With Silicon Reactant Which Is Free Of Any Silicon To Carbon Bond Patents (Class 528/39)
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Patent number: 7834120Abstract: A novel monofunctional monomer having a cage oligosiloxane structure is represented by formula (1) wherein X is a polymerizable oxygen-containing C1-C40 group, R1 is a C1-C20 saturated hydrocarbon group, C6-C20 aromatic hydrocarbon group, C1-C20 organoxy group or halogen atom, and R is a non-polymerizable monovalent C1-C40 hydrocarbon group which is optionally halogenated. The monomer has improved compatibility with various solvents and polymerizable monomers. A method for preparing the same is also provided.Type: GrantFiled: October 4, 2005Date of Patent: November 16, 2010Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Ayumu Kiyomori, Tohru Kubota, Yasufumi Kubota, Takayuki Honma
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Patent number: 7834121Abstract: Disclosed are coating compositions that include both (a) an alkoxy-functional and/or silanol-functional silicone; and (b) an epoxy-functional silicone. Also disclosed are substrates at least partially coated with a coating deposited from such a composition and methods for coating substrates with such compositions.Type: GrantFiled: March 30, 2007Date of Patent: November 16, 2010Assignee: PPG Industries Ohio, Inc.Inventors: Norman R. Mowrer, Kamlesh J. Sheth
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Publication number: 20100272673Abstract: This invention relates to thermoplastic elastomers comprising at least one silicone ionomer. These thermoplastic elastomers may be reprocessed and/or recycled.Type: ApplicationFiled: December 18, 2008Publication date: October 28, 2010Inventors: John Bernard Horstman, Randall Schmidt, Steven Swier
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Patent number: 7794837Abstract: A stationary phase for a liquid chromatograph and process for making is provided. The stationary phase material may have a modified base substrate and a fluorinated carboxylic acid covalently bonded thereto through an amide or ester bond. The stationary phase may have a substantially consistent shape selectivity characteristic with an ?TBN/BaP of less than 1 within a temperature range of at least 10-70° C. Advantageously, a fluorinated stationary phase has a shape selectivity characteristic exhibited with an ?TBN/BaP of less than 1 with a mobile phase having up to at least 30% water. A process for making the stationary involves mixing a substrate material or fluorinated carboxylic acid with a reactive alkylsilane linker and at least one organic solvent to form a first solution. The other of the substrate material or fluorinated carboxylic acid is then added to the first solution, or to a product separated from the first solution, to form a second solution.Type: GrantFiled: August 6, 2008Date of Patent: September 14, 2010Assignee: The United States of America as represented by the Secretary of Commerce, The National Institute of Standards and TechnologyInventors: Katrice A. Lippa, Catherine A. Rimmer, Lane C. Sander
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Patent number: 7795368Abstract: The invention relates to a novel family of oligomeric and polymeric s-triazine and s-heptazine derivatives and to their use as an intermediate, e.g. as precursors for producing Si/(M)/C/N/(O) ceramics, as mesoporous materials such as, e.g., catalyst carriers for storing gas or as a stationary phase for chromatography, as flameproofing agents, plastic additives or for other organic/inorganic functional materials.Type: GrantFiled: August 6, 2006Date of Patent: September 14, 2010Assignee: Zylum Beteiligungsgesellschaft mbH & Co.Inventors: Edwin Rolf Balduin Kroke, Marcus Rolf Schwarz, Nadia Emam Aly El Gamel
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Patent number: 7794795Abstract: The present invention relates to a coating composition including a sol-gel matrix and a dendrimeric organochalcogeno derivative and a system including the coating composition and a substrate. The present invention also relates to a method of preventing fouling of surfaces subjected to a marine environment.Type: GrantFiled: July 6, 2007Date of Patent: September 14, 2010Assignee: The Research Foundation of State University of New YorkInventors: Michael R. Detty, Michael D. Drake, Ying Tang, Frank V. Bright
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Patent number: 7790829Abstract: A method for producing a functionalized silica, compositions and methods for forming curable silicone rubber compositions by using the functionalized silica are also disclosed. Compositions and methods for forming cured silicone resin compositions and products having high transparency, high tensile strength, desirable percent elongation, or a combination of the foregoing properties are also disclosed.Type: GrantFiled: July 13, 2007Date of Patent: September 7, 2010Assignee: Momentive Performance Materials Inc.Inventors: Abirami Srikanth, Vikram Kumar, Helmut Steinberger, Umapathy Senthilkumar
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Publication number: 20100210786Abstract: An alkyl silane compound represented by the general formula RSi(OL)3 (here, R is an alkyl group, L is H, Si or a group capable of easily changing the OL group into the OH group in a solution or a suspension), a silicon compound represented by the general formula Si(OM)4 (here, M is H, Si or a group capable of easily changing the OM group into the OH group in a solution or a suspension), and water are reacted in a solvent or a dispersion medium. A thermoplastic layered alkyl siloxane with the composition formula represented by the general formula (RSi1+xO2+1.5x+0.5xLz)m (here, R is an alkyl group, L is H, Si or a group capable of easily changing the OL group into the OH group in a solution or a suspension, and 0.5?x?2, 2?m?200, 0?z), which is a thermoplastic inorganic/organic layered composite having good shaping property and dispersing property, capable of transitioning at various temperatures including the vicinity of the room temperature can be provided.Type: ApplicationFiled: May 3, 2010Publication date: August 19, 2010Inventors: Kazuko FUJII, Hiroshi Kodama, Nobuo Iyi, Taketoshi Fujita, Shigenobu Hayashi
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Publication number: 20100184935Abstract: A process is disclosed for the preparing silicone polyethers by reacting; (A) a polyether having at least one terminally unsaturated aliphatic hydrocarbon group and an alkali metal content of less than 50 ppm, (B) an organohydrogensiloxane having an acid number of less than 0.005, via a hydrosilylation reaction. The process is particularly useful to prepare silicone polyethers of improved quality via a continuous process.Type: ApplicationFiled: March 29, 2007Publication date: July 22, 2010Applicants: DOW CORNING CORPORATION, CORNING TORAY CO., LTD.Inventors: Theodore Oberhellman, Yoshiyuki Tanaka, Charles Neal, Simon Parsley, Brian Deeth
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Patent number: 7736735Abstract: The coating composition of the present invention contains an organic-inorganic hybrid polymer and a polysiloxane having a specific molecular weight, wherein the organic-inorganic hybrid polymer is prepared from a specific silane compound and a specific silyl group-containing polymer, and the weight ratio (Wa/Wb) between the silane compound content (Wa) and the silyl group-containing polymer content (Wb) is within the range from 5/95 to 50/50 (provided that Wa+Wb=100). The coating composition enables to obtain a coating film excellent in transparency, adhesion to organic substrates and radical resistance, and the coating composition has excellent storage stability.Type: GrantFiled: September 2, 2005Date of Patent: June 15, 2010Assignee: JSR CorporationInventors: Tarou Kanamori, Keisuke Yajima, Akira Nishikawa
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Patent number: 7674857Abstract: The present invention provides for a room temperature cured silicone thermoplastic resin sealant composition with reduced gas permeability useful in the manufacture of glazing such as windows and doors.Type: GrantFiled: November 18, 2005Date of Patent: March 9, 2010Assignee: Momentive Performance Materials Inc.Inventors: Shayne J. Landon, David A. Williams, Vikram Kumar, Sachin Askok Shelukar, Edward Joseph Nesakumar, Indumathi Ramakrishnan
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Patent number: 7652119Abstract: A problem of the present invention is to provide a curable composition which gives good curability by use of a catalyst other than organic tin catalysts. The above problem is solved by a curable composition, comprising: (A) one or more polymers having a silicon-containing group which is crosslinkable by forming siloxane bonds, (B) an amine compound, and (C) a silicon compound having, as substituents on its silicon, at least one electron withdrawing group, and at least one group selected from the group consisting of alkoxy groups, alkenyloxy groups, acyloxy groups, and a hydroxyl group.Type: GrantFiled: November 9, 2005Date of Patent: January 26, 2010Assignee: Kaneka CorporationInventors: Katsuyu Wakabayashi, Hiroshi Iwakiri, Masahiro Murakami
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Publication number: 20090306326Abstract: A stable MQ resin solution with over 50% SiO2 and having viscosity of 50 cps at 25° C. to about 750 cps at 25° C. and which is essential free of monomer is disclosed. The stable resin solution is made by a two step addition of catalysts wherein a hydrolysis catalysts, as for example, hydrochloric acid is added initially and a second catalysts such as Phosphonitrilic chloride trimer is added subsequently.Type: ApplicationFiled: June 10, 2008Publication date: December 10, 2009Inventors: Walter L. Magee, Adam W. Emerson, Wallace G. Joslyn, Richard S. Odneal
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Patent number: 7601792Abstract: To a silicone resin obtained through cohydrolytic condensation of 100 pbw of a mixture of 1-50 Si mol % of tetraalkoxysilane, 50-99 Si mol % of trialkoxysilane and 0-10 Si mol % of dialkoxysilane with less than 100 pbw of water, having a Mn of at least 1,500 and containing 30-80 mol % of R1SiO3/2 units and 20-70 mol % of R1SiO2/2(OX) and R1SiO1/2(OX)2 units combined, a curing catalyst and a solvent are added to formulate a silicone resin composition. It is applied and heat cured to a plastic substrate to form a protective coat having a high hardness and improved properties such as mar resistance, crack resistance, adhesion, water resistance, heat resistance and weathering resistance.Type: GrantFiled: January 13, 2005Date of Patent: October 13, 2009Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Koichi Higuchi, Masaaki Yamaya
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Publication number: 20090238986Abstract: The invention relates to alkali-resistant sol-gel coatings, a process for producing alkali-resistant sol-gel coatings and use thereof. To provide alkali-resistant sol-gel coatings, a coating is proposed within the scope of the invention that consists of a hydrolysable silane of the compounds TEOS, MTEOS or higher-chain alkyl silanes (di- tri- and tetrafunctional silanes), but preferably TEOS, MTEOS or mixtures thereof and a condensation catalyst based on a) secondary or tertiary bases (e.g. amino, mercaptosilanes) and/or b) Lewis acids as metal alkoxides, such as aluminium alkoxides, zirconium alkoxides and titanium alkoxides where the ratio (in wt. %) of hydroysable silane to condensation catalyst is between 99:1 and 70:30.Type: ApplicationFiled: June 12, 2006Publication date: September 24, 2009Inventors: Frank Gross, Gerd Schlick, Stefan Sepeur
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Patent number: 7582697Abstract: A silicone rubber adhesive film comprising a composition formed from; (A) organopolysiloxane gum that has at least two alkenyl groups in each molecule; (B) wet-method hydrophobic reinforcing silica that has a specific surface area of at least 200 m2/g; (C) organohydrogenpolysiloxane that contains at least two silicon-bonded hydrogen atoms in each molecule; (D) mixture or reaction mixture from: (a) organopolysiloxane that has a branched molecular chain structure and that contains at least one silicon-bonded alkenyl group in each molecule and at least one silicon-bonded hydrolyzable group in each molecule, and (b) a silicon-containing compound that contains at least one silicon-bonded epoxy-functional hydrocarbon group and at least one silicon-bonded hydrolyzable group; and (E) curing accelerator.Type: GrantFiled: December 19, 2005Date of Patent: September 1, 2009Assignee: Dow Corning Toray Company, Ltd.Inventors: Kazuo Hirai, Hideo Miyazaki, Hiroaki Yoshida, Noriyuki Suganuma
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Patent number: 7544735Abstract: A mixture for forming a coating on a surface includes a metal alkoxide having the chemical formula Si(OR1)4, OR1 being a hydrolysable group, an organoalkoxysilane having the chemical formula R2xSiOR1(4-x), R2 being an epoxy group and x being an integer from 0 to 3 , a silica filler, and an organic acid for promoting hydrolysis and cross-linking the metal alkoxide and the organoaloxysilane. A coating on the surface is formed by depositing the mixture on the surface to form an under layer and depositing an outer layer comprising primarily a radiation activated self-cleaning material on the under layer. The radiation activated self-cleaning material can include titanium dioxide (TiO2) particles at least partially in anatase form.Type: GrantFiled: August 27, 2004Date of Patent: June 9, 2009Assignee: Agency for Science Technology and ResearchInventor: Ru Xiong Cai
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Patent number: 7514151Abstract: A method of forming an insulating film includes: forming a polysiloxane insulating film on a substrate; forming a polycarbosilane insulating film on the polysiloxane insulating film; and forming a CVD insulating film on the polycarbosilane insulating film by plasma chemical vapor deposition (CVD). The polysiloxane insulating film is formed by hydrolysis and condensation of a silane compound, and the polycarbosilane insulating film is formed by applying a solution obtained by dissolving a polycarbosilane compound in a solvent, and heating the resulting coating.Type: GrantFiled: May 12, 2006Date of Patent: April 7, 2009Assignee: JSR CorporationInventor: Atsushi Shiota
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Patent number: 7491785Abstract: A multi-functional cyclic silicate compound, a siloxane-based polymer prepared from the silicate compound and a process of producing an insulating film using the siloxane-based polymer. The silicate compound of the present invention is highly compatible with conventional pore-generating substances and hardly hygroscopic, so it is useful for the preparation of a siloxane-based polymer suitable to a SOG process. Furthermore, a film produced by the use of such siloxane-based polymer is excellent in mechanical properties, thermal stability and crack resistance and enhanced in insulating properties by virtue of its low hygroscopicity. Therefore, in the field of semiconductor production, this film is of great use as an insulating film.Type: GrantFiled: May 10, 2004Date of Patent: February 17, 2009Assignee: Samsung Electronics Co., Ltd.Inventors: Hyeon Jin Shin, Hyun Dam Jeong, Jong Back Seon, Kwang Hee Lee, Sang Kook Mah
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Patent number: 7485690Abstract: A sacrificial film-forming composition is provided comprising (A) a silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formulae (1) and (2): X—Y—SiZ3??(1) RnSiZ4-n??(2) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group such as an unsubstituted hydroxyl group or a substituted or unsubstituted epoxy, acyloxy or acryloxy group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, and n is an integer of 0 to 3, the silicone resin being capable of crosslinking reaction by the crosslinkable organofunctional group in formula (1), (B) a crosslinking agent, (C) an acid generator, and (D) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.Type: GrantFiled: June 9, 2005Date of Patent: February 3, 2009Assignees: Shin-Etsu Chemical Co., Ltd., International Business Machines CorporationInventors: Yoshitaka Hamada, Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda, Dirk Pfeiffer
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Patent number: 7482419Abstract: A silsesquioxane resin wax composition, method for its preparation, and use in personal, household, automotive and medical care compositions are disclosed. The silsesquioxane resin wax can also find utility in a variety of oil and gas field applications, such as for crude oil wax control.Type: GrantFiled: April 5, 2005Date of Patent: January 27, 2009Assignee: Dow Corning CorporationInventors: Virginie Caprasse, Timothy Gregg Hueston, Tina Marie Leaym, Virginia Kay O'Neil, Lori Ann Stark-Kasley, Isabelle Van Reeth
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Patent number: 7465777Abstract: The present disclosure relates to hybrid polymers, methods of making such hybrid polymers, and medical devices that include the hybrid polymers. Such hybrid polymers are suitable for forming biomaterials in a predetermined shape for use in medical devices and medical device components. The hybrid polymers of the present disclosure are formed through a reactive extrusion process prior to being formed into the predetermined shape of the medical device or medical device component.Type: GrantFiled: March 2, 2006Date of Patent: December 16, 2008Assignee: Boston Scientific Scimed, Inc.Inventors: Michele L. Zoromski, Liliana L. Atanasoska, Robert W. Warner
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Publication number: 20080249278Abstract: A sealing material for optical elements with excellent transparency, crack resistance, and heat resistance which can produce a cured product of the sealing material and a sealed optical element are provided.Type: ApplicationFiled: March 18, 2008Publication date: October 9, 2008Inventors: Mikihiro Kashio, Toshio Sugizaki, Osamu Moriya
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Patent number: 7429638Abstract: A polysiloxane having a refractive index of about 1.56 measured at light wavelength 633 nm, characterized in that the polysiloxane includes siloxane T units of the formula where A represents an alkylene group having 1 to 4 carbon atoms: n=0 or 1; m is at least 1; and Ar is an aryl group substituted by at least one iodine, bromine or chlorine atom, or is a polynuclear aromatic group. The invention includes chlorosilanes having the formula (Ar) m-(A)nSiCl3, useful in forming high refractive index polysiloxanes.Type: GrantFiled: July 18, 2002Date of Patent: September 30, 2008Assignee: Dow Corning LimitedInventors: Pierre Maurice Chevalier, Duan Li Ou
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Patent number: 7385021Abstract: A sacrificial film-forming composition is provided comprising (A) an organofunctional silicone resin which is a co-hydrolytic condensate of hydrolyzable silanes having formula (1) and formula (2) and/or (3): X—Y—SiZ3 ??(1) RnSiZ4-n ??(2) P—SiZ3 ??(3) wherein Z is a hydrolyzable group, X is a crosslinkable organofunctional group, Y is a single bond or a divalent hydrocarbon group, R is hydrogen or a monovalent hydrocarbon group, n is an integer of 0-3, and P is a substituent group which readily decomposes and volatilizes upon thermal decomposition, (B) a crosslinking agent, (C) an acid generator, (D) an extender or porogen, and (E) an organic solvent. The composition has improved storage stability, filling properties, adhesion and coating uniformity sufficient to form a sacrificial film which is effectively dissolvable in a stripping solution.Type: GrantFiled: June 9, 2005Date of Patent: June 10, 2008Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoshitaka Hamada, Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Takafumi Ueda
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Patent number: 7375168Abstract: Siliceous materials were prepared by adding one or more additives, including one or more water soluble polymers, and derivatives thereof, as well as trifunctional silanes, to sols containing tetraalkoxysilanes derived from polyols. The polymers facilitate phase separation of the growing silica gel matrix, leading to high surface area self-supporting silica gels with cure occurring at ambient temperatures. The materials also show a significant reduction in shrinkage properties and significant protein stabilization abilities.Type: GrantFiled: April 1, 2004Date of Patent: May 20, 2008Assignee: McMaster UniversityInventors: Zheng Zhang, Yang Chen, Jorge Cruz-Aguado, Richard J. Hodgson, Dina Tleugabulova, John D. Brennan, Michael A. Brook
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Patent number: 7358316Abstract: The present invention relates to a low dielectric material essential for a next generation electric device such as a semiconductor device, with a high density and high performance. In detail, the present invention provides: a process for preparing an organic silicate polymer comprising a polymerization step in the absence of homogenizing organic solvents, of mixing and reacting organic silane compounds with water in the presence of a catalyst to hydrolyze and condense the silane compounds, that is thermally stable and has good mechanical and crack resistance properties; and a coating composition for forming a low dielectric insulating film; and a process for preparing a low dielectric insulating film using the organic silicate polymer prepared according to the process, and an electric device comprising the low dielectric insulating film prepared according to the process.Type: GrantFiled: September 18, 2001Date of Patent: April 15, 2008Assignee: LG Chem, Ltd.Inventors: Min-Jin Ko, Myung-Sun Moon, Dong-Seok Shin, Jung-Won Kang, Hye-Yeong Nam
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Patent number: 7358318Abstract: The present invention relates to an organo-ceramic composite material useful for the extraction of metal ions from solution. The organo-ceramic composite material is formed according to a sol gel synthesis scheme by reacting a functional precursor silane and its homopolymers with either (i) a mixture of a cross-linking silane and its homopolymers or (ii) the cross-linking silane, under conditions effective to yield the composite material of the present invention. Further aspects of the present invention relate to methods of removing a metal ion from a water stream and recovering a metal ion from a water stream, both of which include contacting a water stream containing a metal ion with an organo-ceramic composite material of the present invention under conditions effective to remove the metal ion from the water stream.Type: GrantFiled: May 18, 2000Date of Patent: April 15, 2008Assignee: Syracuse UniversityInventors: Lawrence L. Tavlarides, Nandu V. Deorkar, Jun-Sig Lee
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Patent number: 7354624Abstract: Multi-layer coatings are disclosed that include (a) a first layer deposited from at least one composition that includes a polymeric composition, and (b) a second layer applied over at least a portion of the first layer in which the second layer is deposited from at least one liquid composition that includes (i) a photocatalytic material, and (ii) a binder that is hydrophilic and comprises an essentially completely hydrolyzed organosilicate. Also disclosed are substrates coated with such multi-layer coatings, methods of applying such multi-layer coatings to a substrate and methods of making a painted surface easy-to-clean.Type: GrantFiled: May 18, 2005Date of Patent: April 8, 2008Assignee: PPG Industries Ohio, Inc.Inventors: Edward R. Millero, Masayuki Nakajima, Chia-Cheng Lin, Shan Cheng, James P. Colton
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Patent number: 7354650Abstract: Multi-layer coatings are disclosed that include (1) a first layer comprising an inorganic oxide network, and (2) a second layer applied over at least a portion of the first layer, wherein the second layer is deposited from at least one liquid composition that is hydrophilic and includes an essentially completely hydrolyzed organosilicate. Also disclosed are substrates coated with such multi-layer coatings, methods of applying such multi-layer coatings to a substrate and methods for improving the anti-fouling, self-cleaning, easy-to-clean, and/or anti-fogging properties of an article.Type: GrantFiled: May 18, 2005Date of Patent: April 8, 2008Assignee: PPG Industries Ohio, Inc.Inventors: Masayuki Nakajima, Chia-Cheng Lin, Shan Cheng, James P. Colton
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Patent number: 7335717Abstract: The in vitro polymerization of silica, silicone, non-silicon metalloid-oxane and metallo-oxane polymer networks, by combining a catalyst and a substrate to polymerize the substrate to form silica, polysiloxanes, polymetalloid-oxanes polymetallo-oxanes (metal oxides), polyorganometalloid oxanes, polyorganometallo oxanes, and the polyhydrido derivatives thereof, at about neutral pH.Type: GrantFiled: March 22, 2004Date of Patent: February 26, 2008Assignee: The Regents of the University of CaliforniaInventors: Daniel E. Morse, David Kisailus, Kristian M. Roth
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Publication number: 20070243395Abstract: A composite resin which has been produced by hydrolyzing and condensing a silane compound (2) containing a bissilane compound (B) represented by: XnR3-nSi—Y—SiR3-nXn ??(B) wherein Y is a divalent organic group which is optionally substituted with a fluorine atom or a divalent organic group which optionally contains an aromatic ring, R is a monovalent organic group, X is OH group or a hydrolyzable group, and n is 1, 2, or 3; in the presence of (1) porous and/or hollow inorganic oxide fine particles (A); and which is an integral mixture of component (1) and component (2) which has undergone the hydrolysis and the condensation. The composite resin of the present invention has voids in the resin since it contains porous and/or hollow inorganic oxide fine particles, and the composite resin of the present invention can also be formed into a cured article or a cured coating with reduced refractive index since it contains air which has the lowest refractive index.Type: ApplicationFiled: April 12, 2007Publication date: October 18, 2007Inventors: Masaaki Yamaya, Kazuharu Sato
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Patent number: 7247350Abstract: The invention relates to a method for the production of low solvent sol-gel systems, comprising the following steps: (a) hydrolysis or condensation of a silane and/or an alkoxide and/or several alkoxides of Al, Ce, Ga, Ge, Sn, Ti, Zr, Hf, V, Nb and Ta, (b) addition of water to the reaction mixture until phase separation sets in, and (c) separation of the condensate phase. The invention also relates to the sol-gel system thus obtained and to the use thereof.Type: GrantFiled: December 20, 2001Date of Patent: July 24, 2007Assignee: Nano-X GmbHInventors: Stefan Sepeur, Nora Kunze, Michael Kihm
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Patent number: 7241505Abstract: Hybrid sol comprising [SiOx(OH)y]n particles, where 0<y<4 and 0<x<2, which consist of a mixture of a first fraction of particles having a particle size of 4–15 nm and a second fraction of particles having a mean particle size of 15–60 nm, water and a solvent; obtainable by hydrolytic polycondensation of tetraalkoxysilanes in an aqueous, solvent-containing medium with addition of a monodisperse silicon oxide hydroxide sol having a mean particle size of 15–60 nm and a maximum standard deviation of 20%, and the preparation and use thereof.Type: GrantFiled: September 19, 2002Date of Patent: July 10, 2007Assignee: Merck Patent, GmbHInventors: Walther Glaubitt, Monika Kursawe, Andreas Gombert, Thomas Hofmann
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Patent number: 7153584Abstract: Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.Type: GrantFiled: November 5, 2004Date of Patent: December 26, 2006Assignee: Hoya CorporationInventors: Hiroshi Shirakawa, Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 7144968Abstract: A silicon-containing polymer having a tetrafunctional siloxane portion as the basic skeleton, and containing a carboxylic acid group-containing triorganosiloxane portion and a carboxylic acid derivative group-containing triorganosiloxane portion in a specific proportion. It may be advantageously used as a negative non-chemical amplification resist polymer or a positive chemical amplification resist polymer.Type: GrantFiled: December 7, 2001Date of Patent: December 5, 2006Assignee: Fujitsu LimitedInventors: Miwa Kozawa, Keiji Watanabe, Ei Yano
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Patent number: 7125949Abstract: A process, comprising: a) reacting a an alkoxysilane, an (epoxy)alkoxysilane, and a fluorinated alkoxysilane to form a fluorinated sol-gel polymer; and b) reacting a nonlinear optical chromophore comprising a donor, a ?-bridge, an acceptor, and at least one alkoxysilyl group with the fluorinated sol-gel polymer to form a nonlinear optical fluorinated sol-gel polymer.Type: GrantFiled: January 21, 2004Date of Patent: October 24, 2006Assignee: Lumera CorporationInventor: Dan L. Jin
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Patent number: 7097910Abstract: A composition comprising the condensation product of a least one fluorochemical polyether silane compound having a polyfluoropolyether segment and at least two hydrolysable silane groups per molecule, with one or more non-fluorinated compounds having at least two hydrolysable groups per molecule, and the reaction product thereof, is disclosed. The composition provides durable water, oil and stain repellency to a substrate.Type: GrantFiled: November 5, 2003Date of Patent: August 29, 2006Assignee: 3M Innovative Properties CompanyInventors: George G. I. Moore, Rudolf J. Dams, Franceska M. Fieuws, Guido P. Piessens
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Patent number: 7074874Abstract: Liquid alkoxysilyl-functional silicone resins having excellent storage stability and a method of preparing these liquid alkoxysilyl-functional silicone resins comprising running an equilibration polymerization reaction with components comprising (A) a polydiorganosiloxane and (B) an alkyl polysilicate in the presence of (C) an equilibration polymerization catalyst. Curable silicone resin compositions comprising the aforesaid liquid alkoxy-functional silicone resins which have excellent curability and when cured form a water-repellent coating on a variety of substrate surfaces.Type: GrantFiled: June 27, 2002Date of Patent: July 11, 2006Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Hideki Kobayashi, Motoshi Sasaki, Toru Masatomi
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Patent number: 7026427Abstract: A process for the preparation of organopolysiloxane resins, wherein a silane R3SiOR1 ??(I) or a hydrolyzate thereof, and a silane Si(OR2)4 ??(II) or a partial hydrolyzate thereof, are reacted with acidified water and a portion of alcohol distilled off; the mixture is then reacted in the presence of base and a water-insoluble organic solvent and water, alcohol and optionally a portion of water-insoluble organic solvent are removed; the mixture is then neutralized with acid, and any water, alcohol, and a portion of organic solvent are distilled off; the mixture obtained is then treated with organopolysiloxanes and precipitated salts formed are then removed, and optionally, the mixture is separated from water-insoluble organic solvent.Type: GrantFiled: September 5, 2003Date of Patent: April 11, 2006Assignee: Wacker-Chemie GmbHInventors: Thomas Koehler, Manfred Meisenberger, Wolfgang Ackermann
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Patent number: 7019099Abstract: Disclosed herein are siloxane-based resins prepared by hydrolyzing and polycondensing cyclic and/or cage-shape siloxane compounds, optionally with at least one silane compound, in an organic solvent in the presence of a catalyst and water. Also, disclosed herein are methods for forming insulating film between interconnect layers in semiconductor devices by using the siloxane-based resins thus prepared as low dielectric insulating materials.Type: GrantFiled: July 18, 2003Date of Patent: March 28, 2006Assignee: Samsung Electronics Co., Ltd.Inventors: Yi Yeol Lyu, Jin Heong Yim, Sang Kook Mah, Eun Ju Nah, Il Sun Hwang, Hyun Dam Jeong, Jung Hyung Kim
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Patent number: 7015298Abstract: The invention pertains to a coating composition comprising a compound comprising at least one spiro-ortho silicate group and a hydroxyl-reactive cross-linker, to a process for curing the composition, and to the use of the composition. The coating composition of the current invention can be formulated to a coating composition having a low content of volatile organic solvents, is curable at a temperature as low as 5° C., and the cured coating composition of the current invention is essentially free of unreacted low-molecular weight blocking agents. Further, the pot life: drying time ratio of coating compositions according to the invention is particularly favorable.Type: GrantFiled: September 29, 2003Date of Patent: March 21, 2006Assignee: Akzo Nobel N.V.Inventors: Keimpe Jan Van Den Berg, Klaus Hobel, Josephus Christiaan Van Oorschot, Jan Cornelis Van Beelen, Huig Klinkenberg
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Patent number: 7012125Abstract: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic dyes incorporated into spin-on-glass materials. Suitable dyes are strongly absorbing over wavelength ranges around wavelengths such as 248 nm and 193 nm that may be used in photolithography. A method of making dyed spin-on-glass materials includes combining one or more organic dyes with alkoxysilane reactants during synthesis of the spin-on-glass materials.Type: GrantFiled: November 5, 2001Date of Patent: March 14, 2006Assignee: Honeywell International Inc.Inventors: Joseph Kennedy, Teresa Baldwin, Nigel P. Hacker, Richard Spear
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Patent number: 6965006Abstract: A method of synthesizing metal alkoxide polymers is provided, for use, as an example, in synthesizing hybrid organic/inorganic materials with low optical absorption for optical applications. The method involves a plurality of acidolysis steps involving acidolysis of a metal alkoxide compound with an acid to produce an intermediate acidolysed solution, and combining and condensing the intermediate acidolysed solutions to produce the metal alkoxide polymer.Type: GrantFiled: April 10, 2002Date of Patent: November 15, 2005Assignee: rpo Pty Ltd.Inventor: Congji Zha
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Patent number: 6958172Abstract: Hybrid films, such as those having good abrasion-resistance and defogging properties, antireflection films including it, optical products, and methods for restoring the defogging property of the hybrid films are disclosed. The hybrid films having a defogging property may be obtained through vapor deposition of an organic compound having a hydrophilic group and a reactive group along with silicon dioxide or with silicon dioxide and aluminum oxide. The antireflection film may be formed on a substrate having the hybrid film as the outermost layer opposite to the substrate. The optical product may comprise a plastic substrate and the antireflection film having the hybrid film. A method for restoring the defogging property of the hybrid film of the optical product may include washing the hybrid film.Type: GrantFiled: December 23, 2002Date of Patent: October 25, 2005Assignee: Hoya CorporationInventors: Hiroshi Shirakawa, Takeshi Mitsuishi, Kenichi Shinde
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Patent number: 6956097Abstract: Anti-reflective coating materials for deep ultraviolet photolithography include one or more organic light-absorbing compounds incorporated into spin-on-glass materials. Suitable absorbing compounds are strongly absorbing over wavelength ranges around wavelengths such as 365 nm, 248 nm, and 193 nm that may be used in photolithography. A method of making absorbing spin-on-glass materials includes combining one or more organic absorbing compounds with alkoxysilane or halosilane reactants during synthesis of the spin-on-glass materials.Type: GrantFiled: February 14, 2002Date of Patent: October 18, 2005Assignee: Honeywell International Inc.Inventors: Joseph Kennedy, Teresa Baldwin, Nigel P. Hacker, Richard Spear
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Patent number: 6946537Abstract: Siloxane oligomers of the general formula I or II wherein at least one functionalized alkyl group is present per oligomer molecule. The siloxane oligomers are produced by oligomerization of halogenalkyltrihalogensilanes, and co-optionally co-oligomerized with (C1-C18)-alkyl-, phenyl-, aryl- or aralkyl-trihalogensilanes and/or silicon tetrachloride, in the presence of alcohol and water, following which the halogenalkyl function is optionally modified in a further step. The siloxane oligomers can be used as coupling agents in rubber mixtures or as building preservation agents.Type: GrantFiled: February 6, 2004Date of Patent: September 20, 2005Assignee: Degussa AGInventors: Roland Krafczyk, Björn Treffeisen, Jaroslaw Monkiewicz
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Patent number: 6914114Abstract: An absorbing ether-like compound including a siliconethoxy, silicondiethoxy, or silicontriethoxy species attached to a naphthalene or anthracene chromophore via an oxygen linkage is used as an organic light-absorbing compound. The absorbing ether-like compound is incorporated into spin-on glass materials to provide anti-reflective coating materials for deep ultraviolet photolithography. A method of synthesizing the light-absorbing ether compounds is based on the reaction of an alcohol-substituted chromophore with an acetoxysilicon compound in the presence of alcohol. A method of making absorbing spin-on-glass materials including the absorbing ether-like compounds is also provided.Type: GrantFiled: April 30, 2003Date of Patent: July 5, 2005Assignee: Honeywell International Inc.Inventors: Teresa Baldwin, Mary Richey, James S. Drage, Hui-Jung Wu, Richard Spear
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Patent number: 6913832Abstract: The present invention provides a coating composition comprising: A coating composition comprising: TEOS; a surfactant; at least one organosilane; HCl; water; and ethanol. The present invention also provides films made from such a coating composition and a method for making such films.Type: GrantFiled: June 7, 2002Date of Patent: July 5, 2005Assignee: Science & Technology Corporation at University of New MexicoInventors: Hongyou Fan, Gabriel P. Lopez, Charles Jeffrey Brinker, Yunfeng Lu
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Patent number: 6893724Abstract: The present invention employs alkyl polysilicate to form silicone-polyester-polysilicate hybrid compositions with an appropriate proportion to modify silicone-polyester resin, or directly adds the alkyl polysilicate at an appropriate proportion into silicone-polyester resin to produce a hybrid composition. The composition in high baking temperature forms a hybrid structure having good thermal resistance, especially, hot-oil resistance and hot hardness, and good adhesion to metals such as carbon steel, stainless steel and aluminum. The present invention can be used in the field of the protective coating for heat-resistant metal such as frying pans and electric irons to be a kind of novel heat-resistant composition having hybrid structure. The composition in accordance with the present invention comprises (A)silicone-polyester; (B)alkyl polysilicate and the structure thereof comprises (RO)3—Si—O—(Si(OR)2—O)n—R, where n=0˜20 and R represents —CH3, —C2H5, —C3H7, or —C4H9.Type: GrantFiled: March 11, 2003Date of Patent: May 17, 2005Assignee: Grand Tek Advance Material Science Co., Ltd.Inventors: Hsueh-Tso Lin, Kuan-Ching Chen