Carbocyclic Ring Containing Patents (Class 549/560)
  • Patent number: 5998518
    Abstract: A description is given of compounds of the formula I ##STR1## where R.sup.1 is H, C.sub.1 -C.sub.12 alkyl, C.sub.2 -C.sub.12 alkenyl, C.sub.2 -C.sub.12 alkynyl, O--C.sub.1 -C.sub.12 alkyl, CO--C.sub.1 -C.sub.12 alkyl, in which radicals alkyl chains may also be interrupted by O, S, S.dbd.O, SO.sub.2 or N--C.sub.1 -C.sub.12 alkyl, or is C.sub.5 -C.sub.12 cycloalkyl which is unsubstituted or substituted by1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, O--C.sub.5 -C.sub.12 cycloalkyl, which is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, CO--C.sub.6 -C.sub.14 aryl, which is unsubstituted or substituted by 1 to 9 C.sub.1 -C.sub.4 alkyl and/orC.sub.1 -C.sub.4 alkoxy radicals, O-benzyl, which on the aromatic ring is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.1 -C.sub.4 alkoxy radicals, CO-benzyl, which on the aromatic ring is unsubstituted or substituted by 1 to 4 C.sub.1 -C.sub.4 alkyl and/or C.sub.
    Type: Grant
    Filed: October 15, 1997
    Date of Patent: December 7, 1999
    Assignee: Ciba Specialty Chemcials Corporation
    Inventor: Alfred Steinmann
  • Patent number: 5965753
    Abstract: A process for preparation of a glycidyl sulfonate derivative with high purity and in high yield, which is characterized in reacting glycidol which is prepared from treating 3-chloro-1,2-propanediol in an aqueous solvent in the basic condition, without isolating the resulting glycidol with a sulfonyl halide in a two phase solvent consisting of an organic solvent and water in the presence of an inorganic base and a tertiary amine or a pyridine derivative.
    Type: Grant
    Filed: July 20, 1998
    Date of Patent: October 12, 1999
    Assignee: Daiso Co., LTd.
    Inventors: Midori Masaki, Yoshiro Furukawa, Keishi Takenaka
  • Patent number: 5955551
    Abstract: The present invention relates to polyglycidyl ether compounds containing at least three mono- or divalent radicals A of the general formula wherein R.sub.
    Type: Grant
    Filed: August 6, 1997
    Date of Patent: September 21, 1999
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Chi-Wen Frank Cheng, Mark Bryant
  • Patent number: 5948923
    Abstract: A number of new phenolepoxy resins are prepared by reacting polyphenol, epihalohydrin and imidazole in a homogeneous reaction medium.
    Type: Grant
    Filed: October 30, 1998
    Date of Patent: September 7, 1999
    Assignee: Industrial Technology Research Institute
    Inventors: Kung-Lung Cheng, Woan-Shiow Tzeng, Shu-Chen Lin
  • Patent number: 5939473
    Abstract: The stilbene epoxy resin having two different aryl groups and an epoxy resin mixture including this stilbene epoxy resin have lower melting points than those of the stilbene epoxy resin having two identical aryl groups and the epoxy resin mixture of the latter stilbene epoxy resin. Compared with the conventional resins, the present resin or resin mixture has improved working and molding properties, which shortens the time required for the molding and working process, resulting in economic advantages and a preferred affect on productivity. The present epoxy resin or resin mixture is preferably used as an adhesive, a coating, an insulating material, an electrical or electronic material for laminated sheets or the like. It is especially suited for use as material for encapsulating electronic parts.
    Type: Grant
    Filed: April 29, 1996
    Date of Patent: August 17, 1999
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yasuhiro Hirano, Masatsugu Akiba, Akira Yokota, Hiroshi Nakamura, Shigeki Naitoh
  • Patent number: 5908943
    Abstract: Epoxy-containing compounds which are essentially free of organic halides are prepared by (I) reacting an allyl derivative of an active hydrogen-containing compound with (II) a peroxygen-containing compound. The epoxy-containing compounds are useful in coatings, castings, laminates etc.
    Type: Grant
    Filed: October 8, 1996
    Date of Patent: June 1, 1999
    Assignee: The Dow Chemical Company
    Inventors: Andrew T. Au, J. Lowell Nafziger
  • Patent number: 5854370
    Abstract: The invention provides a cis-stilbene type epoxy resin having lower melting point and lower viscosity than the trans-stilbene type epoxy resin hitherto known. The stilbene type epoxy resin has a cis-isomer content of essentially 100%, or in the alternative, at least about 10% with the rest being the trans-isomer, and is based on the following general formula (1): ##STR1## wherein R.sub.1 to R.sub.8 are independently an acyclic or cyclic alkyl group, a hydrogen atom, or a halogen atom. Production processes for these epoxy resins are also disclosed.
    Type: Grant
    Filed: May 27, 1997
    Date of Patent: December 29, 1998
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Akira Yokota, Yasuhiro Hirano, Masatsugu Akiba, Hiroshi Nakamura, Shigeki Naitoh
  • Patent number: 5840824
    Abstract: An object is to provide hardened products having excellent water resistance and mechanical strength, and an epoxy resin and an epoxy resin composition for use in the production thereof. An epoxy resin obtained by the glycidylation of a novolak type resin which is prepared by the condensation of biphenyls with phenols and naphthols, and a resin composition containing said epoxy resin and hardened products thereof.
    Type: Grant
    Filed: December 26, 1996
    Date of Patent: November 24, 1998
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Yasumasa Akatsuka, Kenichi Kuboki, Yoshio Shimamura, Ryoichi Hasegawa
  • Patent number: 5811504
    Abstract: Monomers of formula (I) ##STR1## where ##STR2## is a mesogen, ##STR3## is a spacer, and --X is a group having an epoxy function exhibit a reduced tendency to undergo self-condensation via addition polymerization and afford liquid crystalline polymers upon condensation with a crosslinking agent.
    Type: Grant
    Filed: August 3, 1995
    Date of Patent: September 22, 1998
    Assignee: Cornell Research Foundation, Inc.
    Inventors: Atsushi Shiota, Christopher K. Ober
  • Patent number: 5736620
    Abstract: Epoxy resins containing rodlike mesogenic moieties are prepared from phenolic hydroxyl containing compounds which contain such moieties.
    Type: Grant
    Filed: May 25, 1995
    Date of Patent: April 7, 1998
    Assignee: The Dow Chemical Company
    Inventors: Jimmy D. Earls, Robert E. Hefner, Jr., Paul M. Puckett
  • Patent number: 5717054
    Abstract: This invention relates to flexible epoxy resins that have a structural composition comprising an oligomeric backbone of alkylene or alkyleneoxy repeat units, terminated with an aromatic moiety bearing one or more epoxy functionalities.
    Type: Grant
    Filed: May 31, 1996
    Date of Patent: February 10, 1998
    Assignee: National Starch & Chemical Investment Holding Corp.
    Inventor: Rose Ann Schultz
  • Patent number: 5709715
    Abstract: The silicon or silica substrates described have a modified surface of a new type occupied by the alcohol fraction of an orthoester. The alcohol fraction may be saturated or unsaturated. The surface of the substrate is modified by being treated with an orthoester, the water being eliminated from the surface by hydrolysis and then replaced by the resulting alcohol or silylether. Besides many other compounds, new orthoesters having the formula R.sup.1 C?OCH.sub.2 --CH.sub.2 --O--CO--CH.dbd.CH.sub.2 !.sub.3, in which R.sup.1 stands for hydrogen or for a clearable organic residue, R stands for (CH.sub.2).sub.n, in which n stands for an integer between 1 and 18, and new orthoesters having the formula (I), are particularly appropriate. In the formula (I), R.sup.1 stands for hydrogen or an organic residue, R.sup.3 stands for hydrogen or an alkyl group with 1 to 6 carbon atoms; and R.sup.4 stands for hydrogen, an alkyl group or an alkyl group or a phenyl group.
    Type: Grant
    Filed: May 19, 1994
    Date of Patent: January 20, 1998
    Assignee: Owens-Corning Fiberglas Technology Inc.
    Inventors: Bruno Guidotti, Walter Caseri, Ulrich Suter, Wolfgang Saur
  • Patent number: 5707545
    Abstract: Novel oxiranylmethyl ethers can advantageously be employed in liquid-crystal mixtures since they have high spontaneous-polarization values and features in their molecular structure which make them miscible with other components of liquid-crystal systems.
    Type: Grant
    Filed: June 24, 1994
    Date of Patent: January 13, 1998
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Hubert Schlosser, Rainer Wingen, Anke Kaltbeitzel, Javier Manero
  • Patent number: 5705596
    Abstract: The invention provides a cis-stilbene type epoxy resin having lower melting point and lower viscosity than the trans-stilbene type epoxy resin hitherto known. The stilbene type epoxy resin has a cis-isomer content of essentially 100%, or in the alternative, at least about 10% with the rest being the trans-isomer, and is based on the following general formula (1): ##STR1## wherein R.sub.1 to R.sub.8 are independently an acyclic or cyclic alkyl group, a hydrogen atom, or a halogen atom. Production processes for these epoxy resins are also disclosed.
    Type: Grant
    Filed: June 3, 1996
    Date of Patent: January 6, 1998
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Akira Yokota, Yasuhiro Hirano, Masatsugu Akiba, Hiroshi Nakamura, Shigeki Naitoh
  • Patent number: 5668227
    Abstract: Novel cyclohexyl-group-containing glycidyl ethers of formulae I to IV according to claim 1, which are distinguished especially by a low chlorine content and a low viscosity and which can be used, for example, in epoxy resin formulations as reactive diluents, flexibilisers or adhesion enhancers, or can also be polymerised per se and used as coatings or casting resins, the products having only slight water absorption and having good external weather resistance.
    Type: Grant
    Filed: March 11, 1996
    Date of Patent: September 16, 1997
    Assignee: Ciba-Geigy Corporation
    Inventors: Heinz Wolleb, Andreas Kramer
  • Patent number: 5654382
    Abstract: An epoxy resin prepared from a component comprising a bisphenol F having high ortho isomer content is claimed. Ortho isomer content is defined as follows:(A+2B)/2A: content of ortho-para isomer of a bisphenol FO: content of ortho-ortho isomer of a bisphenol FThe epoxy resin of the present invention has lower viscosity (e.g. melt viscosity, solution viscosity) and good physical properties (e.g. flexibility), and suitable for various applications such as coating materials, electrical laminates, adhesives, molding products, encapsulation materials, etc.
    Type: Grant
    Filed: June 30, 1995
    Date of Patent: August 5, 1997
    Assignee: The Dow Chemical Company
    Inventors: Robert A. Dubois, Hideyuki Ohnishi, Allyson J. Malzman
  • Patent number: 5614646
    Abstract: A process for the selective hydrogenation of aromatic groups of organic molecules carrying at least one aromatic group and one epoxy group with hydrogen in the presence of a ruthenium-containing catalyst, in which the hydrogenation is carried out in the presence of from 0.2 to 10 wt % of water, based on the reaction mixture.
    Type: Grant
    Filed: November 17, 1995
    Date of Patent: March 25, 1997
    Assignee: BASF Aktiengesellschaft
    Inventors: Thomas Wettling, Ludwig Schuster, Jochem Henkelmann
  • Patent number: 5571939
    Abstract: The method is directed to the preparation of dodecohydro-3a,6,6,9a-tetramethyl-naphtho[2,1-b]furan from sclareol using an alkoxy-radical fragmentation reaction. A novel 9-haloethyl decalin derivative is an intermediate in this method.
    Type: Grant
    Filed: July 17, 1995
    Date of Patent: November 5, 1996
    Assignee: BASF Corporation
    Inventor: Philip A. Christenson
  • Patent number: 5530147
    Abstract: A process for the selective hydrogenation of aromatic groups of organic molecules carrying at least one aromatic group and one epoxy group with hydrogen in the presence of a ruthenium-containing catalyst, in which a homogeneous ruthenium catalyst is used which can be prepared by reducing the ruthenium compound with a metal having a redox potential of from -0.75 to 2.5 V, a boron hydride, an aluminum hydride, an aluminum alkyl compound, a lithium alkyl compound, or a lithium aryl compound in the presence of an ether.
    Type: Grant
    Filed: April 17, 1995
    Date of Patent: June 25, 1996
    Assignee: BASF Aktiengesellschaft
    Inventors: Thomas Wettling, Ludwig Schuster, Jochem Henkelmann
  • Patent number: 5494950
    Abstract: An epoxy resin composition comprising an epoxy resin component containing at least 5% by weight of an epoxy resin of Formula [I], an epoxy hardener, and an inorganic filler as essential constituents: ##STR1## [wherein R and R.sup.1 denote alkyl of C.sub.2 to C.sub.6, and n is an integer repetition unit from 0 to 10.]. The epoxy resin composition, when used as a molding material, is low in water absorption rate and flexural modulus (low stress).
    Type: Grant
    Filed: April 6, 1994
    Date of Patent: February 27, 1996
    Assignee: Totokasei Co., Ltd.
    Inventors: Hideyasu Asakage, Michio Aritomi, Xiao Li Wu
  • Patent number: 5463091
    Abstract: The diglycidyl ether of 4,4'-dihydroxy-.alpha.-methylstilbene is prepared.
    Type: Grant
    Filed: June 2, 1994
    Date of Patent: October 31, 1995
    Assignee: The Dow Chemical Company
    Inventors: Jimmy D. Earls, Robert E. Hefner, Jr., Paul M. Puckett
  • Patent number: 5439989
    Abstract: Macrocyclic epoxy resins comprising at least one compound of the formula (I) ##STR1## wherein n is an integer from 3 to 10.R.sup.1 and R.sup.3 are either the same or different and are selected from hydrogen, hydroxyl, alkoxy, allyloxy and epoxypropyloxy (glycidyloxy);R.sup.2 is selected from hydrogen, arylakalkyl optionally substituted with halogen, alkyl optionally substituted with halogen, and aryl optionally substituted with halogen;R.sup.4 is selected from hydrogen, alkyl optionally substituted with halogen, arylalkyl optionally substituted with alkyl or halogen, and aryl optionally substituted with halogen;R.sup.5 is selected from hydrogen, aryl and alkyl; with the proviso that the resin contains on average at least one epoxy group per molecule.
    Type: Grant
    Filed: May 3, 1993
    Date of Patent: August 8, 1995
    Assignee: Commonwealth Scientific & Industrial Research Organisation
    Inventors: Trevor C. Morton, Jonathan H. Hodgkin, Buu N. Dao
  • Patent number: 5360576
    Abstract: Compounds of the formula (I) in which the symbols have the following meanings: R.sup.1 is straight-chain or branched (C.sub.3 -C.sub.2)alkenyl containing a terminal double bond, it being possible for one or two non-adjacent CH.sub.2 groups to be replaced by O and/or S atoms, A and B, independently of one another, are phenyl, diazine-2,5-diyl or diazine-3,6-diyl, with the proviso that one of the groups A or B is phenyl and the other is diazine, X is O or S, R.sup.2, R.sup.3 and R.sup.4, independently of one another, are H, straight-chain (C.sub.1 -C.sub.10)alkyl or branched (C.sub.3 -C.sub.10 )alkyl, R.sup.2, R.sup.3 and R.sup.4 not simultaneously being H, have the property of increasing the phase width in CC mixtures or depressing the melting point.
    Type: Grant
    Filed: January 21, 1993
    Date of Patent: November 1, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Karsten Blatter, Claus Escher, Takamasa Harada, Peter Harnischfeger, Wolfgang Hemmerling
  • Patent number: 5352832
    Abstract: The present invention comprises a process for the asymmetric synthesis of florfenicol, thiamphenicol or chloramphenicol, from a derivative of trans-cinnamic acid, comprising the steps:(a) converting the acid to an acid chloride using a chlorinating agent, and reducing the acid chloride to a trans allylic alcohol with a reducing agent;(b) asymmetrically epoxidizing the allylic alcohol of step (a), by reacting with t-butylhydroperoxide in the presence of a chiral epoxidation catalyst prepared from titanium (IV) isopropoxide and L-diisopropyltartaric acid, to form a chiral epoxide;(c) regioselectively opening the epoxide of step (b) by sequentially treating with sodium hydride, zinc chloride and dichloroacetonitrile to form an oxazoline;(d) stereoselective inversion/isomerization of the oxazoline of step (c) by sequentially treating with: (i) a lower alkylsulfonyl chloride and a tertiary amine base; (ii) sulfuric acid and water; (iii) an alkali metal hydroxide; to form an oxazoline;(e) optionally treating the ox
    Type: Grant
    Filed: December 18, 1992
    Date of Patent: October 4, 1994
    Assignee: Schering Corporation
    Inventors: Guang-Zhong Wu, Wanda I. Tormos
  • Patent number: 5340788
    Abstract: Storing stabilizers for color image of heat sensitive recording materials, which are higher safe diphenylsulfone derivatives represented by general formula (I), and the heat sensitive recording materials using them. ##STR1## (Wherein, R.sup.1 is aralkyl or lower alkenyl which may be substituted with halogen or lower alkyl and R.sup.2 is hydrogen or methyl, but when R.sup.1 is unsubstituted benzyl, R.sub.2 is methyl).
    Type: Grant
    Filed: March 19, 1992
    Date of Patent: August 23, 1994
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Takafumi Tohyama, Takehiro Sato, Kousaku Morita, Masaaki Uchikawa, Nobuyuki Hirai
  • Patent number: 5336436
    Abstract: Optically active oxirane derivatives containing a mesogenic molecular unit are suitable as dopes in liquid-crystal mixtures. They give liquid-crystalline ferroelectric phases having short response times and electroclinic phases having large electroclinic coefficients. A further advantage is that they induce a helix of very small pitch, so that they are also suitable for helix compensation in LC mixtures.
    Type: Grant
    Filed: June 22, 1992
    Date of Patent: August 9, 1994
    Assignee: Hoechst Aktiengesellschaft
    Inventors: Gunter Scherowsky, Kirsten Gruneberg
  • Patent number: 5324450
    Abstract: An optically active glycidyl ether, which is useful in making .gamma.-lactone containing liquid crystalline compounds, the ether having the following formula: ##STR1## wherein R.sup.1 is a group selected from the group consisting of ##STR2## n is 0 or 1; e is 1; R.sup.3 is an alkyl group having 1 to 15 carbon atoms; and the symbol * is an asymmetric carbon atom.
    Type: Grant
    Filed: May 24, 1993
    Date of Patent: June 28, 1994
    Assignee: Daiso Co., Ltd.
    Inventors: Kazuhiko Sakaguchi, Naoya Kasai, Yoshikazu Takehira, Tohru Kitamura, Yutaka Shiomi
  • Patent number: 5310956
    Abstract: The present invention is optically active epoxides and its production characterized in that the process comprises reacting alkenyl ethylene glycols with 0.5 to 2.0 equivalents of a titanium-tetraalkoxyde, a peroxide and an L-(+)- or D-(-)-dialkyl tartrate at a temperature of -78.degree. to 50.degree. C. to asymmetrically oxidize the alkenyl ethylene glycols. The production of the present invention is an excellent method for producing chiral epoxides in which steric configuration of three asymmetric points can be perfectly controlled, the reaction is performed by mild conditions and the chemical yield and the optical yield are extremely high. The optically active epoxides which can be efficiently produced by the production of the present invention are useful as stating materials of several kinds of compounds.
    Type: Grant
    Filed: May 19, 1993
    Date of Patent: May 10, 1994
    Assignee: Chisso Corporation
    Inventors: Seiichi Takano, Kunio Ogasawara
  • Patent number: 5304662
    Abstract: A compound having the formula (I): ##STR1## in which n is an integer ranging from 2 to 6; X is the residue of an optionally substituted primary or secondary aliphatic or cycloaliphatic polyol of formula II:X(OH).sub.n IIin which X and n have their previous significance; and Z is a group of formula:--CH.sub.2 --CH(CH.sub.2 OY)--in which Y is the residue of an optionally substituted primary or secondary aliphatic or cycloaliphatic monohydric alcohol, or Z is a group of formula: ##STR2## in which W is an optionally substituted aliphatic carbon chain, which may contain one or more heteroatoms, or Z is a group of formula--CH.sub.2 --CH(T)--in which T is an aliphatic or cycloaliphatic alkyl group.
    Type: Grant
    Filed: January 6, 1993
    Date of Patent: April 19, 1994
    Assignee: Ciba-Geigy Corporation
    Inventors: Michael R. Thoseby, Bryan Dobinson
  • Patent number: 5302672
    Abstract: A 1,1-bis(2,7-diglycidyloxy-1-naphthyl)alkane as an epoxy resin; a 1,1-bis(2,7-dihydroxy-1-naphthyl)alkane as an intermediate for said epoxy resin; a process for producing said intermediate comprising reacting 2,7-dihydroxy-1-naphthalene and an aldehyde; a process for producing said epoxy resin comprising reacting said intermediate and an epihalohydrin; and an epoxy resin composition comprising said epoxy resin and a curing agent. The epoxy resin has a low melt viscosity while exhibiting excellent heat resistance.
    Type: Grant
    Filed: February 26, 1992
    Date of Patent: April 12, 1994
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Ichiro Ogura, Shunji Ehara, Taku Kitamura, Hiroshi Sakata
  • Patent number: 5254704
    Abstract: The present invention is optically active epoxides and its production characterized in that the process comprises reacting alkenyl ethylene glycols with 0.5 to 2.0 equivalents of a titanium-tetraalkoxyde, a peroxide and an L-(+)- or D-(-)-dialkyl tartrate at a temperature of -78.degree. to 50.degree. C. to asymmetrically oxidize the alkenyl ethylene glycols. The production of the present invention is an excellent method for producing chiral epoxides in which steric configuration of three asymmetric points can be perfectly controlled, the reaction is performed by mild conditions and the chemical yield and the optical yield are extremely high. The optically active epoxides which can be efficiently produced by the production of the present invention are useful as stating materials of several kinds of compounds.
    Type: Grant
    Filed: May 20, 1992
    Date of Patent: October 19, 1993
    Assignee: Chisso Corporation
    Inventors: Seiichi Takano, Kunio Ogasawara
  • Patent number: 5242996
    Abstract: A modified epoxy resin or compound of the formula: ##STR1## wherein A is the backbone reside of a glycidyl ether epoxy resin with removal of the glycidyloxy groups; R.sup.1 and R.sup.2 are independently a hydrogen atom or C.sub.1 -C.sub.12 alkyl; R.sup.3 is a glycidyl group; and n is an integer of greater than 1. A method for producing the modified epoxy resin is also disclosed.
    Type: Grant
    Filed: May 22, 1991
    Date of Patent: September 7, 1993
    Assignee: Nippon Paint Co., Ltd.
    Inventors: Mitsuo Yamada, Kei Aoki, Ryuzo Mizuguchi
  • Patent number: 5223602
    Abstract: This invention relates to naphthol aralkyl resins of the general formula (I) ##STR1## in which A is a naphthalene nucleus, R is hydrogen or methyl, and n is an integer from 0 to 15 and cured products thereof, which are highly heat- and moisture-resistant, possess excellent impact strength and other mechanical properties, and are useful for such applications as lamination, molding, casting, and adhesion.
    Type: Grant
    Filed: January 24, 1992
    Date of Patent: June 29, 1993
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masashi Kaji, Takanori Aramaki, Norito Nakahara, Yasuharu Yamada
  • Patent number: 5220042
    Abstract: 1,4-Benzoquinone derivatives and benzene derivatives having cerebral- and cardiac-blood flow improving activities and preventive activities of cerebral ischema with low toxicities, and thus are useful as activators for cardiac and cebral metabolisms, curing agents for heart failure, cardiac and cerebral blood flow improving agents, as well as anti-allergic agents for slow reacting allergy (IV-type allergy).
    Type: Grant
    Filed: November 21, 1989
    Date of Patent: June 15, 1993
    Assignee: Otsuka Pharmaceutical Co., Ltd.
    Inventors: Hideyuki Iwaki, Yoshiyasu Fukuyama, Kuniaki Matsui
  • Patent number: 5218074
    Abstract: The invention provides epoxy resins having the following structure: ##STR1## The cross-linked epoxy resins have non-linear optical properties. The group "Z" constitutes a nonlinear optical chromophone having stilbene, azo, azomethine or propargyl moieties as linking units.
    Type: Grant
    Filed: September 17, 1991
    Date of Patent: June 8, 1993
    Assignees: Siemens Aktiengesellschaft, Siemens Aktiengesellschaft
    Inventors: Jens Nordmann, Heinz Hacker
  • Patent number: 5218060
    Abstract: An epoxide resin having the formula I: ##STR1## in which R.sup.1 to R.sup.4 are the same or different and each is hydrogen or C.sub.1 -C.sub.12 alkyl; R.sup.5 to R.sup.12 are the same or different and each is C.sub.1 -C.sub.12 alkyl or alkenyl or the glycidyl residue such that at least two R.sup.5 to R.sup.12 groups are glycidyl residues; and R.sup.13 to R.sup.20 are the same or different and are hydrogen, halogen C.sub.1 -C.sub.12 alkyl or alkenyl.
    Type: Grant
    Filed: February 7, 1992
    Date of Patent: June 8, 1993
    Assignee: Ciba-Geigy Corporation
    Inventors: William M. Rolfe, Michael R. Thoseby
  • Patent number: 5216180
    Abstract: A herbicidal hydroxyethyl-cyclopropyl-azolyl derivative of the formula ##STR1## in which R.sup.1 represents halogen, phenyl or the grouping --Z-R.sup.3, whereinZ represents oxygen, sulphur, SO or SO.sub.2 andR.sup.3 represents alkyl, phenyl or benzyl,R.sup.2 represents alkenyl, optionally substituted furyl, optionally substituted thienyl or the radical of the formula ##STR2## wherein R.sup.4 represents difluoromethoxy, 1,1,2,2-tetrafluoroethoxy, 1,1,2-trifluoro-2-chloro-ethoxy, cyano, formyl, alkoximinoalkyl, carbalkoxy, dialkoxyalkyl, phenoxyalkyl which is optionally substituted in the phenyl moiety by halogen, or benzyloxy which is optionally substituted in the phenyl moiety by halogen andR.sup.5 represents hydrogen or halogen, orR.sup.4 and R.sup.5 are linked in the ortho-position and together represent --O--CH.sub.2 --O--, orR.sup.2 represents the radical of the formula ##STR3## in which R.sup.6 represents difluoromethoxy, 1,1,2,2-tetrafluoroethoxy or 1,1,2-trifluoro-2-chloro-ethoxy, orR.sup.
    Type: Grant
    Filed: November 1, 1991
    Date of Patent: June 1, 1993
    Assignee: Bayer Aktiengesellschaft
    Inventors: Jurgen Scherkenbeck, Monika Frie, Klaus Stroech, Thomas Himmler, Georg-W. Ludwig, Wilhelm Brandes, Stefan Dutzmann
  • Patent number: 5171869
    Abstract: A naphthalene of the following formula (1) having at least two allyl or propenyl groups ##STR1## wherein each G represents a hydrogen atoms or ##STR2## R.sup.1 's independently represent a hydrogen atom or an unsubstituted or substituted monovalent hydrocarbon group having from 1 to 6 carbon atoms, R.sup.2 's independently represent a hydrogen atom, an allyl group or a propenyl group, R.sup.3 represents an allyl group or a propenyl group, X represents a hydrogen atom or a halogen atom, and n is an integer of from 0 to 6. The derivative is useful for modifying curable resins or resin compositions to provide cured products which have a low water absorption, high strength and a high glass transition temperature. The derivative has good working properties and a good heat resistance.
    Type: Grant
    Filed: January 24, 1992
    Date of Patent: December 15, 1992
    Assignee: Shin-Etsu Chemical Company Limited
    Inventors: Toshio Shiobara, Kazutoshi Tomiyoshi, Hisashi Shimizu, Manabu Narumi
  • Patent number: 5162547
    Abstract: An improved process for the preparation of glycidyl ethers of formula I ##STR1## wherein Q is an aliphatic, cycloaliphatic or araliphatic radical of a valency m, R is --H or --CH.sub.3, and m is an integer from 1 to 10,by reacting an alcohol of formula Q--(OH).sub.m with m mol of an epihalohydrin of formula II ##STR2## in the presence of a catalyst to the corresponding halohydrin ether, and dehydrohalogenating said halohydrin ether with an alkali metal hydroxide to give a compound of formula I, wherein Q, m and R are as defined above and Hal is halogen,which process comprises using as catalysta) tin difluoride orb) a divalent tin halide in conjunction with a co-catalyst.
    Type: Grant
    Filed: December 9, 1991
    Date of Patent: November 10, 1992
    Assignee: Ciba-Geigy Corporation
    Inventors: Martin Roth, Heinz Wolleb, Marc-Andre Truffer
  • Patent number: 5155202
    Abstract: A phenolic novolak resin comprising a compound represented by the general formula [I]: ##STR1## wherein X is H or ##STR2## R is an alkyl group having 1 to 4 carbon atoms, and n is 1 to 10, particularly a phenolic novolak epoxy resin, and material, and a cured substance therefrom, and a process for producing the resin are disclosed. This resin is excellent in heat resistance and in reluctance to absorb water as compared with conventional phenolic resins, and useful in sealing electronic parts, molding, and laminating.
    Type: Grant
    Filed: February 6, 1991
    Date of Patent: October 13, 1992
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Hiromi Morita, Kazuyuki Murata, Ichiro Kimura, Susumu Nagao
  • Patent number: 5122586
    Abstract: Disclosed are a composition comprising polyether compounds, obtained by addition copolymerization of a mixture of 4-vinylcyclohexene-1-oxide and a compound having at least two epoxy groups with a compound having at least one active hydrogen atom, and a composition comprising epoxy compounds obtained by epoxidation of the composition of the polyether compounds. The invention also relates to processes for production thereof.The disclosed composition comprising epoxy compounds has a higher softening temperature compared that produced by polymerization of only 4-vinylcyclohexene-1-oxide with a compound having at least one active hydrogen atom.
    Type: Grant
    Filed: March 3, 1989
    Date of Patent: June 16, 1992
    Assignee: Daicel Chemical Industries, Ltd.
    Inventors: Katsuhisa Sakai, Hiroyuki Oshima
  • Patent number: 5097047
    Abstract: Fungicidal and plant growth-regulating azolylmethylcyclopropyl derivatives of the formula ##STR1## in which R represents halogen, alkyl or optionally substituted phenyl, or represents the groupings --Y--R.sup.2,whereinY represents oxygen, sulphur, SO or SO.sub.2 andR.sup.2 represents optionally substituted phenyl,R.sup.1 represents hydrogen, alkyl or acyl,X represents nitrogen or a CH group,Z represents halogen, alkyl with 1 to 4 carbon atoms, alkoxy with 1 to 4 carbon atoms, alkylthio with 1 to 4 carbon atoms, halogenoalkyl with 1 or 2 carbon atoms and 1 to 5 halogen atoms, halogenoalkoxy with 1 or 2 carbon atoms and 1 to 5 halogen atoms, halogenoalkylthio with 1 or 2 carbon atoms and 1 to 5 halogen atoms or phenyl which is optionally substituted by alkyl with 1 or 2 carbon atoms and/or halogen, or represents phenoxy which is optionally substituted by alkyl with 1 or 2 carbon atoms and/or halogen andm represents the number 0, 1, 2 or 3, and addition products thereof with acids and metal salts.
    Type: Grant
    Filed: October 26, 1990
    Date of Patent: March 17, 1992
    Assignee: Bayer Aktiengesellschaft
    Inventors: Klaus Stroech, Wilhelm Brandes, Stefan Dutzmann
  • Patent number: 5089587
    Abstract: An epoxy resin having the formula: ##STR1## wherein R is a hydrogen atom or a methyl group, and n is an integer of from 0 to 15, and wherein the resin has an epoxy equivalent in the range of 320-345 g/eq.
    Type: Grant
    Filed: December 27, 1989
    Date of Patent: February 18, 1992
    Assignee: Sanyo-Kokusaku Pulp Co., Ltd.
    Inventors: Hiroaki Namba, Minoru Hishinuma
  • Patent number: 5068293
    Abstract: The invention relates to naphthol-based epoxy resins of the general formula (I) ##STR1## in which A is a naphthalene nucleus, R is hydrogen or methyl, and n is an integer from 0 to 15, naphthol aralkyl resins which are intermediates for said epoxy resins, a process for the preparation of said naphthol aralkyl resins, and epoxy resin compositions containing said naphthol-based epoxy resins which are highly heat- and moisture-resistant, possess excellent impact strength and other mechanical properties, and are useful for such applications as lamination, molding, casting, and adhesion.
    Type: Grant
    Filed: August 30, 1990
    Date of Patent: November 26, 1991
    Assignee: Nippon Steel Chemical Co., Ltd.
    Inventors: Masashi Kaji, Takanori Aramaki, Norito Nakahara, Yasuharu Yamada
  • Patent number: 5061814
    Abstract: Chiral nonracemic molecules which are useful in the preparation of high polarization density FLC compositions and which have the following structure are provided: ##STR1## wherein Ph is a 1,4 substituted phenyl group, m=2 and n=1 or m=1 and n=2, asymmetric carbons are indicated by *. R is an alkyl group having three to fifteen carbon atoms, and R' is an alkyl group having one to seven carbons. The invention in particular provides compounds having the R,R or S,S configuration in the epoxide tail. The epoxy phenylbenzoates of this invention display a property of inducing a tilt angle greater than expected in FLC compositions in which they are combined.
    Type: Grant
    Filed: June 1, 1989
    Date of Patent: October 29, 1991
    Assignee: Displaytech, Inc.
    Inventors: Michael D. Wand, Rohini T. Vohra, David M. Walba
  • Patent number: 4990633
    Abstract: New fluorinated bisaryloxy-substituted alkenes are prepared by reaction of substituted phenols with perhaloalkenes and can be used as electrical insulating agents.
    Type: Grant
    Filed: May 4, 1989
    Date of Patent: February 5, 1991
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Negele, Dietmar Beilefeldt, Thomas Himmler, Albrecht Marhold
  • Patent number: 4960840
    Abstract: Polyglycidyl ethers which are obtainable by reacting acetophenone with 0.7 to 1.4 mol of formaldehyde per mol of acetophenone, in the presence of an alkaline catalyst and in the temperature range from 50.degree. to 100.degree. C., to a carbonylated acetophenone/formaldehyde resin, hydrogenating said carbonylated resin to a modified hydroxylated acetophenone/formaldehyde resin, subsequently converting said resin with epichlorohydrin, in the presence of a phase transfer catalyst, into the corresponding polychlorohydrin ether, and dehydrochlorinating said ether with a base, are suitable for use as epoxy resins, for example for the preparation of powder coating compositions having good resistance to chemicals and good adhesion.
    Type: Grant
    Filed: August 18, 1989
    Date of Patent: October 2, 1990
    Assignee: Ciba-Geigy Corporation
    Inventors: Jacques-Alain Cotting, Alfred Renner
  • Patent number: 4954600
    Abstract: A ferroelectric liquid-crystalline polymer consisting essentially of at least one repeating unit represented by the following general formula: ##STR1## wherein k is an integer having a value of 2 to 30;R.sup.1 is ##STR2## X is --COO-- or --OCO--; and R.sup.2 is --COOR.sup.3, --OCOR.sup.3 or --OR.sup.3 ;wherein R.sup.3 is ##STR3## wherein each of R.sup.4 and R.sup.5 is independently --CH.sub.3, a halogen atom or --CN;each of m and n is independently an integer having a value of 0 to 10, with the proviso that when R.sup.4 is --CH.sub.3, n is not an integer having a value of 0;p is an integer having a value of 0 or 1; andC marked with * is an asymmetric carbon atom.
    Type: Grant
    Filed: June 16, 1989
    Date of Patent: September 4, 1990
    Assignee: Idemitsu Kosan Co., Ltd.
    Inventor: Satoshi Hachiya
  • Patent number: 4954603
    Abstract: Disclosed is a heat-resistant flame-retardant epoxy resin composition comprising a halogen-containing epoxy resin obtained by reacting a trifunctional epoxy compound having a specific structure with a halogenated bisphenol in the presence of a catalyst. Furthermore, a novel specific trifunctional epoxy compound is disclosed, which is valuably used for the production of the above-mentioned halogen-containing epoxy resin.
    Type: Grant
    Filed: June 6, 1989
    Date of Patent: September 4, 1990
    Assignee: Mitsui Petrochemical Industries, Ltd.
    Inventors: Toshimasa Takata, Kenichi Mizuno
  • Patent number: 4940809
    Abstract: Certain bis-anthrols and bis-naphthols and their diglycidyl ethers are novel and useful in the preparation of new polyether thermoplastic compositions.
    Type: Grant
    Filed: February 6, 1989
    Date of Patent: July 10, 1990
    Assignee: Shell Oil Company
    Inventors: Kenneth C. Dewhirst, Thomas G. Stewart, Jr.