Abstract: A nitrile group-containing highly saturated copolymer rubber comprising (a) 0 to 20% by weight of 1,3-butadiene units, (b) 0 to 50% by weight of saturated 1,3-butadiene units, (c) 40 to 50% by weight of &agr;,&bgr;-ethylenically unsaturated nitrile monomer units, and (d) 10 to 35% by weight and at least 8% by mol of other monomer units, wherein the sum of 1,3-butadiene units (a) and saturated 1,3-butadiene units (b) is in the range of 20 to 50% by weight. A rubber composition comprising this copolymer rubber and a crosslinking agent gives a crosslinked product exhibiting good oil resistance, namely, good resistance to rancid gasoline and not hardening even when it is placed in contact with oil containing condensed aromatics.

Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained.

Abstract: A novel organosiloxane polymer is obtained by addition reaction of an organohydrogenpolysiloxane, an alkenyl-containing organopolysiloxane and an unsaturated compound of formula (3) or (4). Using the organosiloxane polymer, a photo-curable resin composition is prepared which can be exposed to radiation having a wide range of wavelength and developed to form a pattern.

Abstract: A continuous process for the preparation of absorbable block copolymers and their processing into monofilament fibers is disclosed. The process comprises a reactive extrusion step where cyclic monomers and other additives are polymerized in stages to form the absorbable block copolymer compositions, which are then continuously extruded and spun into monofilament fibers using regular fiber spinning and drawing techniques.

Abstract: A continuous process for the preparation of absorbable polymers and their processing into multifilament fibers is disclosed. The process comprises a reactive extrusion step where cyclic monomers and other additives are polymerized into absorbable homopolymer or copolymer compositions, which are then extruded continuously and spun into multifilament fibers using regular fiber spinning and drawing techniques.

Abstract: A process for the preparation of absorbable homopolymers or random copolymers and their processing into monofilament fibers is disclosed. The process comprises a reactive extrusion step where a cyclic monomer or a mixture of cyclic monomers and other additives are polymerized to form absorbable homopolymer or copolymer compositions, which are then extruded continuously and spun into monofilament fibers using regular fiber spinning and drawing techniques.

Abstract: Covalently-bound, hydrophilic copolymer coatings for implants are disclosed. The copolymer coatings comprise a hydrophobic aryl acrylic monomer, a hydrophilic monomer selected from the group consisting of hydroxyalkyl (meth)acrylates, n-vinyl pyrrolidone and acrylamides, and a reactive plasticizer.

Abstract: There is described a method of preparing a first polymeric compound which comprises a providing a compound of general formula (I) or a salt thereof where A and B are the same or different and at least one comprises a relatively polar atom or group and R1 and R2 independently comprise relatively non-polar atoms or groups, in a solvent of a type in which ethene itself is generally insoluble and causing the groups C═C in said compound to react with one another to form a polymeric structure. The first polymeric compound may be reacted with a second compound, for example polyvinylalcohol, collagen or the like to produce a colloid or gel which may have applications in the treatment or bums or recovery of oils.

Abstract: A novel star block copolymer which can be made to have a high molecular weight and gives a solution having a lower viscosity than solutions of linear polymers having the same molecular weight as the copolymer and which is expected to be used as a resist material; and a process for producing the copolymer. The star block copolymer having alkenylphenol skeletons is obtained by homopolymerizing by living anion polymerization an alkenylphenol compound in which the hydroxyl group of the phenol moiety has been protected by a saturated aliphatic protective group or copolymerizing the alkenylphenol compound with a vinylaromatic compound by living anion polymerization, subsequently copolymerizing the resultant polymer using a polyfunctional coupling agent such as divinylbenzene to obtain a star block copolymer, and eliminating the saturated aliphatic protective groups with an acid reagent.

Abstract: The present invention relates to a weather-resistant composition comprising a bisbenzotriazolylphenol compound represented by the general formula (1): [wherein A represents an alkylene group, and R1 and R2 represent a group (B): (in which R3 and R4 represent an alkyl group)], a meth)acrylate compound, and a curing agent; a coating material containing the weather-resistant composition as a main component; and a molded article. The composition can form a coating film which is not impaired in mechanical strength, exhibits excellent weather resistance, metal ion resistance and transparency for a prolonged period, and is less likely to cause surface cracks.

Abstract: A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.

Abstract: A method of preparing a first polymeric compound which comprises providing a compound of the general formula AR1C═CR2B or a salt thereof where A and B are the same or different and at least on group comprises a relatively polar atom or group and R1 and R2 independently comprise relatively non-polar atoms or groups, in a solvent of a type in which ethane itself is greatly insoluble and spacing the C═C groups in said compound to react with one another to form a polymeric structure. The first polymeric compound may be reacted with a second compound, for example polyvinylalcohol, collagen, or the like to produce a colloid or gel which may have applications in the treatment of burns or recovery of oils.

Abstract: A chemical amplification type resist composition uses as the base resin a polymer having a molecular weight dispersity of 1.0 to 1.5 which is a polymer comprising recurring units of formula (1) and recurring units of formula (2) or a polymer comprising recurring units of formula (2) wherein R1 is alkyl, alkoxyalkyl, acetyl or carbonylalkoxy, 0<p/(p+q)≦1, R2 is hydrogen or methyl, and R3 is a tertiary hydrocarbon group of 4 to 30 carbon atoms. By virtue of the narrow dispersity effect of the polymer, the resist composition is improved in resolution as compared with prior art base resins having a wide dispersity. Advantages including a high resolution, good pattern profile and storage stability are obtained.

Abstract: Disclosed are soft, high refractive index, acrylic materials having an elongation of at least 150%. These materials, especially useful as intraocular lens materials, contain an aryl acrylic hydrophobic monomer as the single principal device-forming monomer. In addition to their use as intraocular lens materials, the present materials are also suitable for use in other ophthalmic or otorhinolaryngological devices, such as contact lenses, keratoprostheses, corneal inlays or rings; otological ventilation tubes and nasal implants.

Abstract: A composition for plastic lenses having a viscosity suitable for application to plastic lens materials and other optical materials and capable of giving a cured material having a relatively high refractive index and a low specific gravity, a plastic lens obtained by curing the composition, and a process for producing the plastic lens. A specific dicarboxylic acid component and a specific diol component are employed and the ratio of the components is adjusted to provide the composition for plastic lenses.

Abstract: A ternary copolymer of hydroxystyrene, tertiary alkyl (meth)acrylate and substitutable phenoxyalkyl (meth)acrylate having a Mw of 1,000-500,000 is blended as a base resin to formulate a chemically amplified, positive resist composition which has advantages including a significantly enhanced contrast of alkali dissolution rate before and after exposure, high sensitivity, high resolution, a satisfactory pattern profile after exposure, high etching resistance, and process adaptability.

Abstract: The present invention relates to a semiconductor device using a copolymer-containing photoresist, and a process for manufacturing the same. As a norbornene derivative (monomer) having a hydrophilic group is synthesized and introduced to the backbone chain of a polymer, the polymer according to the present invention has excellent etching resistance and heat resistance, which are the characteristic points of alicyclic olefin structure, and provide excellent resolution due to prominent enhancement of adhesiveness resulted from introducing a hydrophilic group (—OH).

Abstract: Covalently-bound, hydrophilic copolymer coatings for implants are disclosed. The copolymer coatings comprise 2-phenylethyl (meth)acrylate, a hydrophilic monomer selected from the group consisting of hydroxyalkyl (meth)acrylates and acrylamides, and a reactive plasticizer.

Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray.

Abstract: Polyisobutenylphenols are prepared by alkylating an aromatic hydroxy compound with substantially monoethylenically unsaturated and substantially homopolymeric polyisobutenes in the presence of a Lewis acid alkylation catalyst by a process in which the polyisobutenes have a &bgr; double bond content of at least 35 mol %.

Abstract: In one aspect, the invention provides ene-thiol elastomers comprising the reaction product of a polythiol free of hydrophilic groups and having at least two thiol groups and an aromatic, heterocyclic, aliphatic, or cycloaliphatic polyene having at least two reactive unsaturated carbon to carbon bonds. In another aspect, the invention provides ene-thiol elastomer comprising the reaction product of (a) a thiol terminated oligomer comprising the reaction product of a polythiol having two thiol groups and a first polyene or mixture of polyenes having two reactive unsaturated carbon to carbon bonds; and (b) a second polyene or a mixture of polyenes having at least 5 percent functional equivalents of unsaturated carbon to carbon bonds from polyenes having at least three unsaturated carbon to carbon bonds. The ene-thiol elastomers of the invention have a weight increase of not more than 4 weight percent in 15 days at a temperature of 22° C.

Abstract: In one aspect, the invention provides ene-thiol elastomers comprising the reaction product of a polythiol free of hydrophilic groups and having at least two thiol groups and an aromatic, heterocyclic, aliphatic, or cycloaliphatic polyene having at least two reactive unsaturated carbon to carbon bonds. In another aspect, the invention provides ene-thiol elastomer comprising the reaction product of (a) a thiol terminated oligomer comprising the reaction product of a polythiol having two thiol groups and a first polyene or mixture of polyenes having two reactive unsaturated carbon to carbon bonds; and (b) a second polyene or a mixture of polyenes having at least 5 percent functional equivalents of unsaturated carbon to carbon bonds from polyenes having at least three unsaturated carbon to carbon bonds. The ene-thiol elastomers of the invention have a weight increase of not more than 4 weight percent in 15 days at a temperature of 22° C.

Abstract: In one aspect, the invention provides ene-thiol elastomers comprising the reaction product of a polythiol free of hydrophilic groups and having at least two thiol groups and an aromatic, heterocyclic, aliphatic, or cycloaliphatic polyene having at least two reactive unsaturated carbon to carbon bonds. In another aspect, the invention provides ene-thiol elastomer comprising the reaction product of (a) a thiol terminated oligomer comprising the reaction product of a polythiol having two thiol groups and a first polyene or mixture of polyenes having two reactive unsaturated carbon to carbon bonds; and (b) a second polyene or a mixture of polyenes having at least 5 percent functional equivalents of unsaturated carbon to carbon bonds from polyenes having at least three unsaturated carbon to carbon bonds. The ene-thiol elastomers of the invention have a weight increase of not more than 4 weight percent in 15 days at a temperature of 22° C.

Abstract: Disclosed are soft, high refractive index, acrylic materials having an elongation of at least 150%. These materials, especially useful as intraocular lens materials, contain an aryl acrylic hydrophobic monomer as the single principal device-forming monomer. In addition to their use as intraocular lens materials, the present materials are also suitable for use in other ophthalmic or otorhinolaryngological devices, such as contact lenses, keratoprostheses, corneal inlays or rings; otological ventilation tubes and nasal implants.

Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF(249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray. Photoresist monomers of the present invention are represented by the following Chemical Formula 1: wherein, m is 1 or 2. Polymers of the present invention comprise repeating units derived from the comonomer of Chemical Formula 1, preferably together with monomers of the following Chemical Formula 2: wherein, R* is an acid-labile group, and W is 1 or 2.

Abstract: A photo-alignment material useful in liquid crystal alignment films comprises a maleimide-based repeating unit and at least one additional repeating unit, or a maleimide-based repeating unit and at least two additional repeating units. The photo-alignment materials have freely-controllable pretilt angles, and they provide a display quality equivalent or superior to alignment materials made using the conventional rubbing process.

Abstract: An objective of the invention is to provide a conjugated diene-based rubber having a specific composition and a method of producing the same, an oil extended rubber using the same, as well as a rubber composition capable of being converted into a vulcanized rubber which has a low rolling resistance, an excellent wearing resistance and the like, and is useful, for example, as a tire or the like. A conjugated diene-based rubber in the invention has a glass transition point of −60 to 0° C., an olefinically unsaturated nitrile monomer unit randomly contains in its molecular chain, its repeating units consists of 9 to 30% by mass of an olefinically unsaturated nitrile monomer unit such as acrylonitrile, 10 to 50% by mass of an aromatic vinyl monomer unit such as styrene and 20 to 81% by mass of a conjugated diene monomer unit such as 1,3-butadiene, and its Mooney viscosity [ML1+4(100° C.)] is 20 to 200.

Abstract: A polymer having at least one reactive terminal or pendant functional group that has been capped with a trifunctional olefinic compound. The polymer can be made by contacting a base polymer having at least one reactive terminal or pendant functional group with a trifunctional olefinic compound under conditions effective to react at least one of the terminal or pendant functional groups with the trifunctional olefinic compound. The capped polymers are particularly suitable as crosslinking toughening agents in multi-components compositions such as adhesives, coatings and matrices for composites.

Abstract: A diyne-containing (co)polymer which is soluble in organic solvents, has excellent processability, and gives a cured coating film excellent in heat resistance, solvent resistance, and low-dielectric characteristics, and mechanical strength; processes for producing the same; and a cured film. The diyne-containing (co)polymer contains at least 10 mol % repeating units represented by the following formula (1) and has a weight-average molecular weight of from 500 to 1,000,000: &Brketopenst;C≡C&Parenopenst;Y&Parenclosest;nC≡C—Ar&Brketclosest;  (1) wherein Y represents a specific bivalent organic group; Ar represents a bivalent organic group; and n represents 1.

Abstract: Disclosed are soft, high refractive index, acrylic materials having an elongation of at least 150%. These materials, especially useful as intraocular lens materials, contain an aryl acrylic hydrophobic monomer as the single principal device-forming monomer. In addition to their use as intraocular lens materials, the present materials are also suitable for use in other ophthalmic or otorhinolaryngological devices, such as contact lenses, keratoprostheses, corneal inlays or rings; otological ventilation tubes and nasal implants.

Abstract: A polymer having at least one reactive terminal or pendant functional group that has been capped with a trifunctional olefinic compound. The polymer can be made by contacting a base polymer having at least one reactive terminal or pendant functional group with a trifunctional olefinic compound under conditions effective to react at least one of the terminal or pendant functional groups with the trifunctional olefinic compound. The capped polymers are particularly suitable as crosslinking toughening agents in multi-components compositions such as adhesives, coatings and matrices for composites.

Abstract: A polymer having at least one reactive terminal or pendant functional group that has been capped with a trifunctional olefinic compound. The polymer can be made by contacting a base polymer having at least one reactive terminal or pendant functional group with a trifunctional olefinic compound under conditions effective to react at least one of the terminal or pendant functional groups with the trifunctional olefinic compound. The capped polymers are particularly suitable as crosslinking toughening agents in multi-components compositions such as adhesives, coatings and matrices for composites.

Abstract: A polymer having at least one reactive terminal or pendant functional group that has been capped with a trifunctional olefinic compound. The polymer can be made by contacting a base polymer having at least one reactive terminal or pendant functional group with a trifunctional olefinic compound under conditions effective to react at least one of the terminal or pendant functional groups with the trifunctional olefinic compound. The capped polymers are particularly suitable as crosslinking toughening agents in multi-components compositions such as adhesives, coatings and matrices for composites.

Abstract: Poly(p-arylene-vinylenes) comprising repeating units of the formula (I), where the symbols and indices have the following meanings: Y1, Y2, Y3: identical or different, CH, N; Aryl: an aryl group having from 4 to 14 carbon atoms; R′, R″: identical or different, each a straight-chain or branched or cyclic alkyl or alkoxy group having from 1 to 20 carbon atoms, where one or more non-adjacent CH2 groups may be replaced by —O—, —S—, —CO—, —COO—, —O—CO—, —NR1—, —(NR2R3)+—A−, or —CONR4— and one or more H atoms may be replaced by F, or else CN, F, Cl or an aryl group having from 4 to 14 carbon atoms which may be substituted by one or more nonaromatic radicals R′; R1, R2, R3, R4: identical or different, aliphatic or aromatic hydrocarbon radicals having from 1 to 20 carbon atoms or else H; A−: a singly charged anion or its equivalent; m: 0, 1 or 2; n: 1, 2, 3,

Abstract: The present invention is directed to radical-curable adhesive compositions which include a (meth)acrylate component; a thermal resistance-conferring component; and a radical cure-inducing composition. Reaction products of the compositions of this invention exhibit superior resistance of thermal degradation.

Abstract: A polymer having at least one reactive terminal or pendant functional group that has been capped with a trifunctional olefinic compound. The polymer can be made by contacting a base polymer having at least one reactive terminal or pendant functional group with a trifunctional olefinic compound under conditions effective to react at least one of the terminal or pendant functional groups with the trifunctional olefinic compound. The capped polymers are particularly suitable as crosslinking toughening agents in multi-components compositions such as adhesives, coatings and matrices for composites.

Abstract: The present invention is directed to radical-curable adhesive compositions which include a (meth)acrylate component; a thermal resistance-conferring component; and a radical cure-inducing composition. Reaction products of the compositions of the compositions of this invention exhibit superior resistance to thermal degradation.

Abstract: A method for producing poly(p-t-butoxystyrene), which comprises polymerizing p-t-butoxystyrene in a hydrocarbon type reaction solvent in the presence of a polymerization initiator, and, after termination of the polymerization reaction, conducting a separation of the hydrocarbon type reaction solvent layer containing poly(p-t-butoxystyrene) and the water layer in the presence of 1-50 parts by weight of a polar solvent per 100 parts by weight of the hydrocarbon type reaction solvent layer, wherein the separation efficiency, after termination of the polymerization reaction, of the hydrocarbon type reaction solvent layer containing poly(p-t-butoxystyrene) and the water or acidic water layer conspicuously improves.

Abstract: Disclosed is an extremely rapidly photo-addressable storage media from inherently slow photo-addressable polymers by irradiating a substrate over a large area with a light source suitable for conventional inscription so that an optical anisotropy, i.e. a double refraction with a preferential direction in the plane of the substrate occurs. If the substrates so prepared are briefly intensively irradiated, the pattern is inscribed extremely rapidly and permanently. The invention also relates to novel side-chain polymers in which high optical anisotropy can be generated by irradiation. This optical anisotropy is very heat stable.

Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained.

Abstract: A dendritic or hyperbranched polymer having a weight average molecular weight of 500-10,000,000 is prepared by polymerizing a hydroxystyrene derivative, adding a branching monomer midway in the polymerization step to introduce branch chains, and repeating the polymerizing and branching steps. The polymer is advantageously used as the base resin of resist material because the size of the polymer can be reduced while maintaining strength.

Abstract: A novel compound suitable for use as an ultraviolet absorber is provided. Further provided are a resin composition and a coating material each containing the novel compound. A bis(benzotriazolyl phenol) compound represented by the following general formula (1), a resin composition containing the compound, and an ultraviolet-absorbing polymer prepared by copolymerization of the compound: [wherein A represents a methylene group, a (CH3)2C group or a C2H5(CH3)C group; R1 and R6, either identical to or different from each other, represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, an aryl group, an alkoxy group having 1-4 carbon atoms or a halogen atom; R2 and R4, either identical to or different from each other, represent a straight-chain or branched alkylene group having 1-6 carbon atoms; R3 and R5each represents a hydrogen atom or a methyl group; and 1, m and n each indicates 0 or 1].

Abstract: The invention relates to poly(phenylene vinylene) polymers substituted with dendritic sidechains to enhance main-chain separation in the solid state. The polymers are synthesized by the Heck polymerization and have a weight-average molecular weight of 20,000 to 60,000 Daltons. The polymers are self-ordering in the solid state and have thermotropic liquid crystalline phases. The polymers show enhanced photoconductivity, better charge transport capability and improved polarized light emission.

Abstract: The present invention relates to photoresist monomers, polymers formed therefrom and photoresist compositions suitable for photolithography processes employing a DUV light source, such as KrF (249 nm) and ArF(193 nm); EUV; VUV; E-beam; ion-beam; and X-ray.

Abstract: A thermoplastic molding composition is disclosed containing polycarbonate resin and a copolymer of methyl methacrylate conforming structurally to: wherein x and y are integers calculated to result in a content of PMMA in the copolymer in the range of 80 to 90 mole %, and where R1 denotes —CH3, R2 denotes —C6H5 and R3 is a C1-C2-alkyl group. The composition is characterized in its transparence.

Abstract: A polymer used in a chemically amplified resist is represented by the following formula: 1

Abstract: A polymer for a photoresist composition is given by the formula (I): 1

Abstract: A novel ester compound having an exo-form 2-alkylbicyclo[2.2.1]heptan-2-yl group as the protective group is provided as well as a polymer comprising units of the ester compound. The polymer is used as a base resin to formulate a resist composition having a higher sensitivity, resolution and etching resistance than conventional resist compositions.

Abstract: A resist composition containing a polymer of t-butyl cinnamate, a photacid generator, and a solvent. Optionally, the resist composition may include a basic compound. The polymer of t-butyl cinnamate has the monomeric units: wherein a=0.3 to 0.9, b=0.1 to 0.7, and c=0 to 0.3; R1=H, methyl, or CH2OR4; R4=H or C1-C4 alkyl group; R2=H, methyl, CH2OR4, CH2CN, or CH2X; X=Cl, I, Br, F, or CH2COOR5; R5=C1-C4 alkyl group; and R3=isobomyl, cyclohexyl methyl, cyclohexyl ethyl, benzyl, or phenethyl.

Abstract: Disclosed is an improved, chemically-amplifying positive resist composition for radiations, especially UV rays, deep-UV rays, excimer laser beams, X-rays, electron beams. The composition comprises (A) a resin component whose solubility in an alkaline aqueous solution is increased by the action of acids, (B) a chemical compound which generates an acid when exposed to radiations, and (C) an organic carboxylic acid compound and (D) an amine, in which said resin component (A) is a mixture comprising (a) a polyhydroxystyrene having a weight-average molecular weight of from 8,000 to 25,000 and a molecular weight distribution (Mw/Mn) of 1.