Material Is A Nitrogen-containing Compound Patents (Class 528/21)
  • Patent number: 6670438
    Abstract: Methods, compositions, and biomimetic catalysts, such as silicateins and block copolypeptides, used to catalyze and spatially direct the polycondensation of silicon alkoxides, metal alkoxides, and their organic conjugates to make silica, polysiloxanes, polymetallo-oxanes, and mixed poly(silicon/metalklo)oxane materials under environmentally benign conditions.
    Type: Grant
    Filed: July 16, 2001
    Date of Patent: December 30, 2003
    Assignee: The Regents of the University of California
    Inventors: Daniel E. Morse, Galen D. Stucky, Timothy D. Deming, Jennifer Cha, Katsuhiko Shimizu, Yan Zhou
  • Publication number: 20030225236
    Abstract: An organopolysiloxane terminated with silanol at both ends is prepared by polymerizing a siloxane having silanol at both ends in the presence of a thermally decomposable polymerization catalyst and under a reduced pressure below atmospheric pressure.
    Type: Application
    Filed: June 3, 2003
    Publication date: December 4, 2003
    Inventors: Masaharu Takahashi, Yutaka Hagiwara, Tomohiko Suto
  • Patent number: 6657035
    Abstract: The present invention provides a moisture-curing one-pack urethane adhesive composition which has a good adhesive property to a painted steel. The moisture-curing one-pack urethane adhesive composition according to the present invention contains an isocyanate group-terminated urethane prepolymer as a main component, and also contains (1) a silane coupling agent as an adhesive promoter, and (2) (a) 2,2′-dimorpholinodiethyl ether and/or di(2,6-dimethylmorpholinoethyl)ether, and (b)dibutyltin diacetylacetonate, as curing catalysts. The moisture-curing one-pack urethane adhesive composition according to the present invention is particularly suitable for bonding automotive window glasses to automotive bodies.
    Type: Grant
    Filed: July 16, 2002
    Date of Patent: December 2, 2003
    Assignees: Sunstar Giken Kabushiki Kaisha, Uni-Sunstar B.V.
    Inventors: Yoshihiro Nakata, Shinji Ochi
  • Patent number: 6645638
    Abstract: A silicone rubber adhesive composition comprising (A) a heat curable organopolysiloxane composition of the addition curing type or peroxide curing type, (B) reinforcing silica fines, (C) an adhesive agent, and (D) a compound having at least one ester group in a molecule is easily moldable within a short time by injection molding, suitable in primerless molding, and bondable with various thermoplastic resins. Integrally molded articles in which the silicone rubber adhesive composition is firmly bonded to the thermoplastic resin are obtainable without a need for modification of the resin.
    Type: Grant
    Filed: July 11, 2001
    Date of Patent: November 11, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hironao Fujiki, Syuuichi Azechi
  • Patent number: 6642309
    Abstract: The object of the present invention is to provide a novel acrylic-modified silyl-terminated polyether resin composition which is advantageous not only in terms of the availability of raw materials and the ease of synthetic reaction, but also in fast-curing, good storage stability, good weatherability, high adhesiveness, thus promising high potentials of industrial utilization. Further, the object of the present invention is also to develop an environment-friendly curable composition which is a major social consideration. The composition is a curable composition comprising an oxyalkylene polymer (A) containing silyl functional group capable of crosslinking by forming a siloxane bond and a copolymer (B) having a molecular chain comprising alkyl acrylate and/or alkyl methacrylate monomer units and containing silyl functional group capable of crosslinking by forming a siloxane bond, said copolymer (B) having both dialkoxysilyl and trialkoxysilyl groups as said silyl functional group.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: November 4, 2003
    Assignee: Kaneka Corporation
    Inventors: Shintaro Komitsu, Toshihiko Okamoto, Hiroshi Iwakiri
  • Patent number: 6632523
    Abstract: An adhesive composition that bonds at low temperatures is disclosed. The composition is a solution in an organic solvent of a polyimide, an epoxy resin, and a cyanate. The polyimide can be a polyimidesiloxane, made from a dianhydride, an aromatic diamine that does not contain siloxane, and a siloxane diamine. The adhesive composition can be used to make a single layer tape, a coated tape, or a double-sided trilayer tape. The tape can bond an article, such as a chip, to a substrate, such as a circuit board.
    Type: Grant
    Filed: September 28, 2000
    Date of Patent: October 14, 2003
    Assignee: Sumitomo Bakelite Company Limited
    Inventors: Jerrold C. Rosenfeld, Jerrine L. Neff
  • Patent number: 6617411
    Abstract: A process is described for the polycondensation of organic silicon compounds at from pH 6 to 8 in the presence of a lipase which is, where appropriate, immobilized on a carrier composed of polymer materials. Suitable organic silicon compounds capable of polycondensation are (RO)(R1O)(R2O)(R3O)Si, (RO)(R1O)(R2O)SiR3, (RO)(R1O)Si (R2)(R3) and (RO) SiR1R2R3, where R, R1, R2 and R3 are independently of one another C1- to C10-alkyl, C3- to C10-cycloalkyl, C4- to C20-alkylcycloalkyl, aryl, C6- to C16-alkylaryl, the alkyl groups being linear or branched. It is advantageous and possible to obtain the lipase on a large scale relatively simply by fermentation processes. Preference is given to employing lipases from Pseudomonas species.
    Type: Grant
    Filed: November 22, 2000
    Date of Patent: September 9, 2003
    Assignee: BASF Aktiengesellschaft
    Inventor: Thomas Friedrich
  • Patent number: 6605360
    Abstract: A polyorganosiloxane compound obtained by allowing a polyorganosiloxane having silicone resin structure to react with a polyorganosiloxane having silicone oil structure in the presence of a hydrosilylation catalyst, and having the both structures in the molecule. Also disclosed is a coating composition including the polyorganosiloxane compound, a silane or silicone resin having an RO—Si group, and a curing catalyst. The former polyorganosiloxane compound is compatible with silicone resins. The latter coating composition can provide coatings improved in flexibility without lowering the curability, surface hardness and weatherability inherent in silicone resins.
    Type: Grant
    Filed: September 14, 2001
    Date of Patent: August 12, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hiroaki Kizaki, Masaaki Yamaya, Akinari Itagaki
  • Patent number: 6599995
    Abstract: The present invention relates to a highly regular and well-defined ladder structured polyorganosilsesquioxane with superior heat resistance, combustion resistance and flexibility. This product is made by alternatingly bonding together two kinds of substituents. The polyorganosilsesquioxane prepared according to the present invention has a small molecular weight distribution and a high molecular weight. It is soluble in organic solvents because its three-dimensional network structure is not formed as a result of a condensation polymerization, which resulted in a product having structure defect(s) and randomness because of the oligomer that was previously used as a starting material for polymerization. Polyalkylaromaticsilsesquioxanes obtained according to the preparing method of the present invention are useful, heat-resistant materials.
    Type: Grant
    Filed: May 1, 2001
    Date of Patent: July 29, 2003
    Assignee: Korea Institute of Science and Technology
    Inventors: Seung-Sang Hwang, Soon-Man Hong, Eung-Chan Lee, Seung-Pyo Hong
  • Patent number: 6596834
    Abstract: Silicone resins having the general formula (R1SiO3/2)x(HSiO3/2)y where R1 is an alkyl group having 8 to 24 carbon atoms; x has a value of 0.05 to 0.7; y has a value of 0.3 to 0.95 and x+y =1. The resins are used to form porous ceramic materials and porous thin films on semiconductor devices.
    Type: Grant
    Filed: September 12, 2001
    Date of Patent: July 22, 2003
    Assignee: Dow Corning Corporation
    Inventor: Bianxiao Zhong
  • Patent number: 6555236
    Abstract: A process for producing an article having a fine uneven surface, coated with a film which has high heat resistance, does not crack and does not peel off from a substrate. The process for producing the article comprises disposing a film-forming solution between a substrate and a mold in the form of a film so as to make the solution closely contact with the substrate and the mold, said solution being prepared by carrying out the hydrolysis and dehydration polycondensation reaction of a stock solution containing a specific silane compound (A) having an unhydrolyzable organic group and a hydrolyzable group, a specific silane compound (B) having a hydrolyzable group and a catalyst, and heating to form an article having an uneven film having a surface shape which is the inversion of the surface shape of the mold on the surface of the substrate. The film-forming solution contains the above silane compounds (A) and (B) in the form of unhydrolysates in amounts of 0.5 to 40 wt % and 0.
    Type: Grant
    Filed: March 6, 2001
    Date of Patent: April 29, 2003
    Assignee: Nippon Sheet Glass Company, Ltd.
    Inventors: Koichiro Nakamura, Masahiro Hori, Hiroaki Yamamoto
  • Patent number: 6548614
    Abstract: A stain-proofing agent comprising a compound represented by the formula (1): and non-aqueous composition for paints comprising the stain-proofing agent, resin, curing agent and/or curing catalyst and being capable of forming a coating film remarkably excellent in stain-proofing property.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: April 15, 2003
    Assignee: Daikin Industries, Ltd.
    Inventors: Haruhiko Mohri, Susumu Wada, Akira Chida, Masaru Nagato, Keiko Kunimasa, Yoshiki Shimizu
  • Patent number: 6515043
    Abstract: An oligomer of the formula: [R3SiO½]m[O½Si(R2)O½]n[SiO{fraction (3/2)}R]o[SiO{fraction (4/2)}]p  (I) wherein each R is selected individually from the group consisting of R1, —OR2 and —OR3; each R1 is independently a substituted or unsubstituted hydrocarbon group; each R2 is a C1-C6 alkyl group or an acyl group; and each R3 is a independently an alkyl or alkenyl group having at least 8 carbon atoms; with the provisos that if R3 is alkenyl, there is no unsaturation within two carbon atoms adjacent to the oxygen atom of the —OR3 group; at least one R group is —OR3; at least one quarter of all R groups are —OR2 or —OR3; m=2 to 20; n=0 to 50; o=0 to 20; and p=0 to 10. The oligomer is a useful component of in insulation formulations for wire and cable used in underground locations.
    Type: Grant
    Filed: March 20, 2001
    Date of Patent: February 4, 2003
    Assignee: Crompton Corporation
    Inventors: Herbert B. Petty, Robert Pickwell
  • Publication number: 20030020049
    Abstract: Functionalized organo-silicone compounds incorporate ultraviolet radiation screening or absorbing moieties. The novel materials of the invention are durable and provide uniform UV absorption properties when used in various applications, including coatings on substrates such as glass, in particular float glass. Methods for their preparation and use are also provided.
    Type: Application
    Filed: July 30, 2001
    Publication date: January 30, 2003
    Inventors: Donald N. Payne, Yei-Ping (Mimi) H. Wang
  • Patent number: 6512071
    Abstract: An organohydridosiloxane polymer having a cage conformation, at least approximately 40 Mole percent carbon containing substituents and a dielectric constant of less than about 2.7 is presented. Each silicon atom of the cage polymer is bonded to at least three oxygen atoms and to either a hydrogen atom or an organic substituent. By providing such a caged structure with essentially no hydroxyl or alkoxy substituents, either on the polymer backbone or at terminal silicon atoms, essentially no chain lengthening polymerization can occur in solution. Such organohydridosiloxane resins having a molecular weight in the range from about 400 to about 200,000 atomic mass units were formed using a dual phase solvent system and either a solid phase or phase transfer catalyst to assist the condensation of hydridotrihalosilane with at least one organotrihalosilane.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: January 28, 2003
    Assignee: Honeywell International Inc.
    Inventors: Nigel P. Hacker, Scott Lefferts, Lisa Figge
  • Patent number: 6503633
    Abstract: A composition for film formation which, when used in the production of semiconductor devices and the like, can give interlayer insulating films which differ little in dielectric constant even when obtained through curing under different conditions and have excellent adhesion to substrates, a process for producing the composition, and a silica-based film obtained from the composition. The composition for film formation comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing (A-1) at least one compound selected from the group consisting of compounds represented by the following formula (1), compounds represented by the following formula (2), and compounds represented by the following formula (3), and (A-2) at least one compound represented by the following formula (4), in the presence of a catalyst and water; and (B) an organic solvent.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: January 7, 2003
    Assignee: JSR Corporation
    Inventors: Michinori Nishikawa, Kouichi Hasegawa, Eiji Hayashi, Kinji Yamada
  • Patent number: 6497964
    Abstract: A composition comprising (1) 0.1-50 parts by weight of the reaction product of a hydroxyl group-containing benzophenone compound with a silane and/or a hydrolyzate thereof and (2) 100 parts by weight of a silane compound and/or a hydrolyzate thereof is applied to a polycarbonate sheet to form a protective coating having mar and weather resistance. A composition comprising the reaction product of a hydroxyl group-containing benzophenone compound with a silane and/or a hydrolyzate thereof is useful for undercoating.
    Type: Grant
    Filed: July 21, 2000
    Date of Patent: December 24, 2002
    Assignees: Shin-Etsu Chemical Co., Ltd., Kabushi Kaishi Toyoda Jidoshokki Seisakusho
    Inventors: Kazuyuki Matsumura, Masaaki Yamaya, Kazuharu Sato, Koichi Higuchi, Muneo Kudo
  • Patent number: 6495649
    Abstract: Spherical silicone fine particles having an average particle diameter of 0.1 to 5 &mgr;m, which can be produced without decreasing a yield and also without conducting a dilution step, and a process for effectively producing the same. Spherical silicone particles are obtained by reacting an organotrialkoxysilane with a tetraalkoxysilane. Water in an amount of 20 to 150 moles is added to 1 mole of the silane mixture, which is subjected to hydrolysis under an acidic condition to obtain an aqueous or alcohol solution of an organosilanol and/or the partial hydrolyzed product thereof, and an aqueous alkaline solution is added thereto, mixed and allowed to stand to conduct polycondensation.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: December 17, 2002
    Assignee: GE Toshiba Silicones Co., Ltd.
    Inventors: Yukinobu Harada, Akira Takagi
  • Patent number: 6495264
    Abstract: A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one silane compound selected from the group consisting of compounds represented by the formula (1), compounds represented by the formula (2), and compounds represented by the formula (3) in the presence of water and at least one compound selected from the group consisting of tetraalkylammonium hydoxides, alicyclic organic amines, and metal hydroxides, and (B) an organic solvent.
    Type: Grant
    Filed: April 9, 2001
    Date of Patent: December 17, 2002
    Assignee: JSR Corporation
    Inventors: Eiji Hayashi, Kouichi Hasegawa, Youngsoo Seo
  • Patent number: 6492479
    Abstract: The invention comprises a method for producing fluorosilicone oil by reacting a fluorosilicone trimer with a triorganosilanol in the presence of an alkali silanolate. The polymer may be condensed to increase viscosity and decrease the silanol content of the polymer, and volatiles may be removed by stripping. The method provides a high yield of fluorosilicone oil of narrow viscosity ranges in an efficient reaction, and produces small amounts of waste.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: December 10, 2002
    Assignee: General Electric Company
    Inventors: John S. Razzano, Nancy E. Gosh
  • Patent number: 6472079
    Abstract: A composition for film formation which comprises: (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing at least one compound selected from the group consisting of (A-1) compounds represented by the following formula (1) RaSi(OR1)4-a  (1) (A-2) compounds represented by the following formula (2) Si(OR2)4  (2) and (A-3) compounds represented by the following formula (3) R3b(R4O)3-bSi—(R7)d—Si(OR5)3-cR6c  (3) (B) at least one member selected from the group consisting of compounds of the metals in Groups IA and IIA of the periodic table; and (C) an organic solvent. A method for film formation using the composition and a silica-based film obtained by the method are also disclosed.
    Type: Grant
    Filed: April 11, 2001
    Date of Patent: October 29, 2002
    Assignee: JSR Corporation
    Inventors: Eiji Hayashi, Michinori Nishikawa, Kinji Yamada
  • Patent number: 6444775
    Abstract: The present invention has its object to provide a curable composition showing a controlled initial curing rate and, hence, offering good workability by introducing a methyl group into the neighborhood of the reactive silicon group within an oligomer to indirectly lower the reactivity of the reactive silicon group within the oligomer.
    Type: Grant
    Filed: March 27, 2000
    Date of Patent: September 3, 2002
    Assignee: Kaneka Corporation
    Inventors: Hideharu Jyono, Hidetoshi Odaka, Hiroshi Ito, Hiroshi Iwakiri
  • Patent number: 6428898
    Abstract: The present invention is directed to low VOC curable coating compositions suitable for use in various mar and etch resistant coatings, such as in automotive coatings. The binder of the composition includes silicon/hydroxyl and cross-linking components. The silicon/hydroxyl component includes one or more reactive oligomers having linear or branched cycloaliphatic moiety and at least two functional groups with at least one being a silane or silicate group, the remaining being a hydroxyl group. Applicants have unexpectedly discovered that by including silane or silicate functionalities in these reactive oligomers, the solids level of the composition can be significantly increased at reduced composition viscosities. As a result, such high solids low VOC compositions can be readily applied by conventional application means, such as by spraying.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: August 6, 2002
    Assignee: E. I. du Pont de Nemours & Company
    Inventors: Robert J. Barsotti, Isidor Hazan, John David Nordstrom
  • Patent number: 6426127
    Abstract: The invention pertains to dielectric films for the production of microelectronic devices. A spin-on glass film is produced by depositing a silazane polymer containing composition film onto a substrate and then exposing the film to electron beam radiation. The electron beam exposing step is conducted by overall exposing the dielectric layer with a wide, large beam of electron beam radiation from a large-area electron beam source.
    Type: Grant
    Filed: December 28, 1999
    Date of Patent: July 30, 2002
    Assignee: Electron Vision Corporation
    Inventors: Matthew Ross, Heike Thompson
  • Patent number: 6423378
    Abstract: The invention concerns the use of cross-linkable silicone compositions for fast, economical and simple impregnation and/or varnishing of flat joints (e.g. cylinder head gaskets). More precisely it concerns the use of silicone compositions cross-linkable under UV radiation, by cationic process and in the presence of specific phoinitiators selected among onium borates or organometallic complexes, of which the borate counter-anions contain at least a boron bound to at least a substituted phenyl (Me, F). The silicone liquid precursor is a polydimethylsiloxane (PDMS) substituted by cross-linking functional groups, by cationic process (Gfp) under UV of the epoxy of vinyloxy type. These Gfp are present at the rate of 0.15 to 2.0 pr kg of PDMS. The invention also relates to the method for impregnating/varnishing flat joints (e.g. cylinder head gaskets) using the specific PDMS composition+photoinitiator of borate type as well as the treated joints and the composition themselves.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: July 23, 2002
    Assignee: Rhodia Chimie
    Inventors: Marie-Christine Cotting, Gérard Joubert, Olivier Loubet
  • Patent number: 6420088
    Abstract: Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
    Type: Grant
    Filed: June 23, 2000
    Date of Patent: July 16, 2002
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Wayne M. Moreau
  • Patent number: 6417310
    Abstract: A branched organopolysiloxane is prepared by polymerizing an organopolysiloxane mixture of a branch unit-containing organopolysiloxane and a low molecular weight organopolysiloxane in the presence of an acidic or basic catalyst, or by adding a surfactant to the organopolysiloxane mixture, dispersing it in water to form an emulsion, and polymerizing the emulsion.
    Type: Grant
    Filed: September 11, 2000
    Date of Patent: July 9, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Naoki Omura, Satoshi Kuwata, Yoshihito Osawa
  • Patent number: 6413647
    Abstract: A composition for film formation which is capable of giving a silica-based coating film having an exceeding low dielectric constant and improved mechanical strength and useful as an interlayer insulating film in semiconductor devices and the like, a process for producing the composition, and a silica-based film obtained from the composition. The composition comprises (A) a product of hydrolysis and condensation obtained by hydrolyzing and condensing one or more silane compounds, and (B) an organic solvent.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: July 2, 2002
    Assignee: JSR Corporation
    Inventors: Eiji Hayashi, Kouichi Hasegawa, Seo Youngsoo
  • Patent number: 6410150
    Abstract: A polyorganosiloxane-based composition for film formation which gives a film having low dielectric constant and high modulus of elasticity and useful as an interlayer insulating film in semiconductor devices and the like.
    Type: Grant
    Filed: September 27, 2000
    Date of Patent: June 25, 2002
    Assignee: JSR Corporation
    Inventors: Takahiko Kurosawa, Eiji Hayashi, Seo Youngsoon, Keiji Konno, Atsushi Shiota, Kinji Yamada
  • Patent number: 6372874
    Abstract: This invention disclosure describes an improved process for the preparation of siloxane-oxyalkylene copolymers via hydrosilation of unsaturated polyethers with organohydrogensiloxanes in the presence of hydroxyl, carbonyl, or ether-functional amines as buffer-catalyst modifiers for noble metal hydrosilation catalysts. The common side reactions such as dehydrocondensation and acetal formation are significantly reduced or eliminated, by the use of these amines, without reduction in hydrosilation rates.
    Type: Grant
    Filed: December 4, 1998
    Date of Patent: April 16, 2002
    Assignee: Crompton Corporation
    Inventor: Rudolph A. Cameron
  • Patent number: 6362301
    Abstract: The present invention relates to a curable composition including an acryloxysilane- or acyloxysilane-containing oligomer prepared by a continuous process. In addition, photocurable composition including an alkoxysilane or acyloxysilane oligomer is provided. Methods are provided for curing the curable and photocurable compositions.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: March 26, 2002
    Assignee: Rohm and Haas Company
    Inventors: Michael Damian Bowe, Linda Louise Graham, Gary David Greenblatt, Barry Clifford Lange, Richard Foster Merritt
  • Patent number: 6359099
    Abstract: An organohydridosiloxane polymer having a cage conformation, between approximately 0.1 to 40 mole percent carbon-containing substituent, and a dielectric constant of less than about 3.0 is disclosed. Each silicon atom of the cage polymer is bonded to at least three oxygen atoms and to either a hydrogen atom or an organic substituent. By providing such a caged structure having essentially no hydroxyl or alkoxy substituents, either on the polymer backbone or at terminal silicon atoms, essentially no chain lengthening polymerization can occur in solution. Such organohydridosiloxane resins having a molecular weight in the range from about 400 to about 200,000 atomic mass units were formed using a dual phase solvent system and either a solid phase or a phase transfer catalyst to assist the condensation of hydridotrihalosilane with at least one organotrihalosilane.
    Type: Grant
    Filed: July 3, 2000
    Date of Patent: March 19, 2002
    Assignee: Honeywell International Inc.
    Inventors: Nigel P. Hacker, Scott Lefferts, Lisa Figge
  • Patent number: 6359667
    Abstract: An organopolysiloxane fine particle comprising as a principal component a polysiloxane having a hydrocarbon group (a) directly bonded to a silicon atom and having an OH group (b) directly bonded to a silicon atom, wherein: (i) carbons contained in the hydrocarbon group (a) constitute 5 to 35% of the weight of the organopolysiloxane fine particles, and (ii) the OH group (b) is in an amount of 1 to 8 meq per g of the organopolysiloxane fine particles, the organopolysiloxane fine particles having: (iii) a 10% compressive modulus of elasticity of 150 to 900 Kg/mm2, (iv) an average compressive deformation (Cr)m of 20 to 60%, (v) an average elastic recovery (Rr)m of 60 to 90%, and (vi) an average particle diameter of 0.5 to 50 &mgr;m.
    Type: Grant
    Filed: August 8, 2000
    Date of Patent: March 19, 2002
    Assignee: Catalysts & Chemicals Industries Co., Ltd.
    Inventors: Tsuguo Koyanagi, Michio Komatsu, Kazuhiro Nakayama
  • Patent number: 6353075
    Abstract: A polymerization process comprising mixing a siloxane having silicon-bonded groups R′ and a cyclic or linear siloxane having no silicon-bonded groups R′ with a phosphazene base catalyst in the presence of water and allowing the siloxane having silicon-bonded groups R′ to condense and the cyclic or linear siloxane having no silicon-bonded R′ groups to polymerize by equilibration.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: March 5, 2002
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Avril Surgenor, Richard Taylor
  • Patent number: 6353073
    Abstract: The present invention provides near quantitative yields of greater than about 95% isomeric purity of poly(3-aminopropylmethylsiloxane)-poly(dimethylsiloxane) copolymers of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)w(Me2SiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y(Me2SiO)z wherein Me is methyl, w may range from 1 to about 100, x may range from 1 to about 100, y may range from 1 to about 6, z may range from 1 to about 6 and y+z may range from 3 to about 7.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: March 5, 2002
    Assignee: Archimica (Florida), Inc.
    Inventors: Timothy N. Biggs, Benigno A. Janeiro
  • Patent number: 6346593
    Abstract: A polymerization process comprising mixing siloxane polymers with organosilicon compounds having at least one silicon-bonded group RN, which is a substituent comprising at least one amine group, and with a phosphazene base catalyst and allowing the siloxanes and organosilicon compounds to polymerize to form amino-functional polyorganosiloxane polymers is claimed.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: February 12, 2002
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Grainne Moloney, Avril Surgenor, Richard Taylor
  • Patent number: 6340735
    Abstract: A coating solution of a poly(phenylsilsesquioxane) ladder polymer having a weight average molecular weight of 4,000-100,000 in a suitable solvent is spin coated and heated to form a dense dielectric film having a low dielectric constant.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: January 22, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Fujio Yagihashi
  • Patent number: 6339137
    Abstract: The present invention provides near quantitative yields of greater than about 95% isomeric purity of poly(3-aminopropylmethylsiloxanes) of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y wherein Me is methyl, x may range from 2 to about 100 and y may range from 3 to about 7. The present invention also provides a simple method for rapidly producing poly(3-aminopropylmethylsiloxanes) of the general formulae: Me3Si(H2NCH2CH2CH2MeSiO)xOSiMe3 (H2NCH2CH2CH2MeSiO)y wherein Me is methyl, x may range from 2 to over 100 and y may range from 3 to about 7, the method comprising heating of 3-(3-aminopropyl)-1,1,1,3,5,5,5-heptamethyltrisiloxane, of at least 95% isomeric purity, with a basic catalyst, removing hexamethyldisiloxane, and decomposing the catalyst.
    Type: Grant
    Filed: March 22, 2000
    Date of Patent: January 15, 2002
    Assignee: Archimica (Florida) Inc.
    Inventors: Timothy N. Biggs, Benigno A. Janeiro
  • Patent number: 6329487
    Abstract: This invention is directed to novel ammonolysis products including novel silazanes and polysilazanes characterized by repeating units of silicon-nitrogen in a polymeric compound having a reduced amount of Si—H bonds relative to the amount of Si—H bonds in the starting compound. Preparation of these novel ammonolysis products comprises introducing a starting compound containing at least one Si—H bond, such as a halosilane into a stoichiometric excess of anhydrous liquid ammonia wherein an ammonium halide is generated acting as an acid catalyst to provide an ionic and/or acidic environment for preparing the novel ammonolysis compounds. The prepared novel ammonolysis products are retained in a separate liquid-phase layer and distinct from the anhydrous liquid ammonia containing the ionized ammonium halide. Also provided are methods to purify ammonolysis products and to modify ammonolysis products by controllably increasing viscosity from a liquid to a solid and viscosities there between.
    Type: Grant
    Filed: November 12, 1999
    Date of Patent: December 11, 2001
    Assignee: Kion Corporation
    Inventors: Albert E. Abel, Tracy A. Kruger, Robert W. Mouk, Gary J. Knasiak
  • Patent number: 6329490
    Abstract: Disclosed are polyhedral organosilicon compounds which are possible to be polymerized and can form a film excellent in adhesiveness to a substrate, having a high hardness, a high transparency and having water and oil repellency, and comprise organofluoro groups or both of organofluoro groups and reactive functional groups, the compounds being soluble in an organic solvent and stable. Organosilicon compounds which have perfluoroalkyl groups or both perfluoroalkyl groups and reactive functional groups and which have a polyhedral structure have the following formulas of (I), (II) and (III): [Rf1—X1—(CH2)a—SiO1.5]m  (I) [Rf1—X1—(CH2)a—SiO1.5]m[Rf2—(X2)c—(CH2)b—SiO1.5]n  (II) [Rf1—X1—(CH2)a—SiO1.5]m[R—(X2)c—(CH2)b—SiO1.
    Type: Grant
    Filed: March 31, 2000
    Date of Patent: December 11, 2001
    Assignees: Mitsubishi Materials Corporation, Dai Nippon Toryo Co., Ltd.
    Inventors: Yukiya Yamashita, Kenji Hayashi, Masaoki Ishihara
  • Patent number: 6313253
    Abstract: The invention relates to a process for the condensation of compounds which carry silanol groups and have at least one unit of the general formula (III) AcEdSiO(4-c-d)/2  (III) in which A is a hydroxyl group, E is an inert radical, c is 1, 2, 3 or 4 and d is 0, 1 or 2, with the proviso that c+d ≦4, in which higher molecular weight organosiloxane compounds are prepared by employing with a catalyst system comprising a catalyst which is chosen from basic alkali metal and alkaline earth metal compounds and a cocatalyst which is an at least bidentate chelating ligand and contains units of the general formula (I) N—R1—N  (I)  in which R1 is a divalent linear, cyclic and/or aromatic C1-to C30-hydrocarbon radical.
    Type: Grant
    Filed: January 6, 2000
    Date of Patent: November 6, 2001
    Assignee: Wacker-Chemie GmbH
    Inventors: Frank Baumann, Bernward Duebzer, Chantal Delagnes
  • Patent number: 6306998
    Abstract: Blending (A) a diorganopolysiloxane end-blocked with a hydroxyl group, (B) a hydrolyzable silane having ketoxime, alkoxy, acyloxy, amide or amino groups or a partial hydrolyzate thereof, (C) an organic compound having a C═O group, and (D) an organic compound having a NH2 group gives a condensation curing type composition which is fast and deeply curable at room temperature.
    Type: Grant
    Filed: February 24, 2000
    Date of Patent: October 23, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Tsuneo Kimura, Masayuki Ikeno
  • Patent number: 6294634
    Abstract: A method of preparing organosilicon compositions by heating various mixtures of (i) dimethylcyclosiloxanes or methylhydrogencyclosiloxanes, (ii) homopolymeric and copolymeric cyclosiloxanes containing a C5 or more carbon atom containing group, and (iii) homopolymeric and copolymeric cyclosiloxanes containing an oxyalkylene segment, in the presence of a catalyst, at a temperature and for a time sufficient to cause polymerization of cyclosiloxanes (i) to (iii) to the desired organosilicon composition.
    Type: Grant
    Filed: March 28, 2000
    Date of Patent: September 25, 2001
    Assignee: Dow Corning Corporation
    Inventors: Michael Salvatore Ferritto, William James Schulz, Jr.
  • Patent number: 6291540
    Abstract: The invention concerns a novel method for preparing non-toxic resins crosslinkable under radiation in the presence of an initiator system. Said resins are prepared from compositions of an organic and/or silicon type comprising monomers, oligomers and/or polymers with organofunctional groups, and are cross-linked in the presence of an initiator system consisting of an onium salt with low toxicity whereof the cationic structure is [(CH(CH3)2—C6H4—)—I—(—R1)]+(I).
    Type: Grant
    Filed: March 10, 2000
    Date of Patent: September 18, 2001
    Assignee: Rhodia Chimie
    Inventors: Christian Priou, Jacques Richard
  • Patent number: 6288195
    Abstract: An organopolysiloxane gum is prepared by polymerizing a cyclic organopolysiloxane with a low molecular weight linear organopolysiloxane end-blocked with a triorganosilyl group in the presence of a thermally decomposable catalyst. After the polymerization reaction, the catalyst is deactivated by heating the reaction product under a subatmospheric pressure of typically up to 500 mmHg.
    Type: Grant
    Filed: December 2, 1999
    Date of Patent: September 11, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaharu Takahashi, Yutaka Hagiwara, Minoru Igarashi, Kenji Tawara, Yoshio Tomizawa
  • Patent number: 6284859
    Abstract: A polymerization process comprising mixing siloxanes having silicon-bonded groups R′ with ionic phosphazene base catalysts and allowing condensation via reaction of Si—R′ groups with the formation of a Si—O—Si linkage, R′ denoting a hydroxyl group or a hydrocarbonoxy group having up to 8 carbon atoms is claimed. The catalysts may be of the general formulae: {((R12N)3P═N—)x(R12N)3−xP—N(H)R2}+{A−} or {((R12N)3P═N—)y(R12N)4−yP}+{A}− in which R1 is hydrogen or an optionally substituted hydrocarbon group or in which two R1 groups bonded to the same N atom may be linked to complete a heterocyclic ring, R2 is hydrogen or an optionally substituted hydrocarbon group, x is 1, 2 or 3, y is 1, 2, 3 or 4 and A is an anion.
    Type: Grant
    Filed: December 9, 1999
    Date of Patent: September 4, 2001
    Assignee: Dow Corning Limited
    Inventors: Peter Hupfield, Avril Surgenor, Richard Taylor
  • Patent number: 6284908
    Abstract: A method for disproportionation of an oligohydridosiloxane to produce a polysilsesquioxane compound and an organohydridosilane compound when contacted with a basic catalyst. The basic catalyst can be a tetraalkylammonium hydroxide, an alkali metal hydroxide, and an alkali earth hydroxide. These basic catalysts are generally dissolved in an organic solvent for delivery. The hydroxide catalysts are attractive because many readily decompose by heating above 150° C., thus being easily removed from the final materials. The oligohydridosiloxane is contacted with the basic catalyst under conditions effective to catalytically convert the oligohydridosiloxane into a polysilsesquioxane compound and an organohydridosilane compound. The reaction can occur in either an inert or oxidative atmosphere and can occur without heating, at room temperature. Both polysilsesquioxane foams and gels of the formula (RSiO1.5)n can be produced.
    Type: Grant
    Filed: September 25, 2000
    Date of Patent: September 4, 2001
    Assignee: Sandia Corporation
    Inventors: Douglas A. Loy, Kamyar Rahimian
  • Patent number: 6271330
    Abstract: Terminally functionalized silicone polymers prepared using protected functionalized initiators and processes for preparing the same. The silicone polymers includes protected, functionalized silicone polymers, such as mono-functional, homotelechelic, heterotelechelic, macromonomer, and radial polymers. The protected functionalized polymers can be optionally deprotected to afford functionalized silicone polymers.
    Type: Grant
    Filed: August 12, 1999
    Date of Patent: August 7, 2001
    Assignee: FMC Corporation
    Inventors: Robert James Letchford, James Anthony Schwindeman, Roderic Paul Quirk
  • Patent number: 6265598
    Abstract: A hydrolyzable group end-blocked organopolysiloxane is prepared by reacting (A) an organopolysiloxane having a silanol group at each end of its molecular chain with (B) an organosilicon compound having hydrolyzable groups or a partial hydrolyzate thereof in the presence of (C) a condensation catalyst. Use is made of a vibratory mixer comprising a conduit through which a fluid flows in an axial direction and an agitating element disposed in the conduit for reciprocal motion in the flow direction. A reactant mixture of necessary components is introduced into the conduit where the components are vibro-agitated by the agitating element while reaction takes place.
    Type: Grant
    Filed: October 13, 2000
    Date of Patent: July 24, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kenichi Kimura, Masatoshi Miyake, Nobuhiko Kodana
  • Patent number: 6251486
    Abstract: An improved siloxane-based composition for use as a low &kgr; dielectric material in integrated circuit applications is provided, the composition exhibiting desirable thermal mechanical stability compared to conventional siloxane-based low-&kgr; compositions. Specifically, the invention provides a modified methylsilsesquioxane composition suitable for higher temperature applications than a composition formed from only methylsilsesquioxane. The modified oligomer is characterized by the pendant group ratio A:B:C, where A represents the percentage of pendant groups that are methyl and is about 13 to about 67, B represents the percentage of pendant groups that are dimethyl and is greater than 0 to about 33, and C represents the percentage of pendant groups that are phenyl and is greater than 0 to about 67. The presence of dimethyl and phenyl pendant groups provides a molecular structure that has improved crack-resistance compared to an all-methyl silsesquioxane.
    Type: Grant
    Filed: July 11, 1999
    Date of Patent: June 26, 2001
    Assignee: Agere Systems Guardian Corp.
    Inventors: Edwin Arthur Chandross, Valerie Jeanne Kuck