Abstract: A method for producing a fluorosulfonyl group-containing compound to obtain a compound represented by the following formula 5 from a compound represented by the following formula 1 as a starting material and a method for producing a fluorosulfonyl group-containing monomer in which the fluorosulfonyl group-containing compound is used: wherein R1 and R2 are a C1-3 alkylene group, and RF1 and RF2 are a C1-3 perfluoroalkylene group.

Abstract: A method for removing perfluorinated compounds from a fluoropolymer material is provided. The method includes the steps of: (a) providing the fluoropolymer material in a chamber; (b) providing an anaerobic environment in the chamber; and (c) providing a fluorination gas in the chamber, thereby exposing the fluoropolymer material to the fluorination gas. The method results in the removal the perfluorinated compounds from the fluoropolymer material.

Abstract: To provide a perfluoropolymer capable of producing an electrolyte membrane excellent in mechanical strength in high temperature environments; as well as a liquid composition, polymer electrolyte membrane, membrane electrode assembly and polymer electrolyte water electrolyzer, obtainable by using the perfluoropolymer. The perfluoropolymer of the present invention contains perfluoromonomer units, does not substantially contain units having a halogen atom other than a fluorine atom, does not substantially contain units having a ring structure, and has acid-type sulfonic acid groups, wherein the perfluoromonomer units contain at least one type of units A selected from the group consisting of perfluorovinyl ether units and perfluoroallyl ether units; the ion exchange capacity is from 0.9 to 1.4 milliequivalent/gram dry resin; and the storage modulus at 120° C. is at least 100 MPa.

Abstract: The present disclosure is directed to provide a process capable of producing a sulfonic acid group-containing monomer in a good yield, which can be used as a raw material of fluorine-based polymer electrolytes, such as membranes for fuel cells, catalyst binder polymers for fuel cells, and membranes for chlor-alkali electrolysis. A process for producing a sulfonic acid group-containing monomer represented by the general formula (3) includes the step of mixing and stirring a cyclic compound represented by the general formula (1) and a silanol compound represented by the general formula (2).

Abstract: The present disclosure is directed to provide a vinylsulfonic anhydride which is useful as a synthetic intermediate for synthesis of a fluorinated monomer. It is also directed to efficiently produce the vinylsulfonic anhydride. It is further directed to efficiently produce a fluorinated monomer using the vinylsulfonic anhydride. A vinylsulfonic anhydride of the present disclosure is expressed by the general formula (1). Further, a process for producing a vinylsulfonic anhydride of the present disclosure includes making a vinylsulfonic acid compound represented by the general formula (2) come in contact and be mixed with an anhydridization agent.

Abstract: Sulfate and sulfonate derivatives of unsaturated fatty alcohols, processes for making them, and methods of using them are disclosed. In one aspect, a monounsaturated fatty alcohol composition is made by reducing a metathesis-derived monounsaturated alkyl ester. The fatty alcohol composition is then converted to a sulfate or sulfonate derivative by one or more of alkoxylation, sulfation, sulfonation, and sulfitation. Of particular interest are the sulfate and ether sulfate derivatives.

Abstract: A photoacid generator includes those of formula (I): wherein each Ra in formula 1 is independently H, F, a C1-10 nonfluorinated organic group, C1-10 fluorinated organic group, or a combination comprising at least one of the foregoing, provided at least one Ra is F or a C1-10 fluorinated organic group, the C1-10 fluorinated and nonfluorinated organic groups each optionally comprising O, S, N, or a combination comprising at least one of the foregoing heteroatoms; L1 is a linking group comprising a heteroatom comprising O, S, N, F, or a combination comprising at least one of the foregoing; G+ is an onium salt of the formula (II): wherein in formula (II), X is S or I, each R0 is independently C1-30 alkyl group; a polycyclic or monocyclic C3-30 cycloalkyl group; a polycyclic or monocyclic C4-30 aryl group; or a combination comprising at least one of the foregoing, provided at least one R0 is substituted where each R0 is a C6 monocyclic aryl group, and wherein when X is I, a is 2, and where X is S, a is 3,

Abstract: The present invention provides a method for efficiently producing a sulfonic acid group-containing ether compound having a high purity and a good polymerizability while preventing production of a byproduct, and provides a sulfonic acid group-containing ether compound containing fewer impurities and having a good radical (co)polymerizability. The present invention provides a method of producing a sulfonic acid group-containing ether compound by reacting a sulfurous acid compound with a compound represented by the formula (1): wherein R1 represents a single bond, a CH2 group, or a CH2CH2 group, and R2 represents H, or a CH3 group, the method comprising the steps of: adjusting pH of a reaction system to 5.5 or greater with use of an alkaline substance; and adding the compound represented by the formula (1) to a reaction vessel containing the sulfurous acid compound.

Abstract: The present invention provides a method for efficiently producing a sulfonic acid group-containing ether compound having a high purity and a good polymerizability while preventing production of a byproduct, and provides a sulfonic acid group-containing ether compound containing fewer impurities and having a good radical (co)polymerizability. The present invention provides a method of producing a sulfonic acid group-containing ether compound by reacting a sulfurous acid compound with a compound represented by the formula (1): wherein R1 represents a single bond, a CH2 group, or a CH2CH2 group, and R2 represents H, or a CH3 group, the method comprising the steps of: adjusting pH of a reaction system to 5.5 or greater with use of an alkaline substance; and adding the compound represented by the formula (1) to a reaction vessel containing the sulfurous acid compound.

Abstract: There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

Abstract: An extended anionic surfactant having the general formula: RO—(PO)n—YZ wherein R is a linear alkyl chain ranging from C6 to C36, a branched alkyl chain ranging from C6 to C36, or a mixture thereof; PO is a propyleneoxy group; Y is —SO3, —CH2CH2CH2—SO3, —CH2CH(CH3)—SO3, or —CH2COO; Z is a cation; and n is 1 to 50.

Abstract: A method for increasing ozone concentration in a liquid can include: providing a gas having ozone; introducing the ozone-containing gas into a liquid, wherein the liquid and ozone combination has a temperature between about 0.8 and about 1.5 times the critical temperature of ozone; and increasing isothermally, the pressure of the ozone-containing gas above the liquid to about 0.3 to about 5 times the critical pressure of ozone so as to increase the ozone concentration in the liquid. The temperature is expressed in absolute units (Kelvin or Rankin). The method can be used for removing ozone from a gas or for purifying ozone. The liquid having a high ozone concentration can be used for ozonolysis of a substrate.

Abstract: According to the present invention, there is provided a fluorine-containing sulfonate resin having a repeating unit of the following general formula (3). In order to prevent deficiency such as roughness after pattern formation or failure in pattern formation, the fluorine-containing sulfonate resin incorporates therein a photoacid generating function and serves as a resist resin in which “a moiety capable of changing its developer solubility by the action of an acid” and “a moiety having a photoacid generating function” are arranged with regularity.

Abstract: The invention relates to a process for mineral oil production by means of Winsor Type III microemulsion flooding, in which an aqueous surfactant formulation comprising at least one ionic surfactant of the general formula R1—O—(CH2C(CH3)HO)m(CH2CH2O)n—XY?M+ is injected through injection boreholes into a mineral oil deposit, and crude oil is withdrawn from the deposit through production boreholes. The invention further relates to ionic surfactants of the general formula.

Abstract: The invention relates to novel cross-linkable monomers that may be polymerized with ethylenically unsaturated comonomers to form cross-linkable copolymers. Said copolymers may particularly be used in the form of aqueous dispersions as formaldehyde-free adhesives or as coatings with good water resistance.

Abstract: There is disclosed a sulfonium salt represented by the following general formula (1). In the formula, X and Y each represents a group having a polymerizable functional group; Z represents a divalent hydrocarbon group having 1 to 33 carbon atoms optionally containing a hetero atom; R1 represents a divalent hydrocarbon group having 1 to 36 carbon atoms optionally containing a hetero atom; and R2 and R3 each represents a monovalent hydrocarbon group having 1 to 30 carbon atoms optionally containing a hetero atom or R2 and R3 may be bonded with each other to form a ring together with a sulfur atom in the formula. There can be provided a sulfonium salt usable as a resist composition providing high resolution and excellent in LER in photolithography using a high energy beam such as an ArF excimer laser, an EUV light and an electron beam as a light source, a polymer obtained from the sulfonium salt, a resist composition containing the polymer and a patterning process using the resist composition.

Abstract: A sulfonium salt of a naphthyltetrahydrothiophenium cation having a fluoroalkoxy chain with a specific anion is provided. The sulfonium salt is used as a photoacid generator to form a resist composition which when processed by immersion lithography, offers advantages of restrained dissolution in the immersion water and less pattern dependence or dark/bright bias.

Abstract: A composition of formula I [Rf(CH2)m(O)n]x-A wherein Rf is a straight or branched perfluoroalkyl group having from about 2 to about 20 carbon atoms, or a mixture thereof, m is a positive integer equal to or greater than 3, n is 0 or 1, x is 1 to about 3, and A is —P(O)(OR1)y(OM+)3-y-x, —C(O)CH(SO3?M+)CH2C(O)?, —(CH2CH2O)d(CH2CHR2O)eR3, or ?SO2B, M+ is an alkali metal ion, NH4+, or NH2(CH2CH2OH)2, B is N(R)2 or N(CH2CH3)(CH2CH2OH), R1 is C1 to C3 alkyl, and R2 is C1 to C4 alkyl, R3 is H or CH3, y is 0 to about 1, d is 0 to about 16, e is 0 to about 16, provided that (d+e) is from about 3 to about 16 is disclosed.

Abstract: The present invention provides a salt represented by the formula (I): wherein Q1 and Q2 independently each represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, L2 represents a single bond or a C1-C6 alkanediyl group in which one or more —CH2— can be replaced by —O— or —CO—, Y represents a C3-C18 alicyclic hydrocarbon group which can have one or more substituents, and one or more —CH2— in the alicyclic hydrocarbon group can be replaced by —O—, —CO— or —SO2—, and Z+ represents an organic counter ion.

Abstract: Provided are compositions containing a compatible mixture of a cationic surfactant and an anionic surfactant. A composition according to the invention comprises: (a) a first surfactant of formula I: wherein R, R1, R2, and R3 Y, X, and n are as defined below; (b) a second surfactant that is oppositely charged to the first surfactant.

Abstract: The disclosure provides anionic Gemini surfactants comprising at least two carbonyl moieties and at least two aliphatic moieties. In some aspects, at least two of the aliphatic moieties comprise at least seven carbon atoms and at least one pair of conjugated carbon-to-carbon double bonds. The anionic Gemini surfactants are polymerizable and may be used to prepare triply periodic multiply continuous lyotropic phase and polymers thereof that substantially retain triply periodic multiply continuous lyotropic phase structure.

Abstract: Surfactants with polyether sulfonate structure, which have a propanonylsulfonic acid group as a head group, a process for preparing such surfactants and their use for tertiary mineral oil extraction.

Abstract: A method for increasing ozone concentration in a liquid can include: providing a gas having ozone; introducing the ozone-containing gas into a liquid, wherein the liquid and ozone combination has a temperature between about 0.8 and about 1.5 times the critical temperature of ozone; and increasing isothermally, the pressure of the ozone-containing gas above the liquid to about 0.3 to about 5 times the critical pressure of ozone so as to increase the ozone concentration in the liquid. The temperature is expressed in absolute units (Kelvin or Rankin). The method can be used for removing ozone from a gas or for purifying ozone. The liquid having a high ozone concentration can be used for ozonolysis of a substrate.

Abstract: Sulfonate-, sulfate-, or carboxylate-capped, alkoxylated anti-misting agents having the structure: R((AO)nX)m((AO)nH)p, and methods of suppressing mist from electrolyte solutions by adding a mist-suppressing amount of one or more compounds selected from the group consisting of compounds of the Formulas R((AO)nX)m((AO)nH)p and R3N+(CH3)2R4, and mixtures thereof, to electrolyte solutions.

Abstract: The description includes materials that may be useful for fuel cell applications such as in the manufacture of fuel cell electrodes, proton exchange membranes (PEM), as catalyst additives or in tie layers designed to be thermally and chemically robust while operating within a fuel cell's harsh environment at higher temperatures and to conduct protons, with significantly higher levels of bound acidic groups, while in a low hydration state. Methods of making the materials are also described.

Abstract: The present invention relates to the novel compound classes of dendritic polyglycerol sulfates and sultanates as well as to their production and use for the treatment of diseases, particularly inflammatory diseases, and to their use as selectin inhibitors and selectin indicators. The dendritic polyglycerol sulfates and sulfonates are also suitable for imaging diagnostics, particularly with respect to inflammatory diseases.

Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C40 normal alpha olefins; and neutralizing the isomerized alpha olefin sulfonic acid with a source of a mono-valent cation.

Abstract: A composition is provided that contains an intermediate for a water-soluble monomer, wherein this intermediate is suitable for producing a water-soluble polyalkylene glycol-type monomer that has a polymerizable terminal double bond, and suitable for the production of water-soluble polymer, and moreover allows the high-yield production of water-soluble polymer. A process of producing this composition and a water-soluble monomer-containing composition obtained therefrom are also provided. A water-soluble monomer is also provided that can be used as a starting material for a water-soluble polymer that even at high hardnesses exhibits an excellent capacity to capture metal ions such as the calcium ion and magnesium ion, an excellent anti-gelation performance, an excellent anti-soil redeposition performance, a better anti-dye transfer performance than in the past, and also an excellent compatibility with surfactants.

Abstract: The present invention is directed to the use of alkylalkoxysulfonates for the production of foams, which are stable at high temperatures, e.g. up to about 250° C. Furthermore, the invention relates to a method for producing of high temperature stable foams by using a foamable aqueous composition comprising at least one linear alkylalkoxysulfonate.

Abstract: A resist composition including a base component that exhibits changed solubility in an alkali developing solution under the action of acid, and an acid generator consisting of a compound represented by general formula (b1). In formula (b1), Y1 represents a fluorinated alkylene group of 1 to 4 carbon atoms, X represents an aliphatic cyclic group of 3 to 30 carbon atoms, R11? to R13? each represents an aryl group or alkyl group, provided that at least one of R11? to R13? is an aryl group having a substituent represented by general formula (b1-0), and two alkyl groups among R11? to R13? may be bonded to each other to form a ring with the sulfur atom in the formula. In formula (b1-0), R52 represents a chain-like or cyclic hydrocarbon group, and f and g each represents 0 or 1.

Abstract: A photoacid generator represented by the following formula (1), a method for producing the photoacid generator, and a resist composition containing the photoacid generator are provided. wherein in the formula (1), Y, X, R1, R2, n1, n2 and A+ have the same meanings as defined in the detailed description of the invention. The photoacid generator can maintain an appropriate contact angle at the time of ArF liquid immersion lithography, can reduce defects occurring during liquid immersion lithography, and has excellent solubility in resist solvents and excellent compatibility with resins. Furthermore, the photoacid generator can be produced by an efficient and simple method using an epoxy compound that is industrially easily available.

Abstract: Anionic acid-labile surfactants may generally comprise compounds represented by the formula: wherein R1 is independently selected from —(CH2)0-9CH3, R2 is selected from the group consisting of —H and —(CH2)0-5CH3, Y is an anion, X is a cation, and n is an integer from 1 to 8. Methods of making and using the anionic acid-labile surfactants are also described. The anionic acid-labile surfactants may be used to facilitate the solubilization of proteins and other molecules in an aqueous environment.

Abstract: The present application describes compounds of Formula I and Formula IA and as disclosed herein, that are useful as anti-microbial agents, including as antibacterial, disinfectant, antifungal, germicidal or antiviral agents.

Abstract: The present invention provides an amphiphile of the formula (I) as described hereinafter. The invention further relates to a process for preparing the amphiphile and to a composition comprising the amphiphile and a sparingly water-soluble active ingredient. It further relates to a process for producing the composition by contacting the amphiphile and the active ingredient, and to the use of the amphiphile for solubilizing a sparingly water-soluble active ingredient in aqueous solutions. The invention also relates to the use of the amphiphile in an agrochemical formulation comprising the amphiphile and a pesticide for controlling phytopathogenic fungi and/or unwanted vegetation and/or unwanted insect or mite infestation and/or for regulating the growth of plants, and finally to plant propagation material comprising the amphiphile.

Abstract: A composition comprising a mixture of fluoropolyether acids or salts having a number average value of about 800 to about 2500 g/mol. The amount of fluoropolyether acids or salt in the mixture having a molecular weight of not more than 500 g/mol is not more than 50 ppm by weight of the total amount of fluoropolyether acids or salts in the mixture. The amount of fluoropolyether acids or salts in the mixture having a molecular weight of 2500 g/mol or greater is not more than 40% by weight of the total amount of fluoropolyether acids or salts in the mixture. Preferably the fluoropolyether acids or salts comprise an anionic group selected from the group consisting of carboxylate, sulfonate, sulfonamide anion and phosphonate. Also disclosed is an aqueous dispersion polymerization process for fluoropolymer manufacture employing polymerization agent comprising the specified mixture of fluoropolyether acids or salts.

Abstract: Compositions and methods of synthesis of anionic surfactants by alkoxylation of a Guerbet alcohol (GA) having 12 to 36 carbon atoms using butylene oxide, and optionally propylene oxide and/or ethylene oxide followed by the incorporation of a terminal anionic group are described herein. The GA of the present invention is made by a facile and inexpensive method that involves high temperature base catalyzed dimerization of alcohols with 6 to 18 carbon atoms. The large hydrophobe ether surfactants of the present invention find uses in enhanced oil recovery (EOR) applications where it is used for solubilization and mobilization of oil and for environmental cleanup. Further, the hydrophobe alkoxylated GA without anionic terminal group can be used as an ultra-high molecular weight non-ionic surfactant.

Abstract: Anionic acid-labile surfactants may generally comprise compounds represented by the formula: wherein R1 is independently selected from —(CH2)0-9CH3, R2 is selected from the group consisting of —H and —(CH2)0-5CH3, Y is an anion, X is a cation, and n is an integer from 1 to 8. Methods of making and using the anionic acid-labile surfactants are also described. The anionic acid-labile surfactants may be used to facilitate the solubilisation of proteins and other molecules in an aqueous environment.

Abstract: A polymerizable anion-containing sulfonium salt having formula (1) is provided wherein R1 is H, F, methyl or trifluoromethyl, R2, R3 and R4 are C1-C10 alkyl, alkenyl or oxoalkyl or C6-C18 aryl, aralkyl or aryloxoalkyl, or two of R2, R3 and R4 may bond together to form a ring with S, A is a C1-C20 organic group, and n is 0 or 1. The sulfonium salt generates a very strong sulfonic acid upon exposure to high-energy radiation. A resist composition comprising a polymer derived from the sulfonium salt is also provided.

Abstract: A process for preparing alkyl glyceryl sulfonate includes fractionally distilling an alkyl glyceryl epoxide mixture to afford alkyl glyceryl epoxide of formula IV: where R is a C4-12 alkyl, in at least about 98.0% purity by weight with respect to epoxidized compounds, the epoxidized compounds comprising the alkyl glyceryl epoxide of formula IV, dimer alkyl glyceryl epoxide of formula V, and trimer alkyl glyceryl epoxide of formula VI: where R is a C4-12 alkyl; and reacting the at least about 98.0% alkyl glyceryl epoxide of formula IV with a mixture of an alkali bisulfite and an alkali sulfite in a sulfonation reaction at a temperature, to afford the alkyl glyceryl sulfonate of formula I: where R is a C4-12 alkyl and M is an alkali metal.

Abstract: Provided herein are new spermicidal compositions that include one or more fluorous surfactants, e.g., non-ionic fluorous surfactants, anionic fluorous surfactants, cationic fluorous surfactants, and combinations thereof. Also provided are methods of preventing fertilization of an ovum, which include a step of contacting at least one spermatozoon with one or more fluorous surfactants. Additionally described herein are methods of preventing infection, which include a step of contacting at least one infectious pathogenic microorganism with one or more fluorous surfactants. Numerous fluorine-containing surfactants are demonstrated to be efficacious as human spermicides.

Abstract: A process for preparing alkyl glyceryl sulfonate includes fractionally distilling an alkyl glyceryl epoxide mixture to afford alkyl glyceryl epoxide of formula IV: where R is a C4-12 alkyl, in at least about 98.0% purity by weight with respect to epoxidized compounds, the epoxidized compounds comprising the alkyl glyceryl epoxide of formula IV, dimer alkyl glyceryl epoxide of formula V, and trimer alkyl glyceryl epoxide of formula VI: where R is a C4-12 alkyl; and reacting the at least about 98.0% alkyl glyceryl epoxide of formula IV with a mixture of an alkali bisulfite and an alkali sulfite in a sulfonation reaction at a temperature, to afford the alkyl glyceryl sulfonate of formula I: where R is a C4-12 alkyl and M is an alkali metal.

Abstract: There is provided an acid having a fluorine-containing carbanion structure or a salt having a fluorine-containing carbanion structure, which is represented by the following general formula (1). By using a photoacid generator for chemically amplified resist materials that generates this acid, it is possible to provide a photoacid generator which has a high sensitivity to the ArF excimer laser light or the like, of which acid (photo generated acid) to be generated has a sufficiently high acidity, and which has a high dissolution in resist solvent and a superior compatibility with resin, and a resist material containing such a photoacid generator.

Abstract: Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.

Abstract: Provided are new anionic surfactants and methods of their preparation and use. The surfactants are compounds of the formula I: wherein R, R1, R2, R3, R4, R5, and R6 are as defined herein.

Abstract: A sulfonium salt having a polymerizable anion generates a strong sulfonic acid upon exposure to high-energy radiation so that it facilitates effective scission of acid labile groups in chemically amplified resist compositions. It is useful as a monomer from which a base resin for use in radiation-sensitive resist compositions is derived.

Abstract: A method for increasing ozone concentration in a liquid can include: providing a gas having ozone; introducing the ozone-containing gas into a liquid, wherein the liquid and ozone combination has a temperature between about 0.8 and about 1.5 times the critical temperature of ozone; and increasing isothermally, the pressure of the ozone-containing gas above the liquid to about 0.3 to about 5 times the critical pressure of ozone so as to increase the ozone concentration in the liquid. The temperature is expressed in absolute units (Kelvin or Rankin). The method can be used for removing ozone from a gas or for purifying ozone. The liquid having a high ozone concentration can be used for ozonolysis of a substrate.

Abstract: Novel compositions of matter and the process of preparing these surfactants having the structure: R1[—(O—(R2O)m—(R3O)n—(R4)]y where: R1=alkyl, alkenyl, amine, alkylamine, dialkylamine, trialkylamine, aromatic, polyaromatic, cycloalkane, cycloalkene, R2=C2H4 or C3H6 or C4H8, R3=C2H4 or C3H6 or C4H8, R4=linear or branched C7H14SO3X to C30H60 SO3X when y=1, R4=linear or branched C7H14SO3X to C30H60 SO3X or H when y>1 but at least one R4 must be linear or branched C7H14SO3X to C30H60 SO3X, m?1, n?0, n+m=1 to 30+, y?1, X=alkali metal or alkaline earth metal or ammonium or amine. These novel ether sulfonate surfactants have excellent surfactant properties making them suitable for a variety of applications as surfactants including agriculture, adhesives, coatings, deinking, detergents, emulsion polymerization, laundry, lubricants, metal working, mining, oilfield, personal care, pharmaceuticals, and soil remediation.

Abstract: A detergent composition having cold water solubility and exhibiting high calcium tolerance can be produced from biodegradable branched ether derivative compositions derived from a branched ether primary alcohol represented by the formula: wherein R1 represents hydrogen or a hydrocarbyl radical having from 1 to 3 carbon atoms, R2 represents a hydrocarbyl radical having from 1 to 7 carbon atoms, x is a number ranging from 0 to 16, preferably from 3 to 13, wherein the total number of carbon atoms in the alcohol ranges from 9 to 24.

Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.

Abstract: Provided herein is a class of compounds with surfactant properties known as alcohol ether sulfonates. These materials are produced according to the present invention by reaction of isethionic acid or its halo-derivative with an alcohol. An alcohol ether sulfonate according to the invention is useful as a component of a finished surfactant formulation useful for cleaning hard surfaces, laundry, and dishes, among other things.