Hetero-oxygen Ring Compound Contains A Carbonate Group, I.e., -o-c(=o)-o As Ring Atoms Patents (Class 526/269)
  • Patent number: 10407534
    Abstract: Compounds of the formula in which R1 is an organic radical having a (meth)acryloyl group and R2, R3, and R4 independently of one another are an H atom or a C1 to C10 alkyl group.
    Type: Grant
    Filed: April 15, 2016
    Date of Patent: September 10, 2019
    Assignee: BASF SE
    Inventors: Verena Mormul, Rainer Klopsch, Miran Yu, Guenter Scherr, Diego Ghislieri
  • Patent number: 10385152
    Abstract: What are described are copolymers formed from (a) at least one monomer M1 of the formula in which R1 is an organic radical having a (meth)acryloyl group, R2, R3 and R4 are each independently a hydrogen atom or a C1- to C10-alkyl group; and (b) at least one ethylenically unsaturated, free-radically copolymerizable monomer M2 other than the monomers M1. What are also described are two-pack adhesives comprising the copolymers and a polyfunctional hardener. The copolymers and the two-pack adhesives can be used as laminating adhesives.
    Type: Grant
    Filed: June 8, 2016
    Date of Patent: August 20, 2019
    Assignee: BASF SE
    Inventors: Ulrike Licht, Karl-Heinz Schumacher, Rainer Klopsch, Diego Ghislieri
  • Patent number: 9951245
    Abstract: The present invention relates to a nonaqueous coating material composition comprising at least one compound (A) having at least two amino groups and at least one oligomeric and/or polymeric compound (B) having at least two alkylidene-1,3-dioxolan-2-one groups. Compound (B) is obtained using at least one monomer (B1) of formula (I) where R1-R6, A, X, Z, and Y are as set forth in the specification and at least two different comonomers (B2) and (B3) which are each different from the monomer (B1). The present invention further provides the coatings produced from these coating material compositions, and also the use thereof.
    Type: Grant
    Filed: August 7, 2014
    Date of Patent: April 24, 2018
    Assignee: BASF Coatings GmbH
    Inventors: Peter Hoffmann, Rainer Klopsch, Matthijs Groenewolt, Elisabeth Wessling, Aaron Flores-Figueroa, Kristin Michel
  • Patent number: 8877424
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Grant
    Filed: February 8, 2013
    Date of Patent: November 4, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masayoshi Sagehashi, Jun Hatakeyama, Koji Hasegawa, Kazuhiro Katayama
  • Publication number: 20140212813
    Abstract: A radiation-sensitive resin composition includes a first polymer including an acid-labile group, an acid generator to generate an acid upon exposure to radiation, and a second polymer including a fluorine atom and a functional group shown by a general formula (x). The second polymer has a fluorine atom content higher than a fluorine atom content of the first polymer. R1 represents an alkali-labile group. A represents an oxygen atom, —NR?—, —CO—O—# or —SO2—O—##, wherein the oxygen atom represented by A is not an oxygen atom bonded directly to an aromatic ring, a carbonyl group, or a sulfoxyl group, R? represents a hydrogen atom or an alkali-labile group, and “#” and “##” each indicate a bonding hand bonded to R1.
    Type: Application
    Filed: April 2, 2014
    Publication date: July 31, 2014
    Applicant: JSR CORPORATION
    Inventors: Yuusuke ASANO, Mitsuo SATOU, Hiromitsu NAKASHIMA, Kazuki KASAHARA, Yoshifumi OIZUMI, Masafumi HORI, Takanori KAWAKAMI, Yasuhiko MATSUDA, Kazuo NAKAHARA
  • Publication number: 20130331532
    Abstract: Polymerizable alkylidene-1,3-dioxolan-2-one monomers, a process for preparation of polymerizable alkylidene-1,3-dioxolan-2-one monomers, and the use thereof for preparation of polymers. The invention also relates to the homopolymers and copolymers obtained by homopolymerization or copolymerization of alkylidene-1,3-dioxolan-2-one monomers and to the use thereof as a component in 2K binder compositions.
    Type: Application
    Filed: March 29, 2013
    Publication date: December 12, 2013
    Applicant: BASF SE
    Inventor: BASF SE
  • Patent number: 8604148
    Abstract: This invention relates to a polymer of a cyclic olefin and a vinyl terminated macromonomer, and processes for the production thereof.
    Type: Grant
    Filed: November 29, 2011
    Date of Patent: December 10, 2013
    Assignee: ExxonMobil Chemical Patents Inc.
    Inventors: Matthew W. Holtcamp, Donna J. Crowther, Caol P. Huff, Patrick Brant, Jacqueline A. Lovell
  • Publication number: 20130288126
    Abstract: A family of carboxylic acid groups containing fluorene/fluorenon copolymers is disclosed as binders of silicon particles in the fabrication of negative electrodes for use with lithium ion batteries. Triethyleneoxide side chains provide improved adhesion to materials such as, graphite, silicon, silicon alloy, tin, tin alloy. These binders enable the use of silicon as an electrode material as they significantly improve the cycle-ability of silicon by preventing electrode degradation over time. In particular, these polymers, which become conductive on first charge, bind to the silicon particles of the electrode, are flexible so as to better accommodate the expansion and contraction of the electrode during charge/discharge, and being conductive promote the flow battery current.
    Type: Application
    Filed: March 15, 2013
    Publication date: October 31, 2013
    Inventors: Gao Liu, Vincent S. Battaglia, Sang-Jae Park
  • Patent number: 8536291
    Abstract: Block copolymers include hydrophobic and hydrophilic blocks having repeating units derived from ring opening polymerization of one or more cyclic carbonate monomers. The carbonate monomers are independently selected from compounds of formula (II): wherein each Q? and Qa group independently represents a hydrogen, an alkyl group, a halide, a carboxy group, an ester group, an amide group, an aryl group, an alkoxy group, or a foregoing Q? or Qa group substituted with a carboxy group or an ester group, at least one Q? and Qa group includes an ester group; each Y independently represents O, S, NH, or NQ?; n is an integer from 0 to 6, wherein when n is 0, carbons labeled 4 and 6 are linked together by a single bond; each Q? group independently represents an alkyl group, an aryl group, or a foregoing Q? group substituted with a carboxy group, or an ester group.
    Type: Grant
    Filed: July 6, 2012
    Date of Patent: September 17, 2013
    Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Standford Junior University
    Inventors: Kazuki Fukushima, James L. Hedrick, Sung-Ho Kim, Robert M. Waymouth
  • Publication number: 20130216951
    Abstract: A radiation-sensitive resin composition includes a polymer, an acid generating agent, and an organic solvent. The polymer includes a first structural unit derived from a compound represented by a formula (1), and a second structural unit derived from a compound represented by a formula (2). R1 represents an organic group having a valency of (a+2) that represents a ring structure having 3 to 8 carbon atoms together with the carbon atom constituting a lactone ring. R2 represents a fluorine atom, a hydroxyl group, an organic group having 1 to 20 carbon atoms or the like.
    Type: Application
    Filed: March 29, 2013
    Publication date: August 22, 2013
    Applicant: JSR CORPORATION
    Inventor: JSR Corporation
  • Publication number: 20130209935
    Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 15, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: SHIN-ETSU CHEMICAL CO., LTD.
  • Publication number: 20130203000
    Abstract: A radiation-sensitive resin composition includes a polymer component, a radiation-sensitive acid generating agent, and a nitrogen-containing compound having a ring structure. The polymer component includes, in an identical polymer or different polymers, a first structural unit represented by a formula (1) and a second structural unit represented by a formula (2). R1 represents a hydrogen atom or a methyl group. Z is a group which represents a divalent monocyclic alicyclic hydrocarbon group taken together with R2. R2 represents a carbon atom. R3 represents a methyl group or an ethyl group. R4 represents a hydrogen atom or a methyl group. X is a group which represents a divalent bridged alicyclic hydrocarbon group having no less than 10 carbon atoms taken together with R5. R5 represents a carbon atom. R6 represents a branched alkyl group having 3 or 4 carbon atoms.
    Type: Application
    Filed: March 14, 2013
    Publication date: August 8, 2013
    Applicant: JSR CORPORATION
    Inventor: JSR CORPORATION
  • Publication number: 20120316286
    Abstract: A water-dispersible, cyclocarbonate-functionalized vinyl copolymer binder, a process for the preparation of the binder, an aqueous dispersion containing the binder, a system comprising the binder, water and an (amine) curing agent and the use of the binder for the production of a hardened coating are proposed. It was surprisingly found that this binder, in which the emulsifier groups according to the invention are incorporated in the polymer chain, gives stable aqueous dispersions having a solids content of up to a 30% by weight.
    Type: Application
    Filed: August 12, 2010
    Publication date: December 13, 2012
    Inventors: Joanna Mecfel-Marczewski, Burkhard Walther, Jochen Mezger, Rosita Staudhamer
  • Publication number: 20120252983
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl carbonate group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl carbonate group. Using a suitable nucleophile, the pendant pentafluorophenyl carbonate group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: June 8, 2012
    Publication date: October 4, 2012
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Masaki Fujiwara, James L. Hedrick, Daniel P. Sanders, Manabu Yasumoto
  • Patent number: 8263715
    Abstract: A block copolymer includes a hydrophobic block and a hydrophilic block, wherein the hydrophobic block and the hydrophilic block include repeating units derived from ring opening polymerization of one or more cyclic carbonate monomers. The one or more cyclic carbonate monomers are independently selected from compounds of the general formula (II): wherein each Q? and Qa group independently represents a hydrogen, an alkyl group, a halide, a carboxy group, an ester group, an amide group, an aryl group, an alkoxy group, or a foregoing Q? or Qa group substituted with a carboxy group or an ester group, at least one Q? and Qa group includes an ester group; each Y independently represents O, S, NH, or NQ?; n is an integer from 0 to 6, wherein when n is 0, carbons labeled 4 and 6 are linked together by a single bond; each Q? group independently represents an alkyl group, an aryl group, or a foregoing Q? group substituted with a carboxy group, or an ester group.
    Type: Grant
    Filed: August 28, 2009
    Date of Patent: September 11, 2012
    Assignees: International Business Machines Corporation, The Board of Trustees of the Leland Stanford Junior University
    Inventors: Kazuki Fukushima, James L. Hedrick, Sung-Ho Kim, Robert M. Waymouth
  • Publication number: 20120178891
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: March 8, 2012
    Publication date: July 12, 2012
    Applicants: CENTRAL GLASS CO., LTD., INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Masaki Fujiwara, James L. Hedrick, Alshakim Nelson, Daniel P. Sanders, Yoshiharu Terui, Manabu Yasumoto
  • Publication number: 20120172559
    Abstract: A one pot method of preparing cyclic carbonyl compounds comprising an active pendant pentafluorophenyl ester group is disclosed. The cyclic carbonyl compounds can be polymerized by ring opening methods to form ROP polymers comprising repeat units comprising a side chain pentafluorophenyl ester group. Using a suitable nucleophile, the pendant pentafluorophenyl ester group can be selectively transformed into a variety of other functional groups before or after the ring opening polymerization.
    Type: Application
    Filed: March 8, 2012
    Publication date: July 5, 2012
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: James L. Hedrick, Alshakim Nelson, Daniel P. Sanders
  • Patent number: 8188205
    Abstract: The present invention relates to the use of hydrotalcites as catalysts for the polymerization of unsubstituted or substituted trimethylene carbonate.
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: May 29, 2012
    Assignee: E I du Pont de Nemours and Company
    Inventors: David Richard Corbin, Robert DiCosimo, Neville Everton Drysdale, Hari Babu Sunkara
  • Patent number: 8182977
    Abstract: A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, wherein R0 represents an alkyl group having 1 to 5 carbon atoms in which at least one hydrogen atom is substituted by a hydroxyl group, and R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group, R2 represents an alkyl group having 1 to 4 carbon atoms, and R3 represents an alkyl group having 1 to 4 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 4 to 20 carbon atoms, or a divalent cyclic hydrocarbon group having 4 to 20 carbon atoms formed by R3 and R3 bonding to each other together with a carbon atom.
    Type: Grant
    Filed: March 23, 2010
    Date of Patent: May 22, 2012
    Assignee: JSR Corporation
    Inventors: Norihiko Ikeda, Hiromitsu Nakashima, Saki Harada
  • Publication number: 20120006358
    Abstract: The invention relates to machine dishwashing agents containing specific polycarbonate-, polyurethane-, and/or polyurea-polyorganosiloxane compounds or precursor compounds thereof of the reactive cyclic carbonate and urea type which help to avoid the formation of water spots and filming after the use of the agents and accelerate the drying of dishes.
    Type: Application
    Filed: September 20, 2011
    Publication date: January 12, 2012
    Applicant: Henkel AG & Co. KGaA
    Inventors: Nadine Warkotsch, Marc-Steffen Schiedel, Johannes Zipfel, Arnd Kessler
  • Publication number: 20110223537
    Abstract: A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, wherein each R1 represents a hydrogen atom or the like, R represents a monovalent group shown by an above formula (a?), each R19 represents a chain hydrocarbon group having 1 to 5 carbon atoms or the like, A represents a divalent chain hydrocarbon group having 1 to 30 carbon atoms or the like, and m and n are integers from 0 to 3 (m+n=1 to 3), wherein each of R2 and R3 represents a monovalent chain hydrocarbon group having 1 to 20 carbon atoms or the like.
    Type: Application
    Filed: March 10, 2011
    Publication date: September 15, 2011
    Applicant: JSR Corporation
    Inventors: Takuma Ebata, Hiroki Nakagawa, Yasuhiko Matsuda, Kazuki Kasahara, Kenji Hoshiko, Hiromitsu Nakashima, Norihiko Ikeda, Kaori Sakai, Saki Harada
  • Patent number: 7998657
    Abstract: Novel ester compounds having formulae (1) to (4) wherein A1 is a polymerizable functional group having a carbon-carbon double bond, A2 is oxygen, methylene or ethylene, R1 is a monovalent hydrocarbon group, R2 is H or a monovalent hydrocarbon group, any pair of R1 and/or R2 may form an aliphatic hydrocarbon ring, R3 is a monovalent hydrocarbon group, and n is 0 to 6 are polymerizable into polymers. Resist compositions comprising the polymers as a base resin are thermally stable and sensitive to high-energy radiation, have excellent sensitivity and resolution, and lend themselves to micropatterning with electron beam or deep-UV.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: August 16, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Takeshi Kinsho, Takeru Watanabe
  • Patent number: 7968650
    Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.
    Type: Grant
    Filed: October 26, 2007
    Date of Patent: June 28, 2011
    Assignee: Johnson & Johnson Vision Care, Inc.
    Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
  • Publication number: 20110112241
    Abstract: The invention provides novel flame-retardant polymers and materials, their synthesis and use. More particularly, the flame-retardant polymers are deoxybenzoin-derived polymers.
    Type: Application
    Filed: March 30, 2009
    Publication date: May 12, 2011
    Inventors: Todd Emrick, Bryan E. Coughlin, Thangamani Ranganathan, Michael Beaulieu, Richard Farris, Bon-Cheol Ku
  • Patent number: 7935771
    Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: May 3, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
  • Publication number: 20110009585
    Abstract: The present invention provides a thermoplastic acrylic resin comprising (i) a repeating unit derived from a methacrylate monomer, (ii) a repeating unit derived from a vinyl aromatic monomer, (iii) a repeating unit derived from an aromatic group-containing methacrylate monomer, and (iv) a cyclic acid anhydride repeating unit, and a molding for optical material comprising the same.
    Type: Application
    Filed: December 24, 2008
    Publication date: January 13, 2011
    Inventors: Masami Yonemura, Mayuko Kimura, Michio Ogawa
  • Patent number: 7862867
    Abstract: Disclosed is a bifunctional polymerizable compound represented by the formula [1]. Also disclosed is a polymerizable liquid crystal composition comprising at least one bifunctional polymerizable compound represented by the formula [1] and a polymerizable liquid crystal compound. The bifunctional polymerizable compound has a high polymerizability. When added to a polymerizable liquid crystal compound to prepare a polymerizable liquid crystal composition, the bifunctional polymerizable compound enables to remarkably improve the thermal stability of a polymer produced from the composition. The polymerizable liquid crystal composition containing the bifunctional polymerizable compound has a low crystallization temperature and shows a stable liquid-crystallinity under ordinary environment wherein X1, X2 and X3 independently represent a single bond or a benzene ring; Y represents —O— or a single bond; M represents a lactone ring or an acrylate group; and n represents an integer of 4 to 10.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: January 4, 2011
    Assignee: Nissan Chemical Industries, Ltd.
    Inventor: Daniel Antonio Sahade
  • Patent number: 7601766
    Abstract: The present invention relates to polymeric compositions useful in the manufacture of biocompatible medical devices. More particularly, the present invention relates to certain carboxylic monomers capable of polymerization to form polymeric compositions having desirable physical characteristics useful in the manufacture of ophthalmic devices. The polymeric compositions comprise polymerized carboxylic hydrophilic siloxanyl monomers.
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: October 13, 2009
    Assignee: Bausch & Lomb Incorporated
    Inventors: Derek Schorzman, Jay Kunzler, Joseph Salamone
  • Publication number: 20090253880
    Abstract: The present invention aims at providing a dispersion stabilizer for suspension polymerization of a vinyl-based compound, which gives vinyl chloride-based polymer particles having a sharp particle size distribution and a high bulk density owing to excellent dispersion stability during polymerization, and which can produce vinyl chloride-based polymer particles with few wet foams, hardly accompanied with formation of polymer scales and foamy polymers attributable to dry foams, with less coloring, and having excellent heat resistance. The dispersion stabilizer of the invention comprises a PVA-based resin having a 1,2-diol component at a side chain and a degree of saponification of 65 to 87% by mol.
    Type: Application
    Filed: August 1, 2006
    Publication date: October 8, 2009
    Applicant: The Nippon Synthetic Chemical Industry Co., Ltd.
    Inventors: Mitsuo Shibutani, Masahiro Saito
  • Patent number: 7553386
    Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: June 30, 2009
    Assignee: Intel Corporation
    Inventors: Daoqiang Lu, Eric J. Li
  • Patent number: 7465415
    Abstract: Various non-limiting embodiments disclosed herein related to photochromic materials comprising the reaction product of (a) at least one ring-opening cyclic monomer, and (b) a photochromic initiator. Other non-limiting embodiments related to photochromic materials represented by: wherein S? comprises the at least one ring-opened cyclic monomer as set forth herein. Other non-limiting embodiments related to photochromic compositions, optical elements, and methods of inhibiting migration of a photochromic material in a polymeric material using the photochromic materials disclosed herein. Methods of making such photochromic materials, compositions, and optical elements are also disclosed.
    Type: Grant
    Filed: July 30, 2004
    Date of Patent: December 16, 2008
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Feng Wang, Barry Van Gemert, Kevin J. Stewart, Carol L. Knox, Anu Chopra, Patrick M. Brown
  • Publication number: 20080193797
    Abstract: The present invention relates to compounds of the formula (1) and to the use thereof in organic electroluminescent devices. The compounds of the formula (1) are used as host material or dopant in the emitting layer and/or as hole-transport material and/or as electron-transport material.
    Type: Application
    Filed: July 26, 2006
    Publication date: August 14, 2008
    Applicant: Merck Patent GmbH
    Inventors: Holger Heil, Arne Buesing, Philipp Stoessel, Horst Vestweber, Amir Hossain Parham
  • Patent number: 7393468
    Abstract: An adhesive adapted with particular optical properties, and its use to couple a substrate to a substrate holder during substrate processing are disclosed. After processing the substrate, the optical properties of the adhesive may be exploited to locate and/or remove adhesive residue that may be present on the substrate.
    Type: Grant
    Filed: February 23, 2005
    Date of Patent: July 1, 2008
    Assignee: Intel Corporation
    Inventors: Daoqiang Lu, Eric J. Li
  • Patent number: 7354531
    Abstract: A composition for use as a polymer electrolyte, wherein said composition includes one or more polar materials and one or more polyesters of formula III, wherein each unit A may be identical or different and is of the structure IV, wherein each unit B may be identical or different and is of the structure V, wherein R and R1 are each, independently, hydrogen, optionally substituted hydrocarbyl or an inert functional group; a process for preparing said composition; the use of said composition as a polymer electrolyte in coulometers, displays, smart windows, cells or batteries; and a cell and/or battery having said composition.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: April 8, 2008
    Assignee: Shell Oil Company
    Inventors: Wynham Henry Boon, Thomas Clayton Forschner, David Eric Gwyn, James R. MacCallum, Christopher John Smith, Michael John Smith
  • Patent number: 7344820
    Abstract: The present invention relates to a chemically amplified polymer having a pendent group with dicyclohexyl bonded thereto, a process for the preparation thereof, and a resist composition comprising it, and more particularly, to a novel (meth)acrylic or norbornene carboxylate compound with dicyclohexyl bonded thereto, a process for the preparation thereof, a chemically amplified polymer synthesized therewith, and a positive photoresist composition for ArF comprising said polymer, with high resolution and excellent etching resistance.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: March 18, 2008
    Assignee: DongJin Semichem Co., Ltd.
    Inventors: Eun-Kyung Son, Jae-Hyun Kang, Deog-Bae Kim, Jae-Hyun Kim
  • Patent number: 7112633
    Abstract: The invention relates to a process for the preparation of compound(s) comprising at least one acrylate or methacrylate group, at least one linear carbonate group and at least one 5-membered cyclic carbonate group. The process comprises (A) a selective ring-opening step and (B) a (meth)acrylation step. The process is environment-friendly and compounds obtained are usable in radiation curable compositions, for example in radiation-curable inks.
    Type: Grant
    Filed: August 5, 2002
    Date of Patent: September 26, 2006
    Assignee: Surface Specialties, S.A.
    Inventor: Vincent Stone
  • Patent number: 7087675
    Abstract: The ?-hydroxy carbamate, ethylenically unsaturated monomer of the invention can be polymerized as a homopolymer or copolymerized with other monomers. The polymerization can be carried out in an aqueous medium. The ?-hydroxy carbamate monomer is polymerized to form water-soluble homopolymers or, if polymerized as a mixture with one or more comonomers, copolymers that are soluble, emulsifiable, or dispersible in water. The ?-hydroxy carbamate monomer can be used as a replacement monomer for acrylamide.
    Type: Grant
    Filed: March 19, 2003
    Date of Patent: August 8, 2006
    Assignee: BASF Corporation
    Inventors: Walter H. Ohrbom, Patricia A. Herrel
  • Patent number: 7022789
    Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1–C20 alkyl, C2–C20 alkenyl, C2–C20 alkynyl, aryl, C1–C20 carboxylate, C1–C20 alkoxy, C1–C20 alkenyloxy, C2–C20 alkynyloxy, aryloxy, C2–C20 alkoxycarbonyl, C1–C20 alkylthio, C1–C20 alkylsulfonyl and C1–C20 alkylsulfinyl.
    Type: Grant
    Filed: February 22, 2005
    Date of Patent: April 4, 2006
    Assignee: California Institute of Technology
    Inventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
  • Patent number: 6979716
    Abstract: This invention is related to a production method of a branched polymer which comprises polymerizing a macromonomer [I], said macromonomer [I] being a vinyl polymer obtainable by radical polymerization and terminally having one polymerizable carbon—carbon double bond-containing group per molecule. Furthermore, by producing the macromonomer by living radical polymerization, in particular atom transfer radical polymerization, it becomes possible to produce the above polymers or gels having well controlled side chain molecular weights.
    Type: Grant
    Filed: June 18, 1999
    Date of Patent: December 27, 2005
    Assignee: Kaneka Corporation
    Inventors: Yoshiki Nakagawa, Shigeki Ono, Masayuki Fujita, Kenichi Kitano
  • Patent number: 6867274
    Abstract: The present invention relates to telechelic polymers having crosslinkable end groups of the formula and methods for preparing the same wherein n is an integer; is an alkadienyl group; Y is an alkyl group; and Z is crosslinkable end group. In general, the inventive synthesis involves reacting a functionalized chain transfer agent having crosslinkable ends with a cycloalkene in the presence of a ruthenium or osmium catalyst of the formula wherein: M is ruthenium or osmium; X and X1 are independently any anionic ligand; L and L1 are any neutral electron donor ligand; R and R1 are each hydrogen or a substituted or unsubstituted substituent wherein the substituent is selected from the group consisting of C1-C20 alkyl, C2-C20 alkenyl, C1-C20 alkynyl, aryl, C1-C20 carboxylate, C1-C20 alkoxy, C2-C20 alkenyloxy, C2-C20 alkynyloxy, aryloxy, C2-C20 alkoxycarbonyl, C1-C20 alkylthio, C1-C20 alkylsulfonyl and C1-C20 alkylsulfinyl.
    Type: Grant
    Filed: May 21, 2002
    Date of Patent: March 15, 2005
    Assignee: California Institute of Technology
    Inventors: Bob R. Maughon, Takeharu Morita, Robert H. Grubbs
  • Patent number: 6866984
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Grant
    Filed: December 18, 2003
    Date of Patent: March 15, 2005
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Patent number: 6849376
    Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: February 1, 2005
    Assignee: Shipley Company, L.L.C.
    Inventors: George G. Barclay, Stefan J. Caporale
  • Publication number: 20040236052
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Application
    Filed: March 5, 2004
    Publication date: November 25, 2004
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Publication number: 20040230020
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Application
    Filed: March 19, 2004
    Publication date: November 18, 2004
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Publication number: 20040226331
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Application
    Filed: March 17, 2004
    Publication date: November 18, 2004
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6818039
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers maybe complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: November 16, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6808859
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Grant
    Filed: June 27, 2000
    Date of Patent: October 26, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Publication number: 20040131968
    Abstract: A photoresist copolymer is prepared from one or more carboxy-substituted bicycloalkene monomers, and this copolymer is used to prepare a photoresist for submicrolithography processes employing deep ultraviolet (ArF) as a light source. In addition to having high etch resistance and thermal resistance, the photoresist has good adhesiveness to the substrate and can be developed in a TMAH solution.
    Type: Application
    Filed: December 18, 2003
    Publication date: July 8, 2004
    Applicant: Hyundai Electronics Industries Co., Ltd.
    Inventors: Jae Chang Jung, Cheol Kyu Bok, Ki Ho Baik
  • Patent number: 6756438
    Abstract: Aqueous based emulsion copolymers containing vinyl ethylene carbonate, vinyl acetate, and one or more other ethylenically unsaturated monomers, and aqueous based poly(vinyl alcohol)-containing emulsion copolymers formed by emulsion copolymerization of vinyl ethylene carbonate, vinyl acetate, and optionally one or more other ethylenically unsaturated monomer, in the presence of poly(vinyl alcohol). These emulsion copolymers can be used in a variety of applications such as adhesives and coatings.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: June 29, 2004
    Assignee: Air Products and Chemicals, Inc.
    Inventors: John Joseph Rabasco, Carrington Duane Smith, Richard Henry Bott
  • Patent number: 6756461
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: June 29, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo