From Phenol, Phenol Ether, Or Inorganic Phenolate Monomer Patents (Class 526/313)
  • Patent number: 8450380
    Abstract: The invention pertains to a new method for formulating pharmaceutical active ingredients in such a way as to protect them when ingested orally, and to allow for the controlling of the release of the active ingredient in the intestine. It relies upon the use of thickening acrylic emulsions with a pH greater than 5, containing hydrophobic groups, in order to encapsulate the pharmaceutical active ingredients for the purpose of encouraging their passage through the gastrointestinal barrier, while controlling the release kinetics of said active ingredients.
    Type: Grant
    Filed: January 30, 2008
    Date of Patent: May 28, 2013
    Assignee: Coatex S.A.S.
    Inventors: Olivier Guerret, Jean-Marc Suau
  • Publication number: 20130109779
    Abstract: Polymeric and co-polymeric compositions useful for preparing ophthalmic and ocular devices, such as implantable intraocular lenses (IOL) and contact lenses, and processes of forming the compositions and devices are provided. The disclosed polymeric or co-polymeric composition may include a curcuminoid compound as a UV-blocker, and is derived from a pre-polymerization mixture of monomers which comprises at least 50 weight percents acrylate monomers and exhibiting visible light transparency and ultraviolet light opacity. The disclosed co-polymeric composition may alternatively, or in addition, be derived from a pre-polymerization mixture of defined monomers.
    Type: Application
    Filed: July 5, 2011
    Publication date: May 2, 2013
    Applicant: POLYMER TECHNOLOGIES INTERNATIONAL (EOU)
    Inventors: Sanjay Ram Swaroop Argal, Munavvar Tahir Hussain, Vinod Chintamani Malshe, Abhijit Bhagvat Patil
  • Publication number: 20130109826
    Abstract: Disclosed is a low-environmental load toner for electrostatic image development. The toner for electrostatic image development includes toner particles containing a resin. The resin contains a vinyl polymer having a structural unit represented by the following general formula (1). In the formula, R1 to R5 are each a hydrogen atom, an alkoxy group having 1 to 4 carbon atoms or —OCOR6 (R6 is an alkyl group having 1 to 8 carbon atoms), at least two of R1 to R5 are hydrogen atoms, and at least one thereof is an alkoxy group having 1 to 4 carbon atoms or —OCOR6.
    Type: Application
    Filed: October 23, 2012
    Publication date: May 2, 2013
    Inventors: Mikio KOUYAMA, Ken OHMURA
  • Publication number: 20130084529
    Abstract: A positive resist composition comprising a polymer having carboxyl groups substituted with an acid labile group having formula (1), (2) or (3) exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a reduced acid diffusion rate, and forms a pattern with good profile, minimal edge roughness, and etch resistance. In formula (1), R1, R2, R5, R6, R8, and R9 are alkyl, aryl, or alkenyl, R3, R4, R7, R10, and R11 are hydrogen, alkyl, alkoxy, acyloxy, halogen, cyano, nitro, hydroxyl or trifluoromethyl, M is methylene or ethylene, R is a single bond or linking group.
    Type: Application
    Filed: September 13, 2012
    Publication date: April 4, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Koji Hasegawa
  • Publication number: 20130052567
    Abstract: A resist pattern forming method includes: in the following order, (1) a step of forming a film on a substrate by using a negative resist composition capable of undergoing negative conversion by a crosslinking reaction; (2) a step of exposing the film; and (4) a step of performing development by using an alkali developer after the exposing, wherein the negative resist composition contains (A) a polymer compound having a repeating unit represented by the following formula (I) as defined in the specification, a thickness of the film formed in the step (1) is from 15 to 40 nm, and an alkali component concentration in the alkali developer is from 0.5 to 1.1 mass %.
    Type: Application
    Filed: July 30, 2012
    Publication date: February 28, 2013
    Applicant: FUJIFILM CORPORATION
    Inventor: Toru TSUCHIHASHI
  • Publication number: 20130053526
    Abstract: A polymer includes a repeating unit shown by a following general formula (1). R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group. R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms. Y represents a carbon atom. X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.
    Type: Application
    Filed: October 24, 2012
    Publication date: February 28, 2013
    Applicant: JSR CORPORATION
    Inventor: JSR CORPORATION
  • Patent number: 8372926
    Abstract: Novel fatty acid monomers and methods for their synthesis are provided for use in polymerization reactions. Fatty acid monomers are employed as reactive diluents in the polymerization of vinyl esters and polyesters for one or more purposes selected from improving the fracture resistance, lowering the processing viscosity and reducing the volatile organic compounds present in the polymerization mixture.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: February 12, 2013
    Assignees: Drexel University, The United States of America, as represented by the Secretary of the Army
    Inventors: Guiseppe Raffaello Palmese, John Joseph LaScala, James Matthew Sands
  • Publication number: 20130029254
    Abstract: A chemical amplification resist composition contains: (A) a polymer compound having a phenolic hydroxyl group and a group formed by substituting a substituent for a hydrogen atom of a hydroxyl group in a phenolic hydroxyl group and satisfying the following (a) to (c) at the same time: (a) the polydispersity is 1.2 or less, (b) the weight average molecular weight is from 2,000 to 6,500, and (c) the glass transition temperature (Tg) is 140° C. or more.
    Type: Application
    Filed: June 29, 2012
    Publication date: January 31, 2013
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka TSUCHIMURA, Tadateru YATSUO
  • Publication number: 20120327357
    Abstract: The present invention relates to polymerisable compounds, to processes and intermediates for the preparation thereof, to the use thereof for optical, electro-optical and electronic purposes, in particular in liquid-crystal (LC) media and LC displays having a polymer-stabilised blue phase, and in LC media for LC displays of the PS or PSA type (“polymer sustained” or “polymer sustained alignment”), and to LC media and LC displays comprising these compounds.
    Type: Application
    Filed: February 24, 2011
    Publication date: December 27, 2012
    Applicant: Merck Patent Gesellschaft Mit Beschrankter Haftung
    Inventors: Axel Jansen, Thorsten Kodek, Helmut Haensel, Erdal Durmaz
  • Patent number: 8329845
    Abstract: The present invention provides a divided redox-curing type composition including a first part in which at least an oxidizing agent (b) is dissolved in a first radical monomer including a radical monomer (a) having an acidic group and/or a hydrophilic group; and a second part in which at least an aromatic sulfinate (d) is dispersed in a second radical monomer including a radical monomer (c) having neither an acidic group nor a hydrophilic group. According to the present invention, a redox-curing type composition capable of securing a time necessary for an adhesion operation and exhibiting high bond strength not only at the initial stage of adhesion but also over a long period of time thereafter in application to a wetting material such as a tooth or a bone as well as a tooth crown repairing material such as a metal or porcelain.
    Type: Grant
    Filed: January 16, 2008
    Date of Patent: December 11, 2012
    Assignee: Kuraray Noritake Dental Inc.
    Inventors: Mitsuru Takei, Hidemi Nakayama, Hiroki Shinoda
  • Patent number: 8273830
    Abstract: Provided is a method of deprotecting a protected polymer, the method being capable of, in the deprotection reaction of a polymer comprising a unit structure having a phenolic hydroxyl group protected with an acyl group, deacylating the polymer in a short period of time while maintaining the other structure, and being capable of taking out the deacylated polymer while highly suppressing contamination of the deacylated polymer with a substance other than the polymer taking part in the reaction. More specifically, provided is a method of deprotecting a protected polymer comprising at least a step of dissolving in an organic solvent the protected polymer comprising at least a unit structure having a phenolic hydroxyl group protected with an acyl group and a deprotecting reagent selected from primary or secondary amine compounds each having a ClogP value of 1.
    Type: Grant
    Filed: October 11, 2010
    Date of Patent: September 25, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Keiichi Masunaga, Takeru Watanabe, Daisuke Domon, Satoshi Watanabe
  • Publication number: 20120226009
    Abstract: A photopolymerizable and photocleavable (P&P) resin monomer is derived from a reactive photoresponsible moiety via various linkages to form photopolymerizable monomers and/or oligomers.
    Type: Application
    Filed: May 17, 2012
    Publication date: September 6, 2012
    Inventors: Xiaoming Jin, Paul D. Hammesfahr
  • Patent number: 8247481
    Abstract: A photosensitive insulating resin composition includes a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes a first structural unit shown by a following formula (1) and a second structural unit shown by a following formula (2), wherein R1 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R2 represents an alkyl group having 1 to 4 carbon atoms.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: August 21, 2012
    Assignee: JSR Corporation
    Inventors: Atsushi Ito, Shigehito Asano, Hirofumi Goto, Takayoshi Tanabe
  • Publication number: 20120184700
    Abstract: A polyester resin for a toner obtained by polycondensing a carboxylic acid component and an alcohol component, wherein the polyester resin for a toner is obtained using, as the carboxylic acid component and/or the alcohol component, a specified aromatic compound; a polyester resin for a toner obtained by polycondensing a reaction product obtained by treating a specified aromatic compound with a carboxylic acid having an unsaturated reactive group, a carboxylic acid component, and an alcohol component; a resin binder for a toner, containing the polyester resin for a toner; and a toner for electrophotography, containing the resin binder. The polyester resin for a toner of the present invention is suitably used for a resin binder of a toner used in developing and the like of latent images formed in electrophotography, electrostatic recording method, electrostatic printing method or the like.
    Type: Application
    Filed: October 1, 2010
    Publication date: July 19, 2012
    Applicant: Kao Corporation
    Inventors: Norihiro Fukuri, Takashi Kubo, Yasunori Inagaki, Katsutoshi Aoki
  • Patent number: 8198358
    Abstract: The present invention relates to a process for preparing phenolic polymers utilizing Coprinus cinereus peroxidase. More particularly, the present invention relates to a process for preparing phenolic polymers by polymerizing phenolic monomers with Coprinus cinereus peroxidase instead of using typical peroxidase which essentially requires the use of toxic formalin or peroxidase of plant origin which is very costly and easily deactivated by hydrogen peroxide in the polymerization of phenolic monomers, wherein the polymerization is conducted in the presence of a polar organic solvent under mild reaction conditions of atmospheric temperature and pressure to economically produce desired phenolic polymers having excellent water and chemical resistances with high yield.
    Type: Grant
    Filed: December 6, 2005
    Date of Patent: June 12, 2012
    Assignee: Korea Institute of Chemical Technology
    Inventors: Yong Hwan Kim, Eun Suk An, Jeong Mi Kwon, Hyun Seong Jeong, Seung Yeong Park, Kee Hoon Won, Jae Kwang Song, Bong Keun Song, Jeong Yong Ryu
  • Publication number: 20120136091
    Abstract: Radical polymerization techniques can be used to polymerize monomers that include a class of hydroxyaryl compounds so as to provide polymers that exhibit desirable properties including, but not limited to, reduced hysteresis. Compositions such as vulcanizates in which such polymers can be utilized and products such as tire components that incorporate and/or are manufactured from such compositions also are provided.
    Type: Application
    Filed: July 1, 2010
    Publication date: May 31, 2012
    Inventors: Yuan-Yong Yan, Zengquan Qin, Xiao-Dong Pan
  • Patent number: 8163847
    Abstract: A thermoset composition exhibiting reduced water absorption in the cured state includes an olefinically unsaturated monomer and a capped poly(arylene ether) prepared by the reaction of an uncapped poly(arylene ether) with an anhydride capping agent. The capped poly(arylene ether) is isolated and/or purified by methods that reduce the concentrations of polar impurities that contribute to water absorption by the cured composition.
    Type: Grant
    Filed: December 10, 2009
    Date of Patent: April 24, 2012
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Kenneth Paul Zarnoch, John Robert Campbell, Amy Rene Freshour, Hua Guo, John Austin Rude, Prameela Susarla, Michael Alan Vallance, Gary William Yeager
  • Patent number: 8158748
    Abstract: The invention provides hetero-functional compound compounds useful in a variety of adhesive applications. More particularly, the invention provides compounds bearing at least one electron rich olefinic bond and at least one electron poor olefinic bond, wherein the two olefinic bonds are separated by a C3 to about C500 aliphatic, cycloaliphatic, or aromatic spacer.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: April 17, 2012
    Assignee: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G Mizori
  • Patent number: 8110336
    Abstract: A resin comprising a structural unit represented by the formula (I): wherein Q1 and Q2 represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group in which one or more —CH2— may be replaced by —O— etc., X1 represents —O—CO— etc., and A+ represents an organic counter ion.
    Type: Grant
    Filed: September 18, 2009
    Date of Patent: February 7, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Ichiki Takemoto, Nobuo Ando
  • Patent number: 8097688
    Abstract: The present invention provides an ink composition containing (A) a polymer compound having (a-1) a photoradical generation site and (a-2) at least one segregation site selected from a fluoroalkyl group, a siloxane structure, and a long-chain alkyl group, (B) a radical-polymerizable compound, and (C) a photoradical generator having a structure different from that of (A).
    Type: Grant
    Filed: March 2, 2010
    Date of Patent: January 17, 2012
    Assignee: FUJIFILM Corporation
    Inventors: Kazuhiro Yokoi, Tokihiko Matsumura
  • Publication number: 20120006788
    Abstract: A chemical amplification resist composition that is used for preparation of a mold, and a mold preparation method and a resist film each using the composition are provided.
    Type: Application
    Filed: June 23, 2010
    Publication date: January 12, 2012
    Applicant: FUJIFILM CORPORATION
    Inventors: Toru Fujimori, Koji Shirakawa, Toshihiro USA, Kenji Sugiyama, Takayuki Ito, Hideaki Tsubaki, Katsuhiro Nishimaki, Shuji Hirano, Hidenori Takahashi
  • Patent number: 8092821
    Abstract: According to an aspect of the present invention, implantable or insertable medical devices are provided, which contain at least one polymeric region in contact with a metallic region. The polymeric region contains at least one block copolymer that contains at least one low Tg block and at least one high Tg block. The polymeric region contains at least one polymer that contains at least one adhesion promoting group selected from one or more of halo-silane, alkoxy-silane, epoxy, anhydride, phenoxy, hydroxyl, amino, sulfonate and carboxyl groups, which at least one polymer may correspond to the block copolymer, a supplemental polymer, or both.
    Type: Grant
    Filed: June 1, 2007
    Date of Patent: January 10, 2012
    Assignee: Boston Scientific Scimed, Inc.
    Inventor: Frederick H. Strickler
  • Publication number: 20120003177
    Abstract: Curcumin, a polyphenol extracted from the rhizome turmeric, has been polymerized to produce a polymer material having a backbone of one or more repeating structural units, at least one of which comprises a curcumin monomer residue. These curcumin-containing polymers have a wide range of pharmacological activities, including, among others antitumor, antioxidant, antiinflammatory, antithrombotic and antibacterial activities. Certain species of these polymers have exhibited remarkable antitumor activity. Water-soluble curcumin derivatives and their use as prodrugs and prodrug carriers are also disclosed.
    Type: Application
    Filed: September 17, 2009
    Publication date: January 5, 2012
    Inventors: Youqing Shen, Huadong Tang, Edward Van Kirk, William Murdoch, Maciej Radosz
  • Publication number: 20110306745
    Abstract: Provided herein are vinyl ether end-functionalized polyolefins and methods for producing the same.
    Type: Application
    Filed: June 14, 2010
    Publication date: December 15, 2011
    Inventors: Robson F. Storey, David L. Morgan
  • Publication number: 20110294070
    Abstract: A polymer is obtained from a hydroxyphenyl methacrylate monomer having an acid labile group substituted thereon. A positive resist composition comprising the polymer as a base resin has a very high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good profile and minimal line edge roughness of a pattern after exposure, a retarded acid diffusion rate, and good etching resistance.
    Type: Application
    Filed: June 1, 2011
    Publication date: December 1, 2011
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Jun Hatakeyama, Seiichiro Tachibana, Koji Hasegawa
  • Patent number: 8063161
    Abstract: The present invention is based on the discovery that certain electron poor olefins combined with nucleophiles and a base catalyst are useful as adhesive compositions for the electronic packaging industry. In particular, the adhesive formulations set forth herein are useful as low temperature curing formulations with high adhesion to a variety of substrates. Invention formulations typically cure at about 80° C. and have a potlife of about 24 hours. The formulations cure by the well-known Michael addition reaction.
    Type: Grant
    Filed: April 14, 2008
    Date of Patent: November 22, 2011
    Assignee: Designer Molecules, Inc.
    Inventor: Stephen M. Dershem
  • Publication number: 20110244182
    Abstract: Polymerizable resin compositions and microstructures comprising the reaction product of such polymerizable resin compositions are described. The microstructures comprise the reaction product of a polymerizable resin composition comprising an organic portion having a refractive index of at least 1.56 wherein the polymerizable resin composition comprises a polymerizable ultraviolet absorbing compound.
    Type: Application
    Filed: December 17, 2009
    Publication date: October 6, 2011
    Inventors: Bryan V. Hunt, Eric W. Nelson
  • Publication number: 20110245133
    Abstract: [Purpose] The purpose of the present invention is to produce a polymer composition with an improved dispersibility for lime soap when used as a detergent and to provide a method for production of the same. [Means of Solution] A laundry detergent or cleaning composition which comprises a polymer composition containing a polymer obtained by polymerizing a polyoxyalkylene-based compound and an unsaturated monomer containing an acid group in the presence of a polymerization initiator, which is characterized by that the polyoxyalkylene-based compound includes 1) a group containing a carbon-carbon double bond, 2) a polyalkylene glycol chain, and 3) one of the groups shown in formulas (1)-(5), and the amount of solvent used at the time of the polymerization is 10 parts or less for 100 parts of the polyoxyalkylene-based compound.
    Type: Application
    Filed: September 1, 2009
    Publication date: October 6, 2011
    Inventors: Jeffrey Scott Dupont, Atsuro Yoneda, Daisuke Michitaka, Yuki Taguchi
  • Patent number: 8026326
    Abstract: A composition comprising a polymer backbone and at least one side group, wherein the side group comprises a benzene ring-based chromophore comprising a ketone at the 1-position, a substituted or unsubstituted amino group at the 2-position, and an oxygen atom at the 3-position of the benzene ring. The chromophore is a kynurenine-based compound. Methods of making and using the composition are also provided. The composition can be used in an ophthalmic lens or device for protecting the retina by blocking UV rays and filtering violet rays.
    Type: Grant
    Filed: March 4, 2008
    Date of Patent: September 27, 2011
    Assignee: Benz Research and Development Corp.
    Inventors: Patrick H. Benz, Jose A. Ors
  • Patent number: 7977442
    Abstract: A polymer includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom or a methyl group, R2 represents a substituted or unsubstituted linear or branched monovalent alkyl group having 1 to 20 carbon atoms, an alicyclic group having 3 to 25 carbon atoms, or an aryl group having 6 to 22 carbon atoms, and X represents a substituted or unsubstituted methylene group or a substituted or unsubstituted linear, branched or alicyclic hydrocarbon group having 2 to 25 carbon atoms. The polymer has a polystyrene-reduced weight average molecular weight determined by gel permeation chromatography (GPC) of 3000 to 100,000.
    Type: Grant
    Filed: September 3, 2010
    Date of Patent: July 12, 2011
    Assignee: JSR Corporation
    Inventors: Ken Maruyama, Daisuke Shimizu
  • Publication number: 20110165114
    Abstract: There is provided a non-water soluble drug delivery composition comprising a conjugate and a polymer matrix wherein exposure of the composition to electromagnetic radiation at a suitable pre-determined wavelength and intensity induces release of the active ingredient from the composition. The conjugate is attached to the polymer matrix through non-covalent interactions. There is also provided a drug delivery apparatus formed from the drug delivery composition.
    Type: Application
    Filed: May 28, 2009
    Publication date: July 7, 2011
    Inventors: Colin Peter McCoy, Sean Patrick Gorman, David Simon Jones
  • Publication number: 20110160386
    Abstract: The present invention relates to a process for preparing phenolic polymers utilizing Coprinus cinereus peroxidase. More particularly, the present invention relates to a process for preparing phenolic polymers by polymerizing phenolic monomers with Coprinus cinereus peroxidase instead of using typical peroxidase which essentially requires the use of toxic formalin or peroxidase of plant origin which is very costly and easily deactivated by hydrogen peroxide in the polymerization of phenolic monomers, wherein the polymerization is conducted in the presence of a polar organic solvent under mild reaction conditions of atmospheric temperature and pressure to economically produce desired phenolic polymers having excellent water and chemical resistances with high yield.
    Type: Application
    Filed: December 6, 2005
    Publication date: June 30, 2011
    Applicant: Korea Research Institute of Chemical Technology
    Inventors: Yong Hwan Kim, Eun Suk An, Jeong Mi Kwon, Hyun Seong Jeong, Seung Yeong Park, Kee Hoon Won, Jae Kwang Song, Bong Keun Song, Jeong Yong Ryu
  • Publication number: 20110112241
    Abstract: The invention provides novel flame-retardant polymers and materials, their synthesis and use. More particularly, the flame-retardant polymers are deoxybenzoin-derived polymers.
    Type: Application
    Filed: March 30, 2009
    Publication date: May 12, 2011
    Inventors: Todd Emrick, Bryan E. Coughlin, Thangamani Ranganathan, Michael Beaulieu, Richard Farris, Bon-Cheol Ku
  • Patent number: 7928171
    Abstract: A polymer material useful for manufacturing an intraocular lens (IOL) suitable for insertion through an IOL inserter barrel having an inner diameter of less than 3 mm is provided. Specifically, acrylic-silicone hybrids having a tensile strength of approximately 100 psi to 400 psi and a percent elongation at break of between 50% and 400% are disclosed.
    Type: Grant
    Filed: December 29, 2004
    Date of Patent: April 19, 2011
    Assignee: Abbott Medical Optics Inc.
    Inventors: Harish C. Makker, Michael D. Lowery, Can B. Hu
  • Patent number: 7910282
    Abstract: In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. According to the invention, in a copolymer for semiconductor lithography, which is obtained by copolymerizing a monomer having a hydroxyl group and a monomer having no hydroxyl group, when a copolymer of which composition of a hydroxyl group-containing repeating unit is controlled is used, the object can be achieved.
    Type: Grant
    Filed: April 28, 2005
    Date of Patent: March 22, 2011
    Assignee: Maruzen Petrochemical Co., Ltd.
    Inventors: Takanori Yamagishi, Takayoshi Okada, Satoshi Yamaguchi, Kiyomi Miki
  • Patent number: 7893293
    Abstract: A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc.
    Type: Grant
    Filed: June 20, 2008
    Date of Patent: February 22, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Makoto Akita, Isao Yoshida, Kazuhiko Hashimoto
  • Patent number: 7875688
    Abstract: The invention is based on the discovery that certain polyester compounds bearing are useful as b-stageable and/or liquid adhesives for the microelectronic packaging industry.
    Type: Grant
    Filed: October 15, 2007
    Date of Patent: January 25, 2011
    Assignee: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G. Mizori
  • Patent number: 7868113
    Abstract: The invention is based on the discovery that a certain polyester compounds are useful as b-stageable adhesives for the microelectonic packaging industry. The polyester compounds described herein contain ring-opening or ring-forming polymerizable moieties and therefore exhibit little to no shrinkage upon cure. In addition, there are provided well-defined b-stageable adhesives useful in stacked die assemblies. In particular, there are provided assemblies wherein the b-stageable adhesive encapsulates a portion of the wiring members contained within the bondline gap between the stacked die.
    Type: Grant
    Filed: April 11, 2007
    Date of Patent: January 11, 2011
    Assignee: Designer Molecules, Inc.
    Inventor: Stephen M Dershem
  • Publication number: 20100324245
    Abstract: In order to improve a resist pattern shape in a semiconductor lithography process, which is a factor largely affecting on a processing precision, an integration degree and yield, a copolymer for semiconductor lithography where a composition of a hydroxyl group-containing repeating unit in a low molecular weight region is controlled, and a method of producing the same are provided. According to the invention, in a copolymer for semiconductor lithography, which is obtained by copolymerizing a monomer having a hydroxyl group and a monomer having no hydroxyl group, when a copolymer of which composition of a hydroxyl group-containing repeating unit is controlled is used, the object can be achieved.
    Type: Application
    Filed: August 31, 2010
    Publication date: December 23, 2010
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Takanori YAMAGISHI, Takayoshi Okada, Satoshi Yamaguchi, Kiyomi Miki
  • Publication number: 20100310615
    Abstract: The invention relates to compositions comprising pholyphenol derivatives, characterised in that said polyphenols contain monomers, oligomers or polymers with units having formula (I), said units being characterised by the simultaneous presence of a resorcinol nucleus (nucleus A) and a para-phenol nucleus (nucleus B) which are interconnected by a carbon bond C, said derivatives being over-activated, in respect of the nucleophilic power thereof, by alkylation of at least one phenol function of each constituent monomer unit and stabilised by sterification by mixtures of fatty acids in proportions reflecting those of vegetable oils formed mainly by unsaturated fatty acids of all of the other phenol functions. The invention is suitable for use in cosmetics, dietetics and therapeutics.
    Type: Application
    Filed: November 17, 2008
    Publication date: December 9, 2010
    Inventor: Joseph Vercauteren
  • Publication number: 20100310987
    Abstract: A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R1 represents a hydrogen atom, a methyl group, a fluorine atom, or a trifluoromethyl group, R2 represents a substituted or unsubstituted aryl group having 6 to 22 carbon atoms, Y represents a carbon atom, and X represents an atomic group that forms an alicyclic hydrocarbon group together with Y.
    Type: Application
    Filed: July 12, 2010
    Publication date: December 9, 2010
    Applicant: JSR Corporation
    Inventors: Ken MARUYAMA, Toshiyuki Kai
  • Patent number: 7847013
    Abstract: A thermosetting resin composition for producing a color filter for a CMOS image sensor is provided. The thermosetting resin composition comprises an organic solvent and a self-curing copolymer having structural units represented by Formulae 1, 2, 3 and 4, which are described in the specification.
    Type: Grant
    Filed: May 7, 2008
    Date of Patent: December 7, 2010
    Assignee: Cheil Industries Inc.
    Inventors: O Bum Kwon, Kil Sung Lee, Jae Hyun Kim, Jung Hyun Kim
  • Publication number: 20100286351
    Abstract: To provide a novel ABA-type triblock copolymer of vinyl ether series, comprising polyvinyl ether and an oxystyrene-series unit, and a process of producing the ABA-type copolymer at a series of steps. The invention relates to a novel ABA-type triblock copolymer comprising Segment A comprising an oxystyrene-series repeat unit (a) and Segment B comprising a vinyl ether-series repeat unit (b), in which the Segment A and the Segment B are bonded together with a single bond, and to a simple process of producing the same. The triblock copolymer can be produced at a series of steps in a simple manner, comprising living cationic polymerization of a vinyl ether-series monomer such as ethyl vinyl ether in the presence of a bifunctional initiator and a Lewis acid, and subsequently adding an oxystyrene-series monomer such as p-hydroxystyrene for living cationic polymerization.
    Type: Application
    Filed: June 19, 2008
    Publication date: November 11, 2010
    Applicant: MARUZEN PETROCHEMICAL CO., LTD.
    Inventors: Norihiro Yoshida, Hijiri Aoki, Takahito Mita, Ami Yamaguchi, Kazuhiko Haba, Goro Sawada
  • Publication number: 20100248149
    Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including (P) a resin which contains (A) a repeating unit having an ionic structure moiety capable of producing an acid anion on the side chain upon irradiation with an actinic ray or radiation, wherein a cation moiety of the ionic structure moiety has an acid-decomposable group or an alkali-decomposable group.
    Type: Application
    Filed: March 23, 2010
    Publication date: September 30, 2010
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka Tsuchimura, Hidenori Takahashi, Takayuki Ito, Takeshi Inasaki, Shohei Kataoka
  • Patent number: 7803891
    Abstract: The invention relates to polymeric resin blends containing polyelectrolyte resins blended into a polymer or copolymer matrix. Specifically, the polyelectrolyte resins are (co)polymers without hydrolyzable groups. The matrix polymer is a tough, and highly chemical-resistant (co)polymer, preferably a fluoropolymer. The polymeric resin blend is useful for forming films, and especially films useful for MEAs for use in fuel cells.
    Type: Grant
    Filed: June 18, 2008
    Date of Patent: September 28, 2010
    Assignee: Arkema Inc.
    Inventors: James T. Goldbach, Robert J. Umpleby
  • Patent number: 7786234
    Abstract: The invention is based on the discovery that certain polyester compounds bearing free-radical curable moieties are useful as b-stageable adhesives for the microelectronic packaging industry.
    Type: Grant
    Filed: October 17, 2007
    Date of Patent: August 31, 2010
    Assignee: Designer Molecules, Inc.
    Inventors: Stephen M. Dershem, Farhad G. Mizori
  • Patent number: 7781496
    Abstract: An intraocular lens comprising a polymer that is prepared from a monomer mixture comprising a monomer of formula G-D-Ar??(I) wherein Ar is a C6-C24 aromatic group having a hydrophilic substituent, D is a divalent linking group, and G is a reactive functional group selected from the group consisting of acryloyl, acryloyloxy, methacryloyl, methacryloyloxy and mercapto. The polymer has an equilibrium water content of greater than 4.5 percent by weight.
    Type: Grant
    Filed: November 19, 2008
    Date of Patent: August 24, 2010
    Assignee: Bausch & Lomb Incorporated
    Inventors: Joseph C. Salamone, Jay F. Kunzler, Richard M. Ozark
  • Publication number: 20100201920
    Abstract: The invention relates to novel calamitic mesogenic compounds which are especially suitable for use in birefringent films with negative optical dispersion, to novel liquid crystal (LC) formulations and polymer films comprising them, and to the use of the compounds, formulations and films in optical, electrooptical, electronic, semiconducting or luminescent components or devices.
    Type: Application
    Filed: August 6, 2008
    Publication date: August 12, 2010
    Applicant: Merck Patent Gesellschaft
    Inventors: Kevin Adlem, Owain Llyr Parri, Karl Skjonnemand, David Wilkes
  • Publication number: 20100183845
    Abstract: Disclosed is an optical sheet, which is environmentally friendly and has a high refractive index and superior light resistance, and is thus useful for an optical sheet assembly of a backlight unit.
    Type: Application
    Filed: May 28, 2008
    Publication date: July 22, 2010
    Applicant: KOLON INDUSTRIES, INC
    Inventors: Chang Pyo Hong, Hyo Jin Lee
  • Publication number: 20100162892
    Abstract: The present invention relates to a membrane wherein said membrane comprises a continuous non-porous layer comprising a polymerized composition that comprised prior to polymerization at least one type of compound having a molecular weight of at least 1500 Da and comprising at least 75 weight % of oxyethylene groups and at least two polymerizable groups each comprising a non-substituted vinyl group. The invention further relates to the use of this membrane for separating polar gases and vapors.
    Type: Application
    Filed: May 26, 2008
    Publication date: July 1, 2010
    Applicant: FUJIFILM MANUFACTURING EUROPE B.V.
    Inventors: Akira Kase, Yujiro Itami