Phenolic Reactant Contains A Single Phenolic -oh Group Or A Single Inorganic Phenolate Thereof Patents (Class 528/212)
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Patent number: 8039572Abstract: Cyanate ester shape memory polymers (SMP). The polymers are preferably formed via reaction of a multifunctional cyanate ester and a mono functional cyanate ester and exist, in one inventive aspect, in the form of a cross-linked thermoset network. Optional catalysts and structural modifiers may be added to the reaction moieties to help control the glass transition temperature of the resulting SMP to greater than 0° C., preferably from about 150° C.-300° C.Type: GrantFiled: May 5, 2005Date of Patent: October 18, 2011Assignee: Cornerstone Research Group, Inc.Inventors: Tat Hung Tong, Richard Douglas Hreha, Benjamin John Vining
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Patent number: 8034894Abstract: A terminal modified polycarbonate having a high content of biogenic matter, excellent heat resistance, heat stability, moldability and moist absorption resistance and high surface energy and a manufacturing process thereof are provided. The terminal modified polycarbonate has a main chain essentially composed of a recurring unit represented by the following formula (1): has a specific viscosity at 20° C. of a solution obtained by dissolving 0.7 g of the polycarbonate in 100 ml of methylene chloride of 0.2 to 0.5, and contains a terminal group represented by the following formula (2) or (3) in an amount of 0.Type: GrantFiled: March 5, 2008Date of Patent: October 11, 2011Assignee: Teijin LimitedInventors: Toshiyuki Miyake, Masami Kinoshita, Mizuho Saito, Katsuhiko Hironaka
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Patent number: 7960483Abstract: An adamantane derivative of formula (I), a compound of formula (VII) or (VIII), compositions containing them, and optical electronic members using the resin compositions. In the formulas, W represents, for example, a hydrogen atom, X is bonded to a bridge-head adamantane carbon and represents, for example, a group of represented by the general formula (II), Y represents a group of formula (V) or (VI), R1 represents a methyl group or an ethyl group, R2 represents a C1 to C10 hydrocarbon group which may contain O or S, m is an integer of 2 to 4, k is an integer of 0 to (16?m) and p and q are each an integer of 1 to 5.Type: GrantFiled: February 1, 2007Date of Patent: June 14, 2011Assignee: Idemitsu Kosan Co., Ltd.Inventors: Hajime Ito, Yasunari Okada, Hideki Yamane, Nobuaki Matsumoto
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Patent number: 7897697Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: June 24, 2009Date of Patent: March 1, 2011Assignee: DuPont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Publication number: 20100316949Abstract: The present invention relates to an organic spin on hard mask antireflective coating composition comprising a polymer comprising at least one unit of fused aromatic rings in the backbone of the polymer and at least one unit with a cycloaliphatic moiety in the backbone of the polymer. The invention further relates to a process for making the polymer and a process for imaging the present composition.Type: ApplicationFiled: June 10, 2009Publication date: December 16, 2010Inventors: M. Dalil Rahman, Douglas McKenzie, Guanyang Lin, Jianhui Shan, Ruzhi Zhang, Mark Neisser
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Patent number: 7825404Abstract: An embodiment of the invention provides an integrated circuit having an organic field effect transistor (OFET) with a dielectric layer. The dielectric layer is prepared from a polymer formulation comprising: about 100 parts of at least one crosslinkable base polymer, from about 10 to about 20 parts of at least one di- or tribenzyl alcohol compound as an electrophilic crosslinking component, from about 0.2 to about 10 parts of at least one photo acid generator, and at least one solvent. Another embodiment provides a semiconductor fabrication method. The method comprises applying the polymer formulation to a surface of a substrate, drying the polymer formulation, crosslinking the polymer formulation after drying, and baking the polymer formulation after crosslinking.Type: GrantFiled: August 8, 2008Date of Patent: November 2, 2010Assignee: Qimonda AGInventors: Marcus Halik, Hagen Klauk, Guenter Schmid, Andreas Walter, Ute Zschieschang
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Patent number: 7816014Abstract: The present invention provides a liquid crystalline polyester comprising (a) a repeating unit derived from aromatic hydroxycarboxylic acid, (b) a repeating unit derived from aromatic dicarboxylic acid and (c) a repeating unit represented by —X—Ar1-O—Ar1-Y—, wherein Ar1 represents 1,4-phenylene which may be substituted by a halogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group having 6 to 20 carbon atoms, and X and Y independently represent O or NH. The polyester in the preset invention has a sufficiently low dielectric constant and/or is a sufficiently high resistance in hydrolysis.Type: GrantFiled: January 13, 2006Date of Patent: October 19, 2010Assignee: Sumitomo Chemical Company, LimitedInventors: Toyonari Ito, Tomoya Hosoda, Satoshi Okamoto
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Publication number: 20100210790Abstract: A halogenated aromatic polymer has between 2 and 100 monomer units each comprising an aromatic group substituted with at least one halide group, wherein at least one of said monomer units has the following formula (I): —Ar1-A-(Ar2-B)y-(Ar3-C)z-??(I) wherein Ar1, Ar2 and Ar3 are the same or different and each is an aromatic group substituted with at least one halide group; A is selected from CO, CO2, S, SO2, a single bond, and a C1 to C6 alkyl chain; B and C are the same or different and each is selected from O, CO, CO2, CO3, S, SO2, a single bond, and a C1 to C6 alkyl chain; and each of y and z is independently zero or 1.Type: ApplicationFiled: February 9, 2010Publication date: August 19, 2010Applicant: CHEMTURA CORPORATIONInventors: Larry D. Timberlake, James D. Sibecker
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Publication number: 20100160594Abstract: A melt polymerized polycarbonate comprising repeat units in the polycarbonate derived from the melt polymerization of monomers (II) and/or (III), monomer (IV), and optionally monomer (VIII), wherein monomers (II) and (III) are diaryl dihydroxy compounds, monomer (IV) is a sterically hindered dihydroxy compound, and monomer (VIII) is a non-sterically hindered dihydroxy diaryl compound; wherein the mole ratio of repeat units in the polycarbonate derived from monomers [(II)+(III)]:(IV):(VIII) is 15-70:1-85:0-50, the sum of the mole percent of repeat units in the polycarbonate derived from monomers [(II)+(III)]+(IV) is greater than or equal to 50 mole %, and the sum of the mole percent of units in the polycarbonate derived from monomers [(II)+(III)]+(IV) +(VIII) is 100 mole %; and wherein the polycarbonate has an L* value that is at least 1 L* unit value higher than the same polycarbonate in which monomer (IV) is replaced by bisphenol A.Type: ApplicationFiled: December 18, 2008Publication date: June 24, 2010Inventors: Hans-Peter BRACK, Dennis Karlik, Jan-Pleun Lens, Dennis James Patrick Maria Willemse, Josef Gerardus Berndsen
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Patent number: 7718756Abstract: A process for preparing a polybromoaryl ether, comprising adding to a solvent for the polybromoaryl ether a mixture of (1) at least one compound of the structure HO—Ar—X1, X2, X3, X4, X5, wherein Ar is an aryl group and X1, X2, X3, X4, and X5 are independently selected from hydrogen and bromine, provided that at least one of X1, X2, X3, X4, and X5 is bromine, (2) at least one alkali or alkaline metal hydroxide, and (3) at least one polymerization initiator, wherein the solvent for the polybromoaryl ether is a non-solvent for alkali metal bromides.Type: GrantFiled: April 14, 2009Date of Patent: May 18, 2010Assignee: Chemtura CorporationInventors: Larry D. Timberlake, William R. Fielding, Sumit Mathur, Mark V. Hanson
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Patent number: 7718758Abstract: Poly(1,4-dihydroxy)-phenylenes (polyhydroquinones) having antihypoxic and antioxidative properties and prolonged paramagnetism, and represented by general formula: where n=0-13. The polyhydroquinones possess the possibility to increase significantly the labour-efficiency of an organism. The polyhydroquinones can be produced by hydrolysis of arbutin containing vegetable raw material followed by its polymerization; by polymerization of hydroquinone in the presence of catalyst (and without it); or by reduction of hydroquinone followed by polymerization along with purification.Type: GrantFiled: July 13, 2006Date of Patent: May 18, 2010Inventors: Andrey Leonidovich Zagorsky, Karl Karlovich Kalninsh, Dmitri Kirillovitsh Toporov
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Publication number: 20100105845Abstract: The present invention relates to a process of producing polyarylene sulfide (PAS) and PAS resin produced therefrom, and more specifically, to a process of preparing polyarylene sulfide with better thermal properties and luminosity than conventional PAS and the PAS resin produced therefrom, including the steps of: a) melting and mixing a composition including solid sulfur, iodinated aryl compounds, and a polymerization terminator; b) polymerizing the molten mixture of step a) for 1 to 30 hours while increasing the temperature and decreasing the pressure from initial reaction conditions of a temperature of 180 to 250° C. and a pressure of 50 to 450 Torr to final reaction conditions of a temperature of 270 to 350° C. and a pressure of 0.001 to 20 Torr; and c) heating the reaction product of step b) at a temperature of 270 to 350° C. for 1 to 25 hours.Type: ApplicationFiled: January 4, 2008Publication date: April 29, 2010Applicant: SK CHEMICALS CO., LTD.Inventors: Young-Rok Lee, Il-Hoon Cha, Jun-Sang Cho
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Publication number: 20100087590Abstract: The object of the present invention is to provide an epoxy resin composition capable of realizing low dielectric constant and low dielectric dissipation factor, which is suited for use as a latest current high-frequency type electronic component-related material, without deteriorating heat resistance during the curing reaction. A phenol resin, which has the respective structural units of a phenolic hydroxyl group-containing aromatic hydrocarbon group (P) derived from phenols, an alkoxy group-containing condensed polycyclic aromatic hydrocarbon group (B) derived from methoxynaphthalene and a divalent hydrocarbon group (X) such as methylene and also has a structure represented by -P-B-X- wherein P, B and X are structural sites of these groups in a molecular structure, is used as a curing agent for the epoxy resin, or a phenol resin as an epoxy resin material.Type: ApplicationFiled: December 9, 2009Publication date: April 8, 2010Applicant: DAINIPPON INK AND CHEMICALS, INC.Inventors: Ichirou OGURA, Yoshiyuki TAKAHASHI, Yutaka SATO
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Patent number: 7687570Abstract: A thermosetting resin material is provided with: (A) a thermosetting resin having a dihydrobenzoxazine ring; and (B) a condensed polycyclic aromatic hydrocarbon resin is described.Type: GrantFiled: June 20, 2008Date of Patent: March 30, 2010Assignee: Akebono Brake Industry Co., Ltd.Inventors: Shou Kurihara, Hiroshi Idei, Yoshihiro Aoyagi, Naeko Okumura
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Patent number: 7678876Abstract: Hydroxy-aromatic compounds of formula (I) are provided: wherein at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; wherein formula (II) is the following group: wherein EWG is an electron-withdrawing group.Type: GrantFiled: December 1, 2005Date of Patent: March 16, 2010Assignee: DSM IP Assets B.V.Inventors: Rudolfus A T M Van Benthem, Renier H M Kierkels
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Publication number: 20100056748Abstract: [PROBLEM] To provide a novel star polymer useful as resist materials with high sensitivity and high resolution, and a novel coupling agent for anionic polymerization for synthesizing the polymer. [MEANS FOR SOLVING THE PROBLEM] A star polymer comprising: a core part derived from a coupling agent for anionic polymerization composed of an acid-degradable compound having an organic group derived from a halide; and an arm part that is attached to the core part and composed of an acid-degradable polymer chain obtained by anionic polymerization; and the coupling agent for anionic polymerization.Type: ApplicationFiled: August 26, 2009Publication date: March 4, 2010Applicant: TOHO CHEMICAL INDUSTRY CO., LTD.Inventor: Katsuhiko Yano
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Patent number: 7655386Abstract: An antireflective hardmask composition includes an organic solvent, and at least one polymer represented by Formulae A, B or C: In Formulae A and B, the fluorene group is unsubstituted or substituted, in Formula C, the naphthalene group is unsubstituted or substituted, n is at least 1 and is less than about 750, m is at least 1, and m+n is less than about 750, G is an aromatic ring-containing group having an alkoxy group, and R1 is methylene or includes a non-fluorene-containing aryl linking group.Type: GrantFiled: December 20, 2007Date of Patent: February 2, 2010Assignee: Cheil Industries, Inc.Inventors: Kyung Hee Hyung, Jong Seob Kim, Dong Seon Uh, Chang Il Oh, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee
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Patent number: 7649075Abstract: A process for preparing polyphenylene ether by oxidizing phenols using water as a solvent, enabling polyphenylene ether to be prepared with only a small amount of oxidizer, while making it possible to reuse a solvent after reaction repeatedly. Water is used as the solvent. Phenols are oxidized under the presence of a water-soluble metal complex catalyst. For the water-soluble metal complex catalyst, it is preferable to use the one whose central metal is copper or manganese, having an amine multidentate ligand.Type: GrantFiled: September 7, 2005Date of Patent: January 19, 2010Assignee: Waseda UniversityInventors: Hiroyuki Nishide, Kei Saito
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Publication number: 20090318610Abstract: There are provided organic insulating materials exhibiting low permittivity, high heat resistance and high mechanical strength, as well as organic insulating films with low permittivity, high heat resistance and high mechanical strength that employ the same, and semiconductor devices comprising the foregoing. An organic insulating material comprising a compound represented by general formula (1), or a polymer obtained by polymerizing a compound represented by general formula (1), or a mixture of a compound represented by general formula (1) and the polymer. X-V?W?nY??(1) (In formula (1), X and Y each independently represent one or more groups with polymerizable functional groups. V and W each represent a group having an adamantane or polyamantane structure, and they may be the same or different. The letter n represents an integer of 0 or greater).Type: ApplicationFiled: August 24, 2009Publication date: December 24, 2009Applicant: SUMITOMO BAKELITE CO., LTDInventors: Mihoko MATSUTANI, Atsushi Izumi, Yohko Sano, Kazuyoshi Fujita
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Patent number: 7632896Abstract: A process for preparing derivatized poly(4-hydroxystryrene) having a novolak type structure which comprises the steps of (i) supplying a solution of methanol containing 4-hydroxyphenylmethylcarbinol, (ii) subjecting said solution to an acid catalyzed displacement reaction for a sufficient period of time and under suitable conditions of temperature and pressure to convert substantially all of said carbinol to 4-hydroxyphenylmethylcarbinol methyl ether in solution, (iii) polymerizing said ether containing solution in the presence of a suitable acid catalyst for a sufficient period of time and under suitable conditions of temperature and pressure to form a novolak type polymer.Type: GrantFiled: April 7, 2008Date of Patent: December 15, 2009Assignee: Dupont Electronic Polymers L.P.Inventors: Michael T. Sheehan, Edward G. Zey
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Publication number: 20090304977Abstract: A polycarbonate resin which is reduced in the change of hygroscopic-expansion coefficient with changing environ-mental humidity, is inhibited from warping, and is suitable for use as an optical material is provided with excellent productivity. The polycarbonate resin is obtained by reacting an aromatic dihydric phenol compound (2,2-bis(4-hydroxyphenyl)propane, etc.), a compound forming a carbonic ester (phosgene, etc.), and a chain terminator represented by the following general formula (A) (dodecyl 4-hydroxybenzoate, etc.). [Chemical formula 1] (A) (In the formula (A), n is an integer of 10-20.Type: ApplicationFiled: May 16, 2007Publication date: December 10, 2009Inventors: Tatsuya Kanagawa, Kazuhiro Andou
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Publication number: 20090292082Abstract: The present invention relates to a mold releasing film for printed circuit board production, which comprises a resin layer (P) containing (A) a polyphenylene ether-based resin in an amount of 50 wt % or more. According to the present invention, it is possible to provide a mold releasing film suitable for production of printed circuit boards, particularly flexible printed circuit boards, which is excellent in mold-releasing property, exhibits little heat shrinkage, hardly imparts wrinkles to printed circuit board products, itself hardly gets wrinkled, and is excellent in contamination resistance since no bleeding-out is observed, and which is also excellent in an anti-moisture absorbing property, shape-following property, less overflow of adhesive, adhesion between multilayer films and slipping property between films.Type: ApplicationFiled: July 23, 2009Publication date: November 26, 2009Applicant: ASAHI KASEI CHEMICALS CORPORATIONInventors: Hiroshi Kamo, Yuuji Kusumi
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Publication number: 20090286929Abstract: A phenol aralkyl type phenolic resin represented by the general formula (1), wherein the total content of the compounds represented by formulae (2) to (4) is 58 to 92% as determined by GPC and the contents of the compounds represented by formulae (2) to (4) as determined by HPLC satisfy the following relationship: 0.60?(2a+b)/(2a+2b+2c)?0.90 wherein a is the content of the compound of formula (2); b is the content of the compound of formula (3); and c is the content of the compound of formula (4).Type: ApplicationFiled: November 29, 2006Publication date: November 19, 2009Inventors: Katsuhiko Oshimi, Shigeru Moteki, Takao Sunaga, Masataka Nakanishi, Sumio Ichimura
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Publication number: 20090286953Abstract: Copolycarbonates comprising alkylphenolchain terminator groups for adjusting the molecular weight, compositions of these copolycarbonates with additives chosen from the group of heat stabilizers and mould release agents, the use thereof for the production of moldings and moldings obtained therefrom.Type: ApplicationFiled: May 15, 2009Publication date: November 19, 2009Applicant: Bayer MaterialScience AGInventors: Helmut-Werner Heuer, Rolf Wehrmann
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Publication number: 20090247724Abstract: A poly(arylene ether) copolymer is the product of oxidative copolymerization of monomers including a monohydric phenol and a dihydric phenol. It has an intrinsic viscosity of about 0.04 to about 0.15 deciliter per gram and, on average, about 1.8 to about 2 hydroxyl groups per molecule. The poly(arylene ether) copolymer is enriched in low molecular weight copolymer chains and copolymer chains that include a terminal unit derived from the dihydric phenol.Type: ApplicationFiled: March 31, 2009Publication date: October 1, 2009Inventors: Alvaro Carrillo, Erik Rene Delsman, Hua Guo, Alexey Kruglov, Edward N. Peters
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Publication number: 20090202940Abstract: The present invention provides a polymer, having a high sensitivity, a high degree of resolution, a good pattern configuration after exposure, and in addition an excellent etching resistance, suitable as a base resin for a positive resist composition, especially for a chemically amplified positive resist composition; a positive resist composition using the polymer; and a patterning process. The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1).Type: ApplicationFiled: January 22, 2009Publication date: August 13, 2009Applicant: SHIN-ETSU CHEMICAL CO., LTD.Inventors: Jun Hatakeyama, Takanobu Takeda
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Patent number: 7572877Abstract: An object of the present invention is to provide a modified cyclic aliphatic polyamine having a low viscosity and a small content of unreacted polyamine which can provide, when it is used as a curing agent for epoxy resin, an epoxy resin composition having an improved workability without adding solvent or diluent and an excellent property of epoxy resin cure product. The above modified cyclic aliphatic polyamine is obtained by addition reaction of a cyclic aliphatic polyamine such as isophoronediamine and norbornanediamine and an alkenyl compound such as styrene. The modified cyclic aliphatic polyamine thus obtained is added in epoxy resin to be used as a curing agent for epoxy resin.Type: GrantFiled: October 22, 2007Date of Patent: August 11, 2009Assignee: Mitsubishi Gaschemical Company, Inc.Inventors: Takeshi Koyama, Tetsushi Ichikawa, Hisayuki Kuwahara, Masatoshi Echigo
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Patent number: 7563850Abstract: An inexpensive and durable polyelectrolyte composition includes both an aromatic polymer containing carbonyl linkages and/or sulfonyl linkages in the backbone chain and bearing cation-exchange groups and a fused salt exhibits a high ionic conductivity even in the absence of water or a solvent. The aromatic polymer is preferably an aromatic polyether sulfone comprising specific structural units and bearing cation-exchange groups, an aromatic polyether ketone comprising specific structural units and bearing cation-exchange groups, an aromatic polyether sulfone block copolymer consisting of at least one hydrophilic segment bearing cation-exchange groups and at least one hydrophobic segment free from cation-exchange groups, and/or an aromatic polyether ketone block copolymer consisting of at least one hydrophilic segment bearing cation-exchange groups and at least one hydrophobic segment free from cation-exchange groups.Type: GrantFiled: November 29, 2002Date of Patent: July 21, 2009Assignee: Ube Industries, Ltd.Inventors: Masayuki Kinouchi, Tetsuji Hirano, Nobuharu Hisano
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Publication number: 20090176165Abstract: A polymer composition includes an aromatic ring-containing polymer represented by Formula 1: wherein m and n satisfy the relations 1?m<190, 0?n<190, and 1?m+n<190.Type: ApplicationFiled: December 23, 2008Publication date: July 9, 2009Inventors: Hwan Sung Cheon, Jong Seob Kim, Kyong Ho Yoon, Min Soo Kim, Jin Kuk Lee, Jee Yun Song
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Publication number: 20090163693Abstract: A photoactive aromatic polymer having high fluorescence, including an aromatic compound as a backbone, through the polymerization of aromatic polycyclic monomers and a photoactive aromatic polymer having high conductivity and fluorescence even in a state in which the photoactive aromatic polymer is formed into a thin film.Type: ApplicationFiled: April 24, 2007Publication date: June 25, 2009Applicant: Industry-Academic Cooperation Foundation, Yonsei UniversityInventor: Eun Kyoung Kim
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Patent number: 7550551Abstract: A process for preparing a polybromoaryl ether comprising adding to a solvent for the polybromoaryl ether a mixture of (1) at least one compound of the structure HO—Ar—X1, X2, X3, X4, X5, wherein Ar is an aryl group and X1, X2, X3, X4, and X5 are independently selected from hydrogen and bromine, provided that at least one of X1, X2, X3, X4, and X5 is bromine, (2) at least one alkali or alkaline metal hydroxide, and (3) at least one polymerization initiator, wherein the solvent for the polybromoaryl ether is a non-solvent for alkali metal bromides.Type: GrantFiled: August 16, 2007Date of Patent: June 23, 2009Assignee: Chemtura CorporationInventors: Larry D. Timberlake, William R. Fielding, Sumit Mathur, Mark V. Hanson
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Publication number: 20090117388Abstract: Disclosed is a phenol aralkyl epoxy resin having a structure wherein at least a phenol or a naphthol is bound by using an aralkyl group as a linking group and a structure represented by formula (1) below, while satisfying the condition 1 below. This epoxy resin is excellent in workability during production of a composition and is easy to control quality. Condition 1: The following relation (?) is satisfied with A being the hydroxyl equivalent (as measured in accordance with JIS K 0070) of a phenol-modified epoxy resin obtained by adding an equivalent molar amount of phenol relative to the epoxy equivalent of the epoxy resin, and B being the epoxy equivalent of the epoxy resin.Type: ApplicationFiled: October 16, 2006Publication date: May 7, 2009Inventors: Masataka Nakanishi, Katsuhiko Oshimi, Kazuyuki Ohhashi, Toru Kurihashi
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Publication number: 20090062472Abstract: The present invention relates to novolak resins prepared with, inter alia, one or more alkylphenols. The invention further relates to compositions comprising the novolak resins, such as vulcanizable rubber compositions, and to products obtained therewith.Type: ApplicationFiled: September 10, 2008Publication date: March 5, 2009Applicant: SI GROUP, INC.Inventors: L. Scott HOWARD, Todd M. AUBE, Timothy Edward BANACH, James J. LAMB
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Publication number: 20090054587Abstract: An object of the present invention is to provide an epoxy resin exhibiting superior heat resistance, dielectric properties, water resistance, and workability, a resin composition containing the epoxy resin, and a prepreg and a laminated plate. The epoxy resin of the invention is expressed by the following formula. (In the formula, R represents a hydrocarbon group having a carbon number of 1 to 4. m Represents an integer of 1 to 4 and when m is 2 to 4, R's may be the same or different. n Represents a positive number of 1 to 6 on average.) The epoxy resin composition of the invention contains the epoxy resin of the invention and a curing agent.Type: ApplicationFiled: March 14, 2006Publication date: February 26, 2009Applicant: Nippon Kayaku Kabushiki KaishaInventors: Katsuhiko Oshimi, Yasumasa Akatsuka, Masataka Nakanishi, Takao Sunaga
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Patent number: 7491789Abstract: The present invention discloses a sulfur-containing phenolic resin which comprises an organic group represented by the following formula (1): —R1—S—R2—S—R1—??(1) wherein R1 represents a hydrocarbon group having 2 to 6 carbon atoms, R2 represents a hydrocarbon group having 1 to 10 carbon atoms, between a phenolic carbon and a phenolic carbon, phenol derivatives represented by the following formula (5): wherein R5 represents a C2-3 alkylene group, R6 represents a C1-10 alkylene group, G represents H, a C1-10 alkyl group, etc., and an epoxy resin composition containing (A) a curing agent of the above-mentioned formula (5) and (B) an epoxy resin as essential components.Type: GrantFiled: July 17, 2007Date of Patent: February 17, 2009Assignee: Hitachi Chemical Company, LtdInventors: Haruaki Sue, Takashi Kumaki, Hideyasu Tsuiki, Hiroshi Matsutani, Toshihiko Takasaki, Iwao Fukuchi
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Publication number: 20080269427Abstract: The present invention provides a bifunctional phenylene ether oligomer compound having a thermosetting functional group at each terminal, an epoxy resin containing the above oligomer compound and a use thereof. That is, it provides a sealing epoxy resin composition for sealing an electric part, an epoxy resin composition for laminates, a laminate, a printed wiring board, a curable resin composition and a photosensitive resin composition. The resins and resin compositions of the present invention are used in electronics fields in which a low dielectric constant, a low dielectric loss tangent and high toughness are required and also used for various uses such as coating, bonding and molding.Type: ApplicationFiled: May 29, 2008Publication date: October 30, 2008Inventors: Kenji Ishii, Yasumasa Norisue, Kiyonari Hiramatsu, Makoto Miyamoto, Makoto Yamazaki, Daisuke Ohno
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Publication number: 20080269456Abstract: Multifunctional reactive polymers created by chemical vapor deposition (CVD) and methods of making such polymeric systems are provided. Such polymers provide multifunctional surfaces which can present two or more different molecules (e.g. biological ligands) in controlled ratios. Polymers may include compositional gradients allowing attached ligands to be presented as continuous gradients across a surface. The polymer compositions are modularly designable and applicable to a wider range of applications, including biomedical devices and diagnostic systems.Type: ApplicationFiled: March 24, 2008Publication date: October 30, 2008Inventors: Joerg Lahann, Yaseen Elkasabi
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Publication number: 20080269416Abstract: A halogenated aryl ether oligomer is formed by halogenation of an aryl ether oligomer and is useful as a flame retardant for flammable macromolecular materials. Typically, the halogenated aryl ether oligomer comprises the following repeating monomeric units: wherein R is hydrogen or alkyl, especially C1 to C4 alkyl, Hal is halogen, m is at least 1, n is 0 to 3 and x is at least 2.Type: ApplicationFiled: April 16, 2008Publication date: October 30, 2008Inventors: Larry D. Timberlake, James D. Siebecker
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Publication number: 20080255315Abstract: An epoxy resin composition including an epoxy resin and a curing agent as essential components, in which the curing agent comprises a phenol resin which has each structural moiety of a phenolic hydroxyl group-containing aromatic hydrocarbon group (P), an alkoxy group-containing aromatic hydrocarbon group (B) and a divalent aralkyl group (X), and also has, in a molecular structure, a structure in which the phenolic hydroxyl group-containing aromatic hydrocarbon group (P) and the alkoxy group-containing aromatic hydrocarbon group (B) are bonded with the other phenolic hydroxyl group-containing aromatic hydrocarbon group (P) or alkoxy group-containing aromatic hydrocarbon group (B) via the divalent aralkyl group (X).Type: ApplicationFiled: August 31, 2005Publication date: October 16, 2008Applicant: Dainippon Ink and Chemicals, Inc.Inventors: Ichiro Ogura, Yoshiyuki Takahashi, Kazuo Arita, Kunihiro Morinaga, Yutaka Satou
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Publication number: 20080246186Abstract: A method for making a polyarylene ether copolymer including mixing a polyarylene ether, a hydroxyaromatic terminated siloxane reagent and an oxidant, and melt compounding the mixture. A polyarylene ether copolymer including a polyarylene ether, a hydroxyaromatic terminated siloxane reagent, an oxidant and a filler is also presented.Type: ApplicationFiled: April 9, 2007Publication date: October 9, 2008Inventors: Scott Michael Fisher, Susanta Banerjee, Subramanya Kishore Avadhanula Venkata, Anatharaman Dhanabalan, Vijay R. Mhetar, Abhijit Namjoshi
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Publication number: 20080194790Abstract: The invention relates to a hydroxy-aromatic compound of formula (I): wherein: at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; formula (II) is the following group: wherein EWG is an electron-withdrawing group.Type: ApplicationFiled: December 1, 2005Publication date: August 14, 2008Inventors: Rudolfus A.T.M. Van Benthem, Renier H.M. Kierkels
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Patent number: 7344657Abstract: An aromatic liquid-crystalline polyester composition is provided, which comprises at least one compound selected from an aliphatic carboxylate aryl ester and an aromatic carboxylic anhydride; an aromatic liquid-crystalline polyester; and a solvent containing at least 30% by weight of a halogen-substituted phenol compound. Using the composition, an aromatic liquid-crystalline polyester film with a low viscosity in melting state can be obtained.Type: GrantFiled: September 23, 2005Date of Patent: March 18, 2008Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Okamoto, Shiro Katagiri
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Publication number: 20080051505Abstract: A process for preparing a polybromoaryl ether, the polybromoaryl ether prepared by this process comprising adding to a solvent for the polybromoaryl ether a mixture of (1) at least one compound of the structure HO—Ar—X1, X2, X3, X4, X5, wherein Ar is an aryl group and X1, X2, X3, X4, and X5 are independently selected from hydrogen and bromine, provided that at least one of X1, X2, X3, X4, and X5 is bromine, (2) at least one alkali or alkaline metal hydroxide, and (3) at least one polymerization initiator, wherein said solvent for the polybromoaryl ether is a non-solvent for alkali metal bromides. The current invention also relates to a composition comprising a mixture of a polymeric resin and the polybromoaryl ether prepared by the process of the current invention.Type: ApplicationFiled: August 16, 2007Publication date: February 28, 2008Inventors: Larry D. Timberlake, William R. Fielding, Sumit Mathur, Mark V. Hanson
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Patent number: 7282554Abstract: A low molecular weight polyphenylene ether having a reduced viscosity of 0.04 to 0.18 dl/g as measured at 30° C. in a 0.5 g/dl chloroform solution, and a molecular weight distribution of 1.5 to 2.5; or a low molecular weight polyphenylene ether powder comprising the low molecular weight polyphenylene ether exhibits high thermal resistance and excellent electric properties, and thus is useful as electric materials such as printed circuit board and as modifiers of other resins.Type: GrantFiled: February 28, 2003Date of Patent: October 16, 2007Assignee: Asahi Kasei Kabushiki KaishaInventors: Akira Mitsui, Hiroaki Furukawa, Nobuyuki Ota
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Patent number: 7273918Abstract: Just like other conducting polymers, polyanilines are useful for many important electric and electrooptical applications. A self-doped polyaniline that contains a stable/immobile, covalently bonded acid moiety on the backbone is highly desired, due to their greater resistances to solvent-washing, rain-flushing, and thermal evaporation. The present invention discloses a new type of thermally stable self-doped functionalized polyanilines that are thermally much more stable than the previously reported sulfonated-polyaniline, which was believed to be the most thermally stable self-doped polyaniline known in the art. The present invention also discloses a new and effective method for making this new type of thermally stable self-doped functionalized polyanilines.Type: GrantFiled: September 23, 2004Date of Patent: September 25, 2007Inventors: Chien-Chung Han, Chia-Hui Lu
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Patent number: 7205377Abstract: A method for preparing a poly(arylene ether) with a reduced level of powder fines is described. In one embodiment, the method comprises oxidatively coupling a monohydric phenol in the presence of a solvent and a complex metal catalyst, to produce a poly(arylene ether) resin; and then removing a portion of the solvent to produce a concentrated solution having a cloud point Tcloud. The concentrated solution is then combined with an anti-solvent to precipitate the poly(arylene ether) in the form of a precipitation mixture. The concentrated solution usually has a temperature of at least about (Tcloud?10° C.) immediately before it is combined with the anti-solvent. The precipitation mixture has a temperature of at least about (Tcloud?40° C.) after its formation. Related poly(arylene ether) copolymers are also described.Type: GrantFiled: September 29, 2004Date of Patent: April 17, 2007Assignee: General Electric CompanyInventors: Hugo Gerard Eduard Ingelbrecht, Alexey Kruglov, Gert-Jan Schoenmakers
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Patent number: 7087704Abstract: It is an object of the present invention to manufacture high quality thermotropic liquid-crystalline polymer generating no low boiling gas and inducing no discoloration resulted from thermal degradation at high yield. To manufacture a liquid-crystalline polymer having 50 mol % or larger ratio of constitutive unit introduced from 4-hydroxybenzoic acid, the reaction is conducted under the presence of an acylating agent and of a catalyst quantity of aromatic sulfonic acid.Type: GrantFiled: March 7, 2005Date of Patent: August 8, 2006Assignee: Polyplastics Co., Ltd.Inventors: Keiichi Kanaka, Shinya Yamada
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Patent number: 7071290Abstract: The invention relates to polymers and oligomers, methods of their synthesis, and electronic devices comprising them.Type: GrantFiled: April 28, 2005Date of Patent: July 4, 2006Assignee: The Ohio State UniversityInventors: Arthur J. Epstein, Daike Wang
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Patent number: 7063892Abstract: An aromatic liquid-crystalline polyester having a small dielectric loss in a wide frequency region is provided. An aromatic liquid-crystalline polyester is provided that can manufacture a film having a small volume expansion by heating. An aromatic liquid-crystalline polyester substantially comprising a repeating structural unit originating in 2-hydroxy-6-naphthoic acid 30 to 80 mol %, a repeating structural unit originating in aromatic diol 35 to 10 mol %, and a repeating structural unit originating in aromatic dicarboxylic acid 35 to 10 mol %.Type: GrantFiled: December 17, 2003Date of Patent: June 20, 2006Assignee: Sumitomo Chemical Company, LimitedInventors: Satoshi Okamoto, Tomoya Hosoda, Shinji Ohtomo
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Patent number: 7060781Abstract: A 2,6-dimethylphenol composition having an m-cresol content of from 15 to 700 ppm on a weight basis has effects of drastically improving polymerization activity and particularly, improving the color tone of polyphenylene ethers. Therefore, the composition makes it possible to provide a preparation process having improved productivity, and at the same time, provide polyphenylene ethers having good quality.Type: GrantFiled: August 6, 2002Date of Patent: June 13, 2006Assignee: Asahi Kasei Chemicals CorporationInventors: Akira Mitsui, Osamu Shoji, Hitoshi Ota