Plural Rings Containing Patents (Class 568/34)
  • Publication number: 20100249431
    Abstract: Hexamethylphosphoramide (HMPA) was added to a reaction vessel containing (R)-1,1?-binaphthyl-2,2?-dithiol and potassium hydroxide. The vessel was purged with oxygen and stirred at 80° C. for 5 days under 7 atmospheres of oxygen. After being cooled to room temperature, the reaction product was purified to yield potassium (R)-1,1?-binaphthyl-2,2?-disulfonate. The (R)-1,1?-binaphthyl-2,2?-disulfonic acid obtained from the disulfonate and 2,6-diphenylpyridine were stirred in acetonitrile, and then the solvent was evaporated under reduced pressure. Subsequently, magnesium sulfate and distilled CH2Cl2 were added to the reaction product, and the mixture was stirred at room temperature for 30 minutes. The resulting solution was cooled to 0° C. Benzaldehyde imine whose nitrogen is protected with Cbz and subsequently acetyl acetone were dropped into the solution over a period of 1 hour. The resulting mixture was further stirred at 0° C. for 30 minutes.
    Type: Application
    Filed: October 1, 2008
    Publication date: September 30, 2010
    Applicant: NATIONAL UNIVERSITY CORPORATION NAGOYA UNIVERSITY
    Inventors: Kazuaki Ishihara, Manabu Hatano, Toshikatsu Maki
  • Patent number: 7799505
    Abstract: The invention is related to an arylsulfonium salt compound having a polycyclic hydrocarbon structure in a cation moiety.
    Type: Grant
    Filed: October 23, 2007
    Date of Patent: September 21, 2010
    Assignee: FUJIFILM Corporation
    Inventors: Kunihiko Kodama, Tomotaka Tsuchimura, Hiroshi Saegusa, Hideaki Tsubaki
  • Publication number: 20100174104
    Abstract: Asymmetric cyclopropanation of olefins with diazosulfones.
    Type: Application
    Filed: March 16, 2009
    Publication date: July 8, 2010
    Inventors: X. Peter Zhang, Shifa Zhu
  • Patent number: 7682772
    Abstract: A compound represented by general formula (I); and a compound represented by general formula (b1-1). [Chemical Formula 1] X-Q1-Y1—SO3?M+??(I) X-Q1-Y1—SO3?A+??(b1-1) wherein Q1 represents a divalent linkage group or a single bond; Y1 represents an alkylene group which may have a substituent or a fluorinated alkylene group which may have a substituent; X represents a cyclic group of 3 to 30 carbon atoms which may have a substituent, and has an —SO2— bond in the structure thereof; M+ represents an alkali metal ion; and A+ represents an organic cation.
    Type: Grant
    Filed: November 5, 2008
    Date of Patent: March 23, 2010
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takehiro Seshimo, Yoshiyuki Utsumi, Akiya Kawaue, Hideo Hada, Hiroaki Shimizu, Tsuyoshi Nakamura
  • Publication number: 20100056819
    Abstract: The present invention provides a process for producing nano graphene platelets (NGPs) that are both dispersible and electrically conducting. The process comprises: (a) preparing a pristine NGP material from a graphitic material; and (b) subjecting the pristine NGP material to an oxidation treatment to obtain the dispersible NGP material, wherein the NGP material has an oxygen content no greater than 25% by weight. Conductive NGPs can find applications in transparent electrodes for solar cells or flat panel displays, additives for battery and supercapacitor electrodes, conductive nanocomposite for electromagnetic wave interference (EMI) shielding and static charge dissipation, etc.
    Type: Application
    Filed: September 3, 2008
    Publication date: March 4, 2010
    Inventors: Bor Z. Jang, Aruna Zhamu
  • Patent number: 7638654
    Abstract: A novel 1-fluoro-1,1-bis(arylsulfonyl)methane is provided which is useful in monofluoromethylation. Also provided is a production method thereof. A method for producing a fluorobis(arylsulfonyl)methane, the method including the steps of: treating a bis(arylsulfonyl)methane represented by the following formula (1), (ArSO2)2CH2??(1) (wherein Ar represents a substituted or unsubstituted phenyl group or naphthyl group) with a base; and then adding a fluorination reagent thereto, to produce fluorobis(arylsulfonyl)methane represented by the following formula (2) (ArSO2)2CHF??(2) (wherein Ar is defined as above), and a fluorobis(arylsulfonyl)methane (2) represented by the above formula (2), which is a novel compound that is very useful in producing a monofluoromethyl.
    Type: Grant
    Filed: March 2, 2007
    Date of Patent: December 29, 2009
    Assignees: Nagoya Institute of Technology, Tosoh F-Tech, Inc.
    Inventors: Takeshi Toru, Norio Shibata, Shuichi Nakamura, Takeo Fukuzumi
  • Publication number: 20090318709
    Abstract: The invention relates to a new process for the preparation of N-[3-[(2-methoxyphenyl)sulfanyl]-2-methylpropyl]-3,4-dihydro-2H-1,5-benzoxathiepin-3-amine.
    Type: Application
    Filed: November 6, 2007
    Publication date: December 24, 2009
    Applicant: PIERRE FABRE MEDICAMENT
    Inventors: Bernard Vacher, Yves Brunel, Jean-Louis Maurel
  • Publication number: 20090149510
    Abstract: The invention relates to compounds and methods for modulating one or more components of a kinase cascade.
    Type: Application
    Filed: July 7, 2008
    Publication date: June 11, 2009
    Inventor: David G. Hangauer, JR.
  • Publication number: 20090131419
    Abstract: Disclosed are sulphones which modulate the action of gamma-secretase. The compounds are useful in the treatment or prevention of Alzheimer's disease.
    Type: Application
    Filed: May 6, 2008
    Publication date: May 21, 2009
    Inventors: Jose Luis Castro Pineiro, Ian Churcher, Kevin Dinnell, Timothy Harrison, Sonia Kerrad, Alan John Nadin, Paul Joseph Oakley, Andrew Pate Owens, Duncan Edward Shaw, Martin Richard Teall, Susannah William, Brian John Williams
  • Publication number: 20090131723
    Abstract: A novel 1-fluoro-1,1-bis(arylsulfonyl)methane is provided which is useful in monofluoromethylation. Also provided is a production method thereof. A method for producing a fluorobis(arylsulfonyl)methane, the method including the steps of: treating a bis(arylsulfonyl)methane represented by the following formula (1), (ArSO2)2CH2??(1) (wherein Ar represents a substituted or unsubstituted phenyl group or naphthyl group) with a base; and then adding a fluorination reagent thereto, to produce fluorobis(arylsulfonyl)methane represented by the following formula (2) (ArSO2)2CHF??(2) (wherein Ar is defined as above), and a fluorobis(arylsulfonyl)methane (2) represented by the above formula (2), which is a novel compound that is very useful in producing a monofluoromethyl.
    Type: Application
    Filed: March 2, 2007
    Publication date: May 21, 2009
    Inventors: Takeshi Toru, Norio Shibata, Shuichi Nakamura, Takeo Fukuzumi
  • Publication number: 20090069521
    Abstract: A radiation-sensitive resin composition is provided which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, a high resolution radiation-sensitive resin composition providing a wide DOF and excelling in LER. Also provided are a polymer which can be used in the composition and a novel compound useful for synthesizing the polymer. The novel compound is shown by the following formula (2), wherein R4 represents a methyl group, a trifluoromethyl group, or a hydrogen atom, at least one of the Rfs represents a fluorine atom or a linear or branched perfluoroalkyl group having 1 to 10 carbon atoms, A represents a divalent organic group or a single bond, G represents a divalent organic group having a fluorine atom or a single bond, Mm+ represents a metal ion or an onium cation, m represents an integer of 1 to 3, and p is an integer of 1 to 8.
    Type: Application
    Filed: May 11, 2006
    Publication date: March 12, 2009
    Applicant: JSR CORPORATION
    Inventors: Tomoki Nagai, Eiji Yoneda, Takuma Ebata, Takanori Kawakami, Makoto Sugiura, Tsutomu Shimokawa, Makoto Shimizu
  • Publication number: 20090054655
    Abstract: The present invention provides a method for producing an organic oxide, wherein a substrate is oxidized using hypohalous acid, hypohalous acid salt, chlorine, bromine or iodine in the presence of water and a catalytic amount of a compound represented by the following formula (I): R1—X1—NY—R2, wherein: X1 represents —CO— or —SO2—; Y represents a hydrogen atom, a potassium atom, a sodium atom, a chlorine atom, a bromine atom or an iodine atom; R1 represents a substituted or unsubstituted hydrocarbon group, —NYR3 group or —OR3 group (in the formulae, R3 represents a substituted or unsubstituted hydrocarbon group, and Y represents the same meaning as defined above); and R2 represents a hydrogen atom or —CO—R4 group (in the formula, R4 represents a substituted or unsubstituted hydrocarbon group, —NYR5 group or —OR5 group (in the formulae, R5 represents a substituted or unsubstituted hydrocarbon group, and Y represents the same meaning as defined above)); or R1 and R4 may bind to each other to form a further substi
    Type: Application
    Filed: April 5, 2007
    Publication date: February 26, 2009
    Applicant: TAKEDA PHARMACEUTICAL COMPANY LIMITED
    Inventors: Tomomi Ikemoto, Naohiro Fukuda
  • Publication number: 20090036632
    Abstract: A dihalobiphenyl compound represented by the formula (1): wherein A represents an amino group substituted with one or two C1-C20 hydrocarbon groups or a C1-C20 alkoxy group, R1 represents a fluorine atom, a C1-C20 alkyl group, etc., X1 represents a chlorine atom, a bromine atom or an iodine atom, an k represents an integer of 0 to 3, and a polyarylene comprising a repeating unit represented by the formula (2): wherein A, R1 and k represent the same meanings as defined above.
    Type: Application
    Filed: September 6, 2006
    Publication date: February 5, 2009
    Inventors: Noriyuki Hida, Seiji Oda, Takashi Kamikawa, Katsuhiro Suenobu
  • Publication number: 20090012308
    Abstract: The present invention provides a process for the manufacture of an arylmethyl-sulfonylarene, R1CH2SO2R2, wherein R1 and R2 are each independently an optionally substituted phenyl or naphthyl group which process comprises reacting an arylmethylhalide, R1CH2-Hal wherein R1 is as defined hereinabove and Hal is Cl, Br or I with a sodium arylsulfinate R2SO2Na wherein R2 is as defined hereinabove in the presence of a base optionally in the presence of a solvent. Also provided is the use of the inventive process in the manufacture of a 3-arylsulfonylindazole 5-HT6 ligand.
    Type: Application
    Filed: June 9, 2008
    Publication date: January 8, 2009
    Applicant: Wyeth
    Inventors: Mahmut Levent, Panolil Raveendranath, Sanjay Raveendranath, Vijay Raveendranath, Girija Raveendranath
  • Patent number: 7468393
    Abstract: Compounds of formula I: are potent and selective antagonists of the human 5-HT2A receptor, and hence useful in treatment of a variety of adverse conditions of the CNS.
    Type: Grant
    Filed: April 27, 2007
    Date of Patent: December 23, 2008
    Assignee: Merck Sharp & Dohme Ltd.
    Inventors: Jose Luis Castro Pineiro, Laura Catherine Cooper, Myra Gilligan, Alexander Charles Humphries, Peter Alan Hunt, Tamara Ladduwahetty, Angus Murray MacLeod, Kevin John Merchant, Monique Bodil Van Niel, Kevin Wilson
  • Publication number: 20080306028
    Abstract: This invention relates to a kind of Erianin salt and the preparing process thereof. The said Erianin salt is a compound with the following general formula (I), wherein R is the salt formed by monobasic acid radical of inorganic oxacid combining with metals, ammonium salts, organic amine. This invention also relates to a pharmaceutical composition comprising Erianin salt. Compared with Erianin, the said Erianin salt has far better solubility, which can improve the bioavailability and show better antineoplastic efficacy.
    Type: Application
    Filed: August 1, 2006
    Publication date: December 11, 2008
    Applicant: The Jiang Cell Biomedical Research Co., Ltd.
    Inventors: Yiping Li, Ning Li
  • Patent number: 7456321
    Abstract: The present invention provides a process for producing 4,4?-dihydroxydiphenylsulfone of very high purity. In particular, the present invention provides a process for producing 4,4?-dihydroxydiphenylsulfone of high purity comprising the steps of subjecting phenol in combination with a sulfonating agent or phenolsulfonic acid to a dehydration reaction in the presence of an aromatic nonpolar solvent while suspending the resulting dihydroxydiphenylsulfone therein, mixing the reaction suspension with a polar solvent to at least partially dissolve the dihydroxydiphenylsulfone, and precipitating 4,4?-dihydroxydiphenylsulfone.
    Type: Grant
    Filed: September 22, 2003
    Date of Patent: November 25, 2008
    Assignee: Konishi Chemical Ind. Co., Ltd.
    Inventors: Eiji Ogata, Fumio Oi, Norio Yanase, Nobuyuki Nate
  • Patent number: 7452673
    Abstract: Compounds represented by the following structural formulas can be used as photoacid generators: Such compounds are useful, for example, in fabricating arrays of polymers.
    Type: Grant
    Filed: January 16, 2007
    Date of Patent: November 18, 2008
    Assignee: Affymetrix, Inc.
    Inventors: Glenn H. McGall, Andrea Cupoletti
  • Publication number: 20080262139
    Abstract: Disclosed is a flame retardant crosslink agent free of halogen and phosphorous. The crosslink agent can be applied in epoxy resin composition, such that the composition achieves V0 under UL-94 standard after curing. The crosslink agent, a novolac structure modified by nitrogen-containing and/or silicon containing compound, may collocate with inorganic powder, such that the thermal cured epoxy resin composition contains thermal retardancy, low expansion, low water uptake, and high glass transfer temperature properties. The epoxy resin composition including the crosslink agent of the invention can be applied in a prepreg used in copper clad laminates or printed circuit plates.
    Type: Application
    Filed: September 12, 2007
    Publication date: October 23, 2008
    Inventors: Hsin-Ho Wu, Weita Yang, Ching Cheng Hsueh
  • Patent number: 7411004
    Abstract: Disclosed are sulphones which modulate the action of gamma-secretase. The compounds are useful in the treatment or prevention of Alzheimer's disease.
    Type: Grant
    Filed: August 21, 2001
    Date of Patent: August 12, 2008
    Assignee: Merck Sharp & Dohme Ltd.
    Inventors: Timothy Harrison, Paul Joseph Oakley, Martin Richard Teall
  • Publication number: 20080176255
    Abstract: This invention relates to compositions and methods for the detection of mold. Specifically, provided herein are compositions and methods for the detection of mold by detecting differences in light intensity of fluoresence resulting from interaction between the mold and the compositions described herein.
    Type: Application
    Filed: January 23, 2007
    Publication date: July 24, 2008
    Inventor: Edward Sobek
  • Patent number: 7402704
    Abstract: Aryl sulfone compounds of formula I and II are described and have therapeutic utility, particularly in the treatment of diabetes, obesity and related conditions and disorders:
    Type: Grant
    Filed: April 14, 2005
    Date of Patent: July 22, 2008
    Assignee: Amgen Inc.
    Inventors: Pingchen Fan, Hiroyuki Goto, Xiao He, Makoto Kakutani, Marc Labelle, Dustin L. McMinn, Jay P. Powers, Yosup Rew, Daqing Sun, Xuelei Yan
  • Publication number: 20080154035
    Abstract: The present invention relates to a coupling method between intramolecular carbon using the intramolecular cyclization reaction in situ of an allyl-indium compound derived from an allyl derivative containing an unsaturated hydrocarbon compound and indium, in presence of a transition metal compound catalyst. More particularly, the present invention relates to a coupling method between intramolecular carbon for preparing a cyclic compound having a vinyl group as a substituent by bonding a carbon in an allyl derivative containing an unsaturated hydrocarbon compound and a carbon in the unsaturated hydrocarbon compound via intramolecular cyclization reaction in situ of an allyl-indium compound as a coupling agent derived from the allyl derivative containing the unsaturated hydrocarbon and indium (In), in presence of a palladium catalyst.
    Type: Application
    Filed: July 17, 2007
    Publication date: June 26, 2008
    Applicant: PHIL HO LEE
    Inventors: Phil Ho LEE, Kooyeon LEE, Dong SEOMOON, Hyunseok KIM
  • Publication number: 20080032184
    Abstract: A monomer comprising the structure (1a) or (1b) wherein Z comprises S, SO2, or POR wherein R comprises a linear or branched perfluoroalkyl group of 1 to 14 carbon atoms optionally containing oxygen or chlorine, an aryl or substituted aryl group of 6 to 12 carbon atoms, or an alkyl of 1 to 8 carbon atoms; RFcomprises a linear or branched perfluoroalkene group of 1 to 20 carbon atoms, optionally containing oxygen or chlorine; Q is chosen from F, —OM, NH2, —N(M)SO2R2F, and —C(M)(SO2R2F)2, wherein M comprises H, an alkali cation, or ammonium; and R2F groups comprise perfluorinated or partially fluorinated alkyl, and may optionally include ether oxygens; and n is 1 or 2 for (1a), and n is 1, 2, or 3 for (1b). These monomers are used in the preparation of homopolymers and copolymers that are useful in preparing polymer electrolyte membranes. Electrochemical cells, such as fuel cells, containing these membranes are also described.
    Type: Application
    Filed: June 25, 2004
    Publication date: February 7, 2008
    Inventors: Zhen-yu Yang, Mark Roelofs
  • Patent number: 7241924
    Abstract: A process for producing 4-isopropoxy-4?-hydroxydiphenyl sulfone useful as the developer for leuco dyes to be used in thermosensible papers, which is excellent in productivity, economical efficiency and safety and permits the production of the compounds from constantly available raw materials. This process is improved in productivity and economical efficiency as compared with those of the prior art both by shortening the production time by the use of an isopropyl iodide, which is more reactive than isopropyl bromide which have been used in the prior art.
    Type: Grant
    Filed: May 28, 2003
    Date of Patent: July 10, 2007
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Syuichiro Sanpei, Masayuki Hanzawa, Yasuyuki Suzuki, Minoru Kaeriyama, Tomoya Hidaka, Toru Kawabe
  • Patent number: 7217492
    Abstract: An onium salt compound having a cation moiety of the following formula (1) is disclosed. wherein A represents I or S, m is 1 or 2, n is 0 or 1, x is 1–10, and Ar1 and Ar2 are (substituted) aromatic hydrocarbon group, and P represents —O—SO2R, —O—S(O)R, or —SO2R, wherein R represents a hydrogen atom, a (substituted) alkyl group, or a (substituted) alicyclic hydrocarbon group. The onium salt compound is suitable as a photoacid generator for photoresists of a positive-tone radiation-sensitive resin composition. The positive-tone radiation-sensitive resin composition containing this compound is useful as a chemically-amplified photoresist exhibiting high resolution at high sensitivity, responsive to various radiations, and having outstanding storage stability.
    Type: Grant
    Filed: December 24, 2003
    Date of Patent: May 15, 2007
    Assignee: JSR Corporation
    Inventors: Eiji Yoneda, Yong Wang, Yukio Nishimura
  • Patent number: 7217841
    Abstract: Elastomers which have excellent stability to prevent oxidative, thermal, dynamic, light-induced and/or ozone-induced degradation comprise, as stabilizers, at least one compound of the formula I [R—S(?O)m—CH2—CH(OH)—CH2]n—N(R1)2-n—R2, ??(I) in which R is C4–C20alkyl, hydroxyl-substituted C4–C20alkyl; phenyl, benzyl, ?-methylbenzyl, ?,?-dimethylbenzyl, cyclohexyl or —(CH2)qCOOR3, and, if m is 0, R may additionally be and, if n is 1 and R4 is hydrogen, R may additionally be R2—R1N—CH2—CH(OH)—CH2—S(?O)m—(CH2)x— or R2—R1N—CH2—CH(OH)—CH2—S(?O)m—CH2—CH2—(O—CH2—CH2)y—, R1 is hydrogen, cyclohexyl or C3–C12alkyl, R2 is R3 is C1-C18alkyl, R4 is hydrogen or —CH2—CH(OH)—CH2—S(?O)m—R, X is C1–C8alkyl, Y is C1–C8alkyl, m is 0 or 1, n is 1 or 2, q is 1 or 2, x is from 2 to 6, and y is 1 or 2. The compounds of the formula I are also suitable as stabilizers for elastomers to prevent contact discoloration of substrates coming into contact with elastomers.
    Type: Grant
    Filed: April 15, 2004
    Date of Patent: May 15, 2007
    Assignee: Ciba Specialty Chemicals Corp.
    Inventors: Hans-Rudolf Meier, Gerrit Knobloch, Samuel Evans
  • Patent number: 7193113
    Abstract: The present invention provides a method for producing various types of arylbis(perfluoroalkylsulfonyl)methane having a bulky aryl group and an electron-accepting aryl group in which synthesis was conventionally considered to be difficult, at high efficiency; a novel arylbis(perfluoroalkylsulfonyl)methane that can be widely applied to asymmertric catalyst, various types of functional materials and the like; and a metallic salt thereof. In addition, excellent catalysts are also provided. An aryl halomethane is reacted with a sodium trifluoromethane sulfinate, the arylmethyl triflone produced thereby is reacted with a t-BuLi and the like, the lithium salt of the arylmethyl triflone obtained is reacted with a trifluoromethane sulfonic acid anhydride, and an arylbis(trifluoromethylsulfony)methane such as pentafluorophenylbis(triflyl)methane, {4-(pentafluorophenyl)-2,3,5,6-tetrafluorophenyl}bis(triflyl)methane and the like are obtained at a high yield.
    Type: Grant
    Filed: December 14, 2001
    Date of Patent: March 20, 2007
    Assignee: Japan Science and Technology Corporation
    Inventors: Kazuaki Ishihara, Hisashi Yamamoto
  • Patent number: 7189880
    Abstract: A process for producing 2,4?-dihydroxydiphenylsulfone which comprises separating 4,4?-dihydroxydiphenylsulfone by crystallization from a mixture containing 4,4?-dihydroxydiphenylsulfone, 2,4?-dihydroxydiphenylsulfone, phenolsulfonic acid and phenol which is obtained by dehydration of phenol and sulfuric acid or phenolsulfonic acid to obtain a mixture having a content of 2,4?-dihydroxydiphenylsulfone greater than the content of 4,4?-dihydroxydiphenylsulfone, crystallizing 2,4?-dihydroxydiphenylsulfone by adjusting the composition of the solvent of the obtained mixture so that the ratio of the amounts by weight of phenol to water is 10:90 to 90:10, and separating 2,4?-dihydroxydiphenylsulfone by filtration; and a process as described above in which the filtrate obtained by the filtration is used as the raw material for the hydration.
    Type: Grant
    Filed: January 22, 2003
    Date of Patent: March 13, 2007
    Assignee: Nicca Chemical Co., Ltd.
    Inventors: Gou Yoshino, Yuichi Tomoda, Norihiro Taniguchi, Kazuaki Igarashi, Takeo Hasegawa
  • Patent number: 7173155
    Abstract: The present invention relates to a terphenyl dihalide monomer having sulfonate groups and a process for preparing the same. More particularly, the present invention relates to a terphenyl dihalide monomer having sulfonate groups prepared by a process comprising obtaining a terphenyl dihalide derivative by Suzuki cross-coupling of a tetrahalobenzene and phenylboronic acid and introducing sulfonate groups into the phenyl rings at each end of the terphenyl dihalide derivative, the resultant monomer capable of being prepared into a polymer electrolyte having superior ion conductivity through nucleophilic aromatic substitution (SNAr) polymerization due to the presence of two halogen atoms and two conducting sulfonate groups in the monomer molecule, and a process for preparing the same.
    Type: Grant
    Filed: July 13, 2006
    Date of Patent: February 6, 2007
    Assignee: Gwangju Institute of Science and Technology
    Inventors: Jae-Suk Lee, Sun-Young Chang, Kwan-Soo Lee, Myung-Hwan Jeong, Jung-Eun Yang
  • Patent number: 7122294
    Abstract: Photoacid generators (PAGs) comprising photoactive moieties and perfluorinated, multifunctional anionic moieties (or incipient anionic moieties) are disclosed which provide photoacids with high acid strength, low volatility and low diffusivity. The present invention further relates to photoacid generators as they are used in photoinitiated or acid-catalyzed processes for uses such as photoresists for microlithography and photopolymerization.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: October 17, 2006
    Assignee: 3M Innovative Properties Company
    Inventor: William M. Lamanna
  • Patent number: 7053123
    Abstract: (E)-Styryl benzylsulfones useful as antiproliferative agents, including, for example, anticancer agents, are provided according to formula I: wherein: R1 is selected from the group consisting of halogen, C1–C6 alkoxy, nitro, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); and R2 and R3 are independently selected from the group consisting of halogen, C1–C6 alkoxy, C1–C6 alkyl, nitro, cyano, hydroxyl, phosphonato, amino, sulfamyl, carboxy, acetoxy, and dimethylamino (C2–C6 alkoxy); provided: R1 may not be halogen when R2 and R3 are both halogen; R2 may not be 2-halogen when R3 is 4-halogen; or a pharmaceutically acceptable salt thereof; or formula II: wherein: R4 is selected from the group consisting of C1–C6 alkoxy, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); R6 is selected from the group consisting of nitro, hydrogen, phosphonato, amino, sulfamyl, carboxy, acetoxy and dimethylamino (C2–C6 alkoxy); and R7 is selected from the group consistin
    Type: Grant
    Filed: October 5, 2001
    Date of Patent: May 30, 2006
    Assignee: Temple University-of the Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 7009055
    Abstract: A dibromomethyl moiety is converted to a sulfonylmethyl moiety by treatment with a sulfinic acid salt. For example, (methyl-sulfonyl)methyl bromo-quinoline is prepared by the treatment of dibromomethyl bromo-quinoline with a sulfinic acid salt.
    Type: Grant
    Filed: July 19, 2002
    Date of Patent: March 7, 2006
    Assignee: Merck & Co., Inc.
    Inventors: Feng Xu, Kimberly A. Savary, John M. Williams
  • Patent number: 6927309
    Abstract: The invention aims at providing novel sulfur compounds, molecular compounds containing the same as the component compound, and so on. The above aim is achieved by using sulfur compounds of the general formula (I) wherein Rs are each independently hydrogen, optionally substituted C1-6 alkyl, optionally substituted C2-6 alkenyl, optionally substituted aryl, chloro, or bromo; m is an integer of 0, 1, or 2; and Z is a group represented by any of the general formulae (II) to (V) (wherein R and m are each as defined above; W is hydrogen or C1-6 alkyl; and Y is a direct bond, C1-3 alkylene, or phenylene).
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: August 9, 2005
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Ryu Sato, Hiroshi Suzuki
  • Patent number: 6861562
    Abstract: The present invention provides a process for producing a mixture of 4,4?- and 2,4?-dihydroxydiphenylsulfones comprising heating trihydroxytriphenyldisulfone or a mixture of dihydroxydiphenylsulfone isomers containing trihydroxytriphenyldisulfone in the presence of phenol and an acid catalyst.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: March 1, 2005
    Assignee: Konishi Chemical Ind. Co., Ltd.
    Inventors: Fumio Oi, Norio Yanase, Hiroyuki Yamamoto
  • Patent number: 6833480
    Abstract: Substituted (Z)-styrylbenzyl sulfones of the formulae (I, II, III, IV), pharmaceutically acceptable salts thereof, and compositions thereof are provided as cell antiproliferative agents, including, for example, anticancer agents.
    Type: Grant
    Filed: August 21, 2003
    Date of Patent: December 21, 2004
    Assignee: Temple University - Of The Commonwealth System of Higher Education
    Inventors: E. Premkumar Reddy, M. V. Ramana Reddy
  • Patent number: 6762326
    Abstract: Embodiments of the invention relate to C2-substituted indan-1-ones and to their physiologically acceptable salts and physiologically functional derivatives. Compounds of embodiments of the invention include compounds of formula I in which the radicals are as defined, and their physiologically acceptable salts and processes for their preparation. The compounds are suitable, for example, for use as anorectics.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: July 13, 2004
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6743916
    Abstract: A process for producing an organotitanium compound capable of regioselectively converting a substituted acetylene compound into polysubstituted benzene or polysubstituted pyridine. The process comprises reacting an acetylene compound represented by the formula (1) [where R1 and R2 denote a C1-20 alkyl group or the like] in the presence of a prescribed titanium compound and a Grignard reagent with a compound represented by the formula (4) [where R3 and R4 denote a hydrogen atom or the like] and further reacting with a compound represented by the formula (5) [where R5 denotes a hydrogen atom or the like, Z denotes CR′ (where R′ denotes a hydrogen atom or the like), nitrogen atom, X6 denotes a halogen atom or the like, and m is 0 or 1] thereby giving the titanium compound represented by the formula (6) and/or (7).
    Type: Grant
    Filed: December 13, 2001
    Date of Patent: June 1, 2004
    Assignees: Nissan Chemical Industries, Ltd
    Inventor: Fumie Sato
  • Patent number: 6727386
    Abstract: A method is provided for making aromatic-imide and aromatic-methylidynetrissulfonyl species by reaction of aromatic species with a reactant according to formula (I): (X—SO2—)m—QH—(—SO2—R1)n  (I) wherein Q is C or N; wherein each X is independently selected from the group consisting of halogens, typically F or Cl; wherein each R1 is independently selected from the group consisting of aliphatic and aromatic groups, which may or may not be saturated, unsaturated, straight-chain, branched, cyclic, heteroatomic, polymeric, halogenated, fluorinated or substituted; wherein m is greater than 0; wherein m+n=2 when Q is N; and wherein m+n=3 when Q is C. Ar may be derived from an aromatic polymeric compound.
    Type: Grant
    Filed: October 25, 2001
    Date of Patent: April 27, 2004
    Assignee: 3M Innovative Properties Company
    Inventor: Steven Joseph Hamrock
  • Patent number: 6723483
    Abstract: A triphenyl sulfonium salt compound shown by the general formula [1] or [3]. (wherein R1 and R2 are each independently a hydrogen atom or a lower alkyl group, provided that at least one of R1 and R2 are a lower alkyl group, R3s are each independently an alkyl group, n is an integer of 0 to 3, i is an integer of 1 to 3, j is an integer of 0 to 2, provided that i+j=3, Y− is an anion derived from a sulfonic acid shown by the general formula [2] R4—SO3H  [2] [wherein R4 is an alkyl group or an aryl group which may have as a substituent an alkyl group]). (wherein X is a phenyl group which has a substituent at an ortho- and/or a meta-position, m is an integer of 1 to 3, q is an integer of 0 to 2, provided that m+q=3, p is 1 or 2 and Zp− is an anion derived from a carboxylic acid).
    Type: Grant
    Filed: December 7, 2000
    Date of Patent: April 20, 2004
    Assignee: Wako Pure Chemical Industries, Ltd.
    Inventors: Keiji Oono, Kazuhito Fukasawa, Kazunori Sakamoto, Fumiyoshi Urano, Motoshige Sumino, Shigeaki Imazeki
  • Patent number: 6692893
    Abstract: Onium salts of arylsulfonyloxynaphthalenesulfonate anions with iodonium or sulfonium cations are novel. A chemically amplified resist composition comprising the onium salt as a photoacid generator is suited for microfabrication, especially by deep UV lithography because of many advantages including improved resolution, improved focal latitude, minimized line width variation or shape degradation even on long-term PED, minimized debris after coating, development and peeling, and improved pattern profile after development.
    Type: Grant
    Filed: October 23, 2001
    Date of Patent: February 17, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Youichi Ohsawa, Jun Watanabe, Takeshi Nagata, Jun Hatakeyama
  • Patent number: 6686397
    Abstract: Polysubstituted indan-1-ol compounds of formula I, its physiologically acceptable salts and physiologically functional derivatives are disclosed: Compositions comprising the same, methods of preparation and methods for the prophylaxis or treatment of obesity are also disclosed herein.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: February 3, 2004
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6670401
    Abstract: Polysubstituted indan-1-ol compounds, methods for their preparation; and methods for their use are disclosed herein. In particular, the invention relates to polysubstituted indan-1-ol compounds of the formula I and their physiologically acceptable salts. The compounds are useful, for example, as anorectics.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: December 30, 2003
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6667345
    Abstract: Derivatives of C2-substituted indan-1-ol compounds of the formula I: its physiologically acceptable salts, and its physiologically functional derivatives for the prophylaxis or treatment of obesity are disclosed herein. Compositions comprising the same, methods for preparing the instant compounds, and methods for reducing weight in mammals and for the prophylaxis or treatment of obesity are also described.
    Type: Grant
    Filed: August 29, 2002
    Date of Patent: December 23, 2003
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6657086
    Abstract: Embodiments of the invention relate to C2-substituted indan-1-ols and to their physiologically acceptable salts and physiologically functional derivatives. Compounds of embodiments of the invention may include compounds of formula I in which the radicals are as defined, and their physiologically acceptable salts and processes for their preparation. The compounds are suitable, for example, for use as anorectics.
    Type: Grant
    Filed: August 30, 2002
    Date of Patent: December 2, 2003
    Assignee: Aventis Pharma Deutschland GmbH
    Inventors: Gerhard Jaehne, Volker Krone, Martin Bickel, Matthias Gossel
  • Patent number: 6590126
    Abstract: A process for producing compounds of general formula (II) useful as the developer for leuco dyes to be used in thermosensible papers, which is excellent in productivity, economical efficiency and safety and permits the production of the compounds from constantly available raw materials. This process is improved in productivity, economical efficiency and safety as compared with those of the prior art both by shortening the production time by the use of, e.g., an alkyl iodide, RI, which is more reactive than alkyl bromides which have been used in the prior art, and by attaining the complete recovery and reuse of iodine by incorporating into the process the iodine recovery step of recovering iodine from the manufacturing wastewater and reacting this iodine with an alcohol to thereby self-produce an alkyl iodide.
    Type: Grant
    Filed: September 21, 2001
    Date of Patent: July 8, 2003
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Syuichiro Sanpei, Masayuki Hanzawa, Yasuyuki Suzuki, Minoru Kaeriyama, Tomoya Hidaka, Toru Kawabe
  • Patent number: 6582879
    Abstract: The present invention relates to a reactive photo acid-generating agent and a heat-resistant photoresist composition comprising the same. In particularly, the present invention relates to the heat-resistant photoresist composition comprising the photo acid-generating agent expressed by the following formula (1), which can increase the degree of polymerization, and polyamide oligomers having acetal or its cyclized derivatives, which have an ability of that light-exposed area is dissolved in the developer and light-unexposed area is convertible to a heat-resistant polymer in the latter heating process and thus, it can be used for passivation layer, buffer coat or layer-insulating film of the multilayer printed circuit board, wherein and R are the same as defined in the detailed description of the Invention.
    Type: Grant
    Filed: March 27, 2001
    Date of Patent: June 24, 2003
    Assignee: Korea Research Institute of Chemical Technology
    Inventors: Kil-Yeong Choi, Moon Young Jin, Jong Chan Won, Sang Yeol Choi
  • Publication number: 20030092941
    Abstract: The present invention is to provide methods for producing highly pure 4,4′-dihydroxydiphenyl sulfone monoethers advantageously in industrial production.
    Type: Application
    Filed: September 20, 2002
    Publication date: May 15, 2003
    Inventors: Kiyoshi Katsuura, Tomoya Hidaka, Yutaka Takashina, Yasuo Ohnuki
  • Patent number: 6548622
    Abstract: Polysulfones are manufactured by reacting a sulfuric acid or sulfur trioxide with a bireactive aromatic compound, using as a “promoter” a carboxylic acid anhydride. The product polymers are useful as molding resins.
    Type: Grant
    Filed: September 27, 2001
    Date of Patent: April 15, 2003
    Assignee: E. I. du Pont de Nemours and Company
    Inventor: Marc Bruce Goldfinger
  • Patent number: 6482567
    Abstract: New photoacid generator compounds (“PAGs”) are provided and photoresist compositions that comprise such compounds. In particular, non-ionic PAGs are provided that contain an oxime sulfonate group, and/or an N-oxyimidosulfonate group. PAGs of the invention are particularly useful as photoactive components of photoresists imaged at short wavelengths such as 248 nm, 193 nm and 157 nm.
    Type: Grant
    Filed: August 25, 2000
    Date of Patent: November 19, 2002
    Assignee: Shipley Company, L.L.C.
    Inventors: James F. Cameron, Gerhard Pohlers