Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.

Abstract: The present invention provides a divided redox-curing type composition including a first part in which at least an oxidizing agent (b) is dissolved in a first radical monomer including a radical monomer (a) having an acidic group and/or a hydrophilic group; and a second part in which at least an aromatic sulfinate (d) is dispersed in a second radical monomer including a radical monomer (c) having neither an acidic group nor a hydrophilic group. According to the present invention, a redox-curing type composition capable of securing a time necessary for an adhesion operation and exhibiting high bond strength not only at the initial stage of adhesion but also over a long period of time thereafter in application to a wetting material such as a tooth or a bone as well as a tooth crown repairing material such as a metal or porcelain.

Abstract: The present invention is to provide a method for producing a copolymer for a cement admixture, which enables to easily produce a blend of a plurality of copolymers with different monomer compositions in one polymerization operation, and is superior in water reducing performance and/or slump retention ability. Disclosed is a method for producing a copolymer for a cement admixture, which comprises a step of polymerizing monomer components comprising unsaturated polyalkylene glycol ether-based monomer (A) and unsaturated organic acid-based monomer (B), wherein the unsaturated polyalkylene glycol ether-based monomer (A) is added into a reactor in advance and the unsaturated organic acid-based monomer (B) is added thereto with an addition rate thereof changed at least one time.

Abstract: A polymer comprising a structural unit represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 is independently in each occurrence a linear or branched chain C1-C6 alkyl group, k represents an integer of 0 to 4, X represents a linear or branched chain C1-C6 alkylene group, Z represents a 2-adamantyl group which may have one or more substituents, and a structural unit represented by the formula (II): wherein R4 represents a hydrogen atom or a methyl group, R5 is independently in each occurrence a linear or branched chain C1-C6 alkyl group and n represents an integer of 0 to 4.

Abstract: The present invention is based on the discovery that certain electron poor olefins combined with nucleophiles and a base catalyst are useful as adhesive compositions for the electronic packaging industry. In particular, the adhesive formulations set forth herein are useful as low temperature curing formulations with high adhesion to a variety of substrates. Invention formulations typically cure at about 80° C. and have a potlife of about 24 hours. The formulations cure by the well-known Michael addition reaction.

Abstract: A grafted polymer and its use in polymer/liquid crystal composite films, and more particularly in PDLC films, is disclosed. The grafted polymer includes (alkyl)acrylic acid or (alkyl)acrylamide moieties. At least one of the moieties is grafted with an alkylphenol or with an alkoxylated alkylphenol.

Abstract: The invention provides an alkali soluble polymer including a specific vinylketone phenol and a derivative thereof as radical polymerizable monomers and a positive working photosensitive resin composition containing the alkali soluble polymer and a photosensitizing agent. According to the invention, there can be provided an alkali soluble resin having high solvent resistance, high water resistance, high acid resistance, high alkali resistance, high thermal resistance, high transparency, excellent adhesiveness with a substrate, and the like and useful for the formation of a patterned resin film obtained by developing in an aqueous alkali solution and a positive working photosensitive resin composition including such an alkali soluble resin.

Abstract: A myo-inositol derivative: R1, R2, R3 and R4 are identical, being selected from PO3H2, PO3Na2, PO3K2, PO3Li2, PO3Ca, PO3Mg, PO3(NH4), PO3(RNH3)2, PO3(R2NH2)2, PO3(R4N)2, PO(OR)2, H, COZ and BHPP, where R is benzyl or alkyl of 1 to 6 carbon atoms and Z is an alkyl or arylalky group providing a cleavable protecting group; R5 of H, benzyl, 4-methoxybenzyl, COZ, PO3H2, PO3Na2, PO3K2, PO3Li2, PO3Ca, PO3Mg, PO3(NH4)2, PO3(RNH3)2, PO3(R2NH2)2, PO3(R4N)2, PO(OR)2, and BHPP, where R is benzyl or alkyl of 1 to 6 carbon atoms and Z is an alkyl or arylalky group providing a cleavable protecting group; X is one of CH2, CH2CH2O, and CH2CH2CH2O; n is an integer from 1 to 8; L1 is a single bond or CH2; L2 is one of a single bond, CONH, CH2CONH, CH2CH2CONH, CH2CH2NHCO, CH2CH2NHCONH, CH2CH2NHCSNH, CH2CH2NHSO2, CH2CH2CH2NHCO, CH2CH2CH2NHCONH, CH2CH2CH2NHCSNH, CH2CH2CH2NHSO2, NHCO, NHCONH, NHCSNH, OCONH, CH2, CH2CH2, CH2CH2O, CH2CH2S, CH2CH2NH, CH2CH2CH2, CH2CH2CH2O, CH2CH2CH2S, CH2CH2CH2NH, and NH—SO2; and R6 is a UV-visible ch

Abstract: A method for limiting the transmission of light through a material is disclosed. In the method, a layer composed of a hyperbranched polymer formed via a copolycyclotrimerization reaction is interposed between a light source and the material. Also provided is a method for emitting light comprising exciting the hyperbranched polymer. In addition, methods for limiting the transmission of light and for emitting light using hyperbranched polymers formed by homopolycyclotrimerization reactions are disclosed. A new class of hyperbranched polymers produced by copolycyclotrimerization is also disclosed.

Abstract: An overbased salt of an oligomerized alkylhydroxyaromatic compound is disclosed, wherein the alkyl group of the alkylhydroxyaromatic compound is derived from an olefin mixture comprising propylene oligomers having an initial boiling point of at least about 195° C. and a final boiling point of no more than about 325° C. as measured by ASTM D86. Also disclosed is a lubricating oil composition containing at least (a) a major amount of an oil of lubricating viscosity and (b) the overbased salt of the oligomerized alkylhydroxyaromatic compound.

Abstract: The present invention relates to superabsorbent polymer particles having functionalizers covalently bound to the surface of precursor superabsorbent polymer particles. The functionalizers of the present invention comprise a grafting unit with a radiation activatable group and a functional unit covalently bound to the grafting unit. The grafting unit is bound to an aliphatic C—H group comprised at the surface of the precursor superabsorbent polymer particle. The functional unit comprises chemical structures which are not present in the precursor superabsorbent polymer particle. These functional units add an additional function to the precursor suberabsorbent polymer particle or modifying an existing function of the precursor superabsorbent polymer particle. Moreover, the invention relates to a process for making these superabsorbent polymer particles.

Abstract: The present invention is directed to novel flame retardant monomers and polymers, wherein the flame retardant properties of the polymers are provided by functionality in pendant groups attached to a polymer backbone (as opposed to the polymer backbone itself possessing flame retardant properties. The present invention is also directed to methods of making such polymers and monomers, and articles of manufacture incorporating such monomers and polymers.

Abstract: Disclosed is a composition for formation of a mold, which is used in a method for producing a nanostructure by removing a portion of a thin film formed on the surface of a mold, and removing the mold, the composition including an organic compound, which has a hydrophilic group and has a molecular weight of 500 or more.

Abstract: The invention provides a photosensitive resin composition comprising: a polymer comprising a polymerizable group and a functional group that interacts with a plating catalyst or a precursor thereof so as to form a coordination bond; and at least one selected from the group consisting of a synthetic rubber, an epoxy acrylate monomer, and a polymerizable monomer having a benzyl alcohol group; a laminate; a method of producing a metal plated material; a metal plated material; a method of producing a metal pattern material; a metal pattern material; and a wiring substrate.

Abstract: A photosensitive polymer for a photoresist and a photoresist composition having the same are provided. The photosensitive polymer for a photoresist includes the repeating unit represented by the formula below: wherein R1 is a C1-C20 hydrocarbon group or a C1-C20 hetero hydrocarbon group including at least one hetero atom selected from the group consisting of nitrogen, fluorine and sulfur.

Abstract: An amphiphilic block copolymer having an ionic functional group, wherein the ratio (N10/N5) of a rotational viscosity (N10) of a 10% by mass solution of the copolymer in purified water to a rotational viscosity (N5) of a 5% by mass solution of the copolymer in purified water is 2.5 or lower.

Abstract: Adhesive formulations generally including an acrylate and/or methacrylate monomer; a vinyl ester resin having a weight average molecular weight ranging from about 450 to about 3000; and a catalyst. Also disclosed is a method for forming a composite material employing the formulations.

Abstract: The present invention relates to an active energy beam-curable inkjet ink comprising a polymerizable monomer, wherein when a cured film obtained upon curing the ink is measured under conditions including an oscillation frequency of 1 Hz, the loss tangent (tan ?) at the glass transition temperature is 2 or greater.

Abstract: Disclosed are latex polymers and an aqueous coating compositions having excellent freeze-thaw stability, open time, stain resistance, low temperature film formation, foam resistance, block resistance, adhesion, water sensitivity and a low-VOC content. The latex polymers and aqueous coating compositions include at least one latex polymer derived from at least one monomer copolymerized or blended with an alkoxylated compound, for example an alkoxylated tristyrylphenol or an alkoxylated tributylphenol. Also provided is an aqueous coating composition including at least one latex polymer, at least one pigment, water and at least one freeze-thaw additive. Typically, the freeze-thaw additive in an amount greater than about 1.3% by weight of the polymer, typically in an amount greater than about 2% by weight of the polymer, in an amount greater than about 4% by weight of the polymer, in an amount greater than about 7.

Abstract: UV-absorbing polymers and copolymers suitable for Composition into sunscreens for the protection of human skin. The UV-absorbing chromophoric monomers chosen are simple and easily synthesized. With the correct choice of chromophoric monomer or mixture of monomers, protection against UV-A radiation or against both UV-A and UV-B radiation can be achieved. With the correct choice of comonomer, copolymers produced as aqueous latex emulsions or as Polyethylene Glycol solutions can also be achieved.

Abstract: The invention provides a self-dispersible polymer having one or more hydrophilic structural units and one or more aromatic group-containing structural units. The content of the aromatic group-containing structural units is in a range from 10 mass % to 95 mass % with respect to the total mass of the self-dispersible polymer, and the content of one or more water soluble components, which are contained in the self-dispersible polymer and exhibit solubility in water when the self-dispersible polymer is dispersed in a water-based medium, is 10 mass % or less with respect to the total mass of the self-dispersible polymer.

Abstract: A process for producing a stable polymer such as poly(hydroxystyrene) which comprises the decarboxylation of a corresponding phenolic in the presence of a non-amine basic catalyst and a polar organic solvent, followed by the polymerization thereof.

Abstract: A hydrophilic, aromatic-based monomer has an aromatic group substituted with at least one hydrophilic substituent and a reactive functional group. Polymers comprising such a hydrophilic, aromatic-based monomers avoid or reduce the risk of forming vacuoles of absorbed water. Furthermore, such polymers have high refractive index, and, thus, are advantageously used for making ophthalmic devices, such as intraocular lenses, contact lenses, corneal rings, corneal inlays, and keratoprostheses.

Abstract: A class of bioinspired, cross linking polymers, created by working catechol functionalities into the backbone of a bulk polymer, is disclosed. Varied cross linking groups may be incorporated into different polymer backbones, and subsequently reacted with an array of reagents. An adhesive composition comprising a copolymer, the copolymer comprising pendant dihydroxyphenyl groups; and a crosslinking agent selected from the group consisting of, for example, oxidants, enzymes, metals, and light. A method of preparing an adhesive composition comprising copolymerizing a first monomer comprising pendant dihydroxy-protected dihydroxyphenyl groups; deprotecting the dihydroxy-protected dihydroxyphenyl groups; crosslinking the dihydroxyphenyl groups with a crosslinking agent.

Abstract: Novel fatty acid monomers and methods for their synthesis are provided for use in polymerization reactions. Fatty acid monomers are employed as reactive diluents in the polymerization of vinyl esters and polyesters for one or more purposes selected from improving the fracture resistance, lowering the processing viscosity and reducing the volatile organic compounds present in the polymerization mixture.

Abstract: The present invention relates to macromonomer compounds possessing antioxidant properties, antioxidant polymers comprising the antioxidant macromonomers as a recurring unit, and methods of inhibiting oxidation in a substance comprising contacting the substance with the antioxidant polymers. In one embodiment, substantially all of the recurring macromonomeric units of the antioxidant polymers comprise an antioxidant moiety. In another embodiment, all of the recurring macromonomer units of the antioxidant polymers comprise an antioxidant moiety. The method of the present invention, yields antioxidant polymers with substantially all of the recurring units comprising an antioxidant moiety. These antioxidant polymers have greater bulk antioxidative properties than previously known.

Abstract: An electronic device, such as a thin film transistor, is disclosed having a dielectric layer formed from a composition comprising a compound having at least one phenol group and at least one group containing comprising silicon. The resulting dielectric layer has good electrical properties.

Abstract: New syntheses of phenolic acrylate monomers are provided as well as polymers comprising such phenolic acrylate monomers. Preferred polymers of the invention are useful as a resin component of chemically-amplified positive-acting resists.

Abstract: Optical films having a polymerized microstructured surface are described. The polymerized microstructured surface comprises the reaction product of a polymerizable resin composition comprising 10% to 100 wt-% of at least one biphenyl di(meth)acrylate monomer. The di(meth)acrylate monomer comprises a core biphenyl structure having two aromatic rings connected with a C—C bond. The biphenyl di(meth)acrylate monomer preferably comprises a sufficient amount of ortho and/or meta(meth)acrylate substituents such that the monomer is a liquid at 25° C.

Abstract: An etch resistant thermally curable Underlayer for use in a multiplayer liyhographic process to produce a photolithographic bilayer coated substrate, the composition having: (a) at least one cycloolefin polymer comprising at least one repeating unit of Structure (I), and at least one repeating unit of Structure (II), and optionally at least one repeating unit of Structure (III) with the proviso that neither Structure (I) nor Structure (II) nor Structure (III) contains acid sensitive groups. b) at least one cross-linking agent selected from the group consisting of an amino or phenolic cross-linking agent; c) a least one thermal acid generator (TAG); d) at lest one solvent; and e) optionally, at least one surfactant.

Abstract: A naphthalene-backbone polymer represented by Formula 1: wherein n and m are independently at least 1 and less than about 190, R1 is a hydrogen, a hydroxyl, a hydrocarbon group of about 10 carbons or less, or a halogen, R2 is methylene or includes an aryl linking group, R3 is a conjugated diene group, and R4 is an unsaturated dienophile group.

Abstract: Copolymers are manufactured to include a zwitterionic monomer (e.g., methacryloyloxyethyl phosphorylcholine monomer), a dihydroxyphenyl derivatized monomer, and optionally one or more additional monomers. The dihydroxyphenyl derivatized monomer gives the copolymers excellent adhesion properties. Optional monomers include a cationic amino monomer, a hydrocarbon monomer, and/or a hydrophilic monomer. The copolymers are biocompatible and can be used with medical devices.

Abstract: A resist material has a base polymer containing a compound including a copolymer of a first unit represented by a general formula of the following Chemical Formula 1 and a second unit represented by a general formula of the following Chemical Formula 2: wherein R1, R2, R3, R7, and R8 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5 and R6 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; and R9 is a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group

Abstract: A polymer support is provided which comprises protected hydroxypolyC2-4 alkyleneoxy chains attached to a cross-linked polymer wherein the protected hydroxypolyC2-4 alkyleneoxy chain contains from 2 to 10 C2-4 alkyleneoxy groups and wherein the hydroxypolyC2-4 alkyleneoxy chains are protected with an acid labile group. The acid labile protecting group is preferably a poly-aryl methane protecting group. A monomer and process for the preparation of said support are also provided.

Abstract: The present invention provides a production method of a hydroxyl-containing polymer including: protecting a hydroxyl group of a hydroxyl-containing monomer with a protecting group to make the monomer a protected monomer with decreased hydrophilicity; adding the protected monomer alone or together with a hydrophobic monomer to a water-based medium containing a salt and a dispersion stabilizer; adding a polymerization initiator to the mixture to carry out suspension polymerization; and de-protecting the obtained polymer having the protecting group to recover the hydroxyl group.

Abstract: According to an aspect of the present invention, implantable or insertable medical devices are provided, which contain at least one polymeric region in contact with a metallic region. The polymeric region contains at least one block copolymer that contains at least one low Tg block and at least one high Tg block. The polymeric region contains at least one polymer that contains at least one adhesion promoting group selected from one or more of halo-silane, alkoxy-silane, epoxy, anhydride, phenoxy, hydroxyl, amino, sulfonate and carboxyl groups, which at least one polymer may correspond to the block copolymer, a supplemental polymer, or both.

Abstract: A process for forming a resist pattern comprises the steps of applying on a substrate to form a photosensitive resist layer a photosensitive composition comprising at least one photosensitive compound having, in the molecule, two or more structural units represented by C6R2-6—CHR1—OR7 or C6R2-6—CHR1—COOR7 where R1 is a hydrogen atom or an alkyl group, at least one of R2, R3, R4, R5, and R6 is a nitro group, and others are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl, an alkoxy, a phenyl, a naphthyl, and an alkyl in which a part or the entire of hydrogen atoms are substituted by a fluorine atom, and R7 is a substituted or unsubstituted phenylene or naphthylene group dissolved in an organic solvent, irradiating the resist layer selectively with a radiation ray, and developing a portion irradiated by the ray to form a pattern of the resist layer.

Abstract: The invention is based on the discovery that certain polyester compounds bearing free-radical curable moieties are useful as b-stageable adhesives for the microelectonic packaging industry.

Abstract: A polymer, which contains a structural unit having a carboxyl group represented by the following formula (1) at a side chain of the structural unit, wherein node position is formed, when the polymer is dissolved in an alkali aqueous solution having a pH of 10 or more and kept at 25° C. for 60 days: wherein R1 represents a hydrogen atom or a methyl group; R2 represents an (n+1)-valent organic linking group containing an ester group represented by —O(C?O)—; A represents an oxygen atom or NR3—; R3 represents a hydrogen atom, or an monovalent hydrocarbon group having from 1 to 10 carbon atoms; and n indicates an integer of from 1 to 5.

Abstract: A process that includes (a) providing a mixture including i) a halocatechol diacrylate, a haloresorcinol diacrylate, or a halohydroquinone diacrylate component, ii) a charge transporting component having a radical polymerizable group, and iii) a radical initiator and b) initiating a radical polymerization.

Abstract: Novel copolymers, including block copolymers, which comprise: (a) a plurality of constitutional units that correspond to one or more olefin monomer species and (b) a plurality of constitutional units that correspond to one or more protected or unprotected hydroxystyrene monomer species.

Abstract: A method of preparing a dispersion which includes the step of contacting a first phase, a first material immiscible therewith, a first polymeric material and a second polymeric material wherein: (a) (i) said first polymeric material has a repeat unit of the formula (I), wherein A and B are the same or different, are selected from optionally-substituted aromatic and thereoaromatic groups and at least one comprises a relatively polar atom or group and R1 and R2 independently comprise relatively non-polar atoms or groups; (ii) said first polymeric material is prepared or preparable by providing a compound of general formula (I), wherein A, B, R1 and R2 are as described above, in an aqueous solvent and causing the groups C?C in said compound to react with one another to form said first polymeric material; (b) said second polymeric material includes a functional group which is able to react with said first polymeric material so that covalent bonds are formed between said first and second polymeric materials; (c) t

Abstract: A thermoset composition exhibiting reduced water absorption in the cured state includes an olefinically unsaturated monomer and a capped poly(arylene ether) prepared by the reaction of an uncapped poly(arylene ether) with an anhydride capping agent. The capped poly(arylene ether) is isolated and/or purified by methods that reduce the concentrations of polar impurities that contribute to water absorption by the cured composition.

Abstract: Disclosed are UV absorbers that contain a labile functional group capable of initiating free radical polymerization.

Abstract: 1. A copolymer having recurring units of the following formulas (1), (2), and (3), wherein R1, R4, R5, and R6 are a hydrogen atom or a methyl group, R2, R3, and R7 represent a monovalent organic group, k is 1 or 2, 1 is 0–4, n is 1–3, m is 0–3, R8 is a substituted methyl group, 1-substituted ethyl group, 1-branched alkyl group, triorganosilyl group, triorganogermyl group, alkoxycarbonyl group, acyl group, or cyclic acid-dissociable group, with two or more R8 groups being the same or different, q is 1–3, and p is 0–3, the copolymer having a GPC average molecular weight of 3,000–100,000. The composition is useful as a polymer component for a radiation-sensitive resin composition suitable as a chemically-amplified resist.

Abstract: The base polymer of a resist material contains a polymer compound including a first unit represented by a general formula of the following Chemical Formula 5 and a second unit represented by a general formula of the following Chemical Formula 6: wherein R1, R2, R3, R7, R8 and R9 are the same or different and are a hydrogen atom, a fluorine atom, or a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20; R4 is a straight-chain alkylene group or a branched or cyclic alkylene group with a carbon number not less than 0 and not more than 20; R5, R6 and R11 are the same or different and are a hydrogen atom, a straight-chain alkyl group, a branched or cyclic alkyl group or a fluoridated alkyl group with a carbon number not less than 1 and not more than 20, or a protecting group released by an acid; R12 is a fluorine atom, or a straight-chain fluoridated alkyl group or a branched or cyclic fluoridated alkyl group with a

Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and l is 1 or 2.

Abstract: A functionalized poly(arylene ether) having a pendant carbon—carbon double bond is prepared by reacting the hydroxy end group of a poly(arylene ether) with a polyisocyanate compound to produce a urethane-capped poly(arylene ether) having pendant isocyanate functionality, which is then reacted with a polyfunctional compound having a carbon—carbon double bond and a hydroxy, thiol, or amino group. The functionalized poly(arylene ether) is useful as a component of a curable composition in which its carbon—carbon double bond copolymerizes with one or more olefinically unsaturated comonomers.

Abstract: Polymers comprising recurring units of cycloolefin having fluorinated alkyl introduced therein are novel and have transparency and alkali solubility. Using the polymers, resist compositions featuring low absorption of F2 excimer laser light are obtained.

Abstract: A polymer comprising recurring units of formula (2) is prepared by effecting deblocking reaction on a polymer comprising recurring units of formula (1) in the presence of an acid catalyst. In the formulae, R1 and R4 are H or methyl, R2 and R3 are C1-C10 alkyl, or R2 and R3 may form a ring, R5 is H, hydroxyl, alkyl, alkoxy or halogen, R6 and R7 are H, methyl, alkoxycarbonyl, cyano or halogen, R8 is C4-C20 tertiary alkyl, n is an integer of 0 to 4, p is a positive number, q and r each are 0 or a positive number, exclusive of q=r=0, p1 is a positive number, p2 is 0 or a positive number, and p1+p2=p. The polymer thus produced has a narrower molecular weight distribution than polymers produced by the prior art methods. A resist composition comprising the polymer as a base resin has advantages including a dissolution contrast of resist film, high resolution, exposure latitude, process flexibility, good pattern profile after exposure, and minimized line edge roughness.