Type: ApplicationFiled: July 20, 2010Publication date: November 4, 2010Inventors: Tarun K. Poddar, Ping Xu
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Publication number: 20100273088Abstract: The present invention provides a novel production process by which unstable terminal groups can be sufficiently stabilized under mild conditions. The present invention is related to a method for producing an —SO3H group-containing fluoropolymer wherein a fluoropolymer to be treated having a —SO2X group-containing monomer unit (X representing F or Cl) is subjected to a procedure comprising at least the steps A, B and C defined below in that order: A: Step of reacting with a halogenating agent; B: Step of reacting with a decomposition treatment agent; C: Step of reacting with a fluorinating agent.Type: ApplicationFiled: July 6, 2010Publication date: October 28, 2010Applicants: DAIKIN INDUSTRIES, LTD., ASAHI KASEI E-MATERIALS CORPORATIONInventors: Tadashi INO, Tadaharu ISAKA, Masahiro KONDO, Masanori IKEDA, Nobuyuki UEMATSU, Takehiro KOGA
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Patent number: 7811694Abstract: A polymer electrolyte membrane for a direct oxidation fuel cell includes a porous polymer supporter having a plurality of pores, and a hydrocarbon fuel diffusion barrier layer which is formed on the polymer supporter and contains an inorganic additive dispersed in a cation exchange resin.Type: GrantFiled: October 14, 2005Date of Patent: October 12, 2010Assignee: Samsung SDI Co., Ltd.Inventors: Min-Kyu Song, You-Mee Kim, Ho-Jin Kweon, Hee-Woo Rhee
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Patent number: 7812105Abstract: A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.Type: GrantFiled: May 11, 2006Date of Patent: October 12, 2010Assignee: JSR CorporationInventors: Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu
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Publication number: 20100248324Abstract: A functional TFE copolymer fine powder is described, wherein the TFE copolymer is a polymer of TFE and at least one functional comonomer, and wherein the TFE copolymer has functional groups that are pendant to the polymer chain. The functional TFE copolymer fine powder resin is paste extrudable and expandable. Methods for making the functional TFE copolymer are also described. The expanded functional TFE copolymer material may be post-reacted after expansion.Type: ApplicationFiled: March 24, 2009Publication date: September 30, 2010Inventors: Ping Xu, Jack J. Hegenbarth, Xin Kang Chen
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Patent number: 7803846Abstract: The objective of the invention is to solve the problems of conventional polymer electrolyte membranes, including small ion-exchange capacity and low oxidation and methanol resistance. A polymer film substrate is irradiated with ?-rays, electron beams or other radiations to perform multi-graft polymerization with functional monomers and then the polymer film substrate containing the grafted molecular chains or the graft molecular chains into which sulfonic acid groups have been introduced is crosslinked by irradiation to produce a polymer electrolyte membrane that has outstanding oxidation resistance, dimensional stability, electrical conductivity and methanol resistance and which can be controlled in ion-exchange capacity over a wide range.Type: GrantFiled: August 30, 2005Date of Patent: September 28, 2010Assignees: Japan Atomic Energy Agency, Nitto Denko CorporationInventors: Masaru Yoshida, Masaharu Asano, Tetsuya Yamaki, Soji Nishiyama, Toshimitsu Tachibana, Yozo Nagai
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Patent number: 7799883Abstract: Embodiments of the present invention relate generally to non-self imageable and imageable norbornene-type polymers useful for immersion lithographic processes, methods of making such polymers, compositions employing such polymers and the immersion lithographic processes that make use of such compositions. More specifically the embodiments of the present invention are related to norbornene-type polymers useful for forming imaging layer and top-coat layers for overlying such imaging layers in immersion lithographic process and the process thereof.Type: GrantFiled: February 22, 2006Date of Patent: September 21, 2010Assignee: Promerus LLCInventors: Larry F. Rhodes, Chun Chang, Pramod Kandanarachchi, Lawrence D. Seger, Keita Ishiduka, Kotaro Endo, Tomoyuki Ando
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Publication number: 20100234521Abstract: A fluorochemical derived from monomers with a side chain, wherein the side chain includes a perfluoroalkyl group with 1-6 carbon atoms and a hydrocarbon spacer group attached to the perfluoroalkyl group, wherein the spacer group has 15-50 carbon atoms. The perfluoroalkyl group is non-crystallizable at room temperature and the spacer group is crystallizable at room temperature.Type: ApplicationFiled: August 17, 2007Publication date: September 16, 2010Inventors: Richard M. Flynn, Michael A. Yandrasits
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Publication number: 20100233617Abstract: A photosensitive composition includes: (A) a resin containing a repeating unit corresponding to a compound represented by the following formula (I); the resin being capable of producing an acid group upon irradiation with an actinic ray or radiation: Z-A-X—B—R ??(I) wherein Z represents a group capable of becoming an acid group resulting from leaving of a cation upon irradiation with an actinic ray or radiation; A represents an alkylene group; X represents a single bond or a heteroatom-containing divalent linking group; B represents a single bond, an oxygen atom or —N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted by Y; when B represents —N(Rx)-, R and Rx may combine with each other to form a ring; and Y represents a polymerizable group.Type: ApplicationFiled: September 18, 2008Publication date: September 16, 2010Applicant: FUJIFILM CORPORATIONInventor: Kenji Wada
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Publication number: 20100221971Abstract: Disclosed is a water-repellent/oil-repellent agent which is composed of a fluorine-containing polymer containing a repeating unit (A) derived from a fluorine-containing monomer having a fluoroalkyl group or a fluoroalkenyl group, and a repeating unit (B) derived from a monomer having an imide group at a weight ratio of from 10/90 to 95/5 (repeating unit (A)/repeating unit (B)). Also disclosed is a thermoplastic resin composition which is obtained by adding such a water-repellent/oil-repellent agent into a thermoplastic resin. Since the fluorine-containing polymer is improved in heat resistance, the water-repellent/oil-repellent agent is capable of imparting a wide range of thermoplastic resins with excellent water repellency and oil repellency.Type: ApplicationFiled: January 22, 2007Publication date: September 2, 2010Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Kouji Kubota, Norimasa Uesugi
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Patent number: 7781085Abstract: A novel polymer electrolyte is provided that enables a solid polymer electrolyte used in fuel cells, for example, to have sufficient proton conductivity even in a low-water-content state or a zero-water-content state by using a monomer compound represented by the general formula (1), and a graft copolymer compound in which the monomer compound represented by the general formula (1) is graft-copolymerized to the main chain of a fluorine-containing hydrocarbon polymer. Tf indicates a trifluoromethane sulfonyl group (—SO2CF3).Type: GrantFiled: November 26, 2004Date of Patent: August 24, 2010Assignee: Toyota Jidosha Kabushiki KaishaInventor: Yuichiro Sugiyama
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Publication number: 20100168318Abstract: It has been discovered by in present invention that, compared with a fluorosurfactant having only one betaine group per molecule, a fluorosurfactant having a plurality of betaine groups per molecule is superior in its ability to undergo electrostatic interaction with other components of a fire fighting composition thereby improving the performance of the fire fighting composition. Previously known fluorosurfactants comprise only one betaine group per molecule. In contrast, the present invention provides for a fluorobetaine copolymer containing a plurality of betaine groups.Type: ApplicationFiled: March 14, 2008Publication date: July 1, 2010Applicant: E.I. DU PONT DE NEMOURS AND COMPANYInventors: Romain Severac, Martial Jean-Jacques Pabon, Isabelle Deguerry, Guillaume Gamblin
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Publication number: 20100143843Abstract: Disclosed are a photoacid generator, a copolymer, a chemically amplified resist composition, and a method of forming a pattern using the chemically amplified resist composition. The photoacid is connected with a main chain of the copolymer, whereby the photoacid is equally dispersed within a resist layer, and characteristics of line edge roughness of a resist pattern is improved.Type: ApplicationFiled: April 2, 2009Publication date: June 10, 2010Inventors: Jung Hoon OH, Sang Jin KIM, Jin Ho KIM, Dae Hyeon SHIN
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Publication number: 20100099804Abstract: Disclosed herein are polymer compounds, a method for preparing thereof. More specifically, provided are polymer compounds with well-connected, narrow size distribution free-volume element and a method for preparing the polymer compounds by thermal rearrangement for aromatic polyimides containing ortho-positioned functional groups in the solid state.Type: ApplicationFiled: October 10, 2008Publication date: April 22, 2010Applicant: Industry-University Cooperation Foundation, HANYANG UNIVERSITYInventors: Young-Moo LEE, Ho-Bum Park, Chul-Ho Jung, Sang-Hoon Han
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Publication number: 20100084640Abstract: A polymer having a repeating unit represented by the following general formula (I) and a ferrocene-based reduction potential of ?1.5 to ?0.5 V as measured by a cyclic voltammetry method wherein Ar1 represents a divalent aromatic hydrocarbon group or a divalent heterocyclic group, and these groups may be substituted by a substituent.Type: ApplicationFiled: March 5, 2008Publication date: April 8, 2010Applicant: Sumitomo Chemical Company LimitedInventors: Yutaka Ie, Yoshio Aso, Yoshikazu Umemoto, Masato Ueda
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Publication number: 20100075256Abstract: A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.Type: ApplicationFiled: January 15, 2009Publication date: March 25, 2010Applicant: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Jung-Hoon Oh, Dae-Hyeon Shin
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Publication number: 20100044050Abstract: A composition comprising a nonionic fluorinated polymeric surfactant having a weight average molecular weight of least 100,000 grams per mole, the nonionic fluorinated polymeric surfactant comprising: divalent units independently represented by formula (I): in a range from 30% to 65% by weight, based on the total weight of the nonionic fluorinated polymeric surfactant; and divalent units independently represented by formula (II): in a range from 70% to 35% by weight, based on the total weight of the nonionic fluorinated polymeric surfactant. Rf is a perfluoroalkyl group having from 3 to 4 carbon atoms; R and R2 are each independently hydrogen or alkyl of 1 to 4 carbon atoms; R1 is alkyl of 16 to 24 carbon atoms; and n is an integer from 2 to 11. Foams comprising the nonionic fluorinated polymeric surfactant and a liquid hydrocarbon and methods of making and using the foams are also disclosed.Type: ApplicationFiled: January 18, 2008Publication date: February 25, 2010Inventors: Patricia M. Savu, Michael J. Sierakowski
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Patent number: 7666964Abstract: A copolymer comprises repeating units derived from at least one co-reactant comprising two or more mercapto functional groups, and repeating units derived from a fluoroacrylate comprising the reaction product of: (a) at least one fluorochemical alcohol represented by the formula: C4F9—X—OH wherein: R=hydrogen or an alkyl group of 1 to 4 carbon atoms, m=2 to 8, Rf=CnF2n+1, n=1 to 5, y=0 to 6, and q=1 to 8; (b) at least one unbranched symmetric diisocyanate; and (c) at least one hydroxy-terminated alkyl (meth)acrylate or 2-fluoroacrylate monomer having 2 to about 30 carbon atoms in its alkylene portion.Type: GrantFiled: September 21, 2007Date of Patent: February 23, 2010Assignee: 3M Innovative Properties CompanyInventors: Zai-Ming Qiu, John C. Clark, Ramesh C. Kumar
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Patent number: 7662896Abstract: Described are fluorochemical surfactants derived from nonafluorobutanesulfonyl fluoride that contain polyalkyleneoxy side chains and may be copolymerized with acrylic acid or methacrylic acid to form polyacrylates or polymethacrylates. The surfactants surprisingly lower the surface tension of water and other liquids in the same or similar low values achieved by premier surfactants such as those derived from perfluorooctane sulfonyl fluoride.Type: GrantFiled: August 1, 2008Date of Patent: February 16, 2010Assignee: 3M Innovative Properties CompanyInventors: Patricia M. Savu, Sandra A. Etienne
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Publication number: 20100021847Abstract: An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1) represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.Type: ApplicationFiled: July 21, 2009Publication date: January 28, 2010Applicant: SUMITOMO CHEMICAL COMPANY, LTD.Inventors: Tatsuro MASUYAMA, Kazuhiko HASHIMOTO, Takashi HIRAOKA, Ichiki TAKEMOTO
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Publication number: 20100018659Abstract: A greaseproof paper is provided for use in food processing and/or packaging of foods in which paper has been rendered oleophobic by treatment with a fluorine-containing polymer. The fluorine-containing polymer may be prepared by polymerizing a fluorine-containing monomer in the presence of a mercapto group-containing organopolysiloxane. The fluorine-containing polymer may be applied to paper by coating onto pre-formed paper, or by applying the polymer as a size during a papermaking process.Type: ApplicationFiled: July 24, 2007Publication date: January 28, 2010Applicants: DOW CORNING CORPORATION, DAIKIN INDUSTRIES, LTD.Inventors: Peter Cheshire Hupfield, Tetsuya Masutani, Shinichi Minami, Ikuo Yamamoto
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Patent number: 7651993Abstract: A fluorine-containing copolymer including: (A) repeating units derived from a fluorine-containing macromonomer of the general formula: CH2?C(—X)—COO—(Y)1—Z—MfmMrn—H (I) wherein X, Y, Z and MfmMrn are as described herein, and (B) repeating units derived from a polyalkyleneglycol (meth)acrylate.Type: GrantFiled: February 5, 2008Date of Patent: January 26, 2010Assignee: Daikin Industries, Ltd.Inventors: Ikuo Yamamoto, Norimasa Uesugi