From Monomer Containing An Ether Group Patents (Class 526/332)
  • Patent number: 6887961
    Abstract: An absorbent binder composition is provided which is capable of crosslinking after application to a substrate, in the absence of radiation, at a temperature of about 120° C. or less. The absorbent binder composition includes about 15 to about 99.8% by mass monoethylenically unsaturated polymer units, about 0.1 to about 20% by mass polyacrylate ester units having an alkoxysilane functionality, and about 0.1 to about 75% by mass of polymer units selected from polyolefin glycols and polyolefin oxides. The absorbent binder composition can be prepared using a template polymerization process, with the preformed polyolefin glycol or polyolefin oxide serving as a template polymer.
    Type: Grant
    Filed: May 1, 2003
    Date of Patent: May 3, 2005
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Dave Allen Soerens, Jason Matthew Laumer
  • Patent number: 6887960
    Abstract: A bioadhesive composition is disclosed which includes copolymer particles containing as polymerized units, terminally unsaturated acid-containing oligomers and ethylenically unsaturated nonionic monomers. A method of preparing the bioadhesive composition and a method of using the bioadhesive composition are also disclosed.
    Type: Grant
    Filed: February 5, 2001
    Date of Patent: May 3, 2005
    Assignee: Rohm and Haas Company
    Inventors: Hsing-Yeh Parker, Allan Sachs Hoffman
  • Patent number: 6881803
    Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.
    Type: Grant
    Filed: December 28, 2001
    Date of Patent: April 19, 2005
    Assignee: Daicel Chemical Industries Ltd.
    Inventors: Toshio Endo, Tatsumi Fujii, Yasuo Tsuji, Morihito Saito
  • Patent number: 6841648
    Abstract: The present invention relates to polymers which are modified by functional end groups and are based on conjugated dienes or on conjugated dienes and vinylaromatic compounds, a process for their preparation and their use for the production of rubber shaped articles of all types, in particular for the production of tires and tire components, such as tire treads.
    Type: Grant
    Filed: December 9, 2002
    Date of Patent: January 11, 2005
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Grün, Wilfried Braubach
  • Patent number: 6835525
    Abstract: A novel polymer is obtained by copolymerizing a (meth)acrylic acid derivative with a vinyl ether compound, an allyl ether compound and an oxygen-containing alicyclic olefin compound. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, etching resistance, and minimized swell and lends itself to micropatterning with electron beams or deep-UV.
    Type: Grant
    Filed: February 13, 2002
    Date of Patent: December 28, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsunehiro Nishi, Mutsuo Nakashima, Seiichiro Tachibana, Kenji Funatsu
  • Patent number: 6833230
    Abstract: A photosensitive polymer includes a copolymer containing adamantylalkyl vinyl ether, and a resist composition includes the photosensitive polymer. For example, the photosensitive polymer may include a copolymer having a formula: wherein x is an integer between 1 and 4 inclusive, R1 is a hydrogen atom or a methyl group, R2 is an acid-labile C4 to C20 hydrocarbon group, p/(p+q+r)=0.1 to 0.4, q/(p+q+r)=0.1 to 0.5, and r/(p+q+r)=0.1 to 0.4.
    Type: Grant
    Filed: March 21, 2003
    Date of Patent: December 21, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventor: Sang-jun Choi
  • Publication number: 20040242770
    Abstract: A water-insoluble, hydrophilic adhesive polymer is provided, wherein the polymer is prepared by polymerization of a composition consisting of a hydrophilic monomer and a dual-function monomer that both (a) undergoes polymerization with the hydrophilic monomer and (b) provides crosslinks in the polymer product. Water-insoluble, hydrophilic adhesive polymer blends are also provided, which are free of covalent crosslinks. The polymers are useful in hydrogel and bioadhesive compositions, which find utility as drug delivery systems (e.g., topical, transdermal, transmucosal, iontophoretic), medical skin coverings, wound dressings and wound healing products, biomedical electrodes, and tooth whitening stripes.
    Type: Application
    Filed: April 14, 2004
    Publication date: December 2, 2004
    Inventors: Mikhail M. Feldstein, Danir F. Bairamov, Nicolai A. Plate, Valery G. Kulchikhin, Parminder Singh, Gary W. Cleary
  • Publication number: 20040236053
    Abstract: A method of preparing a (meth)acrylate functionalised polymer comprising the steps of mixing together a monofunctional vinylic monomer with from 0.3-100% w/w (based on monofunctional monomer) of a polyfunctional vinylic monomer and from 0.0001-50% w/w of a chain transfer agent, reacting said mixture to form a polymer and terminating the polymerisation reaction before 99% conversion. The resulting polymers are useful as components of surface coatings and inks, as moulding resins or in curable compounds, e.g. curable moulding resins or photoresists.
    Type: Application
    Filed: March 8, 2004
    Publication date: November 25, 2004
    Applicant: LUCITE INTERNATIONAL UK LIMITED
    Inventors: Michael S. Chisholm, Andrew T. Slark
  • Publication number: 20040204556
    Abstract: A polymerization process comprising initiating a first polymerization of monomers using an initiator functionalized with an ATRP initiating site, wherein the first polymerization is selected from the group of cationic polymerization, anionic polymerization, conventional free radical polymerization, metathesis, ring opening polymerization, cationic ring opening polymerization, and coordination polymerization to form a macroinitiator comprising an ATRP initiating site and further initiating an ATRP polymerization of radically polymerizable monomers using the macroinitiator comprising an ATRP initiating site. Novel block copolymers may be formed by the disclosed method.
    Type: Application
    Filed: February 18, 2004
    Publication date: October 14, 2004
    Inventors: Krzysztof Matyjaszewski, Scott G. Gaynor, Simion Coca
  • Patent number: 6800696
    Abstract: In the first aspect of the present invention, there is disclosed a method for producing a copolymer of an alkyl vinyl ether and maleic anhydride which comprises removing an organic solvent used in a reaction under a temperature so that a slurry state can be maintained. According to the first aspect, such a copolymer of the alkyl vinyl ether and maleic anhydride which contains a little amount of the solvent remaining therein as disclosed in the second aspect of the present invention, can be obtained. Further, it can be avoided that a specific viscosity of the copolymer of the alkyl vinyl ether and maleic anhydride is lowered, by means of a method for producing a copolymer of alkyl vinyl ether and maleic anhydride which comprises shielding oxygen in a polymerization, as disclosed in the third aspect of the present invention.
    Type: Grant
    Filed: January 9, 2004
    Date of Patent: October 5, 2004
    Assignee: Daicel Chemical Industries, Ltd.
    Inventor: Morihito Saito
  • Publication number: 20040192870
    Abstract: In a method of producing a low dielectric constant polymer, a thermosetting monomer is provided, wherein the thermosetting monomer has a cage compound or aryl core structure, and a plurality of arms that are covalently bound to the cage compound or core structure. In a subsequent step, the thermosetting monomer is incorporated into a polymer to form the low dielectric constant polymer, wherein the incorporation into the polymer comprises a chemical reaction of a triple bond that is located in at least one of the arms. Contemplated cage compounds and core structures include adamantane, diamantane, silicon, a phenyl group and a sexiphenylene group, while preferred arms include an arylene, a branched arylene, and an arylene ether. The thermosetting monomers may advantageously be employed to produce low-k dielectric material in electronic devices, and the dielectric constant of the polymer can be controlled by varying the overall length of the arms.
    Type: Application
    Filed: April 12, 2004
    Publication date: September 30, 2004
    Inventors: Kreisler S. Lau, Feng Quan Liu, Boris A. Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek
  • Patent number: 6797793
    Abstract: A process for producing a polymer of a vinyl ether monomer by contacting the monomer with phosphorous pentoxide as polymerization initiator.
    Type: Grant
    Filed: August 14, 2003
    Date of Patent: September 28, 2004
    Assignee: ISP Investments Inc.
    Inventors: Michael A. Tallon, John Mc Kittrick, Stephen L. Kopolow, James Dougherty, David K. Hood
  • Patent number: 6794110
    Abstract: A polymer blend is provided for use in a lithographic photoresist composition, particularly a chemical amplification photoresist. In a preferred embodiment, the polymer blend is substantially transparent to deep ultraviolet radiation, i.e., radiation of a wavelength less than 250 nm, including wavelengths of 157 nm, 193 nm and 248 nm, and has improved sensitivity and resolution. Processes for preparing and using the polymer blend are also provided, as are lithographic photoresist compositions that contain the polymer blend.
    Type: Grant
    Filed: March 4, 2002
    Date of Patent: September 21, 2004
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Hiroshi Ito, Hoa D. Truong
  • Publication number: 20040176558
    Abstract: A copolymer composition that includes a copolymer comprised of at least 30 mol % of residues having the following alternating residues from a donor monomer and from an acceptor monomer. The copolymer contains at least 15 mol % of an isobutylene type donor monomer and at least 15 mol % of an acrylic monomer as an acceptor monomer. The copolymer is substantially free of maleate or fumarate monomer segments and the copolymer composition is substantially free of Lewis acids and transition metals. Also disclosed is a thermosetting composition that includes a reactant comprising functional groups, a crosslinking agent having at least two functional groups that are reactive with the functional groups first reactant, and a copolymer flow control agent that includes the copolymer composition as well as substrates coated with the thermosetting composition.
    Type: Application
    Filed: October 30, 2003
    Publication date: September 9, 2004
    Inventors: Simion Coca, Edward R. Coleridge, Gregory J. McCollum, James B. O'Dwyer, James E. Poole, Victoria A. Trettel
  • Patent number: 6784268
    Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-25 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation, has excellent sensitivity, resolution, and etching resistance, and lends itself to micropatterning with electron beams or deep-UV.
    Type: Grant
    Filed: July 3, 2003
    Date of Patent: August 31, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi
  • Patent number: 6777519
    Abstract: The present invention is directed to a water-based acrylic emulsion dispersant to be used as a grind resin to incorporate inorganic pigment into a pigment dispersion for a coating composition. The acrylic emulsion dispersant is the reaction product of butyl methacrylate, butyl acrylate, styrene, methyl ether polyethylene glycol methacrylate, polyethylene glycol methacrylate, and polyphosphoric acid. The present invention is also directed to a method of preparing the acrylic emulsion dispersant. In this method, the butyl methacrylate, butyl acrylate, and styrene are combined with water to establish a first reaction blend. Similarly, the methyl ether polyethylene glycol methacrylate and the polyethylene glycol methacrylate are combined with water to establish a second reaction blend. Next, the first and second reaction blends are polymerized to form an intermediate emulsion polymer containing a hydroxyl group from the functionality of the polyethylene glycol methacrylate.
    Type: Grant
    Filed: July 15, 2003
    Date of Patent: August 17, 2004
    Assignee: BASF Corporation
    Inventors: Swaminathan Ramesh, JoAnn Lanza, Paul J. Harris
  • Publication number: 20040152849
    Abstract: The invention relates to a process for the preparation of terpolymers of ethylene and at least 2 further olefinically unsaturated compounds by polymerization in a tubular reactor fitted with at least one side branch, wherein the fresh monomer components, which are introduced into the tubular reactor via the reactor inlet (the primary stream) or via the side branch or side branches (secondary stream or secondary streams), in each of the streams contain ethylene and at most one further olefinically unsaturated compound.
    Type: Application
    Filed: December 30, 2003
    Publication date: August 5, 2004
    Inventors: Matthias Krull, Werner Reimann, Wilhelm Zoller, Heinz Dieter Buhnen, Gerhard Bettermann
  • Patent number: 6762253
    Abstract: The invention relates to a process for the preparation of terpolymers of ethylene and at least 2 further olefinically unsaturated compounds by polymerization in a tubular reactor fitted with at least one side branch, wherein the fresh monomer components, which are introduced into the tubular reactor via the reactor inlet (the primary stream) or via the side branch or side branches (secondary stream or secondary streams), in each of the streams contain ethylene and at most one further olefinically unsaturated compound.
    Type: Grant
    Filed: September 18, 2001
    Date of Patent: July 13, 2004
    Assignee: Clariant GmbH
    Inventors: Matthias Krull, Werner Reimann, Wilhelm Zoller, Heinz Dieter Bühnen, Gerhard Bettermann
  • Patent number: 6762269
    Abstract: A hydrophobe-containing alkali soluble or swellable copolymer thickener comprising an emulsion polymerization product of (A) an ethylenically unsaturated copolymerizable surfactant monomer having a cloud point of from about 65° C. to about 95° C., wherein the surfactant monomer has the formula M(EO)x(BO)zOR1 wherein M is a residue selected from the group consisting of an ethylenically unsaturated carboxylic acid, and an ethylenically unsaturated dicarboxylic acid, EO is an ethylene oxide unit; BO is a butylene oxide unit; x is from 10 to 45; z is from 5 to 35; provided that x+z is from 20 to 45; and R1 is selected from the group consisting of alkyl, alkylene, cycloalkyl, cycloalkylene, and arylalkyl group wherein the alkyl group has 1 to 4 carbon atoms; (B) an &agr;,&bgr;-ethylenically unsaturated monocarboxylic acid monomer; and (C) a nonionic &agr;,&bgr;-ethylenically unsaturated monomer.
    Type: Grant
    Filed: August 13, 1998
    Date of Patent: July 13, 2004
    Assignee: National Starch and Chemical Investment Holding Corporation
    Inventors: Joseph S. Maxim, Jr., James C. Long, Daniel W. Verstrat
  • Publication number: 20040132942
    Abstract: A water-based ink containing an aqueous dispersion of water-insoluble vinyl polymer particles containing a pigment, wherein the water-insoluble vinyl polymer is prepared by copolymerizing a monomer mixture containing (a) a monomer having a salt-forming group, (b) a monomer having a long-chain alkyl group, (c) a macromer, (d) a monomer having a polyoxyalkylene group, and (e) a monomer copolymerizable with the monomer having a salt-forming group (a), the monomer having a long-chain alkyl group (b), the macromer (c) and the monomer having a polyoxyalkylene group (d). The water-based ink can be suitably used, for instance, as a water-based ink for inkjet recording and the like.
    Type: Application
    Filed: December 22, 2003
    Publication date: July 8, 2004
    Applicant: Kao Corporation
    Inventors: Makoto Sakakibara, Nobushige Tanaka, Ryuma Mizushima, Kenji Kaida, Takehiro Tsutsumi
  • Patent number: 6737491
    Abstract: An absorbent binder composition including a monoethylenically unsaturated polymer, such as carboxylic acid, sulphonic acid, or phosphoric acid, or salts thereof, and an acrylate or methacrylate ester that contains an alkoxysilane functionality, or a monomer capable of co-polymerization with a compound containing a trialkoxy silane functional group and subsequent reaction with water to form a silanol group. The absorbent binder composition is particularly suitable for use in manufacturing absorbent articles. A method of making the absorbent binder composition includes preparing a monomer solution, adding the monomer solution to an initiator solution, and activating a polymerization initiator within the initiator solution.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: May 18, 2004
    Assignee: Kimberly-Clark Worldwide, Inc.
    Inventors: Dave Allen Soerens, Jason Matthew Laumer, Kambiz Bayat Makoui
  • Patent number: 6737493
    Abstract: To provide a biocompatible material with a high level of safety at a low cost. The biocompatible material has a polymer synthesized from monomers by an anionic polymerization, wherein the polymer has a ratio (Mw/Mn) of a weight-average molecular weight (Mw) to a number-average molecular weight (Mn) in a range of 1.0 to 1.5, in which the weight-average molecular weight is 40,000 or more, and each of the monomers is represented by a following general formula (1): where R1 is a hydrogen atom or a methyl group; R2 is a C1-C4 alkylene group; and R3 is a C1-C4 alkyl group.
    Type: Grant
    Filed: April 25, 2002
    Date of Patent: May 18, 2004
    Assignees: Terumo Kabushiki Kaisha, Kuraray Co., Ltd.
    Inventors: Akira Mochizuki, Kenichi Shimura, Takao Anzai, Kazushige Ishiura, Kenichi Hamada
  • Patent number: 6734151
    Abstract: A process for efficiently producing a high purity compound having oxygen which has a high volume specific resistance and a lubricating oil comprising the high purity compound having oxygen are provided. The process for producing a high purity compound having oxygen selected from a group consisting of high purity polyvinyl ether compounds, high purity polyalkylene glycol compounds, high purity polyol ester compounds, high purity cyclic polyether compounds and high purity carbonate compounds comprises a step of treating with an adsorbent at least one crude compound having oxygen selected from a group consisting of crude polyvinyl ether compounds, crude polyalkylene glycol compounds, crude polyol ester compounds, crude cyclic polyether compounds and crude carbonate compounds. The lubricating oil comprises the high purity compound having oxygen obtained in accordance with this process.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: May 11, 2004
    Assignees: Idemitsu Kosan Co., Ltd., Kyowa Yuka Co., Ltd.
    Inventors: Minoyuki Kubota, Kazuhiko Suzuki, Hirotaka Yamazaki, Tokuyuki Yoshimoto, Akihisa Ogawa, Shigeru Kamimori
  • Patent number: 6723814
    Abstract: Membranes made from amphiphilic copolymers are disclosed. The amphiphilic copolymers can be ABA copolymers, where one of A and B is hydrophilic and the other is hydrophobic. The copolymers may be crosslinked to form more stable structures. Crosslinking can be accomplished using a variety of methods, including end to end polymerization of copolymers having terminal unsaturated groups. Molecules such as membrane proteins can be incorporated into the membrane to allow the transport there through of selected components.
    Type: Grant
    Filed: May 16, 2001
    Date of Patent: April 20, 2004
    Assignee: BioCure, Inc.
    Inventors: Wolfgang Meier, Corinne Nardin, Mathias Winterhalter
  • Patent number: 6713584
    Abstract: A method of preparing a (meth)acrylate functionalised polymer comprising the steps of mixing together a monofunctional vinylic monomer with from 0.3-100% w/w (based on monofunctional monomer) of a polyfunctional vinylic monomer and from 0.0001-50% w/w of a chain transfer agent, reacting said mixture to form a polymer and terminating the polymerisation reaction before 99% conversion. The resulting polymers are useful as components of surface coatings and inks, as moulding resins or in curable compounds, e.g. curable moulding resins or photoresists.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: March 30, 2004
    Assignee: Lucite International UK Limited
    Inventors: Michael Stephen Chisholm, Andrew Trevithick Slark
  • Patent number: 6706838
    Abstract: The invention provides an explosive composition comprising A) an oxygen-donating constituent, which forms a disperse phase, B) an organic constituent, which forms a dispersion phase, and C) at least one emulsifier, wherein the emulsifier includes a copolymer comprising, in random or regular order, structural units derived from a) maleic anhydride, b) one or more olefins having more than 40 carbon atoms, and c) a vinyl ester of carboxylic acids having from 2 to 12 carbon atoms, where the structural units derived from maleic anhydride have been modified by reaction with alcohols, amino alcohols, ammonia or amines.
    Type: Grant
    Filed: January 16, 2003
    Date of Patent: March 16, 2004
    Assignee: Clariant GmbH
    Inventors: Peter Klug, Ralf Bender
  • Patent number: 6703139
    Abstract: The present invention relates to a weather-resistant composition comprising a bisbenzotriazolylphenol compound represented by the general formula (1): [wherein A represents an alkylene group, and R1 and R2 represent a group (B): (in which R3 and R4 represent an alkyl group)], a meth)acrylate compound, and a curing agent; a coating material containing the weather-resistant composition as a main component; and a molded article. The composition can form a coating film which is not impaired in mechanical strength, exhibits excellent weather resistance, metal ion resistance and transparency for a prolonged period, and is less likely to cause surface cracks.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: March 9, 2004
    Assignee: Otsuka Chemical Co., Ltd.
    Inventors: Takashi Ogawa, Koji Mori, Mitsuo Akada
  • Publication number: 20040044116
    Abstract: A waterborne radiation curable coating composition containing at least one acrylate functional oligomer having a functionality greater than 3 and at least one vinyl ether oligomer having a functionality greater than 1 provides a cured coating resists deep scratches.
    Type: Application
    Filed: August 27, 2002
    Publication date: March 4, 2004
    Inventors: Keith E. Olson, Bryan M. Anderson
  • Patent number: 6699951
    Abstract: Disclosed are a monomer, a polymer for a photoresist, a photoresist composition and a phosphor layer for a cathode ray tube.
    Type: Grant
    Filed: February 14, 2002
    Date of Patent: March 2, 2004
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Beom-Wook Lee, Ik-Chul Lim, Seung-Joon Yoo
  • Publication number: 20040024159
    Abstract: The invention provides an explosive composition comprising
    Type: Application
    Filed: January 16, 2003
    Publication date: February 5, 2004
    Applicant: Clariant GmbH
    Inventors: Peter Klug, Ralf Bender
  • Patent number: 6686124
    Abstract: A multifunctional polymer comprising a polymeric chain having chromophore groups and cross-linking sites is suitable as a resist material and especially as the underlayer for bilayer and top surface imaging strategies. The multifunctional polymer can function as an antireflective coating, planarizing layer or etch resistant hard mask.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: February 3, 2004
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Katherina E. Babich, David R. Medeiros, Wayne M. Moreau
  • Patent number: 6686432
    Abstract: A copolymer composition that includes a copolymer comprised of at least 30 mol % of residues having the following alternating residues from a donor monomer and from an acceptor monomer. The copolymer contains at least 15 mol % of an isobutylene type donor monomer and at least 15 mol % of an acrylic monomer as an acceptor monomer. The copolymer is substantially free of maleate or fumarate monomer segments and the copolymer composition is substantially free of Lewis acids and transition metals. Also disclosed is a thermosetting composition that includes a reactant comprising functional groups, a crosslinking agent having at least two functional groups that are reactive with the functional groups first reactant, and a copolymer flow control agent that includes the copolymer composition as well as substrates coated with the thermosetting composition.
    Type: Grant
    Filed: February 15, 2002
    Date of Patent: February 3, 2004
    Assignee: PPG Industries Ohio, inc.
    Inventors: Simion Coca, Edward R. Coleridge, Gregory J. McCollum, James B. O'Dwyer, James E. Poole, Victoria A. Trettel
  • Patent number: 6677422
    Abstract: A method of making a copolymer composition containing a copolymer, which includes the steps of (a) providing a donor monomer composition that includes an isobutylene type monomer; (b) mixing the donor monomer composition with an ethylenically unsaturated monomer composition that includes one or more ethylenically unsaturated acceptor monomers, and is substantially free of maleate type monomers and fumarate type monomers, and (c) polymerizing the mixture resulting from step (b) in the presence of a free radical polymerization initiator. The polymerization is carried out in the substantial absence of Lewis acids and/or transition metals. The isobutylene type monomer is present at a molar excess of at least 10 mol % based on the molar concentration of monomers in the ethylenically unsaturated monomer composition. The ethylenically unsaturated acceptor monomers are present in an amount of at least 15 mol % of the total monomer composition.
    Type: Grant
    Filed: February 15, 2002
    Date of Patent: January 13, 2004
    Assignee: PPG Industries Ohio, Inc.
    Inventors: Simion Coca, Edward R. Coleridge, Gregory J. McCollum, James B. O'Dwyer, James E. Poole, Victoria A. Trettel
  • Patent number: 6673513
    Abstract: There are provided a photosensitive polymer having a copolymer of alkyl vinyl ether and a resist composition containing the same. The photosensitive polymer includes a copolymer of alkyl vinyl ether and maleic anhydride, represented by the following structure: wherein X is one of a linear alkyl vinyl ether and a cyclic alkyl vinyl ether, which are respectively represented by the structures wherein y is one of the integer values 1 through 4, R1 is one of a hydrogen atom and a methyl group, R2 is a C1 to C20 hydrocarbon, and R3 is one of a hydrogen atom, a C1 to C3 alkyl group and an alkoxy group.
    Type: Grant
    Filed: January 19, 2001
    Date of Patent: January 6, 2004
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Sang-jun Choi, Hyun-woo Kim
  • Publication number: 20030236369
    Abstract: The present invention relates to a fluorine-containing copolymer.
    Type: Application
    Filed: June 25, 2002
    Publication date: December 25, 2003
    Applicant: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Sunao Koga, Kentaro Tsutsumi, Kazuhiko Maeda
  • Publication number: 20030224172
    Abstract: An in-mold primer coating adapted to be applied in-mold to a thermoplastic substrate and heat cured to form a thermoset surface coating on the molded substrate. The in-mold primer coating comprises a coreactive polymerizable composition comprising an epoxy-acrylate oligomer having a molecular weight from about 350 to about 2500, a hydroxyl functional acrylate or methacrylate, a vinyl aromatic monomer such as styrene, and a small amount of acrylic or methacrylic acid, with the balance being other diacrylate and/or other ethylenically unsaturated monomer(s), if any.
    Type: Application
    Filed: May 31, 2002
    Publication date: December 4, 2003
    Applicant: OMNOVA Solutions Inc.
    Inventor: Douglas S. McBain
  • Patent number: 6653425
    Abstract: The invention is directed to the preparation of vinyl sulfide compounds of general formula —(—R1—S—R4C═CR5—R3—S—)n—(—R2—S—R4C═CR5—R3—S—)m, where m and n are integers in the range of 1-1000, are formed by the addition of a dithiol compound of general formula HS—R1—SH to an acetylenic compound of general formula HC≡C—R3—S—R2≡S—R3—C—CH2. These vinyl sulfide compounds can be homopolymerized or copolymerized with second monomers, oligomers or polymers that are capable of reacting with their carbon-carbon double bond. The vinyl sulfide compounds have a high refractive index (1.60 or higher at 632 nm) and can be used to make optical telecommunication elements and devices. They are soluble in selected solvents and such solutions can be applied to substrates by various methods such as spin coating, dipping, spraying and other methods known in the art.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: November 25, 2003
    Assignee: Corning Incorporated
    Inventors: Eyerce L. Armstrong-Poston, Paul J. Shustack, Jianguo Wang
  • Patent number: 6649717
    Abstract: The invention encompasses a composition of vinyl compounds, comprising a) at least one polymerizable compound which has at least one O-vinyl group or one N-vinyl group, and b) at least one ammonium salt of the formula (I) where R is NH2, O− NH4+, C1-C18-alkyl, C6-C18-cycloalkyl, or C7-C18-alkylcycloalkyl. The invention further relates to the use of an ammonium salt of the formula (I) as additive to polymerizable compounds which have at least one O-vinyl group or one N-vinyl group, and also to a process for inhibiting premature polymerization of compositions which comprise polymerizable compounds which have at least one O-vinyl group or one N-vinyl group, which encompasses adding to the compositions an ammonium salt of the formula (I).
    Type: Grant
    Filed: August 15, 2001
    Date of Patent: November 18, 2003
    Assignee: BASF Aktiengesellschaft
    Inventors: Thomas Preiss, Rudolf Erich Lorenz, Sabine Weiguny, Jochem Henkelmann
  • Patent number: 6642338
    Abstract: The present invention is directed to a water-based acrylic emulsion dispersant to be used as a grind resin to incorporate inorganic pigment into a pigment dispersion for a coating composition. The acrylic emulsion dispersant is the reaction product of butyl methacrylate, butyl acrylate, styrene, methyl ether polyethylene glycol methacrylate, polyethylene glycol methacrylate, and polyphosphoric acid. The present invention is also directed to a method of preparing the acrylic emulsion dispersant. In this method, the butyl methacrylate, butyl acrylate, and styrene are combined with water to establish a first reaction blend. Similarly, the methyl ether polyethylene glycol methacrylate and the polyethylene glycol methacrylate are combined with water to establish a second reaction blend. Next, the first and second reaction blends are polymerized to form an intermediate emulsion polymer containing a hydroxyl group from the functionality of the polyethylene glycol methacrylate.
    Type: Grant
    Filed: December 22, 2000
    Date of Patent: November 4, 2003
    Assignee: BASF Corporation
    Inventors: Swaminathan Ramesh, JoAnn Lanza, Paul J. Harris
  • Patent number: 6642334
    Abstract: Described herein is a pentaalkyldisiloxane containing polymeric surfactant prepared by the copolymerization of an alkoxypolyoxyalkylenyl acrylate and an acrylate containing a pentaalkyldisiloxane group. A method for preparing beaded polyethylene glycol-based resins in silicone oil in the presence of a polymeric surfactant containing a pentaalkyldisiloxane group is also described. The average bead size can be controlled by varying the stirring rate, the polymerization temperature, the amount of surfactant, the type of solvent, and the amount of solvent. The surfactant does not interfere with the polymerization and can be removed together with residual silicone oil by a simple washing procedure. The resins can be used, for example, as a support for solid phase organic synthesis, as a chromatographic resin, as a resin for solid phase MAS-NMR spectroscopy, and as a carrier for drug molecules, various reagents, or scavengers.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: November 4, 2003
    Assignee: Carlsberg A/S
    Inventors: Morten Grøtli, Morten Peter Meldal
  • Patent number: 6639036
    Abstract: A chemically amplified resist composition consists of an acid generating agent, additive, solvent and a copolymer represented by the following formula: where R1, R2 and R6 are independent of each other and respectively include a hydrogen atom or an alkyl, alkoxymethylene, alkoxyethylene, phenyl, alkoxyalkylene, alkylphenyl, alkoxyphenyl, allyl, benzyl, alkylbenzyl, alkoxybenzyl containing 1 to 34 carbon atoms having or not having an hydroxy, ether, ester, carbonyl, acetal, epoxy, nitrile or aldehyde; R5 is a hydrogen atom, an alkyl or alkoxy group containing 1 to 18 carbon atoms; R7 is a hydrogen atom, an alkyl group containing 1 to 18 carbon atoms, an alkyl group containing alkoxy 1 to 18 carbon atoms or an alkyl group containing ester of 1 to 18 carbon atoms; R3 and R4 are independent and respectively include a hydrogen atom, hydroxy, nitrile, aldehyde, hydroxymethylene, and alkylcarbonyloxy, alky, hydroxyalkylene, alkoxycarbonyl, alkoxymethylene or alkoxyalkanyl group containing 1 to 18 c
    Type: Grant
    Filed: January 24, 2002
    Date of Patent: October 28, 2003
    Assignee: Korea Kumho Petrochemical Co. Ltd.
    Inventors: JooHyeon Park, DongChul Seo, YoungTaek Lim, HyunSang Joo, SeongDuk Cho, SeongJu Kim
  • Publication number: 20030181619
    Abstract: Improved processes for atom (or group) transfer radical polymerization (ATRP) and novel polymers have been developed and are described. In certain embodiments, novel copolymers comprising a least one polymeric branch or polymeric block with a predominantly alternating monomer sequence are described. Novel copolymers comprising a least one polymeric branch or polymeric block with a gradient monomer structure are described. Additionally, novel copolymers comprising a least one polymeric branch or polymeric block with a predominantly periodic monomer sequence are also described. Novel copolymers having a water soluble backbone and at least two hydrophobic polymeric branches grafted to the water soluble backbone are also described.
    Type: Application
    Filed: November 7, 2002
    Publication date: September 25, 2003
    Inventors: Krzysztof Matyjaszewski, Simion Coca, Scott G. Gaynor, Dorota Greszta, Timothy E. Patten, Jin-Shan Wang, Jianhui Xia
  • Patent number: 6624271
    Abstract: A process for making a solution of a copolymer of maleic anhydride (MA) and methyl vinyl ether (MVE) monomers the specific viscosity (SV) of the product being about 2.5-6, preferably 3-5, indicating a weight average molecular weight of substantially above one million, preferably above 1.5 million and a solids content of about 20-45%, preferably 30-40, in isopropyl acetate (IPAc), solvent includes the steps of (a) precharging part of MVE in IPAc into a reactor heated to about 50-90° C., and then (b) feeding (i) a solution of MA in IPAc, (ii) the rest of MVE, at a mole ratio of MA:MVE of 1:≧1.5 to 1:<3, preferably 1:2.4, and (iii) a free radical initiator dissolved in IPAc, in an amount of 0.02-0.3%, preferably 0.05-0.2%, based on total monomers, into the reactor over time. Powders of such MA/MVE copolymers are made by removing the solvent from the solution.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: September 23, 2003
    Assignee: ISP Investments Inc.
    Inventors: Yoon Tae Kwak, Stephen L. Kopolow, Alan J. Carlin
  • Patent number: 6624335
    Abstract: An ether compound of formula (1) is provided wherein R1 is H or C1-6 alkyl, R2 is C1-6 alkyl, R3 is H, C1-15 acyl or C1-15 alkoxycarbonyl which may be substituted with halogen atoms, k is 0 or 1, m is from 0 to 3, and n is from 3 to 6. The ether compound is polymerized to form a polymer having improved reactivity, robustness and substrate adhesion.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: September 23, 2003
    Assignee: Shin Etsu Chemical Co., Ltd.
    Inventors: Seiichiro Tachibana, Mutsuo Nakashima, Tsunehiro Nishi
  • Patent number: 6613857
    Abstract: A composition that can be coated as a hot melt or as a high solids content solution comprises, on a percent-by-weight basis, 85-99.7% of at least one acrylic copolymer, 0.1-5% of at least one photoinitiator, and 0.2-10% of at least one multifunctional (meth)acrylate. The composition is readily crosslinked by exposure to ultraviolet light to yield a high-performance acrylic PSA.
    Type: Grant
    Filed: July 26, 2002
    Date of Patent: September 2, 2003
    Assignee: Avery Dennison Corporation
    Inventors: Carol A. Koch, Liem T. Ang
  • Patent number: 6613855
    Abstract: The invention provides a polymerizable resin capable of forming thin insulating films excellent in heat resistance, solvent resistance, low water absorption, insulating property, low dielectric constant, etc.
    Type: Grant
    Filed: March 23, 2000
    Date of Patent: September 2, 2003
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Munekazu Satake, Masahito Inoue, Takao Saito
  • Patent number: 6605408
    Abstract: A hydrogenated product of a ring-opening metathesis polymer comprising structural units as shown below has improved heat resistance, pyrolysis resistance and light transmission and is suited as a photoresist for semiconductor microfabrication using UV or deep-UV. A resist composition comprising the polymer as a base resin is sensitive to high-energy radiation and has excellent sensitivity, resolution, and etching resistance.
    Type: Grant
    Filed: April 12, 2001
    Date of Patent: August 12, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsunehiro Nishi, Takeshi Kinsho, Shigehiro Nagura, Tomohiro Kobayashi, Satoshi Watanabe
  • Patent number: 6573325
    Abstract: An aqueous surface treatment composition, methods for the production thereof, and an apparatus for the preparation of aqueous surface treatment compositions. The composition comprises a water soluble thickening polymeric thickening agent, water and a basic neutralizing agent. Additionally, coloring agents and polyols may be added to the composition. The polymeric water soluble thickening agent and basic neutralizing agent are present in sufficient quantity to afford a viscous composition that, upon application to a suitable surface, provide a surface treatment. The apparatus useful for the production of aqueous surface treatment compositions simultaneously and rapidly mixes and dispenses a fast forming viscous compositions.
    Type: Grant
    Filed: April 28, 2000
    Date of Patent: June 3, 2003
    Inventors: David York, Jack Currie, Ted Morton
  • Patent number: 6569973
    Abstract: A process of making a vinyl caprolactam (VCL)-based polymer which comprises suspension polymerizing the monomers in aqueous medium in the absence of an added protective colloid, wherein polymer formed at an early stage of the polymerization functions as a dispersing agent to maintain polymer particles suspended in water throughout the polymerization.
    Type: Grant
    Filed: July 6, 2001
    Date of Patent: May 27, 2003
    Assignee: ISP Investments Inc.
    Inventors: Jui-Chang Chuang, Jenn S. Shih, Michael A. Drzewinski
  • Patent number: 6562928
    Abstract: What is described herein is a terpolymer of maleic acid (MAA)/maleic anhydride (MAN)/alkylvinylether (AVE), made by partial cyclization, e.g. 1-99%, of a maleic acid/alkylvinylether copolymer, preferably comprising, in mole %, 1-49% MAA/1-49% MAN/50% AVE, and derivatized terpolymers thereof.
    Type: Grant
    Filed: June 19, 2002
    Date of Patent: May 13, 2003
    Assignee: ISP Investments Inc.
    Inventor: Krystyna Plochocka