Nitrogen Atom Is Part Of A Bridged Or Fused Ring System Patents (Class 526/259)
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Patent number: 6372355Abstract: To provide a laminated resinous article having an improved weatherability without inviting ultraviolet-induced coloring or deterioration in interlayer adhesion and in surface hardness, and having a high surface harness and a satisfactory abrasion resistance, a weather resistant ultraviolet absorptive laminated resinous article is disclosed. The resinous article includes a resin base, a base protective layer and a surface protective layer formed on at least one surface of the resin base, which base protective layer is composed of a cross-linked cured product. The base protective layer includes a polymer obtained by polymerizing a monomer component containing at least one selected from monomers having an ultraviolet absorptive group of the formula (1) or (2) in the description, and the surface protective layer is formed as an outermost layer of the resinous article.Type: GrantFiled: June 5, 2000Date of Patent: April 16, 2002Assignee: Nippon Shokubai Co., Ltd.Inventors: Nobuhisa Noda, Toshifumi Nishida, Takahiro Aoyama
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Publication number: 20020041979Abstract: A compound represented by the following general formula (1) and a light-emitting device comprising the compound.Type: ApplicationFiled: October 1, 2001Publication date: April 11, 2002Applicant: FUJI PHOTO FILM CO., LTD.Inventor: Toshiki Taguchi
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Publication number: 20020041976Abstract: Benzofuran, benzothiophene or indole oligomers, co-oligomers, polymers and copolymers, methods for their production, and their use in charge transport and light emission regions of electroluminescent devices are described.Type: ApplicationFiled: March 26, 2001Publication date: April 11, 2002Inventors: Sally Anderson, Michael Stuart Weaver
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Publication number: 20020035222Abstract: A water-soluble polymeric adhesion promoter is represented by the following formula (I): 1Type: ApplicationFiled: January 18, 2001Publication date: March 21, 2002Inventors: Se Yong Oh, Chan Eon Park, Sang Min Song
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Patent number: 6355712Abstract: The present invention is directed to a copolymer containing a hydrophilic copolymerizable monomer and a plastisol obtained by the use of the copolymer, which exhibits reduced viscosity and longer pot-life.Type: GrantFiled: March 28, 2000Date of Patent: March 12, 2002Assignee: Roehm GmbH & Co KGInventors: Klaus Schultes, Guenther Schmitt, Andreas Olschewski, Theodor Mager
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Patent number: 6350838Abstract: A curable composition for encapsulating an electronic component comprises one or more mono- or polyfunctional maleimide compounds, or one or more mono- or polyfunctional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, with a free radical curing agent, and optionally, one or more fillers.Type: GrantFiled: June 28, 2001Date of Patent: February 26, 2002Assignee: National Starch and Chemical Investment Holding CorporationInventors: Bodan Ma, Quinn K. Tong
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Patent number: 6350841Abstract: This invention relates to underfill encapsulant compositions prepared from allylated amide compounds to protect and reinforce the interconnections between an electronic component and a substrate in a microelectronic device.Type: GrantFiled: June 7, 2001Date of Patent: February 26, 2002Assignee: National Starch and Chemical Investment Holding CorporationInventors: Rose Ann Schultz, Donald Herr, Chaodong Xiao
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Patent number: 6344531Abstract: Water-soluble polymers of Formula Useful comprising from about 0.001 to about 10.0 mole percent of a Repeating Mer Unit represented by the formula: wherein a is an integer of from 1 to 10, R1 is selected from the group consisting of hydrogen and methyl groups, R2 and R3 are methyl groups, and R9 is selected from the group consisting of NH and O; and TAG is a fluorescing moiety; are described and claimed.Type: GrantFiled: August 31, 1999Date of Patent: February 5, 2002Assignee: Nalco Chemical CompanyInventors: Patrick G. Murray, Wesley L. Whipple
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Publication number: 20010056162Abstract: A curable composition for encapsulating an electronic component comprises one or more mono- or polyfunctional maleimide compounds, or one or more mono- or polyfunctional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, with a free radical curing agent, and optionally, one or more fillers.Type: ApplicationFiled: June 28, 2001Publication date: December 27, 2001Inventors: Bodan Ma, Quinn K. Tong
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Patent number: 6329445Abstract: An ocular lens material comprising a polymer prepared by polymerizing a component containing a benzotriazole compound (A) represented by the formula (I): wherein X is hydrogen, a halogen, an alkyl having 1 to 3 carbons or an alkoxy having 1 to 3 carbons, R1 is an alkylene having 2 to 10 carbons, R2 is hydrogen, methyl or a halogenated methyl, R3 is hydrogen, an alkyl or an aryl, and each of R4 and R5 is independently an alkyl having 1 to 8 carbons. The material shows excellent ultraviolet-ray absorbing power and oxidation inhibiting power at the same time.Type: GrantFiled: February 29, 2000Date of Patent: December 11, 2001Assignee: Menicon Co., LTDInventors: Akiko Okumura, Kazuhiko Nakada, Akinori Okumura
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Patent number: 6326448Abstract: A soft intraocular lens material which consists essentially of a polymer obtained by polymerizing polymerizable components containing a hydrophilic monomer, and which has a water absorptivity of from 1.5 to 4.5 wt %.Type: GrantFiled: February 18, 1999Date of Patent: December 4, 2001Assignee: Menicon Co., Ltd.Inventors: Tatsuya Ojio, Kazuharu Niwa, Tohru Kawaguchi
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Patent number: 6316566Abstract: A curable composition for encapsulating an electronic component comprises one or more mono- or polyfunctional maleimide compounds, or one or more mono- or polyfunctional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, with a free radical curing agent, and optionally, one or more fillers.Type: GrantFiled: June 18, 1999Date of Patent: November 13, 2001Assignee: National Starch and Chemical Investment Holding CorporationInventors: Bodan Ma, Quinn K. Tong
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Patent number: 6316565Abstract: A novel copolymer useful for photoresist, which allows a formation of patterns showing a significantly improved resolution in a photolithography using ArF (193 nm) light source, is prepared by copolymerizing at least two cycloaliphatic olefins with an amide or imide.Type: GrantFiled: July 18, 1997Date of Patent: November 13, 2001Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Chi Hyeong Roh
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Patent number: 6313247Abstract: Enantioseparation methods using chemical compounds which contain the chiral 9,11-substituted-10,11-dihydro-cinchonan skeleton (9,11-Subst.-DHC) and the precursors thereof with the 9-substituted cinchonan skeleton (9-Subst.-C) are described and discussed. The chiral compounds of the present invention are based on cinchonan derivatives containing amide structure elements which support effectively and co-operatively the enantioseparation of chiral acidic selectands involving also ion-pair and ion-exchange binding mechanism between the strong amino group of the selector and the acidic group of the selectand. The methods of enantioseparation of the present invention are related to stereoselective liquid-liquid and liquid-solid type extraction principles and fractionated crystallization employing cinchonan derivative type selectors.Type: GrantFiled: November 17, 1999Date of Patent: November 6, 2001Inventors: Wolfgang Lindner, Michael Laemmerhofer, Norbert Maier
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Patent number: 6300410Abstract: There is provided a polymer useful in coating, ink and adhesive compositions. The polymer has monomeric units derived from a monomer having the formula: wherein: R1 is alkylene having about 2 or 3 carbon atoms; R2 is alkylene having about 2 to about 10 carbon atoms; X is oxygen, sulfur, or NR3 wherein R3 is hydrogen, alkyl, alicyclic, aryl, heteroalkyl, heterocyclic; R4 has the structure of the residue of an alicylic diisocyanate wherein the isocyanate groups have reactivities that differ one from another; Y is oxygen, sulfur, or NR5 wherein R5 is hydrogen, alkyl, alicyclic, aryl, heteroalkyl, or heterocyclic; R6 is alkylene, arylene, aralkylene, alkarylene, or heteroalkylene; Z is oxygen, sulfur, or NR7 wherein R7 is hydrogen, alkyl, alicylic, aryl, heteroalkyl, or heterocyclic; and R8 is hydrogen or methyl. The polymer is further comprised of monomeric units from at least one other polymer. Further disclosed is a latex of the polymer and paints, inks or adhesives having the latex.Type: GrantFiled: May 26, 2000Date of Patent: October 9, 2001Assignee: Rhodia, Inc.Inventors: Norman Shachat, Zenyk Kosarych
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Publication number: 20010026879Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) 1Type: ApplicationFiled: May 8, 2001Publication date: October 4, 2001Inventors: Yun Chen, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
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Acid activation of ruthenium metathesis catalysts and living ROMP metathesis polymerization in water
Patent number: 6284852Abstract: Activation of ruthenium based catalyst compounds with acid to improve reaction rates and yields of olefin metathesis reactions, including ROMP, RCM, ADMET and cross-metathesis reactions is disclosed. The ruthenium catalyst compounds are ruthenium carbene complexes of the general formula AxLyXzRu═CHR′ where x=0, 1 or 2, y=0, 1 or 2, and z=1 or 2 and where R′ is hydrogen or a substituted or unsubstituted alkyl or aryl, L is any neutral electron donor, X is any anionic ligand, and A is a ligand having a covalent structure connecting a neutral electron donor and an anionic ligand. The use of acid with these catalysts allows for reactions with a wide range of olefins in a variety of solvents, including acid-initiated RIM processes and living ROMP reactions of water-soluble monomers in water.Type: GrantFiled: October 29, 1998Date of Patent: September 4, 2001Assignee: California Institute of TechnologyInventors: David M. Lynn, Eric L. Dias, Robert H. Grubbs, Bernard Mohr -
Patent number: 6281314Abstract: A curable composition for use in the fabrication and assembly of circuit components and printed wire boards, which may be designed to be reworkable, comprises one or more mono- or polyfunctional maleimide compounds, or one or more mono- or polyfunctional vinyl compounds other than maleimide compounds, or a combination of maleimide and vinyl compounds, with a free-radical initiator or a photoinitiator, and optionally, one or more fillers. The circuit component is formed by applying the curable composition to the printed wire board and curing the composition in situ on the board.Type: GrantFiled: June 18, 1999Date of Patent: August 28, 2001Assignee: National Starch and Chemical Investment Holding CorporationInventors: Quinn K. Tong, Bodan Ma, Chaodong Xiao
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Patent number: 6281313Abstract: The present invention provides a 2,2′-bis(6-benzotriazolylphenol) compound represented by the formula wherein A represents a methylene group or the like, R1 and R5 each represent a hydrogen atom, an alkyl group or the like, R2 represents a hydrogen atom or the like, R3 represents an alkylene group or the like, and R4 represents a hydrogen atom or a methyl group. The compound of the invention is useful as an UV absorber. Further, the compound of the invention can be incorporated into a copolymer by copolymerization with a vinyl monomer, and a polymer composition containing the copolymer can be used as an UV absorber.Type: GrantFiled: May 11, 2000Date of Patent: August 28, 2001Assignee: Otsuka Chemical Co., Ltd.Inventors: Shinji Nakano, Emiko Daimon, Minoru Yamamoto, Mitsuo Akada
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Patent number: 6261676Abstract: An ultraviolet light absorbing material that resists blooming and migration is made up of a fluoropolymer and an amide functional ultraviolet light absorbing compound, wherein the polymer and the amide functional ultraviolet light absorbing compound are hydrogen bonded to one another. Polymeric films that contain a polymeric matrix and the ultraviolet light absorbing material are useful as the top layer in multilayer constructions such as retroreflective sheetings and conformable marking sheets.Type: GrantFiled: August 3, 1999Date of Patent: July 17, 2001Assignee: 3M Innovative Properties CompanyInventors: David B. Olson, David M. Burns, Bruce B. Wilson
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Patent number: 6258905Abstract: Disclosed are stabilized unimolecular initiator compounds which are useful for initiating living radical polymerization of polymerizable hydrocarbons. The stabilized unimolecular initiator compounds are the reaction products of polymerization initiator radical-forming compounds, such as organo peroxides and azo compounds, and stable radical-forming compounds, wherein the polymerization initiator radicals are capable of initiating polymerization of polymerizable hydrocarbons and the stable radicals, alone, are not capable of initiating polymerization of hydrocarbons. An exemplary stabilized unimolecular initiator compound is 1-benzoylperoxy-2,2,6,6-tetramethyl-1-piperidine which is the reaction product of benzoyl peroxide, (BPO), and 2,2,6,6-tetramethyl-1-piperidineyloxy, (TEMPO).Type: GrantFiled: August 3, 1999Date of Patent: July 10, 2001Inventors: Zhe Wu, Dekun Wang
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Patent number: 6258911Abstract: A polymer having groups located at the ends of the polymer chain which groups are derived from stable free radical compounds, wherein the polymer is of the formula: SFR—(R)—SFR wherein SFR represents a covalently bonded stable free radical group and R represents a thermoplastic resin.Type: GrantFiled: August 18, 1994Date of Patent: July 10, 2001Assignee: Xerox CorporationInventors: Michael K. Georges, Toyofumi Inoue, Gordon K. Hamer, Peter M. Kazmaier, Richard P. N. Veregin
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Patent number: 6252024Abstract: A water-insoluble copolymer which is composed of (a) from 39.9 to 60% by weight of N,N-dimethylacrylamide or N,N-dimethylmethacrylamide; (b) from 60 to 39.9% by weight of N-alkylated acryl amides or N-alkylated methacryl amides; (c) from 0.1 to 0.7% by weight of a proton-sensitive fluorophore which is covalently bonded to the copolymer; and (d) from 0 to 20% by weight of a diolefinic crosslinking component. The copolymer is used in the form of a membrane on a transparent support material as an optical sensor for ionic strength-independent pH value determination.Type: GrantFiled: November 2, 1998Date of Patent: June 26, 2001Assignee: Novartis AGInventors: Steven Mark Barnard, Joseph Berger, Marizel Rouilly, Adrian Waldner
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Patent number: 6248457Abstract: This invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally contain repeat units of the general formula (3) in which L1 and L2 mean a photoluminescent residue, wherein the proportion of structural units of the formulae (1) and/or (2) is in each case 0.5 to 100 mol. %, and (3) 0 to 99.5 mol. %, and the molar percentages add up to 100, to the use thereof for the production of electroluminescent devices and to the electroluminescent devices.Type: GrantFiled: February 9, 1996Date of Patent: June 19, 2001Assignee: Bayer AGInventors: Yun Chen, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
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Patent number: 6235849Abstract: The invention is directed to polymers containing a repeating unit derived from a norbornene sulfonamide. These may be addition polymers which include copolymers with one or more comonomers such as norbornene, ethylene, an acrylate or sulfur dioxide or carbon monoxide. Said monomers may be polymerized using single or multicomponent Group VIII catalysts. The norbornene sulfonamides can also form ROMP polymers using known metathesis catalysts. Preferably the ROMP polymers may be hydrogenated to give more stable polymers.Type: GrantFiled: February 3, 2000Date of Patent: May 22, 2001Assignee: The B. F. Goodrich CompanyInventors: Saikumar Jayaraman, Richard Vicari, Larry F. Rhodes
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Patent number: 6207779Abstract: The present invention provides a ring-opened polymer, which is prepared by reacting at least one pericyclic olefin elected from those represented by formulae (I) and (II) through ring-opening metathesis polymerization wherein A and B may be the same or different and are independently selected from the group consisting of halogen, hydrogen, C3-20 cyclic or pericyclic alkyl, C1-20 linear and branched alkyl, C6-20 aryl, C7-20 arylalkyl, C7-20 alkylaryl, silyl, alkylsilyl, germyl, alkylgermyl, alkoxycarbonyl, acyl, and a heterocylic group; or, A and B are linked together to form a C3-20 saturated or unsaturated cyclic hydrocarbon group or a substituted or unsubstituted heterocyclic group; C is selected from the group consisting of oxygen, sulfur, —CH2—, and —SiH2—, wherein each R1 is independently selected from C1-20 alkyl and phenyl; each R is independently selected from hydrogen, halogen, and C1-20 alkyl; and each n is an integer from 1 to 6Type: GrantFiled: December 17, 1998Date of Patent: March 27, 2001Assignees: Industrial Technology Research Institute, Everlight Chemical Industrial CorporationInventors: Sheng-Yueh Chang, Bang-Chein Ho, Jian-Hong Chen, Tai-Sheng Yeh, Jui-Fa Chang
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Patent number: 6201087Abstract: A polymer having the formula wherein M1 and M2 signify monomer units for homo- or copolymers. “x” and “y” indicate the mole fractions of the comonomers, with in each case 0<x≦1 and 0≦y<1 and x+y=1. The symbol “p” signifies 4 to 30,000 and “S1” and “S2” signify spacer units. “Q1” signifies a structural unit of the formula —A—(Z1—B)z—Z2— and “Q2” signifies a structural unit of the formula —A—(Z1—B)zR1. “A” and “B” each independently signify pyridine-2,5-diyl, pyrimidine-2,5-diyl, 1,4—Cyclohexylene,1,3-dioxane-2,5-diyl or optionally substituted 1,4-phenylene.Type: GrantFiled: March 27, 1997Date of Patent: March 13, 2001Assignee: Rolic AGInventors: Rolf Peter Herr, François Herzog, Andreas Schuster
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Patent number: 6197923Abstract: N-Oxides of nitrogenous heterocycle or nitrogenous fused heterocycle polymers of general formula (1) or (7) (wherein any two of a, b, c, d, e, f, g and h are carbon atoms participating in the bonding between repeating units; at least one of them is N→O; the rest are each CH, N or N→O; and the degree of polymerization “n” is at least 5). These polymers have excellent heat resistance, are soluble in aqueous or organic solvents and controllable in the degree of depolarization and electrochemical redox potential, exhibit clear color changes by chemical or electrochemical oxidation or reduction, and are conductive per se . They can be used as moldings such as fibers and films; electrochromic elements; active materials and electrodes of cells; semiconductors including n-type semiconductors; and so on.Type: GrantFiled: April 20, 1998Date of Patent: March 6, 2001Assignee: Nissan Chemical Industries, Ltd.Inventor: Takakazu Yamamoto
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Patent number: 6194529Abstract: Polyacetylene compounds and process for the preparation thereof from a chiral dihydroxy amide are described. The compounds preferably have diacyl groups attached to the amide. The compounds are useful for making films which are electrically conductive, near infrared absorbing, polarizing, and have the characteristic optical and other properties of polyacetylenes.Type: GrantFiled: March 19, 1999Date of Patent: February 27, 2001Assignee: Board of Trustees operating Michigan State UniversityInventors: Rawle I. Hollingsworth, Guijun Wang
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Patent number: 6165684Abstract: A composition for a bottom anti-reflective coating material and a method for forming a resist pattern using the composition, which are high in the dry etching rate, high in the resolution, excellent in the resist film thickness dependency and high in the effect of preventing reflective light against exposure light, and provide no intermixing with the photoresist layer, are disclosed, wherein the composition for a bottom anti-reflective coating material comprises a naphthalene group-containing polymer compound having a specific structure.Type: GrantFiled: December 23, 1997Date of Patent: December 26, 2000Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuyoshi Mizutani, Makoto Momota
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Patent number: 6153760Abstract: A method for preparing a lens having UV-absorbing properties involves charging to a mold a monomer mixture comprising lens-forming monomers and an essentially non-UV-absorbing compound, and curing the monomer mixture to form a lens, followed by treating the lens to convert the essentially non-UV-absorbing compound to a UV-absorbing agent.Type: GrantFiled: March 19, 1999Date of Patent: November 28, 2000Assignee: Bausch & Lomb IncorporatedInventor: Jay F. Kunzler
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Patent number: 6147177Abstract: Polycyclic polymers containing pendant aromatic moieties are disclosed. The polymers exhibit light transparency properties to deep UV wave lengths making them useful for high resolution photolithographic applications. These polymers are particularly useful in chemically amplified positive and negative tone resists.Type: GrantFiled: February 19, 1999Date of Patent: November 14, 2000Assignees: The B. F. Goodrich Company, International Business Machines CorporationInventors: Saikumar Jayaraman, Brian Leslie Goodall, Larry Funderburk Rhodes, Robert Adam Shick, Richard Vicari, Robert David Allen, Juliann Opitz, Ratnam Sooriyakumaran, Thomas Wallow
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Patent number: 6114463Abstract: The present invention relates to (co)polymers which contain at least one repeating structural chain unit of the general formula (1) and/or (2) and optionally repeating units of the general formula (3) ##STR1## in which L.sup.1 and L.sup.2, independently of each other, represent a photoluminescent grouping, a process for their preparation, their use in electroluminescent devices and the electroluminescent devices.Type: GrantFiled: August 11, 1997Date of Patent: September 5, 2000Assignee: Bayer AGInventors: Yun Chen, Burkhard Kohler, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
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Patent number: 6100009Abstract: An image recording medium is disclosed which comprising: an acid generating agent capable of generating an acid by the action of heat or an acid, which is represented by the following formula (1); and a compound of causing variation in the absorption region of from 360 to 900 nm by the intramolecular or intermolecular reaction triggered by the action of an acid:W.sup.1 OP (1)wherein W.sup.1 represents a residue of an acid represented by W.sup.1 OH, and P represents an acid-sensitive substituent capable of splitting off at a temperature of 150.degree. C. or less due to catalysis by W.sup.1 OH.Type: GrantFiled: October 15, 1998Date of Patent: August 8, 2000Assignee: Fuji Photo Film Co., Ltd.Inventors: Tatsuhiko Obayashi, Junichi Yamanouchi, Atsuhiro Ohkawa
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Patent number: 6096846Abstract: An ultraviolet absorbing base material is disclosed in which a vinyl copolymerizable monomer and a benzotriazole ultraviolet absorbing monomer represented by formula (I) or (II) are copolymerized: ##STR1## wherein X represents H or a halogen, R.sub.1 is H or an alkyl group having 1 to 6 carbon atoms, R.sub.2 and R.sub.3 each represents a linear or branched C.sub.1 -C.sub.10 alkylene group and R.sub.4 represents H or CH.sub.3.Type: GrantFiled: August 31, 1998Date of Patent: August 1, 2000Assignee: Nidek Co., Ltd.Inventors: Haruo Oda, Tsutomu Sunada, Yoshihiro Nakahata
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Patent number: 6080826Abstract: Functionalized cyclic olefins and methods for making the same are disclosed. Methods include template-directed ring-closing metathesis ("RCM") of functionalized acyclic dienes and template-directed depolymerization of functionalized polymers possessing regularly spaced sites of unsaturation. Although the template species may be any anion, cation, or dipolar compound, cationic species, especially alkali metals, are preferred. Functionalized polymers with regularly spaced sites of unsaturation and methods for making the same are also disclosed. One method for synthesizing these polymers is by ring-opening metathesis polymerization ("ROMP") of functionalized cyclic olefins. The metathesis catalysts for both RCM and ROMP reaction are ruthenium or osmium carbene complex catalysts of the formula ##STR1## where M is Os or Ru; R and R.sup.1 each may be hydrogen, C.sub.2 -C.sub.20 alkenyl, C.sub.2 -C.sub.20 alkynyl, C.sub.1 -C.sub.20 alkyl, aryl, C.sub.1 -C.sub.20 carboxylate, C.sub.1 -C.sub.20 alkoxy, C.sub.2 -C.sub.Type: GrantFiled: December 18, 1997Date of Patent: June 27, 2000Assignee: California Institute of TechnologyInventors: Robert H. Grubbs, Michael J. Marsella, Heather D. Maynard
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Patent number: 6069275Abstract: A novel monomer composition for promoting wet adhesion of latex polymers for paints is provided. The composition consists essentially of a monomer having the formula: ##STR1## The preferred monomer is derived from the reaction of hydroxyethyl methacrylate with isophorone diisocyanate followed by reaction of the monourethane product the N-aminoethyl ethylene urea. The monomer is preferably copolymerized in an emulsion polymerization with acrylic and/or vinyl monomers.Type: GrantFiled: January 28, 1998Date of Patent: May 30, 2000Assignee: Rhodia Inc.Inventors: Norman Shachat, Zenyk Kosarych
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Patent number: 6043327Abstract: The present invention is directed to an anaerobic adhesive composition which includes an acrylate monomer; a coreactant monomer; and an anaerobic cure-inducing composition. The composition may also include a maleimide compound. Reaction products of compositions in accordance with this invention exhibit superior resistence to thermal depredation, such as under elevated temperature conditions.Type: GrantFiled: July 3, 1997Date of Patent: March 28, 2000Assignee: Loctite CorporationInventors: Shabbir Attarwala, Gina M. Mazzella
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Patent number: 6034183Abstract: A process for preparing polymers having quaternary ammonium groups comprising polymerizing a vinyl monomer component containing a vinyl monomer having a tertiary amino group in the presence of a specific solvent, while quaternizing the tertiary amino group with a quaternizing agent, to produce the vinyl polymers having quaternary ammonium groups in the form of particles dispersed in the solvent, which is possible to easily separate the produced polymers having quaternary ammonium groups from the solvent without requiring a heating step for removing the solvent, and which can produce quaternary ammonium group-containing copolymers having a high content of a hydrophobic vinyl monomer. The quaternary ammonium group-containing copolymers obtained by this process are useful as modifier for plastics, permanent antistatic agent, bactericide or fungicide, chemicals for paper making and water treating agent.Type: GrantFiled: June 8, 1998Date of Patent: March 7, 2000Assignee: Arakawa Chemical Industries, Ltd.Inventors: Tatsuya Okumura, Jiro Mizuya, Junji Shiigi
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Patent number: 5989775Abstract: A copolymer having a repeating unit represented by the following general formula I and a chemical amplification positive photoresist composition having the copolymer and a photoacid generator. The photoresist can allow for a good pattern shape even though a post-baking is taken in a somewhat delayed time and for a use of any radiation, such as uv light, deep uv light and charged particle beam. Also, it is superior in storage stability and resolution so that it is useful for the high integration of semiconductor devices. The polymer ranges, in polystyrene-reduced average molecular weight, from 1,000 to 1,000,000. The polymer is represented by the following repeating pattern: ##STR1## wherein, R.sub.1, R.sub.2 and R.sub.3 independently represent a hydrogen atom or a methyl; R.sub.4, R.sub.5 and R.sub.6 independently represent a hydrogen atom, an alkyl group, an alkoxy group or a halogen; 1, m, n each is a repeating number satisfying the condition that 0.3<1/(m+n)<0.9, 0.1<m/(1+n)<0.6 and 0.Type: GrantFiled: December 26, 1997Date of Patent: November 23, 1999Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Joo-Hyeon Park, Ji-Hong Kim, Ki-Dae Kim, Sun-Yi Park, Seong-Ju Kim
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Patent number: 5985444Abstract: An ultraviolet light absorbing material that resists blooming and migration is made up of a fluoropolymer and an amide functional ultraviolet light absorbing compound, wherein the polymer and the amide functional ultraviolet light absorbing compound are hydrogen bonded to one another. Polymeric films that contain a polymeric matrix and the ultraviolet light absorbing material are useful as the top layer in multilayer constructions such as retroreflective sheetings and conformable marking sheets.Type: GrantFiled: April 3, 1998Date of Patent: November 16, 1999Assignee: 3M Innovative Properties CompanyInventors: David B. Olson, David M. Burns, Bruce B. Wilson
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Patent number: 5986030Abstract: A cationic water-soluble polymer comprising from 0.001 to 10 mole percent of a repeating mer unit represented by the formula ##STR1## wherein a is an integer of from 1 to 10, R.sub.1 is selected from the group consisting of hydrogen and methyl groups, R.sub.2 and R.sub.3 are methyl groups, fluor is a fluorescing moiety and X is selected from the group consisting of chloride, iodide and bromide ions and wherein the polymer also contains from 90 to 99.Type: GrantFiled: April 15, 1997Date of Patent: November 16, 1999Assignee: Nalco Chemical CompanyInventors: Patrick G. Murray, Wesley L. Whipple
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Patent number: 5968640Abstract: The morphology of multidimensional, thermally stable oligomers is combined with the inclusion of charge carrier linkages within the polymer arms to produce thermally stable advanced composites from cured oligomers that are conductive or semiconductive if suitably doped.Type: GrantFiled: September 5, 1985Date of Patent: October 19, 1999Assignee: The Boeing CompanyInventors: Hyman R. Lubowitz, Clyde H. Sheppard, Larry P. Torre
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Patent number: 5955566Abstract: Thermosetting polymers with high temperature capability for composite and adhesive applications are disclosed. Inhibitors for improving pot life, gel time and storage stability are disclosed. These polymers are ideally suited for adhesives and RTM, resin film infusion, and prepreg methods to make polymer matrix, fiber reinforced composite parts.Type: GrantFiled: November 13, 1996Date of Patent: September 21, 1999Assignee: Cytec Technology CorporationInventors: Jean Lee, Jack Douglas Boyd, Albert Kuo
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Patent number: 5945457Abstract: A hemocompatible composition comprising a polymer containing at least one pharmacologic material chemically bonded to a polymer backbone. Such compositions may be obtained by reacting a pharmacologic material with a compound containing a polymerizable group (e.g., an acyl halide) and thereafter either copolymerizing the acylated material with one or more copolymerizable monomers or first irradiating a backbone polymer and thereafter grafting the acylated pharmacologic material onto the irradiated polymer. The resulting products are hemocompatible and may be used in the manufacture of medical devices which come in contact with blood or other bodily fluids. The advantage of chemically bonded pharmacologic materials is that they are not leached out and retain their pharmaceutical effectiveness for a long period of time. The compositions may contain one or more additional pharmacologic materials which are physically admixed with polymers containing bonded pharmacologic materials.Type: GrantFiled: October 1, 1997Date of Patent: August 31, 1999Assignee: A.V. Topchiev Institute of Petrochemical Synthesis, Russian Academy of ScienceInventors: Nicolai A. Plate, Lev I. Valuev, Lubov D. Uzhinova, Vladimir A. Sinani
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Patent number: 5891975Abstract: The present invention relates to (co)polymers which contain at least one repeat chain unit of the general formula (1) or (2) and optionally repeat units of the general formula (3), ##STR1## in which L.sup.1 and L.sup.2 mutually independently mean a photoluminescent residue, to a process for the production thereof, to the use thereof in electroluminescent devices and to the electroluminescent devices.Type: GrantFiled: March 20, 1996Date of Patent: April 6, 1999Assignee: Bayer AktiengesellschaftInventors: Yun Chen, Burkhard Kohler, Rolf Wehrmann, Andreas Elschner, Ralf Dujardin
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Patent number: 5866635Abstract: A reactive monomer for preparing ultraviolet absorbing polymers has formula (I) wherein R.sup.1 is a halogen or C.sub.1 -C.sub.6 straight or branched chain alkoxy group; and R is a --(CH.sub.2).sub.3 O--, --(CH.sub.2).sub.2 O--, --CH(CH.sub.3)CH.sub.2 O--, --CH.sub.2 CH(CH.sub.3)O(--, --(CH.sub.2).sub.3 OCH.sub.2 --, --(CH.sub.2).sub.2 OCH.sub.2 --, --CH(CH.sub.3)CH.sub.2 OCH.sub.2 --, or --CH.sub.2 CH(CH.sub.3)OCH.sub.2 --group. The compound can be used to produce ultraviolet absorbing polymers, such as those used for ocular devices including contact and intraocular lenses.Type: GrantFiled: February 4, 1998Date of Patent: February 2, 1999Assignee: Wesley Jessen CorporationInventors: Theresa A. Collins, John T. Mulvihill
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Patent number: 5863993Abstract: A preparation method of polymerid rod using free radical bulk polymerization with temperature gradient, comprising the steps of, charging a mixture of monomer which can be subjected to a radical polymerization, polymerization initiator and cross linking agent into a reaction container of tube shape having a constant inner diameter and performing radical polymerization of the monomer, by passing the said reaction container in a constant dipping speed through a zone downwardly from upper part to lower part of the said zone, wherein the upper part of the zone is maintained at a relatively low temperature (TL) and the lower part of the zone is maintained at a relatively high temperature (TH) than that of the said upper part so that the medium part located between the upper part and lower part has a temperature gradient of (TH-TL)/L (wherein, L is defined as a vertical distance of the temperature-gradient zone).Type: GrantFiled: September 5, 1996Date of Patent: January 26, 1999Assignee: Electronics and Telecommunications Research InstituteInventor: Sang-Don Jung
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Patent number: 5856422Abstract: Optically active poly(aryl)ether polymers prepared from monomers containing optically pure spirobiindane and/or indane moieties are disclosed. The chiral poly(aryl)ether polymers are of high molecular weight and exhibit high optical rotations. In addition, the polyethers are thermally stable at high temperatures and exhibit excellent hydrolytic resistance making them useful in high temperature processing applications, in the fabrication of optoelectronics devices, and as polarizing coatings and filters.Type: GrantFiled: October 24, 1997Date of Patent: January 5, 1999Assignee: Molecular OptoElectronics CorporationInventors: Kwok Pong Chan, Kevin R. Stewart, Janet L. Gordon
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Patent number: 5854323Abstract: The present invention provide an aqueous type pigment dispersing agent having one portion which has a high affinity with a pigment and which has at least one type of selected from the group consisting of an organic dye, anthraquinone and acridone and only at a terminal end or at both terminal ends of at least one aqueous polymer selected from an aqueous linear urethanic polymer and an aqueous linear acrylic polymer, a pigment composition using the same and a pigment dispersion. The portion having a high affinity with the pigment can be adsorbed efficiently on the surface of a pigment. At the same time, for example, a pigment, used for ink or paint can be dispersed stably due to the affinity between the polymer portion and a disperse medium to improve the adaptability in use and the quality of coating articles.Type: GrantFiled: September 11, 1996Date of Patent: December 29, 1998Assignee: Toyo Ink Manufacturing Co., Ltd.Inventors: Tadashi Itabashi, Takashi Kamikubo, Katsuhiko Sawamura