Phenolic Reactant Contains Two Or More Phenolic -oh Groups, Or Two Or More Inorganic Phenolate Groups, Or Mixtures Thereof Patents (Class 528/219)
  • Patent number: 10358585
    Abstract: A polyphenylene ether oligomer and a polyphenylene ether oligomer are provided. The polyphenylene ether oligomer has a structure represented by Formula (I): wherein each R1 can be independently hydrogen, C1-6 alkyl group, or phenyl group; each R2 can be independently hydrogen, C1-6 alkyl group, or phenyl group; a:(a+b) is from 0.05:1 to 1:1; n:(a+b) is from 0.05:1 to 5:1; Q can be m can be 0 or an integer from 1 to 4; Ra can be C1-6 alkylene group; Rb can be C1-6 alkylene group; each X is independently hydrogen, acryloyl group, allyl group, vinylbenzyl group, epoxypropyl group, methacryloyl group, propargyl group, or cyanol group; and wherein the polyphenylene ether oligomer can have a number average molecular weight from 400 to 2,000.
    Type: Grant
    Filed: December 21, 2016
    Date of Patent: July 23, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Cheng-Po Kuo, Po-Ju Chen
  • Patent number: 10240004
    Abstract: Polymeric BODIPY dyes including light harvesting BODIPY unit-comprising multichromophores are provided. In some embodiments, the dyes are polymeric tandem dyes that include a light harvesting BODIPY unit-comprising multichromophore and an acceptor chromophore covalently linked to the multichromophore in energy-receiving proximity therewith. The polymeric tandem dyes may be covalently linked to a specific binding member. Also provided are methods of evaluating a sample for the presence of a target analyte and methods of labelling a target molecule using compositions including the polymeric tandem dyes. Kits and systems for practicing the subject methods are also provided.
    Type: Grant
    Filed: August 7, 2017
    Date of Patent: March 26, 2019
    Assignee: BECTON, DICKINSON AND COMPANY
    Inventors: Glenn P. Bartholomew, Brent S. Gaylord, Lucy Zhao
  • Patent number: 10221117
    Abstract: The present invention provides monomers, analogs, and/or derivatives of bisphenols substituted with one or more fluoromethyl groups. These monomers, analogs, and/or derivatives can be used to form oligomers and/or polymers, which in turn can be used to make compounds with dielectric properties suitable for dielectric materials, including for example, use in energy dense capacitors. In a preferred embodiment, the compounds can comprise a polycarbonate of a homopolymer, copolymer, and/or terpolymer of a bisphenol with one or more fluoromethyl substitution groups. In an aspect of the invention the compounds chosen can be selected based on various desired characteristics, including, for example, their energy density, glass transition temperature, dielectric loss, and/or dipole density.
    Type: Grant
    Filed: August 23, 2017
    Date of Patent: March 5, 2019
    Assignee: South Dakota Board of Regents
    Inventors: David A. Boyles, John T. Bendler, Tsvetanka Filipova
  • Patent number: 10167364
    Abstract: The present invention relates to a process for preparing aromatic polycarbonates, comprising the step of reacting bisphenols with dithiocarbonates or selenium analogs thereof in the presence of a catalyst. It further relates to the use of dithiocarbonates or selenium analogs thereof as transesterifying reagents for the preparation of polycarbonates.
    Type: Grant
    Filed: February 15, 2016
    Date of Patent: January 1, 2019
    Assignee: COVESTRO DEUTSCHLAND AG
    Inventors: Thomas Ernst Müller, Christoph Gürtler, Nicolai Kolb, Burkhard Köhler, Walter Leitner, Jan Heijl, Alexandra Große Böwing
  • Publication number: 20150105531
    Abstract: A method for recovering a dihydroxy aromatic compound and urea from a polycarbonate-containing composition comprising a polycarbonate and a phosphorus-containing flame retardant, comprising contacting the composition with ammonia in the presence of a swelling solvent for a time sufficient to depolymerize the polycarbonate producing a dihydroxy aromatic compound and urea.
    Type: Application
    Filed: October 15, 2013
    Publication date: April 16, 2015
    Inventors: Alexander Stanislaus, Venkata Ramanarayanan Ganapathy Bhotla, PS Sreenivasan, Philip Wesley Bell
  • Patent number: 8992802
    Abstract: An intermediate transfer member that includes a crosslinked poly(ether ether ketone) polymer, an optional conductive component, an optional polymer, and an optional release additive.
    Type: Grant
    Filed: February 21, 2013
    Date of Patent: March 31, 2015
    Assignee: Xerox Corporation
    Inventor: Jin Wu
  • Publication number: 20150048533
    Abstract: A process for making polyarylethers provides a reaction mixture that includes a dipolar aprotic solvent for polyarylether and polyarylether forming reactants, and reacts the polyarylether-forming reactants, with removing of water with nitrogen in the absence of azeotrope forming cosolvent and optionally replacing removed amounts with dipolar aprotic solvent. The process can further include directly wet spinning the reactor solution without recovery of the polymer from the dipolar aprotic solvent through a spinneret to form hollow fibers or flat sheets suitable for membranes.
    Type: Application
    Filed: August 13, 2013
    Publication date: February 19, 2015
    Applicant: Fresenius Medical Care Holdings, Inc
    Inventors: Selvaraj Savariar, Kevin Hudson, Geoffrey Andrew Russell, James Leslie White, Brett Allen Barton
  • Publication number: 20150018511
    Abstract: A method for producing a transparent thermoplastic resin pellet comprising a step of kneading a transparent thermoplastic resin with a kneader under a condition under which a damage history calculated according to the following formula is 500 to 2,500: Damage history={Residence time (tr)}×{Shear rate (?)} Residence time (tr)=(W×H×L)/Q Shear rate (?)=(?×D×N)/H in the formulae, W represents a screw groove width (pitch) [cm]; H represents a screw groove depth [cm]; L represents a screw length [cm]; Q represents a resin supply amount [g/s]; D represents a screw diameter [cm]; and N represents a screw rotation number [rps].
    Type: Application
    Filed: December 21, 2012
    Publication date: January 15, 2015
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Takayoshi Tanaka, Munehiro Chosa, Yasunobu Yamazaki
  • Publication number: 20150010859
    Abstract: A polycarbonate copolymer including a repeating unit represented by the following formula (1) and having a copolymerization molar ratio represented by Ar2/(Ar1+Ar2) of 30 mol % or more and 47 mol % or less. In the formula (1), Ar1 is a group represented by the following formula (2a) or (2b) and Ar2 is a group represented by the following formula (3); and n is an average number of repetition and is 1.12 or more and 2.34 or less.
    Type: Application
    Filed: February 21, 2013
    Publication date: January 8, 2015
    Inventors: Kengo Hirata, Hironobu Morishita
  • Publication number: 20140363768
    Abstract: A naphthalene derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and n is such a natural number as to provide a weight average molecular weight of up to 100,000. A material comprising the naphthalene derivative or a polymer comprising the naphthalene derivative is spin coated to form a resist bottom layer having improved properties. A pattern forming process in which a resist bottom layer formed by spin coating is combined with an inorganic hard mask formed by CVD is available.
    Type: Application
    Filed: August 22, 2014
    Publication date: December 11, 2014
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Takeshi Kinsho, Daisuke Kori, Katsuya Takemura, Takeru Watanabe, Tsutomu Ogihara
  • Publication number: 20140319097
    Abstract: A phenolic monomer used in the lithographic process for semiconductor fabrication, a polymer for preparing a resist under-layer comprising the same, and a resist under-layer composition comprising the same, are disclosed.
    Type: Application
    Filed: November 1, 2012
    Publication date: October 30, 2014
    Inventors: Jeong-Sik Kim, Jae-Woo Lee, Jae-Hyun Kim
  • Patent number: 8835697
    Abstract: A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.
    Type: Grant
    Filed: March 20, 2012
    Date of Patent: September 16, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Daisuke Kori, Takeshi Kinsho, Katsuya Takemura, Tsutomu Ogihara, Takeru Watanabe, Hiroyuki Urano
  • Patent number: 8816038
    Abstract: Disclosed is a polymer which is useful for the preparation of an epoxy resin composition or a cured product thereof in film or sheet exhibiting high heat resistance, high thermal conductivity, low thermal expansion, high gas barrier property, and high toughness. The polymer is a thermoplastic aromatic ether polymer comprising a unit represented by the following general formula (1) at a ratio of 10 to 100 mol % and having a weight average molecular weight of 3,000 or more; in formula (1), X is an oxygen atom or a sulfur atom, R1 and R2 each is a hydrogen atom, an alkyl group of 1 to 8 carbon atoms, an aryl group, an alkoxy group, an aralkyl group, or a halogen atom, and n is a number of 1 to 3.
    Type: Grant
    Filed: January 10, 2007
    Date of Patent: August 26, 2014
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami
  • Patent number: 8815988
    Abstract: A resin compound includes a reaction product of (A) aliphatic polyester and/or aliphatic polyamide and (B) an aromatic compound of which a compositional ratio is from 0.1 part by weight to 5 parts by weight with respect to 100 parts by weight of the (A) and which is represented by the following Formula (1), (X)—(CH2OH)n??Formula (1) wherein in Formula (1), X represents an n-valent group having one or more aromatic rings, and n represents an integer of from 2 to 10.
    Type: Grant
    Filed: May 25, 2012
    Date of Patent: August 26, 2014
    Assignee: Fuji Xerox Co., Ltd.
    Inventor: Kenji Yao
  • Patent number: 8759458
    Abstract: The present invention relates to a process for the production of polyarylene ether block copolymers comprising, in a first stage, the reaction of at least one aromatic dihydroxy compound comprising 4,4?-dihydroxybiphenyl in a molar excess and of at least one aromatic dihalogen compound, to form a polybiphenyl sulfone polymer, and then, in a second stage, the reaction of the polybiphenyl sulfone polymer with at least one aromatic dihydroxy compound and of at least one aromatic dihalogen compound. The invention further relates to the resultant polyarylene sulfone block copolymers and to the use of the polyarylene sulfone block copolymers for the production of moldings, fibers, films, or foams.
    Type: Grant
    Filed: June 2, 2010
    Date of Patent: June 24, 2014
    Assignee: BASF SE
    Inventors: Martin Weber, Christian Schmidt, Alexander Khvorost, Cecile Gibon, Christian Maletzko
  • Patent number: 8729192
    Abstract: The invention provides an epoxy resin composition, a novel epoxy resin, a novel phenol resin and a semiconductor encapsulating material. The cured article of the epoxy resin composition has superior characteristics in flame retardancy, heat-resistant and curing. The epoxy resin composition is a preferable resin composition using in a semiconductor device or a circuit board device, and has the structure in which a naphthalene structure is bonded with an arylene group through an oxygen atom, and the total number of the aromatic nucleus in both the naphthalene structures and the arylenes group is 2-8. The epoxy resin composition essentially includes an epoxy resin (A) having the glycidoxy group as a substituent in the aromatic nucleus and a curing agent (B).
    Type: Grant
    Filed: November 10, 2006
    Date of Patent: May 20, 2014
    Assignee: DIC Corporation
    Inventors: Kazuo Arita, Ichirou Ogura, Kunihiro Morinaga
  • Patent number: 8722837
    Abstract: A composition is prepared by oxidative copolymerization of specific amounts of 2,6-dimethylphenol, 2,3,6-trimethylphenol, and a hydroxyaryl-terminated polysiloxane. The composition exhibits an increased heat resistance relative to a corresponding composition prepared by copolymerizing 2,6-dimethylphenol and hydroxyaryl-terminated polysiloxane, without 2,3,6-trimethylphenol. The composition is useful as a flame-retardant additive in polymer compositions that require high heat resistance.
    Type: Grant
    Filed: January 31, 2012
    Date of Patent: May 13, 2014
    Assignee: Sabic Innovative Plastics IP B.V.
    Inventors: Alvaro Carrillo, Hua Guo, Scott Fisher
  • Patent number: 8703845
    Abstract: A high degree of resistance to moisture and solder and high flame retardancy are realized without incorporating a halogen in view of environmental friendliness. A phenolic resin has structural moieties which are a naphthylmethyloxy group- or anthrylmethyloxy group-containing aromatic hydrocarbon group (ph1), a phenolic hydroxyl group-containing aromatic hydrocarbon group (ph2), and a divalent aralkyl group (X) represented by general formula (1) below: (where Ar represents a phenylene group or a biphenylene group and Rs each independently represent a hydrogen atom or a methyl group) and has a structure in which plural aromatic hydrocarbon groups selected from the group consisting of the naphthylmethyloxy group- or anthrylmethyloxy group-containing aromatic hydrocarbon group (ph1) and the phenolic hydroxyl group-containing aromatic hydrocarbon group (ph2) are bonded through the divalent aralkyl group (X). This phenolic resin is used as a curing agent for an epoxy resin.
    Type: Grant
    Filed: September 27, 2011
    Date of Patent: April 22, 2014
    Assignee: DIC Corporation
    Inventors: Ichirou Ogura, Yoshiyuki Takahashi, Norio Nagae, Yousuke Hirota
  • Publication number: 20140051802
    Abstract: Methods for performing a condensation reaction are disclosed. Specifically, various methods for the production of highly-pure bisphenol-A are disclosed in which an attached promoter ion exchange resin catalyst system is combined with a solvent crystallization step.
    Type: Application
    Filed: May 2, 2012
    Publication date: February 20, 2014
    Applicant: SABIC INNOVATIVE PLASTICS IP B.V.
    Inventors: Johannes De Brouwer, Paulus Johannes Maria Eijsbouts
  • Publication number: 20140039147
    Abstract: A polymer includes a monomeric repeat unit represented by Formula I: In Formula I, R1 is alkyl, alkenyl, alkynyl, aryl, heteroaryl, cycloalkyl, or heterocyclyl; R2 is alkyl, haloalkyl, alkenyl, alkynyl; R3 is alkyl, OH, halo, or alkoxy; R4 is alkyl, OH, halo, or alkoxy; Y is absent, C(O), C1-C4 alkylidene, or C1-C4 alkylideneamino; L is alkylidene, alkylidene-O-alkylidene, alkylidene-S-alkylidene, alkenylidene, cycloalkylidene, arylene, heteroarylene, C(O)O, or C(O)S; n1 is 0, 1, 2, 3, or 4; and n2 is 0, 1, 2, 3, or 4.
    Type: Application
    Filed: March 14, 2013
    Publication date: February 6, 2014
    Applicant: Empire Technology Development LLC
    Inventors: William Brendan CARLSON, Gregory David PHELAN, Vincenzo CASASANTA, III
  • Publication number: 20140023581
    Abstract: Methods of extracting recycling carbon fibers are provided. Method of extracting and recycling carbon fibers with furan-2-carbaldehyde are provided and systems for performing the same are also provided. Compositions comprising resin composites, carbon fibers, and/or furan-2-carbaldehyde are also provided.
    Type: Application
    Filed: July 19, 2012
    Publication date: January 23, 2014
    Applicant: EMPIRE TECHNOLOGY DEVELOPMENT LLC
    Inventor: Georgius Abidal Adam
  • Publication number: 20130337649
    Abstract: The invention provides a compound for forming an organic film having a partial structure represented by the following formula (i) or (ii), wherein the ring structures Ar1, Ar2 and Ar3 each represent a substituted or unsubstituted benzene ring or naphthalene ring; e is 0 or 1; R0 represents a hydrogen atom or a linear, branched or cyclic monovalent organic group having 1 to 30 carbon atoms; L0 represents a linear, branched or cyclic divalent organic group having 1 to 32 carbon atoms; and the methylene group constituting L0 may be substituted by an oxygen atom or a carbonyl group. There can be provided an organic film composition for forming an organic film having high dry etching resistance as well as advanced filling/planarizing characteristics.
    Type: Application
    Filed: June 12, 2013
    Publication date: December 19, 2013
    Inventors: Seiichiro TACHIBANA, Daisuke KORI, Tsutomu OGIHARA, Takeru WATANABE, Kazumi NODA, Toshiharu YANO
  • Patent number: 8609806
    Abstract: To provide phosphorus-containing epoxy resins and phosphorus-containing epoxy resin compositions having high levels of appearance, yield and economic efficiency and cured products thereof that are used for various applications. A phosphorus-containing phenol compound represented by Formula (3) obtained by reacting a compound represented by Formula (2) with a compound represented by Formula (1), wherein in the peak area (A) of the component represented by Formula (1) on a chromatogram measured under specific conditions by gel permeation chromatography, peak area (B) on the high-molecular-weight side of the component of Formula (1), and total area (C) of peak area (A) and peak area (B), the value obtained by dividing peak area (B) by total area (C) is 8 area % or less, and epoxy resin compositions and cured products comprising the phosphorus-containing phenol compound as an essential ingredient.
    Type: Grant
    Filed: September 2, 2009
    Date of Patent: December 17, 2013
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Tetsuya Nakanishi, Hideyasu Asakage, Seigo Takuwa
  • Publication number: 20130285061
    Abstract: An organic film-forming polymer has a Tg of at least 70° C. and comprises a backbone comprising recurring units of Structure (A) shown in this application. These organic film-forming polymers can be used as dielectric materials in various devices with improved properties such as improved mobility.
    Type: Application
    Filed: April 25, 2012
    Publication date: October 31, 2013
    Inventors: Deepak Shukla, Douqlas R. Robello, Mark R. Mis, Wendy G. Ahearn, Dianne M. Meyer
  • Patent number: 8546510
    Abstract: Provided are a crystalline resin cured product which shows high thermal conductivity, low thermal expansion, high heat resistance, low moisture absorption, and good gas barrier properties and a crystalline resin composite material produced therefrom. Further provided is a method for producing the crystalline resin cured product and the crystalline resin composite material. The crystalline resin cured product is obtained by the reaction of an aromatic diglycidyl compound or a diglycidyl resin with an aromatic dihydroxy compound or with a dihydroxy resin and it shows a heat of melting of 10 J/g or more in differential thermal analysis while the endothermic peak corresponding to the melting appears in the range of 120 to 320° C. The crystalline resin composite material is obtained by combining the crystalline resin cured product with a filler or a base material. The crystalline resin cured product has a unit represented by -A-O—CH2—CH(OH)—CH2—O—B—, wherein A and B are divalent aromatic groups.
    Type: Grant
    Filed: November 8, 2007
    Date of Patent: October 1, 2013
    Assignee: Nippon Steel & Sumikin Chemical Co., Ltd.
    Inventors: Masashi Kaji, Koichiro Ogami, Kazuhiko Nakahara, Tomomi Fukunaga
  • Publication number: 20130251919
    Abstract: The problem is to provide a front plate of a TN liquid crystal panel capable of inhibiting occurrence of color unevenness caused by retardation of a polycarbonate resin sheet, even when a liquid crystal panel is observed through polarizing glasses or liquid crystal shutter glasses for 3D, while having excellent impact resistance, heat resistance and transparency. The solution means is the front plate 1 of a TN liquid crystal panel provided with the polycarbonate resin sheet 10, wherein the direction of the slow axis X or the fast axis Y of the polycarbonate resin sheet 10 is inclined by 45° with respect to the lengthwise direction L of a liquid crystal panel.
    Type: Application
    Filed: August 8, 2011
    Publication date: September 26, 2013
    Applicants: MGC FILSHEET CO., LTD., MITSUBISHI GAS CHEMICAL COMPANY, INC.
    Inventors: Koshi Koide, Osamu Kakinoki
  • Publication number: 20130237639
    Abstract: A high degree of resistance to moisture and solder and high flame retardancy are realized without incorporating a halogen in view of environmental friendliness. A phenolic resin has structural moieties which are a naphthylmethyloxy group- or anthrylmethyloxy group-containing aromatic hydrocarbon group (ph1), a phenolic hydroxyl group-containing aromatic hydrocarbon group (ph2), and a divalent aralkyl group (X) represented by general formula (1) below: (where Ar represents a phenylene group or a biphenylene group and Rs each independently represent a hydrogen atom or a methyl group) and has a structure in which plural aromatic hydrocarbon groups selected from the group consisting of the naphthylmethyloxy group- or anthrylmethyloxy group-containing aromatic hydrocarbon group (ph1) and the phenolic hydroxyl group-containing aromatic hydrocarbon group (ph2) are bonded through the divalent aralkyl group (X). This phenolic resin is used as a curing agent for an epoxy resin.
    Type: Application
    Filed: September 27, 2011
    Publication date: September 12, 2013
    Applicant: DIC CORPORATION
    Inventors: Ichirou Ogura, Yoshiyuki Takahashi, Norio Nagae, Yousuke Hirota
  • Patent number: 8519080
    Abstract: To provide a prepolymer which is excellent in heat resistance and which can form a cured product excellent in oil repellency and water repellency. A crosslinkable prepolymer having a polyaryl ether structure on its main chain, which has a crosslinkable functional group and a side chain represented by “Rf-CH2—O—” wherein Rf is a C3-50 fluorinated alkyl group (which may contain an oxygen atom forming an ether bond).
    Type: Grant
    Filed: November 25, 2008
    Date of Patent: August 27, 2013
    Assignee: Asahi Glass Company, Limited
    Inventors: Masahiro Ito, Shunsuke Yokotsuka, Takeshi Eriguchi, Kaori Tsuruoka
  • Publication number: 20130165621
    Abstract: Disclosed herein is a method for preparing a polycondensation resin. The method includes preparing a low degree condensate; and solid phase polymerizing the low degree condensate, wherein a granular molded article is introduced into the solid phase polymerization. The method enables efficient manufacture of high quality resins without problems such as agglomeration or scaling of a low degree condensate in pipes.
    Type: Application
    Filed: December 7, 2012
    Publication date: June 27, 2013
    Applicant: CHEIL INDUSTRIES INC.
    Inventor: Cheil Industries Inc.
  • Publication number: 20130158173
    Abstract: A resin compound includes a reaction product of (A) aliphatic polyester and/or aliphatic polyamide and (B) an aromatic compound of which a compositional ratio is from 0.1 part by weight to 5 parts by weight with respect to 100 parts by weight of the (A) and which is represented by the following Formula (1), (X)—(CH2OH)n??Formula (1) wherein in Formula (1), X represents an n-valent group having one or more aromatic rings, and n represents an integer of from 2 to 10.
    Type: Application
    Filed: May 25, 2012
    Publication date: June 20, 2013
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Kenji YAO
  • Patent number: 8455611
    Abstract: An optical film comprising a copolycarbonate composed of 25 to 90 mol % of unit (A) of the following formula, and 10 to 75 mol % of unit (B) of the following formula, wherein the substituents are defined herein, and the optical film satisfies the following expression (1), R(450)<R(550)<R(650) (1), wherein R(450), R(550) and R(650) are in-plane retardation values of the film at wavelengths of 450 nm, 550 nm and 650 nm. The optical film exhibits a desired chromatic dispersion, low photoelasticity and excellent melt processability.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: June 4, 2013
    Assignee: Teijin Chemicals Ltd.
    Inventors: Tetsuya Motoyoshi, Masatoshi Ando, Akiko Washizu
  • Publication number: 20130123458
    Abstract: The disclosure relates to methods and materials useful for polymerizing a monomer. In one embodiment, for example, the disclosure provides a method for polymerizing a monomer containing a plurality of electrophilic groups, wherein the method comprises contacting the monomer with a nucleophilic reagent in the presence of a guanidine-containing catalyst. The methods and materials of the disclosure find utility, for example, in the field of materials science.
    Type: Application
    Filed: January 7, 2013
    Publication date: May 16, 2013
    Applicants: The Board of Directors of the Leland Stanford Junior University, International Business Machines Corporation
    Inventors: International Business Machines Corporation, The Board of Directors of the Leland Stanford Junior University
  • Publication number: 20130123456
    Abstract: The invention relates to a method for functionalizing natural fatty substances: According to said method, plant oils including at least two unsaturations and the derivatives thereof, fatty acids including at least one unsaturated compound and the derivatives thereof, and mixtures of same, are reacted with a thiol derivative of formula (I), at a temperature of between 0° C. and the temperature of total degradation of the natural fatty substance and in the presence of a thermal initiator compound or a redox initiator, or by UV radiation, or by UV radiation and in the presence of a photoinitiator. The invention also relates to the resulting functionalized fatty substances and to the use thereof for the preparation of polymers. The invention further relates to a method for preparing polymers from at least one functionalized fatty substance obtained by said functionalization method.
    Type: Application
    Filed: June 30, 2011
    Publication date: May 16, 2013
    Applicants: Centre National De La Recherche Scienitique (C.N.R.S.), UNIVERSITE MONTPELLIER 2, SCIENCES ET TECHNIQUES
    Inventors: Sylvain Caillol, Bernard Boutevin, Myriam Desroches
  • Publication number: 20130087529
    Abstract: There is disclosed A resist underlayer film composition, the resist underlayer film composition contains a truxene compound having a substituted or an unsubstituted naphthol group as shown by the following general formula (1). There can be provided a resist underlayer film composition to form a resist underlayer film being capable of reducing reflectance and having high etching resistance, heat resistance.
    Type: Application
    Filed: October 1, 2012
    Publication date: April 11, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Shin-Etsu Chemical Co., Ltd.
  • Publication number: 20130085254
    Abstract: A polycarbonate resin which is excellent in terms of optical properties, hue, thermal stability, and mechanical properties and a transparent film formed from the resin are provided. The invention relates to a polycarbonate resin which has a glass transition temperature of 110-150° C. and a reduced viscosity, as measured at 20° C. with respect to the methylene chloride solution having a concentration of 0.6 g/dL, of 0.30-0.46, and which, when being molded, gives a film wherein the ratio of the retardation thereof measured at a wavelength of 450 nm (Re450) to the retardation thereof measured at a wavelength of 550 nm (Re550) is 0.50-0.93.
    Type: Application
    Filed: November 27, 2012
    Publication date: April 4, 2013
    Inventors: Shingo Namiki, Masanori YAMAMOTO
  • Patent number: 8389665
    Abstract: A method for preparing terpolymer of poly (biphenyl sulfone ether) and poly (ether sulfone) comprises: adding high-temperature organic solvent into a flask, stirring and heating to 80° C., adding 4,4?-dichlorodiphenylsulfone,4,4?-Bis(4-chlorophenyl)sulfonyl-1,1?-biphenyl and 4,4?-dihydroxydiphenylsulfone with solid content of 20-35%; stirring until monomers are completely dissolved, heating to 100° C., adding salt-forming agent and xylene; stirring while heating so that salt-forming reaction begins in the system, wherein the system temperature is controlled between 190° C. and 210° C.; when the amount of water discharged reaches the theoretical value, the first stage of salt-forming reaction is finished; heating the system to 230-236° C.
    Type: Grant
    Filed: October 26, 2010
    Date of Patent: March 5, 2013
    Assignee: Kingfa Sci & Tech Co., LTd.
    Inventors: Zhongwen Wu, Rongtang Ma
  • Patent number: 8389673
    Abstract: An aryl composition includes aryl ether oligomers. These compositions may be prepared by reaction of one or more dihalobenzenes with one or more dihydroxybenzenes by an Ullman ether reaction. The oligomers may have two or more benzene rings and include terminal halogen, e.g., bromine (Br), or hydroxyl (OH) groups. These oligomers may be brominated to form flame retardant compositions for thermoplastic polymers.
    Type: Grant
    Filed: July 31, 2009
    Date of Patent: March 5, 2013
    Assignee: Chemtura Corporation
    Inventors: Larry D. Timberlake, Julia E. Holland
  • Publication number: 20130052381
    Abstract: This disclosure relates to epoxides, polyepoxide compositions and epoxy resins whose degradation products exhibit little or no estradiol binding activity. Also disclosed are methods for making the disclosed compositions and articles of manufacture comprising the disclosed compositions.
    Type: Application
    Filed: August 1, 2012
    Publication date: February 28, 2013
    Inventors: Robert R. Gallucci, James A. Mahood, Jean Francois Morizur, Steve Dimond
  • Publication number: 20130018164
    Abstract: The present invention relates to a novel method for synthesizing a composition of polymers, copolymers, terpolymers and tetrapolymers, and to the use thereof, said composition being made from: cyclodextrins, in particular ?-cyclodextrin, ?-cyclodextrin, ?-cyclodextrin, the derivatives thereof or the corresponding mixtures thereof; and/or calix[n]arene(s) and/or calix[n]arene derivative(s) and/or a mixture of two or more different calix[n]arenes selected from calix[n]arenes (n=4-20) and/or the derivatives thereof, and to the uses thereof. A method was developed on the basis of bulk polycondensation by heating. The invention can be used in the pharmaceutical, human medicine, veterinary medicine, chemistry, separation chemistry, environmental, electronics, biology, diagnostics, phytosanitation, medicinal food, agri-food, and cosmetics fields, and in the nutraceutical field and in the field of molecular imprints (MIP).
    Type: Application
    Filed: December 27, 2010
    Publication date: January 17, 2013
    Inventor: Mohamed Skiba
  • Publication number: 20130012613
    Abstract: A method synthesizes a composition of polymers, copolymers, terpolymers and tetrapolymers. The composition may be made by combining in a reaction chamber, a crosslinking agent and one or more of a calix[n]arene, cyclodextrin, a mixture of a plurality of calix[n]arenes, different cyclodextrins, derivatives of calix[n]arenes, and derivatives of cyclodextrins, stirring the mixture, making a solid residue using microwaves, washing the solid residue, drying some of the wash, filtering some of the wash, and drying the resulting filtered solution. The composition may include alpha-cyclodextrin, beta-cyclodextrin, gamma-cyclodextrin, the derivatives or corresponding mixtures thereof, and/or calix[n]arene(s) and/or of calix[n]arene derivative(s) and/or a mixture of two or more different calix[n]arenes selected from calix[n]arenes (n=4-20) and/or the derivatives thereof.
    Type: Application
    Filed: December 27, 2010
    Publication date: January 10, 2013
    Inventor: Mohamed Skiba
  • Patent number: 8329929
    Abstract: A metal complex represented by the following formula (1): wherein R1 to R6 each independently represent a hydrogen atom or a substituent; Y1 and Y2 each independently represent any one of the following groups: wherein R? represents a hydrogen atom or a hydrocarbon group having 1 to 4 carbon atoms; P1 and P2 each represent a group of atoms necessary for forming a heterocyclic ring together with Y1 or Y2 and the two carbon atoms at a position adjacent to Y1 or Y2; P1 and P2 may be linked to each other to form a ring; M represents a transition metal element or typical metal element; m represents 1 or 2; X represents a counter ion or a neutral molecule; n represents the number of X's in the complex, and an integer of 0 or more; and Q1 and Q2 each independently represent an aromatic heterocyclic group.
    Type: Grant
    Filed: March 10, 2008
    Date of Patent: December 11, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Tadafumi Matsunaga, Nobuyoshi Koshino, Hideyuki Higashimura
  • Patent number: 8283002
    Abstract: Oligomers and/or polymers comprising a backbone comprising arylamine and fluorinated alkyleneoxy moieties which may be crosslinked. Ink formulations and devices can be formed from the oligomers or polymers, or corresponding monomers. Doped compositions can be formed. Charge injection and transport layers can be formed. Improved stability can be achieved in organic electronic devices such as OLEDs and OPVs.
    Type: Grant
    Filed: November 17, 2009
    Date of Patent: October 9, 2012
    Assignee: Plextronics, Inc.
    Inventors: Christopher T. Brown, Venkataramanan Shesadri, Jing Wang
  • Publication number: 20120252218
    Abstract: A biphenyl derivative having formula (1) is provided wherein Ar1 and Ar2 denote a benzene or naphthalene ring, and x and z each are 0 or 1. A material comprising the biphenyl derivative or a polymer comprising recurring units of the biphenyl derivative is spin coated and heat treated to form a resist bottom layer having improved properties, optimum values of n and k, step coverage, etch resistance, heat resistance, solvent resistance, and minimized outgassing.
    Type: Application
    Filed: March 20, 2012
    Publication date: October 4, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Daisuke Kori, Takeshi Kinsho, Katsuya Takemura, Tsutomu Ogihara, Takeru Watanabe, Hiroyuki Urano
  • Publication number: 20120199383
    Abstract: There are provided a substrate for printed wiring excellent in light transmission property, heat resistance, mechanical strength and resistance to thermal coloration; a printed wiring laminate; and a resin composition used to produce the substrate and the laminate. The substrate for printed wiring comprises an aromatic polyether-typed polymer having a glass transition temperature, as measured by differential scanning calorimetry (DSC, heating rate: 20° C./minute), of from 230° C. to 350° C.
    Type: Application
    Filed: October 20, 2010
    Publication date: August 9, 2012
    Applicant: JSR Corporation
    Inventors: Motoki Okaniwa, Toshimitsu Kikuchi, Takaaki Uno, Takashi Okada
  • Patent number: 8236919
    Abstract: A process for preparing a polyether ether ketone. Sodium carbonate is used alone as the condensation agent, and 4,4?-difluorodibenzophenone, p-benzenediol and biphenyldiol are subjected to polymerizing. After the corresponding prepolymer is obtained, the reaction temperature is elevated and p-benzenediol is further added as a chain extender to react for a period of time to produce high-viscosity polyether ether ketone.
    Type: Grant
    Filed: November 30, 2010
    Date of Patent: August 7, 2012
    Assignee: Jilin Jinzheng Macromolecule Materials R & D Co., Ltd.
    Inventors: Guirong Wu, Yuning Xie
  • Publication number: 20120171868
    Abstract: There is disclosed A resist underlayer film composition, wherein the composition contains a polymer obtained by condensation of, at least, one or more compounds represented by the following general formulae (1-1) and/or (1-2), one or more kinds of a compound represented by the following general formula (2), and one or more kinds of a compound, represented by the following general formula (3), and/or an equivalent body thereof. There can be provided an underlayer film composition, especially for a trilayer resist process, that can form an underlayer film having reduced reflectance, (namely, an underlayer film having optimum n-value and k-value as an antireflective film), excellent filling-up properties, high pattern-antibending properties, and not causing line fall or wiggling after etching especially in a high aspect line that is thinner than 60 nm, and a patterning process using the same.
    Type: Application
    Filed: December 5, 2011
    Publication date: July 5, 2012
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Tsutomu OGIHARA, Takeru WATANABE, Yusuke BIYAJIMA, Daisuke KORI, Takeshi KINSHO, Toshihiko FUJII
  • Patent number: 8173720
    Abstract: A transparent gel is disclosed which has an interpenetrating polymer network of a copolymer containing a polysiloxane structure and a polycarbonate structure and a hydrophilic polymer obtained by polymerizing a hydrophilic monomer. The transparent gel is useful as a cultivation substrate, a container for storage and an ophthalmic material, comprising an easily synthesizable and purifiable silicon-containing resin, wherein a gel strength, transparency, oxygen permeability, birefringence and other characteristics are excellent.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: May 8, 2012
    Assignees: Mitsubishi Gas Chemical Company, Inc., Menicon Co., Ltd.
    Inventors: Kazuhiko Nakada, Takahito Nakase, Takahiro Adachi, Akira Yamamoto, Masahiko Minemura
  • Publication number: 20120108782
    Abstract: The invention relates to an apparatus and a process for devolatilizing solvent-containing polycarbonate solutions. By employing the inventive apparatus, polycarbonates with low residual values of volatile constituents are produced from solvent-containing polymer melts, which improved optical properties, especially yellowness index, with the aid of an apparatus combination of a heatable tubular devolatilizer and a vented extruder.
    Type: Application
    Filed: May 26, 2010
    Publication date: May 3, 2012
    Applicant: Bayer MaterialScience AG
    Inventors: Thomas König, Klemens Kohlgrüber, René De Cleyn, Johan Vaes, Johan Vanden Eynde, Dirk Van Meirvenne
  • Patent number: 8168742
    Abstract: To provide a crosslinkable fluorinated aromatic prepolymer which is capable of forming a cured product having a low relative permittivity, high heat resistance, low birefringence and high flexibility, and its uses.
    Type: Grant
    Filed: December 4, 2009
    Date of Patent: May 1, 2012
    Assignee: Asahi Glass Company, Limited
    Inventors: Shunsuke Yokotsuka, Masahiro Ito, Kaori Tsuruoka
  • Publication number: 20120088896
    Abstract: A compound having an excellent activity to inhibit a lectin-like oxidized LDL receptor has been identified. There are provided a drug for inhibiting a lectin-like oxidized LDL receptor characterized by including a trimeric or higher polymeric procyanidin as an active ingredient, which is useful in treating and preventing diseases, in particular, arteriosclerotic diseases, for which a lectin-like oxidized LDL receptor acts as an aggravating factor; the aforementioned drug for inhibiting a lectin-like oxidized LDL receptor, characterized in that the procyanidin is derived from a plant material selected from the group consisting of apples, grape seeds, peanut seed coats and pine barks; and a drug for preventing arteriosclerosis including a trimeric or higher polymeric procyanidin as an active ingredient, and characterized by having an activity to inhibit a lectin-like oxidized LDL receptor.
    Type: Application
    Filed: June 23, 2010
    Publication date: April 12, 2012
    Applicant: NATIONAL CEREBRAL AND CARDIOVASCULAR CENTER
    Inventors: Taichi Nishizuka, Tatsuya Sawamura