Nitrogen Containing Patents (Class 568/30)
  • Patent number: 10421714
    Abstract: A process for the preparation of mesotrione enolate is provided. The process comprises providing a solution of mesotrione in an organic solvent and contacting the solution with a moderate base in the presence of water at a pH of from 6 to 8, to form an aqueous mesotrione enolate solution. A process for preparing mesotrione from the products of an enol ester rearrangement of 3-oxocyclohex-1-enyl-4-(methylsulfonyl)-2-nitrobenzoate is also provided. The process comprises contacting the products of the rearrangement reaction with an organic solvent to dissolve mesotrione; and contacting the resulting solution with an aqueous solution of an acid.
    Type: Grant
    Filed: June 6, 2016
    Date of Patent: September 24, 2019
    Assignee: ROTAM AGROCHEM INTERNATIONAL COMPANY LIMITED
    Inventor: James Timothy Bristow
  • Patent number: 9561230
    Abstract: The invention provides tricyclic sulfonamide compounds and their use in treating medical disorders, such as obesity. Pharmaceutical compositions and methods of making various tricyclic compounds are provided. The compounds are contemplated to have activity against methionyl aminopeptidase 2. For example, the invention relates in part to tricyclic sulfonamide compounds represented by Formula I: or pharmaceutically acceptable salts or stereoisomers thereof, wherein A, B, D, RA1, RA2, Y, X and n are as defined herein.
    Type: Grant
    Filed: October 8, 2015
    Date of Patent: February 7, 2017
    Assignee: Zafgen, Inc.
    Inventors: Susan Mary Cramp, Hazel Joan Dyke, Thomas David Pallin, Robert Zahler
  • Patent number: 9204652
    Abstract: [Problem] To provide an antibacterial agent which can be limited to the required location on the surface of a material without mixing and has excellent antibacterial, antifungal and antiviral effects even at low concentrations of the active component without elution or volatilization. [Solution] An antibacterial agent that contains as an active component a resin having an organic group represented by general formula (I-1). (In the formula (I-1), R1 and R2 mutually independently represent a C1-C4 fluoroalkyl group. “C” and “A” are bonded to each other through a covalent bond or an ionic bond, and “A” represents a hydrogen atom or a cation.
    Type: Grant
    Filed: September 28, 2011
    Date of Patent: December 8, 2015
    Assignee: Central Glass Company, Limited
    Inventors: Haruhiko Komoriya, Katsutoshi Suzuki, Toru Tanaka, Takamasa Kitamoto, Masayuki Shiota, Ryoko Shimada, Kazuki Tanaka
  • Patent number: 8980796
    Abstract: The invention relates to a crystalline polymorph Form 3 of 2-[4-(methylsulfonyl)-2-nitrobenzoyl]-1,3-cyclohex-anedione. A process for its preparation, use thereof for the control of weeds, and an herbicidal composition comprising thereof are also disclosed.
    Type: Grant
    Filed: July 21, 2010
    Date of Patent: March 17, 2015
    Assignee: Agan Chemical Manufacturers Ltd.
    Inventors: Carmen Cohen, Ruben Maidan
  • Patent number: 8900795
    Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution, and an acidic compound component (J) which is decomposed by exposure to exhibit decreased acidity, wherein the acidic compound component (J) contains a compound represented by formula (J1) [in the formula, R1 represents H, OH, halogen atom, alkoxy group, hydrocarbon group or nitro group; m represents 0-4; n represents 0-3; Rx represents H or hydrocarbon group; X1 represents divalent linking group; X2 represents H or hydrocarbon group; Y represents single bond or C(O); A represents alkylene group which may be substituted with oxygen atom, carbonyl group or alkylene group which may have fluorine atom; Q1 and Q2 represents F or fluorinated alkyl group; and W+ represents primary, secondary or tertiary ammonium coutercation which exhibits pKa smaller than pKa of H2N+(X2)—X1—Y—O-A-C(Q1)(Q2)—SO3? generated by decomposition upon exposure].
    Type: Grant
    Filed: January 10, 2013
    Date of Patent: December 2, 2014
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yoshiyuki Utsumi, Hiroaki Shimizu, Jiro Yokoya
  • Publication number: 20140303402
    Abstract: Process for the preparation of known sulfonamides having antibacterial activity applicable on industrial scale, which allows their production in high yields and purity, comprising in particular the step of nucleophile aromatic substitution and oxidation in suitable conditions.
    Type: Application
    Filed: April 2, 2014
    Publication date: October 9, 2014
    Applicant: DIPHARMA FRANCIS S.r.l.
    Inventors: Pietro ALLEGRINI, Simone MANTEGAZZA
  • Patent number: 8808702
    Abstract: Compounds useful as antiproliferative agents according to formula (I): wherein Ar1, Ar2, Ar3, m and n are as defined herein, salts, antibody conjugates, pharmaceutical compositions, methods of treatment, and synthetic methods are provided.
    Type: Grant
    Filed: December 12, 2007
    Date of Patent: August 19, 2014
    Assignee: Temple University-of the Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 8748445
    Abstract: The present disclosure provides for method of treatment and/or prevention of disease states that require cystine for maintenance or progression of the disease state. In addition, methods for screening and identifying novel therapeutic agents useful in the treatment of such disease states are described. In one embodiment, the disease state is a cancer, such as, but not limited to, glioma. In this embodiment, methods for the treatment and prevention of glioma by inhibiting cystine uptake or decreasing intracellular cystine concentrations are provided. The present disclosure teaches that glioma cells are dependent on system Xc for cystine uptake. Pharmacological inhibition of system Xc causes a rapid depletion of intracellular glutathione, resulting in decreased cell growth. In contrast, non-malignant astrocytes and cortical neurons remain viable in the presence of Xc inhibitors and continue to take up cystine via alternate amino acid transporters.
    Type: Grant
    Filed: October 27, 2005
    Date of Patent: June 10, 2014
    Assignee: The UAB Research Foundation
    Inventors: W. Joon Chung, Harald Sontheimer
  • Patent number: 8697882
    Abstract: The present invention provides a compound represented by the formula (I): wherein R1 represents a hydrogen atom, a halogen atom or a C1-C6 alkyl group which may have one or more halogen atoms, A1 represents a divalent connecting group, X1 represents a C2-C36 heterocyclic group and one or more —CH2— in the C2-C36 heterocyclic group can be replaced by —CO— or —O—, R2 is independently in each occurrence a halogen atom, a hydroxyl group, a C1-C24 hydrocarbon group, a C1-C12 alkoxy group, a C2-C4 acyl group or a C2-C4 acyloxy group, and m represents an integer of 0 to 10.
    Type: Grant
    Filed: July 1, 2011
    Date of Patent: April 15, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Hyungjoo Kim, Akira Kamabuchi, Yuichi Mukai
  • Publication number: 20130193382
    Abstract: The present invention relates to compounds of the formula (I) and to the use thereof in electronic devices. The invention furthermore relates to electronic devices, preferably organic electroluminescent devices (OLEDs), comprising one or more com-pounds of the formula (I). The invention again furthermore relates to the preparation of compounds of the formula (I) and to formulations comprising one or more compounds of the formula (I).
    Type: Application
    Filed: September 6, 2011
    Publication date: August 1, 2013
    Applicant: MERCK PATENT GmbH
    Inventors: Arne Buesing, Thomas Eberle, Irina Martynova, Teresa Mujica-Fernaud
  • Patent number: 8435717
    Abstract: A sulfonic acid onium salt represented by the following formula (1) can be used as a superior radiosensitive acid generator for resist compositions. It is possible to form a good pattern by using a resist composition containing this sulfonic acid onium salt. In formula (1), R1 represents a monovalent organic group, and Q+ represents a sulfonium cation or iodonium cation.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: May 7, 2013
    Assignee: Central Glass Company, Limited
    Inventors: Yuji Hagiwara, Jonathan Joachim Jodry, Satoru Narizuka, Kazuhiko Maeda
  • Patent number: 8334410
    Abstract: A method for producing a 3-mercaptoaniline compound, which is a known intermediate for a 3-(1H-1,2,4-triazol-1-yl)phenylsulfide derivative, useful as a pesticide, and a method for producing a compound which can be used as a starting material in producing the 3-mercaptoaniline compound are disclosed. In one embodiment the nitro group and the chlorosulfonyl group of a 3-nitrobenzenesulfonyl chloride compound represented by general formula (1): are reduced in the presence of an acid catalyst to produce a compound of general formula (2): In the above general formulas (1) and (2), R represents an alkyl group or a cyclic alkyl group, and X represents a halogen atom.
    Type: Grant
    Filed: November 28, 2008
    Date of Patent: December 18, 2012
    Assignee: Ihara Chemical Industry Co., Ltd.
    Inventor: Kentaro Kawazoe
  • Patent number: 8318427
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: September 21, 2011
    Date of Patent: November 27, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20120220802
    Abstract: Aniline derivatives represented by formula (8) and formula (9): The aniline derivatives can be used as insecticides.
    Type: Application
    Filed: March 13, 2012
    Publication date: August 30, 2012
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kei Yoshida, Takeo Wakita, Hiroyuki Katsuta, Akiyoshi Kai, Yutaka Chiba, Kiyoshi Takahashi, Hiroko Kato, Nobuyuki Kawahara, Michikazu Nomura, Hidenori Daido, Junji Maki, Shinichi Banba, Atsuko Kawahara
  • Patent number: 8241822
    Abstract: Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar?1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar?1-A1-Y1-A1-Ar?1—; wherein these radicals optionally are substituted; Ar?1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
    Type: Grant
    Filed: May 22, 2008
    Date of Patent: August 14, 2012
    Assignee: BASF SE
    Inventors: Hitoshi Yamato, Toshikage Asakura, Akira Matsumoto, Peter Murer, Tobias Hintermann
  • Publication number: 20120165197
    Abstract: The invention relates to a crystalline polymorph Form 3 of 2-[4-(methylsulfonyl)-2-nitrobenzoyl]-1,3-cyclohex-anedione. A process for its preparation, use thereof for the control of weeds, and an herbicidal composition comprising thereof are also disclosed.
    Type: Application
    Filed: July 21, 2010
    Publication date: June 28, 2012
    Applicant: AGAN CHEMICAL MANUFACTURERS LTD.
    Inventors: Carmen Cohen, Ruben Maidan
  • Patent number: 8206890
    Abstract: A resist composition including: a base component (A) which exhibits changed solubility in an alkali developing solution under action of acid; and an acid-generator component (B) which generates acid upon exposure, wherein said acid-generator component (B) comprises an acid generator (B1) including a compound represented by general formula (b1-11) shown below: wherein R7? to R9? each independently represent an aryl group or an alkyl group, wherein two of R7? to R9? may be bonded to each other to form a ring with the sulfur atom, and at least one of R7? to R9? represents a substituted aryl group having a group represented by general formula (I) shown below as a substituent; X? represents an anion; and Rf represents a fluorinated alkyl group.
    Type: Grant
    Filed: July 8, 2009
    Date of Patent: June 26, 2012
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Takehiro Seshimo, Tsuyoshi Nakamura, Naoto Motoike, Hiroaki Shimizu, Kensuke Matsuzawa, Hideo Hada
  • Patent number: 8143453
    Abstract: ?,?-Unsaturated sulfides, sulfones, sulfoxides and sulfonamides according to Formula I: wherein Ar1, Ar2, X, n, * and R are as defined herein, are prepared by dehydration of ?-hydroxy sulfides, sulfones, sulfoxides or sulfonamides.
    Type: Grant
    Filed: February 24, 2006
    Date of Patent: March 27, 2012
    Assignees: Temple University—Of The Commonwealth System of Higher Education, Onconova Therapeutics, Inc.
    Inventors: M. V. Ramana Reddy, E. Premkumar Reddy, Stanley C. Bell
  • Patent number: 8063253
    Abstract: The invention relates to a process for selectively controlling the crystallisation mesotrione [2-(4-methylsulphonyl-2-nitrobenzoyl)cyclohexane-1,3-dione] from aqueous solution in which the aqueous mesotrione solution is introduced to a crystalliser containing seed crystals predominantly of the thermodynamically stable polymorph (“Form 1”) in a semi-continuous or continuous manner. The invention further relates to a process for converting the metastable polymorph (“Form 2”) of mesotrione to Form 1 by introducing an aqueous solution containing the former form to a crystalliser containing seed crystals predominantly of the latter form.
    Type: Grant
    Filed: January 15, 2007
    Date of Patent: November 22, 2011
    Assignee: Syngenta Crop Protection, Inc.
    Inventor: Arthur Binder
  • Patent number: 8062844
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: November 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 8043786
    Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: October 25, 2011
    Assignee: JSR Corporation
    Inventors: Satoshi Ebata, Yong Wang, Isao Nishimura
  • Publication number: 20110245486
    Abstract: The invention relates to a method for producing 1,4-benzothiepin-1,1-dioxide derivatives substituted with benzyl groups.
    Type: Application
    Filed: April 29, 2009
    Publication date: October 6, 2011
    Applicant: SANOFI-AVENTIS DEUTSCHLAND GMBH
    Inventors: Guenter Billen, Wendelin Frick, John Patrick Larkin, Guy Lemaitre, Francoise Bendetti, Philippe Boffelli, Jean-Yves Godard, Christian Masson, Veronique Crocq, Sylvaine Lafont, Jos Hulshof
  • Patent number: 8017656
    Abstract: A compound given by the formula (I): has an excellent controlling activity against noxious arthropods.
    Type: Grant
    Filed: November 1, 2006
    Date of Patent: September 13, 2011
    Assignee: Sumitomo Chemical Company, Limited
    Inventor: Hiroyuki Miyazaki
  • Publication number: 20110190400
    Abstract: The present invention comprises compounds, compositions and methods of use for sensitizing cancer cells, tumors, neoplasms, and malignancies to the effects of ionizing radiation used in the treatment of cancer. The invention further comprises a method of identifying novel radiosensitizing compounds.
    Type: Application
    Filed: September 12, 2008
    Publication date: August 4, 2011
    Applicant: The Trustees of the University of Pennsylvania
    Inventors: Constantinos Koumenis, Brian E. Lally, Steven Kridel, Gary D. Kao, Adeboye Adejare
  • Publication number: 20110152563
    Abstract: Disclosed herein is a method for synthesizing terpenoid compounds, as well as compositions comprising terpenoids and methods for their use. In one aspect the process is represented by the scheme wherein G is X is and R1, R2 and R3 independently are selected from H, acyl, lower alkyl and aralkyl; and Y is —O—, —S— or —NH—, and R4 is selected from H, acyl, lower alkyl and aralkyl.
    Type: Application
    Filed: August 10, 2009
    Publication date: June 23, 2011
    Inventors: Joseph P. Noel, Justin A. Ramsey, Thomas J. Baiga
  • Publication number: 20110152332
    Abstract: The present invention relates to novel pesticidal azolidine derivatives as well as to oxazolidinone derivatives and their use as pesticides for combating animal parasites which occur in the agrochemical field and in the field of veterinary medicine, respectively. wherein X, m, R?, Q, G, U, l, A1 to A4 and R are as defined herein.
    Type: Application
    Filed: November 1, 2010
    Publication date: June 23, 2011
    Applicant: Bayer CropScience AG
    Inventors: Tetsuya Murata, Mamoru Hatazawa, Peter Brüchner, Eiichi Shimojo, Teruyuki Ichihara, Masashi Ataka, Katsuhiko Shibuya, Ulrich Görgens
  • Patent number: 7947831
    Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined within, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: May 24, 2011
    Assignee: BASF SE Ludwigshafen
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster
  • Patent number: 7910312
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: July 16, 2010
    Date of Patent: March 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Publication number: 20110021402
    Abstract: A solid detergent composition having the salt of an anionic surfactant and of a monopropanolamine counterion.
    Type: Application
    Filed: October 1, 2010
    Publication date: January 27, 2011
    Applicant: The Procter & Gamble Company
    Inventors: Ming Tang, Hiroshi Oh, Sen Liu, Victor Manuel Arredondo
  • Patent number: 7862996
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7863482
    Abstract: A method for reducing the cyanide levels in a mesotrione sample, said method comprising: (i) taking an aqueous solution of the mesotrione sample in an aqueous solvent, (ii) adjusting the pH of said aqueous solution to a value of 9.5 or higher, and (iii) crystallising the mesotrione out of solution is disclosed.
    Type: Grant
    Filed: March 3, 2005
    Date of Patent: January 4, 2011
    Assignee: Syngenta Crop Protection, Inc.
    Inventors: Alan Henry Benke, Julie Marie Wichert
  • Publication number: 20100305095
    Abstract: The present invention relates to, inter alia, the use of a compound capable of inhibiting 4-hydroxyphenylpyruvate dioxygenase (HPPD) in an animal in the manufacture of a medicament for use in the treatment and/or prevention of depression. The invention also provides for the use of a compound capable of inhibiting HPPD in an animal in the manufacture of a medicament for use in the treatment of the withdrawal symptoms associated with an addictive drug which causes dopamine dependant associative learning disorders in said animal. In a particular embodiment said HPPD inhibitor is selected from the group consisting of the compound depicted as compound 1; 2; and 3.22.
    Type: Application
    Filed: August 18, 2006
    Publication date: December 2, 2010
    Inventors: Kim Zachary Travis, John Posner
  • Patent number: 7833690
    Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: November 16, 2010
    Assignee: The University of North Carolina at Charlotte
    Inventors: Kenneth E. Gonsalves, Mingxing Wang
  • Patent number: 7820863
    Abstract: A process for reducing the levels of undesirable impurities in a mesotrione sample is disclosed, said process comprising the steps of: (i) forming a mesotrione enolate solution in an aqueous solvent, (ii) carrying out one or more purification processes, and (iii) crystallizing the purified mesotrione out of solution.
    Type: Grant
    Filed: October 1, 2004
    Date of Patent: October 26, 2010
    Assignee: Syngenta Crop Protection, Inc.
    Inventors: Julie Marie Wichert, Alan Henry Benke, Regine Laure Guidetti-Grep
  • Publication number: 20100249462
    Abstract: A method for producing a 3-mercaptoaniline compound, which is a known intermediate for a 3-(1H-1,2,4-triazol-1-yl)phenylsulfide derivative, useful as a pesticide, and a method for producing a compound which can be used as a starting material in producing the 3-mercaptoaniline compound are disclosed. In one embodiment the nitro group and the chlorosulfonyl group of a 3-nitrobenzenesulfonyl chloride compound represented by general formula (1): are reduced in the presence of an acid catalyst to produce a compound of general formula (2): In the above general formulas (1) and (2), R represents an alkyl group or a cyclic alkyl group, and X represents a halogen atom.
    Type: Application
    Filed: November 28, 2008
    Publication date: September 30, 2010
    Applicant: IHARA CHEMICAL INDUSTRY CO., LTD.
    Inventor: Kentaro Kawazoe
  • Patent number: 7795471
    Abstract: The present invention relates to a process for preparing a compound of the formula: wherein R1 is lower alkyl, R4 is hydrogen or lower alkyl, and Z is optionally substituted lower alkyl, optionally substituted lower alkenly, optionally substituted amino, optionally substituted lower alkoxy, optionally substituted carbocyclyl or optionally substituted heterocyclyl.
    Type: Grant
    Filed: May 11, 2009
    Date of Patent: September 14, 2010
    Assignee: Shionogi & Co., Ltd.
    Inventors: Yasuyuki Kawanishi, Masaaki Uenaka, Munenori Matsuura
  • Publication number: 20100184986
    Abstract: Organocatalysts, particularly proline sulfonamide organocatalysts, having a first general formula as follows are disclosed. Embodiments of a method for using these organocatalysts also are disclosed. The method comprises providing a disclosed organocatalyst, and performing a reaction, often an enantioselective or diastereoselective reaction, using the organocatalyst. Solely by way of example, disclosed catalysts can be used to perform aldol reactions, conjugate additions, Michael additions, Robinson annulations, Mannich reactions, ?-aminooxylations, ?-hydroxyaminations, ?-aminations and alkylation reactions. Certain of such reactions are intramolecular cyclizations used to form cyclic compounds, such as 5- or 6-membered rings, having one or more chiral centers. Disclosed organocatalysts generally are much more soluble in typical solvents used for organic synthesis than are known compounds.
    Type: Application
    Filed: March 17, 2010
    Publication date: July 22, 2010
    Inventors: Rich Garrett Carter, Hua Yang
  • Publication number: 20100152492
    Abstract: The invention relates to a process for selectively controlling the crystallisation mesotrione [2-(4-methylsulphonyl-2-nitrobenzoyl)cyclohexane-1,3-dione] from aqueous solution in which the aqueous mesotrione solution is introduced to a crystalliser containing seed crystals predominantly of the thermodynamically stable polymorph (“Form 1”) in a semi-continuous or continuous manner. The invention further relates to a process for converting the metastable polymorph (“Form 2”) of mesotrione to Form 1 by introducing an aqueous solution containing the former form to a crystalliser containing seed crystals predominantly of the latter form.
    Type: Application
    Filed: January 15, 2007
    Publication date: June 17, 2010
    Applicant: SYNGENTA CROP PROTECTION, INC.
    Inventor: Arthur Binder
  • Publication number: 20100028368
    Abstract: Compounds useful as antiproliferative agents according to formula (I): wherein Ar1, Ar2, Ar3, m and n are as defined herein, salts, antibody conjugates, pharmaceutical compositions, methods of treatment, and synthetic methods are provided.
    Type: Application
    Filed: December 12, 2007
    Publication date: February 4, 2010
    Applicant: TEMPLE UNIVERSITY- OF THE COMMONWEALTH SYSTEM OF HIGHER EDUCATION
    Inventors: E. Premkumar Reddy, M.V. Ramana Reddy
  • Publication number: 20090209426
    Abstract: A mixture of diuron with mesotrione optionally containing other herbicides such hexazinone is disclosed as useful for controlling undesired vegetation. Also disclosed is a herbicidal composition comprising diuron, mesotrione and optionally other herbicides such as hexazinone and at least one additional component selected from the group consisting of surfactants, solid diluents and liquid diluents. Further disclosed is a method of controlling undesired vegetation comprising applying to the locus of the vegetation a herbicidally effective amount of the mixture.
    Type: Application
    Filed: May 8, 2007
    Publication date: August 20, 2009
    Inventors: Jose Evanil Da Silva, Edison Hidalgo
  • Publication number: 20090181319
    Abstract: Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193 nm (ArF) imaging radiation.
    Type: Application
    Filed: January 16, 2008
    Publication date: July 16, 2009
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Wenjie Li, Sen Liu, Wu-Song Huang, Pushkara R. Varanasi, Irene Popova
  • Publication number: 20090131363
    Abstract: This invention relates to novel compounds that are hydroxyethylamino sulfonamide derivatives and pharmaceutically acceptable salts thereof. More specifically, this invention relates to novel hydroxyethylamino sulfonamide derivatives that are derivatives of darunavir. This invention also provides compositions comprising one or more compounds of this invention and a carrier and the use of the disclosed compounds and compositions in methods of treating diseases and conditions that are beneficially treated by administering a human immunodeficiency virus (HIV) protease inhibitor, such as darunavir.
    Type: Application
    Filed: October 24, 2008
    Publication date: May 21, 2009
    Inventor: Scott L. Harbeson
  • Patent number: 7531694
    Abstract: A new process for the preparation and purification of 4-4?-diamino-diphenyl-sulfone (dapsone) is described. The process described is a three step process comprising a condensation reaction with the synthesis of a thioether intermediate and then steps of oxidation and reduction in suitable conditions in order to obtain a product with good yield and purity.
    Type: Grant
    Filed: July 7, 2004
    Date of Patent: May 12, 2009
    Assignee: Lundbeck Pharmaceuticals Italy, S.p.A.
    Inventors: Marco Villa, Carla De Faveri, Riccardo Zanotti, Francesco Ciardella, Fabrizio Borin
  • Patent number: 7524977
    Abstract: There is provided a process for producing a fluoroalkanesulfonamide derivative represented by the formula [3], R2—NH—SO2—Rf—R1??[3] including reacting a fluoroalkanesulfonic anhydride represented by the formula [1], with an organic primary amine represented by the formula [2], in the presence of water and in the presence of a base selected from the group consisting of (a) a hydroxide of an alkali metal or alkaline-earth metal or (b) a basic salt containing an alkali metal or alkaline-earth metal.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: April 28, 2009
    Assignee: Central Glass Company, Limited
    Inventors: Kei Matsunaga, Takeo Komata
  • Publication number: 20090069561
    Abstract: The high efficiency and fidelity of click chemistry permits a large number of diverse dendrimers encompassing a wide variety of functionalities at the chain ends, repeat units, and/or core to be prepared. Almost quantitative yields were obtained during the synthesis. In some cases, filtration or solvent extraction was the only method required for purification. These features represent a significant advancement in dendrimer chemistry and demonstrate an evolving synergy between organic chemistry and functional materials.
    Type: Application
    Filed: June 30, 2005
    Publication date: March 12, 2009
    Applicant: The Scripps Research Institute
    Inventors: Valery Fokin, K. Barry Sharpless, Peng Wu, Alina Feldman
  • Publication number: 20090042114
    Abstract: Compounds of the formula I or II wherein R1 is C1-C10haloalkylsulfonyl, halobenzenesulfonyl, C2-C10haloalkanoyl, halobenzoyl; R2 is halogen or C1-C10haloalkyl; Ar1 is phenyl, biphenylyl, fluorenyl, naphthyl, anthracyl, phenanthryl, or heteroaryl, all of which are optionally substituted; Ar?1 is for example phenylene, naphthylene, diphenylene, heteroarylene, oxydiphenylene, phenylene-D-D1-D-phenylene or —Ar?1-A1-Y1-A1-Ar?1—; wherein these radicals optionally are substituted; Ar?1 is phenylene, naphthylene, anthracylene, phenanthrylene, or heteroarylene, all optionally substituted; A1 is for example a direct bond, —O—, —S—, or —NR6—; Y1 inter alia is C1-C18alkylene; X is halogen; D is for example —O—, —S— or —NR6—; D1 inter alia is C1-C18alkylene; are particularly suitable as photolatent acids in ArF resist technology.
    Type: Application
    Filed: May 22, 2008
    Publication date: February 12, 2009
    Inventors: Hitoshi Yamato, Toshikage Asakura, Akira Matsumoto, Peter Murer, Tobias Hintermann
  • Publication number: 20090012308
    Abstract: The present invention provides a process for the manufacture of an arylmethyl-sulfonylarene, R1CH2SO2R2, wherein R1 and R2 are each independently an optionally substituted phenyl or naphthyl group which process comprises reacting an arylmethylhalide, R1CH2-Hal wherein R1 is as defined hereinabove and Hal is Cl, Br or I with a sodium arylsulfinate R2SO2Na wherein R2 is as defined hereinabove in the presence of a base optionally in the presence of a solvent. Also provided is the use of the inventive process in the manufacture of a 3-arylsulfonylindazole 5-HT6 ligand.
    Type: Application
    Filed: June 9, 2008
    Publication date: January 8, 2009
    Applicant: Wyeth
    Inventors: Mahmut Levent, Panolil Raveendranath, Sanjay Raveendranath, Vijay Raveendranath, Girija Raveendranath
  • Patent number: 7459580
    Abstract: A process for the preparation of Compound (I) comprising reacting Compound (II) with a base in an aprotic solvent, which is represented by the following scheme: wherein R1 and R2 are each independently lower alkyl.
    Type: Grant
    Filed: October 12, 2007
    Date of Patent: December 2, 2008
    Assignee: Shionogi & Co., Ltd.
    Inventors: Yasuyuki Kawanishi, Masaaki Uenaka, Munenori Matsuura
  • Patent number: 7452673
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: November 18, 2008
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cupoletti
  • Publication number: 20080281127
    Abstract: A process for the preparation of isosulfan blue (Active Pharmaceutical Ingredient) is provided. A process is also provided for preparation of the intermediate, 2-chlorobenzaldehyde-5-sulfonic acid, sodium salt of formula (2), used in the preparation thereof and a procedure for the isolation of benzaldehyde-2,5-disulfonic acid, di-sodium salt of the formula (3). Also provided is a process for the preparation of an isoleuco acid of formula (4), which upon mild oxidation gives rise to isosulfan blue of pharmaceutical grade which can be used for preparation of pharmaceutical formulations. The isolation and purification procedures provided in the process provide substantially pure isosulfan blue with HPLC purity 99.5% or greater.
    Type: Application
    Filed: May 11, 2007
    Publication date: November 13, 2008
    Applicant: Apicore, LLC
    Inventors: Ravishanker Kovi, Satyam Nampalli, Peter Xavier Tharial