From Sulfur Monomer Containing Nitrogen Atom Patents (Class 526/288)
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Patent number: 10941234Abstract: Controlled radical initiators that are ketone-containing dithiocarbamate or ketone-containing dithiocarbonate compounds are used to form polymeric materials that have a single polymeric block or multiple polymeric blocks. Reaction mixtures containing controlled radical initiators and various ethylenically unsaturated monomers, polymeric materials formed from the reaction mixtures, crosslinkable compositions containing the polymeric materials, crosslinked compositions formed from the crosslinkable compositions, and articles containing the polymeric materials, the crosslinkable compositions, or the crosslinked compositions are provided.Type: GrantFiled: February 13, 2019Date of Patent: March 9, 2021Assignee: 3M Innovative Properties CompanyInventors: Kevin M. Lewandowski, Stephen B. Roscoe, Babu N. Gaddam, Bryan T. Whiting, John L. Battiste, George W. Griesgraber
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Patent number: 10369577Abstract: Compositions including blends of one or more acrylamide/allyl thiourea polymer as a first depressant, and one or more carboxyalkyl dithiocarbamate compound as a second depressant, and their use as depressants in the beneficiation of sulfide minerals from ores and/or concentrates are disclosed herein, along with methods for selectively separating value sulfide minerals from non-value sulfide minerals in a froth flotation process for the recovery of such value minerals.Type: GrantFiled: October 6, 2017Date of Patent: August 6, 2019Assignee: Cytec Industries Inc.Inventors: Mikael Brasse, Esau Arinaitwe, Devarayasamudram Ramachandran Nagaraj
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Patent number: 9970075Abstract: A sulfonamide based rare earth element ion separation media and method of synthesis and use are provided. A bed or column of sulfonamide resin for separations can be prepared by exposing a sulfonate resin to chlorosulfonic acid to form a sulfonyl chloride resin; exposing the sulfonyl chloride resin to aqueous ammonia to form a sulfonamide resin; and then packing the sulfonamide resin into a separation column. Mixtures of lanthanide and other rare earth ions with very similar atomic radii and characteristics can be separated by flowing a mixture of lanthanide ions through a bed of sulfonamide resin followed by a mobile phase of an organic acid such as lactic acid to elute the separated rare earth element ions separated by the sulfonamide resin. Collected fractions of eluate can also be recycled through the sulfonamide media.Type: GrantFiled: August 24, 2015Date of Patent: May 15, 2018Assignee: THE REGENTS OF THE UNIVERSITY OF CALIFORNIAInventors: Matthew B. Francis, Troy Moore
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Patent number: 9339554Abstract: The present invention relates to a particular class of biodegradable linkers, ensuring transiently stable conjugation of building blocks and/or bioactive compounds into drug delivery systems (DDS), such as DDS based on polymeric micelles or hydrogels. In addition, the present invention relates to compounds, comprising said linkers, such compounds preferably being prodrugs. Further, the invention is directed to the use of said linkers, and especially said biodegradable linkers, in a drug delivery system. Moreover, the invention relates to controlled release system comprising a polymer matrix, capable of releasing an active ingredient, wherein the active ingredient is covalently linked to the polymer molecules of the polymer matrix through said linkers, as well as to a method of synthesizing these linkers and preparing such controlled release systems.Type: GrantFiled: July 14, 2011Date of Patent: May 17, 2016Assignee: CRISTAL DELIVERY B.V.Inventors: Cristianne Johanna Ferdinand Rijcken, Wilhelmus Everhardus Hennink, Cornelis Franciscus van Nostrum, Isil Altintas, Steffen van der Wal, Robertus Matthias Joseph Liskamp, Johannes Anna Wilhelmus Kruijtzer
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Patent number: 9109068Abstract: Hybrid copolymer compositions include a hybrid copolymer including at least one ethylenically unsaturated monomer and a naturally derived hydroxyl containing chain transfer agent as an end group; and a hybrid synthetic copolymer including one or more synthetic polymers derived from the at least one ethylenically unsaturated monomer with at least one initiator fragment as an end group. The hybrid copolymer composition may be prepared as a scale inhibiting composition. Methods of preparing a hybrid copolymer are also included.Type: GrantFiled: July 30, 2010Date of Patent: August 18, 2015Assignee: AKZO NOBEL N.V.Inventors: Klin A. Rodrigues, Matthew M. Vanderhoof, Allen M. Carrier, Jannifer Sanders
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Patent number: 9096503Abstract: Novel benzoxazine-thiol adducts are described, which may be may be cured to produce compositions useful in coating, sealants, adhesive and many other applications.Type: GrantFiled: February 11, 2013Date of Patent: August 4, 2015Assignee: 3M Innovative Properties CompanyInventors: Ilya Gorodisher, Robert J. Webb, Robert J. DeVoe
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Patent number: 9023581Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).Type: GrantFiled: June 14, 2011Date of Patent: May 5, 2015Assignee: Tokyo Ohka Kogyo Co., LtdInventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
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Patent number: 9000111Abstract: An optical part comprising a thermoplastic resin having a recurring unit represented by the following formula (1): wherein R represents a hydrogen atom, an alkyl group, or an aryl group; G represents a divalent linking group; A represents an oxygen atom, a sulfur atom, or —N(R1)—; R1 represents a hydrogen atom, an alkyl group, or an aryl group; Q represents an atomic group of forming a hetero ring; and l indicates 0 or 1.Type: GrantFiled: August 28, 2009Date of Patent: April 7, 2015Assignee: FUJIFILM CorporationInventors: Ryo Suzuki, Rie Okutsu, Hiroaki Mochizuki, Tatsuhiko Obayashi
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Patent number: 8993701Abstract: The invention relates to a copolymer of (a) 5 to 40% by weight of isoprenol, (b) 5 to 93% by weight of at least one monoethylenically unsaturated C3 to C8 monocarboxylic acid, an anhydride or salt of same, (c) 2 to 90% by weight of one or more sulfonic acid group-comprising monomers.Type: GrantFiled: July 10, 2012Date of Patent: March 31, 2015Assignee: BASF SEInventors: Torben Gädt, Jürgen Detering, Stephan Nied
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Patent number: 8978554Abstract: An alkali soluble resin is disclosed comprising a first monomeric unit including at least one sulfonamide group and a second monomeric unit derived from the monomer according to the following structure (I) wherein R1 represents a structural moiety comprising an ethylenically unsaturated polymerizable group; R2, R3 and R4 independently represent hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, alkaryl, aralkyl, aryl or heteroaryl group or, the necessary atoms to form a five to eight membered ring.Type: GrantFiled: January 12, 2010Date of Patent: March 17, 2015Assignee: Agfa Graphics N.V.Inventors: Johan Loccufier, Philippe Moriamé, Stefaan Lingier
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Patent number: 8946367Abstract: Carbamate and thiocarbamate compounds are described that comprise a polymerizable moiety and one or more free hydroxyl and/or thiol groups. Polymers may be obtained by polymerizing these carbamate and/or thiocarbamate compounds. The carbamate and thiocarbamate compounds, as well as the polymers they produce may be formulated into adhesive, agricultural, biocide, cleaning, coating, encapsulation, membrane, oilfield, performance chemical, and personal care compositions.Type: GrantFiled: June 22, 2011Date of Patent: February 3, 2015Assignee: ISP Investments Inc.Inventor: Osama M. Musa
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Patent number: 8912273Abstract: Process for the preparation of an aqueous polymer dispersion using RAFT compounds.Type: GrantFiled: June 3, 2009Date of Patent: December 16, 2014Assignee: BASF SEInventors: Rajan Venkatesh, Vijay Immanuel Raman
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Publication number: 20140350169Abstract: The present invention provides a vinyl alcohol polymer having a mercapto group and having excellent reactivity.Type: ApplicationFiled: December 25, 2012Publication date: November 27, 2014Applicant: KURARAY CO., LTD.Inventors: Takuma Kaneshima, Yusuke Amano, Keisuke Morikawa, Naoki Fujiwara, Kensuke Nagashima, Katsuji Ujita
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Publication number: 20140329267Abstract: It is provided a self-healing polymer network comprising transition metal thiolates, particularly thiolates of a transition metal that is able to self-assemble by metallophilic attractions, and more particularly Au(1), Ag(1), Cu(1) thiolates, or a mixture thereof, and, optionally, disulfide bonds, thiol and other thiolate groups. It is also provided several processes for the preparation of the self-healing polymer networks of the invention, as well as uses thereof.Type: ApplicationFiled: November 27, 2012Publication date: November 6, 2014Inventors: Ibón Odriozola, Pablo Casuso, Natividad Díaz, Iraida Loinaz, Germán Cabañero, Hans-jürgen Grande
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Publication number: 20140322550Abstract: Presently described are curable compositions comprising a mixture of at least one (e.g. free-radically) polymerizable ionic liquid and at least one other ethylenically unsaturated monomer, oligomer, or polymer. The polymerizable ionic liquid is characterized as having an air to nitrogen curing exotherm ratio of at least 0.70. Also described are articles and methods of making articles from such curable compositions. A monofunctional polymerizable ionic liquid is also described comprising a non-polymerizable substituted imidazolium cationic group and a polymerizable sulfonate anion.Type: ApplicationFiled: July 15, 2014Publication date: October 30, 2014Inventors: YIZHONG WANG, JOEL D. OXMAN, LARRY R. KREPSKI, PEIWANG ZHU, KEVIN M. LEWANDOWSKI, BRIAN M. HOLMES, RICHARD L. SEVERANCE, JOSEPH D. RULE, THOMAS P. KLUN
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Patent number: 8871884Abstract: The inventions disclosed, described, and/or claimed herein relate to copolymers comprising copolymers comprising electron accepting A subunits that comprise thiazolothiazole, benzobisthiazole, or benzobisoxazoles rings, and electron donating subunits that comprise certain heterocyclic groups. The copolymers are useful for manufacturing organic electronic devices, including transistors and solar cells. The invention also relates to certain synthetic precursors of the copolymers. Methods for making the copolymers and the derivative electronic devices are also described.Type: GrantFiled: October 26, 2010Date of Patent: October 28, 2014Assignee: University of WashingtonInventors: Samson A. Jenekhe, Selvam Subramaniyan, Eilaf Ahmed, Hao Xin, Felix Sunjoo Kim
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Publication number: 20140296366Abstract: Graft polymerization is fullfiled on a functionalized substrate. The functionalized substrate is prepared from a disulfide bond-containing feedstock and has been prepared for polymerization through the introduction of one or more polyfunctional monomers containing a disulfide bond breaking material functional group.Type: ApplicationFiled: August 31, 2012Publication date: October 2, 2014Applicant: ASPEN RESEARCH CORPORATIONInventors: John A. Spevacek, Roger Pearson, Kenneth W. Richards, Kenneth D. Zigrino
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Publication number: 20140275461Abstract: Sulfone-containing polythioethers, compositions containing sulfone-containing polythioethers, methods of synthesizing sulfone-containing polythioethers and the use of sulfone-containing polythioethers in aerospace sealant applications are disclosed. The sulfone-containing polythioethers have sulfone groups incorporated into the backbone of the polythioether. Cured sealant compositions comprising the sulfone-containing polythioethers exhibit enhanced thermal resistance.Type: ApplicationFiled: March 15, 2013Publication date: September 18, 2014Applicant: PRC-DeSoto International, Inc.Inventors: Chandra Rao, Juexiao Cai, Renhe Lin
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Publication number: 20140221591Abstract: There is provided a copolymer having the general structure below, wherein a, b, and d are molar ratios varying between about 0.01 and about 0.90 and c is a molar ratio varying between about 0.01 and about 0.90; A1 represents monomer units comprising a cyano-containing pendant group in which the cyano is not directly attached to the backbone of the copolymer; A2 represents monomer units comprising two or more hydrogen bonding sites; A3 represents monomer units that increase solubility in organic solvents; and A4 represents monomer units that increase solubility in aqueous alkaline solutions. There is also provided a near-infrared radiation-sensitive coating composition comprising this copolymer as well as a positive-working thermal lithographic printing plate comprising a near-infrared radiation-sensitive coating comprising this copolymer, a method of producing such a printing plate, and finally a method of printing using such a printing plate. Formula (I).Type: ApplicationFiled: September 14, 2010Publication date: August 7, 2014Applicant: MYLAN GROUPInventors: My T. Nguyen, Akha Phan, Viet-Thu Nguyen-Truong, Marc-André Locas
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Patent number: 8778595Abstract: A resist composition containing a base component (A) which generates acid upon exposure, and exhibits changed solubility in a developing solution under the action of acid, wherein the base component (A) contains a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below and a structural unit (a6) that generates acid upon exposure. In the formula, R represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a halogenated alkyl group of 1 to 5 carbon atoms, R1 represents a sulfur atom or an oxygen atom, R2 represents a single bond or a divalent linking group, and Y represents a hydrocarbon group in which a carbon atom or a hydrogen atom may be substituted with a substituent.Type: GrantFiled: November 16, 2012Date of Patent: July 15, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daichi Takaki, Daiju Shiono, Yoshiyuki Utsumi, Jun Iwashita
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Patent number: 8735045Abstract: A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below and a structural unit (a1) derived from an acrylate ester containing an acid dissociable, dissolution inhibiting group.Type: GrantFiled: October 25, 2010Date of Patent: May 27, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Daiju Shiono, Daichi Takaki
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Patent number: 8722825Abstract: A polymer comprises the polymerized product of monomers comprising a nitrogen-containing monomer comprising formula (Ia), formula (Ib), or a combination of formulas (Ia) and (Ib), and an acid-deprotectable monomer having the formula (II): wherein a is 0 or 1, each Ra is independently H, F, C1-10 alkyl, or C1-10 fluoroalkyl, L1 is a straight chain or branched C1-20 alkylene group, or a monocyclic, polycyclic, or fused polycyclic C3-20 cycloalkylene group, each Rb is independently H, C1-10 alkyl, C3-20 cycloalkyl, C3-20 heterocycloalkyl, an aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group, where each Rb is separate or at least one Rb is attached to an adjacent Rb; LN is a nitrogen-containing monocyclic, polycyclic, or fused polycyclic C3-20 heterocycloalkylene group, and X is H, C1-10 alkyl, aliphatic C5-20 oxycarbonyl, or a C1-30 acyl group optionally including a heteroatom substituent group; and each Rc is independently C1-10 alkyl, C3-20 cycloalkyl, oType: GrantFiled: May 29, 2012Date of Patent: May 13, 2014Assignee: Rohm and Haas Electronic Materials LLCInventors: Deyan Wang, Chunyi Wu, Cong Liu, Gerhard Pohlers, Cheng-bai Xu, George G. Barclay
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Patent number: 8685620Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the base component (A) containing a polymeric compound (A1) having a structural unit (a5) represented by general formula (a5-0) shown below (R1 represents a sulfur atom or an oxygen atom; R2 represents a single bond or a divalent linking group; and Y represents an aromatic hydrocarbon group or an aliphatic hydrocarbon group having a polycyclic group, provided that the aromatic hydrocarbon group or the aliphatic hydrocarbon may have a carbon atom or a hydrogen atom thereof substituted with a substituent.Type: GrantFiled: November 6, 2012Date of Patent: April 1, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daichi Takaki, Daiju Shiono, Yoshiyuki Utsumi, Takaaki Kaiho
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Patent number: 8663660Abstract: Polymerized micelles comprising polymerized amphiphilic molecules obtained starting from amphiphilic molecules having one or two lipid chains each comprising one or two polymerizable moieties and linked to a polar head.Type: GrantFiled: April 28, 2009Date of Patent: March 4, 2014Assignees: Les Laboratories Servier, Commissariat a l'Energie AtomiqueInventors: Julien Ogier, Eric Doris, François Lefoulon, Thomas Arnauld
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Publication number: 20140039081Abstract: A process For the production of a thermoplastic polymer including carbon and sulphur in an atomic ration of C:S of at least 4 and at most 36 using thiol-ene addition polymerization, preferably with feedstocks obtained from renewable resources such as fatty acids from vegetable origin. The product is preferably aliphatic, meaning that at most 70% of the protons are present as aromatic hydrogen atoms and, if oxygen atoms are present in ester functions, the atomic ratio of the oxygen atoms present in ester functions relative to the number of sulphur atoms in the polymer is less than 1.0. The polymer may be used to produce a shaped article.Type: ApplicationFiled: April 13, 2012Publication date: February 6, 2014Applicant: UNIVERSITEIT GENTInventors: Otto Van Den Berg, Filip Du Prez, Sam Verbrugghe
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Publication number: 20140023607Abstract: The present disclosure relates to novel ethylenic copolymers comprising from 10% to 80% by weight, of at least one monomer of polyethylene glycol (meth)acrylate type, from 20% to 90% by weight, of at least one anionic monomer, and from 0% to 70% by weight, at least one additional nonionic hydrophilic monomer. The disclosure also relates to a composition, such as cosmetic or pharmaceutical compositions, comprising the copolymers and to a method of using the same.Type: ApplicationFiled: September 27, 2013Publication date: January 23, 2014Applicant: L'OREALInventors: Nathalie Mougin, Gwenaelle Jegou
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Patent number: 8629224Abstract: Polymers are described comprising a) one or more of the recurring structural units of the formula (1) where R1 is hydrogen, methyl or ethyl and A is C1-C8 alkylene, and Q+ is H+, NH4+, Li+, Na+, K+, ½ Ca++, ½ Mg++, ½ Zn++ or ? Al+++, and the neutralization degree of the structural units of formula (1) is 50 to 100 mol-%, and b) one or more of the recurring structural units of the formula (2) where R1 and A are R1 and A from formula (1) and X+ is [HNR5R6R7]+, where R5, R6 and R7 can independently from each other be hydrogen, a linear or branched alkyl group with 1 to 22 carbon atoms, a linear or branched, simple or polyunsaturated alkenylene group with 2 to 22 carbon atoms, a C6-C22-alkylamidopropyl group, a linear monohydroxyalkyl group with 2 to 10 carbon atoms or a linear or branched dihydroxyalkyl group with 3 to 10 carbon atoms, and wherein at least one of the groups R5, R6 and R7 is not hydrogen.Type: GrantFiled: December 16, 2008Date of Patent: January 14, 2014Assignee: Clariant Finance (BVI) LimitedInventors: Matthias Loeffler, Thomas Lindner, Ute Back, Michael Hornung
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Publication number: 20140011129Abstract: A polymerizable monomer is provided which is represented by the following formula (1): wherein R1 represents a hydrogen atom or an alkyl group; A represents —CO— or —SO2—; and the moiety represented by the formula (1) is, at the part shown by an asterisk *, linked to a moiety represented by the following formula (2), at any position of a, b, c or d thereof; wherein the sites among a, b, c and d at which the moiety represented by the formula (2) is not linked to the moiety represented by the formula (1) each has a hydrogen atom or a substituent selected from the group consisting of an alkyl group, an alkoxy group and a sulfonic acid group, or any of which may connect at mutually adjoining positions to form a ring.Type: ApplicationFiled: March 27, 2012Publication date: January 9, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Yasuaki Murai, Kei Inoue, Ryuji Murayama, Kazuyuki Sato, Masashi Hirose
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Publication number: 20140011130Abstract: To provide a polymeric compound having superior charge-providing properties, the polymeric compound contains at least one unit represented by the following general formula (5). In the general formula (5), R1 represents a hydrogen atom or an alkyl group; R2 to R4 each represent a hydrogen atom, an alkyl group, an alkoxy group, a hydroxyl group or a halogen atom, or R3 and R4 may combine each other to form a ring; and A represents a divalent linking group.Type: ApplicationFiled: March 27, 2012Publication date: January 9, 2014Applicant: CANON KABUSHIKI KAISHAInventors: Kei Inoue, Yasuaki Murai, Ryuji Murayama, Kazuyuki Sato, Soichiro Kawakami, Masashi Hirose
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Patent number: 8580482Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.Type: GrantFiled: December 28, 2011Date of Patent: November 12, 2013Assignee: JSR CorporationInventors: Takashi Chiba, Toru Kimura, Tomohiro Utaka, Hiroki Nakagawa, Hirokazu Sakakibara, Hiroshi Dougauchi
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Publication number: 20130288180Abstract: A polymer for use in resist compositions is obtained from a monomer having formula (1) wherein R1 is methyl, ethyl, propyl, vinyl or ethynyl, the circle designates C3-C12 cycloalkyl, a combination wherein R1 is ethyl and the circle is cyclohexyl being excluded, R2 is H or C1-C4 alkyl, and m is 1 to 4.Type: ApplicationFiled: April 3, 2013Publication date: October 31, 2013Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Koji Hasegawa
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Patent number: 8552126Abstract: The present invention relates to an aqueous polymer dispersion whose dispersed addition polymer P comprises, copolymerized in free-radically polymerized form, at least one polar monomer having a water solubility of greater than 50 g/liter (measured at 20° C.), and obtainable by free-radically initiated aqueous emulsion polymerization, the polar monomer being metered to the reaction mixture during the polymerization process at a variable, i.e., nonconstant rate, for example in the sense of a rate gradient. The present invention further relates to processes for preparing these aqueous polymer dispersions, to their use as binders and/or in coatings, and also to coatings comprising the polymer dispersion of the invention.Type: GrantFiled: February 17, 2012Date of Patent: October 8, 2013Assignee: BASF SEInventors: Ekkehard Jahns, Sebastian Roller
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Patent number: 8501382Abstract: There are disclosed sulfonic acid precursor compositions, as are methods of using these compositions in, for example, photolithography. Other embodiments are also disclosed.Type: GrantFiled: February 19, 2010Date of Patent: August 6, 2013Assignee: The Research Foundation of State Univ. of New YorkInventor: Robert L. Brainard
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Patent number: 8501890Abstract: This invention relates to polymerizable ultraviolet light absorbers and yellow colorants and their use in ophthalmic lenses. In particular, this invention relates to polymerizable ultraviolet light absorbing methane compounds and yellow compounds of the methine and anthraquinone classes that block ultraviolet light and/or violet-blue light transmission through ophthalmic lenses.Type: GrantFiled: September 18, 2012Date of Patent: August 6, 2013Assignee: Abbott Medical Optics Inc.Inventors: Jason Clay Pearson, Max Allen Weaver, Jean Carroll Fleischer, Gregory Allan King
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Publication number: 20130190672Abstract: A method for creating a non-adhesive, water-absorbent wound dressing includes creating a mixture of monomers, crosslinker, initiator, and solvent, initiating polymerization of the monomers to begin polymerization of the monomers; quenching the polymerization of the monomers when the mixture has a viscosity suitable for electrospinning; electrospinning the polymer mixture to form a fibrous membrane; and thereafter further polymerizing and crosslinking the fibrous membrane. The monomers are chosen from select species and, following this process, provide wound dressings that are nonadherent to a wound so as to be potentially reusable; superabsorbent; non-biofouling. With the addition of antimicrobial cations, the wound dressings also provide antimicrobial properties.Type: ApplicationFiled: January 25, 2013Publication date: July 25, 2013Applicant: The University of AkronInventor: The University of Akron
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Publication number: 20130178574Abstract: The invention relates to a copolymer of (a) 5 to 40% by weight of isoprenol, (b) 5 to 93% by weight of at least one monoethylenically unsaturated C3 to C8 monocarboxylic acid, an anhydride or salt of same, (c) 2 to 90% by weight of one or more sulfonic acid group-comprising monomers.Type: ApplicationFiled: July 10, 2012Publication date: July 11, 2013Applicant: BASF SEInventors: Torben Gädt, Jürgen DETERING, Stephan NIED
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Publication number: 20130165579Abstract: The present invention is directed to a pneumatic tire having a tread, the tread comprising a rubber composition comprising: a copolymer comprising a polymeric backbone chain derived from a monomer comprising at least one conjugated diene monomer and optionally at least one vinyl aromatic monomer; and polymeric sidechains bonded to the backbone chain, the sidechains comprising a polymer capable of exhibiting a lower critical solution temperature (LCST); optionally, at least one additional diene based elastomer; and a filler selected from the group consisting of carbon black and silica.Type: ApplicationFiled: December 21, 2011Publication date: June 27, 2013Inventors: Ralf Mruk, Frank Schmitz, Robert Fokko Roskamp
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Publication number: 20130150545Abstract: Novel benzoxazine-thiol adducts are described, which may be may be cured to produce compositions useful in coating, sealants, adhesive and many other applications.Type: ApplicationFiled: February 11, 2013Publication date: June 13, 2013Applicant: 3M INNOVATIVE PROPERTIES COMPANYInventor: 3M INNOVATIVE PROPERTIES COMPANY
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Patent number: 8449970Abstract: An antistatic article having an antistatic layer disposed on a substrate is disclosed herein. The antistatic layer is formed from a cationic copolymer, a non-cationic (meth)acrylic polymer, and a crosslinking agent. The cationic copolymer consists essentially of a cationic monomer, a hydrophobic monomer, a crosslinkable monomer, and an optional nitrogen-containing monomer. The substrate may comprise an optical film such as a multilayer optical film. Methods for making the antistatic article and display devices containing the antistatic article are also disclosed.Type: GrantFiled: July 23, 2007Date of Patent: May 28, 2013Assignee: 3M Innovative Properties CompanyInventors: Mark J. Pellerite, Mahfuza B. Ali, Eileen M. Haus, Gregory F. King, James E. Lockridge, Hang K. Loi, Jeffrey A. Peterson
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Patent number: 8344082Abstract: The present invention relates to new molecularly imprinted polymers which are suitable for the selective recognition of glutathione GSH and/or of an analog thereof, and in particular which are of use for the treatment of media comprising in particular a mixture of glutathione GSH, and/or of an analog thereof, with GSH adducts.Type: GrantFiled: October 8, 2008Date of Patent: January 1, 2013Assignee: PolyintellInventors: Celine Perollier, Sami Bayoudh
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Patent number: 8334350Abstract: The present invention relates to an aqueous polymer dispersion whose dispersed addition polymer P comprises, copolymerized in free-radically polymerized form, at least one polar monomer having a water solubility of greater than 50 g/liter (measured at 20° C.), and obtainable by free-radically initiated aqueous emulsion polymerization, the polar monomer being metered to the reaction mixture during the polymerization process at a variable, i.e., nonconstant rate, for example in the sense of a rate gradient. The present invention further relates to processes for preparing these aqueous polymer dispersions, to their use as binders and/or in coatings, and also to coatings comprising the polymer dispersion of the invention.Type: GrantFiled: December 16, 2008Date of Patent: December 18, 2012Assignee: BASF SEInventors: Ekkehard Jahns, Sebastian Roller
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Publication number: 20120295228Abstract: Dental compositions and disulfide monomers are described. The disulfide monomer comprise a disulfide backbone group wherein each of the sulfur atoms are bonded to an ethylenically unsaturated group via a divalent linking group and the linking group comprises at least one heteroatom; and at least one other monomer ethylenically unsaturated monomer.Type: ApplicationFiled: May 18, 2011Publication date: November 22, 2012Inventors: Ahmed S. Abuelyaman, Joel D. Oxman, Yizhong Wang, Christopher N. Bowman, Hee Young Park, Christopher J. Kloxin
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Patent number: 8298748Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A?) including a polymeric compound (A1?) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2?) (wherein X? represents an anion moiety represented by one of general formulas (1) to (5)).Type: GrantFiled: May 17, 2010Date of Patent: October 30, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Yoshitaka Komuro, Takeyoshi Mimura, Daichi Takaki
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Publication number: 20120244093Abstract: The invention relates to a foam formulation comprising a substantially emulsifier-free emulsion of the oil-in-water type, comprising an oil phase and an aqueous phase, the emulsion comprising at least one surface active, ionic polymer with a molecular weight of more than 5000 g/mol, wherein the ionic polymer is a copolymer comprising as monomer units an ionic monomer (M1) and at least one further monomer.Type: ApplicationFiled: December 10, 2010Publication date: September 27, 2012Inventor: Rolf Daniels
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Publication number: 20120146264Abstract: A resin composition for laser engraving is provided that includes a low molecular weight compound containing at least one type of polymerizable group selected from the group consisting of an ethylenically unsaturated group, an epoxy group, an oxetanyl group, a hydrolyzable silyl group, and a silanol group and further containing a sulfonamide group, a low molecular weight compound containing a residue selected from the group consisting of a maleimide group, a succinimide group, and a phthalimide group, or a polymer compound containing a constituent unit derived from a compound containing a maleimide group or a constituent unit containing a sulfonamide group.Type: ApplicationFiled: December 9, 2011Publication date: June 14, 2012Applicant: FUJIFILM CORPORATIONInventor: Takashi KAWASHIMA
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Patent number: 8198388Abstract: One-part self-etching, self-priming dental adhesive composition having a pH of at most 2, which comprises (a) a polymerizable acidic phosphoric acid ester monomer (b) one or more polymerizable acidic monomers (c) a polymerizable N-substituted alkylacrylic or acrylic acid amide monomer; (d) optionally an organic and/or inorganic acid; (e) an organic water soluble solvent and/or water; and (f) polymerization initiator, inhibitor and stabilizer.Type: GrantFiled: December 15, 2004Date of Patent: June 12, 2012Assignee: Dentsply International Inc.Inventors: Joachim E. Klee, Uwe Lehmann, Uwe Walz
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Publication number: 20120135054Abstract: Cationic poly(ester ether amide)s (PEEAs) and compositions comprising PEEAs and biomolecules such as nucleic acids and proteins. Also, a method for intracellular delivery of biomolecules using complexes of the PEEAs and biomolecules. For example, PEEAs can be used as transfection agents for nucleic acids such as DNA and RNA.Type: ApplicationFiled: June 29, 2010Publication date: May 31, 2012Applicant: CORNELL UNIVERSITYInventors: Chih-Chang Chu, Jun Wu, Martha A. Mutschler-Chu
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Patent number: 8187581Abstract: The invention provides surfactant-containing cosmetic, dermatological, and pharmaceutical agents comprising at least one water-soluble or water-swellable copolymer obtainable by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) if desired, one or more further olefinically unsaturated, noncationic comonomers, C) if desired, one or more olefinically unsaturated, cationic comonomers, D) if desired, a silicon-containing component(s), E) if desired, a fluorine-containing component(s), F) if desired, one or more macromonomers, G) the copolymerization taking place if desired in the presence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least one component selected from one of the groups D) to G).Type: GrantFiled: December 21, 2007Date of Patent: May 29, 2012Assignee: Clariant Produkte (Deutschland) GmbHInventors: Matthias Löffler, Roman Morschhäuser, Christoph Kayser
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Patent number: 8182830Abstract: Described herein are hydrogen sulfide (H2S) generating polymers and polymer systems suitable for coating or forming medical devices and methods for making and using the same. More specifically, described are H2S generating polymers comprising at least one thioamide group. The H2S generating polymers can provide controlled site-specific release of H2S once implanted at or within the target surgical site by hydrolysis of the thioamide group in physiological media. The H2S generating polymers can be coated onto a medical device, formed into a medical device or combined with one or more other polymers to form a polymer system. Also described are methods of treating restenosis and inflammation and promoting vasodilation utilizing such medical devices.Type: GrantFiled: January 5, 2010Date of Patent: May 22, 2012Assignee: Medtronic Vascular, Inc.Inventors: Mingfei Chen, Christopher Storment, David Shumaker
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Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same
Patent number: 8178271Abstract: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group or of a derivative of a sulfonic acid.Type: GrantFiled: May 20, 2010Date of Patent: May 15, 2012Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Takashi Kenmoku, Ako Kusakari, Chieko Mihara, Tetsuya Yano, Norikazu Fujimoto