Abstract: The present disclosure relates to the field of OLED technologies and provides a compound having TADF property. In an embodiment, the compound has a structure represented by Formula (1), in which L1 and L2 are each a hydrogen atom, phenyl, naphthyl, anthracyl, pyridyl, pyrimidinyl, and pyrazinyl; R1 and R2 are each aryl or and heteroaryl, such as a carbazole-derived group, an acridine-derived group, diarylamino, a diarylamine-derived group, and the like. In the present disclosure, the double boron heterocyclic structure functions not only as an electron acceptor but also as a linker. In the compound according to the present disclosure, by attaching a group having a large steric hindrance to the boron atom of the boron heterocyclic ring, the molecules the compound are prevented from aggregating, and thus a ?-aggregation or excimer formed by direct accumulation of the conjugate plane is avoided, thereby improving the light-emitting efficiency.

Abstract: A process for preparing diaryl sulfones, such as 4,4?-dichlorodiphenylsulfone is disclosed. The process comprises contacting an aryl compound with sulfur trioxide to provide a benzene sulfonic acid. The benzene sulfonic acid is coupled to additional aryl compound in the presence of a catalyst. During the coupling step, the additional aryl compound is continuously added while water is removed.

Abstract: Compounds and compositions are disclosed that are useful for treating ophthalmic conditions caused by or related to production of toxic visual cycle products that accumulate in the eye, such as dry adult macular degeneration, as well as conditions caused by or related to the misfolding of mutant opsin proteins and/or the mis-localization of opsin proteins. Compositions of these compounds alone or in combination with other therapeutic agents are also described, along with therapeutic methods of using such compounds and/or compositions. Methods of synthesizing such agents are also disclosed.

Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.

Abstract: The invention relates to a process for the single step conversion of isomeric mixture of dichlorodipheriyi sulfones to chlorobenzene. The invention further relates a process of using dilute sulfuric acid and re-circulating the dilute sulfuric acid.

Abstract: The invention relates to novel piperazine compounds of formula (I): to processes for their preparation; to pharmaceutical compositions containing the compounds; and to the use of the compounds in therapy to treat diseases for which blocking the Cav2.2 calcium channels is beneficial, i.e. in particular to treat pain.

Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.

Abstract: The present invention relates to a method of increasing the chlorine fastness of dyed synthetic polyamide fibre materials, which comprises treating the fibre material after dyeing with an aqueous liquor comprising a thiourea/formaldehyde/bisphenol condensate or a thiourea/polyisocyanate adduct.

Abstract: A method for fabricating a semiconductor product includes applying a photo-resist layer to a substrate, the photo-resist layer including a higher acid concentration at an upper portion of the photo-resist layer than at a lower portion of the photo-resist layer. The method also includes exposing the photo-resist layer to a light source through a mask including a feature, the photo-resist layer including a floating, diffusing acid that will diffuse into a region of the photo-resist layer affected by the feature while not diffusing into a feature formed by the mask.

Abstract: The present invention is directed towards a new class of semi-conducting nonacene derivatives. These compounds are all soluble species and they all possess superior resistance to oxidation as compared to their counterparts that lack the substitution patterns disclosed herein.

Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, sulfur trioxide and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.

Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.

Abstract: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc.

Abstract: A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.

Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the removal of such impurities.

Abstract: The inventions disclosed, described, and/or claimed herein relate to bis(sulfonyl)biaryl compounds that are useful as electron transporting materials useful for making novel organic electronic devices, including the electron transport layers of organic light-emitting diodes (“OLEDs”), or as an electron transporting guest for phosphorescent guests in the emissive layer of OLEDs.

Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, at least one fluorinated anhydride and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.

Abstract: Disclosed are novel gamma secretase inhibitors of the formula (I): or a pharmaceutically acceptable salt, solvate, or ester thereof, wherein L1, n, X, Ar, Y, Z, Q, and Q1 are as defined herein. Also disclosed are methods for inhibiting gamma secretase, methods for treating Alzheimer's disease, methods of treating one or more neurodegenerative diseases, and methods of inhibiting the deposition of amyloid protein (e.g., amyloid beta protein) in, on or around neurological tissue (e.g., the brain) using the compounds of formula 1.0.

Abstract: Provided are sulfone-containing polyarylene polymers, and processes for preparing the polymers. The polyarylene polymers are suitable for use as engineering polymers.

Abstract: A description is given of (4-haloalkyl-3-thiobenzoyl)cyclohexanediones of the formula (I) and of their use as herbicides. In this formula (I), X, Y, R1, R2, R3, and R4 are radicals such as hydrogen and organic radicals such as alkyl. A and Z are oxygen or alkylene.

Abstract: Disclosed is an organosulfur compound denoted by a general formula (a1): in which A denotes —S—, —S(O)— or —S(O)2—; Z1 and Z4 denote a trivalent aromatic hydrocarbon group or the like; Z2 and Z3 denote a bivalent aromatic hydrocarbon group or the like; Ar1, Ar2, Ar3 and Ar4 denote an aromatic hydrocarbon group or the like; and n is 0 or 1, or a general formula (b1): in which A denotes the same meaning as aforesaid; Z5 denotes a trivalent aromatic hydrocarbon group or the like; Ar denotes a m-valent aromatic hydrocarbon group or the like; Ar1 and Ar2 denote the aforesaid meaning; and m is 2 or 3. This compound is useful as an electron transport material, a hole blocking material or a host material of an organic electroluminescence element.

Abstract: Methods for the synthesis and use of functionalized, substituted naphthalenes are described. The functionalized, substituted naphthalenes display useful properties including liquid crystals and fluorescence properties, such as solvatochromatic fluorescence, with high quantum yields, Stoke's shift, and show emission maxima that are significantly red-shifted.

Abstract: The invention provides electrophilic monohalomethylating reagents, methods for their preparation and methods for preparation of monohalomethylated biologically active compounds using such reagents. Typical monohalomethyl groups transferred are FH2C—, CIH2C— and others. The reagents used for transferal of the groups are described by Formulae A-D: wherein: X?F, CI, Br, I, sulfonate esters, phosphate esters or another leaving group; R11=tetrafluoroborates, inflates, halogen, perchlorate, sulfates, phosphates or carbonates The other variables are as defined in the claims.

Abstract: The present invention is directed towards a new class of semi-conducting acene derivatives. These compounds are all soluble species and they all possess superior resistance to photooxidation as compared to their counterparts that lack the substitution patterns disclosed herein.

Abstract: Diphenylsulfone bridged compounds of the general formula: (1) wherein n is an integer of 1 to 10. Further, there is disclosed a thermal recording material comprising a support and, superimposed thereon, a thermosensitive color forming layer containing a color forming substance for thermal recording consisting of any of the diphenylsulfone bridged compounds and a color forming substance consisting of a colorless or light-colored leuco dye. This thermal recording material excels in the storability, especially wet heat resistance and oil resistance, of image areas and further exhibits excellent characteristics in the storability, especially heat resistance, of undeveloped areas.

Abstract: Disclosed is an organic electronic material comprising charge transporting compounds and ionic compounds having electron-accepting properties and high solubility in a solvent. The organic electronic material is characterized by comprising charge transporting compounds and ionic compounds, and in that at least one of the ionic compounds is any one kind of compounds represented by general formulas (1b)-(3b). (In the formulas Y1-Y6 each independently represent a divalent linking group, R1-R6 each independently represent an electron-attracting organic substituent (these structures can further have substituents and hetero-atoms, and R1, R2 and R3, or, R4-R6 can respectively combine and become a ring shape or a polymer shape) and L+ represents a monovalent cation.

Abstract: An optically active sulfoxide compound that is useful as an intermediate for synthesis or an active ingredient of a physiologically active substance such as a pharmaceutical agent is produced at a high optical purity. A process for producing an optically active sulfoxide compound of formula (4) comprises oxidizing a sulfide compound of formula (3) in the presence of an optically active metal complex of formula (1), (1?), (2) or (2?) by using an oxidizing agent. The present invention is also directed to the optically active metal complex.

Abstract: The present invention provides a method for the preparation of polymer grade 4,4?-dichlorodiphenyl sulfone in steps comprising reacting dimethyl sulfate and sulfur trioxide optionally containing a catalyst; reacting the formed dimethyl pyrosulfate with the unreacted sulfur trioxide optionally in the presence of a catalyst; reacting the reaction mixture with monochlorobenzene optionally containing a catalyst; optionally removing unreacted dimethyl sulfate; isolating crude 4,4?-dichlorodiphenyl sulfone using an organic solvent/organic solvent-water mixture; recovering the solvent from mother liquor; optionally recovering the isomeric mixture of dichlorodiphenyl sulfones from mother liquor; optionally, conversion of residual isomeric mixture of dichlorodiphenyl sulfones to a product selected from diphenyl sulfone, 2-aminodiphenyl sulfone; 2,4?-dihydroxydiphenyl sulfone, 4,4?-dihydroxydiphenyl sulfone; optionally recovering monochlorobenzene sulfonic acid and/or monochlorobenzene from the mother liquor; optionall

Abstract: A thermosensitive recording material which comprises a color forming layer comprising a color forming substance, which comprises a colorless or light color leuco dye, and a color developer and disposed on a support, wherein a mixture of (A) at least one compound selected from 4-hydroxy-4?-allyloxydiphenylsulfone, 4-hydroxy-4?-ethyloxydiphenylsulfone and 4-hydroxy-4?-n-propoxydiphenylsulfone and (B) a diphenylsulfone bridged compound represented by general formula (1): n representing an integer of 1 to 10, in amounts such that the ratio of the amounts by mass of (A) to (B) is 85:15 to 25:75 is used as the color developer. In the thermosensitive recording material, color is formed with a great density, image portions exhibit excellent properties for storage, in particular, excellent resistance to plasticizers, and portions of no color formation exhibit excellent properties for storage, in particular, excellent heat resistance.

Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.

Abstract: A dihalobiphenyl compound represented by the formula (1): wherein A represents an amino group substituted with one or two C1-C20 hydrocarbon groups or a C1-C20 alkoxy group, R1 represents a fluorine atom, a C1-C20 alkyl group, etc., X1 represents a chlorine atom, a bromine atom or an iodine atom, an k represents an integer of 0 to 3, and a polyarylene comprising a repeating unit represented by the formula (2): wherein A, R1 and k represent the same meanings as defined above.

Abstract: A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided. An aromatic sulfonium salt compound represented by the General Formula (I) below: (wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below). Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.

Abstract: A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to high-energy radiation, the sulfonium salt generates a sulfonic acid, which facilitates efficient scission of acid labile groups in chemically amplified positive resist compositions. Because of substantial non-volatility under high vacuum conditions in the EB or EUV lithography, the risk of the exposure tool being contaminated is minimized.

Abstract: Provided are sulfone-containing polyarylene polymers. Also provided are monomers and processes for preparing the polymers. The polyarylene polymers are suitable for use as engineering polymers.

Abstract: There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X? represents a monovalent polyatomic anion].

Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.

Abstract: ?,?-Unsaturated sulfones, sulfoxides, sulfonimides, sulfinimides, acylsulfonamides and acylsulfinamides of Formula I: wherein R1, R2, M1, M2, L, E1, E2, Q1, Q2 and n are as defined herein, are useful as anti-angiogenesis agents, as agents for treatment of age related senile dementia, and as antiproliferative agents including, for example, as anticancer agents.

Abstract: A method for manufacturing a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups selected from the group consisting of an iodine atom, a bromine atom and a chlorine atom are bonded to an aromatic ring and the aromatic compound (A) does not have (c1) a group represented by the following formula (10): wherein A1 represents a C1-C20 alkoxy group etc.; (g1) a C1-C20 alkyl group which may be substituted with a fluorine atom etc.; and (h1) a C2-C20 acyl group which may be substituted with a fluorine atom etc.

Abstract: The invention relates to a process for preparing 4,4?-dichlorodiphenyl sulfone, comprising the reaction of monochlorobenzene and liquid sulfur trioxide, wherein the liquid sulfur trioxide used has a boron content of at most 100 ppm based on the total weight of the sulfur trioxide used, including all secondary components.

Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5.

Abstract: A compound for an organic thin film transistor having a structure of the following formula (1): wherein R1 to R6 are independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 30 carbon atoms, a haloalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a haloalkoxy group having 1 to 30 carbon atoms, an alkylthio group having 1 to 30 carbon atoms, a haloalkylthio group having 1 to 30 carbon atoms, an alkylamino group having 1 to 30 carbon atoms, a dialkylamino group having 2 to 60 carbon atoms (the alkyl groups may be combined with each other to form a ring structure containing the nitrogen atom), an alkylsulfonyl group having 1 to 30 carbon atoms, a haloalkylsulfonyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 60 carbon atoms, an aromatic heterocyclic group having 3 to 60 carbon atoms, an alkylsilyl group having 3 to 20 carbon atoms, an alkylsilylacetylene group having 5 to 60 carbon atoms or a cyano group, which each may have

Abstract: The invention relates to a process for preparing 4-chlorobenzenesulfonic acid from 2-chlorobenzenesulfonic acid and/or 3-chlorobenzenesulfonic acid, comprising the conversion of 2-chlorobenzenesulfonic acid and/or 3-chlorobenzenesulfonic acid to 4-chlorobenzenesulfonic acid in the presence of sulfuric acid at a temperature of 100 to 300° C. The present invention further relates to a process for preparing 4,4?-dichlorodiphenyl sulfone, comprising said process for preparing 4-chlorobenzenesulfonic acid.

Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the removal of such impurities.

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(?O)—, —S(?O)—, —S(?O)2— and —OS(?O)2—, provided that —C(?O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.

Abstract: Disclosed is an organosulfur compound denoted by a general formula (a1): in which A denotes —S—, —S(O)— or —S(O)2—; Z1 and Z4 denote a trivalent aromatic hydrocarbon group or the like; Z2 and Z3 denote a bivalent aromatic hydrocarbon group or the like; Ar1, Ar2, Ar3 and Ar4 denote an aromatic hydrocarbon group or the like; and n is 0 or 1, or a general formula (b1): in which A denotes the same meaning as aforesaid; Z5 denotes a trivalent aromatic hydrocarbon group or the like; Ar denotes a m-valent aromatic hydrocarbon group or the like; Ar1 and Ar2 denote the aforesaid meaning; and m is 2 or 3. This compound is useful as an electron transport material, a hole blocking material or a host material of an organic electroluminescence element.

Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined within, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.

Abstract: A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to high-energy radiation, the sulfonium salt generates a sulfonic acid, which facilitates efficient scission of acid labile groups in chemically amplified positive resist compositions. Because of substantial non-volatility under high vacuum conditions in the EB or EUV lithography, the risk of the exposure tool being contaminated is minimized.

Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.

Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.

Abstract: Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.