Abstract: Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a composition for forming an underlayer film for photolithography with excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed from the composition, and a method for forming a pattern using the underlayer film. An aromatic hydrocarbon, an aromatic aldehyde, and a phenol derivative are reacted in the presence of an acidic catalyst to yield an aromatic hydrocarbon resin with a high carbon concentration of 90 to 99.9 mass % and a solubility in propylene glycol monomethyl ether acetate of 10 mass % or more.

Abstract: Described herein are alkyl phenolic resins and methods of producing them. The content of residual phenol in the alkyl phenolic resin may be less than about 2% w/w, the softening point of the alkyl phenolic resin may be about 85° C. to about 105° C., the tackiness of the alkyl phenolic resin may be about 8 N to about 25 N, the alkyl group of the alkyl phenol may have 6-12 carbon atoms, and the content of 4-(1,1,3,3-tetramethylbutyl) phenol in the alkyl phenol may be from about 0% to about 85% w/w. The invention also relates to a use of the alkyl phenolic resin as rubber tackifier.

Abstract: The present invention relates to a process for producing a polycondensation product by polycondensing monomers including (A) an aromatic or heteroaromatic compound containing a polyether chain, (B) optionally an aromatic or heteroaromatic compound which is different from monomer (A), and (C) an aldehyde, in the presence of a protonation catalyst, wherein the aldehyde is provided by a fast-releasing aldehyde source and a slow-releasing aldehyde source.

Abstract: Provided is an aromatic hydrocarbon resin with a high carbon concentration and a low oxygen concentration that can be used as a coating agent or a resist resin for semiconductors, as well as a composition for forming an underlayer film for photolithography with excellent etching resistance as an underlayer film for a multilayer resist process, an underlayer film formed from the composition, and a method for forming a pattern using the underlayer film. An aromatic hydrocarbon, an aromatic aldehyde, and a phenol derivative are reacted in the presence of an acidic catalyst to yield an aromatic hydrocarbon resin with a high carbon concentration of 90 to 99.9 mass % and a solubility in propylene glycol monomethyl ether acetate of 10 mass % or more.

Abstract: The invention relates to a process for the preparation of a phosphated polycondensate, at least one sulphonic acid being used as catalyst, and to the use of the phosphated polycondensate obtained as an admixture for aqueous suspensions of hydraulic and/or latently hydraulic binders.

Abstract: A phenol-formaldehyde resin, having a low concentration of tetradimer, making the resin suitable for preparing a binder composition for making non-woven fiber products, such as fiberglass insulation, prepared by reacting phenol and formaldehyde in the presence of a sulfite source.

Abstract: A phenol-formaldehyde resin, having a low concentration of tetradimer, making the resin suitable for preparing a binder composition for making non-woven fiber products, such as fiberglass insulation, prepared by reacting phenol and formaldehyde in the presence of a sulfite source.

Abstract: A phenolic resin having not more than 5 wt% of free bisphenol and a molecular weight distribution Mw/Mn of not more than 2.0 is prepared by reacting a bisphenol and aldehyde in the presence of an alkaline catalyst at a temperature of from 0° C. to 100° C., neutralizing with an acid, adding an acid to adjust the pH to from 0 to 6, heating to a temperature of from 50° C. to 200° C, and vacuuming to recover the phenolic resin.

Abstract: This invention relates to a resin composition capable of being thermally cured while minimizing or eliminating voids in the resulting composite, the composition having both a long pot life at low temperatures and a fast curing rate at higher temperatures containing a mixture of (a) a phenol-formaldehyde resole resin, and (b) an etherified hardener, the etherified hardener being prepared from an alkoxylated polyol or a mono epoxy functional diluent.

Abstract: A modified resorcinol resin is prepared by reacting a phenolic compound (e.g., resorcinol) with an olefinically unsaturated compound (e.g., styrene) and two types of aldehyde: a formaldehyde and an alkyl aldehyde (e.g., butyraldehyde). The reaction is typically carried out in the presence of an acid catalyst. The resulting resin has a lower softening point and can be used as a methylene acceptor compound in a vulcanizable rubber composition.

Abstract: A process for preparing a solution of sulfone-containing tanning materials comprises a) preparing a component A by a1) reacting phenol with concentrated sulfuric acid, with oleum of an SO3 content of from 20 to 65% by weight or with a mixture of sulfuric acid and oleum of an SO3 content of from 20 to 65% by weight, the molar ratio of total sulfuric acid, reckoned as SO3, to phenol being in the range from 0.7:1 to 1.5:1, at from 100 to 180° C. to form a mixture containing phenolsulfonic acid, dihydroxydiphenyl sulfone and sulfuric acid, or mixing the individual components to prepare a corresponding mixture, a2) then condensing said mixture with from 0.25 to 4 mol of urea and with from 0.5 to 4 mol of an aliphatic aldehyde of 1 to 6 carbon atoms per mole of phenol units present at from 40 to 90° C., a3) optionally adding a base to set a pH of from 4 to 5, b) preparing a component B by b1) reacting dihydroxydiphenyl sulfone with from 0.

Abstract: An object of the present invention is to provide an epoxy resin composition which has high flexibility, can be molded to a thin membrane, and can become a noninflammable cured product. The present invention comprises a polyphenol compound obtained by reacting to condense phenol with bischloromethyl biphenyl or bismethoxymethyl biphenyl, removing unreacted phenol and then reacting with BCMB again, wherein the polyphenol compound has a weight-average molecular weight of 3,000 or more as determined by GPC, and using the polyphenol compound as an agent for curing an epoxy resin.

Abstract: An improved resin for use in making honeycomb sandwich panels. The improvement involves modifying a phenolic resin so that the amount of smoke and heat generated during combustion is reduced. The reduction in smoke and heat generation is achieved by reducing the amount of phenol used to form the phenolic resin. The phenol is replaced by low-smoke producing sulfone compounds such as 4,4′-bisphenol-S, 3,3′-bisphenol-S, biphenol and bisphenol ethers which reduce the number of smoke producing methylene or methylene ether linkages present in the cured phenolic resin. The low-smoke producing resin may be used as a dip resin for coating the honeycomb or as the matrix resin for the core and face sheets of the sandwich panel.

Abstract: An improved resin for use in making honeycomb sandwich panels. The improvement involves modifying a phenolic resin so that the amount of smoke and heat generated during combustion is reduced. The reduction in smoke and heat generation is achieved by reducing the amount of phenol used to form the phenolic resin. The phenol is replaced by low-smoke producing sulfone compounds such as 4,4′-bisphenol-S, 3,3′-bisphenol-S, biphenol and bisphenol ethers which reduce the number of smoke producing methylene or methylene ether linkages present in the cured phenolic resin. The low-smoke producing resin may be used as a dip resin for coating the honeycomb or as the matrix resin for the core and face sheets of the sandwich panel.

Abstract: Disclosed are compositions and methods for providing substantially planarized surfaces in the manufacture of electronic devices. Also disclosed are compositions and methods for protecting apertures in the manufacture of electronic devices.

Abstract: A polymer in the form of a novolac resin is provided wherein the novolac resin has a weight average molecular weight of 1,000-30,000, some of the hydrogen atoms of hydroxyl groups are replaced by 1,2-naphthoquinonediazidosulfonyl ester groups, and some of the hydrogen atoms of the remaining hydroxyl groups are replaced by substituted acetal groups and/or crosslinked within a molecule or between molecules with crosslinking groups having C—O—C linkages. The polymer is formulated into a positive resist composition having improved uniformity, sensitivity, resolution and pattern profile as well as improved heat resistance, film retention, substrate adhesion and storage stability.

Abstract: A process for forming a phenol formaldehyde resin, the process comprising the steps of: (i) reacting phenol with an excess of a formaldehyde material in the presence of an acid or base catalyst until water separates from the reactants as an immiscible layer; (ii) adding a mixture comprising an excess of polyhydric alcohol and an aromatic dicarboxylic or tricarboxylic acid, salt or anhydride thereof to the phenol and formaldehyde reaction mixture followed by addition of an alpha hydroxy acid; (iii) adding a non-aqueous solvent, wherein at least some of said water is removed either before addition of the mixture preparated in step (ii) or after addition of the alpha hydroxy acid; (iv) preparing a solution comprising a Lewis acid, a polyhydric alcohol, an alpha hydroxy acid, a non-aqueous solvent, an aromatic sulphonic acid and sulphuric or hydrochloric acid; (v) adding the solution formed in step (iv) to the mixture formed in step (ii) and allowing the mixture to cure.

Abstract: A process for polymerizing a vinyl chloride monomer wherein the vinyl chloride monomer is subjected to homopolymerization or (co)polymerization with a monomer copolymerizable with the vinyl chloride monomer in an aqueous solvent, comprising applying in advance a coating liquid containing a cocondensation product obtained by reacting either a phenothiazine derivative and an aldehyde or a phenothiazine derivative, a naphthol derivative and an aldehyde to give an initial condensation product and then reacting the initial product with a polyphenol, to an inner wall of a polymerization tank and parts of an apparatus in contact with the monomers during the polymerization process. The process makes it possible to apply the cocondensation product as an aqueous solution to, e.g., an inner wall of a polymerization tank; to quite effectively prevent polymer adhesion in, e.g.

Abstract: The present invention provides a method for producing a water insoluble, aqueous alkali soluble novolak resins having consistent molecular weight and superior performance in photoresist composition, by isolating such novolak resin without high temperature distillation. A method is also provided for producing photoresist composition from such a novolak resin and for producing semiconductor devices using such a photoresist composition.

Abstract: Disclosed is a process which comprises reacting a polymer of the general formula ##STR1## wherein x is an integer of 0 or 1, A is one of several specified groups, such as ##STR2## B is one of several specified groups, such as ##STR3##

Abstract: The invention is directed to purification of phenolic resins and to a process for preparing an organic photoresist coating composition. The process comprises reacting one or more phenols to form a crude phenolic resin. The crude phenolic resin formed is then separated from its reaction mixture and dissolved in an aqueous insoluble organic solvent in an organic solvent that is a solvent for the photoresist coating composition. The solution so formed is then mixed with an aqueous phase to extract water soluble impurities from the resin solution into the aqueous phase. Finally, the purified resin solution is further diluted with additional photoresist solvent.

Abstract: A polyamide fibrous substrate having deposited on it an amount of a composition effective to impart stain-resistance comprising a water-soluble or water-dispersible alpha-olefin/maleic anhydride polymer or a mixture of said polymers, and processes for preparing the substrates. The maleic anhydride polymer is used either in hydrolyzed form or in the form resulting from reacting it with a lower alkyl alcohol so as to form an alpha-olefin/maleic acid monalkyl ester polymer.

Abstract: A process for making polyimide-polyamic ester copolymer composition comprisingreacting at least one diamine, a pyromellitic diacid diester compound; at least one other tetracarboxylic diacid diester compound and a selected phosphoramide in the presence of a base catalyst to form a polyimide-polyamic acid ester copolymer.

Abstract: A polyamide fibrous substrate having deposited on it an amount of a composition effective to impart stain-resistance comprising a water-soluble or water-dispersible alpha-olefin/maleic anhydride polymer or a mixture of said polymers, and processes for preparing the substrates. The maleic anhydride polymer is used either in hydrolyzed form or in the form resulting from reacting it with a lower alkyl alcohol so as to form an alpha-olefin/maleic acid monalkyl ester polymer.

Abstract: Cyclic acetal derivative of a resole includes the reaction product of an ortho resole compound with a carbonyl compound or a carbonyl compound derivative. The cyclic acetal derivatives of phenolic resole compounds exhibit enhanced storage stability and can be readily activated at elevated temperatures to prepare phenolic based adhesives and coatings.

Abstract: Polyamide-containing fibre materials can be given an anti-stain finish by treating them with a sulpho-containing aromatic formaldehyde condensation product in combination with polyacrylic acid, the treatment with the two components being carried out in any desired order or simultaneously.

Abstract: A stain-resist for polyamide textiles comprises blends of maleic anhydride/alpha-olefin polymers with sulfonated phenol-formaldehyde condensation products. The stain-resist blends are water-soluble at low pH, even in the absence of surfactant, and are strongly substantive and more resistant to yellowing than the condensation products.

Abstract: A liquid binding agent comprised of a phenolic resin, thinning agents and a curing agent, characterized in that the phenolic resin is produced by condensation catalyzed under alkaline conditions of a phenol and formaldehyde in a molar ratio of phenolic compound to formaldehyde in the range of 1:0.05 to 1.

Abstract: Novel aminoplast anchored UV stabilizers are provided. Compared to unanchored stabilizers, the anchored stabilizers disclosed herein have increased compatibility with coating resins and have reduced volatility due to higher molecular weights resulting from anchoring. A process for preparing the anchored stabilizers by the reaction of unanchored stabilizers with alkoxymethylated aminoplasts in a sulfuric acid medium is also provided. The unanchored stabilizers include 2-(2-hydroxyaryl)benzotriazoles, 2-hydroxybenzophenones, 2-(2-hydroxyaryl)-4,6-diaryl-1,3,5-triazines, salicylic acid derivatives, 2-hydroxyoxanilides, and blocked derivatives thereof as well as mixtures of two or more stabilizers. The aminoplasts include alkoxymethylated derivatives of glycolurils, melamines, and benzoguanamines.

Abstract: The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

Abstract: This invention relates to aromatic oligomeric compounds useful in the treatment of cardiovascular, bone metabolic, hypolipidaemic, neuronal, gastrointestinal and elastase-mediated connective tissue degradation disorders and disorders which may be treated by agents effective in binding DNA, to processes for preparation of such oligomeric compounds, to pharmaceutical compositions including such oligomeric compounds, and to their use in the treatment of such disorders.

Abstract: An essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1500 and a glass transition temperature in excess of 125.degree. C. If desired, the aromatic novolak resin may be blended with a conventional novolak resin to regulate the glass transition temperature of the resin. The aromatic novolak resin and blends formed therefrom are especially suitable as coating resins and are useful for the formation of photoresist coating compositions.

Abstract: A naphthol-modified phenolic resin having low softening point and good flowability is obtained by allowing a naphthol and a phenol to react with an aldehyde in the presence of an acid catalyst at 60 to 110.degree. C. to obtain a primary reaction mixture, heating the primary reaction mixture in the presence of a strong acid, a super acid or a mixture thereof under ambient pressure at 120 to 180.degree. C. for 1 to 12 hours to obtain a secondary reaction mixture, and subjecting the secondary reaction mixture to vacuum concentration or steam distillation, and the naphthol-modified phenolic resin is suited to use as a curing agent in epoxy resin molding materials for sealing electronic parts.

Abstract: A naphthol-modified phenolic resin having low softening point and good flowability is obtained by allowing a naphthol and a phenol to react with an aldehyde in the presence of an acid catalyst at 60.degree. to 110.degree. C. to obtain a primary reaction mixture, heating the primary reaction mixture in the presence of a strong acid, a super acid or a mixture thereof under ambient pressure at 120.degree. to 180.degree. C. for 1 to 12 hours to obtain a secondary reaction mixture, and subjecting the secondary reaction mixture to vacuum concentration or steam distillation, and the naphthol-modified phenolic resin is suited to use as a curing agent in epoxy resin molding materials for sealing electronic parts.

Abstract: New formaldehyde-phenol resins of the novolak type comprising aliphatic aldehyde radicals with 6 or more carbon atoms and with the molar ratio between these heavy aldehyde radicals and the phenolic structures being between 0.9 and 1.2. They are obtained by the condensation of phenols with aldehyde compounds containing at least 543% heavy aldehydes in the presence of acid catalysts in a virtually anhydrous medium. Application to the reinforcement of vulcanized rubbers.

Abstract: A catalyst selected from a perfluorosulfonic acid and an anhydride thereof enables a non-conjugated drying oil to react with a phenol to form a phenol-added vegetable oil without causing hydrolysis of the non-conjugated drying oil. The phenol-added vegetable oil is allowed to react with an aldehyde to form a vegetable oil-modified phenolic resin. A laminate produced by impregnating paper with the vegetable oil-modified phenolic resin and laminating and molding the impregnated paper is excellent in low temperature punching quality and electrical properties and is free from low molecular weight components oozing out the surface of the laminate.

Abstract: Sulfonium compounds of formula 1 or 2 ##STR1## wherein R is a mononuclear cycloalkyl radical containing 3 to 8 ring carbon atoms or a mononuclear cycloalkyl radical which contains 3 to 8 ring carbon atoms and to which at least one further ring containing carbon atoms is fused,X is a non-nucleophilic anion, andZ is a single bond, an oxygen or sulfur atom, a group of formula >S.sup..sym. --R X.sup..crclbar., wherein R and X are as defined above, or is >C.dbd.O or a methylene bridge,which sulfonium compounds are either unsubstituted or carry one or more than substituent selected from the group consisting of halogen, nitro, C.sub.1 -C.sub.8 alkyl, phenyl, hydroxyl, C.sub.1 -C.sub.8 alkoxy, phenoxy, benzyloxy, alkoxycarbonyl containing 1 to 4 carbon atoms in the alkoxy moiety or acyl of 1 to 12 carbon atoms.

Abstract: Oligomeric condensation products including repeat units of the formula: ##STR1## wherein M.sup.+ is a monovalent metal cation; and wherein a=1 or 2 and R is C(R.sub.f).sub.3, or wherein a=O, 1 or 2 and R is ##STR2## wherein each R.sub.f group is independently selected from the group consisting of Fluorine (F) or a perfluoroalkyl group;and b=0, 1 or 2; anda+b=0, 1 or 2; with the proviso thata+b=1 or 2 for at least about half ofsaid repeat units.The products are useful as stainblockers in nylon carpets.

Abstract: A latent catalyzed phenolic resin composition is provided containing a thermosetting phenolic resole resin and a latent catalyst consisting essentially of a primary or secondary amine salt of a strong acid.

Abstract: The aromatic formaldehyde condensation products, which are substantially colorless and water-soluble and contain sulphonate and/or carboxylate groups, are obtainable by adding agents which have a reducing action during and/or after the condensation reaction, and are suitable for the treatment of textiles and leather.

Abstract: The present document describes the use of an inhibitor for cationic polymerization as an additive to a thermocurable composition based on at least one cationically polymerizable organic material and an initiator for cationic polymerization in the form of an onium compound or a compound of the formula (I)[M.sup.+n (L).sub.x ].sup.n+ nX.sup.- (I),in which n is 2 or 3, M is a metal cation selected from the group comprising Zn.sup.2+, Mg.sup.2+, Fe.sup.2+, Co.sup.2+, Ni.sup.2+, Cr.sup.2+, Ru.sup.2+, Mn.sup.2+, Sn.sup.2+, VO.sup.2+, Fe.sup.3+, Al.sup.3+ and Co.sup.3+, X.sup.- is an anion selected from the group comprising PF.sub.6.sup.-, AsF.sub.6.sup.-, SbF.sub.6.sup.-, BiF.sub.6.sup.-, derivatives of these anions in which at least one fluorine atom has been replaced by a hydroxyl group, and CF.sub.3 SO.sub.3.sup.-, or in which up to 50% of the anions X.sup.-, based on the total amount of anions, may be any desired anions, L is water or an organic .sigma.

Abstract: A reaction of the compound (A) having at least two 2-oxazoline groups with the compound (B) having at least two functional groups of one or a plural kind selected from the group consisting of an aromatic hydroxyl group, an amino group and a thiol group proceeds in a short period of time to produce a cured resin with superior mechanical strength, heat resistance and adhesion properties.

Abstract: A latent catalyzed phenolic resin composition is provided containing a thermosetting phenolic resole resin and a latent catalyst consisting essentially of a primary or secondary amine salt of a strong acid.

Abstract: An essentially aromatic alkali soluble novolak resin comprising the product resulting from the acid condensation of an aromatic aldehyde and a phenol where the resin has a molecular weight in excess of 1500 and a glass transition temperature in excess of 125.degree. C. If desired, the aromatic novolak resin may be blended with a conventional novolak resin to regulate the glass transition temperature of the resin. The aromatic novolak resin and blends formed therefrom are especially suitable as coating resins and are useful for the formation of photoresist coating compositions.

Abstract: A copolycondensation of a phenol, a naphthol and formaldehyde proceeds smoothly in the presence of an acid and a metallic element selected from the group consisting of transition metallic elements and metallic elements of Group IIa, Group IIIa, Group IVa, Group Va and Group VIa of the Periodic Table, and a naphthol-modified phenolic resin which has a large molecular weight and does not gel is obtained.

Abstract: Linear aromatic polymeric species, particularly oligomers and polymers are produced under mild conditions in good yield by reacting an at least binuclear aromatic compound with an alkylidene bisphenol in the presence of a non C-alkylatable hydroxy substituted aromatic compound effective to stabilize a generated carbonium ion intermediate; the alkylidene bisphenol may be formed in situ from a ketone or aldehyde in the presence of a catalytic amount of a hydroxy substituted aromatic compound effective to generate a carbonium ion with the ketone or aldehyde; carrying out the reaction under reduced pressure, particularly high vacuum permits direct production of high polymers; the oligomers are useful in the manufacture of high molecular weight engineering or industrial plastics; the polymers may be used directly as such plastics.

Abstract: One hundred percent thermosetting phenol/formaldehyde (P/F) resin and method of preparation thereof are disclosed. The resin comprises a molar ratio of F/P of about 1.2-1.7, has a softening point of about 80.degree. C. and cures at temperature of about 140.degree.-160.degree. C. The method comprises heating the reactants in a solvent-less system in the presence of an ortho directing catalyst while monitoring the amount of free formaldehyde present in the reaction system.

Abstract: Products of the condensation of phenolmonosulfonic acids, dihydroxydiphenyl sulfones, urea and formaldehyde can be obtained by(A) preparing a homogeneous reaction mixture in sulfuric acid from the phenolmonosulfonic acid and dihydroxydiphenyl sulfone in the molar ratio of from 3:1 to 10:1, with the proviso that the water content of the mixture is not more than 10% of the total weight of the components, and the mixture contains from 0.3 to 1.5 moles of sulfuric acid per mole of dihydroxydiphenyl sulfone, at from 100.degree. to 180.degree. C.,(B) subsequently, at from 40.degree. to 90.degree. C., carrying out a precondensation with 1 to 2 moles of formaldehyde and 0.5 to 1.5 moles of urea per mole of phenol units present in aqueous medium,(C) partially neutralizing the reaction mixture,(D) adding to the partially neutralized reaction mixture 0 to 0.5 mole of phenol per mole of phenol units present and then 0.1 to 0.8 mole of formaldehyde per mole of phenol units then present,(E) further condensing at from 40.

Abstract: Thermosetting mixtures containing(a) an epoxy resin having on average more than one 1,2-epoxide group in the molecule,(b) a di- or polyisocyanate compound and(c) a sulfonium salt of the formulae I to IV ##STR1## in which A is C.sub.1 -C.sub.12 alkyl, C.sub.3 -C.sub.8 cycloalkyl, C.sub.4 -C.sub.10 cycloalkylalkyl or phenyl which is unsubstituted or substituted by one or more substitutents from the group comprising C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.4 alkoxy, halogen, nitro, phenyl, phenoxy, alkoxycarbonyl having 1-4 C atoms in the alkoxy radical or acryl having 1-12 C atoms, Ar, Ar.sub.1 and Ar.sub.2 indpendently of one another are each phenyl which is unsubstituted or substituted by one or more substitutents from the group comprising C.sub.1 -C.sub.8 alkyl, C.sub.1 -C.sub.

Abstract: Modified novolaks based on phenols which are trifunctional with respect to formaldehyde and contain, as modifying components, terpenes and unsaturated carboxylic acids or derivatives of these compounds, the weight ratio between the terpenes and the unsaturated carboxylic acids or derivatives thereof being in the range from 98.5:2.5 to 2.5:98.5 and the weight ratio between the phenolic component and the sum of the modified components being in the range from 95:5 to 5:95 and the modified novolaks having a melting point greater than 45.degree. C.Process for the preparation of the modified novolaks by admixing the modifying components indicated with non-modified novolaks in the necessary amounts at temperatures between 80.degree. and 300.degree. C.Use of the modified novolaks as reinforcing resins for rubber and elastomers, as tackifying agents for rubber, as binders for friction linings, curable molding compositions, impregnants, coatings, paints and binders for finely divided inorganic substrates.