Polycyclo Ring System Having The Hetero Ring As One Of The Cyclos Patents (Class 549/31)
  • Patent number: 9382264
    Abstract: The present invention provides the compounds of formulae (3) and (1), wherein n is 0 or 1, R11 and R12 are the same and are selected from the group consisting of CN, OR300, Si(R301)3, NHR302, NR303R304, SR305 and R306, or R11 and R12 together are selected from the group consisting of (a), (b), and (c) and X is Cl, Br or I, and a process for the preparation of compounds of formula (3) comprising the compounds of formula (1) as key intermediates.
    Type: Grant
    Filed: August 27, 2013
    Date of Patent: July 5, 2016
    Assignees: BASF SE, MAX-PLANCK-GESELLSCHAFT ZUR FOERDERUNG DER WISSENSCHAFTEN E.V.
    Inventors: Thomas Gessner, Helmut Reichelt, Yulian Zagranyarski, Long Chen, Chen Li, Klaus Muellen
  • Patent number: 9005874
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Grant
    Filed: April 18, 2012
    Date of Patent: April 14, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Patent number: 8975419
    Abstract: The invention relates to solution-processable, p-type, low-optical gap oligothiophene compounds for use in solar cell application, comprising at least one thiophene-containing group, at least one electron-withdrawing dicyanovinyl or tricyanovinyl group, and at least one electron-donating diphenylaminofluorenyl or N-alkylcarbazole group.
    Type: Grant
    Filed: June 28, 2013
    Date of Patent: March 10, 2015
    Assignee: Nano and Advanced Materials Institute Limited
    Inventors: Ricky Man-Shing Wong, Weifeng Zhang, Lei Guo
  • Publication number: 20150034887
    Abstract: A novel photochromic compound which develops a color of a neutral tint (double peak characteristic) and has high color optical density, high fading speed and excellent durability. Like a compound represented by the following formula (20), the photochromic compound having a group (methylthio group in the following formula 20) which has a sulfur atom bonded to the 7-position carbon atom is a photochromic compound having high color optical density, high fading speed and excellent durability.
    Type: Application
    Filed: March 11, 2013
    Publication date: February 5, 2015
    Applicant: TOKUYAMA CORPORATION
    Inventors: Shinobu Izumi, Yasutomo Shimizu, Junji Momoda
  • Publication number: 20150014666
    Abstract: An aromatic amine derivative is represented by a formula (1) below. In the formula (1), R2, R3, R4, R5, R7, R8, R9 and R10 each independently represent a hydrogen atom and a substituent. In the formula (1), R1 and R6 are represented by a formula (2) below, and L1 to L2 are each independently a single bond, a divalent residue of an aryl group, and the like. L3 is a divalent residue of an aryl group and the like. In the formula (2); Ar1 is a monovalent substituent having a partial structure represented by the following formula (3); X represents an oxygen atom or a sulfur atom; and A and B represent a six-membered ring. In the formula (2), Ar2 is an aryl group, a monovalent substituent having a partial structure represented by the formula (3), and the like.
    Type: Application
    Filed: September 21, 2012
    Publication date: January 15, 2015
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Yumiko Mizuki, Hirokatsu Ito
  • Publication number: 20140356787
    Abstract: A resist composition comprising a compound (m0) (wherein Rb1 represents an electron withdrawing group; Rb2 and Rb3 each independently represents an aryl group, an alkyl group or an alkenyl group, provided that Rb2 and Rb3 may be mutually bonded to form a ring with the sulfur atom; and X0? represents a monovalent counteranion).
    Type: Application
    Filed: May 30, 2014
    Publication date: December 4, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshitaka Komuro, Takaaki Kaiho, Toshiaki Hato, Akiya Kawaue, Junichi Tsuchiya, Yoshiyuki Utsumi
  • Patent number: 8900794
    Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3?Z+??(I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10,k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater.
    Type: Grant
    Filed: September 28, 2012
    Date of Patent: December 2, 2014
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Emad Aqad, Cheng-Bai Xu, Mingqi Li, Shintaro Yamada, William Williams, III
  • Patent number: 8829202
    Abstract: Provided is a condensed polycyclic aromatic compound that can be used as a precursor for synthesizing a condensed polycyclic aromatic compound having relatively high solubility. Also provided is a method for synthesizing and using such a novel condensed polycyclic aromatic compound. The condensed polycyclic aromatic compound is represented by formula (II): (II) (where X1 and X2 are each independently selected from the group consisting of a hydrogen atom, halogen atom, alkyl group, and the like, but at least one of X1 and X2 is a halogen atom; B is a condensed ring having at least one benzene ring moiety; each Y is independently selected from chalcogens; and A1 through A4 are each independently selected from the group consisting of hydrogen atoms, halogen atoms, alkyl groups, and the like and two adjacent atoms or groups can bond together to form an aromatic group).
    Type: Grant
    Filed: August 3, 2012
    Date of Patent: September 9, 2014
    Assignee: Teijin Limited
    Inventors: Yoshinori Ikeda, Azusa Kohno, Takashi Shiro, Kazuo Takimiya
  • Publication number: 20140220492
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component containing a polymeric compound having a structural unit derived from a compound represented by general formula (a0-1). R1 and R2 each independently represents a group represented by general formula (a0-2) or a functional group; V1 and V2 each represents a single bond or an alkylene group of C1 to C10 which may have a substituent; Y1 represents a single bond or a divalent linking group; Y2 represents a fluorinated alkylene group of C1 to C4 which may have a substituent; L1 represents O or a group represented by —NR?1—(R?1 represents H or an alkyl group of C1 to C5); Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Application
    Filed: February 3, 2014
    Publication date: August 7, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takaaki Kaiho, Yoshitaka Komuro
  • Publication number: 20140186769
    Abstract: A resist composition having excellent lithography properties, which generates an acid upon exposure and exhibits changed solubility in a developing solution by the action of an acid, the resist composition containing a base material component (A) which exhibits changed solubility in a developing solution by the action of an acid, and the base material component (A) containing a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1); a method for forming a resist pattern using the resist composition; and a high-molecular weight compound (A1) having a constituent unit (a0) derived from a compound represented by the following general formula (a0-1), are disclosed.
    Type: Application
    Filed: December 10, 2013
    Publication date: July 3, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takaaki Kaiho, Yoshiyuki Utsumi, Jun Iwashita, Masahito Yahagi
  • Publication number: 20140178821
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Application
    Filed: December 18, 2013
    Publication date: June 26, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Takaaki Kaiho, Tsuyoshi Nakamura
  • Publication number: 20140154527
    Abstract: A chromene compound having a short fading half period, especially, a short fading half period even at a low temperature in a general-purpose polymer solid matrix. The chromene compound is represented by the following formula (1). wherein R1 is a hydroxyl group or the like, R2 and R3 are each an aryl group or the like, C* is a spiro carbon atom, a spiro ring A represented by the following formula is a saturated hydrocarbon ring having 4 to 12 ring member carbon atoms or the like, and at least one ring member carbon atom constituting the ring A is a group represented by the following formula (4), and X is a divalent group such as arylene group, wherein R7 and R8 are each a cycloalkyl group or the like.
    Type: Application
    Filed: June 19, 2012
    Publication date: June 5, 2014
    Applicant: TOKUYAMA CORPORATION
    Inventors: Shinobu Izumi, Kazuhiro Teranishi, Yusuke Daikoku, Mitsuyoshi Sando
  • Publication number: 20140120472
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) including a compound represented by (b1-1), a compound represented by (b1-1?) and/or a compound represented by (b1-1?) (R1?-R3? represents an aryl group or an alkyl group, provided that at least one of R1?-R3? represents a substituted aryl group being substituted with a group represented by (b1-1-0), and two of R1?-R3? may be mutually bonded to form a ring with the sulfur atom; X represents a C3-C30 hydrocarbon group; Q1 represents a carbonyl group-containing divalent linking group; X10 represents a C1-C30 hydrocarbon group; Q3 represents a single bond or a divalent linking group; Y10 represents —C(?O)— or —SO2—; Y11 represents a C1-C10 alkyl group or a fluorinated alkyl group: Q2 represents a single bond or an alkylene group; and W represents a C2-C10 alkylene group).
    Type: Application
    Filed: January 6, 2014
    Publication date: May 1, 2014
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Hideo HADA, Yoshiyuki UTSUMI, Takehiro SESHIMO, Akiya KAWAUE
  • Patent number: 8703387
    Abstract: A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation].
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: April 22, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi
  • Publication number: 20140054520
    Abstract: A novel photochromic compound which develops a color of a neutral tint and has high color optical density, high fading speed and excellent durability. The present invention is a chromene compound having an indeno(2,1-f)naphtho(1,2-b)pyran structure as the basic skeleton in which a hetero ring having two hetero atoms including at least one sulfur atom is directly bonded to the 6-position and the 7-position of the indeno(2,1-f)naphtho(1,2-b)pyran structure via the hetero atom like the compound represented by the following formula (18).
    Type: Application
    Filed: March 7, 2012
    Publication date: February 27, 2014
    Applicant: TOKUYAMA CORPORATION
    Inventors: Junji Takenaka, Junji Momoda, Kazuhiro Teranishi, Toshiaki Takahashi, Mitsuyoshi Sando, Shinobu Izumi
  • Publication number: 20140017617
    Abstract: A method of producing an ammonium salt compound, including reacting a first ammonium salt compound containing a first ammonium cation which is a primary, secondary or tertiary ammonium cation with a nitrogen-containing compound having a lone pair to obtain a second ammonium salt compound which contains a conjugated acid of the nitrogen-containing compound, the conjugated acid of the nitrogen-containing compound having a larger pKa than the pKa of the first ammonium cation; and a method of producing a compound, including a step of salt exchange between the ammonium salt compound obtained by the aforementioned production method and a sulfonium cation or iodonium cation which has a higher hydrophobicity than the hydrophobicity of the conjugated acid of the nitrogen-containing compound.
    Type: Application
    Filed: July 8, 2013
    Publication date: January 16, 2014
    Inventors: Masatoshi Arai, Yoshiyuki Utsumi
  • Publication number: 20130337382
    Abstract: A compound represented by general formula (b1) shown below (in the formula, Y1 represents a divalent linking group; W represents S, Se or I; R1 represents a hydrocarbon group; represents an alkyl group of 1 to 5 carbon atoms or an alkoxy group of 1 to 5 carbon atoms; when W represents I, m+n=2, and when W represents S or Se, m+n=3, provided that m?1 and n?0; p represents an integer of 0 to 5; and X? represents a counteranion.
    Type: Application
    Filed: June 11, 2013
    Publication date: December 19, 2013
    Inventors: Yoshiyuki Utsumi, Hideto Nito
  • Patent number: 8569513
    Abstract: A compound having a triptycene moiety represented by formula (1) is disclosed. In the formula, A1 and A2 represent —S—, —O—, —CO—, or —NR—; R1 and R3 represent a substituent; n is an integer from 0 to 2; R4 and R5 an electron-withdrawing group having a Hammett's substituent constant ?p of equal to or more than 0; L11, L12, L21 and L22 represent a single bond or a divalent group selected from the group consisting of —O—, —S—, —S(?O)2—, —CO—, —OCO—, —COO—, —OCOO— and —NRA— where RA represents a C1-7 alkyl group or hydrogen atom, —CH2— and any combinations thereof; Z1 and Z2 represent a divalent 5- or 6-membered cyclic linking group; R21 and R22 represent a hydrogen atom or substituted or non-substituted alkyl group; and m1 and m2 each respectively represent an integer of from 0 to 2.
    Type: Grant
    Filed: March 28, 2011
    Date of Patent: October 29, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Satoshi Tanaka, Masaki Okazaki, Naoyuki Nishikawa
  • Patent number: 8557500
    Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
    Type: Grant
    Filed: February 28, 2012
    Date of Patent: October 15, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Hiromu Sakamoto, Takahiro Yasue
  • Patent number: 8530673
    Abstract: A tetrathiafulvalene derivative expressed by General Formula (I): General Formula (I) in General Formula (I), X represents an atom selected from a carbon atom, a sulfur atom, and a nitrogen atom, and Xs may be the same or different; provided that when X is the carbon atom or the nitrogen atom, R1 to R8 each represent one of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, and a substituted or unsubstituted thioalkoxy group, and may be the same or different; and Y1 and Y2 each represent one of structures expressed by General Formulas (II) and (III), and may be the same or different: General Formula (II) General Formula (III).
    Type: Grant
    Filed: March 17, 2010
    Date of Patent: September 10, 2013
    Assignee: Ricoh Company, Ltd.
    Inventors: Masato Shinoda, Satoshi Yamamoto, Toshiya Sagisaka, Takuji Kato, Takashi Okada, Daisuke Goto, Shinji Matsumoto, Masataka Mohri
  • Publication number: 20130230802
    Abstract: To provide an acrylamide derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition, a polymer produced through polymerization of a raw material containing the acrylamide derivative, and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR. The invention provides an acrylamide derivative represented by the following formula (1): wherein R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group; W represents a C1 to C10 alkylene group or a C3 to C10 cycloalkylene group; R2 represents a cyclic group having 3 to 20 ring-forming atoms and represented by the following formula (2): wherein X represents an oxygen atom or >N—R3; R3 represents a hydrogen atom or a C1 to C5 alkyl group; Y represents >C?O or >S(?O)n; and n is an integer of 0 to 2.
    Type: Application
    Filed: August 25, 2011
    Publication date: September 5, 2013
    Applicant: KURARAY CO., LTD.
    Inventors: Ichihiro Aratani, Takashi Fukumoto
  • Patent number: 8486606
    Abstract: An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to s
    Type: Grant
    Filed: June 30, 2009
    Date of Patent: July 16, 2013
    Assignee: Kuraray Co., Ltd.
    Inventors: Junko Sato, Osamu Nakayama, Takashi Fukumoto
  • Patent number: 8481243
    Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10X10-A11sX11-A12-??(a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
    Type: Grant
    Filed: January 9, 2012
    Date of Patent: July 9, 2013
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hyungjoo Kim, Akira Kamabuchi, Koji Ichikawa
  • Publication number: 20130164675
    Abstract: The invention provides a novel acrylic ester derivative which can form a structural unit of a polymer to be incorporated into a photoresist composition; a polymer produced through polymerization of a raw material containing the acrylic ester derivative; and a photoresist composition which contains the polymer and which, as compared with the case of conventional ones, realizes formation of a high-resolution resist pattern having improved LWR.
    Type: Application
    Filed: September 2, 2011
    Publication date: June 27, 2013
    Applicant: KURARAY CO., LTD.
    Inventors: Osamu Nakayama, Manabu Yada
  • Patent number: 8436117
    Abstract: A stimuli responsive compound includes: a unit A having bonds that function as rotation axes; a first unit B disposed at a first bonding section of the unit A; a second unit B disposed at a second bonding section of the unit A; a first unit C disposed at a third bonding section of the unit A; and a second unit C disposed at a fourth bonding section of the unit A. The first unit B bonds with the second unit B by oxidation-reduction reaction, and the first unit C and the second unit C have liquid crystallinity and include polymerizable functional groups.
    Type: Grant
    Filed: February 2, 2011
    Date of Patent: May 7, 2013
    Assignee: Seiko Epson Corporation
    Inventor: Toshihiro Otake
  • Patent number: 8431723
    Abstract: The invention relates to new radicals, their use as paramagnetic agents in a method for the dynamic nuclear polarisation and a method for the dynamic nuclear polarisation of compounds comprising carboxyl groups.
    Type: Grant
    Filed: July 28, 2005
    Date of Patent: April 30, 2013
    Assignee: GE Healthcare AS
    Inventor: Mikkel Thaning
  • Publication number: 20130095424
    Abstract: A resin comprising a structural unit represented by formula (aa): wherein T1 represents a C3-C34 sultone ring group optionally having a substituent, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents —X2— or —X3—X4—CO—X5—, where X2, X3 and X5 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rd)—, and Rd represents a hydrogen atom or a C1-C6 alkyl group, and R1 represents a hydrogen atom, a halogen atom, or a C1-C6 alkyl group optionally having a halogen atom.
    Type: Application
    Filed: October 9, 2012
    Publication date: April 18, 2013
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventor: SUMITOMO CHEMICAL COMPANY, LIMITED
  • Publication number: 20130089819
    Abstract: A resist composition which can form a very fine resist pattern with excellent lithography properties, a new polymeric compound useful for the resist composition, and a compound useful as a monomer for the polymeric compound. The resist composition contains a polymeric compound containing a structural unit (a0) represented by general formula (a0) shown below. In the formula (a0), A is an anion represented by the general formula (1) or (2).
    Type: Application
    Filed: June 14, 2011
    Publication date: April 11, 2013
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Akiya Kawaue, Kazushige Dohtani, Yoshiyuki Utsumi, Jun Iwashita, Kenri Konno, Daiju Shiono, Daichi Takaki
  • Publication number: 20130084525
    Abstract: A photoacid generator compound has the formula (I): [A-(CHR1)p]k-(L)-(CH2)m—(C(R2)2)n—SO3?Z+??(I) wherein A is a substituted or unsubstituted, monocyclic, polycyclic, or fused polycyclic C5 or greater cycloaliphatic group optionally comprising O, S, N, F, or a combination comprising at least one of the foregoing, R1 is H, a single bond, or a substituted or unsubstituted C1-30 alkyl group, wherein when R1 is a single bond, R1 is covalently bonded to a carbon atom of A, each R2 is independently H, F, or C1-4 fluoroalkyl, wherein at least one R2 is not hydrogen, L is a linking group comprising a sulfonate group, a sulfonamide group, or a C1-30 sulfonate or sulfonamide-containing group, Z is an organic or inorganic cation, p is an integer of 0 to 10, k is 1 or 2, m is an integer of 0 or greater, and n is an integer of 1 or greater.
    Type: Application
    Filed: September 28, 2012
    Publication date: April 4, 2013
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventor: Rohm and Haas Electronic Materials LLC
  • Patent number: 8389744
    Abstract: The present invention is directed towards a new class of semi-conducting acene derivatives. These compounds are soluble species and they all possess superior thermal stability and photooxidative resistance as compared to their counterparts that lack the substitution patterns disclosed herein.
    Type: Grant
    Filed: October 11, 2011
    Date of Patent: March 5, 2013
    Assignee: University of New Hampshire
    Inventors: Glen P. Miller, Jeremy Kintigh
  • Patent number: 8378093
    Abstract: The present invention relates to a porphyrinogen based sensor having selective binding affinity for an explosive chemical. Upon binding of the target molecule, the porphyrinogen derivative undergoes a detectable adsorption and emission of electromagnetic radiation.
    Type: Grant
    Filed: May 15, 2007
    Date of Patent: February 19, 2013
    Assignee: Syddansk Universitet
    Inventors: Jan Oskar Jeppesen, Kent A. Nielsen
  • Patent number: 8367299
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: February 5, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Publication number: 20120301829
    Abstract: A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation].
    Type: Application
    Filed: May 23, 2012
    Publication date: November 29, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi
  • Publication number: 20120270155
    Abstract: There are provided a novel compound, a polymeric compound, a resist composition, an acid generator and a method of forming a resist pattern the compound represented by general formula (1-1): wherein each of R1 and R3 independently represents a single bond or a divalent linking group; A represents a divalent linking group; each of R2 and R4 independently represents a hydroxyl group, a hydrocarbon group which may have a substituent, or a group represented by general formula (1-an1), (1-an2) or (1-an3), provided that at least one of R2 and R4 represents a group represented by general formula (1-an1), (1-an2) or (1-an3); and n0 is preferably 0 or 1, and wherein Y1 represents a single bond or —SO2—; R5 represents a linear or branched monovalent hydrocarbon group of 1 to 10 carbon atoms, cyclic monovalent hydrocarbon group of 3 to 20 carbon atoms or monovalent hydrocarbon group of 3 to 20 carbon atoms having a cyclic partial structure which may be substituted with a fluorine atom; and M+ represents an organic ca
    Type: Application
    Filed: April 18, 2012
    Publication date: October 25, 2012
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshitaka Komuro, Yoshiyuki Utsumi, Akiya Kawaue, Masatoshi Arai
  • Publication number: 20120251945
    Abstract: The present invention provides a photoresist composition containing: a resin which contains a structural unit derived from a compound having an acid-labile group and which is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid; an acid generator and a compound represented by the formula (I): wherein R1, X1, R2, u1, s1, t1 are each defined in the specification, with the proviso that sum of s1 and t1 is 1 or 2.
    Type: Application
    Filed: March 23, 2012
    Publication date: October 4, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Hiromu SAKAMOTO, Yuichi MUKAI
  • Publication number: 20120225385
    Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.
    Type: Application
    Filed: February 28, 2012
    Publication date: September 6, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Hiromu SAKAMOTO, Takahiro YASUE
  • Patent number: 8227170
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of an acid, and an acid generator component (B), wherein the base component (A) includes a polymeric compound (A0) containing a structural unit (a0) represented by the general formula (a0-1) shown below: (wherein, R1 represents a hydrogen atom, an alkyl group or a halogenated alkyl group; R2 represents a bivalent linking group containing at least one kind of polar groups selected from the group consisting of —O—, —C(?O)—, —C(?O)—O—, a carbonate linkage (—O—C(?O)—O—), —S—, —S(?O)2—, —S(?O)2—O—, —NH—, —NR04— (wherein, R04 represents an alkyl group or an acyl group), and —NH—C(?O)—; and R3 represents a cyclic group containing a sulfonyl group within the ring skeleton).
    Type: Grant
    Filed: January 11, 2010
    Date of Patent: July 24, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takahiro Dazai, Daiju Shiono, Tomoyuki Hirano, Tasuku Matsumiya, Daichi Takaki, Takayoshi Mori, Junichi Tsuchiya
  • Publication number: 20120178021
    Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom, T1 represents a C4-C34 sultone ring group optionally having one or more substituents, Z1 represents a C1-C6 alkanediyl group optionally having one or more substituents, or a group represented by the formula (a-1): -A10?X10-A11?sX11-A12-??(a-1) wherein X10 and X11 each independently represents —O—, —NH—, —CO—, —CO—O—, —O—CO—, —CO—NH— or —NH—CO—, A10, A11 and A12 each independently represent a C1-C5 divalent aliphatic hydrocarbon group optionally having one or more substituents, and s represents 0 or 1, and Z2 represents a single bond or —CO—.
    Type: Application
    Filed: January 9, 2012
    Publication date: July 12, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Hyungjoo KIM, Akira KAMABUCHI, Koji ICHIKAWA
  • Publication number: 20120122034
    Abstract: The present invention provides a resin comprising a structural unit represented by the formula (aa): wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X2 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, when X2 is —O—, Z1 represents *—X1—, *—X3—CO—O—X1—, *—X3—CO—N(Rc)—X1—, *—X3—O—CO—X1— or *—X3—N(Rc)—CO—X1—, when X2 is —N(Rc)—, Z1 represents *—X1—, *—X1—O—X3—, *—X1—CO—, *—X1—X4—CO—X3—, *—X1—CO—X4—X3—, *—X1—X4—CO—X3—CO— or *—X1—CO—X4—X3—CO—, X1 and X3 independently each represent a C1-C6 divalent aliphatic hydrocarbon group, X4 represents —O— or —N(Rc)—, * represents a binding position to X2, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom.
    Type: Application
    Filed: November 7, 2011
    Publication date: May 17, 2012
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Koji ICHIKAWA, Masahiko SHIMADA, Takashi NISHIMURA, Akira KAMABUCHI, Hyungjoo KIM, Mitsuyoshi OCHIAI
  • Publication number: 20120035364
    Abstract: A tetrathiafulvalene derivative expressed by General Formula (I): General Formula (I) in General Formula (I), X represents an atom selected from a carbon atom, a sulfur atom, and a nitrogen atom, and Xs may be the same or different; provided that when X is the carbon atom or the nitrogen atom, R1 to R8 each represent one of a hydrogen atom, a halogen atom, a substituted or unsubstituted alkyl group, a substituted or unsubstituted alkoxy group, and a substituted or unsubstituted thioalkoxy group, and may be the same or different; and Y1 and Y2 each represent one of structures expressed by General Formulas (II) and (III), and may be the same or different: General Formula (II) General Formula (III).
    Type: Application
    Filed: March 17, 2010
    Publication date: February 9, 2012
    Inventors: Masato Shinoda, Satoshi Yamamoto, Toshiya Sagisaka, Takuji Kato, Takashi Okada, Daisuke Goto, Shinji Matsumoto, Masataka Mohri
  • Publication number: 20120015297
    Abstract: A compound represented by general formula (b1); an acid generator including the compound; and a resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1), wherein R1 represents a hydrogen atom, a linear, branched or cyclic alkyl group of 1 to 10 carbon atoms or a heterocyclic group of 1 to 10 carbon atoms; R2 represents a linear or branched alkyl group of 1 to 10 carbon atoms; x represents an integer of 0 to 6; n represents an integer of 0 to 3; and X? represents an anion.
    Type: Application
    Filed: July 7, 2011
    Publication date: January 19, 2012
    Applicant: TOKYO OHKA KOGYO.CO., LTD.
    Inventors: Yoshitaka KOMURO, Yoshiyuki Utsumi
  • Publication number: 20120009521
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Application
    Filed: September 15, 2011
    Publication date: January 12, 2012
    Applicant: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Publication number: 20110287362
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) including an acid generator (B1) represented by general formula (b1-1) shown below (in the formula, RX represents a divalent aliphatic group of 3 to 20 carbon atoms; RY represents a monovalent aliphatic group of 3 to 20 carbon atoms having —C(?O)—O— or —S(?O)2—; each of R1 and R2 independently represents a divalent linking group; and Z+ represents a monovalent organic cation).
    Type: Application
    Filed: May 12, 2011
    Publication date: November 24, 2011
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Kazushige Dohtani
  • Patent number: 8053576
    Abstract: Spirocyclic cyclohexane compounds corresponding to formula I a method for producing them, pharmaceutical compositions containing them, and methods of using them.
    Type: Grant
    Filed: February 17, 2009
    Date of Patent: November 8, 2011
    Assignee: Gruenenthal GmbH
    Inventors: Claudia Hinze, Otto Aulenbacher, Bernd Sundermann, Stefan Oberboersch, Elmar Friderichs, Werner Englberger, Babette-Yvonne Koegel, Klaus Linz, Hans Schick, Helmut Sonnenschein, Birgitta Henkel, Valerie Sarah Rose, Michael Jonathan Lipkin
  • Patent number: 8039532
    Abstract: A compound represented by formula (I-1): wherein R21, R22, R23 and R24 each independently represent a hydrogen atom or a monovalent substituent, with the proviso that compounds, in which R21, R22, R23 and R24 each are an alkylthio group, are excluded; R21 and R22 and/or R23 and R24 each may bond to each other to form a ring, with the proviso that compounds, in which the formed ring is a dithiol ring or a dithiolane ring, are excluded; R25 and R26 each independently represent a hydrogen atom or a monovalent substituent; X21, X22, X23 and X24 each independently represent a hetero atom; compounds, wherein R21, R22, R23 and R24 each represent a cyan group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group or a hydrogen atom, are excluded; and compounds, wherein R21 and R23 each represent a hydrogen atom; R22 and R24 each represent an arylcarbonyl group; X21, X22, X23 and X24 each represent a sulfur atom; and R25 and R26 each represent a hydroxyl group, are e
    Type: Grant
    Filed: August 15, 2008
    Date of Patent: October 18, 2011
    Assignee: Fujifilm Corporation
    Inventors: Naoyuki Hanaki, Masuji Motoki, Toshihiko Yawata
  • Publication number: 20110251379
    Abstract: As described herein, the present invention provides compounds useful for treating or lessening the severity of a neurodegenerative disorder. The present invention also provides methods of treating or lessening the severity of such disorders wherein said method comprises administering to a patient a compound of the present invention, or composition thereof. Said method is useful for treating or lessening the severity of, for example, Alzheimer's disease.
    Type: Application
    Filed: March 3, 2011
    Publication date: October 13, 2011
    Applicant: Satori Pharmaceuticals, Inc.
    Inventors: Brian Scott Bronk, Wesley Francis Austin, Steffen Phillip Creaser, Mark A. Findeis, Nathan Oliver Fuller, Jed Lee Hubbs, Jeffrey Lee Ives, Ruichao Shen
  • Publication number: 20110237804
    Abstract: A compound having a triptycene moiety represented by formula (1) is disclosed. In the formula, A1 and A2 represent —S—, —O—, —CO—, or —NR—; R1 and R3 represent a substituent; n is an integer from 0 to 2; R4 and R5 an electron-withdrawing group having a Hammett's substituent constant ?p of equal to or more than 0; L11, L12, L21 and L22 represent a single bond or a divalent group selected from the group consisting of —O—, —S—, —S(?O)2—, —CO—, —OCO—, —COO—, —OCOO— and —NRA— where RA represents a C1-7 alkyl group or hydrogen atom, —CH2— and any combinations thereof; Z1 and Z2 represent a divalent 5- or 6-membered cyclic linking group; R21 and R22 represent a hydrogen atom or substituted or non-substituted alkyl group; and m1 and m2 each respectively represent an integer of from 0 to 2.
    Type: Application
    Filed: March 28, 2011
    Publication date: September 29, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Satoshi TANAKA, Masaki OKAZAKI, Naoyuki NISHIKAWA
  • Patent number: 8022102
    Abstract: This invention concerns novel substituted unsaturated tetracyclic tetrahydrofuran derivatives with binding affinities towards serotonine receptors, in particular 5-HT2A and 5-HT2C receptors, and towards dopamine receptors, in particular dopamine D2 receptors and with norepinephrine reuptake inhibition properties, pharmaceutical compositions comprising the compounds according to the invention, the use thereof as a medicine, in particular for the prevention and/or treatment of a range of psychiatric and neurological disorders, in particular certain psychotic, cardiovascular and gastrokinetic disorders and processes for their production. The compounds according to the invention can be represented by general Formula (I) and comprises also the pharmaceutically acceptable acid or base addition salts thereof, the stereochemically isomeric forms thereof, the N-oxide form thereof and prodrugs thereof, wherein all substitutents are defined as in Claim 1.
    Type: Grant
    Filed: June 21, 2005
    Date of Patent: September 20, 2011
    Assignee: Janssen Pharmaceutica, NV
    Inventors: José Maria Cid-Núñez, Antonius Adrianus Hendrikus Petrus Megens, Andrés Avelino Trabanco-Suárez
  • Publication number: 20110213162
    Abstract: A condensation compound of a fluorinated cyclopentane ring and an aromatic ring, which is useful, for example, for electronic materials, and a process for producing the same are provided. For instance, according to Scheme 1 below, a compound (68) containing a condensed structure formed of a hexafluorocyclopentane ring and an aromatic ring is synthesized. The aromatic ring is not limited to a thiophene ring but can be any ring and any substituent can be used. Thus a compound containing a condensed ring structure formed of a hexafluorocyclopentane ring and an aromatic ring, particularly, for instance, a thiophene ring, which was impossible to produce conventionally, can be produced easily with high yield. The compound of the present invention is particularly suitable to be applied to, for example, electronic materials or semiconductors.
    Type: Application
    Filed: May 12, 2011
    Publication date: September 1, 2011
    Applicant: SUMITOMO CHEMICAL CO., LTD.
    Inventors: Yutaka IE, Yoshio ASO
  • Publication number: 20110117497
    Abstract: An acrylate derivative represented by the following general formula (1): (in the formula, R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group; each of R2, R3, R5, R7, R8, R9 and R10 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group; each of R4 and R6 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group or an alkoxy group, or R4 and R6 are bonded to each other to represent an alkylene group, —O— or —S—; n represents 0, 1 or 2; and W represents an alkylene group or a cycloalkylene group); an intermediate thereof; a method for producing the same; a polymer compound which is obtainable from polymerization of a raw material containing the foregoing acrylate derivative and which is excellent in solubility in an organic solvent used for the preparation of a photoresist composition; and a photoresist composition containing the polymer compound, an organic solvent and a photo acid generator and having excellent adhesion to s
    Type: Application
    Filed: June 30, 2009
    Publication date: May 19, 2011
    Applicant: Kuraray Co., Ltd.
    Inventors: Junko Sato, Osamu Nakayama, Takashi Fukumoto