From Sulfur Monomer Containing Nitrogen Atom Patents (Class 526/288)
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Patent number: 8173350Abstract: An oxime compound represented by the formula (I): wherein Y represents an unsubstituted or substituted n-valent C6-C14 aromatic hydrocarbon group, n represents an integer of 1 to 6, R1 represents a C1-C30 aliphatic hydrocarbon group etc., R2 represents a linear or branched chain C1-C20 aliphatic hydrocarbon group etc., W represents —CO—O— etc., Q1 and Q2 each independently represent a fluorine atom etc., Z represents a C1-C20 halogenated aliphatic hydrocarbon group etc, and the resist composition containing the same.Type: GrantFiled: July 21, 2009Date of Patent: May 8, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Takashi Hiraoka, Ichiki Takemoto
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Patent number: 8173756Abstract: Provided are a novel photopolymerizable monomer having at least one unsaturated double bond and epoxide, and a photocurable composition comprising the photopolymerizable monomer and an initiator, which is polymerizable with good efficiency using light and/or heat, provides reduced shrinkage, and has superior mechanical strength including adhesion and transparency.Type: GrantFiled: December 17, 2008Date of Patent: May 8, 2012Assignee: Industry-Academic Cooperation Foundation, Yonsei UniversityInventors: Eunkyoung Kim, Jeonghun Kim, Hyunjin Oh
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Patent number: 8168366Abstract: The present invention relates to a radiation sensitive photoresist composition. The composition comprises a polymer comprising at least two monomers. The first monomer has an acid cleavable tertiary ester group. The second monomer is an acidic monomer. The acid cleavable ester group of the polymer has a surprisingly low activation energy which results in improved resist images in lithographic processes.Type: GrantFiled: October 16, 2008Date of Patent: May 1, 2012Assignee: International Business Machines CorporationInventors: Robert David Allen, Richard Anthony DiPietro, Ratnam Sooriyakumaran, Hoa D Truong
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Publication number: 20120101205Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000.Type: ApplicationFiled: December 28, 2011Publication date: April 26, 2012Applicant: JSR CorporationInventors: Takashi CHIBA, Toru KIMURA, Tomohiro UTAKA, Hiroki NAKAGAWA, Hirokazu SAKAKIBARA, Hiroshi DOUGAUCHI
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Patent number: 8163814Abstract: Azidoaryl-substituted cyclooctene monomers and synthesized and used in the preparation of various copolymers. Among these copolymers are those prepared from ring-opening metathesis polymerization of cyclooctene, polyethylene glycol-substituted cyclooctene, and azidoaryl-substituted cyclooctene. These copolymers are useful in the formation of crosslinked films that reduce fouling of water purification membranes.Type: GrantFiled: February 11, 2011Date of Patent: April 24, 2012Assignees: The University of Massachusetts, Board of Regents, The University of Texas SystemInventors: Todd Shannon Emrick, Kurt Breitenkamp, Ravindra Revanur, Benny D. Freeman, Bryan McCloskey
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Patent number: 8153740Abstract: The present invention relates to an ampholytic copolymer, to polyelectrolyte complexes which comprise such an ampholytic copolymer, and to cosmetic or pharmaceutical compositions which comprise at least one ampholytic copolymer or one polyelectrolyte complex.Type: GrantFiled: December 29, 2003Date of Patent: April 10, 2012Assignee: BASF AktiengesellschaftInventors: Son Nguyen-Kim, Horst Schuch, Thomas Kaiser, Claudia Wood, Peter Hossel
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Patent number: 8153744Abstract: There is provided a novel hyperbranched polymer in which the refractive index is precisely controlled while retaining its hyperbranched structure, and a method for producing the hyperbranched polymer. Further, there is also provided an optically and thermally stable novel hyperbranched polymer in which the desired refractive index is precisely controlled, and a method for producing the hyperbranched polymer. The hyperbranched polymer has, as a branched structure, a repeating unit structure produced from two dithiocarbamate compounds each having a vinyl structure, at the polymerization initiation site having a vinyl structure. A specific example of the hyperbranched polymer can be produced by subjecting to a living radical polymerization N,N-diethyldithiocarbamylmethylstyrene in the presence of N,N-diethyldithiocarbamylethyl methacrylate.Type: GrantFiled: September 4, 2007Date of Patent: April 10, 2012Assignees: Nissan Chemical Industries, Ltd., Tokyo Institute of TechnologyInventors: Hiroki Takemoto, Masaaki Ozawa, Koji Ishizu
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Patent number: 8148304Abstract: A copolymer containing, as monomer components, a) at least one sulfonic acid-containing compound, b) at least one nitrogen-containing N-vinylamide, one acrylamide or methacrylamide and c) at least one bifunctional or higher-functional vinyl ether is proposed. These copolymers are suitable in particular as thixotropic agents, antisegregation agents and water retention agents and overall as an additive in cement-containing but also gypsum-based systems. Such copolymers having a molecular weight of >40 000 g/mol can be used in particular as admixtures in the exploration of mineral oil and natural gas deposits.Type: GrantFiled: November 24, 2008Date of Patent: April 3, 2012Assignee: BASF SEInventors: Christian Spindler, Andrea Assmann, Uwe Huber
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Patent number: 8133960Abstract: Biomedical devices such as contact lenses formed from a polymerization product of a mixture comprising (a) a random copolymer comprising hydrophilic units and hydrophobic units, wherein the random copolymer has at least one thio carbonyl thio fragment of a reversible addition fragmentation chain transfer (“RAFT”) agent are disclosed.Type: GrantFiled: June 16, 2009Date of Patent: March 13, 2012Assignee: Bausch & Lomb IncorporatedInventors: Jeffrey G. Linhardt, Joseph A. McGee, Ivan M. Nunez
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Patent number: 8133411Abstract: The invention relates to fluorescent polymers soluble in an aqueous solution carrying at least 5 fluorophores which are distributed on the polymer and which exhibit the following properties: the fluorophores are water-soluble, the fluorophores are not self-associated in water at a concentration of less than or equal to 10?4 mol/l, preferably at a concentration of less than or equal to 10?3 mol/l, the fluorophores which are free in the aqueous solution have a molar extinction coefficient of greater than 1000 M?1·cm?1, preferably greater than 5000 M?1·cm?1, the fluorophores which are free in the aqueous solution have a quantum yield of greater than 0.3, preferably greater than 0.6, said polymers having a fluorescence amplification factor of greater than or equal to 0.35 per kg/mol of polymer, preferably greater than 0.45 per kg/mol of polymer.Type: GrantFiled: June 30, 2006Date of Patent: March 13, 2012Assignees: Biomerieux S.A., Centre National de la Recherche Scientifique, Instituto Superior TecnicoInventors: Marie-Thérèse Charreyre, Bernard Mandrand, José Manuel Gaspar Martinho, Paula Relogio, José Paulo Sequeira Farinha
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Patent number: 8110336Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.Type: GrantFiled: September 18, 2009Date of Patent: February 7, 2012Assignee: Sumitomo Chemical Company, LimitedInventors: Ichiki Takemoto, Nobuo Ando
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Patent number: 8092977Abstract: A positive resist composition, includes: (A) a resin having a repeating unit represented by formula (A) as defined in the specification, which decomposes under an action of an acid to increase a solubility of the resin (A) in an alkali developer; and a pattern forming method uses the composition.Type: GrantFiled: March 6, 2008Date of Patent: January 10, 2012Assignee: Fujifilm CorporationInventor: Kazuyoshi Mizutani
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Publication number: 20110319580Abstract: The invention provides intermediates of the formula: as well as a method of their preparation by reacting a thiol having at least two hydroxyl groups with a mono-unsaturated organic compound in the presence of a base catalyst. A polymerizable urethane acrylate oligomer or urethane methacrylate oligomer is formed by reacting a polyisocyanate with the intermediate. The polymerizable urethane acrylate oligomer or urethane methacrylate is blended with a polymerization initiator to form a composition which is useful in such applications as adhesives.Type: ApplicationFiled: June 28, 2010Publication date: December 29, 2011Inventors: JAMES H. AERYKSSEN, Ahmet Nebioglu, Richard D. Zopf, Igor V. Khudyakov
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Patent number: 8076432Abstract: Described herein are methods for producing phosphonic compounds and compounds thereof. Stable compositions of unsaturated phosphonic acid monomers are also described. Additionally, the synthesis and use of new polymers produced from phosphonic acid monomers are presented.Type: GrantFiled: September 10, 2008Date of Patent: December 13, 2011Assignee: Unichem Technologies, Inc.Inventor: Atif Dabdoub
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Patent number: 8062630Abstract: The invention provides surfactant-free cosmetic, pharmaceutical, and dermatological compositions comprising at least one copolymer obtainable by free-radical copolymerization of A) acryloyldimethyltaurine and/or acryloyldimethyltaurates, B) if desired, one or more further olefinically unsaturated, noncationic comonomers, C) if desired, one or more olefinically unsaturated, cationic comonomers, D) if desired, one or more silicon-containing components, E) if desired, one or more fluorine-containing components, F) if desired, one or more macromonomers, G) the copolymerization taking place if desired in the presence of at least one polymeric additive, H) with the proviso that component A) is copolymerized with at least one component selected from one of the groups.Type: GrantFiled: November 5, 2007Date of Patent: November 22, 2011Assignee: Clariant Produkte (Deutschland) GmbHInventors: Matthias Löffler, Roman Morschhäuser
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Patent number: 8058374Abstract: Hybrid copolymers for use as anti-sealant and dispersant. The polymers are useful in compositions used in aqueous systems. The polymers include at least one synthetic monomeric constituent that is chain terminated by a naturally occurring hydroxyl containing moiety. A process for preparing these hybrid copolymers is also provided.Type: GrantFiled: November 24, 2009Date of Patent: November 15, 2011Assignee: Akzo Nobel N.V.Inventors: Klin A. Rodrigues, Darin K. Griffith
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Publication number: 20110269870Abstract: The present invention provides a polymerizable adhesive composition comprising: (i) at least one cyanoacrylate monomer; and (ii) at least one polymerizable compound containing (a) one or more polymerizable carbon-carbon double bonds and (b) one or more biodegradable (BDG) chains. Further are provided the copolymerization product of this composition, and uses thereof in biomedical applications.Type: ApplicationFiled: September 6, 2009Publication date: November 3, 2011Inventors: Daniel Cohn, Peter Siman
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Publication number: 20110247516Abstract: An alkali soluble resin is disclosed comprising a first monomeric unit including at least one sulfonamide group and a second monomeric unit derived from the monomer according to the following structure (I) wherein R1 represents a structural moiety comprising an ethylenically unsaturated polymerisable group; R2, R3 and R4 independently represent hydrogen, an optionally substituted alkyl, alkenyl, alkynyl, alkaryl, aralkyl, aryl or heteroaryl group or, the necessary atoms to form a five to eight membered ring.Type: ApplicationFiled: January 12, 2010Publication date: October 13, 2011Applicant: AGFA GRAPHICS NVInventors: Johan Loccufier, Philippe Moriamé, Stefaan Lingier
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Patent number: 8034532Abstract: A topcoat material for application on top of a photoresist material is disclosed. The topcoat material comprises an acid-inert compound. The topcoat material also comprises a polymer or an oligomer or a cage structure which shows negligible intermixing with the imaging layer and is soluble in aqueous base developer. A method of forming a patterned material layer on a substrate and a coated substrate comprising the topcoat material is also disclosed.Type: GrantFiled: April 28, 2006Date of Patent: October 11, 2011Assignee: International Business Machines CorporationInventors: Robert David Allen, Phillip Joe Brock, Carl E. Larson, Ratnam Sooriyakumaran, Linda Karin Sundberg, Hoa D Truong
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Patent number: 8021824Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: GrantFiled: February 6, 2008Date of Patent: September 20, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
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Publication number: 20110207051Abstract: Provided are sulfonamide-containing compositions, topcoat polymers, and additive polymers for use in lithographic processes that have improved static receding water contact angles over those known in the art.Type: ApplicationFiled: February 19, 2010Publication date: August 25, 2011Applicants: INTERNATIONAL BUSINESS MACHINES CORPORATION, CENTRAL GLASS CO., LTDInventors: Daniel Paul Sanders, Masaki Fujiwara, Yoshiharu Terui
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Publication number: 20110165216Abstract: Described herein are hydrogen sulfide (H2S) generating polymers and polymer systems suitable for coating or forming medical devices and methods for making and using the same. More specifically, described are H2S generating polymers comprising at least one thioamide group. The H2S generating polymers can provide controlled site-specific release of H2S once implanted at or within the target surgical site by hydrolysis of the thioamide group in physiological media. The H2S generating polymers can be coated onto a medical device, formed into a medical device or combined with one or more other polymers to form a polymer system. Also described are methods of treating restenosis and inflammation and promoting vasodilation utilizing such medical devices.Type: ApplicationFiled: January 5, 2010Publication date: July 7, 2011Applicant: Medtronic Vascular, Inc.Inventors: Mingfei Chen, Christopher Storment, David Shumaker
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Patent number: 7968650Abstract: The present invention relates to compositions comprising a polymeric substrate comprising at least one volume excluding polymer. In one embodiment, the present invention provides polymeric articles that are capable of acting as osmotic drivers. The articles are capable of maintaining a desired water balance by moving water in or out of a substrate to maintain cation concentration equilibrium between the substrate and its environment.Type: GrantFiled: October 26, 2007Date of Patent: June 28, 2011Assignee: Johnson & Johnson Vision Care, Inc.Inventors: Brian J. Tighe, Muriel Nasso, Beverley Benning, Frank F. Molock, Jr.
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Patent number: 7964686Abstract: Aqueous treatment composition for use as anti-scalant and dispersant. The composition includes a polymer containing low amounts of sulfonate that prove as effective in carbonate and phosphate inhibition as polymers containing much higher amounts of sulfonate.Type: GrantFiled: April 13, 2007Date of Patent: June 21, 2011Assignee: Akzo Nobel N.V.Inventors: Klein A. Rodrigues, Adrian Zuberbuehler, Stuart Holt, Kevin Beairsto
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Publication number: 20110143622Abstract: Disclosed are fluorinated acrylate compounds.Type: ApplicationFiled: December 13, 2010Publication date: June 16, 2011Applicant: E.I. DUPONT DE NEMOURS AND COMPANYInventor: ANILKUMAR RAGHAVANPILLAI
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Patent number: 7935771Abstract: There is provided a polymer including a unit represented by Chemical Formula (1): wherein R represents -A1-SO2R1; R1w and R1x are each independently a halogen atom or a hydrogen atom; R1y is a CH3 group, a halogen atom or a hydrogen atom; A01 is a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; A1 is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure; R1 is OH, a halogen atom, ONa, OK or OR1a; R1a is a substituted or unsubstituted aliphatic hydrocarbon structure, a substituted or unsubstituted aromatic ring structure or a substituted or unsubstituted heterocyclic structure.Type: GrantFiled: November 10, 2006Date of Patent: May 3, 2011Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Akiko Tominaga, Takashi Kenmoku, Masato Minami, Tetsuya Yano, Takeshi Ikeda, Atsushi Tani, Norikazu Fujimoto
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Patent number: 7935773Abstract: The present disclosure relates to compositions comprising a copolymer that includes a first monomer and a second monomer that is different from the first monomer, wherein both the first and second monomer are selected from the group consisting of 3-sulfopropyl acrylate potassium salt, sodium acrylate, N-(tris(hydroxyl methyl)methyl)acrylamide, and 2-acrylamideo-2-methyl-1-propane sulfonic acid. The present disclosure further relates to methods for preparing the copolymer compositions and shaped articles comprising the copolymers.Type: GrantFiled: August 16, 2005Date of Patent: May 3, 2011Assignee: Tyco Healthcare Group LPInventors: Ahmad R. Hadba, Brian Cuevas, Frank R. Schiretz, Joshua B. Stopek
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Patent number: 7932337Abstract: Inverse emulsions useful for the preparation of cosmetic formulations can be prepared wherein the weight ratio between the aqueous phase and the organic phase is from 4:1 and 2:1 and containing from 20 to 70% by weight of an acrylic polymer obtained by inverse emulsion polymerisation of i. from 55 to 75% by weight of an anionic acrylic monomer containing a strongly acidic functional group; ii. from 0.1 to 5% by weight of a cationic acrylic monomer of the formula (I) wherein R1 is hydrogen or methyl; R2, R3, R4 are, one independently of the others, hydrogen or C1-C4 alkyl; Y is NH or O; A is a C1-C6 alkylene; iii. from 25 to 45% by weight of a C3-C5 anionic acrylic monomer containing a carboxylic group.Type: GrantFiled: June 22, 2007Date of Patent: April 26, 2011Assignee: Lamberti SpAInventors: Arianna Benetti, Gianmarco Polotti, Giuseppe Li Bassi
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Patent number: 7897797Abstract: Azidoaryl-substituted cyclooctene monomers and synthesized and used in the preparation of various copolymers. Among these copolymers are those prepared from ring-opening metathesis polymerization of cyclooctene, polyethylene glycol-substituted cyclooctene, and azidoaryl-substituted cyclooctene. These copolymers are useful in the formation of crosslinked films that reduce fouling of water purification membranes.Type: GrantFiled: April 16, 2010Date of Patent: March 1, 2011Assignees: The University of Massachusetts, The University of Texas Board of RegentsInventors: Todd Shannon Emrick, Kurt Breitenkamp
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Publication number: 20110040057Abstract: Initiator polymers having an initiator group and a ligand group are provided. The initiator polymers are capable of specifically binding to a receptor on a surface. Using a macromer system, the initiator polymers are useful for the formation of a polymeric matrix on the surface of a material. In particular, initiator polymers are provided that have specificity to pancreatic ? cells and can be used to encapsulate cells for transplantation and the treatment of diabetes.Type: ApplicationFiled: October 25, 2010Publication date: February 17, 2011Inventors: Stephen J. Chudzik, Dale G. Swan
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Patent number: 7858287Abstract: A photosensitive resin realizes formation of a pattern having a good shape, without introducing poor compatibility between an acid generator and a photoresist primary-component polymer having an acid-dissociable group, and a photosensitive composition containing the photosensitive resin. The photosensitive resin includes a repeating unit represented by formula (1): (wherein R1 represents a C2-C9 linear or branched divalent hydrocarbon group; each of R2 to R5 represents a hydrogen atom or a C1-C3 linear or branched hydrocarbon group; each of R6 and R7 represents an organic group, wherein R6 and R7 may together form a divalent organic group; and X?represents an anion); at least one of a repeating unit represented by formula (2): (wherein R8 represents a C2-C9 linear or branched hydrocarbon group) and a repeating unit represented by formula (3): a repeating unit represented by formula (4): optionally, a repeating unit represented by formula (5).Type: GrantFiled: November 30, 2007Date of Patent: December 28, 2010Assignees: Hyogo Prefecture, Toyo Gosei Co., LtdInventors: Takeo Watanabe, Hiroo Kinoshita, Shinichi Yusa, Tomotaka Yamanaka, Masamichi Hayakawa, Yosuke Osawa, Satoshi Ogi, Yoshitaka Komuro
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Publication number: 20100317817Abstract: Biomedical devices such as contact lenses formed from a polymerization product of a mixture comprising (a) a random copolymer comprising hydrophilic units and hydrophobic units, wherein the random copolymer has at least one thio carbonyl thio fragment of a reversible addition fragmentation chain transfer (“RAFT”) agent are disclosed.Type: ApplicationFiled: June 16, 2009Publication date: December 16, 2010Applicant: Bausch & Lomb IncorporatedInventors: Jeffrey G. Linhardt, Joseph A. McGee, Ivan M. Nunez
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Publication number: 20100315588Abstract: Biomedical devices such as contact lenses formed from a polymerization product of a mixture comprising (a) a hydrophilic polymer comprising one or more hydrophilic units and one or more thio carbonyl thio fragments of a reversible addition fragmentation chain transfer (“RAFT”) agent; and (b) one or more biomedical device-forming monomers are disclosed.Type: ApplicationFiled: June 16, 2009Publication date: December 16, 2010Applicant: Bausch & Lomb IncorporatedInventors: Ivan M. Nunez, Jeffrey G. Linhardt, Joseph A. McGee, Jennifer Hunt, Michele Alton, Devon A. Shipp, Jay F. Kunzler, Daniel M. Ammon, JR.
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Patent number: 7851571Abstract: Hybrid copolymers for use as anti-sealant and dispersant. The polymers are useful in compositions used in aqueous systems. The polymers include at least one synthetic monomeric constituent that is chain terminated by a naturally occurring hydroxyl containing moiety. A process for preparing these hybrid copolymers is also provided.Type: GrantFiled: November 24, 2009Date of Patent: December 14, 2010Assignee: Akzo Nobel N.V.Inventors: Klin A. Rodrigues, Darin K. Griffith
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Publication number: 20100311933Abstract: There is provided a method for producing a hyperbranched polymer. A method for producing a hyperbranched polymer comprising polymerizing a dithiocarbamate compound of Formula (1): wherein R1 is H or CH3; R2 and R3 are individually a C1-5 alkyl group, etc., A1 is Formula (2) and/or Formula (3): wherein A2 is a linear, branched or cyclic C1-30 alkylene group that optionally contains an ether bond or an ester bond and X1, X2, X3 and X4 are each independently H, a C1-20 alkyl group, etc., by heating at 50 to 250° C.Type: ApplicationFiled: September 11, 2008Publication date: December 9, 2010Applicant: NISSAN CHEMICAL INDUSTRIES, LTD.Inventors: Akihiro Tanaka, Satoru Hatayama
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Patent number: 7833690Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.Type: GrantFiled: October 6, 2006Date of Patent: November 16, 2010Assignee: The University of North Carolina at CharlotteInventors: Kenneth E. Gonsalves, Mingxing Wang
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Patent number: 7807766Abstract: Polymers which are suitable for use in cleaning compositions are described. The polymers are comprised of at least three different monomers. The types of monomers and ratios of the monomers in the polymers are further disclosed. Cleaning compositions containing the polymers for treating various surfaces and for use in various applications are also provided.Type: GrantFiled: September 8, 2006Date of Patent: October 5, 2010Assignee: Cognis IP Management GmbHInventors: Thomas Albers, Wolfgang Denuell, Stephen Gross, Dirk Mampe, Florence Mazuel, Hans-Christian Raths, Christoph G Schunicht
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Publication number: 20100249350Abstract: There is provided a hyperbranched polymer having a nitroxyl group. A hyperbranched polymer comprising at least one organic radical structure (nitroxyl group) of Formula (1), Formula (2) or Formula (3): and having a weight average molecular weight measured by gel permeation chromatography in a converted molecular weight as polystyrene of 500 to 5,000,000.Type: ApplicationFiled: October 23, 2008Publication date: September 30, 2010Applicants: Nissan Chemical Industries, Ltd., Kyushu UniversityInventors: Noboru Koga, Satoru Karasawa, Hiroyuki Hayashi, Akihiro Tanaka, Keisuke Odoi
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Publication number: 20100240792Abstract: Disclosed is a novel hyperbranched polymer having a functional group in a molecular chain of a repeating unit. Also disclosed is a method for producing such a hyperbranched polymer. Specifically disclosed is a hyperbranched polymer having a repeating unit derived from a (meth)acrylate compound as a linear structure, while having a repeating unit derived from a dithiocarbamate compound having a vinyl group structure as a branched structure. This hyperbranched polymer can be obtained by holding a dithiocarbamate compound having a vinyl group structure and a (meth)acrylate compound together and subjecting them to a living radical polymerization.Type: ApplicationFiled: June 13, 2007Publication date: September 23, 2010Applicants: Tokyo Institute of Technology, Nissan Chemical Industries, Ltd.Inventors: Koji Ishizu, Masaaki Ozawa, Hiroki Takemoto
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POLYMER HAVING A SULFONIC GROUP OR A SULFONATE GROUP AND AN AMIDE GROUP AND METHOD OF PRODUCING SAME
Publication number: 20100233610Abstract: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group or of a derivative of a sulfonic acid.Type: ApplicationFiled: May 20, 2010Publication date: September 16, 2010Applicant: CANON KABUSHIKI KAISHAInventors: Tatsuki Fukui, Takashi Kenmoku, Ako Kusakari, Chieko Mihara, Tetsuya Yano, Norikazu Fujimoto -
Polymer having a sulfonic group or a sulfonate group and an amide group and method of producing same
Patent number: 7795363Abstract: A polymer is provided in which a sulfonic group or a derivative thereof is introduced. The polymer includes a unit represented by the following chemical formula (1): wherein R represents -A1-SO2R1; A1 is selected from an alkylene group, a heterocyclic ring, an aromatic ring; and —SO2R1 is a sulfonic group or of a derivative of a sulfonic acid.Type: GrantFiled: May 11, 2005Date of Patent: September 14, 2010Assignee: Canon Kabushiki KaishaInventors: Tatsuki Fukui, Takashi Kenmoku, Ako Kusakari, Chieko Mihara, Tetsuya Yano, Norikazu Fujimoto -
Patent number: 7781551Abstract: Biocompatible copolymers are manufactured to include a zwitterionic monomer and an alkoxy acrylate monomer. The alkoxy acrylate monomer can be a 2-methoxyethyl methacrylate (MOEMA) or 2-ethoxyethyl methacrylate (EOEMA). Alternatively, the alkoxy acrylate can be 2-methoxyethyl acrylate (MOEA) or 2-ethoxyethyl acrylate (EOEA). The alkoxy acrylate monomers advantageously give the zwitterionic copolymers greater ductility, strength, and toughness while maintaining a desired amount of hydrophilicity. The improved toughness allows the zwitterionic copolymers to be processed without cross-linking, which improves the elongation properties of the zwitterionic copolymer, and reduces the risk of cracking during use.Type: GrantFiled: November 19, 2007Date of Patent: August 24, 2010Assignee: Abbott LaboratoriesInventors: Stephen Pacetti, Wouter Roorda
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Patent number: 7781142Abstract: A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which comprises at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000, wherein at least one of R1 and R2 is a fluoroalkyl group having 1 to 4 carbon atoms and R3 in the formula (2) represents a fluoroalkyl group having 1 to 20 carbon atoms.Type: GrantFiled: September 28, 2005Date of Patent: August 24, 2010Assignee: JSR CorporationInventors: Takashi Chiba, Toru Kimura, Tomohiro Utaka, Hiroki Nakagawa, Hirokazu Sakakibara, Hiroshi Dougauchi
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Patent number: 7776983Abstract: Described are polymeric surfactants which include a fluorinated moiety and a non-fluorinated moiety where the fluorinated moiety contains two perfluoro-lower-alkyl sulfonamido segments in proximity to each other ; the surfactants provide more efficient and effective lowering of the surface tension of liquids and increase of wetting of a coating on a substrate surface.Type: GrantFiled: December 30, 2004Date of Patent: August 17, 2010Assignee: 3M Innovative Properties CompanyInventors: Michael S. Terrazas, George G. I. Moore, Michael J. Sierakowski, Rudolf J. Dams
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Patent number: 7772300Abstract: A polymeric composition consisting of water-soluble or water-swellable copolymers containing sulfo groups and nonionic polysaccharide derivatives, such as methylcellulose (MC), hydroxyethylcellulose (HEC), hydroxypropylcellulose (HPC), methylhydroxyethylcellulose (MHEC), methylhydroxypropylcellulose (MHPC) and welan gum or diutan gum, and the use thereof as an additive in aqueous construction systems based on hydraulic binders, such as cement, lime, gypsum or anhydrite, is described. The composition can also be used in water-based paint and coating systems. The composition according to the invention exhibits a synergistic improvement of the properties and, when used in relatively small amounts, constitutes highly effective water retention agents in such construction and paint systems, which also achieve outstanding air pore stability and tack.Type: GrantFiled: March 16, 2005Date of Patent: August 10, 2010Assignee: Construction Research & Technology GmbHInventors: Michael Schinabeck, Stefan Friedrich, Uwe Holland, Peter Gâberlein, Manfred Schuhbeck
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Patent number: 7750103Abstract: Azidoaryl-substituted cyclooctene monomers and synthesized and used in the preparation of various copolymers. Among these copolymers are those prepared from ring-opening metathesis polymerization of cyclooctene, polyethylene glycol-substituted cyclooctene, and azidoaryl-substituted cyclooctene. These copolymers are useful in the formation of crosslinked films that reduce fouling of water purification membranes.Type: GrantFiled: September 7, 2007Date of Patent: July 6, 2010Assignees: The University of Massachusetts, Board of Regents, The University of Texas SystemInventors: Todd Shannon Emrick, Kurt Breitenkamp
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Patent number: 7737237Abstract: The present invention concerns a controlled structure copolymer comprising at least two different parts, a first part A, amphoteric or zwitterionic, including anionic or potentially anionic units, and cationic or potentially cationic units, or zwitterionic units, and another part B, non amphoteric or zwitterionic. Said copolymer further exhibits a high potential for adaptation, through variation in its composition, in order to improve or modify the properties of compositions in which it is introduced.Type: GrantFiled: October 31, 2003Date of Patent: June 15, 2010Assignee: Phodia ChimieInventor: Mathias Destarac
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Publication number: 20100144957Abstract: There is provided a curable material capable of manufacturing a cured object by ultraviolet irradiation without using a photopolymerization initiator or additive and a cured object obtained therefrom, and, in particular, provided a film-forming material capable of manufacturing a cured film and the cured film obtained therefrom. The curable material comprises a branched and/or linear photopolymerizable polymer having an N,N-dialkyldithiocarbamate group as a functional group at a molecular end. The film-forming material is composed of the curable material, and the cured object is obtained by photopolymerization of the curable material to effect inter-bonding and the cured film is obtained by photopolymerization of the film-forming material to effect inter-bonding and form a film.Type: ApplicationFiled: March 24, 2008Publication date: June 10, 2010Applicant: Nissan Chemical Industries , Ltd.Inventor: Kei Yasui
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Patent number: 7732548Abstract: Water-soluble copolymers and terpolymers as stabilizers for aqueous building material systems and water-based paint and coating systems are described. Advantages of the copolymers and terpolymers used according to the invention compared to conventional products are firstly the very good stabilizing properties of the building material systems or water-based paint and coating systems produced correspondingly and secondly the fact that the viscosity of the systems is barely increased, so that these have excellent processability.Type: GrantFiled: October 18, 2004Date of Patent: June 8, 2010Assignee: Construction Research & Technology GmbHInventors: Michael Schinabeck, Stefan Friedrich, Irene Gattinger, Andreas Tselibidis, Gerhard Albrecht, Alfred Kern
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Patent number: 7714088Abstract: An activated, substantially water-soluble poly(ethylene glycol) is provided having of a linear or branched poly(ethylene glycol) backbone and at least one terminus linked to the backbone through a hydrolytically stable linkage, wherein the terminus is branched and has proximal reactive groups. The free reactive groups are capable of reacting with active moieties in a biologically active agent such as a protein or peptide thus forming conjugates between the activated (polyethylene glycol) and the biologically active agent.Type: GrantFiled: March 24, 2009Date of Patent: May 11, 2010Assignee: Nektar TherapeuticsInventors: J. Milton Harris, Antoni Kozlowski