With Silicon Reactant Which Is Free Of Any Silicon To Carbon Bond Patents (Class 528/39)
  • Patent number: 10752730
    Abstract: The present invention provides soluble, stable singlet fission (SF) compounds, compositions, materials, methods of their use, and methods for their preparation that provide efficient intramolecular singlet fission (iSF) and multiple excitons. The SF compound may be a dimer, an oligomer, or a polymer of polyoligoacenes, where for example, the compound achieves a triplet yield reaching about 200% per absorbed photon. In this system, SF does not depend on intermolecular inter-actions. Instead, SF is an intrinsic property of the molecule and therefore occurs independent of intermolecular interactions. Singlet fission has the potential to significantly improve the photocurrent in single junction solar cells and thus raise the Shockley-Queisser power conversion efficiency limit from about 33% to about 46% or greater. Quantitative SF yield at room temperature has only been observed in crystalline solids or aggregates of higher acenes.
    Type: Grant
    Filed: December 17, 2015
    Date of Patent: August 25, 2020
    Assignees: The Trustees of Columbia University in the City of New York, Bookhaven Science Associates, LLC
    Inventors: Luis Miguel Campos, Matthew Y. Sfeir, Samuel Nathan Sanders, Elango Kumarasamy, Andrew Brian Pun, Michael Louis Steigerwald
  • Patent number: 10703857
    Abstract: Nanoparticle compositions comprising nanoparticles formed from ?-conjugated cross-linked polymers are disclosed, together with their methods of manufacture and their applications. Owing to the nature of the cross-links formed therein, the nanoparticle compositions afford a high degree of manufacturing flexibility and control, as well as being amenable to facile purification for the purpose of imaging and electronics applications.
    Type: Grant
    Filed: July 20, 2015
    Date of Patent: July 7, 2020
    Assignee: CHROMITION LIMITED
    Inventors: Mark Christopher McCairn, Michael L. Turner
  • Patent number: 10647820
    Abstract: The present invention relates to a two-step synthesis method of a pre-hydrolyzed alkyl polysilicate. In the method, a silica precursor hydrated to 90 to 100% is added to maximize a condensation reaction rate, and a silica precursor hydrated to 25 to 70% is additionally added to terminate a condensation reaction, so that a condensation reaction time may be remarkably shortened relative to a conventional one-step synthesis method and may be shortened even without the use of a condensation catalyst, so that the catalyst purchase cost and the catalyst separation step in the process may not be required, thus having a simple process and reducing the production cost. Also, the amount and time point of the silica precursor additionally added may be controlled, thereby easily controlling the gelation reaction time and the weight average molecular weight, and synthesizing the pre-hydrolyzed alkyl polysilicate excellent in storage stability and processabilty.
    Type: Grant
    Filed: October 30, 2017
    Date of Patent: May 12, 2020
    Assignee: LG CHEM, LTD.
    Inventors: Kyu Reon Lee, Kyoung Shil Oh, Je Kyun Lee
  • Patent number: 9831491
    Abstract: Provided are a Si/C composite, in which carbon (C) is dispersed in an atomic state in a silicon (Si) particle, and a method of preparing the Si/C composite. Since the Si/C composite of the present invention is used as an anode active material, electrical conductivity may be further improved and volume expansion may be minimized. Thus, life characteristics of a lithium secondary battery may be improved.
    Type: Grant
    Filed: May 8, 2014
    Date of Patent: November 28, 2017
    Assignee: LG Chem, Ltd.
    Inventors: Ji Hoon Ryu, Hong Kyu Park, Wang Mo Jung, Sung Joong Kang, Chi Ho Jo, Gi Beom Han
  • Patent number: 9285507
    Abstract: The present application relates to a high-refractive composition. The composition of the present application exhibits excellent transparency, moisture resistance, heat resistance, water resistance, weather resistance, light resistance, and durability, and enables formation of a highly refractive film having a high index of refraction. The composition exhibits little outgassing during or after a process and can be applied to a solution application method, and thus can be effectively used in various electronic optical devices.
    Type: Grant
    Filed: December 17, 2013
    Date of Patent: March 15, 2016
    Assignee: LG CHEM, LTD.
    Inventors: Min Jin Ko, Jae Ho Jung, Dae Ho Kang
  • Patent number: 9011591
    Abstract: Compositions for use in microelectronic applications: Ra comprises one or more multiple bonds, provided that, if Ra comprises more than one multiple bond, these multiple bonds are not in a conjugated configuration; and R1, R2, R3 are independently selected from alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rb is selected from H or a saturated group comprising alkyl, alkylene, or alkylidene; and R4, R5, R6 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and Rc comprises more than one multiple bond, and these multiple bonds are in a conjugated configuration; and R7, R8, R9 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl; and R10, R11, R12, R13 are independently alkoxyl, hydroxyl, halide, OC(O)R, OC(O)OR, wherein R is alkyl or a substituted alkyl.
    Type: Grant
    Filed: August 28, 2012
    Date of Patent: April 21, 2015
    Assignees: Dow Global Technologies LLC, Rohm and Haas Electronic Materials LLC
    Inventors: Yuanqiao Rao, Robert L. Auger, John D. Weaver, Paul J. Popa, Roxanne M. Jenkins, Christopher P. Sullivan, Jessica P. Evans, Cecilia W. Kiarie, Yasmin N. Srivastava, Jeffrey L. Fenton, Jr.
  • Publication number: 20150105529
    Abstract: A process is disclosed for preparing silicone resins having improved product purity. The process involves flowing a first liquid containing a silicone resin and an impurity through a fiber bundle, wherein the first liquid and second liquid are substantially immiscible.
    Type: Application
    Filed: May 22, 2013
    Publication date: April 16, 2015
    Applicant: Dow Corning Corporation
    Inventors: Robert Fosdick, Gary Wieber
  • Patent number: 8971766
    Abstract: The present invention provides an electrophotographic member capable of more definitely suppressing occurrence of a C set image. The electrophotographic member has a surface layer including a modified polysiloxane having a structure represented by the following formula (1). In the formula (1), G represents a bivalent group having an ethylene oxide chain represented by (—O—C2H4—) and L represents polysiloxane having at least a SiO4/2(Q) unit or a SiO3/2(T) unit.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: March 3, 2015
    Assignee: Canon Kabushiki Kaisha
    Inventors: Tomohito Taniguchi, Hiroshi Mayuzumi, Yusuke Yagisawa
  • Patent number: 8968459
    Abstract: A durable superhydrophobic coating, which coating has the ability to self-heal, similar to the regeneration function observed in biological systems. The coating composition comprises the reaction products of at least one fluorine-containing silane compound (A), at least one hydrolysable compound (B), at least one polysiloxane compound (C), at least one relatively large-sized ceramic particle (I), at least one nano-sized ceramic particle (II) and at least one solvent.
    Type: Grant
    Filed: December 11, 2013
    Date of Patent: March 3, 2015
    Assignee: NEI Corporation
    Inventor: Jiong Liu
  • Patent number: 8937143
    Abstract: Provided according to some embodiments of the invention are methods of making co-condensed macromolecules that include forming a reaction mixture by combining at leak one reactant and at least one reagent at a first temperature at which the at least one reactant is substantially unreactive in the presence of the at least one reagent; raising the temperature of the reaction mixture to a second temperature at which the at least one reactant is reactive in the presence of the at least one reagent, wherein the reaction of the at least one reactant in the presence of the at least one reagent produces co-condensed macromolecules such as co-condensed silica macromolecules.
    Type: Grant
    Filed: July 19, 2013
    Date of Patent: January 20, 2015
    Assignee: Novan, Inc.
    Inventors: Jian Bao, Nathan Stasko, Eleftherios Kougoulos
  • Patent number: 8829144
    Abstract: An MQ resin including at least 30% SiO2, preferably at least 50 wt % SiO2, and having dynamic viscosity of 50 centipoises (cps) to 750 cps at 25° C. is produced from a stable ethylsilicate polymer. The ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The ethylsilicate polymer is produced by a two step addition of catalysts wherein a hydrolysis catalyst, for example, hydrochloric acid is added initially and a second catalyst, such as phosphonitrilic chloride trimer, is added subsequently.
    Type: Grant
    Filed: January 3, 2011
    Date of Patent: September 9, 2014
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 8829142
    Abstract: The present curable composition comprises an organosilicon compound produced by hydrolysis copolycondensation of (A) a silicon compound R0Si(R1)nX13-n [wherein R0 represents a (meth)acryloyl group; and X1 represents a hydrolyzable group] and (B) a silicon compound SiY14 [wherein Y1 represents a siloxane-bond forming group] under an alkaline condition at a ratio of compound (A) to compound (B) of 1:(0.3 to 1.8) by mol. The present process for producing an organosilicon compound comprises a reaction process of conducting alcohol exchange reaction of a silicon compound. SiY24 [wherein Y2 represents a siloxane-bond forming group] in 1-propanol to produce a composition; and a condensation process of adding a silicon compound R0Si(R1)nX23-n [wherein R0 represents a (meth)acryloyl group; and X2 represents a hydrolyzable group] to the composition to perform the hydrolysis copolycondensation of the silicon compounds under alkaline conditions.
    Type: Grant
    Filed: April 14, 2009
    Date of Patent: September 9, 2014
    Assignee: Toagosei Co., Ltd.
    Inventors: Sayaka Ooike, Akinori Kitamura, Hiroshi Suzuki
  • Patent number: 8808680
    Abstract: This invention relates to thermoplastic elastomers comprising at least one silicone ionomer. These thermoplastic elastomers may be reprocessed and/or recycled.
    Type: Grant
    Filed: November 5, 2012
    Date of Patent: August 19, 2014
    Assignee: Dow Corning Corporation
    Inventors: John Bernard Horstman, Randall Gene Schmidt, Steven Swier
  • Patent number: 8785507
    Abstract: This invention relates to viscoelastic silicone rubber compositions that are the products of the reaction of: (a) a silanol-terminated polyorganosiloxane base; (b) a boron-containing crosslinking agent; and (c) a siloxane bond-forming crosslinking agent. In a viscoelastic silicone rubber composition of the invention some of the crosslinks, the siloxane crosslinks, are permanent and others of the crosslinks, the boron-containing crosslinks, are temporary. Because a fraction of its crosslinks can come apart and then reform, a viscoelastic silicone rubber composition of the invention can relax stress in response to strain and thus adapt to new shapes. The composition has sufficient permanent crosslinks, however, to establish a permanent equilibrium shape to which the composition will eventually return when not subject to any imposed stress.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: July 22, 2014
    Assignee: University of Virginia Patent Foundation
    Inventor: Louis A. Bloomfield
  • Publication number: 20140170403
    Abstract: The present disclosure provides a method for forming an inorganic polymer material, including mixing 10 to 80 parts by weight of tetraalkoxysilane and 10 to 80 parts by weight of trialkoxysilane to form a mixture; and performing a reaction at pH of 0 to 4 by adding 5 to 30 parts by weight of a catalyst to the mixture to form an inorganic polymer material.
    Type: Application
    Filed: May 9, 2013
    Publication date: June 19, 2014
    Applicant: Industrial Technology Research Institute
    Inventors: Wei-Cheng TANG, Yuung-Ching SHEEN, Yuan-Chang HUANG, Yi-Che SU, Yun-Shan HUANG, Yih-Her CHANG, Jen-Lien LIN
  • Patent number: 8728624
    Abstract: A fixing material includes a silane compound polymer as the main component, the silane compound polymer being produced by condensing a silane compound mixture that includes at least one silane compound (1) shown by the following formula (1): R1Si(OR2)p(X1)3-p (wherein R1 represents a group including an ester structure or a cyanoalkyl group, R2 represents an alkyl group having 1 to 6 carbon atoms or the like, X1 represents a halogen atom, and p is an integer from 0 to 3), and at least one silane compound (2) shown by the following formula (2): Si(OR3)q(X2)4-q (wherein R3 represents an alkyl group having 1 to 6 carbon atoms, X2 represents a halogen atom, and q is an integer from 0 to 4). A sealed optical device includes an optical device that is sealed with a cured product of the fixing material. The fixing material produces a cured product that exhibits high hardness, excellent transparency and heat resistance, and rarely undergoes coloration even when subjected to high-energy light or heat for a long time.
    Type: Grant
    Filed: December 7, 2012
    Date of Patent: May 20, 2014
    Assignee: Lintec Corporation
    Inventors: Takashi Tamada, Mikihiro Kashio
  • Patent number: 8722153
    Abstract: A release coating composition includes a curable polysiloxane and an aerosol suppressant that has more than one SiO4/2 unit. The aerosol suppressant includes the polymerization product of a siloxane and a cyclic polysiloxane polymerized in the presence of a polymerization catalyst. The siloxane has units of the chemical formula (SiO4/2)(RaRb2SiO1/2)x wherein Ra is a vinyl moiety, Rb is an alkyl moiety, and x is a number from 1.05 to 4. The release coating composition is formed by combining the aerosol suppressant and a curable polysiloxane. The release coating composition is also used to coat a substrate in a release coating process producing a mist of less than 50 mg/cubic meter measured at approximately 457 m/min.
    Type: Grant
    Filed: May 23, 2008
    Date of Patent: May 13, 2014
    Assignee: Dow Corning Corporation
    Inventor: Robert Ekeland
  • Patent number: 8686101
    Abstract: A coating liquid for forming a low dielectric constant amorphous silica-based coating film with a dielectric constant of 3.0 or below and a film strength (Young's modulus) of 3.0 GPa or more, and also having a smooth surface with an excellent hydrophobicity. The coating liquid contains (1) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA) and alkoxysilane (AS) in the presence of tetraalkylammoniumhydroxide (TAAOH), or (2) a silicon compound obtained by hydrolyzing bis(trialkoxysilyl)alkane (BTASA), alkoxysilane (AS) and tetraalkylorthosilicate (TAOS) in the presence of tetraalkylammoniumhydroxide (TAAOH).
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: April 1, 2014
    Assignee: JGC Catalysts and Chemicals Ltd.
    Inventors: Miki Egami, Hiroki Arao, Akira Nakashima, Michio Komatsu
  • Patent number: 8674048
    Abstract: This invention relates to methods for preparing polyheterosiloxane materials having at least two different non-Si metal elements. The polyheterosiloxane materials prepared by these methods are solid materials which can be easily dispersed in a solvent of choice.
    Type: Grant
    Filed: June 30, 2010
    Date of Patent: March 18, 2014
    Assignee: Dow Corning Corporation
    Inventors: John Bernard Horstman, Nanguo Liu, Randall Gene Schmidt
  • Patent number: 8658284
    Abstract: A polysilane-polysilazane copolymer contains a polysilane unit of formula (I), and a polysilazane unit of formula (II), where each R1 and each R2 are each independently selected from H, Si, and N atoms, R3 is selected from H, Si, or C atoms, a?1, b?1, and a quantity (a+b)?2. The polysilane-polysilazane copolymer may be formulated in a composition with a solvent. The polysilane-polysilazane copolymer may be used in PMD and STI applications for trench filling, where the trenches have widths of 100 nm or less and aspect ratios of at least (6). The polysilane-polysilazane copolymer can be prepared by amination of a perchloro polysilane having (2) or more silicon atoms per molecule with a primary amine.
    Type: Grant
    Filed: October 25, 2010
    Date of Patent: February 25, 2014
    Assignee: Dow Corning Corporation
    Inventors: Wei Chen, Eric Scott Moyer, Binh Thanh Nguyen, Sheng Wang, Mark A. Wanous, Xiaobing Zhou
  • Publication number: 20130210236
    Abstract: The present invention provides a silicon-containing surface modifier wherein the modifier contains one or more of a repeating unit shown by the following general formula (A) and a partial structure shown by the following general formula (C).The present invention has an object to provide a resist underlayer film applicable not only to a negatively developed resist pattern formed by a hydrophilic organic compound but also to a conventional positively developed resist pattern formed by a hydrophobic compound.
    Type: Application
    Filed: January 22, 2013
    Publication date: August 15, 2013
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventor: Shin-Etsu Chemical Co., Ltd.
  • Patent number: 8470953
    Abstract: A sealing material for optical elements with excellent transparency, crack resistance, and heat resistance which can produce a cured product of the sealing material and a sealed optical element are provided.
    Type: Grant
    Filed: August 1, 2011
    Date of Patent: June 25, 2013
    Assignee: Lintec Corporation
    Inventors: Mikihiro Kashio, Toshio Sugizaki, Osamu Moriya
  • Publication number: 20130101942
    Abstract: A resist pattern-forming method capable of forming a resist pattern excellent in pattern collapse resistance in the case of development with the organic solvent in multilayer resist processes. The method has the steps of: (1) providing a resist underlayer film on a substrate using a composition for forming a resist underlayer film; (2) providing a resist film on the resist underlayer film using a photoresist composition; (3) exposing the resist film; and (4) developing the exposed resist film using a developer solution containing no less than 80% by mass of an organic solvent, in which the composition for forming a resist underlayer film contains (A) a component that includes a polysiloxane chain and that has a carboxyl group, a group that can generate a carboxyl group by an action of an acid, an acid anhydride group or a combination thereof.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 25, 2013
    Applicant: JSR CORPORATION
    Inventor: JSR CORPORATION
  • Publication number: 20130096253
    Abstract: A fixing material includes a silane compound polymer as the main component, the silane compound polymer being produced by condensing a silane compound mixture that includes at least one silane compound (1) shown by the following formula (1): R1Si(OR2)p(X1)3-p (wherein R1 represents a group including an ester structure or a cyanoalkyl group, R2 represents an alkyl group having 1 to 6 carbon atoms or the like, X1 represents a halogen atom, and p is an integer from 0 to 3), and at least one silane compound (2) shown by the following formula (2): Si(OR3)q(X2)4-q (wherein R3 represents an alkyl group having 1 to 6 carbon atoms, X2 represents a halogen atom, and q is an integer from 0 to 4). A sealed optical device includes an optical device that is sealed with a cured product of the fixing material. The fixing material produces a cured product that exhibits high hardness, excellent transparency and heat resistance, and rarely undergoes coloration even when subjected to high-energy light or heat for a long time.
    Type: Application
    Filed: December 7, 2012
    Publication date: April 18, 2013
    Applicant: LINTEC CORPORATION
    Inventor: Lintec Corporation
  • Patent number: 8394457
    Abstract: Disclosed is a precursor composition comprising: a compound selected from a compound represented by the formula: Si(OR1)4 and a compound represented by the formula Ra(Si)(OR2)4?a (in the formulas R1 represents a monovalent organic group; R represents a hydrogen atom, a fluorine atom or a monovalent organic group; R2 represents a monovalent organic group; and a is an integer ranging from 1 to 3, provided that R, R1 and R2 may be the same or different from one another) a thermally degradable organic compound; an element having a catalyst activity; urea; and the like. A porous thin film produced from the precursor composition is irradiated with ultraviolet ray, and then subjected to gas-phase reaction with a hydrophobic compound. A porous thin film thus prepared can be used for the manufacture of a semiconductor device.
    Type: Grant
    Filed: May 16, 2007
    Date of Patent: March 12, 2013
    Assignee: Ulvac, Inc.
    Inventors: Nobutoshi Fujii, Takahiro Nakayama, Kazuo Kohmura, Hirofumi Tanaka
  • Patent number: 8367083
    Abstract: The present invention relates to a process for making up and/or caring for keratin materials, in which a composition is applied to the keratin materials, and especially to the lips, this composition containing, in a physiologically acceptable medium: a) a siloxane resin comprising the following units: (i) (R13SiO1/2)a (ii) (R22SiO2/2)b (iii) (R3SiO3/2)c and (iv) (SiO4/2)d with R1, R2 and R3 independently representing an alkyl group containing from 1 to 8 carbon atoms, an aryl group, a carbinol group or an amino group, a being between 0.05 and 0.5, b being between 0 and 0.3, c being greater than 0, d being between 0.05 and 0.6, a+b+c+d=1, on condition that more than 40 mol % of the groups R3 of the siloxane resin are propyl groups, and b) at least one phenyl silicone oil.
    Type: Grant
    Filed: December 5, 2008
    Date of Patent: February 5, 2013
    Assignee: L'Oreal
    Inventors: Claudia Barba, Roberto Cavazzuti
  • Patent number: 8367769
    Abstract: Embodiments of the invention provide silicon-based nanoparticle composites, where the silicon nanoparticles are highly luminescent. Preferred embodiments of the invention are Si—O solid composite networks, e.g., glass, having a homogenous distribution of luminescent hydrogen terminated silicon nanoparticles in a homogenous distribution throughout the solid. Embodiments of the invention also provide fabrication processes for silicon-based silicon nanoparticle composites. A preferred method for forming a silicon-based nanoparticle composite disperses hydrogen terminated silicon nanoparticles and an inorganic precursor of an organosilicon gel in an aprotic solvent to form a sol. A catalyst is mixed into the sol. The sol is then permitted to dry into a gel of the silicon-based nanoparticle composite.
    Type: Grant
    Filed: February 17, 2010
    Date of Patent: February 5, 2013
    Assignee: NanoSi Advanced Technologies, Inc.
    Inventors: Abdullah Saleh Aldwayyan, Mohamad Saleh AlSalhi, Abdurahman Mohammed Aldukhail, Mansour S. Alhoshan, Muhammad Naziruddin Khan, Ghassan K. Al-Chaar, Munir Nayfeh
  • Patent number: 8329815
    Abstract: A silicon-containing polymer which is represented by general formula (5) below and has a weight-average molecular weight in the range from 500 to 500,000: (In the formula, A2 is an organic group of 2-10 carbons, having a carbon-carbon unsaturated group; R3 is an alkylene group of 1-20 carbons, a bivalent aromatic group of 6-20 carbons, or a bivalent alicyclic group of 3-20 carbons; n is 0 or 1; R4 is a hydrogen atom or an alkyl group of 1-10 carbons (R4 in one molecule may be the same type or a combination of two or more different types.); each of x and y is a positive number; each of w and z is 0 or a positive number; 0?z/(w+x+y)?2; and 0.01?y/(w+x)?5), and the heat-resistant resin composition comprising the silicon-containing polymer.
    Type: Grant
    Filed: October 2, 2009
    Date of Patent: December 11, 2012
    Assignee: Toagosei Co., Ltd.
    Inventors: Kunikazu Tauchi, Hiroshi Suzuki
  • Publication number: 20120230932
    Abstract: The present invention relates to organosilicon polymers containing benzoic acid esters in form of particles, process for their preparation, cosmetic or dermatological composition comprising them, as well as their use for protecting a human or animal living body from UV radiation.
    Type: Application
    Filed: October 14, 2010
    Publication date: September 13, 2012
    Applicant: INTERQUIM, S.A.
    Inventors: Adaya Gallardo Sanchez, Santiago Nonell Marrugat, Francisco Marquillas Olondriz, Joan Sallares, Ricardo Miralles Bacete
  • Patent number: 8217107
    Abstract: The present invention relates to room-temperature curable silicone compositions possessing rapid deep-section cure. The silicone sealant compositions of the present invention find application in insulating glass units as elements of windows, skylights, doors and related products.
    Type: Grant
    Filed: March 27, 2007
    Date of Patent: July 10, 2012
    Assignee: Momentive Performance Materials Inc.
    Inventors: Indumathi Ramakrishnan, Edward Joseph Nesakumar
  • Publication number: 20120129352
    Abstract: A pattern-forming method includes forming a silicon-containing film on a substrate, the silicon-containing film having a mass ratio of silicon atoms to carbon atoms of 2 to 12. A shape transfer target layer is formed on the silicon-containing film. A fine pattern is transferred to the shape transfer target layer using a stamper that has a fine pattern to form a resist pattern. The silicon-containing film and the substrate are dry-etched using the resist pattern as a mask to form a pattern on the substrate in nanoimprint lithography. According to another aspect of the invention, a silicon-containing film includes silicon atoms and carbon atoms. A mass ratio of silicon atoms to carbon atoms is 2 to 12. The silicon-containing film is used for a pattern-forming method employed in nanoimprint lithography.
    Type: Application
    Filed: July 28, 2011
    Publication date: May 24, 2012
    Applicant: JSR Corporation
    Inventors: Takashi MORI, Masato TANAKA, Yukio NISHIMURA, Yoshikazu YAMAGUCHI
  • Patent number: 8168740
    Abstract: Process for producing an organosiloxane polymer and novel organosiloxane polymer compositions. The process according to the invention comprises hydrolyzing tetraalkoxysilane monomers in a hydrolysis step; and polymerizing said hydrolyzed monomers in a polymerization step by subjecting them to conditions conducive to polymerization to form an organosiloxane polymer. The hydrolysis step is conducted in a reaction medium comprising an organic compound with hydroxy groups. The invention allows for the synthesis of siloxane polymer compositions suitable for thin-film applications using a high content of tetra- and trifunctional silixane polymer precursors.
    Type: Grant
    Filed: February 26, 2008
    Date of Patent: May 1, 2012
    Assignee: Braggone Oy
    Inventor: Ari Kärkkäinen
  • Patent number: 8124220
    Abstract: An ink jet recording element having very good dye keeping properties in time. The recording element comprises a support and at least one ink-receiving layer, the ink-receiving layer comprising at least one hydrosoluble binder and at least one aluminosilicate polymer obtained by a preparation method consisting in treating an aluminum halide with a mixture of at least one silicon alkoxide only having hydrolyzable substituents and at least one silicon alkoxide having a non-hydrolyzable substituent, with an aqueous alkali in the presence of silanol groups, the aluminum concentration being maintained less than 0.3 mol/l, the Al/Si molar ratio being maintained between 1 and 3.6 and the alkali/Al molar ratio being maintained between 2.3 and 3; and then stirring the resulting mixture at a temperature of from 15° C. to 35° C. in the presence of silanol groups for long enough to form the hybrid aluminosilicate polymer.
    Type: Grant
    Filed: July 14, 2003
    Date of Patent: February 28, 2012
    Assignee: Eastman Kodak Company
    Inventors: Olivier J. Poncelet, Stephanie V. Desrousseaux
  • Patent number: 8124710
    Abstract: MQ-T propyl siloxane resins comprising (R13SiO1/2)a, (R22SiO2/2)b, (R3SiO3/2)c, and (SiO4/2)d units, where at least 40 mole % of the R3 groups are propyl are disclosed. A method of preparing such siloxane resins by reacting a MQ siloxane resin with a T propyl siloxane resin is also disclosed. These siloxane resins are useful in a variety of personal, household, and medical care applications, and in particular, as a resin additive in pigmented cosmetic formulations.
    Type: Grant
    Filed: January 20, 2005
    Date of Patent: February 28, 2012
    Assignee: Dow Corning Corporation
    Inventors: Julie Lyn Cook, Daniel Michael Hinterman, Lori Ann Stark-Kasley, Gary Michael Wieber
  • Patent number: 8053173
    Abstract: A novel multi-functional linear siloxane compound, a siloxane polymer prepared from the siloxane compound, and a process for forming a dielectric film by using the siloxane polymer. The linear siloxane polymer has enhanced mechanical properties (e.g., modulus), superior thermal stability, a low carbon content and a low hygroscopicity and is prepared by the homopolymerization of the linear siloxane compound or the copolymerization of the linear siloxane compound with another monomer. A dielectric film can be produced by heat-curing a coating solution containing the siloxane polymer which is highly reactive. The siloxane polymer prepared from the siloxane compound not only has satisfactory mechanical properties, thermal stability and crack resistance, but also exhibits a low hygroscopicity and excellent compatibility with pore-forming materials, which leads to a low dielectric constant.
    Type: Grant
    Filed: July 15, 2009
    Date of Patent: November 8, 2011
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Jae Jun Lee, Jong Baek Seon, Hyun Dam Jeong, Jin Heong Yim, Hyeon Jin Shin
  • Patent number: 8034890
    Abstract: This invention provides a process for making a polyfunctional starburst-shaped fullerene derivative for use as a matrix-reinforcing agent for mesoporous and other porous materials. This invention can include the formation of a highly soluble example of such a derivative from a fullerene and a bifunctional coupling agent. A solution of said agent can be delivered to the surface of a porous solid during, or after, the solids formation. Porous films and bodies containing such a matrix-reinforcing agent can exhibit improved mechanical properties, and can be produced using equipment and techniques common and available to those skilled in the art of porous materials preparations.
    Type: Grant
    Filed: April 3, 2009
    Date of Patent: October 11, 2011
    Assignee: Roskilde Semiconductor LLC
    Inventor: Michael Ayers
  • Patent number: 8026332
    Abstract: A sealing material for optical elements with excellent transparency, crack resistance, and heat resistance which can produce a cured product of the sealing material and a sealed optical element are provided.
    Type: Grant
    Filed: March 18, 2008
    Date of Patent: September 27, 2011
    Assignee: Lintec Corporation
    Inventors: Mikihiro Kashio, Toshio Sugizaki, Osamu Moriya
  • Patent number: 8026035
    Abstract: A composition includes a copolymer including a mixture of monomeric units having structures (A), (B), and (C), and one or more of structures (D) or (E): HSiO(3-a)/2(OH)a??(A) Si(3-b)/2(OH)b—CH2)n—SiO(3-c)/2(OH)c??(B) R1SiO(3-d)/2(OH)d??(C) MeSi(3-e)/2(OH)e??(D) R2SiO(3-f)/2(OH)f??(E) wherein a, b, c, d, e, and f are independently from 0 to 2, n is from 0 to about 10, R1 is a chromophore, and R2 is a hydrophilic group.
    Type: Grant
    Filed: March 30, 2007
    Date of Patent: September 27, 2011
    Assignee: Cheil Industries, Inc.
    Inventors: Shahrokh Motallebi, SangHak Lim
  • Patent number: 7989030
    Abstract: A silicone resin containing boron, aluminum, and/or titanium, and having silicon-bonded branched alkoxy groups; a silicone composition containing a silicone resin; and a method of preparing a coated substrate comprising applying a silicone composition on a substrate to form a film and pyrolyzing the silicone resin of the film.
    Type: Grant
    Filed: July 23, 2007
    Date of Patent: August 2, 2011
    Assignee: Dow Corning Corporation
    Inventors: Ronald Boisvert, Duane Bujalski, Zhongtao Li, Kai Su
  • Publication number: 20110184142
    Abstract: An MQ resin including at least 30% SiO2, preferably at least 50 wt % SiO2, and having dynamic viscosity of 50 centipoises (cps) to 750 cps at 25° C. is produced from a stable ethylsilicate polymer. The ethylsilicate polymer includes not greater than 1 wt % of TEOS monomer. The ethylsilicate polymer is produced by a two step addition of catalysts wherein a hydrolysis catalyst, for example, hydrochloric acid is added initially and a second catalyst, such as phosphonitrilic chloride trimer, is added subsequently.
    Type: Application
    Filed: January 3, 2011
    Publication date: July 28, 2011
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 7968202
    Abstract: The present invention relates to a sealed natural cut stone, the pores of which are permeable to water vapor but are impermeable to aqueous liquids, and a method for the production thereof and the use of such natural cut stones.
    Type: Grant
    Filed: June 1, 2005
    Date of Patent: June 28, 2011
    Assignee: Evonik Degussa GmbH
    Inventors: Edwin Nun, Volker Hennige, Uwe Paulmann, Hannelore Armoneit, Sigrid Banken, Marie-Theres Wilkes, Norbert Kern, Christian Herkt-Bruns, Thomas Schrief, Eckart Berendes
  • Patent number: 7951895
    Abstract: The invention relates to, and the general field of the invention is that of, the synthesis of silicone resins, more particularly the synthesis of silicone resins of type MQ. The process relates to the preparation of MQ silicone resins and permits better control of the operating conditions in the step of the polymerization of a sodium silicate (B) in aqueous medium in the presence of an acid (C) to form a silica hydrosol (polysilicic acid). In the course of the polycondensation step the reactants, a sodium silicate and an acid, are mixed, preferably in continuous fashion, dynamically to form a mixture (3), by means of at least one intensive mixing tool (M) producing a power ? per unit volume of more than 10 kW/m3.
    Type: Grant
    Filed: December 19, 2006
    Date of Patent: May 31, 2011
    Assignee: Bluestar Silicones France
    Inventors: Kamel Ramdani, Hélène Bossy, Sébastien Lomel, Nicolas Durand
  • Patent number: 7943721
    Abstract: Methods are disclosed of making linear and cross-linked, HMW (high molecular weight) polysilanes and polygermanes, polyperhydrosilanes and polyperhydrogermanes, functional liquids containing the same, and methods of using the liquids in a range of desirable applications. The silane and germane polymers are generally composed of chains of Si and/or Ge substituted with R? substituents, where each instance of R? is, for example, independently hydrogen, halogen, alkenyl, alkynyl, hydrocarbyl, aromatic hydrocarbyl, heterocyclic aromatic hydrocarbyl, SiR?3, GeR?3, PR?2, OR?, NR?2, or SR?; where each instance of R? is independently hydrogen or hydrocarbyl. The cross-linked polymers can be synthesized by dehalogenative coupling or dehydrocoupling. The linear polymers can be synthesized by ring-opening polymerization. The polymers can be further modified by halogenation and/or reaction with the source of hydride to furnish perhydrosilane and perhydrogermane polymers, which are used in liquid ink formulations.
    Type: Grant
    Filed: October 5, 2006
    Date of Patent: May 17, 2011
    Assignee: Kovio, Inc.
    Inventor: Vladimir K. Dioumaev
  • Patent number: 7923522
    Abstract: The invention provides a preparation process of organic-group-modified zeolite fine particles excellent in stability of particle size and to be used for electronic materials or the like. The preparation process comprises a first step of obtaining a liquid containing zeolite seed crystals having a particle size of 80 nm or less which are formed in the presence of a structure directing agent, a second step of adding an organic-group-containing hydrolyzable silane compound to the liquid obtained by the first step, and a third step of maturing the liquid of the second step at temperature higher than that of the first step. A dispersion liquid of zeolite fine particles obtained by the process.
    Type: Grant
    Filed: April 1, 2008
    Date of Patent: April 12, 2011
    Assignees: Shin-Etsu Chemical Co., Ltd., Panasonic Corporation
    Inventors: Yoshitaka Hamada, Masaru Sasago, Hideo Nakagawa, Yasunori Morinaga
  • Patent number: 7915362
    Abstract: Provided is a heat-curable silicone composition containing: (A) an organopolysiloxane having at least one structure represented by the following general formula (2) within each molecule: wherein m represents an integer of 0, 1 or 2, R1 represents a hydrogen atom, a phenyl group or a halogenated phenyl group, R2 represents a hydrogen atom or a methyl group, R3 represents an identical or different monovalent organic group having 1 to 10 carbon atoms, and R4 represents an identical or different bivalent organic group having 1 to 10 carbon atoms; and (B) a quantity of an organic peroxide that is effective as a curing catalyst. The heat-curable silicon composition yields a cured product having excellent transparency and minimal discoloration over time. Also provided is a light emitting diode element having a material composed of the cured product.
    Type: Grant
    Filed: September 21, 2007
    Date of Patent: March 29, 2011
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Toshiyuki Ozai
  • Patent number: 7884170
    Abstract: A stable MQ resin solution with over 50% SiO2 and having viscosity of 50 cps at 25° C. to about 750 cps at 25° C. and which is essential free of monomer is disclosed. The stable resin solution is made by a two step addition of catalysts wherein a hydrolysis catalysts, as for example, hydrochloric acid is added initially and a second catalysts such as Phosphonitrilic chloride trimer is added subsequently.
    Type: Grant
    Filed: June 10, 2008
    Date of Patent: February 8, 2011
    Assignee: Silbond Corporation
    Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
  • Patent number: 7875317
    Abstract: An insulating-film-forming composition includes: a hydrolysis-condensation product obtained by hydrolyzing and condensing a hydrolyzable-group-containing silane monomer (A) in the presence of a polycarbosilane (B) and a basic catalyst (C); and an organic solvent.
    Type: Grant
    Filed: July 14, 2006
    Date of Patent: January 25, 2011
    Assignee: JSR Corporation
    Inventors: Hisashi Nakagawa, Masahiro Akiyama, Takahiko Kurosawa, Atsushi Shiota
  • Patent number: 7858690
    Abstract: A polymer including a functional group, where the polymer is defined by the formula where R1 is a monovalent organic group, each R2 is independently a monovalent organic group, R3 is a divalent organic group, R4 is a bond, a divalent organic group, or a divalent organic group including a functional group, ? is a polymer chain, m is an integer from 1 to about 25, and n is an integer from 1 to 4.
    Type: Grant
    Filed: October 5, 2007
    Date of Patent: December 28, 2010
    Assignee: Bridgestone Corporation
    Inventor: Yaohong Chen
  • Patent number: 7851023
    Abstract: An essential aim of the invention is a treatment which permits: (i) coating a textile material and/or threads, fibers and/or filaments making up the textile material, the silicone formulation cross-linking around the threads, fibers and/or filaments making up the textile material and forming a cross-linked silicone coating around the same and ii) durably imparting water-repellency and impermeability to said textile material without substantially affecting the intrinsic respirability of the textile material. Said aim is achieved by means of the present invention using at least one cross-linkable silicone formulation as a base for the textile coating material, particularly, of a textile material which may be used for the production of sports clothing.
    Type: Grant
    Filed: January 21, 2005
    Date of Patent: December 14, 2010
    Assignee: Rhodia Chimie
    Inventors: Martial Deruelle, Yves Giraud
  • Patent number: 7838615
    Abstract: A siloxane resin having the formula: (HSiO3/2)a(RSiO3/2)b(SiO4/2)c where R is Z, Z(CH2)n or ZO(CH2)n where Z is a phenyl or substituted phenyl group; n has a value of 1 to 6, a has value of 0.01 to 0.7, b has a value of 0.05 to 0.7, c has a value of 0.1 to 0.9 and a+b+c?1. The siloxane resins are useful in anti-reflective coating compositions.
    Type: Grant
    Filed: September 23, 2005
    Date of Patent: November 23, 2010
    Assignee: Dow Corning Corporation
    Inventor: Bianxiao Zhong