Abstract: There is disclosed a process for making a mono-lithium salt of 5-sulfoisophthalic acid (LiSIPA) having less than 200 ppm sulfate. The process uses a reaction mixture of acetic acid, water, a lithium cation producing compound, and 5-sulfoisophthalic acid. The reaction mixture is heated to reflux, cooled, filtered and washed to obtain a high quality LiSIPA having less than 200 ppm sulfate. Also disclosed is a high quality mono-lithium salt of 5-sulfoisophthalic acid having less than 200 ppm sulfate.
Abstract: This invention relates to methods for the production of sodium, potassium, rubidium, cesium, magnesium, manganese, cobalt, nickel, aluminum, copper (II) and zinc salts of 5-sulfoisophthalic acid. In addition, this disclosure describes new compositions of matter, specifically, the rubidium, manganese, cobalt, nickel, and copper (II) salts of 5-sulfoisophthalic acid. The method utilizes the addition of metals salts to a crude sulfonation solution of 5-sulfoisophthalic acid.
Abstract: This invention relates to methods for the production of various metal salts of 5-sulfoisophthalic acid including those where the metal cation is selected from the group consisting of silver (I), sodium, potassium, rubidium, cesium, magnesium, calcium, strontium, barium, manganese (II), iron (II), cobalt (II), nickel (II), copper (I), copper (II), zinc, yttrium, and cadmium. The methods utilize a solvent system that comprises acetic acid or water or a mixture of both. The invention also encompasses the various metal salts of 5-sulfoisophthalic acid.
Abstract: The present invention relates to a process for preparing acrylic acid by two-stage heterogeneously catalyzed partial gas phase oxidation of propylene, in which the propylene source used is a preceding propane dehydrogenation and in which the first oxidation stage is operated with restricted propylene conversion, and unconverted propane and propylene present in the product gas mixture of the second partial oxidation stage are recycled substantially into the preceding propane dehydrogenation.
Type:
Grant
Filed:
May 18, 2005
Date of Patent:
April 30, 2013
Assignee:
BASF Aktiengesellschaft
Inventors:
Martin Dieterle, Klaus Joachim Mueller-Engel, Claus Hechler, Ulrich Hammon, Armin Diefenbacher
Abstract: This invention relates to methods for the production of sodium, potassium, rubidium, cesium, magnesium, manganese, cobalt, nickel, aluminum, copper (II) and zinc salts of 5-sulfoisophthalic acid. In addition, this disclosure describes new compositions of matter, specifically, the rubidium, manganese, cobalt, nickel, and copper (II) salts of 5-sulfoisophthalic acid. The method utilizes the addition of metals salts to a crude sulfonation solution of 5-sulfoisophthalic acid.
Abstract: There is disclosed a process for making a mono-lithium salt of 5-sulfoisophthalic acid (LiSIPA) having less than 200 ppm sulfate. The process uses a reaction mixture of acetic acid, water, a lithium cation producing compound, and 5-sulfoisophthalic acid. The reaction mixture is heated to reflux, cooled, filtered and washed to obtain a high quality LiSIPA having less than 200 ppm sulfate. Also disclosed is a high quality mono-lithium salt of 5-sulfoisophthalic acid having less than 200 ppm sulfate.
Abstract: A method for the purification of 5-sulfoisophthalic acid wherein via the application of an acetic acid wash while said crude cake of 5-sulfoisophthalic acid is filtered.
Abstract: Stable, topically applicable cosmetic/dermatological sunscreen compositions, well suited for the UV-photoprotection of human skin/keratinous materials, contain a thus effective amount of at least one novel amine, amide, sulphonamide or carbamate substituted benzalmalonic salt compound.
Abstract: A sulfonate of the formula (I): wherein Q1, Q2, Q3, Q4 and Q5 each independently represents a certain substituent, and A+ represents a counter ion, with the proviso that at least one of Q1, Q2, Q3, Q4 and Q5 is a group of the formula (II) wherein R1 and R2 each independently an alkyl having 1 to 12 carbon atoms or the like; and a chemical amplification type positive resist composition comprising the sulfate of the formula (I) and a resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
Type:
Grant
Filed:
July 16, 2004
Date of Patent:
February 21, 2006
Assignee:
Sumitomo Chemical Company, Limited
Inventors:
Satoshi Yamaguchi, Makoto Akita, Isao Yoshida
Abstract: Methods for treating conditions associated with hyperglycemia, especially Type II diabetes, with novel naphthylsulfonic acids and related compounds. These compounds, as single stereoisomers or mixtures of stereoisomers, or their pharmaceutically acceptable salts, are useful in methods of stimulating the kinase activity of the insulin receptor, enhancing the activation of the insulin receptor by insulin, and stimulating the uptake of glucose into cells. A variety of antidiabetic compounds and pharmaceutical compositions comprising the antidiabetic compounds are also disclosed.
Type:
Grant
Filed:
July 28, 2000
Date of Patent:
November 25, 2003
Assignee:
Telik, Inc.
Inventors:
Wayne R. Spevak, Songyuan Shi, Prasad V. V. S. V. Manchem, Michael R. Kozlowski, Steven R. Schow, Robert T. Lum, Louise Robinson, Jeong Weon Park
Abstract: Compounds of Formula I, and pharmaceutical compositions containing these compounds, activate the insulin receptor kinase, which leads to an increased sensitivity to insulin and an increase in glucose uptake, and are therefore useful for the treatment of animals, especially humans, with hyperglycemia, especially for the treatment of type 2 diabetes. Processes for preparation of the compounds, and their use in assays, are also disclosed.
Type:
Grant
Filed:
September 6, 2001
Date of Patent:
July 29, 2003
Assignee:
Telik, Inc.
Inventors:
Louise Robinson, Prasad V. V. S. V. Manchem, Nicolas Cairns, Steven R. Schow
Abstract: Onium salt capable of generating acid upon exposure to actinic radiation having the following structure:(R.sub.1).sub.a (R.sub.2).sub.b (R.sub.3).sub.c Q.sup.+ --A--M.sup.+ X.sup.- --B--X'.sup.-where:Q is S;R.sub.1, R.sub.2 and R.sub.3 are independently substituted or unsubstituted aromatic, aliphatic, or aralkyl groups having 7-18 carbon atoms;M.sup.+ is a cationic organic radical;A is a divalent radical selected from the group of hindered alkylene groups, substituted or unsubstituted aromatic or aralkyl groups;B is a divalent aromatic sensitizer which absorbs radiation having a wavelength longer than 300 nm and is capable of transferring an electron to Q,x.sup.- and X'.sup.- are anionic groups; and wherein A provides a spatial separation between Q and M, and B provides a spatial separation between X and X', such that the spatial separation provided by A between Q and M is substantially the same as the spatial separation provided by B between X and X'.
Abstract: Fluorinated aromatic hydrocarbons including fluorinated aromatic carboxylic acids fluorinated aromatic dianhydrides and fluorinated aromatic dialkyl esters that serve as precursor monomers for high temperature fluorinated polyimides. The fluorinated aromatic carboxylic acid monomer comprises: ##STR1## wherein X is hydrogen, carboxyl, sulfonic acid, hydroxy, alkyl, halogen or nitro and hydrates of said acids. The fluorinated aromatic dianhydride monomer comprises: ##STR2## wherein x is hydrogen, carboxyl, sulfonic acid, hydroxy, alkyl, halogen or nitro. The fluorinated aromatic dialkyl ester monomer comprises: ##STR3## wherein X is hydrogen, carboxyl, sulfonic acid, hydroxy, alkyl, halogen or nitro and Y is an alkyl group and hydrates of said esters.