Carboxylic Acid Or Derivative Is A Reactant Patents (Class 528/173)
  • Patent number: 5399655
    Abstract: This invention concerns positive-working photodefinable polyimide precursors which make use of chemical amplification based on photoacid catalyzed cleavage of acid labile-poly(amic acetal esters).
    Type: Grant
    Filed: October 29, 1993
    Date of Patent: March 21, 1995
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Howard E. Simmons, III
  • Patent number: 5399664
    Abstract: The invention relates generally to polymers exhibiting second order nonlinear optical properties, and characterized by high thermal stability. Disclosed are polymers prepared by a polycondensation reaction between an aromatic dianhydride and a compound selected from the group consisting of a di(alkylamino)amine and an aromatic diamine. Most preferred are polymers that are the products of a polycondensation reaction between 1,2,4,5-benzenetetracarboxylic dianhydride and nitro(N,N-diethylamino)stilbene, wherein the polymer is imidized by further heat treatment.
    Type: Grant
    Filed: November 10, 1993
    Date of Patent: March 21, 1995
    Assignee: Arch Development Corporation
    Inventors: Zhonghua Peng, Luping Yu
  • Patent number: 5395918
    Abstract: The invention describes new biphenyl dianhydrides, and new polyimides and copolyimides made from the dianhydrides. The synthesized polyimides exhibit significantly enhanced solubility when the biphenyl dianhydrides are substituted, particularly at the 2 and 2' positions on the phenyl rings.
    Type: Grant
    Filed: April 21, 1994
    Date of Patent: March 7, 1995
    Assignee: The University of Akron
    Inventors: Frank W. Harris, Sheng-Hsien Lin
  • Patent number: 5393864
    Abstract: A random polyimide copolymer, based on a rigid dianhydride, a rigid diamine and an additional diamine and/or dianhydride containing one or more flexibilizing linkages. Soft-baked coatings of the poly(amic acid) precursor are readily processed using conventional aqueous base developers, such as tetramethylammonium hydroxide. The polyimide and soft-baked coatings are useful as a dielectric layer In multichip module applications or as a stress buffer coating.
    Type: Grant
    Filed: April 26, 1993
    Date of Patent: February 28, 1995
    Assignee: E. I. Du Pont de Nemours and Company
    Inventor: John D. Summers
  • Patent number: 5386002
    Abstract: Polyetherimides, polyesterimides, poly(ester etherimides) and poly(carbonate imides) which are thermoplastic, polymeric materials contain divalent bisimides of formula ##STR1## wherein R is independently in each occurrence hydrogen, alkyl of from 1 to 20 carbons, aryl or aralkyl of from 1 to 20 carbons, halogen or NO.sub.2. Novel monomeric bisimides corresponding to the above formula are also disclosed.
    Type: Grant
    Filed: December 3, 1993
    Date of Patent: January 31, 1995
    Assignee: The Dow Chemical Company
    Inventors: Muthiah N. Inbasekaran, Daniel J. Murray, Michael N. Mang, James L. Brewbaker
  • Patent number: 5384390
    Abstract: There are disclosed flame-retardant, high temperature resistant polyimide fibers of the general formula ##STR1## wherein n is an integer larger than 1, A is a tetravalent aromatic group and R is at least one divalent aromatic group. These polyimide fibers have been heat-treated in the unstretched state and have a maximum shrinkage of 14% when heated to a temperature of 400.degree. C. These polyimide fibers are produced by initially spinning crude fibers from a solution of the appropriate polyimide in an aprotic organic solvent, preferably according to the dry-spinning method, which solution optionally contains additives. The crude fibers obtained are washed with water to remove the solvent. The washed crude fibers are dried to a moisture content of less than 5% by mass, are subjected to a heat treatment at a temperature of between 315.degree. C and 450.degree. C, are cooled and, if desired, are crimped and cut to staple fibers.
    Type: Grant
    Filed: September 23, 1991
    Date of Patent: January 24, 1995
    Assignee: Lenzing Aktiengesellschaft
    Inventors: Claus Schobesberger, Klaus Weinrotter, Herbert Griesser, Sigrid Seidl
  • Patent number: 5380820
    Abstract: In one aspect, the present invention relates to polyimides having excellent thermal resistance and process for preparing the same comprising carrying out condensation of 4,4'-bis(3-aminophenoxy)biphenyl with pyromellitic dianhydride in the presence of a different diamine compound and optionally with a different tetracarboxylic acid dianhydride.In a second aspect, the present invention relates to a heat resistant resin composition consisting essentially of an aromatic polyetherimide and a defined polyimide.In a third aspect, the present invention relates to a polyimide resin composition comprised on a defined polyimide and a separate high-temperature engineering polymer.In a fourth aspect, the present invention relates to a resin composition comprised of a defined polyimide and an aromatic polyamideimide.
    Type: Grant
    Filed: December 7, 1993
    Date of Patent: January 10, 1995
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Masahiro Ohta, Masao Yoshikawa
  • Patent number: 5374701
    Abstract: Diarylacetylenes and diarylenamines are synthesized from a Schiff's base and an N-arylmethylheterocycle; these compounds are useful as intermediates for a variety of polymers; in particular an efficient process is provided for producing diaryl acetylenes useful in the efficient production of acetylene group-containing polymers which can be cross-linked to produce high strength polymers free of structural defects such as conventionally arise as a result of liberation of volatiles during the cross-linking.
    Type: Grant
    Filed: May 4, 1993
    Date of Patent: December 20, 1994
    Inventors: Allan S. Hay, Martino Paventi
  • Patent number: 5374708
    Abstract: Polyimide filaments and polyimide films having great strength, high elastic modulus and high crystallinity and comprising a novel polyimide which can be melt-processed without impairing high crystallinity and which essentially consists of recurring structural units represented by the formula (I): ##STR1## more than 85 mol % the polyimide consists of recurring structural units of the formula (II): ##STR2## and from 0.5 to 15 mol % of the polyimide consists of recurring structural units represented by the formula (III), the formula (II) exclusive, the formula (IV) and/or the formula (V).
    Type: Grant
    Filed: August 8, 1991
    Date of Patent: December 20, 1994
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Shoji Tamai, Masahiro Ohta, Akihiro Yamaguchi, Masumi Saruwatari
  • Patent number: 5371168
    Abstract: Amorphous polyimide powder which has recurring structural units of the formula (I): ##STR1## as a fundamental skeleton, is blocked at the polymer chain end with dicarboxylic anhydride represented by the formula (II) ##STR2## wherein Z is a divalent radical having from 6 to 27 carbon atoms and selected from the group consisting of a monoaromatic radical, condensed polyaromatic radical and noncondensed aromatic radical connected to each other with a direct bond or a bridge member, and essentially has no reactive radical at the polymer chain end, preparation process of the amorphous polyimide powder, heat-resistant adhesive comprising the polyimide, and bonding method using the adhesive.
    Type: Grant
    Filed: June 5, 1992
    Date of Patent: December 6, 1994
    Assignee: Mitsui Toatsu Chemicals, Inc.
    Inventors: Wataru Yamashita, Shoji Tamai, Akihiro Yamaguchi
  • Patent number: 5371173
    Abstract: The synthesis of a nonlinear chromophoric co-monomer 3,5-diamino-4'-nitrodiphenylamine and use as a reactive component in combination with a bismaleimide monomer in a NLO-active polyimide matrix is disclosed. After concurrent corona or contact poling and thermal polymerization, thin films of these chromophoric polyimides exhibit high second harmonic generation efficiencies and high DSC-determined glass transition temperatures. These poled polyimides also exhibit excellent SHG temporal stability, retaining 85-90% of the initial second harmonic efficiency after more than one month in air at 85.degree. C.
    Type: Grant
    Filed: November 25, 1992
    Date of Patent: December 6, 1994
    Assignee: Northwestern University
    Inventors: Tobin J. Marks, Michael A. Hubbard, Jiann T. Lin
  • Patent number: 5362837
    Abstract: Macrocyclic polyetherimide oligomer compositions are prepared by a displacement reaction at a temperature in the range of about 200.degree.-225.degree. C. between at least one fluorinated aromatic phthalimide and at least one phenolic trialkylsilyl ether compound. Preferably, a bis-fluoroimide and a bis-trialkylsilyl ether of a dihydroxyaromatic compound such as resorcinol are employed. The reaction is conducted by maintaining reagents A and B in high dilution in a dipolar aprotic organic liquid such as N-methylpyrrolidone, and in the presence of a catalytic amount of at least one substantially soluble fluoride. Preferably, a mixture of reagents A and B is added to solvent containing the catalyst.
    Type: Grant
    Filed: July 26, 1993
    Date of Patent: November 8, 1994
    Assignee: General Electric Company
    Inventors: Tohru Takekoshi, Jane M. Terry
  • Patent number: 5357032
    Abstract: A diamine compound of the general formula ##STR1## wherein the arrows denote isomerism, R.sub.1 is a divalent aromatic group selected from the group consisting of ##STR2## R.sub.2 is a tetravalent aromatic group selected from the group consisting of ##STR3## and R.sub.4 is a monovalent aliphatic group selected from the group consisting of ethyl and isopropyl; and, a process for preparing same.
    Type: Grant
    Filed: August 17, 1992
    Date of Patent: October 18, 1994
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Suh Bong Rhee, Ji Y. Chang, Bong S. Moon, Ji-Woong Park
  • Patent number: 5357031
    Abstract: An aromatic copolyamide which is soluble in organic copolyamide solvents and contains recurring structural units of formulae I, II and III ##STR1## in which at least some of the radicals R.sup.1 are a group of formula --OC--R.sup.2 --CO--, in which R.sup.2 is a divalent aromatic radical having valence bonds in the para-position or in a comparable coaxial of parallel position to one another, and in which the remaining radicals are as defined.
    Type: Grant
    Filed: July 6, 1993
    Date of Patent: October 18, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Georg-Emerich Miess, Karl Heinrich, Peter Klein
  • Patent number: 5357033
    Abstract: Film forming aromatic organic polymers are provided having a dielectric constant greater than 3 resulting from the polymerization of aromatic organic monomers having orientable organic dipolar groups with a net dipole moment of at least 0.5 Debye. Among the aromatic organic polymers are included polyimides and polyetherimides having repeat main chain groups with orientable organic dipolar groups with non-symmetrically positioned polar radicals, such as fluoro and nitrile.
    Type: Grant
    Filed: April 1, 1993
    Date of Patent: October 18, 1994
    Assignee: General Electric Company
    Inventors: John T. Bendler, Tohru Takekoshi, Clive W. Reed
  • Patent number: 5354839
    Abstract: A polyimide comprising a requisite structural unit having one or more recurring structural units of the formula: ##STR1## such as the structural units of the formula ##STR2## The polyimide can have an extremely low dielectric constant and is colorless, transparent and excellent in processability and heat resistance, and also provides an aromatic diamine which is useful as a raw material monomer of the polyimide or a raw material of other various engineering plastics.
    Type: Grant
    Filed: March 31, 1993
    Date of Patent: October 11, 1994
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Wataru Yamashita, Yoshihiro Sakata, Toshiyuki Kataoka, Yuichi Okawa, Hideaki Oikawa, Tadashi Asanuma, Mitsunori Matsuo, Tsutomu Ishida, Keizaburo Yamaguchi, Akihiro Yamaguchi
  • Patent number: 5349039
    Abstract: Disclosed is a polyester-imide prepared from a condensation polymerization of aromatic diacid, diimide diacid, and diol, having a carboxy to hydroxy equivalent molar ratio of 0.9:1 to 1.1:1. The disclosed polyester-imide has outstanding heat-resistance, remarkable filming ability, and high solubility in both phenol series and amide series solvents.
    Type: Grant
    Filed: October 20, 1992
    Date of Patent: September 20, 1994
    Assignee: Industrial Technology Research Institute
    Inventors: Chien-Hui Li, Tzong-Ming Lee, Jyh-Chien Chen
  • Patent number: 5346982
    Abstract: A polyimide-based heat-resistant adhesive having excellent peel strength and heat resistance comprising polyimide composed of 10 to 99% by mole of structural units having the formula (1) and 1 to 90% by mole of structural units having the formula (2) or comprising polyamic acid precursor which corresponds to the polyimide.
    Type: Grant
    Filed: June 7, 1993
    Date of Patent: September 13, 1994
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Shoji Tamai, Katsuaki Iiyama, Akihiro Yamaguchi
  • Patent number: 5344914
    Abstract: A new method for preparing commercially valuable polymeric ketones is described. The method employs an .alpha.-amiononitrile as a monomeric unit whereby an amorphous, soluble polymer having protected carbonyl moiety is obtained. Upon deprotecting the carbonyl moiety, a crystalline polymeric ketone is obtained. The method allows production of polymeric ketone materials having aromatic, aliphatic or mixed aromatic/aliphatic backbones.
    Type: Grant
    Filed: October 5, 1992
    Date of Patent: September 6, 1994
    Assignee: The Center for Innovative Technology*
    Inventors: Harry W. Gibson, Ashish Pandya
  • Patent number: 5344916
    Abstract: A negative birefringent film, useful in liquid crystal displays, and a method for controlling the negative birefringence of a polyimide film is disclosed which allows the matching of an application to a targeted amount of birefringence by controlling the degree of in-plane orientation of the polyimide by the selection of functional groups within both the diamine and dianhydride segments of the polyimide which affect the polyimide backbone chain rigidity, linearity, and symmetry. The higher the rigidity, linearity and symmetry of the polyimide backbone, the larger the value of the negative birefringence of the polyimide film.
    Type: Grant
    Filed: June 4, 1993
    Date of Patent: September 6, 1994
    Assignee: The University of Akron
    Inventors: Frank W. Harris, Stephen Z. D. Cheng
  • Patent number: 5344910
    Abstract: Polycarbonate resins containing repeating or recurring polymer chain units of the formula: ##STR1## wherein R represents alkyl are useful in high temperature applications, when thermoplastically molded into articles.
    Type: Grant
    Filed: March 23, 1993
    Date of Patent: September 6, 1994
    Assignee: General Electric Company
    Inventor: Paul D. Sybert
  • Patent number: 5342905
    Abstract: A two step process for the preparation of an ester group-containing polyether sulfone is disclosed. In the first step a dihalogenodiphenyl sulfone is reacted with excess amount of an aromatic dihydroxy compound and in a second step the reaction product is reacted with a dicarboxylic acid derivative. The excess amount of the aromatic dihydroxy compound is that amount which is sufficient to react with said derivative to form the corresponding ester. The process of the invention is characterized by its economics and good yield and by the high purity of the product. The thus produced polyether sulfone is useful as a thermoplastic resin and as a reactant in the melt blending process for the preparation of block copolymers.
    Type: Grant
    Filed: January 29, 1993
    Date of Patent: August 30, 1994
    Assignee: Miles Inc.
    Inventors: Robert J. Kumpf, Aaron D. Meltzer, Harald Pielartzik
  • Patent number: 5340904
    Abstract: A compound or polymer having a bis(phenoxy)naphthalene structure, a high molecular weight, and very good mechanical performance and heat-resistivity is provided. The polymer can be polyamides, polyimides or poly(amide-imide)s and can have a basic structure of ##STR1## wherein R1 is a naphthalene ring.
    Type: Grant
    Filed: December 29, 1992
    Date of Patent: August 23, 1994
    Assignee: National Science Council
    Inventors: Chin-Ping Yang, Wen-Tung Chen
  • Patent number: 5338821
    Abstract: Benzofuran-ether-sulphone monomers of formula ##STR1## and ether ketone polymers derived therefrom of formula ##STR2##
    Type: Grant
    Filed: April 26, 1993
    Date of Patent: August 16, 1994
    Assignee: Raychem Limited
    Inventor: Ian D. H. Towle
  • Patent number: 5338826
    Abstract: A structure which is effective as an electrical insulator or as a transmitter-receiver of electromagnetic energy is prepared by providing a suitable substrate and covering the substrate with an adhering layer of a low dielectric, high temperature, linear aromatic polyimide.
    Type: Grant
    Filed: September 28, 1992
    Date of Patent: August 16, 1994
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administation
    Inventors: Anne K. St. Clair, Terry L. St. Clair, William P. Winfree
  • Patent number: 5334696
    Abstract: A thermosetting resin is comprised of (a) a bisimide, particularly a bismaleimide, (b) a reactive brominated aromatic compound, particularly a member of the group consisting of group consisting of tribromophenyl maleimide, tribromostyrene, and pentabromobenzyl acrylate; and(c) a multifunctional nitrogen compound, particularly dicyandiamide, and optionally(d) ethylene bistetrabromophthalimide.
    Type: Grant
    Filed: December 18, 1992
    Date of Patent: August 2, 1994
    Assignee: Allied Signal Inc.
    Inventors: Larry D. Olson, Jeffrey R. Kamla, Henry R. Johnson
  • Patent number: 5334697
    Abstract: A polyimide gas separation membrane containing repeating units derived from 9,9-disubstituted xanthene dianhydride is disclosed.
    Type: Grant
    Filed: October 4, 1993
    Date of Patent: August 2, 1994
    Assignee: L'Air Liquide, S.A.
    Inventor: John W. Simmons
  • Patent number: 5332799
    Abstract: In solutions of polyimide-forming starting materials, containing diamines and tetracarboxylic diesters, at least 2 mol % of the ester groups in the tetracarboxylic diesters are derived from alcohols of the general formulaHO--Z--O--X IorHO--Z--X IIwhere Z is a straight-chain or branched aliphatic radical of from 1 to 15 carbon atoms which can be interrupted by from 1 to 4 ether groups --O-- and X is an aromatic radical of from 5 to 20 carbon atoms which can also contain nitrogen, oxygen or sulfur as hetero atoms in the aromatic ring system, excepting benzyl alcohol as compound of the formula II in the case of the use of diamines having a basicity constant of less than or equal to 10.sup.-11.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: July 26, 1994
    Assignee: BASF Lacke+Farben Aktiengesellschaft
    Inventors: Rainer Blum, Hans J. Heller, Klaus Lienert
  • Patent number: 5328979
    Abstract: Copolyimide compositions and methods for their preparation which are melt-processible at relative low pressures, i.e. less than 1000 psi, and are suited for laminating and molding, are described. The invention additionally encompasses copolyimide precursors, reinforced polyimide composites and laminates made from said polyimides where the composite is reinforced by fibrous materials. This is achieved by reacting at least one aromatic dianhydride where each anhydride group is located on an aromatic ring with the carbonyl units in an ortho orientation relative to one another, with at least one diamine which is capable of a transmidization reaction upon incorporation into the polyimide backbone, and with at least one other diamine which is not capable of undergoing such reaction, the diamine which is capable of undergoing the transimidization reaction being present in an amount of from about 1-50 mole percent in relation to the diamine that is not susceptable to transimidization.
    Type: Grant
    Filed: November 16, 1992
    Date of Patent: July 12, 1994
    Assignee: The University of Akron
    Inventors: Frank Harris, Patricia A. Gabori
  • Patent number: 5324813
    Abstract: Low dielectric constant polyimides formed from an optionally fluorinated dianhydride and a fluorinated diamine are described. The fluorine containing constituents are sterically disposed so that the dipole moment of the constituents tend to cancel out. Since fluorine containing diamines are generally nonreactive, to achieve a polyimide of high enough molecular weight to be practically useful, a method of fabrication of a high molecular weight polymer from monomers of low reactivity is provided. The monomers, such as a diamine and dianhydride are provided in a solution within which a low molecular weight polyamic acid is formed. The solution is dried. The polyamic acid used is cured to a low molecular weight polyimide. The polyimide is redisolved, redryed and recured enough times to build up the molecular weight to a useful level. The method is applicable to fabricating other polymers of high molecular weight, such as polyamides, polyesters and polyurethanes.
    Type: Grant
    Filed: July 22, 1992
    Date of Patent: June 28, 1994
    Assignee: International Business Machines Corporation
    Inventors: Gareth G. Hougham, Jane M. Shaw, Alfred Viehbeck
  • Patent number: 5322924
    Abstract: Addition polyimide resins having improved thermo-oxidative stability and enhanced processability are prepared by the reaction of a mixture of monomers comprising a non-planar polyphenyl diamine (a), a diester of tetracarboxylic acid or the corresponding dianhydride (b) and an end-capping agent (c), or a diamine (d), a non-planar polyphenyl diester or dianhydride of a tetracarboxylic acid (e) and an end-capping agent (c).
    Type: Grant
    Filed: October 7, 1991
    Date of Patent: June 21, 1994
    Assignee: The United States of America as represented by the United States National Aeronautics and Space Administration
    Inventors: Chun-Hua K. Chuang, Raymond D. Vannucci
  • Patent number: 5322916
    Abstract: A polyamide precursor of a polybenzazole polymer is prepared by reacting an aromatic bis(alkenyl)ester with a ring forming, aromatic diamine. The precursor can be prepared in an organic solvent for the monomers to form a soluble polyamide precursor which can be subsequently cyclocondensed to form a PBX polymer. A polybenzoxazole precursor is prepared by the reaction of a bis(alkenyl)ester and a bis(ortho-hydroxyamine). A polybenzazole polymer is easily prepared by heating the polyamide, PBX precursor.
    Type: Grant
    Filed: March 16, 1993
    Date of Patent: June 21, 1994
    Assignee: The Dow Chemical Company
    Inventors: James J. O'Brien, Edmund P. Woo
  • Patent number: 5320886
    Abstract: This invention relates primarily to organofunctional monomers, predominantly dimethacrylates and/or diacrylates containing one or more (predominantly two carboxyl groups, with moieties that provide sufficient affinity with water to allow any desired amount of water and/or miscible fugitive solvents to be mixed homogeneously with these monomers and formulations containing them. The activity of water in the monomer formulations can be adjusted so that it is equal to the water activity in biological tissues. This promotes biocompatibility and enhances the adhesive characteristics of polymers prepared from these formulations. Probability statistics are disclosed that optimize the compositions of polymer reaction products.
    Type: Grant
    Filed: November 14, 1991
    Date of Patent: June 14, 1994
    Assignee: American Dental Association Health Foundation
    Inventor: Rafael L. Bowen
  • Patent number: 5321096
    Abstract: A thermoplastic resin composition comprise 99.9.about.50 parts by weight of one or more thermoplastic resin selected from the group consisting of aromatic polyimide, aromatic polyetherimide, aromatic polyamideimide, aromatic polyethersulfone and aromatic polyether ketone and 0.1.about.50 parts by weight of one or more liquid crystal type aromatic polyimide having recurring structural units represented by the formula (1): ##STR1## wherein R.sub.1 .about.R.sub.5 is a hydrogen atom, fluorine atom, trifluoromethyl, methyl, ethyl or cyano and may be the same or different, and R is a tetravalent radical having 6.about.27 carbon atoms and being selected from the group consisting of a monoaromatic radical, condensed polyaromatic radical and noncondensed aromatic radical connected each other with a direct bond or a bridge member.
    Type: Grant
    Filed: March 22, 1993
    Date of Patent: June 14, 1994
    Assignee: Mitsui Toatsu Chemical, Incorporated
    Inventors: Yuichi Okawa, Nobuhito Koga, Hideaki Oikawa, Tadashi Asanuma, Akihiro Yamaguchi
  • Patent number: 5317082
    Abstract: Polyimide optical waveguide structures comprising a core within a cladding wherein at least one of the core and the cladding is a polyimide containing 6FDA, BTDA, an aromatic diamine having bulky methyl groups ortho to the amine, and a co-diamine wherein the polyimides have the properties of low optical loss, low optical absorbance, controllable refractive index, and high thermal stability, and wherein the polyimides are photosensitive and solvent resistant.
    Type: Grant
    Filed: December 22, 1992
    Date of Patent: May 31, 1994
    Assignee: Amoco Corporation
    Inventors: Allyson J. Beuhler, David A. Wargowski
  • Patent number: 5314988
    Abstract: A process for forming a polymer (and the polymer formed thereby) for passivation, resist and bonding uses, for example, that is thermally stable at relatively high temperatures in excess of 400.degree. C., but is sensitive to electromagnetic radiation. The process includes forming a heteroatom ring polymer that includes a chain formed of a large number of closed aromatic rings such as polyimide groups. According to the present teaching, intervening moieties, (that is, chemical groupings) in the form of open ring precursors of the aromatic rings, such as polyamic acid groups are introduced between the successive closed aromatic rings, which destroy and/or delimit the colinear character and the coplanar character typical of the successive aromatic rings, thus rendering the aromatic rings sensitive to structural change by electromagnetic radiation exposure, and soluble in common organic solvents, but with the exposed HRP insoluble in resist developers.
    Type: Grant
    Filed: July 1, 1991
    Date of Patent: May 24, 1994
    Assignee: Academy of Applied Science, Inc.
    Inventor: James C. W. Chien
  • Patent number: 5312896
    Abstract: The present invention relates to porphyrins and to metal ion-containing monomers and polymers. The monomer ##STR1## wherein A, R.sup.1,R.sup.2,R.sup.3, and R.sup.4 defined herein, is used with dianhydride to produce a porphyrin polymer or a metal ion containing porphyrin polymer. These polymers are useful as electrical conductors and as liquid crystal polymers, non-linear (NLO) materials, magnetic materials, electrochromic polymers photo-and electrocatalysts and advanced materials.
    Type: Grant
    Filed: October 9, 1992
    Date of Patent: May 17, 1994
    Assignee: SRI International
    Inventors: Tilak R. Bhardwaj, Susanna C. Ventura, Subhash C. Narang
  • Patent number: 5312895
    Abstract: Para-ordered aromatic heterocyclic polymers having repeating units of the formula: ##STR1## wherein n has a value of 0.05 to 1.00 and Q is a benzobisazole of the formula ##STR2## wherein X is --S-- or --O--, are soluble in aprotic solvents.
    Type: Grant
    Filed: March 12, 1993
    Date of Patent: May 17, 1994
    Assignee: The United States of America as represented by the Secretary of the Air Force
    Inventors: Thuy D. Dang, Fred E. Arnold
  • Patent number: 5310863
    Abstract: Copolyamic acids carrying -CF3 group functionalized aromatic segments in the polymer chain derived from aromatic diamines and dianhydrides with linear-rigid-planar structure interrupted by linear-rigid-noncoplanar segments structure and the corresponding copolyimides films are provided. These copolyimides have low in-plane thermal coefficient of expansion, reduced anisotropy in the optical and dielectric properties, low moisture uptake, and improved polyimide-to-polyimide adhesion.
    Type: Grant
    Filed: January 8, 1993
    Date of Patent: May 10, 1994
    Assignee: International Business Machines Corporation
    Inventor: Krishna G. Sachdev
  • Patent number: 5310856
    Abstract: A heat-resistant and high-transparence polyesterimide composition is disclosed which is prepared from the reaction of: (a) an imidihydroxycarboxylic acid represented by the following formula: ##STR1## (b) at least one dicarboxylic, such as terephthalic acid or isophthalic acid, or mixture thereof, and (c) at least one dihydroxy compound represented by the following formula: ##STR2## Wherein Y can be --C(CH.sub.3).sub.2 --, --SO.sub.2 --, --CH(CH.sub.3)--, --(CH.sub.2).sub.m --, where m in an integer of 1 to 10, --O--, or --S--; X can be H, Cl, or Br; and n is an integer of 0 to 4. The polyesterimide resins disclosed in this invention also exhibit improved fabricability due to their improved solubility in organic solvents, and improved mechanical strength.
    Type: Grant
    Filed: January 11, 1993
    Date of Patent: May 10, 1994
    Assignee: Industrial Technology Research Institute
    Inventor: Chien-Hui Li
  • Patent number: 5310862
    Abstract: A photosensitive polyimide precursor composition containing as main ingredients a poly(amic acid) wherein at least one molecular end is esterified with an alcohol, a compound containing carbon-carbon unsaturation having photoreactivity, and a photopolymerization initiator.The photosensitive polyimide precursor composition of the present invention can be prepared without the formation of any harmful by-product. When film formed from this composition is masked for patterning and then subjected to exposure and development using a developer, the amount of exposed portion dissolved in the developer until unexposed portion is dissolved off by the developer, is small and so it is possible to obtain a thick pattern. Further, by heat-treating this pattern, there can be obtained a thick polyimide pattern.
    Type: Grant
    Filed: August 6, 1992
    Date of Patent: May 10, 1994
    Assignee: Toray Industries, Inc.
    Inventors: Hideshi Nomura, Masuichi Eguchi, Masaya Asano
  • Patent number: 5306741
    Abstract: An improved method of laminating a metal foil or sheet to a polyimide material is provided. A solution of a precursor of an intractable (i.e. thermosetting) polyimide is applied to a substrate and the solvent is removed to form a dry tack-free film. Thereafter, a solution of a precursor of a thermoplastic polyimide is applied onto the first film of polyimide and the solvent is removed to form a dry tack-free second film. Both films are then cured concomitantly at a sufficiently rapid rate and low temperature to effect substantial imidization of the polyimide precursors of both films without substantial crosslinking or densification of the polyimides in either of the films. Thereafter, a metal sheet or foil is laminated onto the thermoplastic polyimide film according to the following process. The thermoplastic film is contacted with the sheet or foil of metal to be laminated thereto.
    Type: Grant
    Filed: June 23, 1992
    Date of Patent: April 26, 1994
    Assignee: International Business Machines Corporation
    Inventors: Pei C. Chen, Thomas E. Kindl, Paul G. Rickerl, Mark J. Schadt, John G. Stephanie
  • Patent number: 5304626
    Abstract: A chemical resistant copolymer useful in electronic applications, said copolymer is a polyimide containing a 3,3',4,4'-tetracarboxybiphenyl dianhydride (BPDA) moiety, at least one other dianhydride moiety, and at least one diamine.
    Type: Grant
    Filed: September 13, 1991
    Date of Patent: April 19, 1994
    Assignee: Amoco Corporation
    Inventors: Marvin J. Burgess, Douglas E. Fjare, Herbert J. Neuhaus
  • Patent number: 5304627
    Abstract: Novel polyimides containing pendent siloxane groups (PISOX) were prepared by the reaction of functionalized siloxane compounds with hydroxy containing polyimides (PIOH). The pendent siloxane groups on the polyimide backbone offer distinct advantages such as lowering the dielectric constant and moisture resistance and enhanced atomic oxygen resistance. The siloxane containing polyimides are potentially useful as protective silicon oxide coatings and are useful for a variety of applications where atomic oxygen resistance is needed.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: April 19, 1994
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
    Inventors: John W. Connell, Terry L. St. Clair, Paul M. Hergenrother
  • Patent number: 5302692
    Abstract: The diamine, 1,3-diamino-5-pentafluorosulfanylbenzene (DASP), was reacted with various dianhydrides to form polyimides containing an SF.sub.5 moiety. These polyimides exhibit high glass transition temperatures, high density, low solubility, and low dielectric properties. These polymers were used to prepare semi-permeable membranes, wire coatings, and films and are useful for electronic, space and piezoelectric applications.
    Type: Grant
    Filed: May 27, 1993
    Date of Patent: April 12, 1994
    Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Adminstration
    Inventors: Anna K. St. Clair, Terry L. St. Clair
  • Patent number: 5300627
    Abstract: A silicon-modified, adhesive polyimide film composed mainly of the repetition units of the formula (I) and a process for producing a polyimide film composite product using the above film are provided, the formula (I) being ##STR1## the above process for producing a polyimide film composite product comprising subjecting the above-silicon-modified polyimide film to contact-bonding on heating to a material to be adhered, at an ultimate curing temperature of 130.degree.-230.degree. C.The above polyimide film is highly adhesive and heat-resistant in spite of heating at a relatively low temperature.
    Type: Grant
    Filed: September 15, 1992
    Date of Patent: April 5, 1994
    Assignee: Chisso Corporation
    Inventors: Kouichi Kunimune, Yoshihiro Soeda, Setsuo Itami, Kazutsune Kikuta
  • Patent number: 5300620
    Abstract: The heat resistant adhesive of the invention comprises polyamic acid and/or polyimide which are prepared by using 1,3-bis(3-aminophenoxy)benzene as an aromatic diamine component and 3,3',4,4'-biphenyltetracarboxylic dianhydride, 3,3',4,4'-benzophenonetetracarboxylic dianhydride and/or 3,3',4,4'-diphenylethertetracarboxylic dianhydride as tetracarboxylic acid dianhydrides, and further by blocking the polymer chain end with dicarboxylic anhydride or a monoamine compound; or comprises a polyimide solution containing the polyimide in a good solvent.The adhesive of the invention is a heat-resistant adhesive capable of adhering under mild temperature/mild pressure conditions. The adhesive of polyimide solution can provide desired adhesion by simple procedures such as applying to the adherend and heating under pressure and exhibits excellent adhesive strength.
    Type: Grant
    Filed: June 22, 1993
    Date of Patent: April 5, 1994
    Assignee: Mitsui Toatsu Chemicals, Incorporated
    Inventors: Hideaki Okikawa, Shoji Tamai, Katsuaki Iiyama, Saburo Kawashima, Akihiro Yamaguchi, Tadashi Asanuma
  • Patent number: 5298600
    Abstract: A fluorinated condensation copolyimide has repeating polymer units that include: ##STR1## in which X and Y are diamines. The copolyimide can be made by reacting a 3F-monomer and a 6F-monomer with an aromatic or aliphatic diamine. The 3F-monomer includes 4,4'-(2,2,2-trifluoro-1-phenylethylidene) diphthalic anhydride, a dialkylester of 4,4'-(2,2,2-trifluoro-1-phenylethylidene) diphthalic anhydride, 4,4'-(2,2,2-trifluoro-1-phenylethylidene) diphthalic acid, or mixtures thereof. The 6F-monomer includes 4,4'-[2,2,2-trifluoro-1-(trifluoromethyl)ethylidene] diphthalic anhydride, a dialkylester of 4,4'-[2,2,2-trifluoro-1-(trifluoromethyl)ethylidene] diphthalic anhydride, 4,4'-[2,2,2-trifluoro-1-(trifluoromethyl)ethylidene] diphthalic acid, or mixtures thereof.
    Type: Grant
    Filed: December 4, 1992
    Date of Patent: March 29, 1994
    Assignee: United Technologies Corporation
    Inventor: Daniel A. Scola
  • Patent number: 5298590
    Abstract: The present invention relates to a liquid crystal alignment treating agent which comprises a polyimide resin prepared from a diamine including an aromatic diamine having at least one linear alkyl group of at least 6 carbon atoms per benzene ring as the essential component and a tetracarboxylic acid and its derivative.The liquid crystal alignment treating agent obtained in accordance with the present invention comprises a polyimide resin having an alkyl group on a side chain, and accordingly provides a liquid crystal-aligned film containing liquid crystal molecules stably having an enhanced inclined alignment angle (tilt angle) to a substrate.
    Type: Grant
    Filed: August 13, 1992
    Date of Patent: March 29, 1994
    Assignee: Nissan Chemical Industries Ltd.
    Inventors: Hideyuki Isogai, Toyohiko Abe, Yoshihiro Tsuruoka, Hiroyoshi Fukuro
  • Patent number: RE34820
    Abstract: Sizing for carbon fibers with uncapped or capped linear polyamideimides.The uncapped linear polyamideimides useful as carbon fiber sizings generally contain repeating units having the general formula: ##STR1## Wherein R.sub.2 =a trivalent organic radical and generally benzenetriyl;R.sub.3 =a divalent organic radical; andn=an integer sufficiently large to provide a strong, tough coating.Useful capped, linear polyamideimide oligomers may be formed by including end caps with an unsaturated functionality (Y) containing a residue selected from the group consisting of: ##STR2## wherein R.sub.1 =lower alkoxy, aryl, aryloxy, substituted alkyl, substituted aryl, halogen, or mixtures thereof;j=0, 1 or 2;i=1 or 2;G=--CH.sub.2 --, --O--, --S--, --SO.sub.2 --, --SO--, --CO--, --CHR--, or --CR.sub.2 --;T=methallyl or allyl;Me=methyl; andR=hydrogen, lower alkyl, or phenyl.Prepregs and composites having carbon fibers sized with such polyamideimides are also described.
    Type: Grant
    Filed: November 15, 1993
    Date of Patent: January 3, 1995
    Assignee: The Boeing Company
    Inventors: Hyman R. Lubowitz, Clyde H. Sheppard, Ronald R. Stephenson