Hetero-oxygen Ring Compound Contains A Carbonate Group, I.e., -o-c(=o)-o As Ring Atoms Patents (Class 526/269)
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Patent number: 10407534Abstract: Compounds of the formula in which R1 is an organic radical having a (meth)acryloyl group and R2, R3, and R4 independently of one another are an H atom or a C1 to C10 alkyl group.Type: GrantFiled: April 15, 2016Date of Patent: September 10, 2019Assignee: BASF SEInventors: Verena Mormul, Rainer Klopsch, Miran Yu, Guenter Scherr, Diego Ghislieri
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Patent number: 10385152Abstract: What are described are copolymers formed from (a) at least one monomer M1 of the formula in which R1 is an organic radical having a (meth)acryloyl group, R2, R3 and R4 are each independently a hydrogen atom or a C1- to C10-alkyl group; and (b) at least one ethylenically unsaturated, free-radically copolymerizable monomer M2 other than the monomers M1. What are also described are two-pack adhesives comprising the copolymers and a polyfunctional hardener. The copolymers and the two-pack adhesives can be used as laminating adhesives.Type: GrantFiled: June 8, 2016Date of Patent: August 20, 2019Assignee: BASF SEInventors: Ulrike Licht, Karl-Heinz Schumacher, Rainer Klopsch, Diego Ghislieri
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Patent number: 9951245Abstract: The present invention relates to a nonaqueous coating material composition comprising at least one compound (A) having at least two amino groups and at least one oligomeric and/or polymeric compound (B) having at least two alkylidene-1,3-dioxolan-2-one groups. Compound (B) is obtained using at least one monomer (B1) of formula (I) where R1-R6, A, X, Z, and Y are as set forth in the specification and at least two different comonomers (B2) and (B3) which are each different from the monomer (B1). The present invention further provides the coatings produced from these coating material compositions, and also the use thereof.Type: GrantFiled: August 7, 2014Date of Patent: April 24, 2018Assignee: BASF Coatings GmbHInventors: Peter Hoffmann, Rainer Klopsch, Matthijs Groenewolt, Elisabeth Wessling, Aaron Flores-Figueroa, Kristin Michel
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Patent number: 8877424Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.Type: GrantFiled: February 8, 2013Date of Patent: November 4, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
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Publication number: 20140212813Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.Type: ApplicationFiled: April 2, 2014Publication date: July 31, 2014Applicant: JSR CORPORATIONInventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
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Publication number: 20130331532Abstract: Polymerizable alkylidene-1,3-dioxolan-2-one monomers, a process for preparation of polymerizable alkylidene-1,3-dioxolan-2-one monomers, and the use thereof for preparation of polymers. The invention also relates to the homopolymers and copolymers obtained by homopolymerization or copolymerization of alkylidene-1,3-dioxolan-2-one monomers and to the use thereof as a component in 2K binder compositions.Type: ApplicationFiled: March 29, 2013Publication date: December 12, 2013Applicant: BASF SEInventor: BASF SE
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Patent number: 8604148Abstract: This invention relates to a polymer of a cyclic olefin and a vinyl terminated macromonomer, and processes for the production thereof.Type: GrantFiled: November 29, 2011Date of Patent: December 10, 2013Assignee: ExxonMobil Chemical Patents Inc.Inventors: Matthew W. Holtcamp, Donna J. Crowther, Caol P. Huff, Patrick Brant, Jacqueline A. Lovell
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Publication number: 20130288126Abstract: A family of carboxylic acid groups containing fluorene/fluorenon copolymers is disclosed as binders of silicon particles in the fabrication of negative electrodes for use with lithium ion batteries. Triethyleneoxide side chains provide improved adhesion to materials such as, graphite, silicon, silicon alloy, tin, tin alloy. These binders enable the use of silicon as an electrode material as they significantly improve the cycle-ability of silicon by preventing electrode degradation over time. In particular, these polymers, which become conductive on first charge, bind to the silicon particles of the electrode, are flexible so as to better accommodate the expansion and contraction of the electrode during charge/discharge, and being conductive promote the flow battery current.Type: ApplicationFiled: March 15, 2013Publication date: October 31, 2013Inventors: Gao Liu, Vincent S. Battaglia, Sang-Jae Park
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Patent number: 8536291Abstract: Block copolymers include hydrophobic and hydrophilic blocks having repeating units derived from ring opening polymerization of one or more cyclic carbonate monomers. The carbonate monomers are independently selected from compounds of formula (II): wherein each Q? and Qa group independently represents a hydrogen, an alkyl group, a halide, a carboxy group, an ester group, an amide group, an aryl group, an alkoxy group, or a foregoing Q? or Qa group substituted with a carboxy group or an ester group, at least one Q? and Qa group includes an ester group; each Y independently represents O, S, NH, or NQ?; n is an integer from 0 to 6, wherein when n is 0, carbons labeled 4 and 6 are linked together by a single bond; each Q? group independently represents an alkyl group, an aryl group, or a foregoing Q? group substituted with a carboxy group, or an ester group.Type: GrantFiled: July 6, 2012Date of Patent: September 17, 2013Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Standford Junior UniversityInventors: Kazuki Fukushima, James L. Hedrick, Sung-Ho Kim, Robert M. Waymouth
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Publication number: 20130216951Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.Type: ApplicationFiled: March 29, 2013Publication date: August 22, 2013Applicant: JSR CORPORATIONInventor: JSR Corporation
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Publication number: 20130209935Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.Type: ApplicationFiled: February 8, 2013Publication date: August 15, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventor: SHIN-ETSU CHEMICAL CO., LTD.
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Publication number: 20130203000Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.Type: ApplicationFiled: March 14, 2013Publication date: August 8, 2013Applicant: JSR CORPORATIONInventor: JSR CORPORATION
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Publication number: 20120316286Abstract: A water-dispersible, cyclocarbonate-functionalized vinyl copolymer binder, a process for the preparation of the binder, an aqueous dispersion containing the binder, a system comprising the binder, water and an (amine) curing agent and the use of the binder for the production of a hardened coating are proposed. It was surprisingly found that this binder, in which the emulsifier groups according to the invention are incorporated in the polymer chain, gives stable aqueous dispersions having a solids content of up to a 30% by weight.Type: ApplicationFiled: August 12, 2010Publication date: December 13, 2012Inventors: Joanna Mecfel-Marczewski, Burkhard Walther, Jochen Mezger, Rosita Staudhamer
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Publication number: 20120252983Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.Type: ApplicationFiled: June 8, 2012Publication date: October 4, 2012Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Masaki Fujiwara, James L. Hedrick, Daniel P. Sanders, Manabu Yasumoto
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Patent number: 8263715Abstract: A block copolymer includes a hydrophobic block and a hydrophilic block, wherein the hydrophobic block and the hydrophilic block include repeating units derived from ring opening polymerization of one or more cyclic carbonate monomers. The one or more cyclic carbonate monomers are independently selected from compounds of the general formula (II): wherein each Q? and Qa group independently represents a hydrogen, an alkyl group, a halide, a carboxy group, an ester group, an amide group, an aryl group, an alkoxy group, or a foregoing Q? or Qa group substituted with a carboxy group or an ester group, at least one Q? and Qa group includes an ester group; each Y independently represents O, S, NH, or NQ?; n is an integer from 0 to 6, wherein when n is 0, carbons labeled 4 and 6 are linked together by a single bond; each Q? group independently represents an alkyl group, an aryl group, or a foregoing Q? group substituted with a carboxy group, or an ester group.Type: GrantFiled: August 28, 2009Date of Patent: September 11, 2012Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Stanford Junior UniversityInventors: Kazuki Fukushima, James L. Hedrick, Sung-Ho Kim, Robert M. Waymouth
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Publication number: 20120178891Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.Type: ApplicationFiled: March 8, 2012Publication date: July 12, 2012Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Masaki Fujiwara, James L. Hedrick, Alshakim Nelson, Daniel P. Sanders, Yoshiharu Terui, Manabu Yasumoto
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Publication number: 20120172559Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.Type: ApplicationFiled: March 8, 2012Publication date: July 5, 2012Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: James L. Hedrick, Alshakim Nelson, Daniel P. Sanders
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Patent number: 8188205Abstract: The present invention relates to the use of hydrotalcites as catalysts for the polymerization of unsubstituted or substituted trimethylene carbonate.Type: GrantFiled: November 25, 2008Date of Patent: May 29, 2012Assignee: E I du Pont de Nemours and CompanyInventors: David Richard Corbin, Robert DiCosimo, Neville Everton Drysdale, Hari Babu Sunkara
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Patent number: 8182977Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.Type: GrantFiled: March 23, 2010Date of Patent: May 22, 2012Assignee: JSR CorporationInventors: Norihiko Ikeda, Hiromitsu Nakashima, Saki Harada
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Publication number: 20120006358Abstract: The invention relates to machine dishwashing agents containing specific polycarbonate-, polyurethane-, and/or polyurea-polyorganosiloxane compounds or precursor compounds thereof of the reactive cyclic carbonate and urea type which help to avoid the formation of water spots and filming after the use of the agents and accelerate the drying of dishes.Type: ApplicationFiled: September 20, 2011Publication date: January 12, 2012Applicant: Henkel AG & Co. KGaAInventors: Nadine Warkotsch, Marc-Steffen Schiedel, Johannes Zipfel, Arnd Kessler
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Publication number: 20110223537Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.Type: ApplicationFiled: March 10, 2011Publication date: September 15, 2011Applicant: JSR CorporationInventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada
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Patent number: 7998657Abstract: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic hydrocarbon ring, R3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.Type: GrantFiled: October 26, 2010Date of Patent: August 16, 2011Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Ohashi, Takeshi Kinsho, Takeru Watanabe
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Patent number: 7968650Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.Type: GrantFiled: October 26, 2007Date of Patent: June 28, 2011Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
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Publication number: 20110112241Abstract: The invention provides novel flame-retardant polymers and materials, their synthesis and use. More particularly, the flame-retardant polymers are deoxybenzoin-derived polymers.Type: ApplicationFiled: March 30, 2009Publication date: May 12, 2011Inventors: Todd Emrick, Bryan E. Coughlin, Thangamani Ranganathan, Michael Beaulieu, Richard Farris, Bon-Cheol Ku
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Patent number: 7935771Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.Type: GrantFiled: November 10, 2006Date of Patent: May 3, 2011Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
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Publication number: 20110009585Abstract: The present invention provides a thermoplastic acrylic resin comprising (i) a repeating unit derived from a methacrylate monomer, (ii) a repeating unit derived from a vinyl aromatic monomer, (iii) a repeating unit derived from an aromatic group-containing methacrylate monomer, and (iv) a cyclic acid anhydride repeating unit, and a molding for optical material comprising the same.Type: ApplicationFiled: December 24, 2008Publication date: January 13, 2011Inventors: Masami Yonemura, Mayuko Kimura, Michio Ogawa
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Patent number: 7862867Abstract: Disclosed is a bifunctional polymerizable compound represented by the formula [1]. Also disclosed is a polymerizable liquid crystal composition comprising at least one bifunctional polymerizable compound represented by the formula [1] and a polymerizable liquid crystal compound. The bifunctional polymerizable compound has a high polymerizability. When added to a polymerizable liquid crystal compound to prepare a polymerizable liquid crystal composition, the bifunctional polymerizable compound enables to remarkably improve the thermal stability of a polymer produced from the composition. The polymerizable liquid crystal composition containing the bifunctional polymerizable compound has a low crystallization temperature and shows a stable liquid-crystallinity under ordinary environment wherein X1, X2 and X3 independently represent a single bond or a benzene ring; Y represents —O— or a single bond; M represents a lactone ring or an acrylate group; and n represents an integer of 4 to 10.Type: GrantFiled: October 2, 2007Date of Patent: January 4, 2011Assignee: Nissan Chemical Industries, Ltd.Inventor: Daniel Antonio Sahade
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Patent number: 7601766Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain carboxylic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerized carboxylic hydrophilic siloxanyl monomers.Type: GrantFiled: June 30, 2006Date of Patent: October 13, 2009Assignee: Bausch & Lomb IncorporatedInventors: Derek Schorzman, Jay Kunzler, Joseph Salamone
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Publication number: 20090253880Abstract: The present invention aims at providing a dispersion stabilizer for suspension polymerization of a vinyl-based compound, which gives vinyl chloride-based polymer particles having a sharp particle size distribution and a high bulk density owing to excellent dispersion stability during polymerization, and which can produce vinyl chloride-based polymer particles with few wet foams, hardly accompanied with formation of polymer scales and foamy polymers attributable to dry foams, with less coloring, and having excellent heat resistance. The dispersion stabilizer of the invention comprises a PVA-based resin having a 1,2-diol component at a side chain and a degree of saponification of 65 to 87% by mol.Type: ApplicationFiled: August 1, 2006Publication date: October 8, 2009Applicant: The Nippon Synthetic Chemical Industry Co., Ltd.Inventors: Mitsuo Shibutani, Masahiro Saito
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Patent number: 7553386Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.Type: GrantFiled: May 22, 2008Date of Patent: June 30, 2009Assignee: Intel CorporationInventors: Daoqiang Lu, Eric J. Li
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Patent number: 7465415Abstract: Various non-limiting embodiments disclosed herein related to photochromic materials comprising the reaction product of (a) at least one ring-opening cyclic monomer, and (b) a photochromic initiator. Other non-limiting embodiments related to photochromic materials represented by: wherein S? comprises the at least one ring-opened cyclic monomer as set forth herein. Other non-limiting embodiments related to photochromic compositions, optical elements, and methods of inhibiting migration of a photochromic material in a polymeric material using the photochromic materials disclosed herein. Methods of making such photochromic materials, compositions, and optical elements are also disclosed.Type: GrantFiled: July 30, 2004Date of Patent: December 16, 2008Assignee: PPG Industries Ohio, Inc.Inventors: Feng Wang, Barry Van Gemert, Kevin J. Stewart, Carol L. Knox, Anu Chopra, Patrick M. Brown
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Publication number: 20080193797Abstract: The present invention relates to compounds of the formula (1) and to the use thereof in organic electroluminescent devices. The compounds of the formula (1) are used as host material or dopant in the emitting layer and/or as hole-transport material and/or as electron-transport material.Type: ApplicationFiled: July 26, 2006Publication date: August 14, 2008Applicant: Merck Patent GmbHInventors: Holger Heil, Arne Buesing, Philipp Stoessel, Horst Vestweber, Amir Hossain Parham
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Patent number: 7393468Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.Type: GrantFiled: February 23, 2005Date of Patent: July 1, 2008Assignee: Intel CorporationInventors: Daoqiang Lu, Eric J. Li
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Patent number: 7354531Abstract: A composition for use as a polymer electrolyte, wherein said composition includes one or more polar materials and one or more polyesters of formula III, wherein each unit A may be identical or different and is of the structure IV, wherein each unit B may be identical or different and is of the structure V, wherein R and R1 are each, independently, hydrogen, optionally substituted hydrocarbyl or an inert functional group; a process for preparing said composition; the use of said composition as a polymer electrolyte in coulometers, displays, smart windows, cells or batteries; and a cell and/or battery having said composition.Type: GrantFiled: July 31, 2001Date of Patent: April 8, 2008Assignee: Shell Oil CompanyInventors: Wynham Henry Boon, Thomas Clayton Forschner, David Eric Gwyn, James R. MacCallum, Christopher John Smith, Michael John Smith
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Patent number: 7344820Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.Type: GrantFiled: November 19, 2002Date of Patent: March 18, 2008Assignee: DongJin Semichem Co., Ltd.Inventors: Eun-Kyung Son, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim
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Patent number: 7112633Abstract: The invention relates to a process for the preparation of compound(s) comprising at least one acrylate or methacrylate group, at least one linear carbonate group and at least one 5-membered cyclic carbonate group. The process comprises (A) a selective ring-opening step and (B) a (meth)acrylation step. The process is environment-friendly and compounds obtained are usable in radiation curable compositions, for example in radiation-curable inks.Type: GrantFiled: August 5, 2002Date of Patent: September 26, 2006Assignee: Surface Specialties, S.A.Inventor: Vincent Stone
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Patent number: 7087675Abstract: The ?-hydroxy carbamate, ethylenically unsaturated monomer of the invention can be polymerized as a homopolymer or copolymerized with other monomers. The polymerization can be carried out in an aqueous medium. The ?-hydroxy carbamate monomer is polymerized to form water-soluble homopolymers or, if polymerized as a mixture with one or more comonomers, copolymers that are soluble, emulsifiable, or dispersible in water. The ?-hydroxy carbamate monomer can be used as a replacement monomer for acrylamide.Type: GrantFiled: March 19, 2003Date of Patent: August 8, 2006Assignee: BASF CorporationInventors: Walter H. Ohrbom, Patricia A. Herrel
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Patent number: 7022789Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1–C20 alkyl, C2–C20 alkenyl, C2–C20 alkynyl, aryl, C1–C20 carboxylate, C1–C20 alkoxy, C1–C20 alkenyloxy, C2–C20 alkynyloxy, aryloxy, C2–C20 alkoxycarbonyl, C1–C20 alkylthio, C1–C20 alkylsulfonyl and C1–C20 alkylsulfinyl.Type: GrantFiled: February 22, 2005Date of Patent: April 4, 2006Assignee: California Institute of TechnologyInventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
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Patent number: 6979716Abstract: This invention is related to a production method of a branched polymer which comprises polymerizing a macromonomer [I], said macromonomer [I] being a vinyl polymer obtainable by radical polymerization and terminally having one polymerizable carbon—carbon double bond-containing group per molecule. Furthermore, by producing the macromonomer by living radical polymerization, in particular atom transfer radical polymerization, it becomes possible to produce the above polymers or gels having well controlled side chain molecular weights.Type: GrantFiled: June 18, 1999Date of Patent: December 27, 2005Assignee: Kaneka CorporationInventors: Yoshiki Nakagawa, Shigeki Ono, Masayuki Fujita, Kenichi Kitano
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Patent number: 6866984Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: GrantFiled: December 18, 2003Date of Patent: March 15, 2005Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6867274Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1-C20 alkyl, C2-C20 alkenyl, C1-C20 alkynyl, aryl, C1-C20 carboxylate, C1-C20 alkoxy, C2-C20 alkenyloxy, C2-C20 alkynyloxy, aryloxy, C2-C20 alkoxycarbonyl, C1-C20 alkylthio, C1-C20 alkylsulfonyl and C1-C20 alkylsulfinyl.Type: GrantFiled: May 21, 2002Date of Patent: March 15, 2005Assignee: California Institute of TechnologyInventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
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Patent number: 6849376Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.Type: GrantFiled: February 25, 2002Date of Patent: February 1, 2005Assignee: Shipley Company, L.L.C.Inventors: George G. Barclay, Stefan J. Caporale
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Publication number: 20040236052Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: ApplicationFiled: March 5, 2004Publication date: November 25, 2004Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Publication number: 20040230020Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: ApplicationFiled: March 19, 2004Publication date: November 18, 2004Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Publication number: 20040226331Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: ApplicationFiled: March 17, 2004Publication date: November 18, 2004Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6818039Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers maybe complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: November 12, 2002Date of Patent: November 16, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6808859Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: GrantFiled: June 27, 2000Date of Patent: October 26, 2004Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Publication number: 20040131968Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.Type: ApplicationFiled: December 18, 2003Publication date: July 8, 2004Applicant: Hyundai Electronics Industries Co., Ltd.Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
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Patent number: 6756461Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: May 15, 2003Date of Patent: June 29, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6756438Abstract: Aqueous based emulsion copolymers containing vinyl ethylene carbonate, vinyl acetate, and one or more other ethylenically unsaturated monomers, and aqueous based poly(vinyl alcohol)-containing emulsion copolymers formed by emulsion copolymerization of vinyl ethylene carbonate, vinyl acetate, and optionally one or more other ethylenically unsaturated monomer, in the presence of poly(vinyl alcohol). These emulsion copolymers can be used in a variety of applications such as adhesives and coatings.Type: GrantFiled: February 14, 2003Date of Patent: June 29, 2004Assignee: Air Products and Chemicals, Inc.Inventors: John Joseph Rabasco, Carrington Duane Smith, Richard Henry Bott