Abstract: A copolymer comprising (i) an olefin unit selected from the group consisting of an ethylene unit and an ?-olefin unit having 3 to 20 carbon atoms, and (ii) a unit of a compound represented by the formula, CH2?CH—(R1)m—SO3X; and a process for producing said copolymer comprising the step of contacting (i) the above-mentioned olefin, and (ii) the above-mentioned compound with a polymerization catalyst, wherein m is a number of 0 or 1, R1 is an aliphatic hydrocarbylene group having 1 to 18 carbon atoms, and X is a mono-valent cationic species.

Abstract: The invention relates to an amphoteric water-soluble polymer dispersion containing polymer particles with particle diameters of 100 ?m or smaller and produced by dispersion-copolymerization of a monomer mixture comprising a methacrylate monomer containing a quaternary ammonium salt group, an acrylate monomer containing a quaternary ammonium salt group, an anionic monomer, and a (meth)acrylamide in respectively ratios specified in an aqueous salt solution in the presence of a polymer dispersant soluble in the aqueous salt solution and the invention also relates to a dewatering agent for organic sludge, a pretreatment agent or yield improver for paper making raw materials, and/or a drainage properties-enhancing agent using the amphoteric water-soluble polymer.

Abstract: A polymer includes repetitive units derived from a monomer compound according to formula (I): wherein R1 is a hydrogen atom, a methyl group or an ethyl group, A, which is identical or different, is a group comprising an ester group of formula -A1-C(O)—O-A2-, or an amide group of formula -A1-C(O)—NR10-A2-, wherein: R10, which is identical or different, is hydrogen or an alkyl, hydroxyalkyl, or aminoalkyl C1-C6 linear or branched group, A1, which is identical or different is a covalent bond or a group of formula —(CH2)p1— wherein p1 is an integer of from 1 to 6, A2, which is identical or different, is a linear or branched hydrocarbon group comprising optionally N, O, or S heteroatoms or heterogroups, optionally substituted, optionally forming or comprising a cycle, R1, R2, R3, R5 and R6, which are identical or different, are hydrogen, alkyl, hydroxyalkyl, or aminoalkyl C1-C6 linear or branched groups, or, if inside the brackets, form a heterocycle with group A2, m is an integer of from 1 to 10, n is an inte

Abstract: The invention relates to cosmetic and dermatological hair treatment compositions comprising at least one copolymer. The copolymer is obtained by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, and B) optionally, one or more further olefinically unsaturated, noncationic comonomers, C) optionally, one or more olefinically unsaturated, cationic comonomers, D) optionally, one or more silicon-containing component(s), E) optionally, one or more fluorine-containing component(s), F) optionally, one or more macromonomers, G) optionally, the copolymerization taking place in the presence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least one component selected from one of the groups D) to G).

Abstract: The invention relates to water-soluble or water-swellable copolymers which contain sulfo groups and which are based on (meth)acrylamide-alkylsulfonic acids and (meth)acrylamide or N-vinyl compounds, and to their use as additives for aqueous construction materials systems or for water-based paint and coating systems. The inventive copolymers also represent water retention agents which are highly effective, even when used in relatively small quantities, and which are highly compatible in construction material and paint systems of this type.

Abstract: Water-soluble copolymers based on olefinic sulfonic acids, olefinic dicarboxylic acids, vinyl amides and vinyl ethers and/or allyl ethers and/or bisacryl derivatives are described as well as processes for their production and the use of these copolymers as water retention agents, thickeners or anti-segregation agents for aqueous building material systems that contain hydraulic binding agents such as cement, lime, gypsum, anhydrite etc. or for clay suspensions preferably based on bentonite.

Abstract: The invention relates to novel polymers or oligomers containing at least sulfonite groups (P-(SO2)nX, X=1?(n=1), 2?(n=2) or 3?(n=3) valent metal cation or H+ or ammonium ion NR4+ wherein R=alkyl, aryl, H), which are obtained by completely or partially reducing polymers or oligomers containing at least SO2Y-groups (Y=F, Cl, Br, I, OR, NR2 (R=alkyl and/or aryl and/or H), N-imidazolyl, N-pyrazolyl) by means of suitable reducing agents in a suspension or in a solution form. The invention also relates to polymers and polymer(blend) membranes which are obtained by further reacting the obtained sulfinated polymers, especially by alkylation of the sulfinate groups with mono- di- or oligo functional electrophiles. The invention further relates to methods for producing the sulfinated polymers and for further reacting the sulfinated polymers with electrophiles by S-alkylation.

Abstract: This invention relates to sulfonated copolymers which are useful in forming polymer electrolyte membranes used in fuel cells.

Abstract: A non crosslinked, covalently crosslinked and/or ionically crosslinked polymer, having repeating units of the general formula (1) —K—R—??(1) In which K is a bond, oxygen, sulphur, the radical R is a divalent radical of an aromatic or heteroaromatic compound.

Abstract: There is provided a polymer having a side chain of general formula (I) in which R may be any suitable alkyl, oxyalkyl, aryl or oxyaryl linking group R is preferably C1-6 alkyl (especially —CH2—), a benzene group or a group —CH2—O-Phe-. Generally, the side chain will be attached to an ethylene moiety forming part of the backbone of the polymer. Preferred polymers include polystyrene. The polymer is useful as a support for solid phase chemical reactions especially combinatorial chemical synthesis.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: Solid and liquid compositions containing particles of highly fluorinated ion-exchange polymer having sulfonate functional groups with an ion exchange ratio of less than about 33. The compositions contain at least about 25% by weight of polymer particles having a particle size of about 2 nm to about 30 nm.

Abstract: The invention relates to solid polyelectrolyte membranes and processes for their production. As solid polyelectrolyte materials, there have been known fluoropolymers which have perfluoroskeletons and side chains bearing sulfonic acid groups and heat-resistant resins which have hydrocarbon skeletons and contain alkylsulfonic acid or alkylphosphoric acid groups introduced thereto. The fluoropolymers are excellent in heat resistance and chemical resistance but have the problem of being expensive, while the heat-resistant resins have the problem of being poor in chemical resistance. Further, solid polyelectrolyte materials having higher electric conductivities have been desired.

Abstract: The present invention is directed to methods for preparing multi-functional emulsion polymers.

Abstract: Compositions for increasing the thermal and pressure stability of well fluids viscosified using viscoelastic surfactants, the compositions including an effective amount of an oligomeric or polymeric compound that has a thermally stable backbone structure and at least one pendent viscoelastic surfactant functional group. Preferred compositions for increasing the stability of well fluids viscosified using monomeric viscoelastic surfactants include an effective amount of an oligomeric or polymeric compound that has a thermally stable backbone structure and a multiplicity of pendent viscoelastic surfactant functional groups attached to said backbone structure through relatively long hydrocarbon chains, 1 to 18 carbons in length.

Abstract: The present invention relates to methods and compositions for treating subterranean formations. More particularly, the present invention relates to polymersomes, viscosifying agents that comprise polymersomes, and associated methods of use. In some embodiments, the present invention discloses methods of treating a section of a subterranean formation that comprises the steps of providing a viscosified treatment fluid that comprises an aqueous-based component, and a viscosifying agent that comprises a polymersome; and treating the section of the subterranean formation. In other embodiments, the present invention discloses methods of viscosifying a treatment fluid, suspending particulates in a treatment fluid, fracturing a subterranean formation, providing sand control in a section of a subterranean formation, and encapsulating treatment fluid additives.

Abstract: The invention provides water-soluble or water-swellable copolymers obtained by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) if desired, one or more other olefinically unsaturated, optionally crosslinking comonomers containing at least one oxygen, nitrogen, sulfur or phosphorus atom and possessing a molecular weight of less than 500 g/mol, the copolymerization C) taking place in the presence of at least one polymeric additive having a number-average molecular weight of from 200 g/mol to 109 g/mol. The water-soluble or water-swellable copolymers of the present invention are useful in paper processing, laundry detergents, textile processing, petroleum extraction and formulating cosmetics.

Abstract: A method for reducing or completely eliminating water influx in an oil or natural gas borehole includes introducing in the borehole an aqueous solution of a copolymer comprising: A) 40–98 wt. % of structural units of formula (I), wherein: R1 is hydrogen or methyl; R2 represents C2–C10 alkylene; and Me+ represents an ammonium metal ion and an alkali metal ion; B) 0.1 to 58 wt. % of structural units of formula (II); C) 0.1 to 10 wt. % of structural units of formula (III), wherein: R3 and R4 independently of each other represent hydrogen, methyl or ethyl, or R3 and R4 represent together a propylene group, which, with inclusion of a radical (A), form a pyrrolidon radical or, with inclusion of a pentamethylene group, forms a caprolactam radical; D) 0.10 to 10 wt % of structural units of formula (IV). The method also includes introducing in the ground or deposit, simultaneously with the copolymer or subsequently, an agent for crosslinking the copolymer.

Abstract: A sulfonate compound having formula (1) is novel wherein R1 to R3 are H, F or C1-20 alkyl or fluoroalkyl, at least one of R1 to R3 contains F.

Abstract: A polymer comprising recurring units of (1a) or (1b) wherein R1 is an acid labile group, adhesive group or fluoroalkyl, R2 is H, F, alkyl or fluoroalkyl, R3 and R4 each are a single bond, alkylene or fluoroalkylene, R5 is H or an acid labile group, “a” is 1 or 2, 0<U11<1 and 0<U12<1 and having a Mw of 1,000–500,000 is used as a base resin to formulate a resist composition which is sensitive to high-energy radiation, maintains high transparency at a wavelength of up to 200 nm, and has improved alkali dissolution contrast and plasma etching resistance.

Abstract: The polymer matrix material includes a polymerization product of one or more monomers selected from the group of water-soluble, ethylenically-unsaturated acids and acid derivatives, and a crosslinking agent. A quantity of water is used for polymerization, such that the polymer material is swelled to a defined volume upon curing. Optionally, a water-soluble or water-swellable polymer and/or a chemical polymerization initiator.

Abstract: The present invention is directed a multifunctional polymer capable of inhibiting both calcium carbonate and calcium phosphate scale. The multifunctional polymer contains at least one monomer unit from each of four groups: dicarboxylic acids, mono-carboxylic acids, nonionic monomers, and sulfonated or sulfated monomers. The polymer also inhibits many other alkaline earth scales, such as calcium sulfate scale and provides stabilization of minerals such as iron, zinc and manganese. The polymer is especially effective in highly stressed systems that contain high electrolyte concentrations and have a high number of cycles of concentration.

Abstract: The present invention provides compositions of treating subterranean zones penetrated by well bores in primary well cementing operations, well completion operations, production stimulation treatments and the like. The invention includes aqueous well treating fluids comprised of water and a water soluble polymer complex fluid loss control additive. Preferred polymer complexes comprise water-soluble polymers made in the presence of hydroxyethylcellulose.

Abstract: The invention provides water-soluble or water-swellable copolymers obtained by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) optionally, one or more other olefinically unsaturated, noncationic, optionally crosslinking comonomers containing at least one oxygen, nitrogen, sulfur or phosphorus atom and possessing a molecular weight of less than 500 g/mol, C) one or more mono- or polyolefinically unsaturated, optionally crosslinking macromonomers each possessing at least one oxygen, nitrogen, sulfur or phosphorus atom and having a number-average molecular weight of greater than or equal to 200 g/mol, and D) one or more olefinically unsaturated, cationic comonomers containing at least one oxygen, nitrogen, sulfur or phosphorus atom and possessing a molecular weight of less than 500 g/mol, the copolymerization E) taking place in the presence or absence of at least one polymeric additive having number-average molecular weights of from 200 g/mol to 109 g/mol.

Abstract: A resist composition comprising a base polymer having sulfone or sulfonate units introduced therein is sensitive to high-energy radiation below 300 nm, is endowed with excellent adherence to substrates while maintaining transparency, and is suited for lithographic microprocessing.

Abstract: Water soluble associative polymers and compositions comprising them together with alkali metal salts of carboxylic acid are disclosed. Methods comprise introducing into a wellbore a fluid comprising such associative polymers and alkali metal salts of carboxylic acid, e.g., cesium formate. Disclosed water soluble associative polymers have functionality including at least sulfonate groups, carboxylate groups and hydrophobes associative with one another in a saturated aqueous solution of an alkali metal salt of a carboxylic acid.

Abstract: The invention relates to compositions comprising copolymers based on acryloyldimethyltaurine and also synergistic additives selected from anionic, cationic, nonionic, and betaine surfactants. The compositions exhibit a pronounced thermoassociative behavior and are outstandingly suitable as thickeners. The copolymers of the present invention are useful in formulating cosmetics, pharmaceuticals, and oil field chemicals.

Abstract: The present invention provides new high resolution nanocomposite resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite negative resists comprising a photoacid generating component, a styrene component, and an optional polyhedral oligosilsequioxane component are provided. Negative resists of this invention may also contain an optional methacrylate component. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: The invention is directed to olefin copolymers composed of nonhydrolyzable monomer units and hydrolyzable monomer units, the latter resulting from copolymerization of monomers containing a linkage that is hydrolytically cleavable in the presence of aqueous base or aqueous acid. Generally, the hydrolyzable monomer units represent a significant fraction of the copolymer, such that upon hydrolysis, a substantial portion of the copolymer is degraded into low molecular weight fragments. Also provided are degradable articles that are at least partially composed of a degradable copolymer in which hydrolyzable monomer units represent at least 20 mole % of the copolymer.

Abstract: Polymers having non-thrombogenic properties can be prepared by copolymerizing monomers of at least three classes selected from (a) monomers having sulphate groups, (b) monomers having sulphonate groups, (c) monomers having sulphamate groups, (d) monomers having polyoxyalkylene ether groups, and (e) monomers having zwitterionic groups. The polymers can additionally be provided with anti-thrombogenic properties by including an additional comonomer having a pendant heparin (or hirudin, warfarin or hyaluronic acid) group. The polymers can be used as coating materials for medical devices, such as tubing or connectors, in order to provide them with non-thrombogenic, and optionally anti-thrombogenic, properties.

Abstract: This invention relates to compounds of formula: wherein A is an unsaturated alkylene moiety; B the residue of a polyol wherein one hydroxyl moiety is esterified with one carboxyl moiety of the phthalic acid moiety; D is the residue of a polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the phthalic acid moiety, and another hydroxyl moiety is esterified with one carboxyl moiety of the unsaturated alkylene moiety; E is the residue of polyol wherein one hydroxyl moiety is esterified with another carboxyl moiety of the unsaturated alkylene moiety; and M is a cation. The compounds can be used alone, or polymerized, or polymerized and combined with other polymers, to form effective stain and soil repellent compositions.

Abstract: The invention relates to cosmetic, dermatological, and pharmaceutical products containing an electrolyte. The products are obtained by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, and B) optionally, one or more further olefinically unsaturated, noncationic comonomers, C) optionally, one or more olefinically unsaturated, cationic comonomers, D) optionally, one or more silicon-containing component(s), E) optionally, one or more fluorine-containing component(s), F) optionally, one or more macromonomers, G) optionally, the copolymerization taking place in the presence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least one component selected from one of the groups D) to G).

Abstract: The present invention provides new high resolution resists applicable to next generation lithographies, methods of making these novel resists, and methods of using these new resists in lithographic processes to effect state-of-the-art lithographies. New nanocomposite resists comprising nanoparticles in a polymer matrix are provided in this invention. New chemically amplified resists that incorporate inorganic moieties as part of the polymer are presented herein, as are new chemically amplified resists that incorporate photoacid generating groups within the polymeric chain. Novel non-chemically amplified yet photosensitive resists, and new organic-inorganic hybrid resists are also provided herein. This invention and the embodiments described herein constitute fundamentally new architectures for high resolution resists.

Abstract: A proton conduction material having high proton conductivity and exhibiting high reactive gas permeability regardless of the percentage of water content is provided. This proton conduction material consists of a polymer material whose molecular structure has a strong acid functional group. This polymer material consists of a polymer of a mixture of a monomer having an end structure expressed by a formula (1) or a vinyl radical and a monomer expressed by a formula (2). A strong acid functional group is included in the structure of both the monomers. It is to be noted herein that R1, R2, R3, R4, R5 and R6 represent a hydrocarbon radical, a fluoro-substituted hydrocarbon radical, or a trimethylsiloxy radical. Because introduction of a structure in which a hydrocarbon radical is bonded to silicon weakens interaction and causes bulkiness, gaps are created among atoms. If the number of the gaps among the atoms increases, the diffusion coefficient of reactive gases increases.

Abstract: This invention provides both a pigment dispersing resin which is a copolymer of: (A) polymerizable unsaturated monomer containing at least one kind of ionic functional group selected from the group consisting of tertiary amino group, quaternary ammonium salt and sulfonic acid group; (B) nonionic polymerizable unsaturated monomer having polyoxyalkylene chain; (C) ultraviolet-absorbing polymerizable unsaturated monomer and/or an ultraviolet-stabilizing polymerizable unsaturated monomer; and (D) other ethylenically unsaturated monomer, and water-based pigment dispersion which comprises said pigment dispersing resin, pigment, aqueous medium and, as circumstances may demand, dispersing agent as well.

Abstract: Initiators for atom transfer radical polymerizations are described. The initiators have an azlactone or ring-opened azlactone moiety to provide telechelic (co)polymers.

Abstract: The present invention relates to organic anti-reflective coating polymers suitable for use in a semiconductor device during a photolithograhy process for forming ultrafine patterns using 193 nm ArF beam radiation, and preparation method therefor. Anti-reflective coating polymers of the present invention contain a monomer having a pendant phenyl group having high absorbency at the 193 nm wavelength. When the polymers of the present invention are used in an anti-reflective coating in a photolithography process for forming ultrafine patterns, the polymers eliminate the standing waves caused by changes in the thickness of the overlying photosensitive film, by the spectroscopic property of lower layers on wafer and by changes in CD due to diffractive and reflective light originating from the lower layers.

Abstract: A crosslinked polymer (A) which comprises, as essential structural units, units derived from (a) one or more vinyl monomers selected from the group consisting of water-soluble vinyl monomers and/or vinyl monomers which become water-soluble upon hydrolysis and units derived from (b) a crosslinking agent and which satisfies the following requirements: (1): (X)?25 g/g, (2): (Y)?15 g/g, and (3): (Y)??0.54 (X)+41. It has exceedingly high water retentivity and exceedingly high absorbing power under load. When applied to an absorbent structure and an absorbent article, the polymer has excellent absorbing performance. In the relationships, (X) is the amount of physiological saline retained through 1-hour absorption and (Y) is the amount of physiological saline absorbed through 1-hour standing under a load of 60 g/cm2.

Abstract: A resist composition comprising a polymer containing vinyl sulfonate units having fluorinated hydrophilic groups as a base resin has excellent transparency, substrate adhesion and developer penetrability as well as plasma etching resistance, and is suited for lithographic microprocessing.

Abstract: An anti-bonding agent for blast furnace slag or its grading adjusted slag which includes one or more polymers having a main constituent unit shown by by a greater molar percentage than any other constituent unit where M is hydrogen atom, alkali metal such as sodium, alkali earth metal, ammonium or organic amine is used in an amount of 0.002-0.3 weight parts for 100 weight parts of such blast furnace slag or its grading adjusted slag, and may be applied as an aqueous solution with concentration of 1.5-10 weight %.

Abstract: A pressure-sensitive adhesive polymer comprising a reaction product of a C1 to C20 alkyl (meth)acrylate, an ethylenically unsaturated carboxylic acid, a C2 to C8 hydroxyalkyl (meth)acrylate, a vinyl aromatic, optionally a ethylenically unsaturated monomer containing sulfonic acid, and optionally a vinyl ester of a carboxylic acid. The pressure-sensitive adhesive polymer can provide adhesion and cohesion in a temperature range from ?30° C. to 50° C. for the All-temperature pressure-sensitive adhesive market.

Abstract: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

Abstract: An ion exchange polymer dispersion having an ion exchange polymer having sulfonic acid groups and a fibrilliform fluorocarbon polymer dispersed in a dispersion medium.

Abstract: The invention provides water-soluble or water-swellable copolymers obtained by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) optionally, one or more other olefinically unsaturated, nopcationic comonomers, C) optionally, one or more olefinically unsaturated, cationic comonomers, D) optionally, (a) silicon-containing component(s), E) optionally, (a) fluorine-containing component(s), F) optionally, one or more macromonomers, G) the copolymerization taking place in the presence or absence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least components selected from at least two of the groups C) to F). The water-soluble or water-swellable copolymers of the present invention are useful in formulating cosmetics.

Abstract: An absorbent binder composition is provided which is capable of crosslinking after application to a substrate, in the absence of radiation, at a temperature of about 120° C. or less. The absorbent binder composition includes about 15 to about 99.8% by mass monoethylenically unsaturated polymer units, about 0.1 to about 20% by mass polyacrylate ester units having an alkoxysilane functionality, and about 0.1 to about 75% by mass of polymer units selected from polyolefin glycols and polyolefin oxides. The absorbent binder composition can be prepared using a template polymerization process, with the preformed polyolefin glycol or polyolefin oxide serving as a template polymer.

Abstract: The invention relates to compounds of formula (I), prepared by quaternising a compound (II) by means of at least one compound R3—X?: R1=H or —CH3; R2=—CH3; —C2H5; —C3H7 or —C4H9; and compound (I) is optionally quaternised on one of the nitrogens, which is symbolised by the fact that the R3, X?and ? associated with this nitrogen are shown between brackets; if compound (I) is quaternised on a single nitrogen, R3 and X? have the following meanings: (1) R3=—CH3 or —CH2C6H5; and X?=Cl? or CH3OSO3?; or (2) R3=a C1-C12-alkyl group; and X?=Br? or I?; if compound (I) is quaternised on both nitrogens, the two X? may be the same or different and the two R3 may be the same, in which case: (3) R3=a C5-C12 alkyl group; and X?=CH3OSO3?, Br? or I?; or different, in which case: (4) one of the R3=—CH3 or —CH2C6H5; and X?=Cl? or CH3OSO3?; and the other=a C5-C12-alkyl group; and X?=Br? or I?.

Abstract: A resist composition comprising a base polymer having a fluorinated sulfonate or fluorinated sulfone introduced therein is sensitive to high-energy radiation below 300 nm, has excellent transparency, contrast and adherence, and is suited for lithographic microprocessing.

Abstract: This invention provides a pigment dispersing resin which is a copolymer of: (A) sulfonic group-containing polymerizable unsaturated monomer, (B) polyoxyalkylene chain-containing nonionic polymerizable unsaturated monomer, (C) (C-1) (meth)acrylic acid ester type polymerizable monomer having two tertiary alkyl groups per molecule and/or (C-2) (meth)acrylic acid ester type polymerizable monomer having one tertiary alkyl group and one secondary hydroxyl group per molecule, and (D) other ethylenically unsaturated monomer; and also provides water-based pigment dispersion which comprises said pigment dispersing resin, pigment, aqueous medium and, as circumstances may demand, basic neutralizer and/or dispersing agent as well.

Abstract: Polymers may be made from zwitterionic monomers having controlled architectures and molecular weights, using living polymerisations such as group or atom transfer radical polymerisation. For instance polymers may be formed by atom transfer radical polymerisation using a copper chloride catalyst, a ligand which is water soluble, and a water soluble tertiary alkyl halide initiator to form homopolymers having controlled polydispersities of less than 1.5 and block copolymers with other hydrophilic or hydrophobic monomers. One suitable zwitterionic monomer is 2-methacryloyloxy-2?-trimethylammoniumethyl phosphate inner salt. The block copolymers may spontaneously form micelles, believed to have zwitterionic, for instance phosphorylcholine, groups at the external surface, which may be useful as drug delivery systems with improved biocompatibility.

Abstract: The polymer matrix material includes a polymerization product of one or more monomers selected from the group of water-soluble, ethylenically-unsaturated acids and acid derivatives, and a crosslinking agent. A quantity of water is used for polymerization, such that the polymer material is swelled to a defined volume upon curing. Optionally, a water-soluble or water-swellable polymer and/or a chemical polymerization initiator.