Sulfonic Acids Or Salts Thereof (i.e., Compounds Containing The Sulfonate Group, -s(=o)(=o)-o- Wherein The Single Bonded Oxygen Is Bonded Directly To Hydrogen, Or To A Group Ia Or Iia Light Metal Or To Substituted Or Unsubstituted Ammonium) Patents (Class 562/30)
  • Patent number: 9249092
    Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C20 normal alpha olefins; and neutralizing the isomerized alpha olefin sulfonic acid with a source of an alkali metal or ammonium or substituted ammonium ion.
    Type: Grant
    Filed: November 19, 2014
    Date of Patent: February 2, 2016
    Assignee: Chevron Oronite Company LLC
    Inventors: Curtis Bay Campbell, Andrew J. Howes
  • Patent number: 9040224
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, and a photo-decomposable quencher (D0) containing a compound represented by general formula (d0) shown below. In the formula, R1 represents a hydrocarbon group of 4 to 20 carbon atoms which may have a substituent; Y1 represents a single bond or a divalent linking group; R2 and R3 each independently represents a substituent of 0 to 20 carbon atoms other than a fluorine atom; one of R2 and R3 may form a ring with Y1; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Grant
    Filed: December 18, 2013
    Date of Patent: May 26, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Takaaki Kaiho, Tsuyoshi Nakamura
  • Publication number: 20150141519
    Abstract: The present invention relates to an Agomelatine sulfuric acid complex in formula (I) and the preparation method thereof (HX=H2SO4, RSO3H (R=CH3, Ph, 4-CH3Ph)). The solubility of the Agomelatine sulfuric acid complex obtained by the method of the present invention is significantly improved compared with Agomelatine, has good stability and higher purity, and is suitable for application in finished-product medicinal preparations. The preparation process is quite simple, and a product with high purity can be obtained without special operations.
    Type: Application
    Filed: May 14, 2013
    Publication date: May 21, 2015
    Inventors: Haiping Wang, Cheng Chi, Zhengming Chi, Jin Wang, Guanyu Xu
  • Patent number: 9018425
    Abstract: The present invention relates to the use of at least one sulfonic acid for recovering glycerol resulting from a reaction crude from transesterification of glycerides, in particular of triglycerides of vegetable and/or animal origin. The invention also relates to a process for purifying glycerol obtained as a by-product of triglyceride transesterification during the preparation of fatty acids, fatty esters and/or fatty acid salts, and also to a combined process for preparing, on the one hand, fatty acids, fatty esters and/or fatty acid salts and, on the other hand, glycerol, from triglycerides, using at least one sulfonic acid.
    Type: Grant
    Filed: March 5, 2014
    Date of Patent: April 28, 2015
    Assignee: Arkema France
    Inventors: Bernard Monguillon, Jean-Alex Laffitte
  • Patent number: 9017924
    Abstract: A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, including a base component (A) which exhibits changed solubility in a developing solution under action of acid, the base component (A) including a polymeric compound (A1) containing a structural unit (a0) represented by general formula (a0-1) shown below. In the formula, W1 represents a group which is formed by polymerization reaction of a group containing a polymerizable group; Y1 and Y2 each independently represents a divalent linking group; Y3 represents a carbonyl group or an alkylene group; R2 and R3 each independently represents a fluorine atom or a fluorinated alkyl group; Mm+ represents an organic cation having a valency of m; and m represents an integer of 1 or more.
    Type: Grant
    Filed: March 4, 2014
    Date of Patent: April 28, 2015
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daichi Takaki, Yoshiyuki Utsumi
  • Patent number: 8993798
    Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C20 normal alpha olefins; and neutralizing the isomerized alpha olefin sulfonic acid with a source of an alkali metal or ammonium or substituted ammonium ion.
    Type: Grant
    Filed: December 8, 2010
    Date of Patent: March 31, 2015
    Assignee: Chevron Oronite Company LLC
    Inventors: Curtis Bay Campbell, Andrew J. Howes
  • Publication number: 20150080601
    Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C20 normal alpha olefins: and neutralizing the isomerized alpha olefin sulfonic acid with a source of an alkali metal or ammonium or substituted ammonium ion.
    Type: Application
    Filed: November 19, 2014
    Publication date: March 19, 2015
    Inventors: Curtis B. Campbell, Andrew J. Howes
  • Patent number: 8962233
    Abstract: According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes an arylsulfonium salt that when exposed to actinic rays or radiation, generates an acid, the arylsulfonium salt containing at least one aryl ring on which there are a total of one or more electron donating groups, the acid generated upon exposure to actinic rays or radiation having a volume of 240 ?3 or greater.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: February 24, 2015
    Assignee: FUJIFILM Corporation
    Inventors: Takeshi Kawabata, Tomotaka Tsuchimura, Takayuki Ito
  • Publication number: 20150045548
    Abstract: The present invention relates to a method for labelling fluorine-18, which is a radioisotope, and more specifically, to a method for labelling a [18F]fluoride in a method for preparing an organic [18F]fluoro compound by reacting an alkyl halide or an alkyl sulfonate with a [18F]fluoride, wherein a [18F]fluoride supported on a quaternary alkyl ammonium polymer support is eluted using a solution containing a metal salt or a quaternary ammonium salt with an adjusted pH, and a base is not additionally used. The present invention enables a labeling reaction without an additional base after precisely reflecting the concentration of a base absolutely necessary for the nucleophilic substitution of a [18F]fluoride or eluting a [18F]fluoride using a [18F]fluoride eluent with an adjusted pH, thereby stably obtaining a [18F]fluoride-labelled compound in a high yield, and is thus useful for production of fluorine-18-labelled radioactive medical supplies.
    Type: Application
    Filed: December 21, 2012
    Publication date: February 12, 2015
    Inventors: Sang Ju Lee, Seung Jun Oh, Dae Hyuk Moon, Jin Sook Ryu, Jae Seung Kim, Jong Jin Lee
  • Patent number: 8936659
    Abstract: A substance includes diamond particles having a maximum linear dimension of less than about 1 ?m and an organic compound attached to surfaces of the diamond particles. The organic compound may include a surfactant or a polymer. A method of forming a substance includes exposing diamond particles to an organic compound, and exposing the diamond particles in the presence of the organic compound to ultrasonic energy. The diamond particles may have a maximum linear dimension of less than about 1 ?m. A composition includes a liquid, a plurality of diamond nanoparticles dispersed within the liquid, and an organic compound attached to surfaces of the diamond nanoparticles. A method includes mixing a plurality of diamond particles with a solution comprising a liquid solvent and an organic compound, and exposing the mixture including the plurality of diamond nanoparticles and the solution to ultrasonic energy.
    Type: Grant
    Filed: October 18, 2011
    Date of Patent: January 20, 2015
    Assignee: Baker Hughes Incorporated
    Inventors: Soma Chakraborty, Gaurav Agrawal, Anthony A. DiGiovanni
  • Publication number: 20140367096
    Abstract: The invention relates to a hydrocarbon recovery composition comprising an anionic surfactant, wherein said composition is in the solid state, and to a shaped article comprising said composition. Preferably, said composition is in the form of a powder. Further, the invention relates to a process for treating a hydrocarbon containing formation comprising the steps of a) transporting said composition or shaped article to the location of the hydrocarbon containing formation; b) dissolving said composition or shaped article in water thereby forming an aqueous fluid containing the hydrocarbon recovery composition; c) providing the aqueous fluid containing the hydrocarbon recovery composition to at least a portion of the hydrocarbon containing formation; and d) allowing the hydrocarbon recovery composition to interact with the hydrocarbons in the hydrocarbon containing formation.
    Type: Application
    Filed: May 25, 2012
    Publication date: December 18, 2014
    Inventors: Julian Richard Barnes, Hendrik Dirkzwager, Robert Moene, Reinaldo Conrado Navarrete, Kirk Herbert Raney
  • Patent number: 8900796
    Abstract: The present invention provides an acid generator generates a sulfonic acid represented by the following general formula (1) in response to high-energy beam or heat: To provide a novel acid generator which is suitably used as an acid generator for a resist composition, which solves the problems of LER and a depth of focus and can be effectively and widely used particularly without degradation of a resolution, a chemically amplified resist composition using the same, and a patterning process.
    Type: Grant
    Filed: February 15, 2013
    Date of Patent: December 2, 2014
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Tomohiro Kobayashi, Masayoshi Sagehashi
  • Patent number: 8889336
    Abstract: A radiation-sensitive resin composition includes a compound represented by a formula (1), and a base polymer. A represents —CO— or —CH2—. R1 represents a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms, or a combination of a first group and a second group. The first group is —CO—, —COO—, —OCO—, —O—CO—O—, —NHCO—, —CONH—, —NH—CO—O—, —O—CO—NH—, —NH—, —S—, —SO—, —SO2—, —SO2—O— or a combination thereof, and the second group is a hydrocarbon group having 1 to 30 carbon atoms, a heterocyclic group having 3 to 30 ring atoms or a combination thereof. A part or all of hydrogen atoms included in the hydrocarbon group and the heterocyclic group are not substituted or substituted. M+ represents a monovalent cation.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: November 18, 2014
    Assignee: JSR Corporation
    Inventor: Ken Maruyama
  • Patent number: 8883395
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: November 11, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8853441
    Abstract: A sulfonium compound represented by the following formula (1), a photoacid generator containing the sulfonium compound, and a resist composition containing the photoacid generator are provided: wherein X represents an electron donor group; R1 and R2 each independently represent an alkyl group or the like; R4 to R6 each independently represent an alkyl group, or the like; R3 represents a cyclic alkenediyl group or the like; and ?A represents an anion. The sulfonium compound has a photon yield that is controllable by introducing different absorbers to the cation region in one molecule, can address the inconvenience of using a mixture of different photoacid generators when the sulfonium compound is applied as a photoacid generator, has excellent miscibility in a resist, and has enhanced resolution and line edge roughness.
    Type: Grant
    Filed: July 25, 2012
    Date of Patent: October 7, 2014
    Assignee: Korea Kumho Petrochemical Co., Ltd.
    Inventors: Jung Hoon Oh, Dae Kyung Yoon, Seung Duk Cho, So Jeong Park
  • Publication number: 20140288210
    Abstract: A resin composition includes a resin selected from a polylactic acid resin and a polycarbonate resin as a matrix resin, and surface-treated red phosphorus, wherein the surface-treated red phosphorus is contained in an amount of 10 parts by weight to 40 parts by weight, based on 100 parts by weight of the polylactic acid resin or the polycarbonate resin.
    Type: Application
    Filed: October 18, 2013
    Publication date: September 25, 2014
    Applicant: FUJI XEROX CO., LTD.
    Inventor: Akira IMADA
  • Publication number: 20140274857
    Abstract: The present invention relates to the field of membrane separation processes and clean in place compositions for cleaning such membranes. The cleaning compositions can remove proteins, fats, and other food, beverage, and brewery based soils and offer an environmentally friendly alternative surfactant system to NPE. According to the invention, surfactants and polymers useful for this process are unpredictable and specific surfactants, polymers, and combinations of the same are disclosed for use alone, as part of a cleaning composition. Methods of use of the same are also included.
    Type: Application
    Filed: March 12, 2013
    Publication date: September 18, 2014
    Applicant: ECOLAB USA INC.
    Inventors: Paul Schacht, Jeffrey Weilage, Eric Schmidt, Joseph P. Curran, Ralf Krack, Victor Fuk-Pong Man, Charles Allen Hodge
  • Publication number: 20140275369
    Abstract: The present invention is directed to ready to use (wet) and setting (dry) repair products with antistatic additives having reduced persistent airborne dust particulates upon sanding thereof. Such wet and dry repair products include, in part, an antistatic additive(s) that can reduce or eliminate the static charge that forms in dust particulates when dried repair products, such as spackling compounds, cementitious materials, and joint compounds, are sanded, for example. In turn, this can help reduce the quantity of airborne dust particulates, the time in which they are suspended, and the distance they travel in a given room or job site. In one example, a repair product for use as a dry repair compound can include an anti-static additive, which can include a cationic charge, and optionally a metal complex. In another example, the repair product further includes water to define a wet or ready to use repair product.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Inventors: Dianne Alexandra Stewart, John Scott Nevin, Paul Michael Kurtz
  • Publication number: 20140256978
    Abstract: The present invention relates to the use of at least one sulfonic acid for recovering glycerol resulting from a reaction crude from transesterification of glycerides, in particular of triglycerides of vegetable and/or animal origin. The invention also relates to a process for purifying glycerol obtained as a by-product of triglyceride transesterification during the preparation of fatty acids, fatty esters and/or fatty acid salts, and also to a combined process for preparing, on the one hand, fatty acids, fatty esters and/or fatty acid salts and, on the other hand, glycerol, from triglycerides, using at least one sulfonic acid.
    Type: Application
    Filed: March 5, 2014
    Publication date: September 11, 2014
    Applicant: ARKEMA FRANCE
    Inventors: Bernard MONGUILLON, Jean-Alex LAFFITTE
  • Patent number: 8703387
    Abstract: A resist composition comprising a base component (A) which exhibits changed solubility in a developing solution under action of acid and an acid-generator component (B) which generates acid upon exposure, the acid-generator component (B) comprising an acid generator (B1) composed of a compound represented by general formula (b1-1) shown below [wherein, X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, provided that a ring skelton of the cyclic group contains an —SO2— bond or an —O—SO2— bond, and at least one carbon atom which is not adjacent to the —SO2— bond or the —O—SO2— bond has an oxygen atom as a substituent; Q1 represents a divalent linking group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; and A+ represents an organic cation].
    Type: Grant
    Filed: May 23, 2012
    Date of Patent: April 22, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi
  • Patent number: 8685617
    Abstract: A salt represented by the formula (I): wherein Q1, Q2, L1, L2, ring W, s, t, R1, R2 and Z+ are defined in the specification.
    Type: Grant
    Filed: December 21, 2011
    Date of Patent: April 1, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Koji Ichikawa, Isao Yoshida, Yuki Suzuki
  • Publication number: 20140079660
    Abstract: The present invention provides a cleansing composition for skin or hair which can provide a good rinse feel, give good combability and softness from rinsing to drying when the cleansing composition is applied to hair, and give good moist feeling to skin when the cleansing composition is applied to skin. The cleansing composition for skin or hair is a cleansing composition comprising an internal olefin sulfonate (A) having 12 or more and 24 or less carbon atoms.
    Type: Application
    Filed: December 26, 2012
    Publication date: March 20, 2014
    Applicant: KAO CORPORATION
    Inventor: Yasuhiro DOI
  • Publication number: 20140072526
    Abstract: The present invention relates to an adsorbate of a pharmaceutically compatible rasagiline salt comprising at least one pharmaceutically compatible adjuvant, wherein the at least one pharmaceutically compatible adjuvant is a water-soluble, organic solvent and the rasagiline salt is present in the adsorbate as an amorphous substance.
    Type: Application
    Filed: September 3, 2013
    Publication date: March 13, 2014
    Applicant: RATIOPHARM GMBH
    Inventors: Alexander Lehmann, Frank Muskulus, Julia Schulze-Nahrup
  • Patent number: 8663901
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: March 4, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Publication number: 20140058128
    Abstract: Methods and systems are provided for converting methane in a feed stream to acetylene. The hydrocarbon stream is introduced into a supersonic reactor and pyrolyzed to convert at least a portion of the methane to acetylene. The reactor effluent stream is further processed to generate larger hydrocarbons in a second reactor. The reactor effluent stream can be processed before the second reactor to remove waste products such as carbon monoxide and nitrogen in the reactor effluent stream.
    Type: Application
    Filed: June 11, 2013
    Publication date: February 27, 2014
    Inventors: Jeffery C. Bricker, John Q. Chen, Peter K. Coughlin
  • Patent number: 8658345
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: February 25, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8632945
    Abstract: A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a repeating unit represented by a formula (I), a repeating unit represented by a formula (II), or a both thereof. Each of R1 to R3 independently represents a hydroxyl group, or the like. At least one of R1 represents a group having two or more heteroatoms. l is an integer from 1 to 5. Each of m and n is independently an integer from 0 to 5. Each of R7 and R11 independently represents a hydrogen atom, or the like. Each of R8 to R10 independently represents a hydrogen atom, or the like. A represents —O—, or the like. D represents a substituted or unsubstituted methylene group, or the like.
    Type: Grant
    Filed: May 24, 2012
    Date of Patent: January 21, 2014
    Assignee: JSR Corporation
    Inventor: Ken Maruyama
  • Patent number: 8628910
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: January 14, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8628909
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: January 14, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8623584
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 14, 2012
    Date of Patent: January 7, 2014
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8617791
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: December 31, 2013
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8609889
    Abstract: The photoacid generator produces a sulfonic acid which has a bulky cyclic structure in the sulfonate moiety and a straight-chain hydrocarbon group and thus shows a controlled acid diffusion behavior and an adequate mobility. The PAG is fully compatible with a resin to form a resist composition which performs well during the device fabrication process and solves the problems of resolution, LWR, and exposure latitude.
    Type: Grant
    Filed: July 1, 2010
    Date of Patent: December 17, 2013
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masaki Ohashi, Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe
  • Patent number: 8586771
    Abstract: Provided herein are processes of preparing sulfonated estolide compounds, and the removal of sulfonate residues from those compounds to provide desulfonated estolide base oils. Exemplary sulfonated estolide compounds include those selected from the formula: wherein z is an integer selected from 0 to 15; q is an integer selected from 0 to 15; x is, independently for each occurrence, an integer selected from 0 to 20; y is, independently for each occurrence, an integer selected 0 to 20; n is equal to or greater than 0; R6 is selected from —OH, optionally substituted alkyl, and optionally substituted aryl; and R2 is selected from hydrogen and optionally substituted alkyl that is saturated or unsaturated, and branched or unbranched, wherein each fatty acid chain residue of said compounds is independently optionally substituted.
    Type: Grant
    Filed: March 6, 2013
    Date of Patent: November 19, 2013
    Assignee: Biosynthetic Technologies, LLC
    Inventors: Marlon Lutz, Igor Likhotvorik, Chris Arnold, Travis Thompson, Dean Kent Hoglen, Eric Lee Williams
  • Publication number: 20130277611
    Abstract: The present invention relates to compounds containing at least three ring systems, at least one of which is a 2,6-naphthylene group, and two unsaturated bridging groups between the ring systems, and to the use of the compounds for high-frequency components, in particular antennae, especially for the gigahertz region. The liquid-crystalline media comprising these compounds serve, for example, for the phase shifting of microwaves for tuneable ‘phased-array’ antennae.
    Type: Application
    Filed: December 14, 2011
    Publication date: October 24, 2013
    Applicant: MERCK PATENT GmbH
    Inventors: Christian Jasper, Elvira Montenegro, Detlef Pauluth, Volker Reiffenrath, Atsutaka Manabe
  • Publication number: 20130274162
    Abstract: The invention provides a lubricating composition containing an oil of lubricating viscosity and a detergent. The invention further relates to a process to prepare the detergent, and the use of the lubricating composition in a mechanical device such as an internal combustion engine, or a driveline device.
    Type: Application
    Filed: December 16, 2011
    Publication date: October 17, 2013
    Applicant: THE LUBRIZOL CORPORATION
    Inventors: Christopher L. Friend, William R.S. Barton, Gary M. Walker
  • Publication number: 20130256228
    Abstract: This disclosure describes draw solution compositions for FO processes which increase the available membrane area for permeation and are also amenable to reconcentration with standard techniques, such as membrane filtration and evaporative technologies. The composition are comprised of a water soluble draw solute having surface active properties, i.e., a surfactant.
    Type: Application
    Filed: March 14, 2013
    Publication date: October 3, 2013
    Inventors: Upen J. Bharwada, Isaac V. Farr
  • Patent number: 8518630
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: September 13, 2012
    Date of Patent: August 27, 2013
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Publication number: 20130192649
    Abstract: The present invention relates to the acidic cleaning in the beer industry, and more particularly an improved process for acidic cleaning of the various elements and vessels that are used in the preparation of beer and other and other related fermented beverages, said cleaning being carried out by using a formulation comprising at least one alkane sulphonic acid.
    Type: Application
    Filed: March 13, 2013
    Publication date: August 1, 2013
    Applicant: ARKEMA FRANCE
    Inventor: Arkema France
  • Patent number: 8426101
    Abstract: A photosensitive composition containing a compound having a specific structure as described in the specification, a pattern-forming method using the photosensitive composition and the compound having a specific structure used in the photosensitive composition.
    Type: Grant
    Filed: December 21, 2006
    Date of Patent: April 23, 2013
    Assignee: FUJIFILM Corporation
    Inventors: Kenji Wada, Hiromi Kanda
  • Publication number: 20130092866
    Abstract: The invention generally encompasses phosphonium ionic liquids, salts, compositions and their use in many applications, including but not limited to: as electrolytes in electronic devices such as memory devices including static, permanent and dynamic random access memory, as electrolytes in energy storage devices such as batteries, electrochemical double layer capacitors (EDLCs) or supercapacitors or ultracapacitors, electrolytic capacitors, as electrolytes in dye-sensitized solar cells (DSSCs), as electrolytes in fuel cells, as a heat transfer medium, among other applications. In particular, the invention generally relates to phosphonium ionic liquids, salts, compositions, wherein the compositions exhibit superior combination of thermodynamic stability, low volatility, wide liquidus range, ionic conductivity, and electrochemical stability. The invention further encompasses methods of making such phosphonium ionic liquids, salts, compositions, operational devices and systems comprising the same.
    Type: Application
    Filed: December 5, 2012
    Publication date: April 18, 2013
    Inventors: Benjamin L. Rupert, Levi J. Irwin, Leanne Beer, Shilpa A. Worlikar, Steven Z. Shi
  • Patent number: 8367299
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Grant
    Filed: September 15, 2011
    Date of Patent: February 5, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Patent number: 8343706
    Abstract: The present invention relates to a fluorine-free photoacid generator (PAG) and a photoresist composition containing the same. The PAG is characterized by the presence of an onium cationic component and a fluorine-free fused ring heteroaromatic sulfonate anionic component containing one or more electron withdrawing substituents. The onium cationic component of the PAG is preferably a sulfonium or an iodonium cation. The photoresist composition further contains an acid sensitive imaging polymer. The photoresist composition is especially useful for forming material patterns on a semiconductor substrate using 193 nm (ArF) lithography.
    Type: Grant
    Filed: January 25, 2010
    Date of Patent: January 1, 2013
    Assignee: International Business Machines Corporation
    Inventors: Sen Liu, Pushkara R. Varanasi
  • Patent number: 8283491
    Abstract: The present invention is directed to an isomerized alpha olefin sulfonate and a method of making the same wherein the isomerized alpha olefin sulfonate is derived from sulfonating an isomerized alpha olefin with sulfur trioxide in the presence of air thereby producing an isomerized alpha olefin sulfonic acid, wherein the isomerized alpha olefin is derived from the isomerization of C12-C40 normal alpha olefins; and neutralizing the isomerized alpha olefin sulfonic acid with a source of a mono-valent cation.
    Type: Grant
    Filed: October 23, 2008
    Date of Patent: October 9, 2012
    Assignee: Chevron Oronite Company LLC
    Inventors: Curtis Bay Campbell, Theresa Ann Denslow
  • Publication number: 20120190648
    Abstract: The present invention relates to a compound of formula (I) or a pharmaceutically acceptable salt, a stereoisomer or a mixture in all proportions of stereoisomers thereof, in particular a mixture of enantiomers, such as a racemic mixture, wherein R represents a (C1-C6)alkyl or (C1-C6)alkenyl group, optionally substituted by one or more groups chosen among an halogen atom, ORa, SRb, NRcRd, PO(ORe)(ORf), CO2Rg, SO2Rh SO3R1, P0(0H)(CH(0H)Rk), CN, N3 and NH—C(?NH)NH2, with Ra, Rb, Rc and Rd, representing, independently of each other, an hydrogen atom, a (C1-C6)alkyl group or a —CO—(C1-C6)alkyl group, Re, Rf, Rg, Rh and R1 representing, independently of each other, an hydrogen atom or a (C1-C6)alkyl group, and Rk representing an aryl or heteroaryl group, said group being optionally substituted by one or more groups selected from an halogen atom and NO2, as well as to the use thereof and to a process for preparing such a compound, to a pharmaceutical composition containing it and to synthesis intermediates.
    Type: Application
    Filed: July 23, 2010
    Publication date: July 26, 2012
    Inventors: Philippe Jubault, Jean-Charles Quirion, Gerald Lemonnier, Cedric Lion
  • Patent number: 8211949
    Abstract: Novel mixtures of long-chain (C10-C20) olefins are functionalized by conversion to aldehydes using an OXO process, or to sulfates, sulfonates, sulfones, sulfides, or sulfoxides by direct sulfonation. The aldehydes may then be hydrogenated to form alcohols, or aminated to form amines or amides. The olefins starting mixture may be acquired as a byproduct of the tetramerization of ethylene in the presence of certain chromium-containing tetramerization catalysts. The functionalized mixtures, and derivatives prepared therefrom such as alkoxylates prepared from the alcohols, may be useful as surfactants that may offer improved performance in many applications, while their preparation based on a byproduct mixture reduces their cost and also reduces waste-handling issues for this non-targeted stream.
    Type: Grant
    Filed: September 16, 2008
    Date of Patent: July 3, 2012
    Assignee: Dow Global Technologies LLC
    Inventors: Pierre T. Varineau, Brian W. Kolthammer, Aaron W. Sanders, David A. Wilson, Kara S. Weber, Robert Kirk Thompson, Cynthia L. Rand, Thomas C. Eisenschmid
  • Patent number: 8202731
    Abstract: Novel fluorescent dyes are disclosed for use in analyte detection. In particular, mono- and bis-substituted HPTS dyes and methods of making them are provided.
    Type: Grant
    Filed: June 3, 2010
    Date of Patent: June 19, 2012
    Assignee: Glumetrics, Inc.
    Inventor: Jeff T. Suri
  • Patent number: 8178648
    Abstract: A composition of matter comprising a diamine salt and sulfoisophthalic acid in a ratio other than one salt to one acid and a process for producing a diamine salt of sulfoisophthalic acid comprising generating a sulfoisophthalic acid and charging the sulfoisophthalic acid with diamine.
    Type: Grant
    Filed: November 6, 2008
    Date of Patent: May 15, 2012
    Assignee: Future Fuel Chemical Company
    Inventors: Tracy A. Torno, Candice Stalker, Maria Adriana Sousa-Ragle, Todd Coleman, Ronnie Hampton
  • Patent number: 8114570
    Abstract: Photoacid generators generate sulfonic acids of formula (1a) upon exposure to high-energy radiation. ROC(?O)R1—COOCH2CF2SO3?H+??(1a) RO is OH or C1-C20 organoxy, R1 is a divalent C1-C20 aliphatic group or forms a cyclic structure with RO. The photoacid generators are compatible with resins and can control acid diffusion and are thus suited for use in chemically amplified resist compositions.
    Type: Grant
    Filed: March 24, 2009
    Date of Patent: February 14, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Takeshi Kinsho, Takeru Watanabe, Koji Hasegawa, Masaki Ohashi
  • Publication number: 20120034464
    Abstract: A substance includes diamond particles having a maximum linear dimension of less than about 1 ?m and an organic compound attached to surfaces of the diamond particles. The organic compound may include a surfactant or a polymer. A method of forming a substance includes exposing diamond particles to an organic compound, and exposing the diamond particles in the presence of the organic compound to ultrasonic energy. The diamond particles may have a maximum linear dimension of less than about 1 ?m. A composition includes a liquid, a plurality of diamond nanoparticles dispersed within the liquid, and an organic compound attached to surfaces of the diamond nanoparticles. A method includes mixing a plurality of diamond particles with a solution comprising a liquid solvent and an organic compound, and exposing the mixture including the plurality of diamond nanoparticles and the solution to ultrasonic energy.
    Type: Application
    Filed: October 18, 2011
    Publication date: February 9, 2012
    Applicant: BAKER HUGHES INCORPORATED
    Inventors: Soma Chakraborty, Gaurav Agrawal, Anthony A. DiGiovanni
  • Publication number: 20120020881
    Abstract: This invention relates to novel compounds suitable for labeling by positron emitting isotopes, such as 18F, 11C, 13N and 15O, through appropriate labeling reagents, such as 18F reagents and methods of preparing such a compound, compositions comprising such compounds, kits comprising such compounds or compositions and uses of such compounds, compositions or kits for diagnostic imaging by positron emission tomography (PET).
    Type: Application
    Filed: December 4, 2009
    Publication date: January 26, 2012
    Applicant: BAYER SCHERING PHARMA AKTIENGESELLSCHAFT
    Inventors: Lutz Lehmann, Timo Stellfeld, Keith Graham, Jessica Becaud, Linjing Mu