Nitrogen Containing Patents (Class 568/30)
  • Publication number: 20080251169
    Abstract: An ionic liquid is disclosed A precursor composition that comprises at least one ionic liquid and at least one energetic material is also disclosed, as is a method of synthesizing an ionic liquid and a method of desensitizing an explosive composition.
    Type: Application
    Filed: April 13, 2007
    Publication date: October 16, 2008
    Applicant: ALLIANT TECHSYSTEMS INC.
    Inventors: Steven M. Nicolich, Alexander J. Paraskos, Daniel W. Doll, Gary K. Lund, Wendy A. Balas
  • Patent number: 7417059
    Abstract: The present invention is directed to a class of cyclohexene derivatives bearing sulfamoyl and ester groups which have an inhibitory activity on nitric oxide (NO) production and cytokine production, and are useful as an agent for the prophylaxis and/or treatment of diseases such as, cardiac disease, autoimmune disease, inflammatory disease, central nervous system disease, infectious disease, sepsis, and septic shock.
    Type: Grant
    Filed: March 31, 2005
    Date of Patent: August 26, 2008
    Assignee: Takeda Pharmacetical Company Limited
    Inventors: Norikazu Tamura, Takashi Ichikawa, Masayuki Ii
  • Publication number: 20080167474
    Abstract: The present invention provides azulenyl nitrones, such as those having the following general formula: (I) compositions comprising the same and methods of their use for the treatment or prevention of oxidative, ischemic, ischemia/reperfusion-related and chemokine-mediated conditions.
    Type: Application
    Filed: September 22, 2005
    Publication date: July 10, 2008
    Applicant: FLORIDA INTERNATIONAL UNIVERSITY
    Inventors: David A. Becker, James J. Ley
  • Patent number: 7365231
    Abstract: The present invention provides the diaminophenyladamantane derivatives with antitumor activities and the preparation method therefore. The method includes a step of reacting an aromatic diol with at least one 5-halo-2-nitrophenol in the presence of at least one inorganic base in an organic solvent with a relatively high boiling point.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: April 29, 2008
    Assignee: National Taiwan University of Science & Technology
    Inventor: Yaw-Terng Chern
  • Patent number: 7338958
    Abstract: This invention relates to pyrimidine derivatives of general formula I in which Q, R1, R2, R3, R4, R5, X, and m have the meanings that are contained in the description, as inhibitors of cyclin-dependent kinases and VEGF-receptor tyrosine kinases, their production as well as their use as medications for treatment of various diseases.
    Type: Grant
    Filed: October 18, 2004
    Date of Patent: March 4, 2008
    Assignee: Schering AG
    Inventors: Ulrich Luecking, Gerhard Siemeister, Martin Krueger, Rolf Jautelat
  • Publication number: 20080045751
    Abstract: A process for reducing the levels of undesirable impurities in a mesotrione sample is disclosed, said process comprising the steps of: (i) forming a mesotrione enolate solution in an aqueous solvent, (ii) carrying out one or more purification processes, and (iii) crystallising the purified mesotrione out of solution.
    Type: Application
    Filed: October 1, 2004
    Publication date: February 21, 2008
    Inventors: Julie Marie Wichert, Alan Henry Benke, Regine Laure Guidetti-Grep
  • Patent number: 7307191
    Abstract: This present invention provides materials for use as solid or concentrated chemical precursors for the production of organic peroxy acids (peracids). Organic peroxy acids are formed using a precursor according to the invention when they are combined with hydrogen peroxide or a hydrogen peroxide precursor such as a percarbonate or a perborate in aqueous medium. Organic peroxy acids, such as peroxyacetic acid, are used currently to disinfect medical equipment such as endoscopes and related items.
    Type: Grant
    Filed: March 16, 2004
    Date of Patent: December 11, 2007
    Assignee: OH Technologies LLP
    Inventors: David W. Hobson, Danny O. Helton
  • Patent number: 7253317
    Abstract: The invention relates to a fluorination process for producing fluorinated compounds. The process consists in reacting a compound (I) corresponding to the formula with an ionic fluoride of a monovalent cation. M represents H, an alkali metal, a quaternary phosphonium group or a quaternary ammonium group. Y represents SO2 and m is 1, or else Y is PO and m is 2. Z represents CR2, N or P. R1 represents an electron-withdrawing group which has a Hammet ?P parameter of greater than 0.4. R2 represents a carbonaceous and/or electron-withdrawing group. X represents a halogen other than a fluorine. The fluorinated compounds obtained are of use in particular as electrolytes in lithium batteries.
    Type: Grant
    Filed: December 21, 2001
    Date of Patent: August 7, 2007
    Assignee: Hydro-Quebec
    Inventors: Milos Cernik, Antonin Ruzicka, Zdirad Zak, Virginie Pevere, Christophe Michot
  • Patent number: 7217492
    Abstract: An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: May 15, 2007
    Assignee: JSR Corporation
    Inventors: Eiji Yoneda, Yong Wang, Yukio Nishimura
  • Patent number: 7217841
    Abstract: Elastomers which have excellent stability to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation comprise, as stabilizers, at least one compound of the formula I [R—S(?O)m—CH2—CH(OH)—CH2]n—N(R1)2-n—R2, ??(I) in which R is C4–C20alkyl, hydroxyl-substituted C4–C20alkyl; phenyl, benzyl, ?-methylbenzyl, ?,?-dimethylbenzyl, cyclohexyl or —(CH2)qCOOR3, and, if m is 0, R may additionally be and, if n is 1 and R4 is hydrogen, R may additionally be R2—R1N—CH2—CH(OH)—CH2—S(?O)m—(CH2)x— or R2—R1N—CH2—CH(OH)—CH2—S(?O)m—CH2—CH2—(O—CH2—CH2)y—, R1 is hydrogen, cyclohexyl or C3–C12alkyl, R2 is R3 is C1-C18alkyl, R4 is hydrogen or —CH2—CH(OH)—CH2—S(?O)m—R, X is C1–C8alkyl, Y is C1–C8alkyl, m is 0 or 1, n is 1 or 2, q is 1 or 2, x is from 2 to 6, and y is 1 or 2. The compounds of the formula I are also suitable as stabilizers for elastomers to prevent contact discoloration of substrates coming into contact with elastomers.
    Type: Grant
    Filed: April 15, 2004
    Date of Patent: May 15, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Samuel Evans
  • Patent number: 7179817
    Abstract: Compounds represented by formula (I), prodrugs thereof and salts thereof, and pharmaceutical compositions comprising the same as an active ingredient (wherein each symbol has the meaning as defined in the specification.).
    Type: Grant
    Filed: May 9, 2002
    Date of Patent: February 20, 2007
    Assignee: ONO Pharmaceutical Co., Ltd.
    Inventors: Takuya Seko, Masahiko Terakado, Hiroshi Kohno, Shinya Takahashi
  • Patent number: 7135574
    Abstract: The present invention relates to a process for the preparation of compounds of formula I wherein the substituents are as defined in claim 1, by conversion of a compound of formula II reaction of that compound with a compound of formula IV X—C(O)—Q,??(IV) wherein X is a leaving group, to form a compound of formula V and treatment of that compound in the presence of a base with catalytic amounts of cyanide ions.
    Type: Grant
    Filed: February 11, 2005
    Date of Patent: November 14, 2006
    Assignee: Syngenta Crop Protection, Inc.
    Inventors: Hermann Schneider, Christoph Lüthy, Andrew Edmunds
  • Patent number: 7067683
    Abstract: This invention describes a safe method for the production of sulfamoyl chloride from chlorosulfonyl isocyanate and formic acid in the presence of a amide catalyst, taming the hazardous nature of this reaction by circumventing heat accumulation processes, as well as the sulfamoylation of alcohols and phenols with the resulting sulfamoyl chloride in N,N-dimethyl acetamide or N-methyl pyrrolidone thereby avoiding the formation of side-products which were inevitable with the methods of the prior art using dimethyl formamide or dichloromethane as a solvent. The current invention allows industrial scale applications and describes as an example the process of manufacture of the biologically active compound 17?-Hydroxyestra-1,3,5(10)-triene-3-yl sulfamate.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: June 27, 2006
    Assignee: Schering AG
    Inventors: Jens Geisler, Frank Schneider, Fernando Lopez Holguin, Kai Lovis
  • Patent number: 7053123
    Abstract: (E)-Styryl benzylsulfones useful as antiproliferative agents, including, for example, anticancer agents, are provided according to formula I: wherein: R1 is selected from the group consisting of halogen, C1–C6 alkoxy, nitro, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); and R2 and R3 are independently selected from the group consisting of halogen, C1–C6 alkoxy, C1–C6 alkyl, nitro, cyano, hydroxyl, phosphonato, amino, sulfamyl, carboxy, acetoxy, and dimethylamino (C2–C6 alkoxy); provided: R1 may not be halogen when R2 and R3 are both halogen; R2 may not be 2-halogen when R3 is 4-halogen; or a pharmaceutically acceptable salt thereof; or formula II: wherein: R4 is selected from the group consisting of C1–C6 alkoxy, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); R6 is selected from the group consisting of nitro, hydrogen, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); and R7 is selected from the group consistin
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: May 30, 2006
    Assignee: Temple University-of the Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 7033728
    Abstract: The present invention relates to a photosensitive composition useful at wavelengths between 300 nm and 10 nm which comprises a polymer containing a substituted or unsubstituted higher adamantane.
    Type: Grant
    Filed: December 29, 2003
    Date of Patent: April 25, 2006
    Assignee: AZ Electronic Materials USA Corp.
    Inventor: Ralph R. Dammel
  • Patent number: 7005549
    Abstract: This disclosure describes unique chemical structures for use as solid or concentrated chemical precursors to the production of peroxy acids when combined with hydrogen peroxide or a hydrogen peroxide precursor such as percarbonates or perborates. Peroxy acids (peracids) such as peroxyacetic acid are used currently to disinfect medical equipment such as endoscopes and related items. It has been discovered that these structures are not currently listed in Chemical Abstracts and do not appear to be the subject of any prior art related to this or any other similar application. The specification for this claim includes chemical structures for each claimed precursor as well as means of synthesis that could be carried our by any skilled synthetic organic chemist. Practical uses for this invention include several antimicrobial applications of which at least one example is included.
    Type: Grant
    Filed: January 6, 2004
    Date of Patent: February 28, 2006
    Inventors: David W. Hobson, Danny O. Helton
  • Patent number: 6924391
    Abstract: Inhibitors of the cytosolic phospholypase A2 enzymes are provided which are of use in controlling a wide variety of inflammatory diseases. The inhibitors of the present invention have the general formula wherein X, Z, X1, R1, R2, Ra, Rb, R3, R4 and Y are as defined in the specification.
    Type: Grant
    Filed: May 3, 2001
    Date of Patent: August 2, 2005
    Assignee: Bristol-Myers Squibb Company
    Inventors: Jacques Banville, Roger Remillard, Neelakantan Balasubramanian, Gilles Bouthillier, Alain Martel
  • Patent number: 6878750
    Abstract: This invention describes the new benzocycloheptenes of general formula I in which R1, R2 and SK have the meanings that are indicated in the description. The new compounds have selective estrogenic activity on bones and are suitable for the production of pharmaceutical agents, especially for prophylaxis and therapy of osteoporosis.
    Type: Grant
    Filed: September 11, 2002
    Date of Patent: April 12, 2005
    Assignee: Schering AG
    Inventors: Rolf Bohlmann, Jorg Kroll, Hermann Kuenzer, Christa Hegele-Hartung, Monika Lessl, Rosemarie Lichtner, Yukishige Nishino
  • Patent number: 6861554
    Abstract: A novel salt, creatine taurinate, and the compositions containing same (health foods, dietary supplements or drugs) are disclosed.
    Type: Grant
    Filed: March 19, 2002
    Date of Patent: March 1, 2005
    Assignee: Biosalts s.r.l.
    Inventor: Antonietta Buononato
  • Patent number: 6841638
    Abstract: The invention relates to an ionic compound corresponding to the formula [R1X1(Z1)—Q?—X2(Z2)—R2]m Mm+ in which Mm+ is a cation of valency m, each of the groups Xi is S?Z3, S?Z4, P—R3 or P—R4; Q is N, CR5, CCN or CSO2R5, each of the groups Zi is ?O, ?NC?N, ?C(C?N)2, ?NS (?Z)2R6 or ?C[S(?Z)2R6]2, each of the groups Ri, is Y, YO—, YS—, Y2N— or F, Y represents a monovalent organic radical or alternatively Y is a repeating unit of a polymeric frame. The compounds are useful for producing ion conducting materials or electrolytes, as catalysts and for doping polymers.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: January 11, 2005
    Assignees: ACEP Inc., Universite de Montreal, Centre National de la Recherche Scientifique, Institute of Organic Chemistry National Academy of Sciences of Ukraine
    Inventors: Michel Armand, Christophe Michot, Yurii Yagupolskii, Lev Yagupolskii, Andrej Bezdudny, Natalya Kondratenko
  • Patent number: 6794544
    Abstract: Among its several embodiments, the present invention provides an improved process for the preparation of tetrahydrobenzothiepine-1,1-dioxide compounds; the provision of a process for preparing a diastereomeric mixture of tetrahydrobenzothiepine-1,1-dioxide compounds from a single diastereomer of such compounds; the provision of a process for the preparation of 3-bromo-2-substituted propionaldehyde compounds; and the provision of a process for the preparation of 3-thio-2-substituted propionaldehyde compounds.
    Type: Grant
    Filed: December 23, 2002
    Date of Patent: September 21, 2004
    Assignee: Pharmacia Corporation
    Inventors: Kevin A. Babiak, Andrew Carpenter, Shine Chou, Pierre-Jean Colson, Payman Farid, Robert Hett, Christian H. Huber, Kevin J. Koeller, Jon P. Lawson, James Li, Eduardo K. Mar, Lawrence M. Miller, Vladislav Orlovski, James C. Peterson, Mark J. Pozzo, Claire A. Przybyla, Samuel J. Tremont, Jay S. Trivedi, Grace M. Wagner, Gerald A. Weisenburger, Benxin Zhi
  • Patent number: 6770420
    Abstract: The invention describes the use of oxime alkyl sulfonate compounds of formula 1 R0 is either an R1—X group or R2; X is a direct bond, an oxygen atom or a sulfur atom; R1 is hydrogen, C1-C4alkyl or a phenyl group which is unsubstituted or substituted by a substituent selected from the group consisting of chloro, bromo, C1-C4alkyl and C1-C4-alkyloxy; R2 is hydrogen or C1-C4alkyl; and R3 is straight-chain or branched C1-C12alkyl which is unsubstituted or substituted by one or more than one halogen atom; as photosensitive add generator in a chemically amplified photoresist which is developable in alkaline medium and which is sensitive to radiation at a wavelength of 340 to 390 nanometers and correspondingly composed positive and negative photoresists for the above-mentioned wavelength range.
    Type: Grant
    Filed: July 2, 2003
    Date of Patent: August 3, 2004
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Kurt Dietliker, Martin Kunz, Hitoshi Yamato, Christoph De Leo
  • Patent number: 6717008
    Abstract: Derivatives of C2-substituted indan-1-ol compounds, processes for their preparation and their use are disclosed. In particular, the invention relates to compounds of the formula I and to their physiologically acceptable salts and physiologically functional derivatives. The compounds are suitable, for example, for use as anorectics.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: April 6, 2004
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Publication number: 20040048920
    Abstract: The present invention is directed to selective LXR modulators, small molecule compounds corresponding to Formula I and is further directed to a process of treating a condition in a mammal that is modulated by LXR using a therapeutically effective dose of a compound of Formula I.
    Type: Application
    Filed: May 23, 2003
    Publication date: March 11, 2004
    Applicant: Pharmacia Corporation
    Inventors: Daniel P. Becker, Gary A. DeCrescenzo, James W. Malecha, Julie M. Miyashiro, Jennifer Ann Van Camp, Joe T. Collins
  • Patent number: 6692893
    Abstract: Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: February 17, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Jun Watanabe, Takeshi Nagata, Jun Hatakeyama
  • Patent number: 6639094
    Abstract: A process for producing &agr;-amino-dihalogenated methyl ketone derivatives by reacting an N-protected &agr;-amino acid ester with a dihalomethyl lithium is provided. This process is suitable for the production on an industrial scale and by this process, &agr;-amino-dihalogenated methyl ketone derivatives and &bgr;-amino-&agr;-hydroxycarboxylic acid derivatives can be obtained efficiently and economically advantageously.
    Type: Grant
    Filed: September 12, 1999
    Date of Patent: October 28, 2003
    Assignee: Ajinomoto Co., Inc.
    Inventors: Tomoyuki Onishi, Takashi Nakano, Naoko Hirose, Takayoshi Torii, Masakazu Nakazawa, Kunisuke Izawa
  • Patent number: 6608233
    Abstract: The present invention relates to a process for producing a bis(4-hydroxy-3-nitrophenyl) compounds, characterized by nitrating a bis(4-hydroxyphenyl) compound wherein two phenyl groups are bonded to each other directly or through an electron-donating bridging group, sulfoxide group, sulfone group or carbonyl group in an inert solvent using nitric acid under the condition of substantially free from any other acid. According to the process, the target compounds reduced in the content of trinitrates can be produced in high yield and further recrystallizing the compound easily gives in high yield a high-purity products suitable for use as a raw material of producing a heat-resistant polymer and so on because the content of a trinitro-substitued compound in that compound is low.
    Type: Grant
    Filed: October 10, 2002
    Date of Patent: August 19, 2003
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Eiichi Tanaka, Masaki Fujimoto
  • Patent number: 6605409
    Abstract: A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.
    Type: Grant
    Filed: May 21, 2001
    Date of Patent: August 12, 2003
    Assignee: Fuji Photo Film Co., Ltd.
    Inventors: Kunihiko Kodama, Shinichi Kanna
  • Patent number: 6605645
    Abstract: Nobel polyamine compounds and polyamine compounds having carcinostatic action are provided. There are also provided anticancer agents containing as active ingredient at least one of polyamine compounds represented by the following Formula (I) or (III) and/or pharmaceutically acceptable salts thereof. Specifically, there are provided anticancer agents containing as active ingredient at least one of 1,18-bis(ethylamino)-5,14-diazaoctadecane, 1,16-bis(cyclopropylmethylamino)-5,12-diazahexadecane, 1,17-bis(cyclopropylmethylamino)-5,13-diazaheptadecane and/or pharmaceutically acceptable salts thereof.
    Type: Grant
    Filed: October 16, 2001
    Date of Patent: August 12, 2003
    Assignee: Riken
    Inventor: Masaaki Iwata
  • Patent number: 6582879
    Abstract: The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same. In particularly, the present invention relates to the heat-resistant photoresist composition comprising the photo acid-generating agent expressed by the following formula (1), which can increase the degree of polymerization, and polyamide oligomers having acetal or its cyclized derivatives, which have an ability of that light-exposed area is dissolved in the developer and light-unexposed area is convertible to a heat-resistant polymer in the latter heating process and thus, it can be used for passivation layer, buffer coat or layer-insulating film of the multilayer printed circuit board, wherein and R are the same as defined in the detailed description of the Invention.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: June 24, 2003
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Moon Young Jin, Jong Chan Won, Sang Yeol Choi
  • Patent number: 6551758
    Abstract: Onium salts of arylsulfonyloxybenzenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: April 22, 2003
    Assignee: Shin-Etsu Chemical Co. Ltd.
    Inventors: Youichi Ohsawa, Jun Watanabe, Kazunori Maeda
  • Patent number: 6512020
    Abstract: Compounds of formula I, II and III, wherein wherein R1 is for example hydrogen, C1-C12alkyl, C3-C30cycloalkyl, C2-C12alkenyl, C4-C8cycloalkenyl, phenyl, which is unsubstituted or substituted, naphthyl, anthracyl or phenanthryl, unsubstituted or substituted, heteroaryl radical which is unsubstituted or substituted; wherein all radicals R1 with the exception of hydrogen can additionally be substituted by a group having a —O—C-bond or a —O—Si-bond which cleaves upon the action of an acid; R′1 is for example phenylene, naphthylene, diphenylene or oxydiphenylene, wherein these radicals are unsubstituted or substituted; R2 is halogen or C1-C10haloalkyl; R3 is for example C1-C18alkylsulfonyl, phenylsulfonyl, naphthylsulfonyl, anthracylsulfonyl or phenanthrylsulfonyl, wherein the groups are unsubstituted or substituted, or R3 is e.g.
    Type: Grant
    Filed: March 28, 2001
    Date of Patent: January 28, 2003
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Toshikage Asakura, Hitoshi Yamato, Masaki Ohwa, Jean-Luc Birbaum, Kurt Dietliker, Junichi Tanabe
  • Patent number: 6495607
    Abstract: Benzocycloheptenes of general formula I in which R1, R2 and Y have the meanings indicated herein, have antiestrogenic activity on and are suitable for the production of pharmaceutical agents, especially for prophylaxis and therapy of osteoporosis.
    Type: Grant
    Filed: July 19, 1999
    Date of Patent: December 17, 2002
    Assignee: Schering AG
    Inventors: Rolf Bohlmann, Jorg Kroll, Hermann Kuenzer, Christa Hegele-Hartung, Monika Lessl, Rosemarie Lichtner, Yukishige Nishino
  • Patent number: 6482567
    Abstract: New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, non-ionic PAGs are provided that contain an oxime sulfonate group, and/or an N-oxyimidosulfonate group. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 nm.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: November 19, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Gerhard Pohlers
  • Patent number: 6458506
    Abstract: This invention relates to new photoacid generator compounds and photoresist compositions that comprise such compounds. In particular, the invention relates to photoacid generator compounds that generate an anthracene acid upon exposure to activating radiation, particularly anthracene sulfonic acids such as acids that include 9,10-dialkoxyanthracene-2-sulfonate moieties. Positive- and negative-acting chemically amplified resists that contain such PAGs and that are imaged with I-line (365 nm) radiation are particularly preferred.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: October 1, 2002
    Assignee: Shipley Company, LLC
    Inventor: James F. Cameron
  • Patent number: 6426359
    Abstract: This invention relates to the use of EP2 receptor subtype selective prostaglandin E2 agonists to augment bone mass including the prevention and treatment of skeletal disorders in mammals, including humans.
    Type: Grant
    Filed: June 11, 1999
    Date of Patent: July 30, 2002
    Assignee: Pfizer Inc.
    Inventors: Kimberly O. Cameron, Hua Z. Ke, Bruce A. Lefker, Robert L Rosati, David D. Thompson
  • Publication number: 20020068765
    Abstract: This invention describes the new benzocycloheptenes of general formula I 1
    Type: Application
    Filed: July 19, 1999
    Publication date: June 6, 2002
    Inventors: ROLF BOHLMANN, JORG KROLL, HERMANN KUENZER, CHRISTA HEGELE-HARTUNG, MONIKA LESSL, ROSEMARIE LICHTNER, YUKISHIGE NISHINO
  • Patent number: 6379590
    Abstract: A new method for producing unsymmetrically substituted fluorenyl compounds, one step of which is the preparation of 2,7-disubstituted fluoren-9-one derivatives via the nucleophilic substitution of a compound of the formula D wherein A′ is selected from the group consisting of —Br, —Cl, —F, —NO2, and —CN; A is selected from the group consisting of —NO2, —CN, —CO2R, —C(O)R, —SO2R, —SO2RF, —C(CN)═C(CN)2 and —CH═C(CN)2; RF is —CpF2p+1, p=from about 0 to about 10; R is an straight, branched or cyclic aliphatic alkyl group having about 1 to 10 carbon atoms, or an aromatic group such as phenyl or naphthyl; and is a carbonyl or a protected carbonyl such as a ketal or thio-ketal such as wherein R′ is —CrH2r+1; R″ is —(CH2)r—; and r is independently 2 or 3, with a nucleophilic reagent in the presence of an aprotic solvent
    Type: Grant
    Filed: December 2, 1994
    Date of Patent: April 30, 2002
    Assignee: AlliedSignal Inc.
    Inventors: Chengjiu Wu, Jianhui Shan
  • Patent number: 6376671
    Abstract: 2-Sulfamoylbenzoic acid derivatives of general formula (I): which have both an antagonistic effect on the leukotriene D4 receptor and an antagonistic effect on the thromboxane A2 receptor and salts thereof, pharmaceuticals, anti-allergic agents and leukotriene-thromboxane A2 antagonistic agents containing them as an active ingredient.
    Type: Grant
    Filed: April 27, 2001
    Date of Patent: April 23, 2002
    Assignee: Kaken Pharmaceutical Co., Ltd.
    Inventors: Yoshihiro Ichikawa, Tokiko Nishida, Jun Nakano, Mitsuru Watanuki, Masahiro Suda, Tsutomu Nakamura
  • Patent number: 6358883
    Abstract: The present invention relates to the pesticidal use of 1-aryl-1-(substituted thio, sulfinyl and sulfonyl)-2-nitroethane compounds having the structural formula I
    Type: Grant
    Filed: November 5, 1999
    Date of Patent: March 19, 2002
    Assignee: American Cyanamid Company
    Inventors: William Wakefield Wood, Annmarie Enos
  • Patent number: 6350545
    Abstract: Novel sulfonylinide and sulfonylmethide compounds are described which are useful as conductive salts. Also described is the use of the above compounds in salt form in battery electrolytes, particular salts having mixed perfluorocaron and hydrocarbon groups or having all hydrocarbon groups. The above salts are less expensive to produce and still exhibit excellent conductivity and low corrosivity.
    Type: Grant
    Filed: August 25, 1998
    Date of Patent: February 26, 2002
    Assignee: 3M Innovative Properties Company
    Inventors: Alan David Fanta, Phat tan Pham, Steven Joseph Hamrock
  • Patent number: 6303630
    Abstract: In accordance with the present invention, there is now provided novel anti-HIV compounds of the formulae selected from the group consisting of: wherein R1 is hydrogen or C1-C4 alkyl; R2 is hydrogen, C1-C4 alkyl, C1-C4 alkoxy or halogen; R3 is hydrogen, hydroxy, C1-C4 alkyl, C1-C4 alkoxy or halogen; R4 is hydrogen or halogen, R5 is hydrogen; C1-C4 alkoxy, nitro, halogen or haloalkyl; R6 is hydrogen or nitro; R7 is hydrogen or C1-C4 alkyl, C1-C4 alkoxy, nitro or halogen; R8 is hydrogen, hydroxy, C1-C4 alkyl, C1-C4 alkoxy or halogen; R9 is hydrogen or nitro; R10 is hydrogen or halogen; R11 is hydrogen, C1-C4 amine; R12 is hydrogen, C1-C4 alkyl or halogen; R13 is hydrogen, C1-C4 amine; R14 is hydrogen or halogen; R15 is hydrogen, C1-C4 alkoxy, C1-C4 haloalkyl, nitro, or halogen; R16 is hydrogen or nitro; R17 is hydrogen, C1-C4 alkyl, C1-C4 alkoxy, nitro or halogen; R18 is hydrogen, C1-C4 alkoxy, hydroxy, or halogen; R19 is hydrogen or nitro; and R20 is hydrogen or halogen, or a pha
    Type: Grant
    Filed: April 11, 2000
    Date of Patent: October 16, 2001
    Assignee: University of the Sciences in Philadelphia
    Inventor: Murray Zanger
  • Patent number: 6274758
    Abstract: A process for the preparation of an enantioenriched sulfone of formula (1), which comprises asymmetric hydrogenation of vinyl sulfone of formula (2) wherein R1 and R2 are each independently a hydrocarbon group of less than 20 carbons atoms, optionally substituted at any position, or either of R1 and R3 is H, and X is a coordinating group, in the presence of a stereoselective chiral catalyst.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 14, 2001
    Assignee: Darwin Discovery, Ltd.
    Inventors: Jane Marie Paul, Christopher Palmer
  • Publication number: 20010008736
    Abstract: Novel sulfonylimide and sulfonylmethide compounds are described which are useful as conductive salts. Also described is the use of the above compounds in salt form in battery electrolytes, particular salts having mixed perfluorocarbon and hydrocarbon groups or having all hydrocarbon groups. The above salts are less expensive to produce and still exhibit excellent conductivity and low corrosivity.
    Type: Application
    Filed: August 25, 1998
    Publication date: July 19, 2001
    Applicant: 3M INNOVATIVE PROPERTIES COMPANY
    Inventors: ALAN DAVID FANTA, PHAT TAN PHAM, STEVEN JOSEPH HAMROCK
  • Patent number: 6232503
    Abstract: The present invention provides compounds having the formula wherein R1, R2, R3, R4, and R5 are independently hydrogen, chlorine, bromine, fluorine, iodine, substituted or unsubstituted linear or branched C1-C3 alkoxy, substituted or unsubstituted linear or branched C1-C3 thioalkoxy, substituted or unsubstituted linear or branched C1-C8, alkyl, hydroxyl, thiol, —CN, —CF3, —OCF3, —NO2, acetyl, or —NR6R7; R6 and R7 are independently hydrogen, methyl, or ethyl; and X is iodine or bromine. Another embodiment of the invention includes specific ethynyl benzene sulfone derivatives. The alkynyl aryl sulfones of the present invention are useful as biocides, including, but not limited to, bactericides, fungicides, and preservatives. Also, a method of preparing the halogenated alkynyl aryl sulfones of formula I is provided.
    Type: Grant
    Filed: September 21, 1999
    Date of Patent: May 15, 2001
    Assignee: Lonza Inc.
    Inventor: Peter C. Nirchio
  • Patent number: 6201154
    Abstract: (Z)-styryl benzylsulfones of formula I are useful as anticancer agents: wherein R1 is selected from the group consisting of hydrogen, chloro and nitro; R2 is selected from the group consisting of hydrogen, lower alkyl, lower alkoxy, chloro, bromo, and fluoro; and R3 and R4 are independently selected from the group consisting of hydrogen, lower alkyl, nitro, chloro, bromo, and fluoro; provided that at least one of R1 or R2 is hydrogen. The corresponding (Z)-styryl benzylsulfides are useful as intermediates in the preparation of the biologically active (Z)-styryl benzyl sulfones.
    Type: Grant
    Filed: March 31, 1999
    Date of Patent: March 13, 2001
    Assignee: Temple University-of the Commonwealth of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 6153648
    Abstract: Iodopropargylamine compound of the general formula (1): ##STR1## wherein R.sup.1 and R.sup.2 each independently represent a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, or R.sup.1 and R.sup.2 combine with each other to form a tetramethylene group or a pentamethylene group, R.sup.3 represents a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and X and Y each independently represent a cyano group, an alkoxycarbonyl group having 2 to 7 carbon atoms, an alkylcarbonyl group having 2 to 7 carbon atoms, an alkylsulfonyl group having 1 to 6 carbon atoms, a phenylcarbonyl group or a phenylsulfonyl group, provided that the phenyl group of a phenylcarbonyl group or a phenylsulfonyl group may be optionally substituted by halogen atoms, alkyl groups having 1 to 3 carbon atoms, alkoxy groups having 1 to 3 carbon atoms, nitro groups or trifluoromethyl groups.
    Type: Grant
    Filed: February 23, 2000
    Date of Patent: November 28, 2000
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kenji Makino, Shinichi Igarashi, Mitsugu Futagawa
  • Patent number: 6130334
    Abstract: The invention encompasses a process for making compounds of Formula I useful in the treatment of cyclooxygenase-2 mediated diseases.
    Type: Grant
    Filed: April 15, 1998
    Date of Patent: October 10, 2000
    Assignee: Merck & Co., Inc.
    Inventors: Philip J. Pye, Ashok Maliakal, Kai Rossen, Ralph P. Volante, Jess Sager
  • Patent number: 6096930
    Abstract: The present invention relates to novel cyclohexane-1-3-dione derivatives of formula (1) useful as herbicides and plant-growth regulants, ##STR1## wherein X is selected from the group consisting of hydrogen, halogen, C.sub.1 -C.sub.6 alkyl, C.sub.2 -C.sub.6 alkoxy, C.sub.1 -C.sub.6 haloalkyl, nitro, C.sub.1 -C.sub.6 alkylthio, C.sub.1 -C.sub.6 alkylsulfinyl, C.sub.1 -C.sub.6 alkylsulfonyl, C.sub.1 -C.sub.6 sulfamoyl, and N, N-di(C.sub.1 -C.sub.6 alkyl)sulfamoyl group; (X)n represents the number of X substituents which may be substituted on benzene ring, wherein n is 1, 2 or 3. Also, cyclohexyl moiety, one of the substituents on benzofuran ring, is substituted at C-4, C-5, C-6 or C-7 position on benzene ring; R.sup.1 is selected from the group consisting of hydrogen and C.sub.1 -C.sub.6 alkyl group; R.sup.2 is selected from the group consisting of C.sub.1 -C.sub.6 alkyl, C.sub.2 -C.sub.6 alkenyl and C.sub.2 -C.sub.6 alkynyl group; R.sup.3 is selected from the group consisting of hydrogen, C.sub.1 -C.sub.
    Type: Grant
    Filed: May 12, 1998
    Date of Patent: August 1, 2000
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Eung Kul Ryu, Kyoung Mahn Kim, Jae Nyoung Kim, Jin Seog Kim
  • Patent number: 6057347
    Abstract: Nonsteroidal antiinflammatory drugs which have been substituted with a nitrogen monoxide group; compositions comprising (i) a nonsteroidal antiinflammatory drug, which can optionally be substituted with a nitrogen monoxide group and (ii) a compound that directly donates, transfers or releases a nitrogen monoxide group (preferably as a charged species, particularly nitrosonium); and methods of treatment of inflammation, pain, gastrointestinal lesions and/or fever using the compositions are disclosed. The compounds and compositions protect against the gastrointestinal, renal and other toxicities that are otherwise induced by nonsteroidal antiinflammatory drugs.
    Type: Grant
    Filed: September 16, 1997
    Date of Patent: May 2, 2000
    Assignee: NitroMed, Inc.
    Inventors: David S. Garvey, L. Gordon Letts, H. Burt Renfroe, Sang William Tam