From Ketone-containing Phenolic Reactant Or With Ketone-containing Reactant Patents (Class 528/125)
  • Patent number: 8969504
    Abstract: Poly(aryletherketone)s comprising fluoride end groups having improved melt stability, lower gel content and lower color are provided.
    Type: Grant
    Filed: December 5, 2013
    Date of Patent: March 3, 2015
    Assignee: Solvay Specialty Polymers USA, L.L.C.
    Inventors: Chantal Louis, Satchit Srinivasan, William Gandy
  • Patent number: 8952121
    Abstract: A novel novolac prepared by acid catalyzed condensation between biphenols or bisphenofluorenes and fluorenone is presented. The polymers exhibit excellent oxidative thermal stability and high carbon content, suitable for dielectric, etch stop applications as spin-on material.
    Type: Grant
    Filed: June 6, 2012
    Date of Patent: February 10, 2015
    Assignee: Silecs OY
    Inventor: Jyri Paulasaari
  • Publication number: 20150038666
    Abstract: A bulk heterojunction-type organic photovoltaic cell, i.e., BHJ solar cell, has a photoelectric conversion layer containing a mixture of a donor domain and an acceptor domain. The donor domain contains a polymer as a donor (photoelectric conversion material), and the polymer is obtained by reaction of a polyphenylene having a structural unit selected from moieties represented by the following general formulae (1) to (3). For example, the acceptor domain contains phenyl-C61-butyric acid methyl ester (PCBM) as an acceptor. R1 to R8 in the general formulae (1) to (3) independently represent a hydrogen atom, an alkyl group, or an alkoxy group.
    Type: Application
    Filed: July 29, 2014
    Publication date: February 5, 2015
    Inventors: Takahiro MIYAZAKI, Kazuhiro MIURA, Tadahiro SHIBA
  • Publication number: 20140374887
    Abstract: There is provided a composition for forming a passivation film that satisfies electric insulation, heat-tolerance, solvent-tolerance, and a dry etch back property at the same time.
    Type: Application
    Filed: February 8, 2013
    Publication date: December 25, 2014
    Applicant: NISSAN CHEMICAL IMDUSTRIES, LTD.
    Inventors: Mamoru Tamura, Hiroshi Ogino, Tomoyuki Enomoto
  • Patent number: 8916674
    Abstract: A method for preparing series of terpolymer of poly (diphenyl ether sulfone) and poly (diphenyl ether diphenyl sulfone) comprises: adding high temperature organic solvent, stirring and heating; sequentially adding 4,4?-dihydroxydiphenyl, 4,4?-dichlorodiphenyl sulfone and 4,4?-Bis(4-chlorophenyl)sulfonyl-1,1?-biphenyl; after all the monomers are completely dissolved, heating to 100° C. and adding alkali metal carbonate salt-forming agent which is 5-10 mol % more than the amount of 4,4?-dihydroxydiphenyl added, and subsequently adding xylene; continuously heating and salt-forming reaction begins in the system, and controlling the temperature at 190˜210° C.; then heating to 230˜236° C., and maintaining for 3-4 hours to obtain polymer viscous liquid; and refining the polymer viscous liquid to obtain a terpolymer containing different structural units in the molecular chain, wherein the Tg of the terpolymer can be regulated by changing the ratio of the two dichloro-containing monomers.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: December 23, 2014
    Assignee: Kingfa Sci & Tech Co., Ltd.
    Inventors: Zhongwen Wu, Rongtang Ma, Xiangbin Zeng
  • Patent number: 8916672
    Abstract: The present disclosure relates to a transparent polyarylene ether polymer with high heat resistance and a method for preparing the same. More particularly, the present disclosure relates to a polyarylene ether polymer and a method for preparing the same, wherein the polyarylene ether polymer has a repeating structure in which cardo-type aromatic diols having a large molecular volume, polyether sulfones which are amorphous polymers having a high glass transition temperature and superior film formability, and polyether ketones which are crystalline polymers having superior heat resistance and mechanical properties are sequentially arranged. The polyarylene ether polymer is both transparent and heat resistant and, thus, can be used, for example, for a flexible plastic substrate.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: December 23, 2014
    Assignee: ICUF-HYU (Industry-University Cooperation Foundation Hanyang University)
    Inventors: Yang Kyoo Han, Gyoung Pyo Kong, Moon Ki Kim, Bo Ra Hong, Hyun Aee Chun
  • Publication number: 20140357829
    Abstract: The invention provides a novel platform for minimal- or non-flammable polymers, which is based purely on hydrocarbon systems and does not need additives of any kind A key feature is that the hydrocarbons disclosed herein are characterized by degradation mechanisms that produce few flammable volatiles. For example, 2,4,4?,6-tetrahydroxydeoxybenzoin is employed as a multifunctional cross-linker in conjunction with bis-epoxydeoxybenzoin, affording new resins that combine excellent physical and mechanical properties with low flammability.
    Type: Application
    Filed: May 19, 2014
    Publication date: December 4, 2014
    Inventors: Todd Emrick, Justin Timmons, Megan Warner Szyndler
  • Patent number: 8889817
    Abstract: Triazine polymer comprising at least a plurality of base structural units comprising at least a moiety corresponding to the formula: in which: the symbols X1 and X2, which are identical or different, represent S, SO, or SO2; the symbols Ar1 and Ar2, which are identical or different, represent a substituted or unsubstituted phenylene group; the symbol Ar3 represents a substituted or unsubstituted phenyl group; the symbol Tz represents the 1,3,5-triazine nucleus. This polymer of the invention, which can be used as electrolyte in a PEM fuel cell, makes it possible to obtain membranes of high chemical and dimensional stability which additionally exhibit a high ion conductivity.
    Type: Grant
    Filed: July 6, 2011
    Date of Patent: November 18, 2014
    Assignees: Compagnie Generale des Etablissements Michelin, Michelin Recherche et Technique S.A.
    Inventors: Milan Fedurco, Antonio Delfino
  • Patent number: 8859185
    Abstract: A resist underlayer film-forming composition includes a polymer including a repeating unit shown by a formula (1), and having a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and a solvent. Each of R3 to R8 individually represent a group shown by the following formula (2) or the like. R1 represents a single bond or the like. R2 represents a hydrogen atom or the like.
    Type: Grant
    Filed: July 22, 2013
    Date of Patent: October 14, 2014
    Assignee: JSR Corporation
    Inventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
  • Publication number: 20140265015
    Abstract: A method for preparing bones of cerebral cranium, including: a) selecting polyetheretherketone (PEEK) as a raw material according to data obtained by computed tomography (CT) of a patient; b) heating the PEEK material in a heating device to reach a softening point of 260°±10°; c) hot pressing the heated PEEK material obtained in step b) in a forming die, cooling and shaping the PEEK material to yield a blank; d) curing the blank, and placing the blank in a thermostat for removal of internal stress and resilience; e) removing surface crystals and impurities of the blank resulting from the hot pressing; f) mechanically processing the blank according to the CT data of the patient to yield a product having desired size and shape; and g) washing, disinfecting, and packaging the product.
    Type: Application
    Filed: May 29, 2014
    Publication date: September 18, 2014
    Applicant: WUHAN CONSTANT SCIENCE AND TECHNOLOGY LTD.
    Inventor: Dengfeng HUANG
  • Publication number: 20140275324
    Abstract: Photoactive additives are disclosed. The additive is formed from the reaction of a dihydroxybenzophenone, one or more linker moieties having functional groups that react with the phenolic groups, a diol chain extender, and an end-capping agent. If desired, a secondary linker moiety can be used. When added to a base polymeric resin, the photoactive additive permits crosslinking when exposed to ultraviolet light.
    Type: Application
    Filed: March 13, 2014
    Publication date: September 18, 2014
    Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
    Inventors: Jean-Francois Morizur, Paul Dean Sybert
  • Patent number: 8829060
    Abstract: A membrane comprising a blend of a sulfonated poly(aryl ether) and a phenol compound along with methods for making and using the same. Many additional embodiments are described including applications for such membranes.
    Type: Grant
    Filed: February 21, 2012
    Date of Patent: September 9, 2014
    Assignee: Dow Global Technologies LLC
    Inventors: William E. Mickols, John C. McKeen
  • Publication number: 20140246400
    Abstract: A resin having a fluorene structure, a relatively high carbon concentration in the resin, a relatively high heat resistance and a relatively high solvent solubility has a structure represented by wherein each of R3 and R4 independently denotes a benzene ring or a naphthalene ring, a carbon atom at the bridgehead of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom of each of other aromatic rings, and a carbon atom of each of aromatic rings of a fluorene backbone or (di)benzofluorene backbone is bonded with a carbon atom at the bridgehead of other fluorene backbone or (di)benzofluorene backbone. The resin can be applied to a wet process. Methods for producing the resin, for forming an underlayer film useful for forming a novel resist, and for pattern forming using the material, and an underlayer film excellent in heat resistance and etching resistance for multilayer resist are described.
    Type: Application
    Filed: September 4, 2012
    Publication date: September 4, 2014
    Applicant: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Go Higashihara, Naoya Uchiyama, Masatoshi Echigo
  • Patent number: 8816038
    Abstract: Disclosed is a polymer which is useful for the preparation of an epoxy resin composition or a cured product thereof in film or sheet exhibiting high heat resistance, high thermal conductivity, low thermal expansion, high gas barrier property, and high toughness. The polymer is a thermoplastic aromatic ether polymer comprising a unit represented by the following general formula (1) at a ratio of 10 to 100 mol % and having a weight average molecular weight of 3,000 or more; in formula (1), X is an oxygen atom or a sulfur atom, R1 and R2 each is a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group, an alkoxy group, an aralkyl group, or a halogen atom, and n is a number of 1 to 3.
    Type: Grant
    Filed: January 10, 2007
    Date of Patent: August 26, 2014
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami
  • Publication number: 20140235787
    Abstract: Polymers comprising polyetheretheretherketone and polyetherdiphenyletherketone and polymers comprising polyetheretheretherketone and polyetheretherethersulphone are described which have advantageous Tn and/or Tg properties.
    Type: Application
    Filed: October 10, 2012
    Publication date: August 21, 2014
    Inventors: Carlo Capra, Christoper Peter Tyler, Brian Wilson
  • Publication number: 20140227887
    Abstract: A phenolic self-crosslinking polymer whose self-crosslinking reaction at a heating step is performed without additives for hardening the polymer, and a composition of resist-underlayer-film containing the same, are disclosed.
    Type: Application
    Filed: September 5, 2012
    Publication date: August 14, 2014
    Inventors: Jeong-Sik Kim, Jae-Hyun Kim, Jae-Woo Lee
  • Publication number: 20140213671
    Abstract: Provided are an aromatic sulfonic acid derivative and a sulfonic acid group-containing polymer, each of which has excellent proton conductivity even under low humidification conditions, while having excellent mechanical strength and chemical stability, and enables a solid polymer fuel cell to achieve high output and excellent physical durability when used therein. This aromatic sulfonic acid derivative has a specific structure and is characterized in that a sulfonic acid group is introduced into more than 50% of all the phenyl groups. This sulfonic acid group-containing polymer is characterized by being obtained by polymerization using the aromatic sulfonic acid derivative, and is also characterized by having a specific structure.
    Type: Application
    Filed: June 27, 2012
    Publication date: July 31, 2014
    Applicant: TORAY INDUSTRIES, INC.
    Inventors: Daisuke Izuhara, Hiroaki Umeda, Emi Amano, Tomoyuki Kunita
  • Publication number: 20140206833
    Abstract: A method for producing polycarbonate by melt polymerization can comprise: (a) adding acetone, diaryl carbonate, and dihydroxy compound to the melt polymerization unit, wherein the acetone is added to the melt polymerization unit as a mixture with the diaryl carbonate and/or the dihydroxy compound; (b) adding a catalyst to the melt polymerization unit, optionally without separating out acetone prior to the addition of the catalyst; and (c) operating the melt polymerization unit under conditions so that the diaryl carbonate(s) and dihydroxy compound(s); dihydroxy compound reacts with the diaryl carbonate to produce polycarbonate with a desired specification, and a phenol by-product.
    Type: Application
    Filed: December 17, 2012
    Publication date: July 24, 2014
    Applicant: SABIC Innovative Plastics IP B.V.
    Inventors: Ignacio Vic Fernandez, Fernan Mateos Salvador, Mykhaylo Lyakhovych, Sergio Ferrer Nadal
  • Patent number: 8754186
    Abstract: An object of the present invention is to provide a polyimide precursor composition that can be cured at low temperatures (250° C. or lower), while having a low viscosity even at a high concentration, and a method of producing the same. Another object of the present invention is to provide a polyimide coating film obtained from the polyimide precursor composition and having good physical properties, and a method of producing the same. Furthermore, another object of the present invention is to provide a photosensitive resin composition containing the polyimide precursor composition, and a method of producing the same. These objects can be achieved by the polyimide precursor composition containing an imidized tetracarboxylic acid having a specific structure and a diamine having a specific structure.
    Type: Grant
    Filed: December 19, 2007
    Date of Patent: June 17, 2014
    Assignee: Kaneka Corporation
    Inventors: Kan Fujihara, Tetsuya Kogiso, Yoshihide Sekito
  • Publication number: 20140155569
    Abstract: A chemical compound of structural formula (I) useful in preparation of flame retardant materials is disclosed. Homopolymer, and copolymers of a compound of formula (I), as well as methods of preparing said homo- and copolymers are also disclosed. Polymers described herein advantageous possess low heat release capacities and high char yields.
    Type: Application
    Filed: April 30, 2012
    Publication date: June 5, 2014
    Applicant: UNIVERSITY OF MASSACHUSETTS
    Inventors: Jayant Kumar, E. Bryan Coughlin, Todd Emrick, Bon-Cheol Ku, Sethumadhavan Ravichandran, Subhalakshmi Nagarajan, Ramaswamy Nagarajan, Weeradech Kiratitanavit
  • Publication number: 20140144325
    Abstract: A gas separation membrane having a polyimide structure.
    Type: Application
    Filed: April 23, 2013
    Publication date: May 29, 2014
    Inventor: Central Glass Company, Limited
  • Patent number: 8735531
    Abstract: A diol from which a resin material having high processability and a high refractive index can be manufactured, a polycarbonate resin and a polyester resin which is a polymer of the diol, and a molded article and an optical element formed of the polymer. The diol is represented by the general formula (1) shown below; the polycarbonate resin and the polyester resin are polymers thereof; and the molded article and the optical element are formed of the polymers, wherein R1 and R2 each independently denote one of a hydrogen atom and an alkyl group having 1 or more and 6 or less carbon atoms; Q denotes one of an oxyethylene group, a thioethylene group and a single bond.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: May 27, 2014
    Assignee: Canon Kabushiki Kaisha
    Inventors: Katsumoto Hosokawa, Takahiro Kojima, Toshikazu Takata, Kazuko Nakazono, Yasuhiro Kohsaka, Yasuhito Koyama, Toshihide Hasegawa, Ryota Seto
  • Patent number: 8729214
    Abstract: A method for the purification of aromatic polyether polymers prepared by a halide displacement polymerization process comprises adsorbing the catalyst with an alkali metal halide to form an adsorbent component and then removing the adsorbent component. Mixtures resulting from this method are also discussed.
    Type: Grant
    Filed: February 5, 2013
    Date of Patent: May 20, 2014
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Beatriz Penalver Bernabe, Thomas Guggenheim, David Bruce Hall, Norman Johnson, Juan Justino Rodriguez Ordonez, David Woodruff
  • Patent number: 8722842
    Abstract: The present invention provides an optical film exhibiting wavelength dispersion such that a retardation value is smaller on the shorter wavelength side, and capable of being also formed comparatively thinly. The optical film of the present invention is an optical film including a polyimide-based polymer represented by the following general formula (I). In the formula (I), m is 40% by mol or more and 100% by mol or less. R1 and R2 each independently denote a substituent having a carbon-carbon double bond or a triple bond. A, A?, B, B?, E, G, and H each denote a substituent, and small letters corresponding to these alphabets denote substitution number thereof. X and Y each independently denote bond part such as a covalent bond. The substituents having a carbon-carbon double bond or a triple bond represented by R1 and R2 are a substituted or unsubstituted aryl group, a substituted or unsubstituted vinyl group, and a substituted or unsubstituted ethynyl group.
    Type: Grant
    Filed: April 3, 2008
    Date of Patent: May 13, 2014
    Assignee: Nitto Denko Corporation
    Inventors: Toshiyuki Iida, Yutaka Ohmori, Miyuki Kurogi
  • Patent number: 8710171
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the removal of such impurities.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: April 29, 2014
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Patent number: 8710176
    Abstract: A method of producing a sulfonated polyarylether block copolymer is provided. The method includes producing a sulfonated polyarylether block copolymer containing a hydrophobic segment having a structural unit represented by formula (5) and a hydrophilic segment having a structural unit having a sulfonic acid groups or derivative thereof incorporated into a structure represented by formula (6). A hydrophilic segment prepolymer having a sulfonic acid group in a potassium salt form and a hydrophobic segment prepolymer are block copolymerized. A proton conductor that includes the sulfonated polyarylether block copolymer is also provided.
    Type: Grant
    Filed: March 2, 2012
    Date of Patent: April 29, 2014
    Assignee: Ube Industries, Ltd.
    Inventors: Tetsuji Hirano, Nobuharu Hisano, Tatsuya Arai, Masayuki Kinouchi
  • Patent number: 8648155
    Abstract: The present description discloses a polymeric composition which is a melt-processed alloy comprised of (a) a polyarylene sulfide resin, (b) a polyaryl-ether-ketone resin, and a reactive compound which results in (c) a graft copolymer of the polyarylene sulfide resin and/or the polyaryl-ether-ketone resin in addition to the starting resins. Exemplary melt-processed polymeric compositions can be made by reacting an alkoxy silane with the polyarylene sulfide resin and/or the polyaryl-ether-ketone resin to produce a graft copolymer of a portion of one or both of the resins, sufficient to render the composition uniform and homogeneous. It is normally preferred for the exemplary organosilane compound, to be an amino silane. The subject invention further reveals an insulated wire comprising (1) an electrical conductor and (2) a layer of the melt-processed alloy composition; and fiber reinforced composites comprising fibers substantially fully impregnated with the alloy polymeric composition.
    Type: Grant
    Filed: April 27, 2012
    Date of Patent: February 11, 2014
    Assignee: Ticona LLC
    Inventors: Manoj Ajbani, Andrew Auerbach, Ke Feng
  • Patent number: 8642713
    Abstract: Improved poly(aryletherketone)s with superior melt stability, lower gel content and lower color and a new process for their manufacture.
    Type: Grant
    Filed: August 8, 2008
    Date of Patent: February 4, 2014
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventors: Chantal Louis, Satchit Srinivasan, William Gandy
  • Patent number: 8633256
    Abstract: A process for creating polyolefin blends from waste streams with controlled rheological properties can include processing a waste stream to make a mixture comprising a mixture comprising polypropylene and polyethylene and compounding the mixture with one or more peroxides or nitroxides to produce a polyolefin blend. For example, a process can include: determining the required melt flow rate of the end product; determining the ratio of polyethylene to polypropylene to achieve the required melt flow rate; effecting a separation of polypropylene from polyethylene to achieve the desired composition; determining the amount of peroxide or peroxide concentrate required to increase the melt flow rate to the required level; melt compounding the mixture; evaluating the melt flow rate of the product; and adjusting the composition of polyethyelene and polypropylene or the amount of peroxide added if necessary to achieve the required melt flow rate.
    Type: Grant
    Filed: August 15, 2012
    Date of Patent: January 21, 2014
    Assignee: MBA Polymers, Inc.
    Inventors: Brian L. Riise, Hyung Baek
  • Patent number: 8629232
    Abstract: A polymeric material includes phenyl moieties, ketone moieties and ether moieties in the polymeric backbone of said polymeric material, wherein the difference between the nucleation temperature (Tn) and the glass transition temperature (Tg) of said polymeric material is greater than 23° C.
    Type: Grant
    Filed: June 13, 2007
    Date of Patent: January 14, 2014
    Assignee: Victrex Manufacturing Limited
    Inventors: Simon Jonathon Grant, John Russell Grasmeder, Michael John Percy, Brian Wilson
  • Patent number: 8609804
    Abstract: Provided are sulfone-containing polyarylene polymers, and processes for preparing the polymers. The polyarylene polymers are suitable for use as engineering polymers.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: December 17, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventor: Mark F Teasley
  • Publication number: 20130323416
    Abstract: The invention relates to heat treatment of polymorphic semicrystalline or crystallizable polymers to increase the content of the highest melting crystalline form. Such heat treatment results in a polymer powder that has a consistent, uniform melting range, improved flow and improved durability of the powder particle size for applications that require powder flow at elevated temperatures. In addition to improved powder properties, the articles produced from the powders also exhibit better physical properties in both appearance and in mechanical properties. Thus the invention also includes polymer powders and articles produced by the described processes.
    Type: Application
    Filed: September 27, 2011
    Publication date: December 5, 2013
    Applicant: Arkema Inc.
    Inventors: Christopher A. Bertelo, Manuel A. Garcia-Leiner, Anthony Decarmine, Scott F. Defelice
  • Patent number: 8598303
    Abstract: The invention provides a process for the preparation of valerolactone, said process comprising reacting levulinic acid with hydrogen by using a solid Ru catalyst, characterized in that the process is carried out in the presence of at least 0.08% (w/w) water relative to the amount of levulinic acid. Said process may be faster and more selective. This process advantageously allows the production of valerolactone from renewable sources. The valerolactone may be used in the preparation of methylpentenoate, adipic acid dimethylester, adipic acid, hexamethylenediamine, and polyamide 6,6 (all claimed).
    Type: Grant
    Filed: June 20, 2012
    Date of Patent: December 3, 2013
    Assignee: DSM IP Assets B.V.
    Inventors: Anna Maria Cornelia Francisca Castelijns, Michele Catherine Christianne Janssen, Henricus Wilhemus Leonardus Marie Vaessen
  • Patent number: 8599673
    Abstract: A composition of matter for the recording medium of nanometer scale thermo-mechanical information storage devices and a nanometer scale thermo-mechanical information storage device. The composition includes: one or more polyaryletherketone polymers, each of the one or more polyaryletherketone polymers having two terminal ends, each terminal end having two or more phenylethynyl moieties. The one or more polyaryletherketone polymers are thermally cured and the resulting cross-linked polyaryletherketone resin used as the recording layers in atomic force data storage devices.
    Type: Grant
    Filed: January 3, 2012
    Date of Patent: December 3, 2013
    Assignee: International Business Machines Corporation
    Inventors: Richard Anthony DiPietro, Urs T. Duerig, Jane Elizabeth Frommer, Bernd Walter Gotsmann, Erik Christopher Hagberg, James Lupton Hedrick, Armin W. Knoll, Teddie Peregrino Magbitang, Robert Dennis Miller, Russell Clayton Pratt, Charles Gordon Wade
  • Patent number: 8592548
    Abstract: Bis(halophthalimides) are prepared in mixture in an organic liquid such as ortho-dichlorobenzene or anisole, by a reaction at a temperature of at least 150° C. between at least one diamine compound and at least one halophthalic anhydride in the presence of imidization catalyst. The reaction mixture is maintained at about 15% by weight solids content and rich in the halophthalic anhydride by constantly monitoring the reaction mixture using analytical methods such as high performance liquid chromatography. The product mixture may be directly employed in the direct preparation of polyetherimides, and similar slurries may be employed to prepare other polyether polymers.
    Type: Grant
    Filed: December 22, 2004
    Date of Patent: November 26, 2013
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: John Yupeng Gui, Norman Enoch Johnson, Thomas Link Guggenheim, David Winfield Woodruff, James Manio Silva, Farid Fouad Khouri
  • Publication number: 20130310535
    Abstract: The present invention provides a polycarbonate resin containing a structural unit represented by general formula (I). In formula (I), R's independently represent a halogen atom, an alkyl group having 1-9 carbon atoms, an aryl group having 6-12 carbon atoms, an alkenyl group having 2-5 carbon atoms, an alkoxy group having 1-5 carbon atoms, or an aralkyl group having 7-17 carbon atoms; n's independently mean the number of R's which substitute on the benzene ring and independently represent an integer of 0-4; Y represents an alkylene group having 1-4 carbon atoms; and p represents an integer of 0-4.
    Type: Application
    Filed: January 23, 2012
    Publication date: November 21, 2013
    Applicant: MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Noriyuki Kato, Yuki Kumagai, Shu Yoshida, Takashi Ishii, Kazuaki Kaneko, Kazuya Sekihara
  • Patent number: 8580913
    Abstract: A polyimide resin which is satisfactory in solvent solubility and heat resistance, has a low coefficient of water absorption and is excellent in adhesive properties and a method for manufacturing the same, a film containing the subject polyimide resin and a metal-clad laminate including an adhesive layer composed of the subject polyimide resin are provided. The polyimide resin is a polyimide resin containing a molecule having a repeating unit represented by a structure of any one of the following formulae (1) to (3) in a specified proportion, whose molecular end is capped by an end-capping agent.
    Type: Grant
    Filed: July 5, 2007
    Date of Patent: November 12, 2013
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Tsuyoshi Bito, Shuta Kihara, Jitsuo Oishi
  • Patent number: 8557262
    Abstract: The present invention provides divinyl ether derivatives capable of releasing in a controlled manner at least one active aldehyde and/or ketone into the surrounding environment. The invention relates to the use of these divinyl ether derivatives as perfuming or flavoring ingredients, as well as to the perfuming compositions and consumer articles containing them.
    Type: Grant
    Filed: August 31, 2009
    Date of Patent: October 15, 2013
    Assignee: Firmenich SA
    Inventors: Gary Bernard Womack, Robert Langley Fuller, Glenn Paul Johannes Verhovnik, Nathalie Pinel, Magali Lateulere, Marie Buy
  • Publication number: 20130260223
    Abstract: A water soluble binder composition includes a binder, the binder including a water soluble polyamic acid having an acid equivalent of about 300 to about 600 g/eq.
    Type: Application
    Filed: August 9, 2012
    Publication date: October 3, 2013
    Inventors: Hyesun JEONG, Beomwook LEE, Hyeran LEE
  • Patent number: 8546511
    Abstract: The present invention provides a polyamideimide resin for flexible printed circuit boards that prior to curing exhibits an excellent solubility, processability, and handling characteristics, and that after curing exhibits flame retardancy, solder heat resistance, circuit embeddability, and flexibility and further has a high glass-transition temperature (Tg) and is able to maintain a high adhesive strength. The present invention provides a polyamideimide resin for flexible printed circuit boards, which is obtained by the polymerization reaction of an acid component comprising at least a monoanhydride and an aromatic dicarboxylic acid with a diisocyanate compound or diamine compound in an approximately equimolar amount with respect to the total molar amount of the acid component, wherein the molar amount of the monoanhydride is 0.4 to 0.8 taking the total molar amount of the acid component as 1.
    Type: Grant
    Filed: January 11, 2007
    Date of Patent: October 1, 2013
    Assignee: Arisawa Mfg. Co., Ltd.
    Inventors: Makoto Tai, Shu Dobashi
  • Patent number: 8536265
    Abstract: A polyaryletherketone polymeric material, for example polyetheretherketone and composite materials comprising said polymeric material are described. The polymeric material has a melt viscosity (MV) in the range 0.05 to 0.12 kNsm?2, preferably in the range 0.085 to 0.095 kNsm?2.
    Type: Grant
    Filed: February 14, 2011
    Date of Patent: September 17, 2013
    Assignee: Victrex Manufacturing Limited
    Inventors: Craig Meakin, Dianne Flath, Brian Wilson
  • Patent number: 8524853
    Abstract: The present invention relates to polyarylene ether block copolymers according to the general formula A-K—X—K-A, where —X— is a polyarylene ether segment with number-average molar mass of at least 5000 g/mol, and A- is a segment of the general structure R2NH—(R1—NH—CO—Ar—CO—NH)n—R1—NH—, in which R1 is a linear or branched alkylene group having from 2 to 12 carbon atoms and Ar is an arylene group having from 6 to 18 carbon atoms, and R2 is selected from aryloyl, alkyloyl, and H, and in which the number average of n is from 1 to 3, and there is a coupling group K of the structure —CO—Ar3—CO— linking each A to X, in which Ar13 is an aromatic group having from 6 to 18 carbon atoms. The present invention also relates to a process for the production of the polyarylene ether block copolymers of the invention, to polymer compositions comprising the polyarylene ether block copolymers of the invention, and also to the use thereof for the production of moldings, of films, of fibers, or of foams.
    Type: Grant
    Filed: May 31, 2010
    Date of Patent: September 3, 2013
    Assignee: BASF SE
    Inventors: Cecile Gibon, Martin Weber, Reinoud J. Gaymans, Ranimol Stephen
  • Patent number: 8519081
    Abstract: Polysulfone based polymer comprising a repeat unit represented by the following Chemical Formula 1 is provided: wherein, X, M1, M2, a, b, c, d, e, f, R1, R2, R3, R4 and n are as defined in the detailed description.
    Type: Grant
    Filed: April 9, 2010
    Date of Patent: August 27, 2013
    Assignees: Hyundai Motor Company, Dongjin Semichem Co., Ltd.
    Inventors: Ju Ho Lee, Dong II Kim, Jang-Bae Son, Hyung-Su Park, Inchul Hwang, Ki Yun Cho
  • Publication number: 20130217838
    Abstract: A process for manufacturing a three-dimensional object from a powder by selective sintering the powder using electromagnetic radiation. The powder comprises recycled PAEK. In one embodiment, the powder comprises recycled PEKK. In one embodiment, the powder comprises first recycle PEKK and second recycle PEKK. In one embodiment, the powder consists essentially of recycled PEKK. The process may include the step of maintaining a bed of a selective laser sintering machine at approximately 300 degrees Celsius and applying a layer of the powder to the bed. The average in-plane tensile strength of the three-dimensional object is greater than that of a three-dimension object manufactured by selective sintering using a powder comprising an unused PEKK powder.
    Type: Application
    Filed: December 5, 1913
    Publication date: August 22, 2013
    Inventors: Scott F. DeFelice, Anthony DeCarmine
  • Publication number: 20130217851
    Abstract: A triazine polymer is provided that can be used as an electrolyte in a PEM fuel cell, and that enables membranes having a high chemical and dimensional stability, as well as a high ion conductivity. The triazine polymer is formed of at least a plurality of base structural units that include a moiety corresponding to a formula (I): in which: X1 and X2, which are identical or different, represent S, SO, or SO2; Ar1 and Ar2, which are identical or different, represent a substituted or unsubstituted phenylene group; Ar3 represents a substituted or unsubstituted phenyl group; and Tz represents a 1,3,5-triazine nucleus.
    Type: Application
    Filed: July 6, 2011
    Publication date: August 22, 2013
    Applicants: MICHELIN RECHERCHE ET TECHNIQUE S.A., COMPAGNIE GENERALE DES ETABLISSEMENTS MICHELIN
    Inventors: Milan Fedurco, Antonio Delfino
  • Patent number: 8513133
    Abstract: A resist underlayer film-forming composition includes (A) a polymer that includes a repeating unit shown by a formula (1), and has a polystyrene-reduced weight average molecular weight of 3000 to 10,000, and (B) a solvent, wherein R3 to R8 individually represent a group shown by the following formula (2) or the like, —O—R1?R2??(2) wherein R1 represents a single bond or the like, and R2 represents a hydrogen atom or the like.
    Type: Grant
    Filed: August 30, 2011
    Date of Patent: August 20, 2013
    Assignee: JSR Corporation
    Inventors: Shin-ya Minegishi, Yushi Matsumura, Shinya Nakafuji, Kazuhiko Komura, Takanori Nakano, Satoru Murakami, Kyoyu Yasuda, Makoto Sugiura
  • Patent number: 8501896
    Abstract: A poly(phthalazinone sulfone) composition for molded articles having such characteristics as high temperature resistance, good electrical properties, good chemical and solvent resistance and toughness consists essentially of a polymer of formula (I): Cp-ZxA-Zy??(I) wherein Z is a bisphenyl sulfone moiety of formula: (II): A is a phthalazinone moiety of formula (III): Cp is A, as defined above, or a biphenol moiety of formula (IV): x is an integer of at least 1; y is an integer of at least 1; and x+y=n, where n is an integer such that the polymer has a weight average molecular weight of about 20,000 to about 170,000, the composition comprising less than 5%, by weight, of low molecular weight oligomers; and having a glass transition temperature (Tg) from 225 to 305° C.
    Type: Grant
    Filed: September 26, 2007
    Date of Patent: August 6, 2013
    Assignee: HT Materials Corporation
    Inventors: Allan S. Hay, Xigao Jian, Yi-Feng Wang
  • Patent number: 8502401
    Abstract: A polymeric composition comprising a first polymer chosen from a poly(arylene ether) polymer including polymer repeat units of the following structure: —(O—Ar1—O—Ar2—O—)m—(—O—Ar3—O—Ar4—O)n- where Ar1, Ar2, Ar3, and Ar4 are identical or different aryl radicals, m is 0 to 1, n is 1 m; a polysulfone, a polyimide, a poly(etherketone), a polyurea, a polyurethane, and combinations thereof and a second polymer comprising a per(phenylethynyl) arene polymer derivative. Cured films containing the polymer can exhibit at least one of the following properties: Tg from 160° C. to 180° C., a dielectric constant below 2.7 with frequency independence, and a maximum moisture absorption of less than 0.17 wt %. Accordingly, the polymer is especially useful, for example, in interlayer dielectrics and in die-attach adhesives.
    Type: Grant
    Filed: August 10, 2009
    Date of Patent: August 6, 2013
    Assignee: Delsper LP
    Inventors: William Franklin Burgoyne, Jr., Mark David Conner, Andrew Francis Nordquist, William Steven Collins
  • Publication number: 20130197182
    Abstract: A diol from which a resin material having high processability and a high refractive index can be manufactured, a polycarbonate resin and a polyester resin which is a polymer of the diol, and a molded article and an optical element formed of the polymer. The diol is represented by the general formula (1) shown below; the polycarbonate resin and the polyester resin are polymers thereof; and the molded article and the optical element are formed of the polymers, wherein R1 and R2 each independently denote one of a hydrogen atom and an alkyl group having 1 or more and 6 or less carbon atoms; Q denotes one of an oxyethylene group, a thioethylene group and a single bond.
    Type: Application
    Filed: March 13, 2013
    Publication date: August 1, 2013
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Canon Kabushiki Kaisha
  • Patent number: 8492049
    Abstract: Solid anion exchange polymer electrolytes and compositions comprising chemical compounds comprising a polymeric core, a spacer A, and a guanidine base, wherein said chemical compound is uniformly dispersed in a suitable solvent and has the structure: wherein: i) A is a spacer having the structure O, S, SO2, —NH—, —N(CH2)n, wherein n=1-10, —(CH2)n—CH3—, wherein n=1-10, SO2-Ph, CO-Ph, wherein R5, R6, R7 and R8 each are independently —H, —NH2, F, Cl, Br, CN, or a C1-C6 alkyl group, or any combination of thereof; ii) R9, R10, R11, R12, or R13 each independently are —H, —CH3, —NH2, —NO, —CHnCH3 where n=1-6, HC?O—, NH2C?O—, —CHnCOOH where n=1-6, —(CH2)n—C(NH2)—COOH where n=1-6, —CH—(COOH)—CH2—COOH, —CH2—CH(O—CH2CH3)2, —(C?S)—NH2, —(C?NH)—N—(CH2)nCH3, where n=0-6, —NH—(C?S)—SH, —CH2—(C?O)—O—C(CH3)3, —O—(CH2)n—CH—(NH2)—COOH, where n=1-6, —(CH2)n—CH?CH wherein n=1-6, —(CH2)n—CH—CN wherein n=1-6, an aromatic group such as a phenyl, benzyl, phenoxy, methylbenzyl, nitrogen-substituted benzyl or phenyl g
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: July 23, 2013
    Assignee: Los Alamos National Security, LLC
    Inventors: Yu Seung Kim, Dae Sik Kim, Kwan-Soo Lee