From Monomer Containing Three Or More Oxygen Atoms Bonded To A Single Sulfur Atom, E.g., Sulfonate, Etc. Patents (Class 526/287)
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Publication number: 20120244105Abstract: A pharmaceutical composition comprising a polymeric binder including a high molecular weight synthetic polymer having a backbone constituted of non hydrolysable covalent bonds, said polymer being able to form electrostatic bonds at a pH lower than the isoelectric point of gluten and peptides derived from the degradation of gluten, and being able to bind to gluten or peptides derived from the degradation of gluten in the gastrointestinal tract, and a pharmaceutically acceptable carrier. Methods of using the polymeric binder for binding gluten or a peptide derived from the degradation of gluten, for decreasing the degradation of gluten into toxic peptides or for decreasing interaction of gluten or peptides derived from the degradation of gluten with the gastrointestinal mucosa.Type: ApplicationFiled: May 1, 2012Publication date: September 27, 2012Applicant: VALORISATION-RECHERCHE LIMITED PARTNERSHIPInventors: Jean-Christophe Leroux, Mohamad Nasser Eddine
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Publication number: 20120220740Abstract: Polymers useful as catalysts in non-enzymatic saccharification processes are provided. Provided are also methods for hydrolyzing cellulosic materials into monosaccharides and/or oligosaccharides using these polymeric acid catalysts.Type: ApplicationFiled: February 27, 2012Publication date: August 30, 2012Applicant: Midori Renewables, Inc.Inventors: John M. GEREMIA, Brian M. BAYNES
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Patent number: 8252879Abstract: Provided are a photosensitive resin and a photosensitive resin composition comprising the photosensitive resin. The photosensitive resin has the structure of Formula 1, which is described in the specification. The photosensitive resin and the photosensitive resin composition have good sensitivity, improved resistance to heat and chemicals, and excellent storage stability. Further provided are a method for preparing the photosensitive resin and a cured product of the photosensitive resin composition.Type: GrantFiled: August 20, 2008Date of Patent: August 28, 2012Assignee: LG Chem, Ltd.Inventors: Han Soo Kim, Min Young Lim, Sung Hyun Kim, Yoon Hee Heo, Dae Hyun Kim, Ji Heum Yoo, Sun Hwa Kim
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Publication number: 20120211031Abstract: A discrete or single dose detergent formulation is described. The formulation comprises special copolymers A. These copolymers A comprise structural units originating from a1) one or more special monomers comprising a cyclic amide structure or a2) one or more special alkoxylated monomers and b) one or more special monomers comprising an amido group and a sulfonic acid group in protonated or in salt form and may be crosslinked or non-crosslinked. The discrete or single dose detergent formulations are particularly suited for treating table ware or glasses in automatic dishwashing machines.Type: ApplicationFiled: October 7, 2010Publication date: August 23, 2012Applicants: CLARIANT S.A., BRAZIL, CLARIANT FINANCE (BVI) LIMITEDInventors: Matthias Loeffler, Ernesto Iwao Horikoshi, Gustavo Kume, Ana Regina Coimbra
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Patent number: 8241462Abstract: To provide a papermaking internal sizing agent capable of efficiently imparting sizing performance even in neutral papermaking which uses calcium carbonate as filler, and uses no aluminum sulfate or uses a small amount of aluminum sulfate, and also provide a paper or a paperboard obtained by using the papermaking internal sizing agent. The papermaking internal sizing agent comprises as an effective ingredient an amphoteric copolymer having hydrophobic groups and cationic groups, at least a part of the cationic groups being quaternized. Preferably, the amphoteric copolymer is obtained by polymerizing monomer ingredients that it essentially contain a hydrophobic monomer (A), a cationic monomer (B), and an anionic monomer (C) and that an anion equivalent of the monomer (C) is 0.1 to 90% of a cation equivalent of the monomer (B), in which a rate of quaternizing of the cationic groups is not less than 40% by mole. The paper or the paperboard contains the above papermaking internal sizing agent.Type: GrantFiled: March 6, 2008Date of Patent: August 14, 2012Assignees: Harima Chemicals, Inc., Nippon Paper Industries Co., Ltd.Inventors: Kazunari Sakai, Takahiro Fujiwara, Kazushige Inaoka, Takashi Yamaguchi, Masaki Ito, Yasunobu Ooka
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Publication number: 20120202141Abstract: The object of the present invention is to solve the technical problems in the microfabrication of photomasks or semiconductors and is, in particular, to provide a chemical amplification type positive resist film, and a resist film, resist coated mask blanks and a method of forming a resist pattern using the composition, which satisfy at the same time all of high sensitivity, high resolution (for example, high resolving power), good exposure latitude (EL), and good line edge roughness (LER). A chemical amplification type positive resist composition comprising: a high molecular compound (A) having a repeating unit represented by the following general formula (1), a repeating unit represented by the following general formula (2), and a repeating unit represented by the following general formula (3).Type: ApplicationFiled: January 31, 2012Publication date: August 9, 2012Applicant: FUJIFILM CORPORATIONInventors: Takeshi INASAKI, Tomotaka TSUCHIMURA, Hiroo TAKIZAWA
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Publication number: 20120202959Abstract: A process for producing water-absorbing polymer particles with improved free swell rate by polymerizing a monomer solution or suspension comprising an ethylenically unsaturated monomer bearing acid groups, an ethylenically unsaturated monomer, a crosslinker and an initiator.Type: ApplicationFiled: February 1, 2012Publication date: August 9, 2012Applicant: BASF SEInventors: Norbert Herfert, Thomas Daniel, Klaus Dieter Hörner
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Publication number: 20120172457Abstract: Disclosed is a branched or crosslinked anionic polyelectrolyte of at least one monomer having a partially- or totally-salified strong acid function, with at least one neutral monomer and at least one monomer having formula (I), wherein: R represents a linear or branched alkyl radical including between 8 and twenty carbon atoms, and n represents a number greater than or equal to 1 and less than or equal to twenty. Also described is the use thereof as a thickener in topical compositions.Type: ApplicationFiled: September 1, 2010Publication date: July 5, 2012Applicant: SOCIETE D'EXPLOITATION DE PRODUITS POUR LES INDUSTRIES CHIMIQUES SEEPICInventors: Olivier Braun, Paul Mallo
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Publication number: 20120172562Abstract: To obtain a resin for toners, or a toner, which is superior in the quickness in its rise of charging to a sufficient charge quantity in a short time, in the stability of charging that extends from the initial stage up to the printing on a large number of sheets, and in the stability of charging that comes in a high-temperature and high-humidity environment. As a charge control resin, it is characterized by containing a specific unit having sulfonic acid or a sulfonate as a substituent and a specific unit having a salicylic acid derivative.Type: ApplicationFiled: November 17, 2010Publication date: July 5, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Takashi Kenmoku, Hitoshi Itabashi
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Publication number: 20120160774Abstract: A detergent builder composition includes a (co)polymer of acrylic acid. The acrylic acid copolymers may be selected from a copolymer of acrylic acid and 2-acrylamido-2-methyl propane sulfonic acid, and a copolymer of acrylic acid and hydroxyethyl methacrylate. Also disclosed are processes for removing calcium and/or magnesium ions with the detergent builder composition.Type: ApplicationFiled: December 28, 2010Publication date: June 28, 2012Applicant: KEMIRA OYJInventors: Lucas MOORE, Deepak PATIL, Robert WILSON
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Patent number: 8206553Abstract: A method of improving retention and drainage in a papermaking process is disclosed. The method provides for the addition of an associative polymer, prepared by an inverse emulsion polymerization process that utilizes multiple, discrete additions of initiator. Additionally, a process for preparation of an associative polymer, prepared by an inverse emulsion polymerization process that utilizes multiple discrete additions of initiator is disclosed.Type: GrantFiled: December 21, 2005Date of Patent: June 26, 2012Assignee: Hercules IncorporatedInventors: Robert A. Gelman, Erin A. S. Doherty
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Patent number: 8207263Abstract: The invention pertains to the field of membrane protein immobilization onto supports. It relates to a product comprising a support and at least one membrane protein attached to the surface thereof, characterized in that said membrane protein is attached to said support using an amphiphilic molecule with which said membrane protein is complexed. It also relates to a process for preparing such product, as well as to various applications in the fields of diagnosis, drug design and biotechnologies. It further relates to a kit, together with a functionalized amphiphilic molecule, for preparing a product according to the invention comprising a support and an amphiphilic molecule, wherein the amphiphilic molecule and the support interact through a hydrophobic bond, an ionic bond, a specific bond or a covalent bond.Type: GrantFiled: November 13, 2007Date of Patent: June 26, 2012Assignees: Centre National de la Recherche Scientifique (CNRS), Universite Paris 7—Denis DiderotInventors: Jean-Luc Popot, Delphine Charvolin, Fabrice Giusti
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Publication number: 20120157634Abstract: Particulate superabsorbents based on at least one monoethylenically unsaturated monomer comprising at least one acid group, in which at least 5 mol % of the acid groups have been neutralized with at least one tertiary alkanolamine, are particularly suitable superabsorbent components of thermoplastic mixtures which are shaped by known shaping processes for thermoplastics to give shaped bodies comprising superabsorbents.Type: ApplicationFiled: August 11, 2010Publication date: June 21, 2012Applicant: BASF SEInventor: Francisco Javier Lopez Villanueva
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Publication number: 20120149859Abstract: Provided are a latex for dip molding, a composition for dip molding, a preparation method of a dip molded product, and a dip molded product prepared thereby. The latex for dip molding includes a conjugated diene monomer, an ethylenically unsaturated nitrile monomer, and an ethylenically unsaturated acid monomer, wherein the latex further includes sodium methallyl sulfonate as a copolymerizable ionic monomer. A dip molded product having excellent tensile strength, elongation, and touch may be obtained from a composition using the latex according to the present invention, and the generation of limitations, such as non-uniformity of physical properties and difficulties in product management, may be prevented.Type: ApplicationFiled: June 11, 2010Publication date: June 14, 2012Applicant: LG CHEM, LTDInventors: Seung Hun Yang, Ho Yeul Choi, Jung Su Han, Byoung Yun Kim, Jung Eun Kim
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Patent number: 8187581Abstract: The invention provides surfactant-containing cosmetic, dermatological, and pharmaceutical agents comprising at least one water-soluble or water-swellable copolymer obtainable by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) if desired, one or more further olefinically unsaturated, noncationic comonomers, C) if desired, one or more olefinically unsaturated, cationic comonomers, D) if desired, a silicon-containing component(s), E) if desired, a fluorine-containing component(s), F) if desired, one or more macromonomers, G) the copolymerization taking place if desired in the presence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least one component selected from one of the groups D) to G).Type: GrantFiled: December 21, 2007Date of Patent: May 29, 2012Assignee: Clariant Produkte (Deutschland) GmbHInventors: Matthias Löffler, Roman Morschhäuser, Christoph Kayser
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Publication number: 20120129750Abstract: The invention relates to copolymers which comprise, in copolymerized form, a1) 30 to 90% by weight of at least one monoethylenically unsaturated C3-C8-carboxylic acid or of an anhydride or water-soluble salt thereof, a2) 3 to 60% by weight of at least one monomer comprising sulfo groups, a3) 3 to 60% by weight of at least one nonionic monomer of the formula (I) H2C?C(R1)COO—[R2—O]o—R3 ??(I) ?in which R1 is hydrogen or methyl, R2 are identical or different, linear or branched C2-C6-alkylene radicals which may be arranged in blocks or randomly, and R3 is hydrogen or a straight-chain or branched C1-C4-alkyl radical and o is a natural number from 3 to 50, a4) 0 to 30% by weight of one or more further ethylenically unsaturated monomers which are polymerizable with a1), a2) and a3), where the sum of a1), a2), a3) and a4) adds up to 100% by weight.Type: ApplicationFiled: November 22, 2011Publication date: May 24, 2012Applicants: Henkel AG & Co. KGaA, BASF SEInventors: Jürgen Detering, Bolette Urtel, Heike Weber, Roland Ettl, Torben Gädt, Ewald Heintz, Thorsten Bastigkeit, Thomas Eiting, Dorota Sendor-Müller
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Publication number: 20120125643Abstract: A process for mineral oil production, in which an aqueous formulation comprising at least one water-soluble, hydrophobically associating copolymer is injected through at least one injection borehole into a mineral oil deposit, and crude oil is withdrawn from the deposit through at least one production borehole, wherein the water-soluble, hydrophobically associating copolymer comprises at least acrylamide or derivatives thereof, a monomer having anionic groups and a monomer which can bring about the association of the copolymer, and water-soluble, hydro-phobically associating copolymer which has a low shear degradation and is suitable for execution of the process.Type: ApplicationFiled: November 23, 2011Publication date: May 24, 2012Applicant: BASF SEInventors: Björn LANGLOTZ, Roland Reichenbach-Klinke
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Publication number: 20120129739Abstract: Water-soluble, hydrophobically associating copolymer comprising a monoethylenically unsaturated, water-soluble, surface-active monomer (a), and a monoethylenically unsaturated, hydrophilic monomer (b) different from monomer (a). The copolymer is prepared in the presence of a nonpolymerizable surfactant and has marked thickening properties in aqueous systems.Type: ApplicationFiled: July 30, 2010Publication date: May 24, 2012Inventors: Thomas Pfeuffer, Roland Reichenbach-Klinke, Stefan Friedrich, Marcus Guzmann
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Publication number: 20120130030Abstract: Scale inhibiting particulates formed from a mixture of fly ash and a phosphonic acid curing agent; wherein the fly ash is cured into a solid material by the contact with the phosphonic acid curing agent. The mixture may also contain a multivalent ion and the particulates may be coated with a coating material in an amount from about 0.1% to about 40% coating material by weight of the scale inhibiting particulate to delay the release of the scale inhibitor.Type: ApplicationFiled: February 1, 2012Publication date: May 24, 2012Inventors: Robert M. Kriegel, Gary P. Funkhouser
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Publication number: 20120129749Abstract: The invention relates to copolymers which comprise, in copolymerized form, a1) 30 to 90% by weight of at least one monoethylenically unsaturated C3-C8-carboxylic acid or of an anhydride or salt thereof, a2) 3 to 60% by weight of at least one monomer comprising sulfo groups, a3) 3 to 60% by weight of at least one nonionic monomer of the formula I H2C?C(R1)(CH2)xO[R2—O]0—R3 ??(I) in which R1 is hydrogen or methyl, R2 are identical or different, linear or branched C2-C6-alkylene radicals which may be arranged in blocks or randomly, and R3 is hydrogen or a straight-chain or branched C1-C4-alkyl radical, x is 0, 1 or 2 and o is a natural number from 3 to 50, a4) 0 to 30% by weight of one or more further ethylenically unsaturated monomers which are polymerizable with a1), a2) and a3), where the sum of a1), a2), a3) and a4) adds up to 100% by weight.Type: ApplicationFiled: November 18, 2011Publication date: May 24, 2012Applicants: Henkel AG & Co. KGaA, BASF SEInventors: Jürgen Detering, Bolette Urtel, Heike Weber, Roland Ettl, Torben Gädt, Ewald Heintz, Thorsten Bastigkeit, Thomas Eiting, Dorota Sendor-Müller
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Patent number: 8183320Abstract: The invention is directed to the use of maleic esters selected from compounds of formulae (I), (II) and (III), as copolymerizable emulsifiers in the emulsion polymerization of olefinically unsaturated monomers, in which A is a C3-C40 alkyl group; X, Y and Z independently are hydrogen or methyl; B and D independently are sulfate, phosphate or hydrogen; n and p independently are numbers in the range from 0 to 40; and m is a number in the range from 2 to 40.Type: GrantFiled: June 28, 2010Date of Patent: May 22, 2012Assignee: Cognis IP Management GmbHInventors: Ronald Klagge, Uwe Held, Thomas Mausberg, Katharina Hömberg, Thomas Schliwka
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Publication number: 20120122694Abstract: The invention refers to microcapsules whose capsule wall comprise resin, and which results through reaction of at least one aromatic alcohol or its ether or derivative and at least one aldehyde component, which includes at least two C-atoms per molecule.Type: ApplicationFiled: March 12, 2010Publication date: May 17, 2012Applicant: Follmann & Co. Gesellschaft fur Chemie-Werkstoffe und Verfahrenstechnik mbH & Co. KGInventors: Klaus Last, Daniel Mues
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Patent number: 8178622Abstract: The present invention provides an amphiphilic block copolymer, a method for manufacturing the same, and a fuel cell membrane using the same. According to preferred embodiments, the amphiphilic block copolymer may contain poly(arylene sulfone ether ketone) (PSEK) as a hydrophobic component and poly(sulfonated styrene-co-acrylonitrile) (PSSAN) as a hydrophilic component. According to other preferred embodiments, polymer electrolyte membrane manufactured using the amphiphilic block copolymer has certain advantages in that the hydrogen ion conductivity is not reduced even at a high temperature of more than 100° C. but is rather increased and the thermal and chemical dimensional stability is excellent.Type: GrantFiled: September 20, 2010Date of Patent: May 15, 2012Assignees: Hyundai Motor Company, SNU R&DB FoundationInventors: Won Ho Jo, Tae-Ann Kim, In Chul Hwang, Nak Hyun Kwon
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Publication number: 20120115963Abstract: A process for the preparation of a polymer nanoparticle by a photoinduced emulsion polymerization includes preparing an emulsion comprising at least one surfactant, a dispersed phase and a continuous phase. The dispersed phase comprises at least one polymerizable monomer and the continuous phase comprises water and at least one photoinitiator. The at least one polymerizable monomer is polymerized by exposing the emulsion to an electromagnetic radiation having a wavelength so as to induce a generation of radicals from the at least one photoinitiator.Type: ApplicationFiled: April 16, 2010Publication date: May 10, 2012Applicant: ETH ZUERICHInventors: Hansjoerg Gruetzmacher, Timo Ott
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Patent number: 8173350Abstract: An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.Type: GrantFiled: July 21, 2009Date of Patent: May 8, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Takashi Hiraoka, Ichiki Takemoto
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Publication number: 20120101205Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.Type: ApplicationFiled: December 28, 2011Publication date: April 26, 2012Applicant: JSR CorporationInventors: Takashi CHIBA, Toru KIMURA, Tomohiro UTAKA, Hiroki NAKAGAWA, Hirokazu SAKAKIBARA, Hiroshi DOUGAUCHI
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Publication number: 20120100084Abstract: Water-soluble or water-swellable polymers are described, containing a) 20.0 to 98.99 mole percent of one or more independently recurring structural units of the formula (1) and b) 1.0 to 79.99 mole percent of one or more independently recurring structural units of the formula (2), and c) 0.01 to 8.0 mole percent of one or more independently recurring cross-linking structural units, which are obtained from one or more monomers having at least two olefinic double bonds. The polymers are suitable, for example, as thickeners or yield point formers, in particular in cosmetic, dermatological or pharmaceutical compositions.Type: ApplicationFiled: March 20, 2010Publication date: April 26, 2012Applicant: CLARIANT FINANCE (BVI) LIMITEDInventors: Klug Peter, Dirk Fischer, Thomas Lindner, Matthias Kunze, Wiebke Moeller, Carina Mildner, Sebastiano Lo Vasco
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Publication number: 20120101184Abstract: Presently described are curable compositions comprising a mixture of at least one (e.g. free-radically) polymerizable ionic liquid and at least one other ethylenically unsaturated monomer, oligomer, or polymer. The polymerizable ionic liquid is characterized as having an air to nitrogen curing exotherm ratio of at least 0.70. Also described are articles and methods of making articles from such curable compositions. A monofunctional polymerizable ionic liquid is also described comprising a non-polymerizable substituted imidazolium cationic group and a polymerizable sulfonate anion.Type: ApplicationFiled: August 26, 2010Publication date: April 26, 2012Inventors: Yizhong Wang, Joel D. Oxman, Larry R. Krepski, Peiwang Zhu, Kevin M. Lewandowski, Brian N. Holmes, Richard L. Severance, Joseph D. Rule, Thomas P. Klun
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Patent number: 8158327Abstract: A compound represented by the following formula (1) is provided: wherein R1 represents a hydrogen atom, a trifluoromethyl group, an alkyl group, or an alkoxy group; and A represents a group represented by the following formula (2) or formula (3): wherein R2, R3, R4, R5 and R6 each independently represent a substituted or unsubstituted alkyl group, a substituted or unsubstituted allyl group, a substituted or unsubstituted perfluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted aryl group; and two or more of R2, R3 and R4 may be linked to each other to form a saturated or unsaturated carbon ring or a saturated or unsaturated heterocyclic ring. The chemically amplified resist composition comprising a polymer compound which is produced from the compound of formula 1 according to the present invention provides a chemically amplified resist sensitive to far-ultraviolet radiation, which is represented by KrF excimer laser or ArF excimer laser.Type: GrantFiled: January 15, 2009Date of Patent: April 17, 2012Assignee: Korea Kumho Petrochemical Co., Ltd.Inventors: Hyun-Sang Joo, Joo-Hyeon Park, Jung-Hoon Oh, Dae-Hyeon Shin
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Patent number: 8158699Abstract: Water-soluble sulfo group containing copolymers use as stabilizers, rheology modifiers and water retention agents in aqueous building materials based on hydraulic binders, such as cement, lime, gypsum and anhydrite, and in water-based painting and coating systems are described. Processes of preparing the copolymers and methods of using them are also described.Type: GrantFiled: February 13, 2007Date of Patent: April 17, 2012Assignee: Construction Research & Technology GmbHInventors: Stefan Freidrich, Michael Schinabeck, Andreas Tselebidis, Michael Nachreiner
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Patent number: 8153740Abstract: The present invention relates to an ampholytic copolymer, to polyelectrolyte complexes which comprise such an ampholytic copolymer, and to cosmetic or pharmaceutical compositions which comprise at least one ampholytic copolymer or one polyelectrolyte complex.Type: GrantFiled: December 29, 2003Date of Patent: April 10, 2012Assignee: BASF AktiengesellschaftInventors: Son Nguyen-Kim, Horst Schuch, Thomas Kaiser, Claudia Wood, Peter Hossel
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Patent number: 8153329Abstract: A proton-conducting electrolyte membrane containing a porous inorganic substrate, a porous portion of the porous inorganic substrate being filled with a proton-conducting polymer, wherein the proton-conducting polymer is a co-polymer of: (i) a monomer compound having an ethylenically unsaturated bond and a sulphonic acid group in the molecule; and (ii) a silyl compound represented by Formula (1): (R1O)n—Si—R2m??Formula (1) wherein R1 is an alkyl group of 1 to 4 carbon atoms; R2 is an organic group capable of co-polymerizing; m and n each are an integer of 1 to 3, with the proviso that m plus n equals 4; and R2 may be the same or different when m is 2 or 3.Type: GrantFiled: June 20, 2005Date of Patent: April 10, 2012Assignee: Konica Minolta Holdings, Inc.Inventors: Takayuki Suzuki, Takato Chiba
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Publication number: 20120082939Abstract: An active light ray sensitive or radioactive ray sensitive resin composition which satisfies high sensitivity, high resolution, good pattern configuration, and good line edge roughness at the same time to a great extent, while having sufficiently good outgassing performance during exposure, and an active light ray sensitive or radioactive ray sensitive film formed by using the composition, and a pattern-forming method, are provided. The active light ray sensitive or radioactive ray sensitive resin composition according to the present invention includes a resin (P) containing a repeating unit (A) which decomposes by irradiation with active light ray or radioactive ray to generate an acid, and a repeating unit (C) containing a primary or secondary hydroxyl group.Type: ApplicationFiled: October 4, 2011Publication date: April 5, 2012Applicant: FUJIFILM CorporationInventors: Takeshi KAWABATA, Hidenori Takahashi, Tomotaka Tsuchimura, Shuji Hirano, Hideaki Tsubaki
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Patent number: 8148304Abstract: A copolymer containing, as monomer components, a) at least one sulfonic acid-containing compound, b) at least one nitrogen-containing N-vinylamide, one acrylamide or methacrylamide and c) at least one bifunctional or higher-functional vinyl ether is proposed. These copolymers are suitable in particular as thixotropic agents, antisegregation agents and water retention agents and overall as an additive in cement-containing but also gypsum-based systems. Such copolymers having a molecular weight of >40 000 g/mol can be used in particular as admixtures in the exploration of mineral oil and natural gas deposits.Type: GrantFiled: November 24, 2008Date of Patent: April 3, 2012Assignee: BASF SEInventors: Christian Spindler, Andrea Assmann, Uwe Huber
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Publication number: 20120065291Abstract: A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X+ is an onium cation. X+ in the formula (I) is preferably an onium cation represented by a following formula (1-1), an onium cation represented by a following formula (1-2) or a combination thereof.Type: ApplicationFiled: October 13, 2011Publication date: March 15, 2012Applicant: JSR CorporationInventors: Nobuji Matsumura, Yukio Nishimura, Akimasa Soyano, Ryuichi Serizawa, Noboru Otsuka, Hiroshi Tomioka
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Publication number: 20120065676Abstract: The present disclosure relates to compositions comprising a copolymer that includes a first monomer and a second monomer that is different from the first monomer, wherein both the first and second monomer are selected from the group consisting of 3-sulfopropyl acrylate potassium salt, sodium acrylate, N-(tris(hydroxyl methyl)methyl)acrylamide, and 2-acrylamideo-2-methyl-1-propane sulfonic acid. The present disclosure further relates to methods for preparing the copolymer compositions and shaped articles comprising the copolymers.Type: ApplicationFiled: November 21, 2011Publication date: March 15, 2012Applicant: Tyco Healthcare Group LPInventors: Ahmad R. Hadba, Brian Cuevas, Frank R. Schiretz, Joshua B. Stopek
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Patent number: 8133962Abstract: A heat-curable ink composition and a color filter produced using the ink composition are provided. The ink composition and the color filter are highly resistant to heat and chemicals due to the use of a polyester resin prepared by polycondensation. In addition, unreacted anhydride groups are removed using a monohydric alcohol in the preparation of the ink composition to make the ink composition and the color filter very stable during storage.Type: GrantFiled: August 26, 2008Date of Patent: March 13, 2012Assignee: LG Chem, Ltd.Inventors: Dae Hyun Kim, Han Soo Kim, Mi Ae Kim, Dong Myung Shin, Jae Joon Kim, Jin Woo Cho, Ji Su Kim, Mi Kyoung Kim, Min A. Yu, Min Young Lim, Sung Hyun Kim
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Patent number: 8133411Abstract: The invention relates to fluorescent polymers soluble in an aqueous solution carrying at least 5 fluorophores which are distributed on the polymer and which exhibit the following properties: the fluorophores are water-soluble, the fluorophores are not self-associated in water at a concentration of less than or equal to 10?4 mol/l, preferably at a concentration of less than or equal to 10?3 mol/l, the fluorophores which are free in the aqueous solution have a molar extinction coefficient of greater than 1000 M?1·cm?1, preferably greater than 5000 M?1·cm?1, the fluorophores which are free in the aqueous solution have a quantum yield of greater than 0.3, preferably greater than 0.6, said polymers having a fluorescence amplification factor of greater than or equal to 0.35 per kg/mol of polymer, preferably greater than 0.45 per kg/mol of polymer.Type: GrantFiled: June 30, 2006Date of Patent: March 13, 2012Assignees: Biomerieux S.A., Centre National de la Recherche Scientifique, Instituto Superior TecnicoInventors: Marie-Thérèse Charreyre, Bernard Mandrand, José Manuel Gaspar Martinho, Paula Relogio, José Paulo Sequeira Farinha
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Publication number: 20120058429Abstract: A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). R1 represents a hydrogen atom or a methyl group. Each R2 independently represents one of a linear or branched alkyl group having 1 to 12 carbon atoms, a linear or branched alkoxy group having 1 to 12 carbon atoms, and an alicyclic hydrocarbon group having 3 to 25 carbon atoms. p is an integer from 0 to 3, and q is an integer from 1 to 3, and p+q?5. A chemically-amplified positive-tone resist film that is sensitive to extreme ultraviolet rays (EUV) can be formed using the radiation-sensitive resin composition.Type: ApplicationFiled: September 23, 2011Publication date: March 8, 2012Applicant: JSR CORPORATIONInventors: Kota Nishino, Ken Maruyama, Daisuke Shimizu, Toshiyuki Kai
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Publication number: 20120052444Abstract: A polymerizable composition contains: (A) a polymer compound having (a1) a repeating unit having a structure represented by the following formula (a1-1) in a side chain thereof; and (B) a polymerization initiator, and in the formula (a1-1), R11 and R12 each independently represents a hydrogen atom, an alkyl group, an aryl group, a heterocyclic group, a sulfo group, an alkylsulfonyl group, a arylsulfonyl group, an acyl group, an aryloxycarbonyl group, an alkoxycarbonyl group or a carbamoyl group, R13, R14 and R15 each independently represents a hydrogen atom, an alkyl group or an aryl group, L1 represents a divalent connecting group, Y1 represents a single bond or a divalent connecting group selected from the group consisting of —CO—, —O—, —HN—, a divalent aliphatic group, a divalent aromatic group and a combination of these groups, and * indicates a site connecting to a main chain of the polymer compound.Type: ApplicationFiled: August 30, 2011Publication date: March 1, 2012Inventor: Yu IWAI
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Publication number: 20120041165Abstract: This invention relates to coloured polymer particles preferably with surface functionality for charge retention, a process for their preparation, the use of these particles for the preparation of an electrophoretic device, colour electrophoretic displays comprising such particle, and new water-soluble dyes.Type: ApplicationFiled: January 29, 2010Publication date: February 16, 2012Applicant: MERCK PATENT GESELLSCHAFT MIT BESCHRAENKTER HAFTUNGInventors: Nils Greinert, Louise Diane Farrand, Mark James, Ashley Nathan Smith, Mark John Goulding, Daniel Walker, Safyan Khan, Paul Reynolds, Susan Hawkins, Roy Hughes
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Publication number: 20120040827Abstract: An agrochemical formulation and its method of manufacture comprising an agrochemical active and a dispersant polymer comprising a copolymer of benzylmethacrylate, acrylic acid and 2-acrylamido-2-methyl propane sulfonic acid.Type: ApplicationFiled: April 19, 2010Publication date: February 16, 2012Applicant: AKZO NOBEL CHEMICALS INTERNATIONAL B.V.Inventors: Klin A. Rodrigues, Mark Alexander
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Patent number: 8110336Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.Type: GrantFiled: September 18, 2009Date of Patent: February 7, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando
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Patent number: 8105748Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C2-C20 hydrocarbon group having cyclic structure, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.Type: GrantFiled: October 16, 2009Date of Patent: January 31, 2012Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho, Jun Hatakeyama, Seiichiro Tachibana
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Publication number: 20120006788Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.Type: ApplicationFiled: June 23, 2010Publication date: January 12, 2012Applicant: FUJIFILM CORPORATIONInventors: Toru Fujimori, Koji Shirakawa, Toshihiro USA, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki, Katsuhiro Nishimaki, Shuji Hirano, Hidenori Takahashi
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Patent number: 8092977Abstract: A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.Type: GrantFiled: March 6, 2008Date of Patent: January 10, 2012Assignee: Fujifilm CorporationInventor: Kazuyoshi Mizutani
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Patent number: 8093342Abstract: Provided are a novel polymer having a sulfonic group, a sulfonic acid ester group, or a derivative thereof incorporated therein, a method of producing the polymer, and a novel compound suitable for producing the polymer. A polymer is characterized by containing a unit represented by the following formula (1): wherein R1w and R1x are each independently a halogen atom or a hydrogen atom, R1y is a CH3 group or a hydrogen atom, and any one of R1a, R1b, and R1c is a sulfonate group represented by SO3R1f.Type: GrantFiled: July 23, 2010Date of Patent: January 10, 2012Assignee: Canon Kabushiki KaishaInventors: Masato Minami, Tatsuki Fukui, Takashi Kenmoku, Tetsuya Yano, Takeshi Ikeda, Norikazu Fujimoto, Atsushi Tani
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Patent number: 8084546Abstract: A method for varying the transport properties of a film cast from a polymer having at least two polymer end blocks A and at least one polymer interior block B wherein each A block is a polymer block resistant to sulfonation and each B block is a polymer block susceptible to sulfonation, and wherein said A and B blocks do not contain any significant levels of olefinic unsaturation. The method includes casting the polymer using a solvent mixture having two or more solvents selected from the group consisting of polar solvents and non-polar solvents.Type: GrantFiled: July 1, 2011Date of Patent: December 27, 2011Assignee: Kraton Polymers U.S. LLCInventors: Carl Lesley Willis, Dale Lee Handlin, Jr., Scott Russell Trenor, Brian Douglas Mather
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Publication number: 20110311769Abstract: Disclosed herein is an article comprising a substrate; a polymer disposed upon the substrate; the polymer having a number average molecular weight of about 2,000 to about 5,000 grams per mole; where each polymer is separated from a neighboring polymer by an average distance of 2.5 Angstroms to 5,000 Angstroms. Disclosed herein is a method comprising disposing upon a substrate a polymer; the polymer having a number average molecular weight of 2,000 to about 5,000 grams per mole.Type: ApplicationFiled: June 20, 2011Publication date: December 22, 2011Applicant: UNIVERSITY OF FLORIDA RESEARCH FOUNDATION, INC.Inventors: Jiun-Jeng Chen, Anthony B. Brennan
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Patent number: RE43168Abstract: A polymeric latex prepared by aqueous emulsion polymerization of a monomeric mixture comprising styrene and butadiene in the presence of a seed polymer prepared by aqueous emulsion polymerization of styrene and a salt of 2-acrylamido-2-methylpropanesulfonic acid.Type: GrantFiled: December 13, 2004Date of Patent: February 7, 2012Assignee: OMNOVA Solutions Inc.Inventor: Ira John Westerman