Plural Silicons Bonded Directly To The Same Carbon Or Attached By A Chain Consisting Of Carbons, Which Carbons May Be Part Of A Ring Patents (Class 556/431)
  • Patent number: 7067687
    Abstract: Mesostructured and microporous to mesoporous organofunctionalized silica compositions are described. The compositions incorporate the organofunctional group L as part of a LSiO3 unit in the framework of the compositions. In addition the compositions incorporate the organofunctional group R as part of a O3Si—R—siO3 unit in the framework of the compositions. The compositions are useful as molecular sieves, supports for catalysts and numerous other applications requiring an organo group on surfaces of a silica.
    Type: Grant
    Filed: March 8, 2004
    Date of Patent: June 27, 2006
    Assignee: Board of Trustees of Michigan State University
    Inventors: Thomas J. Pinnavaia, Yutaka Mori
  • Patent number: 6872795
    Abstract: Heat-stable poly(ethynylene phenylene ethynylene polysiloxene(silylene)) polymers preferably of determined molecular mass, optionally bearing at the end of the chain groups derived from a chain-limiting agent. Processes for preparing these polymers, cured products obtained by heat-treating these polymers, and composite matrices comprising these polymers.
    Type: Grant
    Filed: November 9, 2001
    Date of Patent: March 29, 2005
    Assignee: Commissariat a l'Energie Atomique
    Inventors: Christian Levassort, Franck Jousse, Laurent Delnaud, Pierrick Buvat
  • Patent number: 6849755
    Abstract: An organosilicon compound represented by the following general formula (1): wherein R1 is a hydrogen atom, a phenyl group or a halogenated phenyl group; R2 is a hydrogen atom or a methyl group; R3's are each a substituted or unsubstituted monovalent hydrocarbon group having 1 to 10 carbon atoms; X is a hydrolyzable group; Z1 is —R4—, —R4O— or —R4(CH3)2SiO—, where R4 is a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; Z2 is an oxygen atom or a substituted or unsubstituted divalent hydrocarbon group having 1 to 10 carbon atoms; and m is 0, 1 or 2 and n is 0, 1 or 2. When incorporated in silicone compositions, the organosilicon compound acts as a cross-linking agent having well-balanced photopolymerizability and condensation curability.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: February 1, 2005
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Toshiyuki Ozai, Hiroyasu Hara, Yoshifumi Inoue, Tomoyuki Goto
  • Patent number: 6849668
    Abstract: A multi-functional photoinitiator of formula (I) R1m—Q—(A1—PI)n??(I) wherein Q is a heteroatom selected from Si, Ti, Zr and Sn or any two independently selected such heteroatoms linked by a covalent bond or a by C1-16 (preferably C1-9) alkylene group, n is at least 2 and n+m=the functionality of Q, each R1 is the same or different and is a non-photoinitiator group; each group PI is the same or different and is a photoinitiator group. Each —A1— is the same or different and is selected from linking groups of formula —(A2)p—Z— wherein p has an average of from 1 to 10, preferably from 3 to 5 and the groups —A2— are either (a) each independently selected from C2-4 alkyleneoxy groups; or (b) each independently selected from groups of formula —O—(CH2)qCO— wherein q is from 3 to 5, and Z is selected from —O—, —S— and —NR6— where R6 is C1-6 alkyl.
    Type: Grant
    Filed: August 4, 2000
    Date of Patent: February 1, 2005
    Assignee: Sun Chemical Corporation
    Inventors: Roger Edward Burrows, Shaun Lawrence Herlihy, Derek Ronald Illsley
  • Patent number: 6844394
    Abstract: The invention relates to soluble organic-inorganic compositions comprising linear and cyclic hydrosiloxanes, to a novel process for preparing them and to their use as coating materials.
    Type: Grant
    Filed: June 6, 2003
    Date of Patent: January 18, 2005
    Assignee: Bayer Aktiengesellschaft
    Inventors: Lutz Schmalstieg, Wolfgang Frank, Markus Mechtel, Matthias Steiner
  • Patent number: 6830833
    Abstract: Fused conjugated polymers having the following general formula wherein X=C or N; R1-R16 is independently selected from H, D, alkyl, alkoxyl, silyl, aromatic ring, fused aromatic ring, heteroaromatic ring, fused heteroaromatic ring, diarylamino group, carbazole, and at least one of them being a crosslinkable group consisting of a vinyl double bond or an azide group are useful in the fabrication of organic light emitting devices.
    Type: Grant
    Filed: December 3, 2002
    Date of Patent: December 14, 2004
    Assignee: Canon Kabushiki Kaisha
    Inventor: Xiao-Chang Charles Li
  • Patent number: 6811960
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.
    Type: Grant
    Filed: May 12, 2003
    Date of Patent: November 2, 2004
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6808826
    Abstract: A blue electroluminescence compound for an electroluminescence display device comprising a spirobifluorene or triarylsilylphenyl group and a display device using such a blue electroluminescence compound, thereby improving a light emitting efficiency and brightness of the electroluminescence display device.
    Type: Grant
    Filed: May 23, 2001
    Date of Patent: October 26, 2004
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Sung Han Kim, Han Sung Yu, Soon Ki Kwon, Yun Hi Kim, Dong Cheol Shin, Hyun Wook Lee, Hyun Cheol Jeong
  • Patent number: 6787615
    Abstract: The invention comprises a networked polymer comprising the formula: wherein n≧1; wherein n is an average value obtained by averaging all repeating units of the networked polymer; wherein m≧1; wherein Y is a divalent group containing one or more acetylenic groups, one or more crosslinks, or both; wherein z is the average number of crosslinks per Y group; wherein Ar1 and Ar2 are independently selected aromatic groups; and wherein each R is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl, and combinations thereof. The invention also includes prepolymers and precursors needed to make the networked polymer and processes for making all of the above. The invention also includes a ceramic composition made by pyrolysis of the networked polymer.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: September 7, 2004
    Assignee: The United States of America as Represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Craig L. Homrighausen
  • Patent number: 6784306
    Abstract: Fluorinated organosilicon compounds having at least one fluorinated organic group and at least three SiH groups in a molecule are capable of hydrosilylation reaction with such compounds as vinyl group-bearing fluoro-polymers in a stable manner and fully compatible therewith.
    Type: Grant
    Filed: February 20, 2002
    Date of Patent: August 31, 2004
    Assignee: Shin-etsu Chemical Co., Ltd.
    Inventors: Kenichi Fukuda, Koichi Yamaguchi
  • Patent number: 6784259
    Abstract: A prepolymer, represented by the formula: wherein n is an average value grater than or equal to 0, Ar is an aromatic group, and each R10 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof and each R11 is independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof.
    Type: Grant
    Filed: February 12, 2003
    Date of Patent: August 31, 2004
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Craig Homrighausen
  • Patent number: 6780498
    Abstract: A composition comprising a siloxane resin, a silicon compound substantially consisting of silicon, carbon and hydrogen, wherein the number ratio of carbon to silicon atoms forming an —X— bond (wherein X is (C)m (where m is an integer in the range of from 1 to 3), or a substituted or unsubstituted aromatic group with 9 or less carbon atoms) in the main chain of one molecule is in the range of from 2:1 to 12:1, and a solvent, is subjected to a heat treatment to form a low dielectric constant film. Accordingly, a low dielectric constant film having excellent resistance against chemicals and excellent moisture resistance is provided. A semiconductor integrated circuit having a fast response can be produced by using the film.
    Type: Grant
    Filed: October 26, 2001
    Date of Patent: August 24, 2004
    Assignee: Fujitsu Limited
    Inventors: Yoshihiro Nakata, Katsumi Suzuki, Iwao Sugiura, Ei Yano
  • Patent number: 6759094
    Abstract: Branched organosiloxane (co)polymers comprising the structural elements of the formula Y[—CnH2n—(R2SiO)m—Ap—R2Si—G]x  (I) where Y is a tri- to decavalent, optionally heteroatom-containing hydrocarbon radical, R is a monovalent, optionally halogenated hydrocarbon radical, A is a radical of the formula —R2Si—R2—(R2SiO)m—, in which R2 is a divalent hydrocarbon radical, G is a monovalent radical of the formula —CfH2f−2—Z or a divalent radical of the formula —CnH2n— bonded to a further radical Y, Z is a monovalent hydrocarbon radical which is free from terminal aliphatic carbon-carbon multiple bonds, and is inert toward SiH groups in hydrosilylation reactions, x is an integer from 3 to 10, f is an integer from 2 to 12, k is 0 or 1, n is an integer from 2 to 12, m is an integer which is at least 1, and p is 0 or a positive integer, with the proviso that the branched organosiloxane (co)polymers contain on
    Type: Grant
    Filed: July 17, 2002
    Date of Patent: July 6, 2004
    Assignee: Wacker-Chemie GmbH
    Inventors: Christian Herzig, Reinhard Stallbauer, Christine Weizhofer
  • Publication number: 20040106004
    Abstract: Spiro-type conjugated polymers having the following general formula 1
    Type: Application
    Filed: December 3, 2002
    Publication date: June 3, 2004
    Applicant: Canon Kabushiki Kaisha
    Inventor: Xiao-Chang Charles Li
  • Patent number: 6737124
    Abstract: Chiral nonracemic, chiral racemic and achiral compounds useful as component of LC compositions which have a silane tail group which is partially fluorinated. The silane tail group comprises a perfluoroalkyl group. The silane tail group of this invention has the formula: where k is 0 or an integer ranging from 1-10; m and n are integers ranging from 1 to about 20; j is 0 or an integer ranging from 1 to 20; Z is —O— or a single bond; R1, R1′, R2 and R2′ are alkyl groups or perfluorinated alkyl groups; and RF is a perfluorinated alkyl group. The invention also provides LC compositions comprising one or more compounds of the invention with partially fluorinated silane tails. The invention also provides optical devices, particularly display devices which contain an aligned layer of an LC composition comprising one or more silane compounds of this invention.
    Type: Grant
    Filed: January 3, 2001
    Date of Patent: May 18, 2004
    Assignee: Displaytech, Inc.
    Inventors: Neil Gough, Xin-Hua Chen, William N. Thurmes, Michael Wand
  • Patent number: 6730802
    Abstract: The compound 2,4,6-trimethyl-2,4,6-trisila heptane, the preparation thereof, and the use thereof as a silicon carbide precursor in chemical vapor deposition and infiltration procedures are disclosed.
    Type: Grant
    Filed: July 9, 2002
    Date of Patent: May 4, 2004
    Assignee: Starfire Systems, Inc.
    Inventors: Qionghua Shen, Leo Spitz MacDonald
  • Patent number: 6713643
    Abstract: Mesostructured and microporous to mesoporous organofunctionalized silica compositions are described. The compositions incorporate the organofunctional group L as part of a LSiO3 unit in the framework of the compositions. In addition the compositions incorporate the organofunctional group R as part of a O3Si—R—siO3 unit in the framework of the compositions. The compositions are useful as molecular sieves, supports for catalysts and numerous other applications requiring an organo group on surfaces of a silica.
    Type: Grant
    Filed: May 24, 2001
    Date of Patent: March 30, 2004
    Assignee: Board of Trustees of Michigan State University
    Inventors: Thomas J. Pinnavaia, Yutaka Mori
  • Patent number: 6703519
    Abstract: Heat stable poly(ethynylene phenylene ethynylene silylene) polymers with a determined molecular weight bearing at the chain end, groups derived from a chain limiter. Methods for preparing these polymers, hardened products obtained by heat treatment of these polymers, and matrices for composites comprising these polymers.
    Type: Grant
    Filed: March 15, 2002
    Date of Patent: March 9, 2004
    Assignee: Commissariat a L' Energie Atomique
    Inventors: Pierrick Buvat, Christian Levassort, Franck Jousse
  • Patent number: 6696538
    Abstract: The present invention relates to low a dielectric material essential for a next generation semiconductor with high density and high performance, and more particularly to a low dielectric material that is thermally stable and has good film-forming properties and excellent mechanical properties, a dielectric film comprising the low dielectric material, and a semiconductor device manufactured using the dielectric film. The present invention provides an organic silicate polymer having a flexible organic bridge unit in the network prepared by the resin composition of the component (a) and the component (b).
    Type: Grant
    Filed: February 2, 2001
    Date of Patent: February 24, 2004
    Assignee: LG Chemical Ltd.
    Inventors: Min-Jin Ko, Hye-Yeong Nam, Jung-Won Kang, Myung-Sun Moon, Dong-Seok Shin
  • Patent number: 6653048
    Abstract: Polymerizable monomers having silicon containing groups that are transparent at 193 nm; and ethylenically unsaturated group are provided. Polymers from these monomers can be used in processes for forming sub-100 nm images with a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the manufacturing of integrated circuits.
    Type: Grant
    Filed: May 6, 2002
    Date of Patent: November 25, 2003
    Assignee: International Business Machines Corp.
    Inventors: Phillip Joe Brock, Richard Anthony DiPietro, Donald Clifford Hofer, Ratnam Sooriyakumaran, Gregory Michael Wallraff
  • Patent number: 6613834
    Abstract: A low dielectric film forming material contains siloxane resin and polycarbosilane dissolved in solvent. By using this solution, a low dielectric film is formed which contains siloxane resin and polycarbosilane bonded to the siloxane resin. Material of a low dielectric film is provided which is suitable for inter-level insulating film material. A semiconductor device is also provided which has a low dielectric constant film and high reliability.
    Type: Grant
    Filed: March 5, 2001
    Date of Patent: September 2, 2003
    Assignee: Fujitsu Limited
    Inventors: Yoshihiro Nakata, Shun-ichi Fukuyama, Katsumi Suzuki, Ei Yano, Tamotsu Owada, Iwao Sugiura
  • Publication number: 20030162987
    Abstract: The invention provides a device for selective molecular recognition, the device comprising a sensing portion, wherein said sensing portion includes a substrate having coated thereon a layer comprising a non-volatile, small molecule compound having at least two pendant and terminal unsaturated groups, each being functionalized with at least one halogen substituted alcohol or phenol functional group.
    Type: Application
    Filed: February 25, 2002
    Publication date: August 28, 2003
    Inventors: Eric J. Houser, Robert Andrew McGill
  • Patent number: 6589707
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist monomers of the present invention comprise a moiety of Formula 4: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in a thin resist process and a bilayer photoresist process. Moreover, photoresist polymers of the present invention have a high contrast ratio between an exposed region and a non-exposed region.
    Type: Grant
    Filed: February 15, 2001
    Date of Patent: July 8, 2003
    Assignee: Hyundai Electronics Industries Co., Ltd.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6579955
    Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and  represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.
    Type: Grant
    Filed: January 16, 2002
    Date of Patent: June 17, 2003
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Craig Homrighausen
  • Patent number: 6570031
    Abstract: The present invention relates to a novel dendrimic compounds, to a method for the production thereof and to the use thereof as catalysts for the production of polymers, in particular to the use thereof as co-catalysts for metallocenes for polymerizing unsaturated compounds.
    Type: Grant
    Filed: September 22, 2000
    Date of Patent: May 27, 2003
    Assignee: Bayer Aktiengesellschaft
    Inventors: Sigurd Becke, Uwe Denninger, Michael Mager, Heike Windisch
  • Patent number: 6569599
    Abstract: The present invention provides photoresist polymers, processes for producing the same, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions. In particular, photoresist polymers of the present invention comprise a moiety of the Formula: where R1, R2, R3 and R4 are those defined herein. Photoresist polymers of the present invention have a relatively high etching resistance, and therefore are useful in thin resist processes and bilayer photoresist processes. Moreover, photoresist polymers of the present invention have a high contrast ratio between the exposed region and the non-exposed region.
    Type: Grant
    Filed: May 10, 2001
    Date of Patent: May 27, 2003
    Assignee: Hynix Semiconductor Inc.
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Publication number: 20030087128
    Abstract: An organic electrically conductive compound represented by general formula (1): 1
    Type: Application
    Filed: September 27, 2002
    Publication date: May 8, 2003
    Inventors: Norio Hasegawa, Akira Shiga, Youichi Itagaki
  • Patent number: 6558819
    Abstract: A compound containing at least one repeating unit represented by the following formula (1) and at least one repeating unit represented by the following formula (2), a light emitting device material comprising the compound, and a light emitting device containing the light emitting device material: wherein R1 and R2 represent each a substituent; Ar1 and Ar2 represent each an arylene linking group or a heteroarylene linking group; R3 and R4 represent each a hydrogen atom or a substituent; R5 and R6 represent each a substituent; and m and n are each an integer of from 0 to 3.
    Type: Grant
    Filed: August 17, 2000
    Date of Patent: May 6, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tatsuya Igarashi
  • Patent number: 6538055
    Abstract: A compound containing a silane backbone and a group of formula (A) wherein R is hydrogen, C1-C8alkyl, —O, —OH, —CH2CN, C1-C18alkoxy, C5-C12cycloalkoxy, C3-C6alkenyl, C7-C9phenylalkyl unsubstituted or substituted on the phenyl by 1, 2 or 3 C1-C4alkyl; or C1-C8acyl; is useful for stabilizing an organic material against degradation induced by light, heat or oxidation.
    Type: Grant
    Filed: October 18, 2001
    Date of Patent: March 25, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Primo Carrozza, Valerio Borzatta, Giovanni Da Roit, Chryssostomos Chatgilialoglu
  • Patent number: 6534587
    Abstract: Symmetric and asymmetric cyclic silalkylenesiloxane monomers and copolymers thereof, as well as crosslinked and/or reinforced silalkylenesiloxane copolymers, medical devices containing such materials, and methods of preparation.
    Type: Grant
    Filed: May 9, 2000
    Date of Patent: March 18, 2003
    Assignee: Medtronic, Inc
    Inventors: Mark A. Tapsak, Edward Di Domenico
  • Patent number: 6531539
    Abstract: The invention is directed to organosilicon compounds of the general formula prepared by reacting triazine compounds with functional groups (e.g., chlorine) and corresponding compounds (e.g., mercapto). The organosilicon compounds can be used in rubber mixtures.
    Type: Grant
    Filed: April 5, 2001
    Date of Patent: March 11, 2003
    Assignee: Degussa AG
    Inventors: Roland Krafczyk, Rudolf Michel, Jörg Münzenberg, Hans-Detlef Luginsland
  • Patent number: 6521774
    Abstract: A novel organosilicon compound obtained by introducing an alkylene group or analogue instead of the oxygen atom in an Si—O—Si linkage is capable of hydrosilylation reaction with another compound having a vinyl group to form a hydrosilylated derivative which is less prone to decomposition under acidic or basic conditions.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: February 18, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Noriyuki Koike, Koichi Yamaguchi, Yasunori Sakano
  • Patent number: 6500976
    Abstract: Organosilicon compounds each having in a molecule (A) a perfluoroalkyl group of at least 3 carbon atoms which may be separated by an etheric oxygen atom, (B) a monovalent hydrocarbon group containing a carboxylic acid anhydride structure, and (C) a hydrosilyl (SiH) group are novel and added to thermosetting elastomer compositions as adhesion aids whereby the compositions are improved in adhesion to various materials including metals, alloys, plastics, and ceramics.
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: December 31, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Takashi Matsuda, Mikio Shiono, Kenichi Fukuda
  • Publication number: 20020136910
    Abstract: There is provided an array of alkyl substituted silsesquioxane thin film precursors having a structure wherein alkyl groups are bonded to the silicon atoms of a silsesquioxane cage. The alkyl groups may be the same as, or different than the other alkyl groups. In a first aspect, the present invention provides a composition comprising a vaporized material having the formula [R—SiO1.5]x[H—SiO1.5]y, wherein x+y=n, n is an integer between 2 and 30, x is an integer between 1 and n and y is a whole number between 0 and n. R is a C1 to C100 alkyl group. Also provided are films made from these precursors and objects comprising these films.
    Type: Application
    Filed: May 16, 2002
    Publication date: September 26, 2002
    Inventor: Nigel P. Hacker
  • Patent number: 6426427
    Abstract: A bissilylnorbornane compound is prepared by reacting 2,5-norbornadiene with a hydrogenchlorosilane in the presence of a mixture of a palladium compound and a phosphite or a palladium complex having a phosphate ligand as a catalyst. The bissilylnorbornane compound can be produced in high yields while suppressing formation of by-product nortricyclene.
    Type: Grant
    Filed: August 24, 2001
    Date of Patent: July 30, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota, Mikio Endo
  • Patent number: 6420504
    Abstract: Radical-polymerizable organic group-containing branched siloxane-silalkylene copolymer represented by the general formula: {in the formula, Y is a radical-polymerizable organic group, R1 is 1-10 carbon alkyl or aryl, and X1 is a silyl-alkyl group represented by the following formula in the case when i=1: (in the formula, R1 is the same as aforesaid, R2 is 2-10 carbon alkylene, R3 is 1-10 carbon alkyl, and Xi+1 is a group selected from the group comprising a hydrogen atom, 1-10 carbon alkyl, aryl and the aforesaid silylalkyl group, i is an integer from 1 to 10, which indicates the generation number of the said silylalkyl group and ai is an integer from 0 to 3)}, silicone-containing organic polymer made by polymerizing the said copolymer and method for production thereof.
    Type: Grant
    Filed: August 9, 2000
    Date of Patent: July 16, 2002
    Assignee: Dow Corning Toray Silicone Co., Ltd.
    Inventors: Makoto Yoshitake, Haruhiko Furukawa, Yoshitsugu Morita
  • Patent number: 6395826
    Abstract: The present invention relates to mixtures prepared from (A) at least one linear, branched, or cyclic monomeric organosilane having at least two silicon atoms with hydrolyzable and/or condensation-crosslinking groups in which the silicon atoms are bonded to one another through at least one carbon atom in a linking unit, and (B) at least one boron- and/or aluminum-containing compound having the formula (I) RxM(OR′)3−x  (I)  wherein M is Al or B, x is 0, 1, or 2, R is C1-C6-alkyl, C6-C12-aryl, or (O)½, with the proviso that if R is (O)½, then the compound of the formula (I) is a chain when x is 1 and a cyclic or cage-form compound when x is 2, and each R′ is independently H, C1-C10-alkyl, or C6-C12-aryl. The invention further relates to hybrid materials prepared from such mixtures and to coatings produced therefrom.
    Type: Grant
    Filed: March 24, 1999
    Date of Patent: May 28, 2002
    Assignee: Bayer Aktiengesellschaft
    Inventors: Michael Mager, Steffen Hofacker
  • Patent number: 6362289
    Abstract: A linear polymer has repeating units represented by the formula wherein (a) n is an integer greater than or equal to 0, (b) x is an integer greater than or equal to 1, and  represents an unconjugated acetylenic group when x is equal to 1 or conjugated acetylenic groups when x is greater than 1; (c) Ar is an aromatic group, and (c) R1, R2, R3, R4, R5, R6, R7 and R8 are independently selected from the group consisting of alkyl, aryl, alkylaryl, haloalkyl, haloaryl and mixtures thereof. The linear polymer may be thermally cured to form a crosslinked polymer.
    Type: Grant
    Filed: July 25, 2000
    Date of Patent: March 26, 2002
    Assignee: The United States of America as represented by the Secretary of the Navy
    Inventors: Teddy M. Keller, Craig Homrighausen
  • Publication number: 20020016487
    Abstract: The present invention relates to compounds of the formula 1
    Type: Application
    Filed: February 27, 2001
    Publication date: February 7, 2002
    Inventors: Francois Kayser, Wolfgang Lauer, Thierry Florent Edme Materne
  • Patent number: 6331605
    Abstract: Oligomeric organosilanepolysulfanes which are built up from the three structural units A and/or B and/or C, in which Y=H, CN, —(CH2)nSiRR1R2; n=1-8, R, R1, R2 and R3, independently, represent H, (C1-C4)alkyl, (C1-C4)alkoxy, halogen or a OSiR1R2R3 group; x, as a statistical average, is 1-6, z, as a statistical average, is 2-6, n is 1-8 and o, p and q are each a whole, positive number between 1 and 40 where o+p+q may be ≧2 and <40, with the proviso that at least one structural unit A or B is present, and their use in rubber mixtures and to produce molded items, in particular pneumatic tires.
    Type: Grant
    Filed: June 10, 1999
    Date of Patent: December 18, 2001
    Assignee: Degussa Aktiengesellschaft
    Inventors: Hans-Detlef Lunginsland, Christoph Batz-Sohn
  • Patent number: 6323355
    Abstract: A high-efficiency organic luminous element by which blue luminescence with high luminance and high color purity becomes possible, which comprises at least one compound represented by general formula (A): wherein Ra, Rb, Rc and Rd each represents a hydrogen atom or a substituent group, with the proviso that at least one substituent group of Ra, Rb, Rc and Rd is a group represented by general formula (B): wherein Re and Rf each represents a hydrogen atom or a substituent group, and Ara represents an aryl group, a heteroaryl group or an alkenyl group; and when at least two substituent groups of Ra, Rb, Rc and Rd are groups represented by general formula (B), the groups represented by general formula (B) may be the same or different.
    Type: Grant
    Filed: February 20, 2001
    Date of Patent: November 27, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tatsuya Igarashi
  • Patent number: 6310231
    Abstract: Silane compounds as a constituent material of luminescent device are described, which are represented by formula (1), luminescent device materials which comprise said compounds and luminescent devices which comprise said materials to acquire high luminous efficiency and high durability: wherein R1 represents an alkyl group, an aryl group, a heteroaryl group or an alkynyl group, and each of Ar11, Ar12 and Ar13 represents a heteroaryl group.
    Type: Grant
    Filed: April 5, 2000
    Date of Patent: October 30, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Tatsuya Igarashi, Toshiki Taguchi
  • Patent number: 6307083
    Abstract: Silane compounds represented by formula (1), a synthesis method thereof, luminescent device materials comprising such silane compounds, and luminescent devices containing such materials: wherein each of R1 and R2 groups represents an aryl group containing no alkenyl substituent, or a heteroaryl group containing no alkenyl substituent; each of R3, R4, R5 and R6 groups represents a hydrogen atom or a substituent group; each of R7 and R8 groups represents an aryl group or a heteroaryl group; and each of Ar1 and Ar2 groups represents an arylene group or a heteroarylene group; provided that the compound represented by the formula (1) takes neither polymeric nor oligomeric form and the case is excluded therefrom wherein all or three of R1 R2, Ar1 and Ar2 groups have heteroaryl structures.
    Type: Grant
    Filed: April 4, 2000
    Date of Patent: October 23, 2001
    Assignee: Fuji Photo Film Co., Ltd.
    Inventor: Tatsuya Igarashi
  • Publication number: 20010031420
    Abstract: The present invention provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such photoresist compositions.
    Type: Application
    Filed: February 15, 2001
    Publication date: October 18, 2001
    Inventors: Geun Su Lee, Jae Chang Jung, Min Ho Jung, Ki Ho Baik
  • Patent number: 6278011
    Abstract: Two new classes of polysilahydrocarbons: Rn—Si—[CH2CH2—Si—R13](4−n)  (III) C6H(12−m)[CH2CH2SiR13]m  (IV) where R and R1 are alkyl groups having from 1 to 18 carbon atoms, “n” is an integer between 0 and 3, and “m” is an integer between 2 and 6. Lubricant compositions containing the new polysilahydrocarbons are disclosed. Methods of making the new polysilahydrocarbons are also disclosed.
    Type: Grant
    Filed: August 30, 1999
    Date of Patent: August 21, 2001
    Assignee: The University of Dayton
    Inventors: Grace J. Chen, Carl Edgar Snyder, Jr., Kalathil Chandy Eapen
  • Patent number: 6271406
    Abstract: A process for the preparation of halogenated 1,2-disilaethanes of the general formula X3−nRnSi—CHR1CHR1—SiRnX3−n  (I) in which R may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, R1 may be identical or different and denotes a hydrogen atom or a monovalent optionally substituted hydrocarbon radical having 1 to 40 carbon atom(s) per radical, X denotes a halogen atom and n denotes 0, 1 or 2, wherein halogenated 1,2-disilaethenes of the general formula X3−nRnSi—CR1═CR1—SiRnX3−n  (II) in which R, R1, X and n have the meaning stated above therefor, are reacted with hydrogen in the presence of promoting catalysts. The product is produced in high yield and purity.
    Type: Grant
    Filed: November 17, 2000
    Date of Patent: August 7, 2001
    Assignee: Wacker-Chemie GmbH
    Inventors: Bors C. Abele, Jörn Winterfeld
  • Patent number: 6268456
    Abstract: A sprayable coating composition that contains at least one soluble film-forming silicon-containing compound having, on average, more than one fuctionalized silicon group, a volatile organic carrier, a polymer microparticle component, and a catalyst; a substrate coated with the composition; a process for coating the substrate to provide a protective finish; the finish-protected substrate; certain oligomeric compounds and a process therefor.
    Type: Grant
    Filed: December 3, 1997
    Date of Patent: July 31, 2001
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Basil V. Gregorovich, Isidor Hazan, Robert Rudolph Matheson, Lech Wilczek
  • Patent number: 6258914
    Abstract: Alkoxy silane oligomers which have a non-hydrolyzable carbon bridged bond to another silane functionality are taught herein, as well as their manufacture and utility.
    Type: Grant
    Filed: October 15, 1999
    Date of Patent: July 10, 2001
    Assignee: C. K. Witco Corporation
    Inventors: Shiu-Chin Huang Su, Herbert E. Petty, Fredrick D. Osterholtz
  • Patent number: 6248686
    Abstract: Organic/inorganic complex porous materials are disclosed having a main skeletal chain containing metal atoms, oxygen atoms, and organic groups. Preferably, the metal atoms, oxygen atoms and organic groups are bound by ionic bonds and/or covalent bonds, and the organic group is bound to at least two metal atoms in the main chain of the skeleton of the porous material. More preferably, 60% or more of the total pore volume in the porous material has a pore diameter in a range of ±40% of the pore diameter, as determined from the maximum peak in a pore size distribution curve. Alternatively, at least one peak is present at a diffraction angle that preferably corresponds to a d value of at least 1 nm in an x-ray diffraction pattern. Method of making such organic/inorganic complex materials are also disclosed.
    Type: Grant
    Filed: July 2, 1999
    Date of Patent: June 19, 2001
    Assignee: Kabushiki Kaisha Toyota Chuo Kenkyusho
    Inventors: Shinji Inagaki, Shiyou Guan, Yoshiaki Fukushima
  • Patent number: 6245925
    Abstract: By reacting 4-vinyl-1-cyclohexene with a hydrogenchlorosilane compound in the presence of a platinum catalyst to give a reaction solution containing a monosilyl compound, removing the residual 4-vinyl-1-cyclohexene and isomers thereof from the reaction solution, and reacting the monosilyl compound again with the hydrogenchlorosilane compound, an organic silicon compound in which the two double bonds in 4-vinyl-1-cyclohexene have been hydrosilylated is produced in high yields.
    Type: Grant
    Filed: July 27, 2000
    Date of Patent: June 12, 2001
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoichi Tonomura, Tohru Kubota, Mikio Endo