Abstract: The invention concerns the use as a thickening agent, in possibly pigmented aqueous formulations, such as coating formulations such as paints in the aqueous phase such as dispersion paints, varnishes, paper coatings, cosmetic formulations, detergent formulations, textile formulations and drilling muds, of a water-soluble acrylic copolymer consisting of at least one monomer with ethylenic unsaturation and a carboxylic function, at least one non-ionic monomer with ethylenic unsaturation, at least one oxyalkylated monomer with ethylenic unsaturation terminated by a hydrophobic branched and non-aromatic chain with 10 to 24 carbon atoms, and possibly at least one monomer with at least two ethylenic unsaturations. The invention also concerns the possibly pigmented aqueous formulations obtained.

Abstract: A method for producing a biodegradable polyoxyalkylene derivative, includes: reacting a biodegradable polyoxyalkylene compound represented by the formula (1) as defined herein with a compound represented by one of the formulae (I) to (IV) as defined herein in a presence of an alkaline solid salt, the biodegradable polyoxyalkylene derivative being represented by the formula (2) as defined herein.

Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.

Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by a variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor devices, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising a light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Abstract: The present invention is directed to breathable elastomeric articles. The articles of the present invention may allow the transmission of water vapor while still providing an effective barrier to virus, bacteria, contaminants, bodily fluids, and the like. In general, a breathability additive may be incorporated into the polymer matrix of one or more layers of the elastomeric article to improve the breathability of the layer.

Abstract: A multi-functional admixture for simultaneously providing specified characteristics to hydraulic cement compositions such as concrete contains one or more of specified reaction mixtures obtained by specified two processes as well as partially or completely neutralized substances obtained from such a reaction mixture through a specified third process. The specified two processes include initiating a radical copolymerization process of a radical polymerizable monomer mixture containing maleic anhydride and a monomer of a specified kind in a non-aqueous system in the presence of a non-aqueous radical initiator and stopping the radical copolymerization reaction in its midst while the inversion rate of polymerization is at a specified level by adding water to the reaction system to thereby obtain a reaction mixture. The specified third process is for partially or completely neutralizing the reaction mixture.

Abstract: Disclosed herein is a resin composition for an organic insulating layer, a method of manufacturing the same, and a display panel including an insulating layer formed using the resin composition. The resin composition for an organic insulating layer is produced by polymerizing about 5 to about 35 wt % of an unsaturated carboxylic acid, an unsaturated carboxylic acid anhydride, or a mixture of the unsaturated carboxylic acid and the unsaturated carboxylic acid anhydride, about 5 to about 40 wt % of a styrene compound, about 5 to about 40 wt % of an epoxy compound, about 0.1 to about 10 wt % of an isobornyl compound, and about 20 to about 40 wt % of a dicyclopentadiene compound, based on the total weight of unsaturated carboxylic acid, unsaturated carboxylic acid anhydride, styrene compound, isobornyl compound, and dicyclopentadiene compound.

Abstract: Water-soluble copolymers based on olefinic sulfonic acids, olefinic dicarboxylic acids, vinyl amides and vinyl ethers and/or allyl ethers and/or bisacryl derivatives are described as well as processes for their production and the use of these copolymers as water retention agents, thickeners or anti-segregation agents for aqueous building material systems that contain hydraulic binding agents such as cement, lime, gypsum, anhydrite etc. or for clay suspensions preferably based on bentonite.

Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of the bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused light reflection of bottom film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Abstract: The invention relates to a process for the preparation of compound(s) comprising at least one acrylate or methacrylate group, at least one linear carbonate group and at least one 5-membered cyclic carbonate group. The process comprises (A) a selective ring-opening step and (B) a (meth)acrylation step. The process is environment-friendly and compounds obtained are usable in radiation curable compositions, for example in radiation-curable inks.

Abstract: The present invention provides a processing aid for thermoplastic resin having a weight average molecular weight of 10,000 to 300,000, which is obtained by polymerizing an alkyl (meth)acrylate, or an alkyl (meth)acrylate and another vinyl monomer copolymerizable therewith, in the presence of a mercaptan having an alkyl ester group with C4-20 alkyl group as a chain transfer agent, and/or an organic peroxide having a tertiary-butyl peroxy group as a polymerization initiator.

Abstract: A polymeric compound for photoresist of the invention includes at least one monomer unit represented by following Formula (I): wherein R1, R2, R3, R4 and R5 are the same or different and are each a hydrogen atom or a methyl group; m, p and q each denote an integer of from 0 to 2; and n denotes 0 or 1, where the hydroxyl group and carbonyloxy group extending from a principle chain in the formula are independently combined with either of two carbon atoms on the far-left portion of the rings. By using the polymeric compound for photoresist as a base of a photoresist, the resulting photoresist exhibits well-rounded adhesion to substrates and resistance to etching.

Abstract: An organic electroluminescent device is provided which has a high degree of adhesion between an anode and a hole transport layer, the device emitting light of high luminance even when driven by low applied voltages. Copolymers useful in hole transport layers in organic electroluminescent devices are also provided. Methods of producing hole transport layers for organic electroluminescent devices which can emit light of high luminance even when driven by low applied voltages are also provided, the hole transport layers having high degrees of adhesion with anode. A copolymer comprises a monomer unit including in its structure an electron-donating N,N-diaryl-substituted amino group such as an N,N-diphenylaminophenyl group, or a group having an N,N-diaryl-substituted amino moiety, and a monomer unit having at least one functional group.

Abstract: The heat-curable resin composition of the present invention comprises an epoxy-containing resin and a curing agent, wherein the curing agent is cyclohexanetricarboxylic acid and/or an anhydride thereof. The heat-curable resin composition exhibits an excellent curability without using an curing accelerator and provides a colorless transparent cured product which is little discolored under high-temperature conditions and irradiation conditions of high-energy light. The heat-curable resin composition is suitable for producing coating compositions, adhesives, shaped articles, protective films for color filters and sealing materials for photosemiconductors such as blue LED and white LED.

Abstract: Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). wherein X1, X2, R1, R2, m, n, a, b and c are as defined in the description.

Abstract: The photosensitive polymer includes a first monomer which is norbornene ester having C1 to C12 aliphatic alcohol as a substituent, and a second monomer which is maleic anhydride. A chemically amplified photoresist composition, containing the photosensitive polymer, has an improved etching resistance and adhesion to underlying layer materials, and exhibits wettability to developing solutions.

Abstract: This invention is directed to a coating composition used for original equipment manufacturing or refinishing uses in the automotive industry, which coating composition utilizes an acrylic polymer which contains substituted or unsubstituted exomethylene lactones or lactams as a comonomer.

Abstract: Polytetrahydrofuran, polytetrahydrofuran copolymers, diesters or monoesters of these polymers are prepared by polymerization of tetrahydrofuran in the presence of at least one telogen and/or comonomer, which is in the form of shaped catalyst bodies or catalyst particles having a volume of the individual shape of the body or particle of at least 0.05 mm3, preferably at least 0.2 mm3, in particular 1 mm3, and has at least one of the features a) and b): a) a pore radius distribution having at least one maximum in the pore radius range from 100 to 5000 ?, b) a pore volume of catalyst pores having radii of 200–3000 ? of greater than 0.05 cm3/g and/or a pore volume of pores having radii of 200–5000 ? of greater than 0.075 cm3/g and/or a pore volume of pores having radii of >200 ? of greater than 0.1 cm3/g.

Abstract: A norbornene ring-opened polymer which in the molecule has repeating units represented by the formula (1): wherein R1 represents Q, R2 represents Q or C(?O)R5, R3 represents Q or C(?O)R6, and R4 represents Q or X—C(?O)R7 (wherein Q represents hydrogen, a C1-10 hydrocarbon group, etc.; R5, R6 and R7 each represents hydroxyl, C1-10 alkoxyl, etc., provided that R6 and R7 may be bonded to each other to constitute oxygen, NH, etc.; X represents methylene, etc., provided that when R2 is Q, then R3 is C(?O)R6 and R4 is X—C(?O)R7 and that when R4 is Q, then R2 is C(?O)R5, R3 is C(?O)R6, and the configuration of R2 and R3 is trans, and m is 0 or 1), the polymer having a weight-average molecular weight as determined by gel permeation chromatography of 1,000 to 1,000,000. Also provided is a hydrogenation product of the norbornene ring-opened polymer. The norbornene ring-opened polymer and the hydrogenation product are excellent in heat resistance, electrical properties, etc.

Abstract: Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate and reduce standing waves caused by variation of thickness of the photoresist itself, thereby, increasing uniformity of the photoresist pattern, in a process for forming ultra-fine patterns of photoresist for photolithography by using 193 nm ArF among processes for manufacturing semiconductor device, and its preparation method. Also, the present invention discloses an organic anti-reflective coating composition comprising the light absorbent agent polymer for the organic anti-reflective coating and a pattern formation process using the coating composition.

Abstract: Photoresist polymers and photoresist compositions are disclosed. A photoresist polymer represented by Formula 1 and a photoresist composition containing the same have excellent etching resistance, thermal resistance and adhesive property, and high affinity to an developing solution, thereby improving LER (line edge roughness). wherein X1, X2, X3, R1, R2, R3, R4, R5, m, n, o, a, b, c, d and e are as defined in the description.

Abstract: A stable free radical process for preparing a polymer having acid anhydride functionality includes heating a mixture comprised of a stable free radical agent, maleic anhydride or derivative thereof, and at least one polymerizable electron donor monomer to initiate exothermic reaction and during exotherm of the reaction, adding additional amounts of stable free radical agent to control the reaction temperature. The mixture may also include a stable free radical initiator. In the mixture, the maleic anhydride or derivative thereof preferably comprises from about 10% to about 70%, molar basis, of a total amount of the maleic anhydride or derivative thereof and the at least one polymerizable electron donor monomer. Typically, the heating is to a temperature of from about 100° C. to about 160° C., and the rate of addition of the additional amounts of stable free radical agent is adjusted to control the reaction temperature to be about 160° C. or less.

Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and l is 1 or 2.

Abstract: Initiators for atom transfer radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.

Abstract: The water absorbent material of the present invention is composed of a copolymer of an anhydropolyamino acid having at least one ethylenically unsaturated double bond in a molecule, a water-soluble monomer having an ethylenically unsaturated double bond and polysaccharides, and has high water absorption ratio and high water absorption rate in pure water or water having a low ion content and also has high absorption properties for high concentration salt-containing solutions.

Abstract: A method of obtaining homopolymers and/or copolymers in aqueous solution by the use of phosphorous acid and/or its salts or sodium hypophosphite and by neutralization during the polymerisation of the ethylenically unsaturated monomers by the continuous addition, first of all, of bases such as sodium hydroxide, potassium hydroxide or lithium hydroxide and then bases of alkaline earths such as calcium hydroxide, magnesium hydroxide, calcium oxide or magnesium oxide. The polymers obtained by the said method and uses thereof.

Abstract: A crosslinked polymer (A) which comprises, as essential structural units, units derived from (a) one or more vinyl monomers selected from the group consisting of water-soluble vinyl monomers and/or vinyl monomers which become water-soluble upon hydrolysis and units derived from (b) a crosslinking agent and which satisfies the following requirements: (1): (X)?25 g/g, (2): (Y)?15 g/g, and (3): (Y)??0.54 (X)+41. It has exceedingly high water retentivity and exceedingly high absorbing power under load. When applied to an absorbent structure and an absorbent article, the polymer has excellent absorbing performance. In the relationships, (X) is the amount of physiological saline retained through 1-hour absorption and (Y) is the amount of physiological saline absorbed through 1-hour standing under a load of 60 g/cm2.

Abstract: Provided are a resist material having markedly high resolution and etching resistance of a practically usable level, and being useful for fine microfabrication; a patterning method using the resist material; and a polymer useful as a base resin for the resist material. More specifically, provided are a polymer having a weight-average molecular weight of 1,000 to 500,000, which comprises one or more repeating units selected from the group consisting of repeating units represented by formulae (1) to (3) below; and one or more repeating units of the formula (4) below; and a resist material containing the polymer.

Abstract: Disclosed herein is a novel norbornene, acrylate or methacrylate monomer as a photoresist monomer containing an oxepan-2-one group. Further disclosed are photoresist compositions comprising a polymer prepared from the monomer, methods for preparing the photoresist compositions, and methods for forming photoresist patterns using the photoresist compositions.

Abstract: A photosensitive polymer including fluorine, a resist composition containing the same and a patterning method for IC fabrication using the resist composition are provided. The photosensitive polymer having at least one selected from the group consisting of fluorine-substituted or unsubstituted alkyl ester, tetrahydropyranyl ester, tetrahydrofuranyl ester, nitrile, amide, carbonyl and hexafluoro alkyl having a hydrophilic group, and a trifluorovinyl derivative monomer as a repeating unit and having a weight average molecular weight of about 3,000 to about 100,000. The photosensitive polymer exhibits high transmittance for a light source of F2 (157 nm), high dry etching resistance, and has characteristics suitable to realize an unitrafine pattern size.

Abstract: Coatings for agricultural grade fertilizer particles and industrial grade ammonium nitrate are provided which when applied to particles form a protective film which acts as a barrier to inhibit or prevent hydrocarbon infiltration of the fertilizer particle pores and also to physically separate the fertilizer particles and hydrocarbon materials. In so doing, the coating greatly reduces the efficacy of the fertilizer particles as an oxidizing agent for use in incendiary devices, thereby deterring or preventing the use of agricultural grade fertilizers or industrial grade ammonium nitrate in creating weapons of terror.

Abstract: An absorbent binder composition is provided which is capable of crosslinking after application to a substrate, in the absence of radiation, at a temperature of about 120° C. or less. The absorbent binder composition includes about 15 to about 99.8% by mass monoethylenically unsaturated polymer units, about 0.1 to about 20% by mass polyacrylate ester units having an alkoxysilane functionality, and about 0.1 to about 75% by mass of polymer units selected from polyolefin glycols and polyolefin oxides. The absorbent binder composition can be prepared using a template polymerization process, with the preformed polyolefin glycol or polyolefin oxide serving as a template polymer.

Abstract: A novel copolymer includes a repeating unit (B) derived from an unsaturated carboxylic anhydride, a repeating unit (C) represented by Formula (II), and a repeating unit (D) represented by Formula (III).

Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.

Abstract: The invention relates to a catalyst which contains a catalytically active quantity of at least one oxygen-containing molybdenum and/or wolfram compound on an oxidic support material and which has been calcinated at temperatures of 400 to 900° C. after the precursor compound of the catalytically active compounds have been applied to the support material or to a support material precursor. The transport pores for this catalyst each have a diameter of >25 nm and a volume of at least 50 mm3/g. The catalyst contains x ?mol (wolfram and/or molybdenum)/m2 molybdenum and/or wolfram, with 10.1<x<20.9 in relation to the finished catalyst, with the oxidic support material having a BET surface area of 135 to 220 m2/g. Catalysts of this type are characterized by an acidity of at least 70 ?mol/g at pKs<?3 in the dry state and are therfore very active. The invention also relates to a method for producing a catalyst of this type and to the preferred use thereof.

Abstract: A continuous bulk polymerization and esterification process includes continuously charging into a reaction zone at least one ethylenically unsaturated acid-functional monomer and at least one linear or branched chain alkanol having greater than 11 carbon atoms. The process includes maintaining a flow rate through the reaction zone sufficient to provide an average residence time of less than 60 minutes and maintaining a temperature in the reaction zone sufficient to produce a polymeric product incorporating at least some of the alkanol as an ester of the polymerized ethylenically unsaturated acid-functional monomer. The polymeric product is used in various processes to produce water-based compositions including emulsions and dispersions such as oil emulsions, wax dispersions, pigment dispersions, surfactants and coatings which contain the polymeric product.

Abstract: The polymer matrix material includes a polymerization product of one or more monomers selected from the group of water-soluble, ethylenically-unsaturated acids and acid derivatives, and a crosslinking agent. A quantity of water is used for polymerization, such that the polymer material is swelled to a defined volume upon curing. Optionally, a water-soluble or water-swellable polymer and/or a chemical polymerization initiator.

Abstract: A photosensitive polymer including silicon and a resist composition using the same are disclosed. The photosensitive polymer has the following formula 1. In formula 1, R1 of the first monomer and R3 of the third monomer are an alkyl group. R2 of the first monomer is hydrogen, alkyl, alkoxy, or carbonyl. The X of the first monomer is an integer selected from 1 to 4. Further, m/(m+n+p) is about 0.1 to about 0.4, n/(m+n+p) is about 0.1 to about 0.5, and p/(m+n+p) is about 0.1 to about 0.4.

Abstract: The invention includes polymers that contain a polymers of the invention contain one or more 1) carbonate units and/or 2) a lactone provided by a monomer having a ring oxygen adjacent to the monomer vinyl group. The invention also provides photoresists that contain such polymers, particularly for imaging at short wavelengths such as sub-200 nm.

Abstract: A polymer having a repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, and a chemically amplified resist composition comprising the polymer. The resist composition includes a photosensitive polymer having a first repeating unit comprising a copolymer of butadiene sulfone and maleic anhydride, the first repeating unit represented by a formula: and a second repeating unit copolymerized with the first repeating unit.

Abstract: Polymers comprising recurring units of an acrylic derivative of fluorinated backbone represented by formula (1) are novel. R1, R2 and R3 are independently H, F, C1-20 alkyl or fluorinated C1-20 alkyl, at least one of R1, R2 and R3 contains fluorine, and R4 is a hydrophilic group. Using the polymers, chemical amplification positive resist compositions featuring low absorption of F2 excimer laser light are obtained.

Abstract: A photosensitive polymer includes a copolymer containing adamantylalkyl vinyl ether, and a resist composition includes the photosensitive polymer. For example, the photosensitive polymer may include a copolymer having a formula: wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4.

Abstract: Novel silicon-containing polymers are provided comprising recurring units having a POSS pendant and units which improve alkali solubility under the action of an acid. Resist compositions comprising the polymers are sensitive to high-energy radiation and have a high sensitivity and resolution at a wavelength of up to 300 nm and improved resistance to oxygen plasma etching.

Abstract: A chemically-amplified resist composition is disclosed, which comprises a polymer of formula (I) below: 1

Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.

Abstract: A method of preparing a (meth)acrylate functionalised polymer comprising the steps of mixing together a monofunctional vinylic monomer with from 0.3-100% w/w (based on monofunctional monomer) of a polyfunctional vinylic monomer and from 0.0001-50% w/w of a chain transfer agent, reacting said mixture to form a polymer and terminating the polymerisation reaction before 99% conversion. The resulting polymers are useful as components of surface coatings and inks, as moulding resins or in curable compounds, e.g. curable moulding resins or photoresists.

Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.

Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.

Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.