Halogen In Alcohol Moiety Patents (Class 560/197)
-
Patent number: 8697903Abstract: A fluorinated ester monomer is provided having formula (1) wherein R1 is H, CH3 or CF3, R2 and R3 are H or a monovalent hydrocarbon group, or R2 and R3 forms a hydrocarbon ring, R4 is a monovalent hydrocarbon group, and k is 0 or 1. A polymer obtained from the monomer has transparency to radiation with a wavelength of up to 200 nm and appropriate alkaline hydrolysis, is constructed such that any of water repellency, water slip and surface segregation may be adjusted by a choice of its structure, and is useful in forming ArF immersion lithography materials.Type: GrantFiled: September 22, 2011Date of Patent: April 15, 2014Assignee: Shin-Etsu Chemical Co., Ltd.Inventors: Takeshi Kinsho, Yuuki Suka, Yuji Harada, Koji Hasegawa, Takeshi Sasami
-
Publication number: 20140093737Abstract: There is provided a polymerizable composition comprising a compound (A) having a repeating unit having a perfluoropolyether structure and 4 or more polymerizable groups and represented by the specific general formula; an antireflection film comprising a transparent support having thereon at least one low refractive index layer, wherein the low refractive index layer is formed of the polymerizable composition; a polarizing plate comprising a polarization film and two protective films protecting the both surfaces of the polarization film, wherein at least one of the protective films is the antireflection film; an image display device comprising a display, and the antireflection film or the polarizing plate on the outermost surface of the display; and a water-repellent or oil-repellent film formed of the polymerizable composition.Type: ApplicationFiled: September 26, 2013Publication date: April 3, 2014Applicant: FUJIFILM CorporationInventors: Naozumi SHIRAIWA, Masauki HARADA
-
Publication number: 20130317251Abstract: Process for the manufacture of a compound of formula R1OOC—CH(OCH2F)—COOR, (I) or R3HNOC—CH(OCH2F)—CONHR4(II) wherein R1, R2, R3, R4 are equal or different from each other and are independently selected from H; an alkyl group having from 1 to 10 carbon atoms which is optionally substituted by at least one halogen atom; an aralkyl group; or an aryl group, comprising reacting a compound of formula R1OOC—CH(OCH2X)—COOR2 (III) or R3HNOC—CH(OCH2X)—CONHR4(IV) wherein X is a leaving group that can be substituted by nucleophilic substitution, and wherein R1, R2, R3, R4 have the same meaning as above, with at least one source of nucleophilic fluorine.Type: ApplicationFiled: February 7, 2012Publication date: November 28, 2013Applicant: SOLVAY SAInventors: Max Josef Braun, Uta Claassen
-
Patent number: 8426106Abstract: A Photoresist composition comprising a polymer comprising a structural unit derived from a compound represented by the formula (I): wherein R1 represents a hydrogen atom or a methyl group, R2 represents a C6-C12 aromatic hydrocarbon group which can have one or more substituents, R3 represents a cyano group or a C1-C12 hydrocarbon group which can have one or more substituents and which can contain one or more heteroatoms, A1 represents a single bond, —(CH2)g—CO—O—* or —(CH2)h—O—CO—(CH2)i—CO—O—* wherein g, h and i each independently represent an integer of ?1 to 6 and * represents a binding position to the nitrogen atom, a resin having an acid-labile group and being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid, and an acid generator.Type: GrantFiled: October 12, 2010Date of Patent: April 23, 2013Assignee: Sumitomo Chemical Company, LimitedInventors: Tatsuro Masuyama, Kazuhiko Hashimoto, Junji Shigematsu
-
Patent number: 8324331Abstract: A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).Type: GrantFiled: December 16, 2009Date of Patent: December 4, 2012Assignee: Daito Chemix CorporationInventors: Toshiharu Shimamaki, Kenji Uenaga
-
Patent number: 8318877Abstract: A copolymer composition comprising monomers copolymerized in the following percentages by weight: (a) from about 20% to about 95% of a monomer, or mixture of monomers, of formula (I): CnF2n+1(CH2)x[(CF2CF2)y(CH2CH2)z]m-L-C(O)—C(R)?CH2??(I) wherein R is H, Cl, F or CH3, L is O, S, NH, S—(CH2)rO, S—(CH2)rNH, OC(O)NH—CH2CH2O, NHC(O)NHCH2CH2O, S—(CH2)rOC(O)NHCH2CH2O, or S(CH2)rNHC(O)NHCH2CH2O, and (b) from about 5% to about 80% of at least one of: (i) an alkyl (meth)acrylate monomer having a linear, branched or cyclic alkyl group of from about 6 to about 18 carbons; or (II) a monomer of formula (II) (R2)2N—R3—O—C(O)—C(R)?CH2??(II) wherein R is H, Cl, F or CH3, each R2 is independently a C1 to C4 alkyl; and R3 is a divalent linear or branched C1 to C4 alkylene; and wherein the nitrogen is from about 40% to 100% salinized; or (iii) a mixture thereof.Type: GrantFiled: May 20, 2008Date of Patent: November 27, 2012Assignee: E.I. du Pont de Nemours and CompanyInventors: Weiming Qiu, Anilkumar Raghavanpillai, Peter Michael Murphy, Jessica Louise Flatter
-
Publication number: 20120276482Abstract: A radiation sensitive resin composition includes a first polymer having a group represented by a following formula (1), and a radiation sensitive acid generator. n is an integer of 2 to 4. X represents a single bond or a bivalent organic group. A represents a (n+1) valent linking group. Each Q independently represents a group that includes an alkali-dissociable group.Type: ApplicationFiled: April 27, 2012Publication date: November 1, 2012Applicant: JSR CorporationInventors: Takakazu Kimoto, Mitsuo Sato, Yusuke Asano, Tomohiro Kakizawa
-
Publication number: 20120271025Abstract: A method of preparing polydiorganosiloxane polyoxamide copolymers is described. These copolymers have at least one polydiorganosiloxane segment and at least two aminooxalylamino groups. The method can be used in the presence or absence of a solvent. Intermediates involved in the preparation of the copolymers are also described.Type: ApplicationFiled: December 22, 2010Publication date: October 25, 2012Applicant: 3M Innovative Properties CompanyInventors: David S. Hays, Richard G. Hansen
-
Patent number: 8263800Abstract: The present invention comprises a compound comprising Formula 1A, 1B, or 1C (Ra—O—CO—)2X??Formula 1A Ra—O—CO—X—CO—O—(CH2CH2)Rf??Formula 1B Ra—O—CO—X—CO—O—R??Formula 1C wherein Ra is the group Rf(CH2CF2)d—(CgH2g)—; RfOCF2CF2—(CgH2g)—; RfOCFHCF2O(CH2CH2O)v—(CgH2g)—; RfOCFHCF2O(CwH2w); RfOCF(CF3)CONH—(CgH2g); or Rf(CH2)h[(CF2CF2)i(CH2CH2)j]k; Rf is CcF(2c+1); d is 1 to about 3; g is 1 to 4; v is 1 to about 4; w is from about 3 to about 12; h is 1 to about 6; i, j, and k are each independently 1, 2, or 3, or a mixture thereof; provided that the total number of carbon atoms in group (vi) is from about 8 to about 22; X is a linear or branched difunctional alkyl sulfonate group —CeH(2e?1)(SO3M)-, wherein e is 2 or 3; M is a monovalent cation selected from the group consisting of hydrogen, ammonium, alkali metal, or alkaline earth metal; R is H or a linear or branched alkyl group CbH(2b+1)—; and b is from 1 to about 18.Type: GrantFiled: July 1, 2008Date of Patent: September 11, 2012Assignee: E. I. du Pont de Nemours and CompanyInventors: Peter Michael Murphy, Tracy Hewat
-
Publication number: 20120226070Abstract: A fluorine-containing unsaturated carboxylic acid represented by formula (1), wherein R1 represents a polymerizable double-bond containing group, R3 represents a fluorine atom or fluorine-containing alkyl group, and W represents a bivalent linking group. This compound can provide a fluorine-containing polymer compound that has a weight-average molecular weight of 1,000-1,000,000 and contains a repeating unit represented by formula (2), wherein R3 and W are defined as above, each of R4, R5 and R6 independently represents a hydrogen atom, fluorine atom or monovalent organic group, at least two of R4, R5 and R6 may be combined to form a ring. This polymer compound can provide a chemically amplified resist composition that is transparent to KrF or ArF excimer laser light and has a high resolution and is capable of forming a pattern having a rectangular section with no swelling.Type: ApplicationFiled: May 17, 2012Publication date: September 6, 2012Applicant: Central Glass Company, LimitedInventors: Yoshimi ISONO, Jonathan Joachim JODRY, Satoru NARIZUKA, Kazuhiro YAMANAKA
-
Publication number: 20110319516Abstract: Release agents with increased affinity toward nano-imprint lithography template surfaces interact strongly with the template during separation of the template from the solidified resist in a nano-imprint lithography process. The strong interaction between the surfactant and the template surface reduces the amount of surfactant pulled off the template surface during separation of a patterned layer from the template in an imprint lithography cycle. Maintaining more surfactant associated with the surface of the template after the separation of the patterned layer from the template may reduce the amount of surfactant needed in a liquid resist to achieve suitable release of the solidified resist from the template during an imprint lithography process. Strong association of the release agent with the surface of the template facilitates the formation of ultra-thin residual layers and dense fine features in nano-imprint lithography.Type: ApplicationFiled: September 7, 2011Publication date: December 29, 2011Applicant: MOLECULAR IMPRINTS, INC.Inventors: Frank Y. Xu, Weijun Liu
-
Publication number: 20100286433Abstract: Novel improved processes for the production and isolation of methylidene malonates via direct and indirect adduct processes.Type: ApplicationFiled: May 6, 2010Publication date: November 11, 2010Inventors: Bernard M. Malofsky, Chris Mariotti
-
Patent number: 7692035Abstract: A compound comprising Formula 2A, 2B, or 2C (Ra—O—CO—)2Y Formula 2A Ra—O—CO—Y—CO—O—(CH2CH2)Rf Formula 2B Ra—O—CO—Y—CO—O—R Formula 2C wherein Ra is the group (i) Rf(CH2CF2)d—(CgH2g)—; (ii) RfOCF2CF2—(CgH2g)—; (iii) Rf OCFHCF2O(CH2CH2O)v—(CgH2g)—; (iv) RfOCFHCF2O(CwH2w)—; (v) RfOCF(CF3)CONH—(CgH2g)—; or (vi) Rf(CH2)h[(CF2CF2)i(CH2CH2)j]k; each Rf is independently CcF(2c+1); c is 2 to about 6; d is 1 to about 3; g is 1 to 4; v is 1 to about 4; w is from about 3 to about 12; h is 1 to about 6; i, j, and k are each independently 1, 2, or 3, or a mixture thereof; provided that the total number of carbon atoms in group (vi) is from about 8 to about 22; Y is a linear or branched diradical having olefinic unsaturation of the formula —CeH(2e-2)— wherein e is 2 or 3; R is H or a linear or branched alkyl group CbH(2b+1)—; and b is from 1 to about 18.Type: GrantFiled: July 1, 2008Date of Patent: April 6, 2010Assignee: E. I. du Pont de Nemours and CompanyInventors: Peter Michael Murphy, Tracy Hewat
-
Patent number: 7671232Abstract: A method for fabricating a high specific surface area mesoporous alumina is disclosed, which includes the following steps: (a) providing a water solution containing an aluminum salt and a fluoro-surfactant; (b) adding concentrated hydrochloric acid to adjust the PH value of the solution to about 6.0 to 8.0; (c) aging the solution at 70° C. to 110° C. for 12 to 20 hours; (d) washing the precipitate with water; (e) washing the precipitate with an organic solvent; (f) drying the precipitate; and (g) sintering the precipitate in a furnace of 500° C. to 1000° C.Type: GrantFiled: October 5, 2005Date of Patent: March 2, 2010Assignee: Industrial Technology Research InstituteInventors: Tz-Bang Du, Yung-Chan Lin, Bor-Wen Chen, Shyue-Ming Jang
-
Publication number: 20100004478Abstract: A compound comprising Formula 5 RfOCFHCF2O(CH2CH2O)v—H??Formula 5 wherein Rf is CcF(2c+1); c is 2 to about 6; and v is 2 to about 4; and a process for its preparation comprising contacting a compound of Formula 6 Rf—O—CF?CF2??Formula 6 wherein Rf is CcF(2c+1), and c is 2 to about 6, with a compound of Formula 7 HO—(CH2CH2O)v—H??Formula 7 wherein v is 2 to about 4.Type: ApplicationFiled: July 1, 2008Publication date: January 7, 2010Applicant: E. I. du Pont de Nemours and CompanyInventor: Stephan James Mclain
-
Patent number: 6989356Abstract: To provide a lubricant for recording medium, which is advantageous not only in that it maintains excellent lubricity under various conditions for use and excellent lubricating effect over a long time, but also in that it can impart excellent transport properties and excellent abrasion resistance as well as excellent durability. For example, when C18H37—CH(CH2COOC10H6OH)COORf (wherein Rf represents a saturated or unsaturated partially-fluorinated-alkyl group) is used as a lubricant for magnetic recording medium, there can be obtained a magnetic recording medium having excellent transport properties and excellent abrasion resistance as well as excellent durability.Type: GrantFiled: April 8, 2003Date of Patent: January 24, 2006Assignee: Sony Corp.Inventors: Ken Kobayashi, Takahiro Kamei, Noriyuki Kishii, Kenichi Kurihara, Yutaka Iwamoto, Hisanori Tsuboi
-
Patent number: 6864386Abstract: Fluorinated compounds and emulsions including the compounds. The compositions are useful as oxygen carriers and surfactants. In one embodiment, the fluorinated compound is pH sensitive. In one embodiment, the fluorinated compound is a vitamin E derivative. In one embodiment, the fluorinated compound is a vitamin K derivative.Type: GrantFiled: November 20, 2002Date of Patent: March 8, 2005Assignee: Sonus Pharmaceuticals, Inc.Inventors: Yuehua Zhang, Manjari Lal, Andrew Leo, Nagesh Palepu
-
Publication number: 20030224953Abstract: To provide a lubricant for recording medium, which is advantageous not only in that it maintains excellent lubricity under various conditions for use and excellent lubricating effect over a long time, but also in that it can impart excellent transport properties and excellent abrasion resistance as well as excellent durability. For example, when C18H37—CH(CH2COOC10H6OH)COORf (wherein Rf represents a saturated or unsaturated partially-fluorinated-alkyl group) is used as a lubricant for magnetic recording medium, there can be obtained a magnetic recording medium having excellent transport properties and excellent abrasion resistance as well as excellent durability.Type: ApplicationFiled: April 8, 2003Publication date: December 4, 2003Inventors: Ken Kobayashi, Takahiro Kamei, Noriyuki Kishii, Kenichi Kurihara, Yutaka Iwamoto, Hisanori Tsuboi
-
Patent number: 6603037Abstract: Acrylic esters containing fluorine at &agr;-position and having an alkoxymethyl group introduced into the ester side chain thereof are novel. Polymers obtained from the acrylic esters are improved in transparency, acid elimination and substrate adhesion and are used to formulate chemically amplified resist compositions for lithographic microfabrication.Type: GrantFiled: November 27, 2002Date of Patent: August 5, 2003Assignees: Shin-Etsu Chemical Co., Ltd., Matsushita Electric Industrial Co., Ltd., Central Glass Co., Ltd.Inventors: Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shinji Kishimura, Kazuhiko Maeda, Michitaka Ootani, Haruhiko Komoriya
-
Publication number: 20030060571Abstract: Monofunctional polyfluorooxetane oligomers and polymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. The fluorooxetane oligomers or polymers can be copolymerized with generally cyclic ethers. Alternatively, the polyfluorooxetane oligomer or polymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties that have previously been provided by migratory chemicals such as waxes and oils.Type: ApplicationFiled: March 28, 2002Publication date: March 27, 2003Applicant: OMNOVA Solutions Inc.Inventors: Raymond J. Weinert, Guillermina C. Garcia, Aslam Malik, Roland Carlson, Robert E. Medsker
-
Publication number: 20020156200Abstract: Monofunctional polyfluorooxetane oligomers and polymers Zare prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. The fluorooxetane oligomers or polymers can be copolymerized with generally cyclic ethers. Alternatively, the poly-fluorooxetane oligomer or polymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties that have previously been provided by migratory chemicals such as waxes and oils.Type: ApplicationFiled: March 28, 2002Publication date: October 24, 2002Applicant: OMNOVA Solutions Inc.Inventors: Raymond J. Weinert, Guillermina C. Garcia, Aslam Malik, Roland Carlson, Robert E. Medsker
-
Publication number: 20020143112Abstract: Monofunctional polyfluorooxetane oligomers and polymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. The fluorooxetane oligomers or polymers can be copolymerized with generally cyclic ethers. Alternatively, the polyfluorooxetane oligomer or polymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties that have previously been provided by migratory chemicals such as waxes and oils.Type: ApplicationFiled: March 28, 2002Publication date: October 3, 2002Applicant: OMNOVA Solutions Inc.Inventors: Raymond J. Weinert, Guillermina C. Garcia, Aslam Malik, Roland Carlson, Robert E. Medsker
-
Publication number: 20020137853Abstract: Monofunctional polyfluorooxetane oligomers and polymers are prepared by the cationic polymerization of fluorooxetane monomers with a monoalcohol. The fluorooxetane oligomers or polymers can be copolymerized with generally cyclic ethers. Alternatively, the polyfluorooxetane oligomer or polymer having a single hydroxyl end group can be functionalized with a variety of compounds so as to yield a functional end group such as an acrylate, a methacrylate, an allylic, an amine, etc., with the functionalized oligomer or polymer being suitable for use in radiation curable or thermal curable coating compositions. These functionalized polymers can be copolymerized and cured to provide improvements in wetting and surface properties that have previously been provided by migratory chemicals such as waxes and oils.Type: ApplicationFiled: March 27, 2002Publication date: September 26, 2002Applicant: OMNOVA Solutions Inc.Inventors: Raymond J. Weinert, Guillermina C. Garcia, Aslam Malik, Roland Carlson, Robert E. Medsker
-
Patent number: 6087010Abstract: Fluorine-containing polyfunctional (meth)acrylate represented by the formula (1), as well as a composition, a low refractivity material and a reflection reducing film in which the (meth)acrylate is utilized: ##STR1## wherein X stands for a fluoroalkyl group of C1-14 having 3 or more F, or a fluorocycloalkyl group of C3-14 having 4 or more F; Y.sup.1, Y.sup.2, and Y.sup.3 stand for H, an acryloyl group or a methacryloyl group, and at least two of Y.sup.1, Y.sup.2, and Y.sup.3 stand for an acryloyl group or a methacryloyl group; Z stands for H or an alkyl group of C1-3; and n and m is an integer of 0 or 1, and n+m=1.Type: GrantFiled: February 9, 1998Date of Patent: July 11, 2000Assignee: NOF CorporationInventors: Tatsurou Yoshida, Yasuhiro Kimura, Kenji Watanabe, Tomoyuki Ikeda, Tetsuya Itoh, Yoshitaka Goto
-
Patent number: 6002039Abstract: Acetylenic maleates, fumarates and related derivative compounds are new compositions of matter having the formula:R.sub.1 O.sub.2 C--CH.dbd.CH--CO.sub.2 R.sub.2wherein R.sub.1 may be an organic moiety containing at least two carbon atoms triply bonded one to the other as:--C.tbd.C--and R.sub.2 may be hydrogen, an organic moiety, or R.sub.1 ; suitable for use as liquid injection molding inhibitors either singly or in combination with themselves or other liquid injection molding inhibitors when used for the process of liquid injection molding curable compositions enabling an increase in the size of articles manufactured therefrom, which new compositions of matter cure into the polymerizable or curable resins thereby creating new compositions of matter as cured resins from which said articles of manufacture are produced.Type: GrantFiled: January 18, 1996Date of Patent: December 14, 1999Assignee: General Electric CompanyInventors: Philip J. McDermott, Michael J. O'Brien, Edward M. Jeram
-
Patent number: 5977390Abstract: Fluorinated diesters useful for imparting repellency of low surface tension fluids to thermoplastic polymers of formulaeR.sub.f --O--C(O)--(CH.sub.2).sub.n --C(O)--O--R.sub.1 ;R.sub.f --O--C(O)--CH.sub.2 --CH(R.sub.2)--C(O)--O--R.sub.f ;a mixture of R.sub.f --O--C(O)--(CH.sub.2).sub.n --C(O)--O--R.sub.1,R.sub.f --O--C(O)--(CH.sub.2).sub.n --C(O)--R.sub.f, and R.sub.1 --O--C(O)--(CH.sub.2).sub.n --C(O)--O--R.sub.1 ;and [F(CF.sub.2).sub.x CH.sub.2 CH.sub.2 --S--CH.sub.2 ].sub.2 --C--[CH.sub.2 --O--C(O)--C.sub.17 H.sub.35 ].sub.2 ;wherein R.sub.f is F(CF.sub.2).sub.x --(CH.sub.2).sub.m wherein x is 4 to 20 and m is 2 to 6, or F(CF.sub.2).sub.x --SO.sub.2 N(R.sub.3)--R.sub.4 wherein x is 4 to 20; R.sub.1 is a saturated aliphatic hydrocarbon with an average carbon chain length of 12 to 66 carbons; R.sub.2 is a saturated or unsaturated hydrocarbon with 1-20 carbon atoms; R.sub.3 is an alkyl radical having 1 to 4 carbon atoms; R.sub.Type: GrantFiled: May 14, 1997Date of Patent: November 2, 1999Assignee: E. I. du Pont de Nemours and CompanyInventors: Kimberly Gheysen Raiford, Theodor Arthur Liss, Edward James Greenwood, Jack Robert Kirchner
-
Patent number: 5905127Abstract: Mesogens are provided based on substituted unsaturated carboxylic acids such as acrylic and methacrylic acid. Substitution of a variety of hydrophobic tails onto the carboxylic acid or acid derivative via the vinyl carbon proximal to the carbonyl of the carboxylic acid results in mesogens that are capable of forming thermotropic and single-phase lyotropic mesophases over a broad range of compositions. The mesophases can be polymerized to lock in the ordered phases.Type: GrantFiled: April 8, 1997Date of Patent: May 18, 1999Assignee: The University of Southern MississippiInventors: Robert Y Lochhead, Lon J Mathias
-
Patent number: 5643908Abstract: Compounds having inhibitory activity against inhibitory activity against type IV collagenase and are useful as angiogenesis, cancer infiltration or cancer metastasis inhibitors. The compounds have the formula: ##STR1## in which R.sup.1 represents a group of formula: --OR.sup.3 (wherein R.sup.3 represents a hydrogen atom or an alkyl group),--NR.sup.4 R.sup.5 (wherein R.sup.4 and R.sup.5 each represents a hydrogen atom, an alkyl or alkoxy group),--NHCH(R.sup.6 COR.sup.7 (wherein R.sup.6 represents a hydrogen atom or an alkyl group having 1 to 4 carbon atoms, and R.sup.7 represents an alkyl group),--NHCH(R.sup.6)COOR.sup.8 (wherein R.sup.8 represents an alkyl group) or--NHCH(R.sup.6)CONR.sup.9 R.sup.10 (wherein R.sup.9 and R.sup.10 each represents a hydrogen atom or an alkyl group, or NR.sup.9 R.sup.10 together represent a heterocyclic ring group); andR.sup.2 represents a hydrogen atom, an alkyl or aralkyl group.Type: GrantFiled: June 27, 1994Date of Patent: July 1, 1997Assignee: Sankyo Company, LimitedInventors: Yukio Sugimura, Kazuhiko Tamaki, Tomowo Kobayashi, Kazuhiko Tanzawa
-
Patent number: 5606101Abstract: A compound of the formula (I) or its pharmaceutically acceptable salt or ester: ##STR1## and intermediates thereof.Type: GrantFiled: October 6, 1995Date of Patent: February 25, 1997Assignee: Banyu Pharmaceutical Co., Ltd.Inventors: Takashi Nomoto, Masahiro Hayashi, Jun Shibata, Yoshikazu Iwasawa, Morihiro Mitsuya, Yoshiaki IIda, Katsumasa Nonoshita, Yasufumi Nagata
-
Fluorine-containing carboxylic acid amine salt and a magnetic recording medium with the same thereon
Patent number: 5604032Abstract: A fluorine-containing carboxylic acid amine salt of Formula A below: ##STR1## wherein R.sup.1 denotes an aliphatic alkyl group or an aliphatic alkenyl group with 6 to 30 carbons; R.sup.2 denotes a group selected from the group consisting of a fluoroalkyl group with 3 to 30 carbons, a fluoroalkenyl group with 3 to 30 carbons, a fluorophenyl group with 6 to 18 carbons, and a fluoroalkylether group with 5 to 50 carbons; R.sup.3 and R.sup.4 each denotes a saturated or unsaturated hydrocarbon chain with 1 to 20 carbons; R.sup.5 denotes either a fluoroalkyl group with 3 to 30 carbons or a fluoroalkenyl group with 3 to 30 carbons; n denotes 0 or 1; X denotes hydrogen or -(R.sup.6) -R.sup.7 ; and Y denotes hydrogen or -(R.sup.8) -R.sup.9, where R.sup.6 and R.sup.8 each denotes a saturated or unsaturated hydrocarbon chain with 1 to 20 carbons, and R.sup.7 and R.sup.9 each denotes a fluoroalkyl group with 3 to 30 carbons or a fluoroalkenyl group with 3 to 30 carbons.Type: GrantFiled: October 13, 1994Date of Patent: February 18, 1997Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yoshiaki Kai, Yukikazu Ohchi -
Patent number: 5510513Abstract: A fluorine containing diester of an alkyl- or alkenylsuccinic acid having the general formula: ##STR1## wherein R.sub.1 represents an alkyl or alkenyl group, at least one of R.sub.2 and R.sub.3 is a fluoroalkyl or fluoroalkenyl group, the remaining of R.sub.2 and R.sub.3 is an alkyl or alkenyl group, k, l, m and n are 0 or an integer not less than 1, respectively, and k+l are an integer of not less than 2, which provides an excellent lubricating property under any environment from low humidity to high humidity, and is particularly suitable for use in a magnetic recording medium.Type: GrantFiled: April 5, 1994Date of Patent: April 23, 1996Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yoshiaki Kai, Kiyosi Takahasi, Yukikazu Ohchi
-
Patent number: 5506309Abstract: This invention pertains to perfluoropolyethers and perhalogenated chlorofluoropolyethers that can be prepared by fluorinating addition polymers made by polymerizing epoxides.Type: GrantFiled: June 6, 1995Date of Patent: April 9, 1996Assignee: Exfluor Research CorporationInventors: Thomas R. Bierschenk, Timothy Juhulke, Hajimu Kawa, Richard J. Lagow
-
Patent number: 5493049Abstract: This invention provides 1) novel reactive fluorinated compounds derived from a specified class of telomers or cotelomers of fluoroolefins; and 2) stable products and stable polymers thereof obtained by reaction or polycondensation of the novel reactive fluorinated compounds with specified classes of hydrogenated aliphatic, alicyclic, aromatic reactive compounds, telechelic oligomers and block polymers wherein said stable products and polymers contain hetero atoms such as oxygen, sulfur or nitrogen and are characterized by high thermal and chemical resistance.Type: GrantFiled: May 20, 1994Date of Patent: February 20, 1996Assignee: Dow Corning CorporationInventor: Gerardo Caporiccio
-
Patent number: 5424474Abstract: The present invention relates to fluorinated carboxylic acid esters of phosphono- and phosphinocarboxylic acids containing hydroxyl and/or mercapto groups, their use as waterproofing and/or oil-repellency agents, and a method for their preparation.Type: GrantFiled: December 23, 1993Date of Patent: June 13, 1995Assignee: Bayer AGInventors: Klaus Pohmer, Rainer Weber, Hans-Dieter Block, Hans-Heinrich Moretto
-
Patent number: 5391814Abstract: A fluorine-containing alkylsuccinic acid diester of the formula: ##STR1## wherein R.sub.1 is an aliphatic alkyl or alkenyl group, and one of R.sub.2 and R.sub.3 is a fluoroalkylether group and the other is a fluoroalkyl group, a fluoroalkenyl group, a fluorophenyl group, an aliphatic alkyl group or-an aliphatic alkenyl group, which has excellent lubricity in an atmosphere having low to high humidity.Type: GrantFiled: March 29, 1993Date of Patent: February 21, 1995Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yoshiaki Kai, Naoko Mizuno
-
Patent number: 5385902Abstract: Antimicrobial compounds of the formula ##STR1## wherein A is selected from the group consisting of alkyl; phenyl; alkoxy; phenoxy; benzyloxy; monoalkylamino; dialkylamino; cyclic amino, anilino; heterocyclic; amino substituted with heterocyclic ring, methods of making and using said compounds, and compositions comprising said compounds are disclosed.Type: GrantFiled: September 1, 1993Date of Patent: January 31, 1995Assignee: Rohm and Haas CompanyInventor: Adam C. Hsu
-
Patent number: 5350878Abstract: This invention provides 1) novel reactive fluorinated compounds derived from a specified class of telomers or cotelomers of fluoroolefins; and 2) stable products and stable polymers thereof obtained by reaction or polycondensation of the novel reactive fluorinated compounds with specified classes of hydrogenated aliphatic, alicyclic, aromatic reactive compounds, telechelic oligomers and block polymers wherein said stable products and polymers contain hetero atoms such as oxygen, sulfur or nitrogen and are characterized by high thermal and chemical resistance.Type: GrantFiled: February 10, 1993Date of Patent: September 27, 1994Assignee: Dow Corning CorporationInventor: Gerardo Caporiccio
-
Patent number: 5288750Type: GrantFiled: January 31, 1991Date of Patent: February 22, 1994Assignee: Orion-yhtyma OyInventors: Pentti Pohto, Paivi A. Aho, Reijo J. Backstrom, Erkki J. Honkanen, Inge-Britt Y. Linden, Erkki A. O. Nissinen
-
Patent number: 5188747Abstract: A fluorine-containing compound represented by the general formula [I]: ##STR1## wherein R.sub.f, X, Y, W, Z, R.sub.1 -R.sub.3, l, m and n are as defined in the specifications. There are disclosed fluorine-containing compounds of specific structure which have in the molecule a fluoroalkyl ether end group, an aliphatic hydrocarbon end group and a carboxyl end group, and have molecular weights of hundreds to about 3,000; and a process for producing the fluorine-containing compounds. These fluorine-containing compounds can be utilized in magnetic recording media in the form of a lubricant composition.Type: GrantFiled: March 20, 1991Date of Patent: February 23, 1993Assignee: Matsushita Electric Industrial Co., Ltd.Inventors: Yoshiaki Kai, Takashi Suzuki
-
Patent number: 5142098Abstract: The invention relates to novel monoesters and diesters of 9,10-endoethano-9,10-dihydroanthracene-11,11-dicarboxylic acid.These novel monoesters and diesters correspond to the following structural chemical formula (II): ##STR1## in which R.sup.1 and R.sup.2 are identical or different and can represent H, an alkali metal or alkaline earth metal atom, a linear or branched alkyl group having from 1 to 6 carbon atoms, an alicyclic group having form 3 to 6 carbon atoms, an alkenyl group having from 2 to 6 carbon atoms, defined in their cis or trans variety, or an alkynyl group having from 2 to 6 carbon atoms, the said groups optionally being substituted by one or more functional groups such as ether, epoxide, halogeno, cyano, ester, aldehyde, ketone, aryl etc., where R.sup.1 and R.sup.2 cannot be H or ethyl simultaneously. These addition products constitute valuable intermediates for the preparation of methylidenemalonates in high yields and with a high purity.Type: GrantFiled: March 23, 1990Date of Patent: August 25, 1992Assignee: Laboratoires UPSAInventors: Nicole Bru-Magniez, Christian De Cock, Jacques Poupaert, Jean-Luc De Keyser, Pierre Dumont
-
Patent number: 5116544Abstract: This invention provides (i) novel hexafluoroneopentyl alcohol, (ii) its derivatives, i.e., hexafluoroneopentyl (meth)acrylate, (iii) fluorinated polymers comprising said acrylate as the monomer component, and (iv) optical materials comprising said fluorinated polymers.Type: GrantFiled: August 4, 1989Date of Patent: May 26, 1992Assignee: Daikin Industries, Ltd.Inventors: Hiroshi Inukai, Takashi Yasuhara, Takahiro Kitahara
-
Patent number: 5073570Abstract: The new compositions of matter of the present invention comprise compounds having one of the following formulas: ##STR1## wherein: R is hydrogen or methyl;n is 1 to 16;R.sub.1 and R.sub.2 are defined as R.sub.3 and R.sub.4 below or are joined to form a cycloalkyl, cycloalkenyl, aromatic or a heterocyclic ring containing an oxygen, nitrogen or sulfur atom or an alkoxy, amino, carboxyl, halo, hydroxyl, keto or a thiocarboxyl substituted derivative thereof;R.sub.3 and R.sub.4 are independently selected from (A) hydrogen, alkyl, cycloalkyo, alkenyl, cycloalkenyl, aryl, a heterocyclic ring containing an oxygen, nitrogen or sulfur atom, alkoxy, amino, carboxyl, halo, hydroxyl, keto or a thiocarboxyl and (B) substituted derivatives of the alkyl, cycloalkyl, alkenyl, cycloalkenyl, aryl and the heterocyclic ring wherein the substitutions are alkyl, cycloalkyl, alkenyl, cycloalkenyl, aryl, alkoxy, amino, carboxyl, halo, hydroxyl, keto or a thiocarboxyl;W may be a single bond, oxygen, NR.sub.5, or (CR.sub.6 R.sub.7).Type: GrantFiled: February 16, 1989Date of Patent: December 17, 1991Assignee: Lonza Inc.Inventor: Chuen-Ing J. Tseng
-
Patent number: 5023380Abstract: Compounds have a structure represented by Formula I:CF.sub.2 =CF-X-R-(X-CF=CF.sub.2).sub.mwherein R represents an unsubstituted or inertly substituted hydrocarbyl group; each X is independently selected from the group consisting of groups having at least one non-carbon atom between R and --CF=CF.sub.2 ; and m is an integer of from 1 to about 3. Polymers formed from such compounds are also prepared. The compounds are preferably prepared by a method by a process comprising the steps of:(a) forming a salt having anion corresponding to a compound of Formula II:HX--R--(XH).sub.m ;wherein X, R and m are as defined for Formula I;(b) reacting the salt with a 1,2-dihalo-1,1,2, 2-tetrafluoroethane wherein the halo groups are iodine, bromine, chlorine or mixtures thereof, at least one halo group being bromine or iodine, to form a compound of Formula III:Z-CF.sub.2 CF.sub.2 -X-R-(X-CF.sub.2 CF.sub.2 - Z).sub.Type: GrantFiled: June 9, 1989Date of Patent: June 11, 1991Assignee: The Dow Chemical CompanyInventors: David A. Babb, Bobby R. Ezzell, Katherine S. Clement
-
Patent number: 4960925Abstract: A number of novel peracid precursors each have the general structure: ##STR1## wherein: Z is a leaving group, the conjugate acid of the leaving group being in the range of from about 4 to 15; R is a substituted or unsubstituted alkyl or alkenyl group having from about 1 to 18 carbon atoms; and M is hydrogen or an alkali or alkaline earth metal. A method is also disclosed for synthesizing a product as represented above wherein succinic anhydride, including an R constituent as defined above is dissolved in a water-miscible, non-nucleophilic solvent and an acid including a Z constituent as defined above is neutralized and deprotonated to form a nucleophile, the substituted anhydride and the nucleophile being combined to form the product. The product is a component in a dry bleach product, optionally including other adjuncts.Type: GrantFiled: October 24, 1988Date of Patent: October 2, 1990Assignee: The Clorox CompanyInventors: Dale S. Steichen, Hao Ku, Sheldon N. Lewis
-
Patent number: 4931584Abstract: The invention relates to novel monoesters and diesters of 9,10-endoethano-9,10-dihydroanthracene-11,11-dicarboxylic acid.These novel monoesters and diesters correspond to the following structural chemical formula (II): ##STR1## in which R.sup.1 and R.sup.2 are identical or different and can represent H, an alkali metal or alkaline earth metal atom, a linear or branched alkyl group having from 1 to 6 carbon atoms, an alicyclic group having from 3 to 6 carbon atoms, an alkenyl group having from 2 to 6 carbon atoms, defined in their cis or trans variety, or an alkynyl group having from 2 to 6 carbon atoms, the said groups optionally being substituted by one or more functional groups such as ether, epoxide, halogeno, cyano, ester, aldehyde, ketone, aryl etc., where R.sup.1 and R.sup.2 cannot be H or ethyl simultaneously. These addition products constitute valuable intermediates for the preparation of methylidenemalonates in high yields and with a high purity.Type: GrantFiled: March 1, 1988Date of Patent: June 5, 1990Assignee: Laboratoires UPSAInventors: Nicole Bru-Magniez, Christian De Cock, Jacques Poupaert, Jean-Luc De Keyser, Pierre Dumont
-
Patent number: 4913848Abstract: This invention relates to a process for treating a first product which contains monobromopentaerythritol, dibromoneopentyl glycol and tribromoneopentyl alcohol to yield a second product having a dibromoneopentyl glycol content, on a weight percent basis, greater than that of the first product. The process features forming a stirrable mass from the first product and a solvent system in which, at a temperature within the range of from about 0.degree. C. to about 40.degree. C., the monobromopentaerythritol and the tribromoneopentyl alcohol are more soluble than the dibromoneopentyl glycol and in which at least 85% of the dibromoneopentyl glycol in the mass is insoluble; maintaining the reaction mass within the aforementioned temperature range to realize an insoluble portion and a solvent and solute portion; and separating the insoluble portion and the solvent and solute portion without substantial precipitation of the solute from the solvent and solute portion.Type: GrantFiled: October 12, 1988Date of Patent: April 3, 1990Assignee: Ethyl CorporationInventor: John Y. Lee
-
Patent number: 4898970Abstract: This invention relates to a process for producing a fluorinated ester containing a trifluoromethyl group by esterification in the presence of .gamma.-butyrolactone as a solvent, and more particularly a process or producing a fluorinated ester containing a trifluoromethyl group which is useful as a raw material of various fluorine containing compound.Type: GrantFiled: February 1, 1983Date of Patent: February 6, 1990Assignees: Onoda Cement Co., Ltd., Tosoh CorporationInventors: Eiji Ogura, Kunihiro Mito, Shoji Arai
-
Patent number: 4717494Abstract: A liquid thermal accumulator composition comprising a dicarboxylic acid anhydride, an alcohol and a monoester of the dicarboxylic acid and the alcohol. A process for accumulation of thermal energy utilizing said composition is also disclosed.Type: GrantFiled: June 25, 1986Date of Patent: January 5, 1988Assignee: UBE Industries, Ltd.Inventors: Hiroshi Itatani, Mikito Kashima, Masami Aikawa
-
Patent number: 4668710Abstract: Included are trihalovinyl polyol ethers. The compositions have pendant 1,2,2-trihaloethenyl moieties. The compositions may be low viscosity oils or highly polymeric such as incorporated with a urethane or other polymers. One of the uses of the compositions is as flame retardants which may have high thermal stability and scorch resistance.Type: GrantFiled: December 23, 1985Date of Patent: May 26, 1987Assignee: The Dow Chemical CompanyInventors: Chester E. Pawloski, William J. Kruper, Jr.
-
Patent number: 4650913Abstract: Reaction of a perfluorinated iodide with an olefin initiated by a sulfinate salt to prepare fluorinated iodide and diiodide monomers and surface active agents.Type: GrantFiled: November 29, 1984Date of Patent: March 17, 1987Assignee: E. I. Du Pont de Nemours and CompanyInventor: Andrew E. Feiring