Plural Rings Containing Patents (Class 568/34)
  • Patent number: 10040749
    Abstract: Compounds and compositions are disclosed that are useful for treating ophthalmic conditions caused by or related to production of toxic visual cycle products that accumulate in the eye, such as dry adult macular degeneration, as well as conditions caused by or related to the misfolding of mutant opsin proteins and/or the mis-localization of opsin proteins. Compositions of these compounds alone or in combination with other therapeutic agents are also described, along with therapeutic methods of using such compounds and/or compositions. Methods of synthesizing such agents are also disclosed.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 7, 2018
    Assignee: Bikam Pharmaceuticals Inc.
    Inventors: David S. Garvey, Judd Berman, Tan Quach
  • Patent number: 9212111
    Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.
    Type: Grant
    Filed: December 11, 2012
    Date of Patent: December 15, 2015
    Assignee: SOLVAY SPECIALTY POLYMERS USA, LLC
    Inventors: Walter Reichle, Olivier Vidberg, Nicholas Almeter, Chantal Louis
  • Patent number: 9120717
    Abstract: The invention relates to a process for the single step conversion of isomeric mixture of dichlorodipheriyi sulfones to chlorobenzene. The invention further relates a process of using dilute sulfuric acid and re-circulating the dilute sulfuric acid.
    Type: Grant
    Filed: April 12, 2012
    Date of Patent: September 1, 2015
    Assignee: HEMANT RATANAKAR BANDODKAR
    Inventors: Hemant Ratanakar Bandodkar, Dilip Chandrakant Sawant
  • Patent number: 8933132
    Abstract: The invention relates to novel piperazine compounds of formula (I): to processes for their preparation; to pharmaceutical compositions containing the compounds; and to the use of the compounds in therapy to treat diseases for which blocking the Cav2.2 calcium channels is beneficial, i.e. in particular to treat pain.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: January 13, 2015
    Assignee: Convergence Pharmaceuticals Limited
    Inventors: David Norton, Daniele Andreotti, Simon E. Ward, Roberto Profeta, Simone Spada, Helen Susanne Price
  • Publication number: 20140323765
    Abstract: A process for the manufacture of a haloaryl compound which comprises contacting a mixture of dihalodiarylsulfone isomers [mixture (M)] with sulfuric acid to provide a mixture of haloarylsulfonic acid isomers [mixture (M1)] and reacting mixture (M1) in the presence of water. The process is independent on the manufacturing process of mixture (M) and is advantageous in that the obtained haloaryl compound can be recycled to the first step of a dihalodiarylsulfone manufacturing process.
    Type: Application
    Filed: December 11, 2012
    Publication date: October 30, 2014
    Applicant: SOLVAY SPECIALTY POLYMERS USA, LLC.
    Inventors: Walter Reichle, Olivier Vidberg, Nicholas Almeter, Chantal Louis
  • Publication number: 20140259455
    Abstract: The present invention relates to a method of increasing the chlorine fastness of dyed synthetic polyamide fibre materials, which comprises treating the fibre material after dyeing with an aqueous liquor comprising a thiourea/formaldehyde/bisphenol condensate or a thiourea/polyisocyanate adduct.
    Type: Application
    Filed: October 16, 2012
    Publication date: September 18, 2014
    Applicant: Huntsman International LLC
    Inventor: Philippe Ouziel
  • Publication number: 20140255850
    Abstract: A method for fabricating a semiconductor product includes applying a photo-resist layer to a substrate, the photo-resist layer including a higher acid concentration at an upper portion of the photo-resist layer than at a lower portion of the photo-resist layer. The method also includes exposing the photo-resist layer to a light source through a mask including a feature, the photo-resist layer including a floating, diffusing acid that will diffuse into a region of the photo-resist layer affected by the feature while not diffusing into a feature formed by the mask.
    Type: Application
    Filed: March 9, 2013
    Publication date: September 11, 2014
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ching-Yu Chang, Ming-Feng Shieh, Wen-Hung Tseng
  • Patent number: 8822731
    Abstract: The present invention is directed towards a new class of semi-conducting nonacene derivatives. These compounds are all soluble species and they all possess superior resistance to oxidation as compared to their counterparts that lack the substitution patterns disclosed herein.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: September 2, 2014
    Assignee: University of New Hampshire
    Inventors: Glen P. Miller, Irvinder Kaur
  • Publication number: 20140228597
    Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, sulfur trioxide and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Application
    Filed: April 12, 2012
    Publication date: August 14, 2014
    Applicant: SOLVAY SPECIALITY POLYMERS USA, LLC
    Inventor: Chantal Louis
  • Publication number: 20140221595
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the recovery of the diphenyl sulfone.
    Type: Application
    Filed: April 7, 2014
    Publication date: August 7, 2014
    Applicant: SOLVAY ADVANCED POLYMERS, LLC
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Patent number: 8765351
    Abstract: A salt represented by the formula (X): wherein Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, L1 represents a C1-C17 divalent saturated hydrocarbon group in which one or more —CH2— can be replaced by —O— or —CO—, ring W1 represents a C4-C36 lactone ring, R3 is a C1-C6 alkyl group etc., t represents an integer of 0 to 2, Z+ represents an organic counter ion, and W10 represents a group represented by the formula (X-1): wherein L2 represents a single bond etc., ring W2 represents a C3-C36 saturated hydrocarbon ring in which one —CH2— is replaced by —CO— and in which one or more —CH2— can be replaced by —O— or —CO—, R1 represents a C1-C12 hydrocarbon group, R2 is a C1-C6 alkyl group etc.
    Type: Grant
    Filed: November 15, 2010
    Date of Patent: July 1, 2014
    Assignee: Sumitomo Chemical Company, Limted
    Inventors: Koji Ichikawa, Masako Sugihara, Isao Yoshida
  • Patent number: 8741544
    Abstract: A photoresist composition containing a resin that is hardly soluble or insoluble, but which is soluble in an aqueous alkali solution by action of an acid, and a salt represented by formula (I): wherein Q1, Q2, L1, W1, W2, R1, R2, t1 and t2 are defined in the specification, and Z+ represents an organic cation.
    Type: Grant
    Filed: August 20, 2012
    Date of Patent: June 3, 2014
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Isao Yoshida, Yuichi Mukai, Koji Ichikawa
  • Patent number: 8710171
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the removal of such impurities.
    Type: Grant
    Filed: October 23, 2009
    Date of Patent: April 29, 2014
    Assignee: Solvay Advanced Polymers, L.L.C.
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Publication number: 20140061545
    Abstract: The inventions disclosed, described, and/or claimed herein relate to bis(sulfonyl)biaryl compounds that are useful as electron transporting materials useful for making novel organic electronic devices, including the electron transport layers of organic light-emitting diodes (“OLEDs”), or as an electron transporting guest for phosphorescent guests in the emissive layer of OLEDs.
    Type: Application
    Filed: December 7, 2011
    Publication date: March 6, 2014
    Inventors: Julie Leroy, Annabelle Scarpaci, Stephen Barlow, Seth Marder, Sung-Jin Kim, Bernard Kippelen, Dengke Cai
  • Publication number: 20140039222
    Abstract: A process for the preparation of dihalodiphenylsulfones_such as 4,4?-dichlorodiphenyl sulfone or 4,4?-bis-(4-chlorophenylsulfonyl)biphenyl with high regioselectivity, at low temperature and in the absence of toxic reagents by reacting together at least one acid, at least one fluorinated anhydride and at least one halobenzene. The invented process is particularly suited for the manufacture of 4,4?-dichlorodiphenyl sulfone.
    Type: Application
    Filed: April 12, 2012
    Publication date: February 6, 2014
    Applicant: SOLVAY SPECIALITY POLYMERS USA, LLC
    Inventor: Chantal Louis
  • Patent number: 8618123
    Abstract: Disclosed are novel gamma secretase inhibitors of the formula (I): or a pharmaceutically acceptable salt, solvate, or ester thereof, wherein L1, n, X, Ar, Y, Z, Q, and Q1 are as defined herein. Also disclosed are methods for inhibiting gamma secretase, methods for treating Alzheimer's disease, methods of treating one or more neurodegenerative diseases, and methods of inhibiting the deposition of amyloid protein (e.g., amyloid beta protein) in, on or around neurological tissue (e.g., the brain) using the compounds of formula 1.0.
    Type: Grant
    Filed: July 15, 2008
    Date of Patent: December 31, 2013
    Assignee: Merck Sharp & Dohme Corp.
    Inventors: Thavalakulamgara K. Sasikumar, Duane A. Burnett, Theodros Asberom, Wen-Lian Wu, Hongmei Li, Ruo Xu, Hubert B. Josien
  • Patent number: 8609804
    Abstract: Provided are sulfone-containing polyarylene polymers, and processes for preparing the polymers. The polyarylene polymers are suitable for use as engineering polymers.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: December 17, 2013
    Assignee: E I du Pont de Nemours and Company
    Inventor: Mark F Teasley
  • Patent number: 8603947
    Abstract: A description is given of (4-haloalkyl-3-thiobenzoyl)cyclohexanediones of the formula (I) and of their use as herbicides. In this formula (I), X, Y, R1, R2, R3, and R4 are radicals such as hydrogen and organic radicals such as alkyl. A and Z are oxygen or alkylene.
    Type: Grant
    Filed: July 20, 2011
    Date of Patent: December 10, 2013
    Assignee: Bayer Cropscience AG
    Inventors: Hartmut Ahrens, Dieter Feucht, Elmar Gatzweiler, Isolde Haeuser-Hahn, Christopher Hugh Rosinger
  • Patent number: 8597799
    Abstract: Disclosed is an organosulfur compound denoted by a general formula (a1): in which A denotes —S—, —S(O)— or —S(O)2—; Z1 and Z4 denote a trivalent aromatic hydrocarbon group or the like; Z2 and Z3 denote a bivalent aromatic hydrocarbon group or the like; Ar1, Ar2, Ar3 and Ar4 denote an aromatic hydrocarbon group or the like; and n is 0 or 1, or a general formula (b1): in which A denotes the same meaning as aforesaid; Z5 denotes a trivalent aromatic hydrocarbon group or the like; Ar denotes a m-valent aromatic hydrocarbon group or the like; Ar1 and Ar2 denote the aforesaid meaning; and m is 2 or 3. This compound is useful as an electron transport material, a hole blocking material or a host material of an organic electroluminescence element.
    Type: Grant
    Filed: August 13, 2009
    Date of Patent: December 3, 2013
    Assignee: Ube Industries, Ltd.
    Inventors: Junji Kido, Tadashi Murakami
  • Publication number: 20130315841
    Abstract: Methods for the synthesis and use of functionalized, substituted naphthalenes are described. The functionalized, substituted naphthalenes display useful properties including liquid crystals and fluorescence properties, such as solvatochromatic fluorescence, with high quantum yields, Stoke's shift, and show emission maxima that are significantly red-shifted.
    Type: Application
    Filed: March 15, 2013
    Publication date: November 28, 2013
    Inventor: Kay M. Brummond
  • Publication number: 20130274460
    Abstract: The invention provides electrophilic monohalomethylating reagents, methods for their preparation and methods for preparation of monohalomethylated biologically active compounds using such reagents. Typical monohalomethyl groups transferred are FH2C—, CIH2C— and others. The reagents used for transferal of the groups are described by Formulae A-D: wherein: X?F, CI, Br, I, sulfonate esters, phosphate esters or another leaving group; R11=tetrafluoroborates, inflates, halogen, perchlorate, sulfates, phosphates or carbonates The other variables are as defined in the claims.
    Type: Application
    Filed: October 27, 2011
    Publication date: October 17, 2013
    Applicant: HOVIONE INTER LIMITED
    Inventor: Emilia Perpetua Tavares Leitao
  • Patent number: 8513466
    Abstract: The present invention is directed towards a new class of semi-conducting acene derivatives. These compounds are all soluble species and they all possess superior resistance to photooxidation as compared to their counterparts that lack the substitution patterns disclosed herein.
    Type: Grant
    Filed: November 30, 2009
    Date of Patent: August 20, 2013
    Assignee: University of New Hampshire
    Inventors: Glen P. Miller, Irvinder Kaur
  • Patent number: 8497227
    Abstract: Diphenylsulfone bridged compounds of the general formula: (1) wherein n is an integer of 1 to 10. Further, there is disclosed a thermal recording material comprising a support and, superimposed thereon, a thermosensitive color forming layer containing a color forming substance for thermal recording consisting of any of the diphenylsulfone bridged compounds and a color forming substance consisting of a colorless or light-colored leuco dye. This thermal recording material excels in the storability, especially wet heat resistance and oil resistance, of image areas and further exhibits excellent characteristics in the storability, especially heat resistance, of undeveloped areas.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: July 30, 2013
    Assignee: Nicca Chemical Co., Ltd.
    Inventors: Hajime Saito, Takeo Hasegawa
  • Publication number: 20130037753
    Abstract: Disclosed is an organic electronic material comprising charge transporting compounds and ionic compounds having electron-accepting properties and high solubility in a solvent. The organic electronic material is characterized by comprising charge transporting compounds and ionic compounds, and in that at least one of the ionic compounds is any one kind of compounds represented by general formulas (1b)-(3b). (In the formulas Y1-Y6 each independently represent a divalent linking group, R1-R6 each independently represent an electron-attracting organic substituent (these structures can further have substituents and hetero-atoms, and R1, R2 and R3, or, R4-R6 can respectively combine and become a ring shape or a polymer shape) and L+ represents a monovalent cation.
    Type: Application
    Filed: April 20, 2011
    Publication date: February 14, 2013
    Applicant: HITACHI CHEMICAL COMPANY, LTD
    Inventors: Kenichi Ishitsuka, Shigeaki Funyuu, Yousuke Hoshi
  • Patent number: 8367871
    Abstract: An optically active sulfoxide compound that is useful as an intermediate for synthesis or an active ingredient of a physiologically active substance such as a pharmaceutical agent is produced at a high optical purity. A process for producing an optically active sulfoxide compound of formula (4) comprises oxidizing a sulfide compound of formula (3) in the presence of an optically active metal complex of formula (1), (1?), (2) or (2?) by using an oxidizing agent. The present invention is also directed to the optically active metal complex.
    Type: Grant
    Filed: March 10, 2008
    Date of Patent: February 5, 2013
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Tsutomu Katsuki, Hiromichi Egami
  • Publication number: 20120302795
    Abstract: The present invention provides a method for the preparation of polymer grade 4,4?-dichlorodiphenyl sulfone in steps comprising reacting dimethyl sulfate and sulfur trioxide optionally containing a catalyst; reacting the formed dimethyl pyrosulfate with the unreacted sulfur trioxide optionally in the presence of a catalyst; reacting the reaction mixture with monochlorobenzene optionally containing a catalyst; optionally removing unreacted dimethyl sulfate; isolating crude 4,4?-dichlorodiphenyl sulfone using an organic solvent/organic solvent-water mixture; recovering the solvent from mother liquor; optionally recovering the isomeric mixture of dichlorodiphenyl sulfones from mother liquor; optionally, conversion of residual isomeric mixture of dichlorodiphenyl sulfones to a product selected from diphenyl sulfone, 2-aminodiphenyl sulfone; 2,4?-dihydroxydiphenyl sulfone, 4,4?-dihydroxydiphenyl sulfone; optionally recovering monochlorobenzene sulfonic acid and/or monochlorobenzene from the mother liquor; optionall
    Type: Application
    Filed: November 30, 2010
    Publication date: November 29, 2012
    Inventors: Hemant Ratanakar Bandodkar, Dilip Chandrakant Sawant
  • Patent number: 8283286
    Abstract: A thermosensitive recording material which comprises a color forming layer comprising a color forming substance, which comprises a colorless or light color leuco dye, and a color developer and disposed on a support, wherein a mixture of (A) at least one compound selected from 4-hydroxy-4?-allyloxydiphenylsulfone, 4-hydroxy-4?-ethyloxydiphenylsulfone and 4-hydroxy-4?-n-propoxydiphenylsulfone and (B) a diphenylsulfone bridged compound represented by general formula (1): n representing an integer of 1 to 10, in amounts such that the ratio of the amounts by mass of (A) to (B) is 85:15 to 25:75 is used as the color developer. In the thermosensitive recording material, color is formed with a great density, image portions exhibit excellent properties for storage, in particular, excellent resistance to plasticizers, and portions of no color formation exhibit excellent properties for storage, in particular, excellent heat resistance.
    Type: Grant
    Filed: August 22, 2008
    Date of Patent: October 9, 2012
    Assignee: Nicca Chemical Co., Ltd.
    Inventor: Hajime Saito
  • Patent number: 8258199
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: May 9, 2011
    Date of Patent: September 4, 2012
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cuppoletti
  • Patent number: 8236920
    Abstract: A dihalobiphenyl compound represented by the formula (1): wherein A represents an amino group substituted with one or two C1-C20 hydrocarbon groups or a C1-C20 alkoxy group, R1 represents a fluorine atom, a C1-C20 alkyl group, etc., X1 represents a chlorine atom, a bromine atom or an iodine atom, an k represents an integer of 0 to 3, and a polyarylene comprising a repeating unit represented by the formula (2): wherein A, R1 and k represent the same meanings as defined above.
    Type: Grant
    Filed: September 6, 2006
    Date of Patent: August 7, 2012
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Noriyuki Hida, Seiji Oda, Takashi Kamikawa, Katsuhiro Suenobu
  • Patent number: 8227624
    Abstract: A photoacid generator which can generate an acid efficiently when energy was absorbed, is excellent in the developing property and can form fine patterns, and a cationic polymerization initiator excellent in curability are provided; and a resist composition and a cationically polymerizable composition using them are provided. An aromatic sulfonium salt compound represented by the General Formula (I) below: (wherein each of E1 to E4 independently represents a substituent represented by the General Formula (II) below or the General Formula (III) below). Preferably, in the General Formula (I), r and s are 0; m and n are 0; or n and r are 0, and more preferably, one of m and s in the General Formula (I) is 1.
    Type: Grant
    Filed: August 4, 2008
    Date of Patent: July 24, 2012
    Assignee: Adeka Corporation
    Inventors: Tetsuyuki Nakayashiki, Kentaro Kimura
  • Patent number: 8173354
    Abstract: A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to high-energy radiation, the sulfonium salt generates a sulfonic acid, which facilitates efficient scission of acid labile groups in chemically amplified positive resist compositions. Because of substantial non-volatility under high vacuum conditions in the EB or EUV lithography, the risk of the exposure tool being contaminated is minimized.
    Type: Grant
    Filed: July 7, 2010
    Date of Patent: May 8, 2012
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Masaki Ohashi
  • Publication number: 20120004387
    Abstract: Provided are sulfone-containing polyarylene polymers. Also provided are monomers and processes for preparing the polymers. The polyarylene polymers are suitable for use as engineering polymers.
    Type: Application
    Filed: December 28, 2010
    Publication date: January 5, 2012
    Applicant: E. I. DU PONT DE NEMOURS AND COMPANY
    Inventor: Mark F. Teasley
  • Publication number: 20110300482
    Abstract: There is provided a sulfonium salt having high photosensitivity to the i-line. The invention relates to a sulfonium salt represented by formula (1) described below: [in formula (1), R1 to R6 each independently represent an alkyl group, a hydroxy group, an alkoxy group, an alkylcarbonyl group, an arylcarbonyl group, an alkoxycarbonyl group, an aryloxycarbonyl group, an arylthiocarbonyl group, an acyloxy group, an arylthio group, an alkylthio group, an aryl group, a heterocyclic hydrocarbon group, an aryloxy group, an alkylsulfinyl group, an arylsulfinyl group, an alkylsulfonyl group, an arylsulfonyl group, a hydroxy(poly) alkyleneoxy group, an optionally substituted amino group, a cyano group, a nitro group, or a halogen atom, m1 to m6 each represent the number of occurrences of each of R1 to R6, m1, m4, and m6 each represent an integer of 0 to 5, m2, m3, and m5 each represent an integer of 0 to 4, and X? represents a monovalent polyatomic anion].
    Type: Application
    Filed: February 4, 2010
    Publication date: December 8, 2011
    Applicant: SAN-APRO, LTD
    Inventors: Issei Suzuki, Hideki Kimura
  • Patent number: 8062844
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagents are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: January 21, 2011
    Date of Patent: November 22, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 8058313
    Abstract: ?,?-Unsaturated sulfones, sulfoxides, sulfonimides, sulfinimides, acylsulfonamides and acylsulfinamides of Formula I: wherein R1, R2, M1, M2, L, E1, E2, Q1, Q2 and n are as defined herein, are useful as anti-angiogenesis agents, as agents for treatment of age related senile dementia, and as antiproliferative agents including, for example, as anticancer agents.
    Type: Grant
    Filed: June 23, 2005
    Date of Patent: November 15, 2011
    Assignee: Temple University—Of The Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Publication number: 20110275859
    Abstract: A method for manufacturing a conjugated aromatic compound comprising reacting an aromatic compound (A) wherein one or two leaving groups selected from the group consisting of an iodine atom, a bromine atom and a chlorine atom are bonded to an aromatic ring and the aromatic compound (A) does not have (c1) a group represented by the following formula (10): wherein A1 represents a C1-C20 alkoxy group etc.; (g1) a C1-C20 alkyl group which may be substituted with a fluorine atom etc.; and (h1) a C2-C20 acyl group which may be substituted with a fluorine atom etc.
    Type: Application
    Filed: January 18, 2010
    Publication date: November 10, 2011
    Inventors: Seiji Oda, Takashi Kamikawa, Akio Tanaka
  • Publication number: 20110263902
    Abstract: The invention relates to a process for preparing 4,4?-dichlorodiphenyl sulfone, comprising the reaction of monochlorobenzene and liquid sulfur trioxide, wherein the liquid sulfur trioxide used has a boron content of at most 100 ppm based on the total weight of the sulfur trioxide used, including all secondary components.
    Type: Application
    Filed: April 20, 2011
    Publication date: October 27, 2011
    Applicant: BASF SE
    Inventors: Patrick Deck, Heiner Schelling, Florian Garlichs
  • Patent number: 8043786
    Abstract: The invention provides novel acid generators which are unproblematic in combustibility and accumulation inside the human body and can generate acids having high acidities and high boiling points and exhibiting properly short diffusion lengths in resist coating films and which permit the formation of resist patterns excellent smoothness with little dependence on the denseness of a mask pattern; sulfonic acids generated from the acid generators; sulfonyl halides useful as raw material in the synthesis of the acid generators; and radiation-sensitive resin compositions containing the acid generators. The acid generators have structures represented by the general formula (I), wherein R1 is a monovalent substituent such as alkoxycarbonyl, alkylsulfonyl, or alkoxysulfonyl; R2 to R4 are each hydrogen or alkyl; k is an integer of 0 or above; and n is an integer of 0 to 5.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: October 25, 2011
    Assignee: JSR Corporation
    Inventors: Satoshi Ebata, Yong Wang, Isao Nishimura
  • Publication number: 20110220883
    Abstract: A compound for an organic thin film transistor having a structure of the following formula (1): wherein R1 to R6 are independently a hydrogen atom, a halogen atom, an alkyl group having 1 to 30 carbon atoms, a haloalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a haloalkoxy group having 1 to 30 carbon atoms, an alkylthio group having 1 to 30 carbon atoms, a haloalkylthio group having 1 to 30 carbon atoms, an alkylamino group having 1 to 30 carbon atoms, a dialkylamino group having 2 to 60 carbon atoms (the alkyl groups may be combined with each other to form a ring structure containing the nitrogen atom), an alkylsulfonyl group having 1 to 30 carbon atoms, a haloalkylsulfonyl group having 1 to 30 carbon atoms, an aromatic hydrocarbon group having 6 to 60 carbon atoms, an aromatic heterocyclic group having 3 to 60 carbon atoms, an alkylsilyl group having 3 to 20 carbon atoms, an alkylsilylacetylene group having 5 to 60 carbon atoms or a cyano group, which each may have
    Type: Application
    Filed: August 5, 2009
    Publication date: September 15, 2011
    Applicant: IDEMITSU KOSAN CO., LTD.
    Inventors: Yuki Nakano, Masatoshi Saito, Hiroaki Nakamura
  • Publication number: 20110218357
    Abstract: The invention relates to a process for preparing 4-chlorobenzenesulfonic acid from 2-chlorobenzenesulfonic acid and/or 3-chlorobenzenesulfonic acid, comprising the conversion of 2-chlorobenzenesulfonic acid and/or 3-chlorobenzenesulfonic acid to 4-chlorobenzenesulfonic acid in the presence of sulfuric acid at a temperature of 100 to 300° C. The present invention further relates to a process for preparing 4,4?-dichlorodiphenyl sulfone, comprising said process for preparing 4-chlorobenzenesulfonic acid.
    Type: Application
    Filed: March 7, 2011
    Publication date: September 8, 2011
    Applicant: BASF SE
    Inventors: Patrick Deck, Heiner Schelling, Florian Garlichs
  • Publication number: 20110201775
    Abstract: The presence of certain impurities in diphenyl sulfone have a deleterious effect on the properties of the poly(aryletherketone)s produced therein, including one or more of color, melt stability, molecular weight, crystallinity, etc. and here identify those impurities and provide processes for the removal of such impurities.
    Type: Application
    Filed: October 23, 2009
    Publication date: August 18, 2011
    Applicant: SOLVAY ADVANCED POLYMERS, L.L.C.
    Inventors: Chantal Louis, William Gandy, Edward Ryan, Geoffrey Scott Underwood, Kong Yi
  • Publication number: 20110171577
    Abstract: An actinic ray-sensitive or radiation-sensitive resin composition includes any of the compounds of general formula (I) below; wherein: Ar represents an aromatic ring that may have a substituent other than the -(A-B) groups; n is an integer of 1 or greater; A represents any one, or a combination of two or more members selected from a single bond, an alkylene group, —O—, —S—, —C(?O)—, —S(?O)—, —S(?O)2— and —OS(?O)2—, provided that —C(?O)O— is excluded; B represents a group containing a hydrocarbon group having 4 or more carbon atoms wherein either a tertiary or a quaternary carbon atom is contained, when n is 2 or greater, the two or more -(A-B) groups may be identical to or different from each other; and M+ represents an organic onium ion.
    Type: Application
    Filed: March 24, 2011
    Publication date: July 14, 2011
    Applicant: FUJIFILM CORPORATION
    Inventors: Tomotaka TSUCHIMURA, Koji SHIRAKAWA, Toru TSUCHIHASHI, Hideaki TSUBAKI
  • Publication number: 20110140044
    Abstract: Disclosed is an organosulfur compound denoted by a general formula (a1): in which A denotes —S—, —S(O)— or —S(O)2—; Z1 and Z4 denote a trivalent aromatic hydrocarbon group or the like; Z2 and Z3 denote a bivalent aromatic hydrocarbon group or the like; Ar1, Ar2, Ar3 and Ar4 denote an aromatic hydrocarbon group or the like; and n is 0 or 1, or a general formula (b1): in which A denotes the same meaning as aforesaid; Z5 denotes a trivalent aromatic hydrocarbon group or the like; Ar denotes a m-valent aromatic hydrocarbon group or the like; Ar1 and Ar2 denote the aforesaid meaning; and m is 2 or 3. This compound is useful as an electron transport material, a hole blocking material or a host material of an organic electroluminescence element.
    Type: Application
    Filed: August 13, 2009
    Publication date: June 16, 2011
    Applicant: UBE INDUSTRIES, LTD.
    Inventors: Junji Kido, Tadashi Murakami
  • Patent number: 7947831
    Abstract: Polymers grafted with a compound of formula I, wherein the general symbols are as defined within, have outstanding stability against oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation.
    Type: Grant
    Filed: September 19, 2006
    Date of Patent: May 24, 2011
    Assignee: BASF SE Ludwigshafen
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Pierre Rota-Graziosi, Samuel Evans, Paul Dubs, Michèle Gerster
  • Publication number: 20110008735
    Abstract: A sulfonium salt having a triphenylsulfonium cation and a sulfite anion within the molecule is best suited as a photoacid generator in chemically amplified resist compositions. Upon exposure to high-energy radiation, the sulfonium salt generates a sulfonic acid, which facilitates efficient scission of acid labile groups in chemically amplified positive resist compositions. Because of substantial non-volatility under high vacuum conditions in the EB or EUV lithography, the risk of the exposure tool being contaminated is minimized.
    Type: Application
    Filed: July 7, 2010
    Publication date: January 13, 2011
    Inventors: Youichi OHSAWA, Masaki Ohashi
  • Patent number: 7862996
    Abstract: Protective groups which may be cleaved with an activatable deprotecting reagent are employed to achieve a highly sensitive, high resolution, combinatorial synthesis of pattern arrays of diverse polymers. In preferred embodiments of the instant invention, the activatable deprotecting reagent is a photoacid generator and the protective groups are DMT for nucleic acids and tBOC for amino acids. This invention has a wide variety of applications and is particularly useful for the solid phase combinatorial synthesis of polymers.
    Type: Grant
    Filed: December 28, 2006
    Date of Patent: January 4, 2011
    Assignee: Affymetrix, Inc.
    Inventors: Robert G. Kuimelis, Glenn H. McGall, Martin J. Goldberg, Guangyu Xu
  • Patent number: 7834209
    Abstract: Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX2—SO3M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.
    Type: Grant
    Filed: June 6, 2006
    Date of Patent: November 16, 2010
    Assignee: E.I. du Pont de Nemours and Company
    Inventors: Christopher P. Junk, Mark Andrew Harmer, Andrew Edward Feiring, Frank Leonard Schadt, III, Zoe Schnepp
  • Patent number: 7833690
    Abstract: The present invention relates to photoacid generating compounds, lithographic resists comprising photoacid generating compounds, and to various lithographic processes techniques, and applications.
    Type: Grant
    Filed: October 6, 2006
    Date of Patent: November 16, 2010
    Assignee: The University of North Carolina at Charlotte
    Inventors: Kenneth E. Gonsalves, Mingxing Wang
  • Publication number: 20100249431
    Abstract: Hexamethylphosphoramide (HMPA) was added to a reaction vessel containing (R)-1,1?-binaphthyl-2,2?-dithiol and potassium hydroxide. The vessel was purged with oxygen and stirred at 80° C. for 5 days under 7 atmospheres of oxygen. After being cooled to room temperature, the reaction product was purified to yield potassium (R)-1,1?-binaphthyl-2,2?-disulfonate. The (R)-1,1?-binaphthyl-2,2?-disulfonic acid obtained from the disulfonate and 2,6-diphenylpyridine were stirred in acetonitrile, and then the solvent was evaporated under reduced pressure. Subsequently, magnesium sulfate and distilled CH2Cl2 were added to the reaction product, and the mixture was stirred at room temperature for 30 minutes. The resulting solution was cooled to 0° C. Benzaldehyde imine whose nitrogen is protected with Cbz and subsequently acetyl acetone were dropped into the solution over a period of 1 hour. The resulting mixture was further stirred at 0° C. for 30 minutes.
    Type: Application
    Filed: October 1, 2008
    Publication date: September 30, 2010
    Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kazuaki Ishihara, Manabu Hatano, Toshikatsu Maki
  • Patent number: 7799505
    Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 21, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Tomotaka Tsuchimura, Hiroshi Saegusa, Hideaki Tsubaki