Plural Silicons Bonded Directly To The Same Carbon Or Attached By A Chain Consisting Of Carbons, Which Carbons May Be Part Of A Ring Patents (Class 556/431)
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Patent number: 7067687Abstract: Mesostructured and microporous to mesoporous organofunctionalized silica compositions are described. The compositions incorporate the organofunctional group L as part of a LSiO3 unit in the framework of the compositions. In addition the compositions incorporate the organofunctional group R as part of a O3Si—R—siO3 unit in the framework of the compositions. The compositions are useful as molecular sieves, supports for catalysts and numerous other applications requiring an organo group on surfaces of a silica.Type: GrantFiled: March 8, 2004Date of Patent: June 27, 2006Assignee: Board of Trustees of Michigan State UniversityInventors: Thomas J. Pinnavaia, Yutaka Mori
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Patent number: 6872795Abstract: Heat-stable poly(ethynylene phenylene ethynylene polysiloxene(silylene)) polymers preferably of determined molecular mass, optionally bearing at the end of the chain groups derived from a chain-limiting agent. Processes for preparing these polymers, cured products obtained by heat-treating these polymers, and composite matrices comprising these polymers.Type: GrantFiled: November 9, 2001Date of Patent: March 29, 2005Assignee: Commissariat a l'Energie AtomiqueInventors: Christian Levassort, Franck Jousse, Laurent Delnaud, Pierrick Buvat
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Patent number: 6849755Abstract: An organosilicon compound represented by the following general formula (1): wherein R1 is a hydrogen atom, a phenyl group or a halogenated phenyl group; R2 is a hydrogen atom or a methyl group; R3's are each a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; X is a hydrolyzable group; Z1 is —R4—, —R4O— or —R4(CH3)2SiO—, where R4 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; Z2 is an oxygen atom or a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; and m is 0, 1 or 2 and n is 0, 1 or 2. When incorporated in silicone compositions, the organosilicon compound acts as a cross-linking agent having well-balanced photopolymerizability and condensation curability.Type: GrantFiled: October 26, 2001Date of Patent: February 1, 2005Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Toshiyuki Ozai, Hiroyasu Hara, Yoshifumi Inoue, Tomoyuki Goto
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Patent number: 6849668Abstract: A multi-functional photoinitiator of formula (I) R1m—Q—(A1—PI)n??(I) wherein Q is a heteroatom selected from Si, Ti, Zr and Sn or any two independently selected such heteroatoms linked by a covalent bond or a by C1-16 (preferably C1-9) alkylene group, n is at least 2 and n+m=the functionality of Q, each R1 is the same or different and is a non-photoinitiator group; each group PI is the same or different and is a photoinitiator group. Each —A1— is the same or different and is selected from linking groups of formula —(A2)p—Z— wherein p has an average of from 1 to 10, preferably from 3 to 5 and the groups —A2— are either (a) each independently selected from C2-4 alkyleneoxy groups; or (b) each independently selected from groups of formula —O—(CH2)qCO— wherein q is from 3 to 5, and Z is selected from —O—, —S— and —NR6— where R6 is C1-6 alkyl.Type: GrantFiled: August 4, 2000Date of Patent: February 1, 2005Assignee: Sun Chemical CorporationInventors: Roger Edward Burrows, Shaun Lawrence Herlihy, Derek Ronald Illsley
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Patent number: 6844394Abstract: The invention relates to soluble organic-inorganic compositions comprising linear and cyclic hydrosiloxanes, to a novel process for preparing them and to their use as coating materials.Type: GrantFiled: June 6, 2003Date of Patent: January 18, 2005Assignee: Bayer AktiengesellschaftInventors: Lutz Schmalstieg, Wolfgang Frank, Markus Mechtel, Matthias Steiner
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Patent number: 6830833Abstract: Fused conjugated polymers having the following general formula wherein X=C or N; R1-R16 is independently selected from H, D, alkyl, alkoxyl, silyl, aromatic ring, fused aromatic ring, heteroaromatic ring, fused heteroaromatic ring, diarylamino group, carbazole, and at least one of them being a crosslinkable group consisting of a vinyl double bond or an azide group are useful in the fabrication of organic light emitting devices.Type: GrantFiled: December 3, 2002Date of Patent: December 14, 2004Assignee: Canon Kabushiki KaishaInventor: Xiao-Chang Charles Li
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Patent number: 6811960Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.Type: GrantFiled: May 12, 2003Date of Patent: November 2, 2004Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
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Patent number: 6808826Abstract: A blue electroluminescence compound for an electroluminescence display device comprising a spirobifluorene or triarylsilylphenyl group and a display device using such a blue electroluminescence compound, thereby improving a light emitting efficiency and brightness of the electroluminescence display device.Type: GrantFiled: May 23, 2001Date of Patent: October 26, 2004Assignee: Samsung SDI Co., Ltd.Inventors: Sung Han Kim, Han Sung Yu, Soon Ki Kwon, Yun Hi Kim, Dong Cheol Shin, Hyun Wook Lee, Hyun Cheol Jeong
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Patent number: 6787615Abstract: The invention comprises a networked polymer comprising the formula: wherein n≧1; wherein n is an average value obtained by averaging all repeating units of the networked polymer; wherein m≧1; wherein Y is a divalent group containing one or more acetylenic groups, one or more crosslinks, or both; wherein z is the average number of crosslinks per Y group; wherein Ar1 and Ar2 are independently selected aromatic groups; and wherein each R is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl, and combinations thereof. The invention also includes prepolymers and precursors needed to make the networked polymer and processes for making all of the above. The invention also includes a ceramic composition made by pyrolysis of the networked polymer.Type: GrantFiled: January 25, 2002Date of Patent: September 7, 2004Assignee: The United States of America as Represented by the Secretary of the NavyInventors: Teddy M. Keller, Craig L. Homrighausen
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Patent number: 6784306Abstract: Fluorinated organosilicon compounds having at least one fluorinated organic group and at least three SiH groups in a molecule are capable of hydrosilylation reaction with such compounds as vinyl group-bearing fluoro-polymers in a stable manner and fully compatible therewith.Type: GrantFiled: February 20, 2002Date of Patent: August 31, 2004Assignee: Shin-etsu Chemical Co., Ltd.Inventors: Kenichi Fukuda, Koichi Yamaguchi
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Patent number: 6784259Abstract: A prepolymer, represented by the formula: wherein n is an average value grater than or equal to 0, Ar is an aromatic group, and each R10 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof and each R11 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof.Type: GrantFiled: February 12, 2003Date of Patent: August 31, 2004Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Craig Homrighausen
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Patent number: 6780498Abstract: A composition comprising a siloxane resin, a silicon compound substantially consisting of silicon, carbon and hydrogen, wherein the number ratio of carbon to silicon atoms forming an —X— bond (wherein X is (C)m (where m is an integer in the range of from 1 to 3), or a substituted or unsubstituted aromatic group with 9 or less carbon atoms) in the main chain of one molecule is in the range of from 2:1 to 12:1, and a solvent, is subjected to a heat treatment to form a low dielectric constant film. Accordingly, a low dielectric constant film having excellent resistance against chemicals and excellent moisture resistance is provided. A semiconductor integrated circuit having a fast response can be produced by using the film.Type: GrantFiled: October 26, 2001Date of Patent: August 24, 2004Assignee: Fujitsu LimitedInventors: Yoshihiro Nakata, Katsumi Suzuki, Iwao Sugiura, Ei Yano
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Patent number: 6759094Abstract: Branched organosiloxane (co)polymers comprising the structural elements of the formula Y[—CnH2n—(R2SiO)m—Ap—R2Si—G]x (I) where Y is a tri- to decavalent, optionally heteroatom-containing hydrocarbon radical, R is a monovalent, optionally halogenated hydrocarbon radical, A is a radical of the formula —R2Si—R2—(R2SiO)m—, in which R2 is a divalent hydrocarbon radical, G is a monovalent radical of the formula —CfH2f−2—Z or a divalent radical of the formula —CnH2n— bonded to a further radical Y, Z is a monovalent hydrocarbon radical which is free from terminal aliphatic carbon-carbon multiple bonds, and is inert toward SiH groups in hydrosilylation reactions, x is an integer from 3 to 10, f is an integer from 2 to 12, k is 0 or 1, n is an integer from 2 to 12, m is an integer which is at least 1, and p is 0 or a positive integer, with the proviso that the branched organosiloxane (co)polymers contain onType: GrantFiled: July 17, 2002Date of Patent: July 6, 2004Assignee: Wacker-Chemie GmbHInventors: Christian Herzig, Reinhard Stallbauer, Christine Weizhofer
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Publication number: 20040106004Abstract: Spiro-type conjugated polymers having the following general formula 1Type: ApplicationFiled: December 3, 2002Publication date: June 3, 2004Applicant: Canon Kabushiki KaishaInventor: Xiao-Chang Charles Li
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Patent number: 6737124Abstract: Chiral nonracemic, chiral racemic and achiral compounds useful as component of LC compositions which have a silane tail group which is partially fluorinated. The silane tail group comprises a perfluoroalkyl group. The silane tail group of this invention has the formula: where k is 0 or an integer ranging from 1-10; m and n are integers ranging from 1 to about 20; j is 0 or an integer ranging from 1 to 20; Z is —O— or a single bond; R1, R1′, R2 and R2′ are alkyl groups or perfluorinated alkyl groups; and RF is a perfluorinated alkyl group. The invention also provides LC compositions comprising one or more compounds of the invention with partially fluorinated silane tails. The invention also provides optical devices, particularly display devices which contain an aligned layer of an LC composition comprising one or more silane compounds of this invention.Type: GrantFiled: January 3, 2001Date of Patent: May 18, 2004Assignee: Displaytech, Inc.Inventors: Neil Gough, Xin-Hua Chen, William N. Thurmes, Michael Wand
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Patent number: 6730802Abstract: The compound 2,4,6-trimethyl-2,4,6-trisila heptane, the preparation thereof, and the use thereof as a silicon carbide precursor in chemical vapor deposition and infiltration procedures are disclosed.Type: GrantFiled: July 9, 2002Date of Patent: May 4, 2004Assignee: Starfire Systems, Inc.Inventors: Qionghua Shen, Leo Spitz MacDonald
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Patent number: 6713643Abstract: Mesostructured and microporous to mesoporous organofunctionalized silica compositions are described. The compositions incorporate the organofunctional group L as part of a LSiO3 unit in the framework of the compositions. In addition the compositions incorporate the organofunctional group R as part of a O3Si—R—siO3 unit in the framework of the compositions. The compositions are useful as molecular sieves, supports for catalysts and numerous other applications requiring an organo group on surfaces of a silica.Type: GrantFiled: May 24, 2001Date of Patent: March 30, 2004Assignee: Board of Trustees of Michigan State UniversityInventors: Thomas J. Pinnavaia, Yutaka Mori
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Patent number: 6703519Abstract: Heat stable poly(ethynylene phenylene ethynylene silylene) polymers with a determined molecular weight bearing at the chain end, groups derived from a chain limiter. Methods for preparing these polymers, hardened products obtained by heat treatment of these polymers, and matrices for composites comprising these polymers.Type: GrantFiled: March 15, 2002Date of Patent: March 9, 2004Assignee: Commissariat a L' Energie AtomiqueInventors: Pierrick Buvat, Christian Levassort, Franck Jousse
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Patent number: 6696538Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film. The present invention provides an organic silicate polymer having a flexible organic bridge unit in the network prepared by the resin composition of the component (a) and the component (b).Type: GrantFiled: February 2, 2001Date of Patent: February 24, 2004Assignee: LG Chemical Ltd.Inventors: Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Myung-Sun Moon, Dong-Seok Shin
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Patent number: 6653048Abstract: Polymerizable monomers having silicon containing groups that are transparent at 193 nm; and ethylenically unsaturated group are provided. Polymers from these monomers can be used in processes for forming sub-100 nm images with a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the manufacturing of integrated circuits.Type: GrantFiled: May 6, 2002Date of Patent: November 25, 2003Assignee: International Business Machines Corp.Inventors: Phillip Joe Brock, Richard Anthony DiPietro, Donald Clifford Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff
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Patent number: 6613834Abstract: A low dielectric film forming material contains siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided which is suitable for inter-level insulating film material. A semiconductor device is also provided which has a low dielectric constant film and high reliability.Type: GrantFiled: March 5, 2001Date of Patent: September 2, 2003Assignee: Fujitsu LimitedInventors: Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Tamotsu Owada, Iwao Sugiura
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Publication number: 20030162987Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group.Type: ApplicationFiled: February 25, 2002Publication date: August 28, 2003Inventors: Eric J. Houser, Robert Andrew McGill
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Patent number: 6589707Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.Type: GrantFiled: February 15, 2001Date of Patent: July 8, 2003Assignee: Hyundai Electronics Industries Co., Ltd.Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
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Patent number: 6579955Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.Type: GrantFiled: January 16, 2002Date of Patent: June 17, 2003Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Craig Homrighausen
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Patent number: 6570031Abstract: The present invention relates to a novel dendrimic compounds, to a method for the production thereof and to the use thereof as catalysts for the production of polymers, in particular to the use thereof as co-catalysts for metallocenes for polymerizing unsaturated compounds.Type: GrantFiled: September 22, 2000Date of Patent: May 27, 2003Assignee: Bayer AktiengesellschaftInventors: Sigurd Becke, Uwe Denninger, Michael Mager, Heike Windisch
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Patent number: 6569599Abstract: The present invention provides photoresist polymers, processes for producing the same, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist polymers of the present invention comprise a moiety of the Formula: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in thin resist processes and bilayer photoresist processes. Moreover, photoresist polymers of the present invention have a high contrast ratio between the exposed region and the non-exposed region.Type: GrantFiled: May 10, 2001Date of Patent: May 27, 2003Assignee: Hynix Semiconductor Inc.Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
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Publication number: 20030087128Abstract: An organic electrically conductive compound represented by general formula (1): 1Type: ApplicationFiled: September 27, 2002Publication date: May 8, 2003Inventors: Norio Hasegawa, Akira Shiga, Youichi Itagaki
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Patent number: 6558819Abstract: A compound containing at least one repeating unit represented by the following formula (1) and at least one repeating unit represented by the following formula (2), a light emitting device material comprising the compound, and a light emitting device containing the light emitting device material: wherein R1 and R2 represent each a substituent; Ar1 and Ar2 represent each an arylene linking group or a heteroarylene linking group; R3 and R4 represent each a hydrogen atom or a substituent; R5 and R6 represent each a substituent; and m and n are each an integer of from 0 to 3.Type: GrantFiled: August 17, 2000Date of Patent: May 6, 2003Assignee: Fuji Photo Film Co., Ltd.Inventor: Tatsuya Igarashi
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Patent number: 6538055Abstract: A compound containing a silane backbone and a group of formula (A) wherein R is hydrogen, C1-C8alkyl, —O, —OH, —CH2CN, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C6alkenyl, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.Type: GrantFiled: October 18, 2001Date of Patent: March 25, 2003Assignee: Ciba Specialty Chemicals CorporationInventors: Primo Carrozza, Valerio Borzatta, Giovanni Da Roit, Chryssostomos Chatgilialoglu
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Patent number: 6534587Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.Type: GrantFiled: May 9, 2000Date of Patent: March 18, 2003Assignee: Medtronic, IncInventors: Mark A. Tapsak, Edward Di Domenico
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Patent number: 6531539Abstract: The invention is directed to organosilicon compounds of the general formula prepared by reacting triazine compounds with functional groups (e.g., chlorine) and corresponding compounds (e.g., mercapto). The organosilicon compounds can be used in rubber mixtures.Type: GrantFiled: April 5, 2001Date of Patent: March 11, 2003Assignee: Degussa AGInventors: Roland Krafczyk, Rudolf Michel, Jörg Münzenberg, Hans-Detlef Luginsland
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Patent number: 6521774Abstract: A novel organosilicon compound obtained by introducing an alkylene group or analogue instead of the oxygen atom in an Si—O—Si linkage is capable of hydrosilylation reaction with another compound having a vinyl group to form a hydrosilylated derivative which is less prone to decomposition under acidic or basic conditions.Type: GrantFiled: April 25, 2001Date of Patent: February 18, 2003Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Noriyuki Koike, Koichi Yamaguchi, Yasunori Sakano
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Patent number: 6500976Abstract: Organosilicon compounds each having in a molecule (A) a perfluoroalkyl group of at least 3 carbon atoms which may be separated by an etheric oxygen atom, (B) a monovalent hydrocarbon group containing a carboxylic acid anhydride structure, and (C) a hydrosilyl (SiH) group are novel and added to thermosetting elastomer compositions as adhesion aids whereby the compositions are improved in adhesion to various materials including metals, alloys, plastics, and ceramics.Type: GrantFiled: October 5, 2001Date of Patent: December 31, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takashi Matsuda, Mikio Shiono, Kenichi Fukuda
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Publication number: 20020136910Abstract: There is provided an array of alkyl substituted silsesquioxane thin film precursors having a structure wherein alkyl groups are bonded to the silicon atoms of a silsesquioxane cage. The alkyl groups may be the same as, or different than the other alkyl groups. In a first aspect, the present invention provides a composition comprising a vaporized material having the formula [R—SiO1.5]x[H—SiO1.5]y, wherein x+y=n, n is an integer between 2 and 30, x is an integer between 1 and n and y is a whole number between 0 and n. R is a C1 to C100 alkyl group. Also provided are films made from these precursors and objects comprising these films.Type: ApplicationFiled: May 16, 2002Publication date: September 26, 2002Inventor: Nigel P. Hacker
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Patent number: 6426427Abstract: A bissilylnorbornane compound is prepared by reacting 2,5-norbornadiene with a hydrogenchlorosilane in the presence of a mixture of a palladium compound and a phosphite or a palladium complex having a phosphate ligand as a catalyst. The bissilylnorbornane compound can be produced in high yields while suppressing formation of by-product nortricyclene.Type: GrantFiled: August 24, 2001Date of Patent: July 30, 2002Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoichi Tonomura, Tohru Kubota, Mikio Endo
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Patent number: 6420504Abstract: Radical-polymerizable organic group-containing branched siloxane-silalkylene copolymer represented by the general formula: {in the formula, Y is a radical-polymerizable organic group, R1 is 1-10 carbon alkyl or aryl, and X1 is a silyl-alkyl group represented by the following formula in the case when i=1: (in the formula, R1 is the same as aforesaid, R2 is 2-10 carbon alkylene, R3 is 1-10 carbon alkyl, and Xi+1 is a group selected from the group comprising a hydrogen atom, 1-10 carbon alkyl, aryl and the aforesaid silylalkyl group, i is an integer from 1 to 10, which indicates the generation number of the said silylalkyl group and ai is an integer from 0 to 3)}, silicone-containing organic polymer made by polymerizing the said copolymer and method for production thereof.Type: GrantFiled: August 9, 2000Date of Patent: July 16, 2002Assignee: Dow Corning Toray Silicone Co., Ltd.Inventors: Makoto Yoshitake, Haruhiko Furukawa, Yoshitsugu Morita
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Patent number: 6395826Abstract: The present invention relates to mixtures prepared from (A) at least one linear, branched, or cyclic monomeric organosilane having at least two silicon atoms with hydrolyzable and/or condensation-crosslinking groups in which the silicon atoms are bonded to one another through at least one carbon atom in a linking unit, and (B) at least one boron- and/or aluminum-containing compound having the formula (I) RxM(OR′)3−x (I) wherein M is Al or B, x is 0, 1, or 2, R is C1-C6-alkyl, C6-C12-aryl, or (O)½, with the proviso that if R is (O)½, then the compound of the formula (I) is a chain when x is 1 and a cyclic or cage-form compound when x is 2, and each R′ is independently H, C1-C10-alkyl, or C6-C12-aryl. The invention further relates to hybrid materials prepared from such mixtures and to coatings produced therefrom.Type: GrantFiled: March 24, 1999Date of Patent: May 28, 2002Assignee: Bayer AktiengesellschaftInventors: Michael Mager, Steffen Hofacker
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Patent number: 6362289Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.Type: GrantFiled: July 25, 2000Date of Patent: March 26, 2002Assignee: The United States of America as represented by the Secretary of the NavyInventors: Teddy M. Keller, Craig Homrighausen
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Publication number: 20020016487Abstract: The present invention relates to compounds of the formula 1Type: ApplicationFiled: February 27, 2001Publication date: February 7, 2002Inventors: Francois Kayser, Wolfgang Lauer, Thierry Florent Edme Materne
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Patent number: 6331605Abstract: Oligomeric organosilanepolysulfanes which are built up from the three structural units A and/or B and/or C, in which Y=H, CN, —(CH2)nSiRR1R2; n=1-8, R, R1, R2 and R3, independently, represent H, (C1-C4)alkyl, (C1-C4)alkoxy, halogen or a OSiR1R2R3 group; x, as a statistical average, is 1-6, z, as a statistical average, is 2-6, n is 1-8 and o, p and q are each a whole, positive number between 1 and 40 where o+p+q may be ≧2 and <40, with the proviso that at least one structural unit A or B is present, and their use in rubber mixtures and to produce molded items, in particular pneumatic tires.Type: GrantFiled: June 10, 1999Date of Patent: December 18, 2001Assignee: Degussa AktiengesellschaftInventors: Hans-Detlef Lunginsland, Christoph Batz-Sohn
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Patent number: 6323355Abstract: A high-efficiency organic luminous element by which blue luminescence with high luminance and high color purity becomes possible, which comprises at least one compound represented by general formula (A): wherein Ra, Rb, Rc and Rd each represents a hydrogen atom or a substituent group, with the proviso that at least one substituent group of Ra, Rb, Rc and Rd is a group represented by general formula (B): wherein Re and Rf each represents a hydrogen atom or a substituent group, and Ara represents an aryl group, a heteroaryl group or an alkenyl group; and when at least two substituent groups of Ra, Rb, Rc and Rd are groups represented by general formula (B), the groups represented by general formula (B) may be the same or different.Type: GrantFiled: February 20, 2001Date of Patent: November 27, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Tatsuya Igarashi
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Patent number: 6310231Abstract: Silane compounds as a constituent material of luminescent device are described, which are represented by formula (1), luminescent device materials which comprise said compounds and luminescent devices which comprise said materials to acquire high luminous efficiency and high durability: wherein R1 represents an alkyl group, an aryl group, a heteroaryl group or an alkynyl group, and each of Ar11, Ar12 and Ar13 represents a heteroaryl group.Type: GrantFiled: April 5, 2000Date of Patent: October 30, 2001Assignee: Fuji Photo Film Co., Ltd.Inventors: Tatsuya Igarashi, Toshiki Taguchi
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Patent number: 6307083Abstract: Silane compounds represented by formula (1), a synthesis method thereof, luminescent device materials comprising such silane compounds, and luminescent devices containing such materials: wherein each of R1 and R2 groups represents an aryl group containing no alkenyl substituent, or a heteroaryl group containing no alkenyl substituent; each of R3, R4, R5 and R6 groups represents a hydrogen atom or a substituent group; each of R7 and R8 groups represents an aryl group or a heteroaryl group; and each of Ar1 and Ar2 groups represents an arylene group or a heteroarylene group; provided that the compound represented by the formula (1) takes neither polymeric nor oligomeric form and the case is excluded therefrom wherein all or three of R1 R2, Ar1 and Ar2 groups have heteroaryl structures.Type: GrantFiled: April 4, 2000Date of Patent: October 23, 2001Assignee: Fuji Photo Film Co., Ltd.Inventor: Tatsuya Igarashi
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Publication number: 20010031420Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions.Type: ApplicationFiled: February 15, 2001Publication date: October 18, 2001Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
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Patent number: 6278011Abstract: Two new classes of polysilahydrocarbons: Rn—Si—[CH2CH2—Si—R13](4−n) (III) C6H(12−m)[CH2CH2SiR13]m (IV) where R and R1 are alkyl groups having from 1 to 18 carbon atoms, “n” is an integer between 0 and 3, and “m” is an integer between 2 and 6. Lubricant compositions containing the new polysilahydrocarbons are disclosed. Methods of making the new polysilahydrocarbons are also disclosed.Type: GrantFiled: August 30, 1999Date of Patent: August 21, 2001Assignee: The University of DaytonInventors: Grace J. Chen, Carl Edgar Snyder, Jr., Kalathil Chandy Eapen
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Patent number: 6271406Abstract: A process for the preparation of halogenated 1,2-disilaethanes of the general formula X3−nRnSi—CHR1CHR1—SiRnX3−n (I) in which R may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, R1 may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, X denotes a halogen atom and n denotes 0, 1 or 2, wherein halogenated 1,2-disilaethenes of the general formula X3−nRnSi—CR1═CR1—SiRnX3−n (II) in which R, R1, X and n have the meaning stated above therefor, are reacted with hydrogen in the presence of promoting catalysts. The product is produced in high yield and purity.Type: GrantFiled: November 17, 2000Date of Patent: August 7, 2001Assignee: Wacker-Chemie GmbHInventors: Bors C. Abele, Jörn Winterfeld
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Patent number: 6268456Abstract: A sprayable coating composition that contains at least one soluble film-forming silicon-containing compound having, on average, more than one fuctionalized silicon group, a volatile organic carrier, a polymer microparticle component, and a catalyst; a substrate coated with the composition; a process for coating the substrate to provide a protective finish; the finish-protected substrate; certain oligomeric compounds and a process therefor.Type: GrantFiled: December 3, 1997Date of Patent: July 31, 2001Assignee: E. I. du Pont de Nemours and CompanyInventors: Basil V. Gregorovich, Isidor Hazan, Robert Rudolph Matheson, Lech Wilczek
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Patent number: 6258914Abstract: Alkoxy silane oligomers which have a non-hydrolyzable carbon bridged bond to another silane functionality are taught herein, as well as their manufacture and utility.Type: GrantFiled: October 15, 1999Date of Patent: July 10, 2001Assignee: C. K. Witco CorporationInventors: Shiu-Chin Huang Su, Herbert E. Petty, Fredrick D. Osterholtz
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Patent number: 6248686Abstract: Organic/inorganic complex porous materials are disclosed having a main skeletal chain containing metal atoms, oxygen atoms, and organic groups. Preferably, the metal atoms, oxygen atoms and organic groups are bound by ionic bonds and/or covalent bonds, and the organic group is bound to at least two metal atoms in the main chain of the skeleton of the porous material. More preferably, 60% or more of the total pore volume in the porous material has a pore diameter in a range of ±40% of the pore diameter, as determined from the maximum peak in a pore size distribution curve. Alternatively, at least one peak is present at a diffraction angle that preferably corresponds to a d value of at least 1 nm in an x-ray diffraction pattern. Method of making such organic/inorganic complex materials are also disclosed.Type: GrantFiled: July 2, 1999Date of Patent: June 19, 2001Assignee: Kabushiki Kaisha Toyota Chuo KenkyushoInventors: Shinji Inagaki, Shiyou Guan, Yoshiaki Fukushima
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Patent number: 6245925Abstract: By reacting 4-vinyl-1-cyclohexene with a hydrogenchlorosilane compound in the presence of a platinum catalyst to give a reaction solution containing a monosilyl compound, removing the residual 4-vinyl-1-cyclohexene and isomers thereof from the reaction solution, and reacting the monosilyl compound again with the hydrogenchlorosilane compound, an organic silicon compound in which the two double bonds in 4-vinyl-1-cyclohexene have been hydrosilylated is produced in high yields.Type: GrantFiled: July 27, 2000Date of Patent: June 12, 2001Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Yoichi Tonomura, Tohru Kubota, Mikio Endo