Plural Rings Bonded Directly To The Same Acyclic Carbon In Acid Moiety Patents (Class 560/57)
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Publication number: 20150115199Abstract: The present description relates to a polymerizable liquid crystal compound, a polymerizable liquid crystal composition including the same, and an optically anisotropic body.Type: ApplicationFiled: April 19, 2013Publication date: April 30, 2015Inventors: Dai Seung Choi, Sung Ho Chun, Dong Woo Yoo, Mi Ra Hong, Kyung Chang Seo, Hyeong Bin Jang, Jung Hyun Kim, Min Hyung Lee, Eun Seok Park
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Publication number: 20150119458Abstract: The present invention discloses a 4-((substituted phenyl)difluoromethyl)phenoxycarboxylic acid derivative and preparation process and use thereof. More specifically, the present invention relates to a compound of the following formula I, which is defined in the specification. The compounds according to the present invention can be used as PPAR agonists, and demonstrates a strong effect on reducing the levels of total cholesterol (TC), triglyceride (TG), and low density lipoprotein cholesterol (LDL-C) in blood plasma, and thus the compound according to the present invention can be used in the preparation of a medicament for treating or preventing hyperlipoidemia or cardio-cerebrovascular diseases caused by hyperlipoidemia, such as diabetes, atherosclerosis, stroke, coronary heart disease, etc. The present invention also relates to a novel intermediate compound for the preparation of the compound of formula I and preparation method thereof.Type: ApplicationFiled: April 25, 2013Publication date: April 30, 2015Applicant: Zhejiang Hisun Pharmaceutical Co., Ltd.Inventors: Hua Bai, Jian Hong, Lifeng Cai, Hegeng Wei, Xiaoyu Liu, Xiaohe Zheng
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Publication number: 20150068427Abstract: Provided is an optical film used for the optical compensation, in which additives are added to thereby have a good stability at high temperature and high humidity, a higher chromaticity, a higher Haze and a higher moisture resistance, as well as a small thickness direction retardation (Rth).Type: ApplicationFiled: May 7, 2013Publication date: March 12, 2015Inventors: Won Yeob Kim, Myoung Lae Kim, Hyuk Jun Kim, Yong Gyun Cho, Min Joung Im, Yeong Min Jo, Seung Eon Lee, Hyo Shin Kwak
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Publication number: 20150045387Abstract: Bi- and tri-aromatic compounds of the formula (I) wherein R1 to RIO and X are as defined, are Nox2 inhibitors that are useful as medicaments for the treatment of a disease or condition selected from: cardiovascular diseases, respiratory diseases, inflammatory diseases, cancers, ageing and age related disorders, kidney diseases, neurodegenerative diseases, diabetes and conditions associated with diabetes. The compounds, their preparation and pharmaceutical compositions comprising them are disclosed.Type: ApplicationFiled: September 17, 2012Publication date: February 12, 2015Inventors: Jian-Mei Li, Brendan Howlin, Daniel Nathan Meijles
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Publication number: 20140371310Abstract: Disclosed herein are compounds and compositions useful for reducing the risk of infection. In particular, disclosed herein are mandelic acid condensation polymers, compositions comprising such compounds, processes for producing such compounds, and methods of using such compounds.Type: ApplicationFiled: November 30, 2012Publication date: December 18, 2014Inventors: Robert A. Anderson, JR., Xiao-Hui Diao, Lourens J.D. Zaneveld, Calvin J. Chany, II, Aleksej Krunic, Donald P. Waller, Duane L. Venton, Sanjay Jain
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Publication number: 20140336259Abstract: The present document describes a phytochemical isolated from maple syrup and composition comprising the same. More specifically, the document describes an antioxidant phytochemical compound, derivates thereof, and composition comprising the same. The document also describes a process of synthesizing the antioxidant phytochemical compound.Type: ApplicationFiled: June 11, 2012Publication date: November 13, 2014Inventors: Navindra Seeram, Julie Barbeau, Genevieve BeLand, Keykavous Parang
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Patent number: 8846292Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.Type: GrantFiled: December 29, 2011Date of Patent: September 30, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
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Patent number: 8802887Abstract: The present invention relates to a method for the crystallization of n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate, to a method for the production of pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate and to specific pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate.Type: GrantFiled: April 17, 2008Date of Patent: August 12, 2014Assignee: BASF SEInventors: Samantha Champ, Manfred Hetterich, Günther Gottwald
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Patent number: 8748078Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.Type: GrantFiled: August 30, 2010Date of Patent: June 10, 2014Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
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Publication number: 20130310595Abstract: The present invention provides a compound useful as a synthetic intermediate for an anti-HIV agent having an integrase inhibitory activity, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate. Specifically, for example, a compound represented by the formula (2?): wherein R is a fluorine atom or a methoxy group, and R400 is a hydrogen atom or a C1-C4 alkyl group, or a salt thereof, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate.Type: ApplicationFiled: November 21, 2012Publication date: November 21, 2013Applicant: JAPAN TOBACCO INC.Inventor: Japan Tobacco Inc.
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Publication number: 20130228332Abstract: Novel derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups unmodified or modified with terminal hydrophilic groups, preparation of such compounds and use thereof, especially for mineral oil production.Type: ApplicationFiled: November 21, 2012Publication date: September 5, 2013Inventors: Sophie Maitro-Vogel, Roman Benedikt Raether, Markus Hansch
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Patent number: 8404840Abstract: The present invention relates to improved processes for the preparation of endolthelin receptor antagonists darusentan and ambrisentan, their salts and intermediates. Processes for the preparation of darusentan and ambrisentan comprise reacting benzophenone with a compound of Formula-3 to provide a compound of Formula-4, which on in-situ treatment with methanol and a suitable acid provides a compound of Formula-5; hydrolyzing the compound of Formula-5 to provide a compound of Formula-6; resolving the compound of Formula-6 to provide a compound of Formula-7; esterifying the compound of Formula-7 to provide a compound of Formula-8; reacting the compound of Formula-8 with a compound of Formula-9 to provide a compound of Formula-10; hydrolyzing the compound of Formula-10 to provide darusentan or ambrisentan; and purifiying darusentan or ambrisentan to provide darusentan or ambrisentan having purity greater than 99.00% by HPLC.Type: GrantFiled: November 4, 2009Date of Patent: March 26, 2013Assignee: MSN Laboratories LimitedInventors: Manne Satyanarayana Reddy, Chakilam Nagaraju, Achampeta Kodanda Ramprasad
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Patent number: 8324244Abstract: The invention provides synthetic processes and synthetic intermediates that can be used to prepare 4-oxoquinolone compounds having useful integrase inhibiting properties.Type: GrantFiled: September 28, 2010Date of Patent: December 4, 2012Assignee: Gilead Sciences, Inc.Inventors: Eric Dowdy, Xi Chen, Steven Pfeiffer
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Patent number: 8318699Abstract: The present invention is directed to compounds that are allosteric inhibitors of tumor necrosis factor receptor I, compositions comprising such compounds, and methods of using such compounds and compositions thereof in the treatment of TNF-? mediated conditions.Type: GrantFiled: January 31, 2006Date of Patent: November 27, 2012Assignees: The Trustees Of The University Of Pennsylvania, Cephalon, Inc.Inventors: Mark I Greene, Ramachandran Murali, Xin Cheng, Raphael Ottenbrite, Yingxin Xiao
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Publication number: 20120277460Abstract: The present invention concerns the design of an environmentally friendly and efficient fluorous phase based on dendritic architectures containing short semifluorinated groups on their periphery.Type: ApplicationFiled: April 26, 2012Publication date: November 1, 2012Applicant: THE TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIAInventors: Virgil Percec, Christopher J. Wilson, Daniela A. Wilson, Andrew E. Feiring
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Patent number: 8257903Abstract: The present invention provides a compound that can be used within a resist composition, an intermediate compound for the compound, a positive resist composition, and a method for forming a resist pattern.Type: GrantFiled: August 3, 2007Date of Patent: September 4, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Daiju Shiono, Hideo Hada
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Publication number: 20120142934Abstract: A method for synthesis of secondary alcohols is provided for pharmaceutical secondary alcohol by addition of organoboronic acids with aldehydes in presence of the cobalt ion and bidentate ligands as the catalyst. In addition, an enantioselective synthesis method for secondary alcohols is also herein provided in the present invention. The present invention has advantages in using less expensive cobalt ion and commercially available chiral ligands as the catalyst, wide scope of organoboronic acids and aldehydes compatible with this catalytic reaction and achieving excellent yields and/or enantiomeric excess.Type: ApplicationFiled: March 10, 2011Publication date: June 7, 2012Inventors: Chien-Hong CHENG, Jaganathan Karthikeyan, Pang-Chi Huang
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Patent number: 8110334Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.Type: GrantFiled: November 1, 2007Date of Patent: February 7, 2012Assignee: Mitsubishi Gas Chemical Company, Inc.Inventors: Masatoshi Echigo, Dai Oguro
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Publication number: 20110319641Abstract: The present invention is directed to a novel method for preparing a synthetic intermediate for treprostinil via a stereoselective alkyne addition reaction. Also described are methods of preparing treprostinil comprising the alkyne addition reaction described herein as well as novel intermediates useful for synthesis prostacyclin derivatives, such as treprostinil.Type: ApplicationFiled: June 2, 2011Publication date: December 29, 2011Inventors: Hitesh Batra, Raju Penmasta, Vijay Sharma, Sudersan M. Tuladhar, David A. Walsh
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Publication number: 20110263854Abstract: The present invention relates to improved processes for the preparation of Endothelin receptor antagonists, their salts and intermediates.Type: ApplicationFiled: November 4, 2009Publication date: October 27, 2011Inventors: Manne Satyanarayana Reddy, Chakilam Nagaraju, Achampeta Kodanda Ramprasad
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Patent number: 8043789Abstract: A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to 15 weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R? and R? are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R?? is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.Type: GrantFiled: December 17, 2008Date of Patent: October 25, 2011Assignee: Dongjin Semichem Co., Ltd.Inventors: Jae-Woo Lee, Min-Ja Yoo, Jun-Gyeong Lee, Young-Bae Lim, Jae-Hyun Kim
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Publication number: 20110190301Abstract: Therapeutic compounds, methods, and compositions are disclosed herein for treating glaucoma and baldness in mammals. The specific compounds are described herein and are modified prostaglandin derivates.Type: ApplicationFiled: May 13, 2009Publication date: August 4, 2011Applicant: ALLERGAN, INC.Inventors: David W. Old, Vinh X. Ngo, Todd S. Gac
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Publication number: 20110172457Abstract: Disclosed are tetrakis(ether-substituted formylphenyl) expressed by General Formula (1), as well as polynuclear polyphenol derived from such tetrakis(ether-substituted formylphenyl): (In the formula, R1 represents an alkyl group with 1 to 8 carbon atoms or alkoxyl group with 1 to 8 carbon atoms, or aromatic hydrocarbon group or saturated hydrocarbon group with 1 to 8 carbon atoms having an aromatic hydrocarbon group, n represents 0 or an integer of 1 to 3, R2 represents a divalent monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms or divalent aliphatic hydrocarbon group with 1 to 8 carbon atoms that may have a monocyclic or fused-ring aromatic hydrocarbon group with 6 to 15 carbon atoms, R3 represents a hydrogen atom or alkyl group with 1 to 6 carbon atoms, A represents a tetravalent carbon atom group or tetravalent saturated hydrocarbon group with 2 or more carbon atoms, where, if A is a tetravalent saturated hydrocarbon group with 2 or more carbon atoms, the two carbon atoms iType: ApplicationFiled: June 22, 2009Publication date: July 14, 2011Applicant: HONSHU CHEMICAL INDUSTRY CO., LTD.Inventors: Akira Yoshitomo, Tatsuya Iwai
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Publication number: 20110104078Abstract: The invention includes an UV absorbing complex polyol polyester polymer that is the product of a reaction scheme that includes: (i) the esterification of a polyol and a dianhydride, wherein the esterification is carried out under conditions that facilitate substantially only anhydride opening, to form a polyester polymer comprising at least two pendant carboxylic groups, and at least two hydroxyl groups; and (ii) the reaction of at least one pendant carboxylic group and at least one terminal hydroxyl group of the polyester polymer with an epoxide having a functional group, wherein the epoxide comprises an UV absorbing moiety. Also included are linear UV absorbing complex polyol polyester polymers represented by Formula (XI): wherein R3 is independently selected from an UV absorbing moiety; R4 and R5 are each independently selected from a hydrocarbon group, and n is an integer of 1 to 1000.Type: ApplicationFiled: November 2, 2010Publication date: May 5, 2011Inventors: Rocco Burgo, Daniel Winn
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Patent number: 7927627Abstract: The present invention is directed to fibrate compositions having improved pharmacokinetic profiles and reduced fed/fasted variability. The fibrate particles of the composition have an effective average particle size of less than about 2000 nm.Type: GrantFiled: May 23, 2007Date of Patent: April 19, 2011Assignees: Elan Pharma International, Ltd., Fournier Laboratories Ireland, Ltd.Inventors: Tuula Ryde, Evan E. Gustow, Stephen B. Ruddy, Rajeev Jain, Rakesh Patel, Michael John Wilkins
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Patent number: 7858825Abstract: The invention provides compounds that are useful as linkers for solid phase synthesis and as protecting groups, and methods for producing and using the same.Type: GrantFiled: February 15, 2008Date of Patent: December 28, 2010Assignee: Colorado State University Research FoundationInventors: Michio Kurosu, Dean Crick
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Publication number: 20100266952Abstract: A cyclic compound shown by the following formula (I): wherein, of two R1s which are present on the same aromatic ring, one is a group shown by R3, and the other is a dissolution controlling group; R3s are independently hydrogen, a substituted or unsubstituted linear aliphatic hydrocarbon group having 1 to 20 carbon atoms, a substituted or unsubstituted branched aliphatic hydrocarbon group having 3 to 12 carbon atoms, a substituted or unsubstituted cyclic aliphatic hydrocarbon group having 3 to 20 carbon atoms, a substituted or unsubstituted aromatic group having 6 to 10 carbon atoms, an alkoxyalkyl group, a silyl group or a group formed by combining these groups with a divalent group.Type: ApplicationFiled: December 11, 2008Publication date: October 21, 2010Applicant: IDEMITSU KOSAN CO., LTD.Inventors: Takashi Kashiwamura, Akinori Yomogita, Mitsuru Shibata, Takanori Owada, Hirotoshi Ishii, Masashi Sekikawa, Norio Tomotsu
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Publication number: 20100137629Abstract: The present invention relates to a method for the crystallization of n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate, to a method for the production of pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate and to specific pourable or flowable particles of crystalline n-hexyl 2-(4-N,N-diethylamino-2-hydroxybenzoyl)benzoate.Type: ApplicationFiled: April 17, 2008Publication date: June 3, 2010Applicant: BASF SEInventors: Samantha Champ, Manfred Hetterich, Günther Gottwald
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Publication number: 20100121069Abstract: An electron withdrawing group substituted ?-arylolefin derivative represented by general formula (I) (in the formula, Ar1 represents an aryl group, E represents a formyl, acyl and so on) is allowed to react with an arylboronic acid represented by general formula (II) Ar2—BXmMn in the general formula (IV) RhYoL1p (Chiraphos)q (in the formula, Y represents ClO4, BF4, PF6, SbF6, OTf, halogen atom, hydroxyl group, alkoxy group or acyloxy group, L1 represents an organic ligand) to produce an optically active ?-diaryl electron withdrawing group substituted compound represented by general formula (V)Type: ApplicationFiled: July 13, 2007Publication date: May 13, 2010Inventors: Norio Miyaura, Yasunori Yamamoto, Takashi Nishikata, Takahiro Itoh
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Publication number: 20100047709Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.Type: ApplicationFiled: November 1, 2007Publication date: February 25, 2010Inventors: Masatoshi Echigo, Dai Oguro
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Publication number: 20100016597Abstract: Disclosed is a method for producing pulverized particles of a crystalline organic compound which is poorly water-soluble. Also disclosed is a pulverized organic compound particle produced by such a method. Specifically disclosed is a method for producing a poor water solubility organic compound particle for medical use, which is characterized in that a poor water solubility organic compound for medical use is mixed with a physiologically acceptable salt and a physiologically acceptable polyol, and subjected to wet milling. Also specifically disclosed is a poor water solubility organic compound particle for medical use, which is produced by such a production method.Type: ApplicationFiled: September 24, 2009Publication date: January 21, 2010Applicant: Activus Pharma Co., Ltd.Inventors: Takashi Hirokawa, Takahiro Tada
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Publication number: 20100009284Abstract: A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.Type: ApplicationFiled: June 7, 2006Publication date: January 14, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Daiju Shiono, Taku Hirayama, Hideo Hada
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Publication number: 20100010253Abstract: The present invention relates to a method of working up an aluminium-containing reaction product from the production of isopulegol by cyclization of citronellal in the presence of complex compounds, comprising at least one ligand of the formula (I), where Ar1, Ar2, Ar3, Ar4 are chosen from C6-C15-aryl or C2-C15-hetero; R1, R2, R3, R4 are chosen from H, C1-C6-alkyl, C1-C6-perfluoroalkyl, C1-C6-alkoxy, C7-C12-aralkyl, halogen, SiR5bR6bR7b, C6-C10-aryl, NR8bR9b, SR10b, NO2; and where R1 or R2 and/or R3 or R4, together with A, can form an aromatic or nonaromatic cycle; etc.; in which a) the aluminum-containing reaction product is subjected to distillative separation, b) the isopulegol-depleted bottom product is brought into close contact with an aqueous base and c) the ligand of the formula (I) is separated off from the organic phase, preferably by crystallization. Moreover, the invention relates to a method of producing isopulegol, and to a method of producing menthol.Type: ApplicationFiled: August 31, 2007Publication date: January 14, 2010Applicant: BASF SEInventors: Gunnar Heydrich, Gabriele Gralla, Klaus Ebel
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Publication number: 20090269698Abstract: The present invention provides a compound that can be used within a resist composition, an intermediate compound for the compound, a positive resist composition, and a method for forming a resist pattern.Type: ApplicationFiled: August 3, 2007Publication date: October 29, 2009Inventors: Daiju Shiono, Hideo Hada
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Publication number: 20090220886Abstract: The present invention provides a polyhydric compound represented by the formula (I): wherein R51 to R67 each independently represent a hydrogen atom etc., at least one selected from the group consisting of R1 to R5 is a group represented by the formula (II): wherein Q1 and Q2 each independently represent a fluorine atom etc., U represents a C1-C20 divalent hydrocarbon group etc., and A+ represents an organic counter ion, and the others are hydrogen atoms or groups represented by the formula (III): wherein X1 to X4 each independently represent a hydrogen atom etc., n represents an integer of 0 to 3, W represents any one of the following groups: Z1 represents a C1-C6 alkyl group etc., and ring Y represents a C3-C20 alicyclic hydrocarbon group, and a chemically amplified resist composition containing the same.Type: ApplicationFiled: February 23, 2009Publication date: September 3, 2009Applicant: SUMITOMO CHEMICAL COMPANY, LIMITEDInventors: Ichiki Takemoto, Nobuo Ando
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Publication number: 20090221527Abstract: The present invention is directed to compounds that are allosteric inhibitors of tumor necrosis factor receptor I, compositions comprising such compounds, and methods of using such compounds and compositions thereof in the treatment of TNF-? mediated conditions.Type: ApplicationFiled: January 31, 2006Publication date: September 3, 2009Applicants: CEPTION THERAPEUTICS, INC., TRUSTEES OF THE UNIVERSITY OF PENNSYLVANIAInventors: Mark I. Greene, Ramachandran Murali, Xin Cheng, Raphael Ottenbrite, Yingxin Xiao
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Publication number: 20090176995Abstract: Disclosed are soluble diarylmethanofullerene derivatives that are effective as acceptors for organic thin-film solar batteries. They help to constitute effective organic thin-film solar batteries.Type: ApplicationFiled: November 28, 2008Publication date: July 9, 2009Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA INSTITUTE OF TECHNOLOGYInventors: Takeshi Toru, Norio Shibata, Shuichi Nakamura, Tetsuo Soga, Yasuhiko Hayashi, Surya Prakash Singh
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Publication number: 20090162781Abstract: This resist composition is a resist composition containing a compound in which a portion or all of hydrogen atoms of phenolic hydroxyl groups in a polyhydric phenol compound (a) having two or more phenolic hydroxyl groups and having a molecular weight of 300 to 2,500 are substituted with at least one selected from the group consisting of acid dissociable dissolution inhibiting groups represented by the following general formulas (p1) and (p2) wherein R1 and R2 each independently represents a branched or cyclic alkyl group, and may contain a hetero atom in the structure; R3 represents a hydrogen atom or a lower alkyl group; and n? represents an integer of 1 to 3.Type: ApplicationFiled: September 30, 2005Publication date: June 25, 2009Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Hideo Hada
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Publication number: 20090155714Abstract: A photosensitive compound whose size is smaller than conventional polymer for photoresist, and which has well-defined (uniform) structure, and a photoresist composition including the same are disclosed. The photosensitive compound represented by the following formula. Also, the present invention provides a photoresist composition comprising 1 to 85 wt % (weight %) of the photosensitive compound; 0.05 to weight parts of a photo-acid generator with respect to 100 weight parts of the photosensitive compound; and 10 to 5000 weight parts of an organic solvent. In the formula, n is 0 or 1, x is 1, 2, 3, 4 or 5, y is 2, 3, 4, 5 or 6, z is 0, 1, 2, 3 or 4, R, R? and R? are independently hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms, and R?? is a hydrogen atom or hydrocarbon group of 1 to 30 carbon atoms, preferably 2 to 20 carbon atoms.Type: ApplicationFiled: December 17, 2008Publication date: June 18, 2009Inventors: Jae-Woo LEE, Min-Ja Yoo, Jun-Gyeong Lee, Young-Bae Lim, Jae-Hyun Kim
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Patent number: 7534475Abstract: A new liquid crystal compound comprises two condensed and substituted rings. The ring preferably is a five-membered heterocyclic ring. The heterocyclic ring is preferably condensed with benzene ring or an aromatic six-membered heterocyclic ring. The benzene ring or the aromatic six-membered heterocyclic ring is preferably substituted with a group comprising a cyclic structure and a chain structure. The liquid crystal compound is advantageously used in preparation of a thin phase retarder, such as a wide-ranged ?/4 plate, which gives inverse wavelength distribution. The phase retarder can be easily produced according to a simple process by using the new liquid crystal compound.Type: GrantFiled: March 8, 2005Date of Patent: May 19, 2009Assignee: Fujifilm CorporationInventors: Hideyuki Nishikawa, Ryo Hamasaki, Atsuhiro Ohkawa
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Publication number: 20090081580Abstract: A positive type resist composition for forming a high resolution resist pattern and a method of forming a resist pattern are provided which use a low-molecular-weight material as a base component, and a compound and a dissolution inhibitor that are each suitable for the positive type resist composition. Here, the compound is a non-polymer having a molecular weight of 500 to 3000, and is decomposed under the action of an acid to produce two or more molecules of a decomposition product having a molecular weight of 200 or more; the dissolution inhibitor comprises the compound; the positive type resist composition comprises the compound and the acid generator component; and the method of forming a resist pattern uses the positive type resist composition.Type: ApplicationFiled: April 17, 2006Publication date: March 26, 2009Applicant: TOKYO OHKA KOGYO CO., LTDInventors: Daiju Shiono, Taku Hirayama, Toshiyuki Ogata, Shogo Matsumaru, Hideo Hada
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Publication number: 20090039322Abstract: Disclosed herein are compounds of formula (I), compositions having compounds of formula (I) and methods of stabilizing a photodegradable polymer or compound in a composition; wherein R1, R2, and R3 are the same or different and are selected from the group consisting of C1-C30 alkyl, C3-C8 cycloalkyl, substituted alkyl, substituted cycloalkyl, ester, aryl, heteroaryl, heterocycloalkyl, substituted aryl, substituted heteroaryl, substituted heterocycloalkyl, and amino; R4, R5, R6, and R7 are each independently selected from the group consisting of hydrogen and alkoxy, wherein R4 and R5 cannot both be hydrogen and R6 and R7 cannot both be hydrogen; a, b, c, and d are each independently an integer of 1 to 4; n is an integer of 1 to 100; and s is an integer of 0 to 100.Type: ApplicationFiled: August 9, 2007Publication date: February 12, 2009Applicant: HALLSTAR INNOVATIONS CORP.Inventors: Craig A. Bonda, Anna Pavlovic
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Publication number: 20090036684Abstract: The present invention provides a compound useful as a synthetic intermediate for an anti-HIV agent having an integrase inhibitory activity, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate. Specifically, for example, a compound represented by the formula (2?): wherein R is a fluorine atom or a methoxy group, and R400 is a hydrogen atom or a C1-C4 alkyl group, or a salt thereof, and a production method thereof, and a production method of an anti-HIV agent using the synthetic intermediate.Type: ApplicationFiled: March 6, 2007Publication date: February 5, 2009Inventors: Koji Matsuda, Koji Ando, Shigeki Ohki, Jun-ichi Hoshi, Takahiro Yamasaki
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Publication number: 20090023926Abstract: The present invention provides a compound of the formula: (IIa); having a reactive functional group M, capable of reacting with a biopolymer, BP, having at least one group capable of reacting with M to form a covalent linkage, to provide a biopolymer derivative of the formula: (IIIa). The biopolymer derivatives of the invention have enhanced ionisability with respect to free 10 biopolymer (Bp) enabling improved analysis of the biopolymer using mass spectrometry. The invention further provides specific examples of compounds formula (IIa), e.g. compounds of formula: (IIa-2a) and (IIa-58a).Type: ApplicationFiled: September 22, 2005Publication date: January 22, 2009Inventors: Edwin Mellor Southern, Vladimir Korshun, Mikhail Sergeevich Shchepinov
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Publication number: 20080312322Abstract: A compound of formula (I); in free or pharmaceutically acceptable salt form, where R1, R2, R3, R4, R5, m, n, w, X, Y and Q have the meanings as indicated in the specification, are useful for treating conditions mediated by the CRTh2 receptor, especially inflammatory or obstructive airways diseases.Type: ApplicationFiled: May 22, 2006Publication date: December 18, 2008Inventors: Urs Baettig, Brian Cox, Katharine Louise Turner, Simon James Watson, Diana Janus, Catherine Leblanc, David Andrew Sandham
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Patent number: 7456136Abstract: A linear compound and a metal salt or boron-containing metal salt thereof contains one or more carboxyl-containing phenol units or derivatives thereof and one or more on average at least C18 hydrocarbyl-substituted hydroxyaromatic units or derivatives thereof connected by one or more divalent bridging groups. A concentrate contains the linear compound or metal salt thereof and an organic diluent. A lubricating oil composition contains a minor amount of the linear compound or metal salt thereof and a major amount of a lubricating oil. Additional embodiments of the invention are processes to make the linear compound and the metal salt thereof.Type: GrantFiled: August 21, 2002Date of Patent: November 25, 2008Assignee: The Lubrizol CorporationInventors: David J. Moreton, Stephen J. Cook, David Cressey
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Publication number: 20080248584Abstract: Compounds of formula (IIa): are provided where: X is a group capable of being cleaved from the ?-carbon atom to form an ion of formula (I?) C is a carbon atom bearing a single positive charge or a single negative charge; The invention further provides compounds of formula (IIb): where: X is a counter-ion to C. The compounds of formula (IIa) and (IIb) may form ions of formula (I?) by either cleaving the C—X bond between X and the ?-carbon atoms in the case of the compounds of formula (IIa) or dissociating X in the case of compounds of formula (IIb).Type: ApplicationFiled: August 22, 2007Publication date: October 9, 2008Inventors: Mikhail Sergeevich SHCHEPINOV, Edwin Mellor SOUTHERN
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Publication number: 20080214860Abstract: The present invention concerns a method for preparation of fispemifene by use of ospemifene as a starting material.Type: ApplicationFiled: February 13, 2008Publication date: September 4, 2008Inventors: Marja Sodervall, Maire Eloranta, Arja Kalapudas, Brian Kearton, Michael McKenzie
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Publication number: 20080194790Abstract: The invention relates to a hydroxy-aromatic compound of formula (I): wherein: at least one of the set consisting of R1, R3, and R5 is a group of formula (II); any remaining one or two of the set consisting of R1, R3, and R5 being H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; R2 and R4 are H, OH, a C1-C12 alkyl group or an oligomeric or polymeric system; formula (II) is the following group: wherein EWG is an electron-withdrawing group.Type: ApplicationFiled: December 1, 2005Publication date: August 14, 2008Inventors: Rudolfus A.T.M. Van Benthem, Renier H.M. Kierkels
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Patent number: 7393969Abstract: The present invention relates to calix[4]arenes which effectively bind alkali metal ions (Na+, K+) and transport them over phase boundaries, their preparation and use.Type: GrantFiled: August 16, 2005Date of Patent: July 1, 2008Assignee: Bayer Technology Services GmbHInventors: Michael Traving, Wilfried Gutknecht, Werner Bäcker, Wolfgang Kummer, Rainer Ludwig