Ethylenically Unsaturated Reactant Patents (Class 528/205)
  • Patent number: 8039576
    Abstract: Compounds having the formulas below. R is an aromatic-containing group. Each M is an alkali metal. Each m is a positive integer. The value of n is a positive integer. The value p is 0 or 1. If p is 0 then n is 1. A thermoset made by curing a composition containing the below phthalonitrile monomers. A method of reacting a diphenyl acetylene compound with an excess of an aromatic diol in the presence of an alkali metal carbonate to form the above oligomer. A method of reacting a phenoxyphthalonitrile with an acetylene compound to form the phthalonitrile monomer below.
    Type: Grant
    Filed: September 6, 2007
    Date of Patent: October 18, 2011
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Matthew Laskoski, Teddy M Keller
  • Publication number: 20110117322
    Abstract: Disclosed is an optical sheet which is used in a liquid crystal display. The optical sheet is not readily damaged by external impact, and thus is easy to handle and can reduce failure rate, leading to a decrease in production cost and an increase in production efficiency. Also, it can prevent a decrease in brightness.
    Type: Application
    Filed: May 11, 2009
    Publication date: May 19, 2011
    Applicant: KOLON INDUSTRIES, INC.
    Inventors: Chang Pyo Hong, Kyung Jong Kim, Sung Chul Jeong
  • Publication number: 20110105638
    Abstract: An end-modified soluble polyfunctional vinyl aromatic copolymer, which is improved in heat resistance, thermal stability, solvent solubility, and compatibility with acrylate compounds, and a curable resin composition using the same are disclosed. The end-modified soluble polyfunctional vinyl aromatic copolymer is obtained by allowing a divinyl aromatic compound (a), a monovinyl aromatic compound (b), and an aromatic ether compound (c) to react with each other, and has, at an end, an end group derived from the aromatic ether compound and having an acrylate bond. The copolymer has a number average molecular weight Mn of 500 to 100,000, an introduction amount (c1) of the end group derived from the aromatic ether compound satisfies (c1)?1.0 (group/molecule), a molar fraction a? of a structural unit derived from the divinyl aromatic compound and a molar fraction b? of a structural unit derived from the monovinyl aromatic compound in the copolymer satisfy 0.05?a?/(a?+b?)?0.95.
    Type: Application
    Filed: March 3, 2009
    Publication date: May 5, 2011
    Applicant: Nippon Steel Chemical Co., Ltd.
    Inventors: Masanao Kawabe, Hiroko Terao, Natsuko Okazaki
  • Publication number: 20110065889
    Abstract: A polyether polymer containing a defined polymerization unit (—R1—O—R2—O—), R1 and R2 being derived from monomers (A) and (B), respectively; and a process for producing the polyether polymer comprising the step of copolymerizing the monomer (A) with the monomer (B) in the presence of a metal salt, wherein the monomer (A) is (A1) a non-conjugated mono-cyclic diene compound containing a cyclic skeleton, or (A2) a non-conjugated cyclic diene compound containing a mutual linking of plurality of a mono-cyclic structure having a cyclic skeleton, and the monomer (B) is an aliphatic diol, an alicyclic diol or a divalent phenol.
    Type: Application
    Filed: April 17, 2009
    Publication date: March 17, 2011
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: Osamu Ihata
  • Publication number: 20110060097
    Abstract: Monomers and polymers based on dihalogen indolocarbazole and poly(indolocarbazoles), and methods of making such and using the same are described, as well as organic electronic devices incorporating the same.
    Type: Application
    Filed: June 4, 2010
    Publication date: March 10, 2011
    Inventor: Hailiang Wang
  • Publication number: 20110051059
    Abstract: An organic layer composition and a liquid crystal display including the same are provided. An organic layer composition according to an exemplary embodiment includes a binder formed by copolymerizing compounds included in a first group and a second group, wherein the first group includes an acryl-based compound and the second group includes a compound without a —COO— group.
    Type: Application
    Filed: March 12, 2010
    Publication date: March 3, 2011
    Inventors: Hoon Kang, Jae-Sung Kim, Yang-Ho Jung, Jin-Ho Ju, Doo-Hee Jung, Jung-In Park, Shi-Yul Kim
  • Patent number: 7863347
    Abstract: A resin composition is provided comprising a compound having a structure represented by formula (1) and a crosslinking agent: wherein in formula (1), R0 is a single bond or has a structure represented by formula (2); R1 to R8 are respectively any of hydrogen, a group having an alicyclic structure, an organic group having 1 to 10 carbon atoms other than the group having an alicyclic structure, a hydroxyl group and a carboxyl group; and “X” is any of —O—, —NHCO—, —CONH—, —COO— and —OCO—; further, wherein in formula (2), “Ar” is an aromatic group; “Y” is any of a single bond, —O—, —S—, —OCO— and —COO—; “q” is an integer of 1 or more; R9 is hydrogen or an organic group having 1 or more carbon atoms and may be identical with or different from each other when “q” is an integer of 2 or more; at least one of R1 to R8 is the group having an alicyclic structure when R0 is a single bond; at least one of R1 to R9 is the group having an alicyclic structure when R0 has the structure represented by formula (2); and “*”
    Type: Grant
    Filed: March 16, 2007
    Date of Patent: January 4, 2011
    Assignee: Sumitomo Bakelite Company, Ltd.
    Inventors: Kazuyoshi Fujita, Atsushi Izumi, Yumiko Yamanoi, Takahiro Harada, Hiromi Oki, Yukiharu Ono
  • Patent number: 7862990
    Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C as set forth in the specification.
    Type: Grant
    Filed: December 31, 2007
    Date of Patent: January 4, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • Patent number: 7858726
    Abstract: A process for producing a low-molecular polyphenylene ether having a content of components with molecular weights of 20,000 or more of 10 mass % or less and a number average molecular weight of 4,000 or less by a redistribution reaction which involves reacting a raw polyphenylene ether having a number average molecular weight of 10,000 or more with a polyphenol compound and a radical initiator, characterized in that the redistribution reaction step is a step conducted in a solvent; the ratio of the raw polyphenylene ether to the solvent (raw polyphenylene ether:solvent) (mass ratio) is provided at 0.4:100 to 40:100 (mass ratio); and the ratio of the radical initiator to the solvent (radical initiator:solvent) (mass ratio) is provided at 0.5:100 to 5:100 (mass ratio).
    Type: Grant
    Filed: February 14, 2007
    Date of Patent: December 28, 2010
    Assignee: Asahi Kasei Chemichals Corporation
    Inventors: Kenzo Onizuka, Minoru Sakurai
  • Publication number: 20100324219
    Abstract: An arylalkenyl ether oligomer is produced by the reaction of a polyhaloalkene with a polyhydroxyaryl compound. Halogenation of the resultant oligomer produces a flame retardant having both aromatic and aliphatic bromine groups.
    Type: Application
    Filed: June 14, 2010
    Publication date: December 23, 2010
    Applicant: CHEMTURA CORPORATION
    Inventors: Frank Liu, Kenneth Bol, Mark Hanson, Larry Timberlake
  • Publication number: 20100317800
    Abstract: Tires and tread are made from resin formed from the polymerization of phenol, aromatic, and terpene and/or mono- and bi-cyclic mono- and bi-unsaturated hydrocarbons.
    Type: Application
    Filed: June 11, 2010
    Publication date: December 16, 2010
    Inventors: WOLFGANG PILLE-WOLF, ABHAY DESHPANDE
  • Publication number: 20100310424
    Abstract: The present invention generally relates to polymers with lasing characteristics that allow the polymers to be useful in detecting analytes. In one aspect, the polymer, upon an interaction with an analyte, may exhibit a change in a lasing characteristic that can be determined in some fashion. For example, interaction of an analyte with the polymer may affect the ability of the polymer to reach an excited state that allows stimulated emission of photons to occur, which may be determined, thereby determining the analyte. In another aspect, the polymer, upon interaction with an analyte, may exhibit a change in stimulated emission that is at least 10 times greater with respect to a change in the spontaneous emission of the polymer upon interaction with the analyte. The polymer may be a conjugated polymer in some cases. In one set of embodiments, the polymer includes one or more hydrocarbon side chains, which may be parallel to the polymer backbone in some instances.
    Type: Application
    Filed: June 7, 2010
    Publication date: December 9, 2010
    Applicant: Massachusetts Institute of Technology
    Inventors: Aimee Rose, Timothy M. Swager, Zhengguo Zhu, Vladimir Bulovic, Conor F. Madigan
  • Publication number: 20100297560
    Abstract: A positive resist composition including a base component (A?) which exhibits increased solubility in an alkali developing solution under action of acid and generates acid upon exposure, the base component (A?) including a polymeric compound (A1?) having a structural unit (a5-1) represented by general formula (a5-1), a structural unit (a0-1) represented by general formula (a0-1) and a structural unit (a0-2) that generates acid upon exposure, the structural unit (a0-2) containing a group represented by general formula (a0-2?) (wherein represents an anion moiety represented by one of general formulas (1) to (5)).
    Type: Application
    Filed: May 17, 2010
    Publication date: November 25, 2010
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro SESHIMO, Yoshiyuki UTSUMI, Yoshitaka KOMURO, Takeyoshi MIMURA, Daichi TAKAKI
  • Publication number: 20100266523
    Abstract: The invention relates to compositions of polyphenol derivatives, characterised in that said polyphenols contain monomers, oligomers or polymers of units of the formula (I), wherein said units are characterised by the simultaneous presence of a phloroglucinol-type core (core A) and of a catechol-type core (core B) bonded together by a segment of 3 carbons such as C, said derivatives being over-activated in terms of nucleophilic power by the alkylation of at least one phenol function of each constituent monomer unit, and stabilised by the esterification of all the others with mixtures of fatty acids in proportions representing those of vegetable oils mainly consisting of AGI. These compositions can particularly be used in cosmetics, nutrition and therapy.
    Type: Application
    Filed: November 17, 2008
    Publication date: October 21, 2010
    Inventor: Joseph Vercauteren
  • Publication number: 20100240831
    Abstract: Disclosed herein is a branched (meth)acrylate copolymer prepared by polymerizing a monomer mixture comprising (A) about 20 to about 99.999% by weight of a (meth)acrylate monomer having a refractive index higher than methyl methacrylate; (B) about 0 to about 79.999% by weight of a mono-functional unsaturated monomer; and (C) about 0.001 to about 10% by weight of a crosslinking monomer. The copolymer has a refractive index of about 1.495 to about 1.590.
    Type: Application
    Filed: June 2, 2010
    Publication date: September 23, 2010
    Applicant: Cheil Industries Inc.
    Inventors: Il Jin KIM, Kee Hae KWON
  • Patent number: 7781537
    Abstract: A curable composition includes an olefinically unsaturated monomer and a poly(arylene ether) having two polymerizable groups and an intrinsic viscosity of about 0.05 to about 0.30 deciliters per gram. The composition exhibits an improved combination of high flow during molding and high post-cure stiffness and impact strength. The composition is particularly useful for fabricating plastic-packaged electronic devices.
    Type: Grant
    Filed: October 24, 2007
    Date of Patent: August 24, 2010
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Joop Birsak, Herbert Shin-I Chao, Bryan Duffey, Amy Rene Freshour, Hugo Gerard Edward Ingelbrecht, Qiwei Liu, Michael Joseph O'Brien, Prameela Susarla, Michael Vallance, Kenneth Paul Zarnoch
  • Publication number: 20100204412
    Abstract: An oligomer having di-phenylethynyl endcaps is disclosed. The capped oligomer has the formula: D-A-D wherein D is a di-phenylethynyl endcap; and A is an oligomer selected from the group consisting of imidesulfone; ether; ethersulfone; amide; imide; ester; estersulfone; etherimide; amideimide; oxazole; oxazole sulfone; thiazole; thiazole sulfone; imidazole; and imidazole sulfone.
    Type: Application
    Filed: February 6, 2009
    Publication date: August 12, 2010
    Inventors: Thomas K. Tsotsis, Norman R. Byrd
  • Patent number: 7749539
    Abstract: Poly(ester-anhydrides) or polyesters formed from ricinoleic acid and natural fatty diacids and their method of preparation and its use for delivering bioactive agents including small drug molecules, peptides and proteins, DNA and DNA complexes with cationic lipids or polymers or nano and microparticles loaded with bioactive agents are disclosed herein. The drug delivery compositions are administered to a patient in a liquid form, increase in viscosity in vivo to form a drug depot or implant, and are able to release the incorporated bioactive agent for weeks. In the preferred embodiment, the drug delivery formulations are administered by injection. In one embodiment, the compositions are suitable for local or regional delivery of drugs to diseased sites, such as treating solid tumors and bone infections.
    Type: Grant
    Filed: January 23, 2004
    Date of Patent: July 6, 2010
    Assignee: Efrat Biopolymers Ltd.
    Inventor: Abraham J. Domb
  • Patent number: 7723420
    Abstract: An oligomer having the formula: Ar1 and Ar2 are each an aromatic group or a bisphenol residue. At least one of Ar1 and Ar2 is the aromatic group. The value of m is zero or one, and n is a positive integer. A polymer made by reacting the above oligomer with a crosslinker having at least two silyl hydrogen atoms. A method of: reacting a compound having the formula: with vinyl(dimethylchloro)silane to form the above oligomer. T is —OH, —Br, or —I.
    Type: Grant
    Filed: July 25, 2008
    Date of Patent: May 25, 2010
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Matthew Laskoski, Teddy M Keller
  • Publication number: 20100119980
    Abstract: The present invention relates to an organic spin coatable antireflective coating composition comprising a polymer where the polymer comprises (i) at least one unit with fused aromatic rings in the backbone of the polymer of structure (1), (ii) at least one unit with of structure (2), and, (iii) at least one unit with a cyclic aliphatic moiety in the backbone of the polymer of structure (3). where, Fr1 is a substituted or unsubstituted fused aromatic ring moiety with 3 or more aromatic rings, R? and R? are independently selected from hydrogen, C1-C4 alkyl, Z, C1-C4alkyleneZ and where Z is substituted or unsubstituted aromatic moiety, R1 is selected from hydrogen or aromatic moiety, and B is a substituted or unsubstituted cycloaliphatic moiety. The invention further relates to a process for imaging the present composition.
    Type: Application
    Filed: November 13, 2008
    Publication date: May 13, 2010
    Inventors: M. Dalil Rahman, Douglas McKenzie, Clement Anyadeigwu
  • Publication number: 20100081782
    Abstract: The present invention provides a compound having a formula: where R1 is selected from the group consisting of alkyl, CH2(OC2H4)OCH3, and —(OC2H4)OCH3; n is 0-4; Olig is an oligomer having a formula: -L-O-PAGR.R2]q where L is a optional linker moiety selected from the group consisting of —CH2O—, —CH2OX—, —OX—, —C(O)—, —C(O)X, —NH—, —NHC(O)—, —XNHC(O)—, —NHC(O)X—, —C(O)NH—, —C(O)NHX—, and where X is alky1-6 or is not present, Y is N or O or is not present, and R3 is alkyl1-6; PAG is a linear or branched polyalkylene glycol moiety; R2 is an alkyl1-22 capping moiety if X is present or alkyl2-22 if X is not present; and q is a number from 1 to the maximum number of branches on PAG; and m is 1-5.
    Type: Application
    Filed: November 20, 2009
    Publication date: April 1, 2010
    Inventors: Nnochiri N. Ekwuribe, Amy L. Odenbaugh
  • Patent number: 7662906
    Abstract: A polyfunctional phenylene ether oligomer (B) having 3 to less than 9 phenolic hydroxyl groups, obtained by reacting a polyfunctional phenol (A) having 3 to less than 9 phenolic hydroxyl groups per molecule and having alkyl groups and/or alkylene groups at 2- and 6-positions of at least one of the phenolic hydroxyl groups with a monohydric phenol compound of the formula (1), derivatives thereof, resin compositions containing the derivatives, curable films obtained therefrom and cured films thereof, wherein R1 and R2 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and R3 and R4 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group.
    Type: Grant
    Filed: February 9, 2007
    Date of Patent: February 16, 2010
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Kazuyoshi Uera, Takeru Horino, Daisuke Ohno, Kenji Ishii
  • Patent number: 7655386
    Abstract: An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.
    Type: Grant
    Filed: December 20, 2007
    Date of Patent: February 2, 2010
    Assignee: Cheil Industries, Inc.
    Inventors: Kyung Hee Hyung, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee
  • Publication number: 20090247717
    Abstract: A polyimide shown in formula (4) is provided. The polyimide is fabricated by performing a polycondensation reaction with diamine compound shown in formula (2) and various commercial or synthesized dianhydride compounds shown in formula (3) as monomers. In addition, polyimide copolymers are synthesized by various ratios of diamines shown in formulas (2), (7) and (8-1) to (8-7) and a dianhydride compound shown in formula (6). In formulas (3) and (4), Ar represents aromatic groups. In formula (6), X represents aromatic groups or alicyclic groups. In formula (7), n=1 to 10.
    Type: Application
    Filed: March 26, 2009
    Publication date: October 1, 2009
    Applicant: National Taiwan University of Science and Technology
    Inventor: Der-Jang Liaw
  • Publication number: 20090202947
    Abstract: The present invention provides a polymer suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance; a positive resist composition using the polymer; and a patterning process. The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).
    Type: Application
    Filed: January 22, 2009
    Publication date: August 13, 2009
    Applicant: SHIN-ETSU CHEMICAL CO.,LTD
    Inventors: Jun Hatakeyama, Takanobu Takeda
  • Publication number: 20090179000
    Abstract: A method of manufacturing an inkjet printhead, in which a solvent included in a positive photoresist composition or in a non-photosensitive soluble polymer composition which is used to form a sacrificial layer has a different polarity from that of a solvent included in a negative photoresist composition that is used to form at least one of a channel forming layer and a nozzle layer.
    Type: Application
    Filed: June 24, 2008
    Publication date: July 16, 2009
    Applicants: Samsung Electronics Co., Ltd, Korea Advanced Institute of Science and Technology
    Inventors: Jong-jin Park, Su-min Kim, Jin-baek Kim, Yong-ung Ha, Yong-seop Yoon, Byung-ha Park
  • Patent number: 7538177
    Abstract: A crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having high transparency, a low relative permittivity, high heat resistance, low birefringence and high flexibility, and which is obtained by subjecting a compound (Y-1) having a polymerizable double bond (A) and/or a phenolic hydroxyl group and a compound (Y-2) having a polymerizable double bond (A) and a fluorinated aromatic ring, to a condensation reaction in the presence of a HF-removing agent, with a particular fluorinated aromatic compound (B) and a compound (C) having at least 3 phenolic hydroxyl groups, the respective phenolic hydroxyl groups not being present in the same aromatic ring, and which has polymerizable double bonds (A) and ether bonds and has a number average molecular weight of from 1×103 to 5×105.
    Type: Grant
    Filed: December 21, 2007
    Date of Patent: May 26, 2009
    Assignee: Asahi Glass Company, Limited
    Inventors: Takeshi Eriguchi, Masahiro Ito, Kaori Tsuruoka, Yuichiro Ishibashi
  • Publication number: 20090123652
    Abstract: The present invention provides a simple, non-destructive and versatile method that enables layer-by-layer (LbL) assembly to be performed on virtually any substrate. A novel catechol-functionalized polymer which adsorbs to virtually all surfaces and can serve as a platform for LbL assembly in a surface-independent fashion is also provided.
    Type: Application
    Filed: November 10, 2008
    Publication date: May 14, 2009
    Applicant: Northwestern University
    Inventors: Phillip B. Messersmith, Haeshin Lee, Yuhan Lee, Zhongqiang Liu, Lesley Hamming
  • Publication number: 20090117478
    Abstract: An electrophotographic photosensitive body which has both good image stability and wear resistance under high temperature and high humidity conditions can be obtained by using a novel polycarbonate resin, which contains a structural unit represented by the general formula (I) below and having a long-chain unsaturated hydrocarbon group having a double bond, as a binder resin for a charge transport layer of an electrophotographic photosensitive body. In the formula (I), R1-R4 preferably represent a hydrogen atom or a methyl group, respectively; a represents a number of 7-20; and R6 represents a hydrogen atom, a methyl group or a phenyl group. Particularly preferably, the structural unit represented by the general formula (I) below is derived from 1,1-bis(4-hydroxy-3-methylphenyl)-10-undecene or 1,1-bis(4-hydroxyphenyl)-10-undecene.
    Type: Application
    Filed: March 28, 2007
    Publication date: May 7, 2009
    Inventor: Noriyoshi Ogawa
  • Publication number: 20090096136
    Abstract: A stamp is comprised of a thiol-ene polymer, wherein the thiol-ene polymer allows for creation of micro-scale or nano-scale patterns useful in soft or imprint lithography. A patterned thiol-ene polymer is fabricated by casting a thiol-ene mixture onto a patterned mold, curing the thiol-ene mixture to form the patterned thiol-ene polymer, and peeling off the patterned thiol-ene polymer from the silicon mold. A stamp comprised of a thiol-ene polymer may be replicated by exposing the to oxygen plasma to form a hydrophilic mold, exposing the hydrophilic mold to a fluorinating agent under vacuum conditions to form a functionalized surface of the hydrophilic mold, casting a thiol-ene mixture on top of the functionalized surface, photocuring the thiolene mixture to form a replica thiol-ene polymer, and peeling off the replica thiol-ene polymer.
    Type: Application
    Filed: October 13, 2008
    Publication date: April 16, 2009
    Applicant: THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Craig J. Hawker, Luis M. Campos, Ines Meinel
  • Patent number: 7511113
    Abstract: An aromatic ether oligomer or polyaromatic ether comprising the formula: O—Arn; wherein Ar is an independently selected divalent aromatic radical; formed by reacting a dihydroxyaromatic with a dihaloaromatic; and wherein the reaction is performed in the presence of a copper compound and cesium carbonate. The polyaromatic ether is formed when neither the dihydroxyaromatic nor the dihaloaromatic is present in an excess amount. The aromatic ether oligomer is formed by using an excess of either dihydroxyaromatic or dihaloaromatic. A phthalonitrile monomer comprising the formula: formed by reacting a 3- or 4-nitrophthalonitrile with a hydroxy-terminated aromatic ether oligomer. A thermoset formed by curing the phthalonitrile monomer. Processes for forming all the above.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: March 31, 2009
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Dawn D. Dominguez
  • Publication number: 20090071697
    Abstract: The present invention relates to a phenolic hydroxy group-containing rubber-modified polyamide resin which has, in the molecule, a phenolic hydroxy group-containing aromatic polyamide segment having a structure represented by the following formula (A) (wherein, m and n are average values and Ar represents a divalent aromatic group) and a butadiene (co)polymer segment selected from the following formula (B-1) or (B-2), —(CH2—CH?CH—CH2)X—??(B-1) —(CH2—CH?CH—CH2)Y—(CH2—CH(CN))Z—??(B-2) (wherein, each of x, y and z is an average value and 0.01?z/(y+z)?0.13, x represents a positive number of 5 to 200, and also y+z is a positive number of 10 to 200), and a resin composition containing said resin, in particular an epoxy resin composition; a cured product of said epoxy resin composition is excellent in flexibility, heat resistance and electrical properties especially at high temperature and high humidity.
    Type: Application
    Filed: October 26, 2006
    Publication date: March 19, 2009
    Inventors: Kazunori Ishikawa, Makoto Uchida, Shigeru Moteki
  • Publication number: 20090069484
    Abstract: Compounds having the formulas below. R is an aromatic-containing group. Each M is an alkali metal. Each m is a positive integer. The value of n is a positive integer. The value p is 0 or 1. If p is 0 then n is 1. A thermoset made by curing a composition containing the below phthalonitrile monomers. A method of reacting a diphenyl acetylene compound with an excess of an aromatic diol in the presence of an alkali metal carbonate to form the above oligomer. A method of reacting a phenoxyphthalonitrile with an acetylene compound to form the phthalonitrile monomer below.
    Type: Application
    Filed: September 6, 2007
    Publication date: March 12, 2009
    Applicant: The Government of the US, as represented by the Secretary of the Navy
    Inventors: Matthew Laskoski, Teddy M. Keller
  • Publication number: 20090025284
    Abstract: The present invention relates to a process for preparing 2-alkylpolyisobutenylphenols and their Mannich adducts, to compositions obtainable by this process and to their use.
    Type: Application
    Filed: February 1, 2005
    Publication date: January 29, 2009
    Applicant: Basf Aktiengesellschaft
    Inventors: Arno Lange, Helmut Mach, Hans Peter Rath, Dietmar Posselt, Anja Vinckier
  • Publication number: 20090018303
    Abstract: A process for producing a low-molecular polyphenylene ether having a content of components with molecular weights of 20,000 or more of 10 mass % or less and a number average molecular weight of 4,000 or less by a redistribution reaction which involves reacting a raw polyphenylene ether having a number average molecular weight of 10,000 or more with a polyphenol compound and a radical initiator, characterized in that the redistribution reaction step is a step conducted in a solvent; the ratio of the raw polyphenylene ether to the solvent (raw polyphenylene ether:solvent) (mass ratio) is provided at 0.4:100 to 40:100 (mass ratio); and the ratio of the radical initiator to the solvent (radical initiator:solvent) (mass ratio) is provided at 0.5:100 to 5:100 (mass ratio).
    Type: Application
    Filed: February 14, 2007
    Publication date: January 15, 2009
    Applicant: Asahi Kasei Chemicals Corporation
    Inventors: Kenzo Onizuka, Minoru Sakurai
  • Publication number: 20080312374
    Abstract: Disclosed herein is a polycarbonate copolymer comprising A) a structure derived from a dihydroxy alkylene oxide compound selected from the group consisting of formula (1a) and formula (1b): H-(E-X)l—OH ??(1a) H-(E-X-E)l-OH ??(1b) wherein E and X are different and each and independently are selected from the group consisting of formula (2a) and formula (2b): —(OCH2CH2)m— ??(2a) —(OCHRCH2)n— ??(2b) wherein R is a C1-8 alkyl group; l, m, and n are integers greater than or equal to 1; and wherein the weight average molecular weight of the total amount of the structures corresponding to formula (2b) in the copolymer is between 100 and 2,000 g/mol; and B) a structure derived from a dihydroxy aromatic compound, wherein the weight percentages are based on the total weight of the structures of A) and B).
    Type: Application
    Filed: June 15, 2007
    Publication date: December 18, 2008
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Gary C. Davis, Dibakar Dhara, Sarah Elizabeth Genovese, Katherine Glasgow, Gautam Madan, Patrick J. McCloskey, Yohana Perez de Diego, William D. Richards
  • Patent number: 7456247
    Abstract: A phenolic resin, which is the reaction product of a difunctional phenol compound and a divinyl ether having a cycloalkane structure, is provided. The phenolic resin is used to form a difunctional epoxy resin. The resulting epoxy resin features relatively increased molecular weight, and it is used to impart flexibility or improved dielectric properties. It also provides improved moisture and water resistance when used to produce a cured epoxy resin article.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: November 25, 2008
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Ichiro Ogura, Nobuya Nakamura, Tomoyuki Imada
  • Publication number: 20080287610
    Abstract: Provided is a copolycarbonate which can meet a wide range of molding conditions as a raw material and which results in providing good optical molded articles. It is a copolycarbonate comprising repetitive units represented by the following Formulas (I) and (II), wherein a content of the repetitive unit represented by Formula (II) described below is 1 to 30 mass %, and a viscosity number is 30 to 71. In the formulas, R1 and R2 represent an alkyl group having 1 to 6 carbon atoms; X represents a single bond, an alkylene group having 1 to 8 carbon atoms, an alkylidene group having 2 to 8 carbon atoms, a cycloalkylene group having 5 to 15 carbon atoms, a cycloalkylidene group having 5 to 15 carbon atoms, —S—, —SO—, —SO2—, —O—, —CO— or the like; R3 and R4 represent an alkyl group having 1 to 3 carbon atoms; Y represents a linear or branched alkylene group having 2 to 15 carbon atoms; a to d each are an integer of 0 to 4; and n is an integer of 2 to 450.
    Type: Application
    Filed: February 21, 2005
    Publication date: November 20, 2008
    Applicant: Idemitsu Kosan Co., Ltd.
    Inventors: Yasuhiro Ishikawa, Hiroshi Kawato, Atsushi Sato
  • Patent number: 7452959
    Abstract: An aromatic ether oligomer or polyaromatic ether comprising the formula: O—Arn; wherein Ar is an independently selected divalent aromatic radical; formed by reacting a dihydroxyaromatic with a dihaloaromatic; and wherein the reaction is performed in the presence of a copper compound and cesium carbonate. The polyaromatic ether is formed when neither the dihydroxyaromatic nor the dihaloaromatic is present in an excess amount. The aromatic ether oligomer is formed by using an excess of either dihydroxyaromatic or dihaloaromatic. A phthalonitrile monomer comprising the formula: formed by reacting a 3- or 4-nitrophthalonitrile with a hydroxy-terminated aromatic ether oligomer. A thermoset formed by curing the phthalonitrile monomer. Processes for forming all the above.
    Type: Grant
    Filed: March 17, 2004
    Date of Patent: November 18, 2008
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Dawn D. Dominguez
  • Patent number: 7411019
    Abstract: The present invention relates to polymer composite materials containing carbon nanotubes, particularly to those containing singled-walled nanotubes. The invention provides a polymer composite comprising one or more base polymers, one or more functionalized m-phenylenevinylene-2,5-disubstituted-p-phenylenevinylene polymers and carbon nanotubes. The invention also relates to functionalized m-phenylenevinylene-2,5-disubstituted-p-phenylenevinylene polymers, particularly to m-phenylenevinylene-2,5-disubstituted-p-phenylenevinylene polymers having side chain functionalization, and more particularly to m-phenylenevinylene-2,5-disubstituted-p-phenylenevinylene polymers having olefin side chains and alkyl epoxy side chains. The invention further relates to methods of making polymer composites comprising carbon nanotubes.
    Type: Grant
    Filed: August 25, 2004
    Date of Patent: August 12, 2008
    Assignee: Eltron Research, Inc.
    Inventor: Richard A. Bley
  • Publication number: 20080160461
    Abstract: An antireflective hardmask composition includes an organic solvent, an initiator, and at least one polymer represented by Formulae A, B, or C:
    Type: Application
    Filed: December 31, 2007
    Publication date: July 3, 2008
    Inventors: Kyong Ho Yoon, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyung Hee Hyung, Min Soo Kim, Jin Kuk Lee
  • Publication number: 20080135806
    Abstract: Compositions comprising at least one phosphorescent organometallic compound and a polymer comprising structural units of formula II are useful in organic light emitting devices wherein R1, R2, and R4 are independently at each occurrence a C1-C20 aliphatic radical, a C3-C20 aromatic radical, or a C3-C20 cycloaliphatic radical; wherein R3 and R5 are independently selected from the group consisting of hydrogen, triphenylsilyl, t-butyl, mesityl, diphenyl phosphine oxide, and diphenyl phosphine sulfide; and a, b and d are independently 0 or an integer ranging from 1 to 3.
    Type: Application
    Filed: June 19, 2007
    Publication date: June 12, 2008
    Applicant: GENERAL ELECTRIC COMPANY
    Inventors: Qing Ye, Jie Liu, Kyle Erik Litz
  • Publication number: 20080132669
    Abstract: To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having high transparency, a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses.
    Type: Application
    Filed: December 21, 2007
    Publication date: June 5, 2008
    Applicant: Asahi Glass Company, Limited
    Inventors: Takeshi Eriguchi, Masahiro Ito, Kaori Tsuruoka, Yuichiro Ishibashi
  • Patent number: 7368520
    Abstract: Crosslinked polymer blends comprising a poly(arylene ether) and a nonlinear optical chromophore. Also featured are electro-optic devices incorporating these blends.
    Type: Grant
    Filed: June 19, 2006
    Date of Patent: May 6, 2008
    Assignee: Lumera Corporation
    Inventors: Diyun Huang, Timothy M. Londergan
  • Publication number: 20080051507
    Abstract: A resin composition is provided and includes a copolymer having a structure represented by formula (I) and a structure represented by formula (II). In the formulae, X1 and X2 each independently represent a hydrogen atom, a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, or a substituted or unsubstituted alkoxy group; X3 and X4 each independently represent a hydroxyl group, a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group, a substituted or unsubstituted alkoxy group, or a substituted or unsubstituted alkoxycarbonyl group; a and b each independently are an integer of from 1 to 4, and n is an integer of from 1 to 10, and R1 represents a linear or branched alkylene group; and m is an integer of 10 or more.
    Type: Application
    Filed: March 7, 2007
    Publication date: February 28, 2008
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Kenji Yao
  • Patent number: 7329708
    Abstract: A curable composition includes an olefinically unsaturated monomer and a poly(arylene ether) having two polymerizable groups and an intrinsic viscosity of about 0.05 to about 0.30 deciliters per gram. The composition exhibits an improved combination of high flow during molding and high post-cure stiffness and impact strength. The composition is particularly useful for fabricating plastic-packaged electronic devices.
    Type: Grant
    Filed: August 18, 2004
    Date of Patent: February 12, 2008
    Assignee: General Electric Company
    Inventors: Joop Birsak, Herbert Shin-I Chao, Bryan Duffey, Amy Rene Freshour, Hugo Gerard Eduard Ingelbrecht, Qiwei Lu, Michael Joseph O'Brien, Prameela Susarla, Michael Vallance, Kenneth Paul Zarnoch
  • Patent number: 7307137
    Abstract: The present invention is directed to low dielectric polymers and to methods of producing these low dielectric constant polymers, dielectric materials and layers, and electronic components. In one aspect of the present invention, an isomeric mixture of thermosetting monomers, wherein the monomers have a core structure and a plurality of arms, is provided, and the isomeric mixture of thermosetting monomers is polymerized, wherein polymerization comprises a reaction of an ethynyl group that is located in at least one arm of a monomer.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: December 11, 2007
    Assignee: Honeywell International Inc.
    Inventors: Kreisler Lau, Feng Quan Liu, Paul Apen, Boris Korolev, Emma Brouk, Ruslan Zherebin, David Nalewajek, Roger Leung
  • Patent number: 7297347
    Abstract: The invention provides polyanhydrides with aliphatic hydrocarbon terminals having ester or amide bonds.
    Type: Grant
    Filed: November 27, 2001
    Date of Patent: November 20, 2007
    Assignee: Efrat Biopolymers Ltd
    Inventor: Abraham J. Domb
  • Patent number: 7276571
    Abstract: A process for making phenylene dioxydiacetic acid comprises (a) contacting a dihydroxybenzene under reaction conditions with a salt of haloacetic acid in a solution without adding a haloacetic acid to produce a salt of phenylene dioxydiacetic acid; and (b) optionally converting the salt of phenylene dioxydiacetic acid to free phenylene dioxydiacetic acid. In some embodiments, 1,3-phenylene dioxydiacetic acid (RDOA) is made by reacting resorcinol with sodium chloroacetic acid in a reaction mixture with a pH in the range of about 7 to about 11 and at a temperature from about 70° C. to 105° C. By adjusting the reactions conditions, a relatively high yield of 1,3-phenylene dioxydiacetic acid (i.e., greater than 80%) is obtained. The purified acid can be used in the synthesis of polyester, such as polyethylene terephthalate.
    Type: Grant
    Filed: June 29, 2005
    Date of Patent: October 2, 2007
    Inventors: Raj B. Durairaj, Michael N. Tackie
  • Publication number: 20070213499
    Abstract: A polyfunctional phenylene ether oligomer (B) having 3 to less than 9 phenolic hydroxyl groups, obtained by reacting a polyfunctional phenol (A) having 3 to less than 9 phenolic hydroxyl groups per molecule and having alkyl groups and/or alkylene groups at 2- and 6-positions of at least one of the phenolic hydroxyl groups with a monohydric phenol compound of the formula (1), derivatives thereof, resin compositions containing the derivatives, curable films obtained therefrom and cured films thereof, wherein R1 and R2 are the same or different and represent a hydrogen atom, a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group, and R3 and R4 are the same or different and represent a halogen atom, an alkyl group having 6 or less carbon atoms or a phenyl group.
    Type: Application
    Filed: February 9, 2007
    Publication date: September 13, 2007
    Inventors: Kazuyoshi Uera, Takeru Horino, Daisuke Ohno, Kenji Ishii