Acid Anhydride Patents (Class 526/271)
  • Publication number: 20040226330
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Application
    Filed: March 19, 2004
    Publication date: November 18, 2004
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6818039
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers maybe complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: November 16, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6806335
    Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): The polymeric compound may further include at least one of monomer units represented by Formulae (IIa) to (IIg) as described in the specification. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.
    Type: Grant
    Filed: February 28, 2003
    Date of Patent: October 19, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi
  • Patent number: 6803168
    Abstract: A composition for an anti-reflective coating or a radiation absorbing coating which can form an anti-reflective coating or a radiation absorbing coating having high absorption to exposed radiation in the range of 100 to 450 nm, no diffusion of photo-generated acid to anti-reflective coating and so on, no intermixing of resist and anti-reflective coating layer, good shelf-life stability, and good step coverage and novel compounds and polymers being preferably used in the composition are disclosed. The composition contains an acrylic or methacrylic compound or polymer with an isocyanate or thioisocyanate group bonded through an alkylene group to a side chain thereof or with an amino or hydroxyl group-containing organic chromophore which absorbs radiation in the range of 100 to 450 nm wavelength and is bonded, for example, through an alkylene group to the isocyanate or thioisocyanate group. Resist patters with high resolution are formed on a substrate.
    Type: Grant
    Filed: January 26, 1999
    Date of Patent: October 12, 2004
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Munirathna Padmanaban, Wen-Bing Kang, Hatsuyuki Tanaka, Ken Kimura, Georg Pawlowski
  • Patent number: 6803434
    Abstract: A synthetic process comprising the following steps: providing a reaction mixture comprising: an ethylenically unsaturated anhydride monomer, at least one ethylenically unsaturated non-anhydride monomer, a free radical initiator, and an alkyl substituted THF solvent having the general structure of formula 1: where R1, R2, R3, and R4 are independently chosen from the group hydrogen and C1-C4 linear or branched alkyl with the proviso that at least one of R1, R2, R3, and R4 is not H; polymerizing the reaction mixture; and removing, by distillation, unreacted monomers, the alkyl substituted THF solvent, and any low boiling volatile reaction products.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: October 12, 2004
    Assignee: Arch Specialty Chemicals, Inc.
    Inventors: Stephanie Dilocker, Sanjay Malik, Binod De, Ashok Reddy
  • Patent number: 6800696
    Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.
    Type: Grant
    Filed: January 9, 2004
    Date of Patent: October 5, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Morihito Saito
  • Patent number: 6784268
    Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
    Type: Grant
    Filed: July 3, 2003
    Date of Patent: August 31, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi
  • Patent number: 6784264
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: August 31, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
  • Patent number: 6784265
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Grant
    Filed: December 3, 2003
    Date of Patent: August 31, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
  • Patent number: 6780908
    Abstract: The present invention relates to coating compositions which can be used as the clear coat for automotive finishing or refinishing, the coating composition contining a film-forming binder which contains (A) hydroxyl-containing acrylic polymer and polyhydroxyl-tertiary amine, (B) organic polyisocyanate, and (C) catalyst, to provide a coating film which is quick to cure at ambient temperature.
    Type: Grant
    Filed: June 21, 2000
    Date of Patent: August 24, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Gia Huynh-Ba
  • Patent number: 6780563
    Abstract: A polymer bearing specific silicon-containing groups is novel. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity and resolution at a wavelength of less than 300 nm, and high resistance to oxygen plasma etching. The resist composition lends itself to micropatterning for the fabrication of VLSIs.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: August 24, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Hasegawa, Takeshi Kinsho, Takeru Watanabe, Mutsuo Nakashima, Seiichiro Tachibana, Tsunehiro Nishi, Jun Hatakeyama
  • Patent number: 6777517
    Abstract: Copolymers based on unsaturated monocarboxylic or dicarboxylic acid derivatives, oxyalkylene glycol alkenyl ethers, vinylic polyalkylene glycol, polysiloxane or ester compounds and the use thereof as additives for aqueous suspensions based on mineral or bituminous binders are described. The copolymers give aqueous suspensions of building materials excellent processing properties even in very small amounts, without delaying strength developments. In addition, when the copolymers of the invention are used, a drastic decrease in the water/binder ratio still leads to highly fluid building materials without segregation of individual constituents from the building material mixture occurring.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: August 17, 2004
    Assignee: Degussa Construction Chemicals GmbH
    Inventors: Gerhard Albrecht, Christian Hübsch, Hubert Leitner, Harald Grassl, Alfred Kern
  • Publication number: 20040152852
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Application
    Filed: December 3, 2003
    Publication date: August 5, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
  • Publication number: 20040152853
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Application
    Filed: December 3, 2003
    Publication date: August 5, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
  • Publication number: 20040143080
    Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained.
    Type: Application
    Filed: January 9, 2004
    Publication date: July 22, 2004
    Inventor: Morihito Saito
  • Patent number: 6756461
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: May 15, 2003
    Date of Patent: June 29, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6756460
    Abstract: The present invention provides: a novel water-soluble copolymer which is excellent in performance for uses, such as detergent builders, pigment dispersants, and scale inhibitors. In addition, the present invention provides: a novel liquid detergent builder which has extremely excellent compatibility, high transparency when a liquid detergent composition comprises it, and excellent detergency; and a novel liquid detergent composition comprising the liquid detergent builder.
    Type: Grant
    Filed: August 16, 2001
    Date of Patent: June 29, 2004
    Assignee: Nippon Shokubai Co., Ltd.
    Inventors: Takuya Saeki, Junichi Nakamura, Yoshikazu Fujii, Masahito Takagi, Shigeru Yamaguchi
  • Publication number: 20040122192
    Abstract: The present invention is a polar group-containing olefin copolymer having excellent adhesion properties to metals or polar resins and excellent compatibility therewith. A process for preparing the copolymer, a thermoplastic resin composition containing the copolymer, and uses thereof are also described. The polar group-containing olefin copolymer comprises a constituent unit derived from an &agr;-olefin of 2 to 20 carbon atoms, and a constituent unit derived from a straight-chain, branched or cyclic polar group-containing monomer having at the end a polar group such as a hydroxyl group or an epoxy group and/or a constituent unit derived from a macromonomer having at the end a polymer segment obtained by anionic polymerization, ring-opening polymerization or polycondensation.
    Type: Application
    Filed: November 17, 2003
    Publication date: June 24, 2004
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Junichi Imuta, Norio Kashiwa, Seiji Ota, Satoru Moriya, Tadahito Nobori, Kazumi Mizutani
  • Patent number: 6753395
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: June 22, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Publication number: 20040106064
    Abstract: A polymer used for a negative type resist composition having a first repeating unit of a Si-containing monomer unit, a second repeating unit having a hydroxy group or an epoxy ring and copolymerized with the first repeating unit is provided.
    Type: Application
    Filed: November 6, 2003
    Publication date: June 3, 2004
    Applicant: Samsung Electronics Co., Ltd.
    Inventor: Sang-Jun Choi
  • Publication number: 20040097638
    Abstract: The invention relates to a polymer synthesized
    Type: Application
    Filed: July 2, 2003
    Publication date: May 20, 2004
    Applicant: BASF Akiengesellschaft
    Inventors: Alexander Centner, Karl-Heinz Schumacher, Oliver Hartz, Martin Jung
  • Patent number: 6737491
    Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: May 18, 2004
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
  • Patent number: 6723813
    Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising; polymerizing a monomer mixture of a radical polymerizable monomer having an acid anhydride group and another radical polymerizable monomer at a temperature of 150° C. or higher by using a radical initiator, wherein the concentration of the monomer mixture is 50-75 wt %. This method can provide an acrylic copolymer having an acid anhydride group with a relatively low molecular weight that does not cause the problem of yellowing after baking when used in an acid/epoxy curing type clear paint, by means of high temperature polymerization without the use of a large amount of an expensive initiator.
    Type: Grant
    Filed: June 17, 2003
    Date of Patent: April 20, 2004
    Assignee: Nippon Paint Company, Ltd.
    Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
  • Patent number: 6713584
    Abstract: A method of preparing a (meth)acrylate functionalised polymer comprising the steps of mixing together a monofunctional vinylic monomer with from 0.3-100% w/w (based on monofunctional monomer) of a polyfunctional vinylic monomer and from 0.0001-50% w/w of a chain transfer agent, reacting said mixture to form a polymer and terminating the polymerisation reaction before 99% conversion. The resulting polymers are useful as components of surface coatings and inks, as moulding resins or in curable compounds, e.g. curable moulding resins or photoresists.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: March 30, 2004
    Assignee: Lucite International UK Limited
    Inventors: Michael Stephen Chisholm, Andrew Trevithick Slark
  • Patent number: 6713229
    Abstract: Copolymers and terpolyers are used in chemically amplified resists. The terpolymers are of the formula: wherein R3 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R4 is selected from the group consisting of hydrogen and a C1 to C10 aliphatic hydrocarbon, wherein the aliphatic hydrocarbon contains substituents selected from the group consisting of hydrogen, hydroxy, carboxylic acid, carboxylic anhydride, and combinations thereof; R5 is selected from the group consisting of hydrogen and methyl; R6 is selected from the group consisting of t-butyl and tetrahydropyranyl; m and n are each integers; and wherein n/(m+n) ranges from about 0.1 to about 0.5.
    Type: Grant
    Filed: May 21, 2002
    Date of Patent: March 30, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Choi, Chun-geun Park, Young-bum Koh
  • Patent number: 6706837
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: June 4, 2003
    Date of Patent: March 16, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6703452
    Abstract: The present invention relates to coating compositions which can be used as the clear coat for automotive finishing or refinishing, the coating composition containing a film-forming binder which contains (A) hydroxyl-containing acrylic polymer and polyhydroxyl-tertiary amine, (B) organic polyisocyanate, and (C) catalyst, to provide a coating film which is quick to cure at ambient temperature.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: March 9, 2004
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Gia Huynh-Ba
  • Patent number: 6703469
    Abstract: Biodegradable anionic polymers are disclosed which include recurring polymeric subunits preferably made up of dicarboxylic monomers such as maleic anhydride, itaconic anhydride or citraconic anhydride. Free radical polymerization is used in the synthesis of the polymers. The polymers may be complexed with ions and/or mixed with fertilizers or seeds to yield agriculturally useful compositions. The preferred products of the invention may be applied foliarly or to the earth adjacent growing plants in order to enhance nutrient uptake by the plants.
    Type: Grant
    Filed: March 5, 2001
    Date of Patent: March 9, 2004
    Assignee: Specialty Fertilizer Products, LLC
    Inventors: John Larry Sanders, Grigory Mazo, Jacob Mazo
  • Patent number: 6692725
    Abstract: It was found that if a copolymer of maleic acid or maleic anhydride with an alkyl vinyl ether, which has a specific viscosity of 3.5 or more, is used as an antibacterial-enhancing agent, the action of an antibacterial agent in an oral composition is enhanced and the effect such as adhesion prevention of a soft deposit is improved.
    Type: Grant
    Filed: February 19, 2002
    Date of Patent: February 17, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Toshio Endo
  • Patent number: 6689856
    Abstract: Water-soluble polymers having a water-soluble backbone and side units having in water a lower critical solution temperature, LCST, the polymers being obtainable by free-radical precipitation polymerization of water-soluble monomers and of macromonomers comprising a unit with an LCST whose heat-induced demixing temperature in aqueous solution is from 5 to 40° C. for a concentration by mass in water of 1% of the said unit. Also described is a process for preparing these polymers by free-radical precipitation polymerization, and aqueous compositions containing these polymers and the use of these polymers and compositions, especially in cosmetics, for the cleansing and/or making up and/or care and/or antisun protection of keratin materials.
    Type: Grant
    Filed: May 15, 2002
    Date of Patent: February 10, 2004
    Assignee: L'Oreal
    Inventor: Florence L'alloret
  • Patent number: 6689853
    Abstract: The present invention provides a high temperature continuous polymerization and condensation process for preparing a polymeric product. The process includes continuously charging into a reaction zone: at least one radically-polymerizable monomer having a radically polymerizable group and at least one condensation reactive functionality; and at least one modifying agent having a functional group capable of reacting with the condensation reactive functionality. The reaction zone includes at least one primary reactor, but may, and preferably does, contain a secondary reactor. The process further includes maintaining an effective temperature in the primary reactor to cause polymerization of the monomer and to allow at least a portion of the condensation reactive functionality to react with the functional group of the modifying agent.
    Type: Grant
    Filed: December 6, 2001
    Date of Patent: February 10, 2004
    Assignee: Johnson Polymer, LLC
    Inventors: John D. Campbell, Jon A. Debling, Douglas J. DeYoung, Ioannis Giannakitsas, Dean R. Hellwig, David D. Schatz, Fouad Teymour, Marco A. Villalobos
  • Patent number: 6686124
    Abstract: A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: February 3, 2004
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, David R. Medeiros, Wayne M. Moreau
  • Publication number: 20040019168
    Abstract: An absorbent binder composition is provided which is capable of crosslinking after application to a substrate, in the absence of radiation, at a temperature of about 120° C. or less. The absorbent binder composition includes about 15 to about 99.8% by mass monoethylenically unsaturated polymer units, about 0.1 to about 20% by mass polyacrylate ester units having an alkoxysilane functionality, and about 0.1 to about 75% by mass of polymer units selected from polyolefin glycols and polyolefin oxides. The absorbent binder composition can be prepared using a template polymerization process, with the preformed polyolefin glycol or polyolefin oxide serving as a template polymer.
    Type: Application
    Filed: May 1, 2003
    Publication date: January 29, 2004
    Inventors: Dave Allen Soerens, Jason Matthew Laumer
  • Publication number: 20040018365
    Abstract: Absorbent structures having controlled liquid intake, distribution and absorption properties include at least one substrate layer and a flexible absorbent binder formed on and bound to the substrate at selected locations. The flexible absorbent binder is selectively formed so as to provide flow channels, regions of higher and lower fluid intake and absorption, dams for preventing fluid leakage, and other desirable features. The absorbent structures are useful in personal care absorbent articles such as sanitary napkins, diapers, training pants, adult incontinence garments and the like.
    Type: Application
    Filed: May 1, 2003
    Publication date: January 29, 2004
    Inventors: Candace Dyan Krautkramer, Russell Paul George, Kenneth Russell Casson, Dave Allen Soerens, Jason Matthew Laumer, James Hongxue Wang
  • Publication number: 20040019169
    Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.
    Type: Application
    Filed: July 26, 2002
    Publication date: January 29, 2004
    Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
  • Patent number: 6680362
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: January 20, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Duane D. Fansler, Kevin M. Lewandowski, Michael S. Wendland, Babu N. Gaddam
  • Publication number: 20040010080
    Abstract: This invention relates to novel carboxylic acid-modified vinylic polymeric compositions and the process for preparing them. In particular, the invention relates to novel carboxylic acid-modified vinylic polymeric compositions which exhibit properties that make them useful as support resins for producing polymer latices which can be employed in the formulation of various water-based coatings and inks, particularly flexographic inks. More particularly, these carboxylic acid-modified vinylic polymeric compositions are produced by the addition polymerization reaction of vinylic monomers in the presence of dimer acids, trimer acids, dimerized rosins, or mixtures thereof.
    Type: Application
    Filed: July 10, 2002
    Publication date: January 15, 2004
    Applicant: Westvaco Corporation
    Inventors: G. Frederick Hutter, Alexander John Conte
  • Patent number: 6677100
    Abstract: A photosensitive polymer including a copolymer of an acrylate or methacrylate monomer having a group indicated by the following formula (I), a comonomer selected from a maleic anhydride monomer and a cyclic vinyl ether monomer, and a resist composition including the same. In the formula, R1, R2, R3, and R4 are independently a hydrogen atom, a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, a benzyl group, a phenoxy group, or —M(R′)3, M is Si, Ge, Sn, or OSi, and each R′ independently is a C1-C4 alkyl group, a C1-C4 alkoxy group, a phenyl group, or a phenoxy group.
    Type: Grant
    Filed: September 13, 2001
    Date of Patent: January 13, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Hyun-woo Kim, Sang-gyun Woo
  • Patent number: 6677413
    Abstract: Initiators for nitroxide-mediated radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.
    Type: Grant
    Filed: February 5, 2003
    Date of Patent: January 13, 2004
    Assignee: 3M Innovative Properties Company
    Inventors: Kevin M. Lewandowski, Duane D. Fansler, Michael S. Wendland, Babu N. Gaddam
  • Publication number: 20040006189
    Abstract: A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1
    Type: Application
    Filed: February 28, 2003
    Publication date: January 8, 2004
    Applicant: Daicel Chemical Industries, Ltd.
    Inventors: Yoshinori Funaki, Kiyoharu Tsutsumi, Akira Takaragi
  • Patent number: 6673513
    Abstract: There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: January 6, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Choi, Hyun-woo Kim
  • Patent number: 6670093
    Abstract: The present invention relates to a silicon-containing copolymer which includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit. The silicon-containing copolymer is suitable for use as a top layer resist in a bilayer resist system.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: December 30, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Tsing-Tang Song, Tsong-Shin Jean, Weir-Torn Jiaang, Chih-Shin Chuang, Han-Bin Cheng, Jui-Fa Chang, Tzu-Yu Lin
  • Publication number: 20030236372
    Abstract: The present invention is a method of preparing an acrylic copolymer having an acid anhydride group with a number average molecular weight of 1,500-5,000 comprising;
    Type: Application
    Filed: June 17, 2003
    Publication date: December 25, 2003
    Applicant: Nippon Paint Company, Ltd.
    Inventors: Tomohito Asai, Shinya Yamada, Yusuke Ninomiya
  • Publication number: 20030236373
    Abstract: The present invention is a method of preparing an acrylic copolymer using as a raw material a monomer mixture comprising 50 mole % or more of a monomer having a polymerizable double bond formed by a carbon atom to which no hydrogen atom is bonded and a carbon atom to which a hydrogen atom is bonded, wherein after the polymerization is carried out at a polymerization temperature of 150° C. or higher, further heating at 80-130° C. is done.
    Type: Application
    Filed: June 17, 2003
    Publication date: December 25, 2003
    Applicant: Nippon Paint Company, Ltd.
    Inventors: Tomohito Asai, Masatoshi Oohata, Koji Nakajima
  • Patent number: 6660819
    Abstract: The invention relates to a process for producing water-soluble or water-swellable polymer products with low levels of residual monomers using acrylic acid and/or acrylic acid derivatives, which process is characterized by adding a nitrogen compound to the monomer solution to be polymerized and subsequent heating of the polymer product at temperatures of from 120 to 240° C. The polymers produced accordingly are suitable for use as flocculants, dispersants and absorbents.
    Type: Grant
    Filed: October 1, 2002
    Date of Patent: December 9, 2003
    Assignee: Stockhausen GmbH & Co. KG
    Inventors: Miroslav Chmelir, Kurt Dahmen
  • Patent number: 6653047
    Abstract: Photoresist monomers, photoresist polymers prepared therefrom, and photoresist compositions using the polymers are disclosed. More specifically, photoresist polymers comprising a photoresist monomer containing fluorine-substituted benzylcarboxylate represented by Formula 1, and a composition comprising the polymer are disclosed. The photoresist composition has excellent etching resistance, heat resistance and adhesiveness, and can be developed in aqueous tetramethylammonium hydroxide (TMAH) solution. And, the present photoresist composition is suitable to form a fine pattern using deep ultraviolet light source such as VUV (157 nm), since the composition has low light absorbance at 193 nm and 157 nm wavelength. wherein, X1, X2, R1, l and m are defined in the specification.
    Type: Grant
    Filed: March 27, 2002
    Date of Patent: November 25, 2003
    Assignee: Hynix Semiconductor Inc
    Inventors: Geun Su Lee, Jae Chang Jung, Ki Soo Shin
  • Publication number: 20030215735
    Abstract: Fluoroolefin/acid group or protected acid group-containing copolymers for photoresist compositions and microlithography methods employing the photoresist compositions are described. These copolymer compositions comprise 1) at least one fluoroolefin, preferably hexafluoroisobutylene, and 2) an acid group or a protected acid group (e.g., a t-alkyl ester, preferably a t-butyl ester), which together impart high ultraviolet (UV) transparency and developability in basic media to these materials. The materials of this invention have high UV transparency, particularly at short wavelengths, e.g., 157 nm and 193 nm, which makes them useful for lithography at these short wavelengths.
    Type: Application
    Filed: October 16, 2002
    Publication date: November 20, 2003
    Inventors: Robert Clayton Wheland, Roger Harquail French, Frank Leonard Schadt, Frederick C Zumsteg
  • Patent number: 6649714
    Abstract: A process for polymerizing polycycloolefins containing pendant anhydride moieties is disclosed. The process utilizes a single component nickel containing catalyst of the formula EnNi(C6F5)2 wherein n is 1 or 2 and E represents a neutral electron donor ligand.
    Type: Grant
    Filed: February 27, 2003
    Date of Patent: November 18, 2003
    Assignee: Sumitomo Bakelite Co., Ltd.
    Inventors: Saikumar Jayaraman, Brian L. Goodall, Richard Vicari, John-Henry Lipian
  • Patent number: 6646082
    Abstract: A new class of polymeric corrosion inhibiting compositions incorporating pendant heterocyclic groups which are surprisingly effective copper corrosion inhibitors are disclosed. The polymers form a protective barrier on metallic components to aqueous systems and remain substantive on metallic surfaces over a wide pH range. Moreover, the polymers are resistant to oxidizing biocides, and are substantially impervious to repeated or prolonged exposure to corrosive agents.
    Type: Grant
    Filed: September 4, 2002
    Date of Patent: November 11, 2003
    Assignee: Rohm and Haas Company
    Inventors: Tirthankar Ghosh, William M. Hann, Barry Weinstein
  • Publication number: 20030208016
    Abstract: In accordance with the present invention, there are provided free-radical polymerizable compositions comprising polycyclic olefins, wherein the polycyclic olefins contain little, if any, cyclopentenyl unsaturation. As a result, these olefins are sufficiently reactive with the propagating free-radicals during cure to provide a highly crosslinked thermoset resin. Moreover, invention compositions comprise high molecular weight polycyclic olefins having low volatility. Accordingly, the observed undesirable weight loss upon cure of prior art thermosetting compositions is considerably reduced. Further provided by the present invention are compositions comprising functionalized polycyclic olefin monomers. These functionalized olefin monomers provide additional benefits such as increased adhesion to a variety of surfaces and greater control over glass transition temperatures.
    Type: Application
    Filed: January 27, 2003
    Publication date: November 6, 2003
    Applicant: Henkel Loctite Corporation
    Inventors: Stephen M. Dershem, Kevin J. Forrestal, Puwei Liu