Acid Anhydride Patents (Class 526/271)
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Publication number: 20040226330Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: ApplicationFiled: March 19, 2004Publication date: November 18, 2004Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6818039Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers maybe complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: November 12, 2002Date of Patent: November 16, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6806335Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.Type: GrantFiled: February 28, 2003Date of Patent: October 19, 2004Assignee: Daicel Chemical Industries, Ltd.Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi
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Patent number: 6803168Abstract: A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate.Type: GrantFiled: January 26, 1999Date of Patent: October 12, 2004Assignee: Clariant Finance (BVI) LimitedInventors: Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski
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Patent number: 6803434Abstract: A synthetic process comprising the following steps: providing a reaction mixture comprising: an ethylenically unsaturated anhydride monomer, at least one ethylenically unsaturated non-anhydride monomer, a free radical initiator, and an alkyl substituted THF solvent having the general structure of formula 1: where R1, R2, R3, and R4 are independently chosen from the group hydrogen and C1-C4 linear or branched alkyl with the proviso that at least one of R1, R2, R3, and R4 is not H; polymerizing the reaction mixture; and removing, by distillation, unreacted monomers, the alkyl substituted THF solvent, and any low boiling volatile reaction products.Type: GrantFiled: February 27, 2003Date of Patent: October 12, 2004Assignee: Arch Specialty Chemicals, Inc.Inventors: Stephanie Dilocker, Sanjay Malik, Binod De, Ashok Reddy
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Patent number: 6800696Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.Type: GrantFiled: January 9, 2004Date of Patent: October 5, 2004Assignee: Daicel Chemical Industries, Ltd.Inventor: Morihito Saito
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Patent number: 6784268Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.Type: GrantFiled: July 3, 2003Date of Patent: August 31, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi
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Patent number: 6784264Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: GrantFiled: December 3, 2003Date of Patent: August 31, 2004Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
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Patent number: 6784265Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: GrantFiled: December 3, 2003Date of Patent: August 31, 2004Assignee: 3M Innovative Properties CompanyInventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
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Patent number: 6780908Abstract: The present invention relates to coating compositions which can be used as the clear coat for automotive finishing or refinishing, the coating composition contining a film-forming binder which contains (A) hydroxyl-containing acrylic polymer and polyhydroxyl-tertiary amine, (B) organic polyisocyanate, and (C) catalyst, to provide a coating film which is quick to cure at ambient temperature.Type: GrantFiled: June 21, 2000Date of Patent: August 24, 2004Assignee: E. I. du Pont de Nemours and CompanyInventor: Gia Huynh-Ba
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Patent number: 6780563Abstract: A polymer bearing specific silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.Type: GrantFiled: September 27, 2001Date of Patent: August 24, 2004Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana, Tsunehiro Nishi, Jun Hatakeyama
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Patent number: 6777517Abstract: Copolymers based on unsaturated monocarboxylic or dicarboxylic acid derivatives, oxyalkylene glycol alkenyl ethers, vinylic polyalkylene glycol, polysiloxane or ester compounds and the use thereof as additives for aqueous suspensions based on mineral or bituminous binders are described. The copolymers give aqueous suspensions of building materials excellent processing properties even in very small amounts, without delaying strength developments. In addition, when the copolymers of the invention are used, a drastic decrease in the water/binder ratio still leads to highly fluid building materials without segregation of individual constituents from the building material mixture occurring.Type: GrantFiled: September 27, 2001Date of Patent: August 17, 2004Assignee: Degussa Construction Chemicals GmbHInventors: Gerhard Albrecht, Christian Hübsch, Hubert Leitner, Harald Grassl, Alfred Kern
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Publication number: 20040152852Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: ApplicationFiled: December 3, 2003Publication date: August 5, 2004Applicant: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
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Publication number: 20040152853Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: ApplicationFiled: December 3, 2003Publication date: August 5, 2004Applicant: 3M Innovative Properties CompanyInventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
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Publication number: 20040143080Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained.Type: ApplicationFiled: January 9, 2004Publication date: July 22, 2004Inventor: Morihito Saito
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Patent number: 6756461Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: May 15, 2003Date of Patent: June 29, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6756460Abstract: The present invention provides: a novel water-soluble copolymer which is excellent in performance for uses, such as detergent builders, pigment dispersants, and scale inhibitors. In addition, the present invention provides: a novel liquid detergent builder which has extremely excellent compatibility, high transparency when a liquid detergent composition comprises it, and excellent detergency; and a novel liquid detergent composition comprising the liquid detergent builder.Type: GrantFiled: August 16, 2001Date of Patent: June 29, 2004Assignee: Nippon Shokubai Co., Ltd.Inventors: Takuya Saeki, Junichi Nakamura, Yoshikazu Fujii, Masahito Takagi, Shigeru Yamaguchi
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Publication number: 20040122192Abstract: The present invention is a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith. A process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof are also described. The polar group-containing olefin copolymer comprises a constituent unit derived from an &agr;-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation.Type: ApplicationFiled: November 17, 2003Publication date: June 24, 2004Applicant: Mitsui Chemicals, Inc.Inventors: Junichi Imuta, Norio Kashiwa, Seiji Ota, Satoru Moriya, Tadahito Nobori, Kazumi Mizutani
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Patent number: 6753395Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: June 4, 2003Date of Patent: June 22, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Publication number: 20040106064Abstract: A polymer used for a negative type resist composition having a first repeating unit of a Si-containing monomer unit, a second repeating unit having a hydroxy group or an epoxy ring and copolymerized with the first repeating unit is provided.Type: ApplicationFiled: November 6, 2003Publication date: June 3, 2004Applicant: Samsung Electronics Co., Ltd.Inventor: Sang-Jun Choi
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Publication number: 20040097638Abstract: The invention relates to a polymer synthesizedType: ApplicationFiled: July 2, 2003Publication date: May 20, 2004Applicant: BASF AkiengesellschaftInventors: Alexander Centner, Karl-Heinz Schumacher, Oliver Hartz, Martin Jung
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Patent number: 6737491Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.Type: GrantFiled: July 26, 2002Date of Patent: May 18, 2004Assignee: Kimberly-Clark Worldwide, Inc.Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
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Patent number: 6723813Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising; polymerizing a monomer mixture of a radical polymerizable monomer having an acid anhydride group and another radical polymerizable monomer at a temperature of 150° C. or higher by using a radical initiator, wherein the concentration of the monomer mixture is 50-75 wt %. This method can provide an acrylic copolymer having an acid anhydride group with a relatively low molecular weight that does not cause the problem of yellowing after baking when used in an acid/epoxy curing type clear paint, by means of high temperature polymerization without the use of a large amount of an expensive initiator.Type: GrantFiled: June 17, 2003Date of Patent: April 20, 2004Assignee: Nippon Paint Company, Ltd.Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
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Patent number: 6713584Abstract: A method of preparing a (meth)acrylate functionalised polymer comprising the steps of mixing together a monofunctional vinylic monomer with from 0.3-100% w/w (based on monofunctional monomer) of a polyfunctional vinylic monomer and from 0.0001-50% w/w of a chain transfer agent, reacting said mixture to form a polymer and terminating the polymerisation reaction before 99% conversion. The resulting polymers are useful as components of surface coatings and inks, as moulding resins or in curable compounds, e.g. curable moulding resins or photoresists.Type: GrantFiled: November 13, 2000Date of Patent: March 30, 2004Assignee: Lucite International UK LimitedInventors: Michael Stephen Chisholm, Andrew Trevithick Slark
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Patent number: 6713229Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.Type: GrantFiled: May 21, 2002Date of Patent: March 30, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
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Patent number: 6706837Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: June 4, 2003Date of Patent: March 16, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6703452Abstract: The present invention relates to coating compositions which can be used as the clear coat for automotive finishing or refinishing, the coating composition containing a film-forming binder which contains (A) hydroxyl-containing acrylic polymer and polyhydroxyl-tertiary amine, (B) organic polyisocyanate, and (C) catalyst, to provide a coating film which is quick to cure at ambient temperature.Type: GrantFiled: November 9, 2001Date of Patent: March 9, 2004Assignee: E. I. du Pont de Nemours and CompanyInventor: Gia Huynh-Ba
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Patent number: 6703469Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.Type: GrantFiled: March 5, 2001Date of Patent: March 9, 2004Assignee: Specialty Fertilizer Products, LLCInventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
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Patent number: 6692725Abstract: It was found that if a copolymer of maleic acid or maleic anhydride with an alkyl vinyl ether, which has a specific viscosity of 3.5 or more, is used as an antibacterial-enhancing agent, the action of an antibacterial agent in an oral composition is enhanced and the effect such as adhesion prevention of a soft deposit is improved.Type: GrantFiled: February 19, 2002Date of Patent: February 17, 2004Assignee: Daicel Chemical Industries, Ltd.Inventor: Toshio Endo
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Patent number: 6689856Abstract: Water-soluble polymers having a water-soluble backbone and side units having in water a lower critical solution temperature, LCST, the polymers being obtainable by free-radical precipitation polymerization of water-soluble monomers and of macromonomers comprising a unit with an LCST whose heat-induced demixing temperature in aqueous solution is from 5 to 40° C. for a concentration by mass in water of 1% of the said unit. Also described is a process for preparing these polymers by free-radical precipitation polymerization, and aqueous compositions containing these polymers and the use of these polymers and compositions, especially in cosmetics, for the cleansing and/or making up and/or care and/or antisun protection of keratin materials.Type: GrantFiled: May 15, 2002Date of Patent: February 10, 2004Assignee: L'OrealInventor: Florence L'alloret
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Patent number: 6689853Abstract: The present invention provides a high temperature continuous polymerization and condensation process for preparing a polymeric product. The process includes continuously charging into a reaction zone: at least one radically-polymerizable monomer having a radically polymerizable group and at least one condensation reactive functionality; and at least one modifying agent having a functional group capable of reacting with the condensation reactive functionality. The reaction zone includes at least one primary reactor, but may, and preferably does, contain a secondary reactor. The process further includes maintaining an effective temperature in the primary reactor to cause polymerization of the monomer and to allow at least a portion of the condensation reactive functionality to react with the functional group of the modifying agent.Type: GrantFiled: December 6, 2001Date of Patent: February 10, 2004Assignee: Johnson Polymer, LLCInventors: John D. Campbell, Jon A. Debling, Douglas J. DeYoung, Ioannis Giannakitsas, Dean R. Hellwig, David D. Schatz, Fouad Teymour, Marco A. Villalobos
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Patent number: 6686124Abstract: A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.Type: GrantFiled: March 14, 2000Date of Patent: February 3, 2004Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Katherina E. Babich, David R. Medeiros, Wayne M. Moreau
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Publication number: 20040019168Abstract: An absorbent binder composition is provided which is capable of crosslinking after application to a substrate, in the absence of radiation, at a temperature of about 120° C. or less. The absorbent binder composition includes about 15 to about 99.8% by mass monoethylenically unsaturated polymer units, about 0.1 to about 20% by mass polyacrylate ester units having an alkoxysilane functionality, and about 0.1 to about 75% by mass of polymer units selected from polyolefin glycols and polyolefin oxides. The absorbent binder composition can be prepared using a template polymerization process, with the preformed polyolefin glycol or polyolefin oxide serving as a template polymer.Type: ApplicationFiled: May 1, 2003Publication date: January 29, 2004Inventors: Dave Allen Soerens, Jason Matthew Laumer
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Publication number: 20040018365Abstract: Absorbent structures having controlled liquid intake, distribution and absorption properties include at least one substrate layer and a flexible absorbent binder formed on and bound to the substrate at selected locations. The flexible absorbent binder is selectively formed so as to provide flow channels, regions of higher and lower fluid intake and absorption, dams for preventing fluid leakage, and other desirable features. The absorbent structures are useful in personal care absorbent articles such as sanitary napkins, diapers, training pants, adult incontinence garments and the like.Type: ApplicationFiled: May 1, 2003Publication date: January 29, 2004Inventors: Candace Dyan Krautkramer, Russell Paul George, Kenneth Russell Casson, Dave Allen Soerens, Jason Matthew Laumer, James Hongxue Wang
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Publication number: 20040019169Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.Type: ApplicationFiled: July 26, 2002Publication date: January 29, 2004Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
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Patent number: 6680362Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: GrantFiled: February 5, 2003Date of Patent: January 20, 2004Assignee: 3M Innovative Properties CompanyInventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
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Publication number: 20040010080Abstract: This invention relates to novel carboxylic acid-modified vinylic polymeric compositions and the process for preparing them. In particular, the invention relates to novel carboxylic acid-modified vinylic polymeric compositions which exhibit properties that make them useful as support resins for producing polymer latices which can be employed in the formulation of various water-based coatings and inks, particularly flexographic inks. More particularly, these carboxylic acid-modified vinylic polymeric compositions are produced by the addition polymerization reaction of vinylic monomers in the presence of dimer acids, trimer acids, dimerized rosins, or mixtures thereof.Type: ApplicationFiled: July 10, 2002Publication date: January 15, 2004Applicant: Westvaco CorporationInventors: G. Frederick Hutter, Alexander John Conte
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Patent number: 6677100Abstract: A photosensitive polymer including a copolymer of an acrylate or methacrylate monomer having a group indicated by the following formula (I), a comonomer selected from a maleic anhydride monomer and a cyclic vinyl ether monomer, and a resist composition including the same. In the formula, R1, R2, R3, and R4 are independently a hydrogen atom, a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, a benzyl group, a phenoxy group, or —M(R′)3, M is Si, Ge, Sn, or OSi, and each R′ independently is a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, or a phenoxy group.Type: GrantFiled: September 13, 2001Date of Patent: January 13, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Hyun-woo Kim, Sang-gyun Woo
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Patent number: 6677413Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.Type: GrantFiled: February 5, 2003Date of Patent: January 13, 2004Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
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Publication number: 20040006189Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1Type: ApplicationFiled: February 28, 2003Publication date: January 8, 2004Applicant: Daicel Chemical Industries, Ltd.Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi
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Patent number: 6673513Abstract: There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.Type: GrantFiled: January 19, 2001Date of Patent: January 6, 2004Assignee: Samsung Electronics Co., Ltd.Inventors: Sang-jun Choi, Hyun-woo Kim
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Patent number: 6670093Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.Type: GrantFiled: May 16, 2001Date of Patent: December 30, 2003Assignee: Industrial Technology Research InstituteInventors: Tsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin
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Publication number: 20030236372Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising;Type: ApplicationFiled: June 17, 2003Publication date: December 25, 2003Applicant: Nippon Paint Company, Ltd.Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
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Publication number: 20030236373Abstract: The present invention is a method of preparing an acrylic copolymer using as a raw material a monomer mixture comprising 50 mole % or more of a monomer having a polymerizable double bond formed by a carbon atom to which no hydrogen atom is bonded and a carbon atom to which a hydrogen atom is bonded, wherein after the polymerization is carried out at a polymerization temperature of 150° C. or higher, further heating at 80-130° C. is done.Type: ApplicationFiled: June 17, 2003Publication date: December 25, 2003Applicant: Nippon Paint Company, Ltd.Inventors: Tomohito Asai, Masatoshi Oohata, Koji Nakajima
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Patent number: 6660819Abstract: The invention relates to a process for producing water-soluble or water-swellable polymer products with low levels of residual monomers using acrylic acid and/or acrylic acid derivatives, which process is characterized by adding a nitrogen compound to the monomer solution to be polymerized and subsequent heating of the polymer product at temperatures of from 120 to 240° C. The polymers produced accordingly are suitable for use as flocculants, dispersants and absorbents.Type: GrantFiled: October 1, 2002Date of Patent: December 9, 2003Assignee: Stockhausen GmbH & Co. KGInventors: Miroslav Chmelir, Kurt Dahmen
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Patent number: 6653047Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymers are disclosed. More specifically, photoresist polymers comprising a photoresist monomer containing fluorine-substituted benzylcarboxylate represented by Formula 1, and a composition comprising the polymer are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in aqueous tetramethylammonium hydroxide (TMAH) solution. And, the present photoresist composition is suitable to form a fine pattern using deep ultraviolet light source such as VUV (157 nm), since the composition has low light absorbance at 193 nm and 157 nm wavelength. wherein, X1, X2, R1, l and m are defined in the specification.Type: GrantFiled: March 27, 2002Date of Patent: November 25, 2003Assignee: Hynix Semiconductor IncInventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
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Publication number: 20030215735Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.Type: ApplicationFiled: October 16, 2002Publication date: November 20, 2003Inventors: Robert Clayton Wheland, Roger Harquail French, Frank Leonard Schadt, Frederick C Zumsteg
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Patent number: 6649714Abstract: A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.Type: GrantFiled: February 27, 2003Date of Patent: November 18, 2003Assignee: Sumitomo Bakelite Co., Ltd.Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian
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Patent number: 6646082Abstract: A new class of polymeric corrosion inhibiting compositions incorporating pendant heterocyclic groups which are surprisingly effective copper corrosion inhibitors are disclosed. The polymers form a protective barrier on metallic components to aqueous systems and remain substantive on metallic surfaces over a wide pH range. Moreover, the polymers are resistant to oxidizing biocides, and are substantially impervious to repeated or prolonged exposure to corrosive agents.Type: GrantFiled: September 4, 2002Date of Patent: November 11, 2003Assignee: Rohm and Haas CompanyInventors: Tirthankar Ghosh, William M. Hann, Barry Weinstein
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Publication number: 20030208016Abstract: In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these olefins are sufficiently reactive with the propagating free-radicals during cure to provide a highly crosslinked thermoset resin. Moreover, invention compositions comprise high molecular weight polycyclic olefins having low volatility. Accordingly, the observed undesirable weight loss upon cure of prior art thermosetting compositions is considerably reduced. Further provided by the present invention are compositions comprising functionalized polycyclic olefin monomers. These functionalized olefin monomers provide additional benefits such as increased adhesion to a variety of surfaces and greater control over glass transition temperatures.Type: ApplicationFiled: January 27, 2003Publication date: November 6, 2003Applicant: Henkel Loctite CorporationInventors: Stephen M. Dershem, Kevin J. Forrestal, Puwei Liu