Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, P, PO, PO2, and SiR2; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R10 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.

Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R8 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.

Abstract: The present invention relates to films and laminates which shield thermal radiation and are based on IR-reflective liquid-crystalline layers, to a process for the production thereof, to pigments comprising them and to a composition which comprises a particular chiral dopant.

Abstract: Disclosed are electroluminescent materials comprising a homopolymer based on recurring structural units of the formula (I) wherein R9, R9? R9?, R11, R13? R14, R11?, R13?, R14? independently are H or an organic substituent, where at least one of R9, R9? R9?, R11, R13 R14, R11?, R13?, R14? comprises a group R10 of the formula —(Sp)x10-[PG?]< wherein Sp is a divalent organic spacer, PG? is a group derived from a polymerisable group, and x10 is 0 or 1, with substituents and spacer as defined in claim 1. Further disclosed are some novel polymers of this class as well as monomers for their preparation. The homopolymers are advantageously used as a host material in devices further comprising a luminiscent component, which is usually selected from phosphorescent metal complexes and fluorescent dopants.

Abstract: Disclosed is an ether-containing cyclic structure-containing polymer derived from a monomer represented by formula (1) below, or derived from a monomer represented by formula (1) below and a single or more species of cyclic olefinic monomer(s), having a refractive index of equal to or larger than 1.53 and an Abbe number of equal to or larger than 56. Each of R11 to R14 independently represents a hydrogen atom or a substituent, or R11 to R14 may bond with each other to form a cyclic structure; each of X and Y independently represents a substituted or non-substituted, carbon atom, oxygen atom, or sulfur atom; and m represents 0 or 1.

Abstract: There is provided an electroactive material having Formula I wherein: Q is the same or different at each occurrence and can be O, S, Se, Te, NR, SO, SO2, or SiR3; R is the same or different at each occurrence and can be hydrogen, alkyl, aryl, alkenyl, or alkynyl; R1 through R8 are the same or different and can be hydrogen, alkyl, aryl, halogen, hydroxyl, aryloxy, alkoxy, alkenyl, alkynyl, amino, alkylthio, phosphino, silyl, —COR, —COOR, —PO3R2, —OPO3R2, or CN.

Abstract: Isomannide-based compounds having chiral properties are provided, in addition to liquid crystal compositions and polymer networks derived therefrom.

Abstract: Disclosed are a (meth)acrylate compound, a photosensitive polymer, and a resist composition, and the (meth)acrylate compound includes a lactone-group-containing (meth)acrylate compound represented by the following Chemical Formula 1.

Abstract: Initiator polymers having an initiator group and a ligand group are provided. The initiator polymers are capable of specifically binding to a receptor on a surface. Using a macromer system, the initiator polymers are useful for the formation of a polymeric matrix on the surface of a material. In particular, initiator polymers are provided that have specificity to pancreatic ? cells and can be used to encapsulate cells for transplantation and the treatment of diabetes.

Abstract: A pattern is formed by (1) coating a first positive resist composition onto a substrate, baking, patternwise exposing, PEB, and developing to form a first positive resist pattern including a large area feature, (2) applying a resist-modifying composition comprising a basic nitrogen-containing compound and heating to modify the first resist pattern, and (3) coating a second positive resist composition thereon, patternwise exposing, and developing to form a second resist pattern. The large area feature in the first resist pattern has a film retentivity of at least 50% after the second pattern formation.

Abstract: Polymeric compositions for semiconductor applications comprising 10 to 99 wt. % of norbornene-type cycloolefin monomers represented by one or more of Formula I(a), I(b), and optionally I(c) and/or I(d), 0.0005 to 0.5 wt. % of an addition polymerization procatalyst, and optionally: up to 0.5 wt. % of a cocatalyst, up to 59 wt. % of a crosslinking monomer, up to 50 wt. % of a viscosifier, up to 20 wt. % of a thixotropic additive(s), up to 80 wt. % of a filler, up to 10 wt. % of an antioxidant, and up to 0.6 wt. % of an antioxidant synergist, the total of the components of the formulation adding up to 100%. Such formulations are mass polymerized, or cured, to form polymeric compositions that have properties desirable for a variety of specific electronic, microelectronic, optoelectronic and micro-optoelectronic applications such as die attach adhesives, underfill materials, prepreg binders, encapsulants, protective layers, and other related applications.

Abstract: A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a first repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, and Z represents a monovalent group that generates an acid upon exposure to radiation.

Abstract: A resin comprises a structural unit derived from a compound represented by the formula (aa) wherein T represents a C4 to C36 alicyclic hydrocarbon group, the hydrogen atom contained in the alicyclic hydrocarbon group may be replaced by a halogen atom, a hydroxyl group, a C1 to C12 alkyl group optionally substituted with a halogen atom or a hydroxyl group, a C1 to C12 alkoxyl group, a C6 to C12 aryl group, a C7 to C12 aralkyl group, a glycidyloxy group, a C2 to C4 acyl group, an alkoxycarbonyl group, an alkanoyloxyalkyl group or a cyano group, and the —CH2— contained in the alicyclic hydrocarbon group is replaced by at least one —SO2— and furthermore may be replaced by —CO—, —O—, —S—, —SO2— or —N(Rc)—; Rc represents a hydrogen atom or a C1 to C6 alkyl group; R1 represents a hydrogen atom, a halogen atom, or a C1 to C6 alkyl group that may optionally has halogen atoms; and Z1 represents an optionally substituted C1 to C17 saturated hydrocarbon group, and the —CH2— contained in the saturated hydrocarbon grou

Abstract: The invention relates to novel compounds of formula (I): in which R1, R2 and R3, identical or different, independently represent: hydrogen a halogen a C1 to C15 hydroxy or hydroxyalkyl group a C1 to C15 linear or branched alkyl group a, b and c independently lying between 0 and 5. R4 is linked to the naphthalene unit at position 1, 2 or 3 via a —CH2—O— bond and represents: either a divalent group which is (co)polymerisable with a monomer; in which case d lies between 1 and 3 or a monovalent group which is (co)polymerisable with a monomer; in which case d is equal to 2 or 3 and R5 is linked to the naphthalene unit at position 1, 2 or 3 and represents: hydrogen, a halogen, a C1 to C15 hydroxyalkyl group, a C1 to C15 linear or branched alkyl group, and e is an integer lying between 0 and 2 and such that d+e=3. It also relates to the method for synthesising these compounds and to their use for the manufacture of photochromic or photosensitive polymers.

Abstract: The present invention provides novel hybrid polymer useful for alignment layers for inducing alignment of a liquid crystal medium. Hybrid polymers of this invention are prepared from a) at least one component selected from the group consisting of oligomer(s) and polymer(s) within the class of polyimides, poly(amic acids) and esters thereof wherein the at least one component comprises at least one initiator generating moiety, and b) at least one component selected from the group consisting of addition monomer(s) and addition polymer(s), wherein the two components are covalently bonded to form a copolymer. The invention further describes liquid crystal elements such as all liquid crystal display products or modes, liquid crystal devices and liquid crystal optical films comprising the novel hybrid polymer alignment layers.

Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: Heteroatom-containing polymers such as polyketals, and methods of making and using such heteroatom-containing polymers are disclosed herein. The heteroatom-containing polymers can be useful for applications including, for example, medical devices and pharmaceutical compositions. In a preferred embodiment, the heteroatom-containing polymers are polyketals that are biodegradable.

Abstract: A polymer compound comprising a repeating unit represented by the following general formula (1-1) and/or a repeating unit represented by the following general formula (1-2): (in the formula, Rf1 and Rg1 are the same or different, and each represents a phenyl group or the like, and Rd1 and Re1 are the same or different, and each represents a hydrogen atom or the like) (in the formula, Rf2 and Rg2 are the same or different, and each represents a phenyl group or the like, and Rd2 and Re2 are the same or different, and each represents a hydrogen atom or the like).

Abstract: Disclosed is a polycyclic ester containing a cyano group and a lactone skeleton, represented by following Formula (1): wherein Ra represents, for example, a hydrogen atom or an alkyl group having one to six carbon atoms which may have a halogen atom; R1s each represent, for example, a halogen atom or an alkyl or haloalkyl group having one to six carbon atoms; “m” is the number of R1s; “n” is the number of cyano groups; and CH2?C(Ra)COO— group may have either of an endo conformation and an exo conformation. Accordingly, there is provided a novel polycyclic ester containing a cyano group and a lactone skeleton which is useful typically as a monomeric component for highly functional polymers. A polymer, for example, derived from this compound is highly soluble in an organic solvent while remaining stable typically to chemicals and exhibits improved hydrolyzability and/or improved solubility in water after hydrolysis.

Abstract: A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R2 represents a single bond or an alkylene group; R3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R4 represents a halogen atom, a cyano group, a hydroxy group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenyl group, an acyl group, an alkoxycarbonyl group, or a group represented by R—C(?O)— or R—C(?O)O—, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.

Abstract: Disclosed is a photo- and/or thermo-curable copolymer having polymerizable unsaturated groups in side chains, which is obtainable by reacting a copolymer (P) with an epoxy-containing polymerizable unsaturated compound (C), the copolymer (P) containing monomer units derived from a carboxyl-containing polymerizable unsaturated compound (A) and monomer units derived from at least one epoxy-containing polymerizable unsaturated compound (B) represented by following Formula (1) or (2), in which the epoxy group of the epoxy-containing polymerizable unsaturated compound (C) has been added to part of the carboxyl groups of the copolymer (P). In the formulae, Ras each represent hydrogen or hydroxyl-substituted or -unsubstituted alkyl having 1 to 4 carbon atoms; and Rbs each represent single bond or alkylene having 1 to 18 carbon atoms which may contain heteroatom(s).

Abstract: A polymer is provided comprising recurring units having formulas (1), (2), (3), (4), (5), and (6) in amounts of 1-60 mol % (1), 1-60 mol % (2), 1-50 mol % (3), 0-60 mol % (4), 0-30 mol % (5), and 0-30 mol % (6), and having a Mw of 3,000-30,000 and a Mw/Mn of 1.5-2.5. R1, R3, R4, R7, R9, and R11 are H or CH3, Y is methylene or O, R2 is CO2R10 when Y is methylene and R2 is H or CO2R10 when Y is O, R10 is C1-C15 alkyl which may be separated by O, R5 and R6 are H or OH, R8 is a tertiary ester type acid-labile protective group, and R12 is OH-containing fluoroalkyl. A resist composition comprising the polymer has a high resolution and is improved in line edge roughness and I/G bias.

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract: Lactone-containing compounds having formula (1) are novel wherein A1 is a polymerizable functional group having a double bond, R1 is a monovalent C1-C10 hydrocarbon group in which some or all hydrogen atoms are substituted by fluorine atoms, and W is CH2, O or S. They are useful as monomers to produce polymers for the formulation of radiation-sensitive resist compositions which have high transparency to radiation of up to 500 nm and exhibit good development properties. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit high resolution and prevent dissolution in water and penetration of water when processed by immersion lithography.

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: Process for producing photoresist polymeric compound having repeated units corresponding to at least one monomer selected from monomer (a) having lactone skeleton, monomer (b) having group which becomes soluble in alkali by elimination with acid, and monomer (c) having alicyclic skeleton having hydroxyl group. Process includes (A) polymerizing mixture of monomers containing at least one monomer selected from the above monomers (a), (b), and (c), and (B) extracting polymer formed in the polymerization by using organic solvent and water to partition the formed polymer into organic solvent layer and metal component impurity into aqueous layer, or passing polymer solution, which contains polymer having repeated units corresponding to at least one of the above monomers (a), (b), and (c) and metal content of which is 1000 ppb by weight or less relative to the polymer through filter comprising porous polyolefin membrane having cation-exchange group.

Abstract: Disclosed is an optical film having good haze properties, wherein bleedout hardly occurs and deformation problems of the raw material film such as horseback defects and projection defects do not occur even when the film is stored for a long time. Also disclosed are a method for producing such an optical film, a polarizing plate using the optical film, and a liquid crystal display using the polarizing plate. Specifically disclosed is an optical film characterized by containing at least one polymer compound derived from a compound represented by the following general formula (1). [chemical formula 1] (1) (In the formula, R1-R6 independently represent a hydrogen atom or a substituent, and R1 and R2 may combine together to form a substituent bound by a double bond. In this connection, at least one of R1-R6 represents a group having a polymerizable group as a partial structure.

Abstract: A polymer comprising recurring units of formulae (1) to (4) wherein R1, R3, R4 and R7 are hydrogen or methyl, R2 is an acid labile group, R5 and R6 are hydrogen or hydroxyl, and R8 is a lactone structure group and having a Mw of 1,000-50,000 is provided. A resist composition comprising the inventive polymer has a sensitivity to high-energy radiation, improved resolution and etching resistance and lends itself to lithographic micropatterning with electron beams or deep UV.

Abstract: A (meth)acrylic copolymer is endowed with a good profile of rigidity and hydrophilicity by introducing not only polycyclic structure units, but also recurring units having a high polarity. A chemically amplified positive resist composition comprising the polymer has a high sensitivity, resolution and etch resistance and improved substrate adhesion and developer affinity.

Abstract: Lactone-containing compounds having formula (1) are novel wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or monovalent hydrocarbon groups, or R2 and R3 may together form an aliphatic hydrocarbon ring, R4 is H or CO2R5, R5 is a monovalent hydrocarbon group, W is CH2, O or S, and k1 is 3, 4 or 5. They are useful as monomers to produce polymers which are transparent to radiation ?500 nm. Radiation-sensitive resist compositions comprising the polymers as base resin exhibit excellent properties including resolution, LER, pattern density dependency and exposure margin.

Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.

Abstract: A composition includes a coupling agent composition and a polymer precursor. The coupling agent includes a first cycloolefin substituted with at least one anhydride group and the coupling agent is capable of bonding to a filler having a corresponding binding site. The polymer precursor includes a second cycloolefin. An associated article and a method are also provided.

Abstract: Fumagillin analog polymer conjugates, methods of making fumagillin analog polymer conjugates, compositions comprising a polymer conjugate of a fumagillin analog, and methods for treating cancer, or treating angiogenic diseases comprising administering to a subject in need thereof an effective amount of a polymer conjugate of a fumagillin analog, are described. Also described are novel fumagillin analogs, methods of making fumagillin analogs, compositions comprising at least one fumagillin analog, and methods for treating cancer, or treating angiogenic diseases comprising administering to a subject in need thereof an effective amount of a fumagillin analog.

Abstract: There are provided a novel compound having an 3,4-epoxytricyclo[5.2.1.02,6]decane skeleton and a polymerizable unsaturated bond, and a process for the preparation of the compound. There is also provided a copolymer including a monomeric unit (A) containing an alkali-soluble group, and a monomeric unit (B) corresponding to an epoxy-containing polymerizable unsaturated compound, or a copolymer including, in addition to the monomeric units (A) and (B), a monomeric unit (C) corresponding to an epoxy-free polymerizable unsaturated compound such as a N-substituted maleimide, in which the monomeric unit (B) occupies 40 to 90 percent by weight of total monomeric units, and 30 percent by weight or more of the monomeric unit (B) is a monomeric unit corresponding to a specific 3,4-epoxytricyclo[5.2.1.02,6]decane skeleton-containing compound. The copolymer can yield a film excellent typically in thermal stability, yield a resin composition having very high storage stability, and be easily synthetically prepared.

Abstract: The invention provides certain novel water-soluble and water-insoluble monomers for ring opening metathesis polymerization and novel polymers, compositions and products, and related methods thereof.

Abstract: This invention relates to polymerizable ultraviolet light absorbers and yellow colorants and their use in ophthalmic lenses. In particular, this invention relates to polymerizable ultraviolet light absorbing methine compounds and yellow compounds of the methine and anthraquinone classes that block ultraviolet light and/or violet-blue light transmission through ophthalmic lenses.

Abstract: The present invention relates to triaylamines which are substituted by defined groups. These compounds can be used for producing organic electroluminescent devices.

Abstract: A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having at least one group selected from the group of consisting (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkaline developer and increasing solubility of the resin (C) in an alkaline developer, and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer, and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating, (ii) a step of exposing the resist coating to light via an immersion liquid, (iii) a step of removing the immersion liquid remaining on the resist coating, (iv) a step of heating the resist coating, a

Abstract: The object of the present invention is to provide a composition for conductive materials from which a conductive layer having a high carrier transport ability can be made, a conductive material formed of the composition and having a high carrier transport ability, a conductive layer formed using the conductive material as a main material, an electronic device provided with the conductive layer and having high reliability, and electronic equipment provided with the electronic device.

Abstract: A noble alicyclic unsaturated compound represented by the general formula (1): wherein at least one of R1 and R2 is a fluorine atom or a fluorinated alkyl group; a polymer formed by the polymerization of a polymer precursor comprising the alicyclic compound. The polymer is useful, in the lithography using a light having a wavelength of 190 nm or less, as a chemically amplified resist which exhibits excellent transparency with respect to the light for use in exposure and also is excellent in the adhesion to a substrate and the resistance to dry etching.

Abstract: The present invention relates to a solid, acid catalyst for the preparation of polytetrahydrofuran, polytetrahydrofuran copolymers, diesters or monoesters of these polymers by polymerization of tetrahydrofuran in the presence of at least one telogen and/or comonomer, which has a BET surface area of at least 160 m2/g and an acid center density of at least 0.05 mmol/g for pKa values of from 1 to 6, to a process for preparing it and to a process for the polymerization of cyclic ethers over this catalyst.

Abstract: Disclosed is an oxetane-containing vinyl ether compound including one or more aromatic or non-aromatic carbocycles and/or two or more vinyl ether structures, such as a compound of Formula: wherein Ring Z1 is non-aromatic carbocycle; Ra is vinyl group of Formula: wherein each of R1, R2, and R3 is hydrogen or C1-C4 alkyl; Wa is single bond or organic group having a valence of (m+1); X1 is, for example, hydrocarbon; “m” and “q” are each 1 or 2; and “p” is 0 to 5. Also disclosed is an alicyclic epoxy-containing vinyl ether compound of Formula: wherein Ring Z2 is non-aromatic carbocycle; Rb is vinyl group of Formula: wherein R4, R5 and R6 are each hydrogen or C1-C4 alkyl; Wb is single bond or organic group having a valence of (r+1); Rc and Rd are hydrogen or alkyl; and “r” and “s” are 1 or 2.

Abstract: The present invention provides a star polymer which comprises a central core and three or more branches bonded to the central core, and has a weight average molecular weight of from 1,000 to 100,000, wherein at least one of the branches containing at least one repeating unit selected from the group consisting of the following repeating units (1), (2), (3), (4) and (9); and a process for producing the star polymer. The present invention also provides a chemically amplified positive resist composition comprising the star polymer and an acid generator.

Abstract: A photoresist polymer having a spiro cyclic ketal group, and a photoresist composition including the same is disclosed. The photoresist polymer and the photoresist composition can improve the resolution and the process margin due to its low activation energy of the deprotection reaction of the spiro cyclic ketal group, and can produce fine photoresist patterns due to its low PEB (Post Exposure Baking) temperature sensitivity.

Abstract: The invention relates to an intraocular lens comprising at least one pharmaceutically-acceptable photochromic polymer that enables all or part of the intraocular lens to change colour reversibly when exposed to light.

Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.

Abstract: A novel lactone-containing compound is provided as well as a polymer comprising units of the compound. The polymer is used as a base resin to formulate a resist composition having a high sensitivity, resolution and etching resistance.