Three Or More Phenols Containing Patents (Class 568/720)
  • Patent number: 9567281
    Abstract: 4-Aralkylphenols and derivatives thereof expressed by general formulas (6) and (7) are useful for producing trisphenols.
    Type: Grant
    Filed: April 8, 2014
    Date of Patent: February 14, 2017
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Akihiko Ojiri, Takafumi Tsujigami, Kouichi Tanba
  • Publication number: 20150037735
    Abstract: The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.
    Type: Application
    Filed: May 18, 2012
    Publication date: February 5, 2015
    Applicant: INSTITUTE OF CHEMISTRY, CHINESE ACADEMY OF SCIENCES
    Inventors: Guoqiang Yang, Jian Xu, Li Chen, Shuangqing Wang, Shayu Li
  • Patent number: 8921613
    Abstract: Provided is a polynuclear poly(phenol)family represented by general formula (1). In general formula (1), R1s are each independently C1-8 alkyl group, C1-8 alkoxy group, an aromatic hydrocarbon group, or a C1-8 saturated hydrocarbon group having an aromatic hydrocarbon group; n is 0 or an integer of 1 to 3; X is a hydroxyphenyl group represented by general formula (2); and A is a tetravalent carbon atom group or a tetravalent saturated hydrocarbon group having two or more carbon atoms, with the proviso that when A is a tetravalent saturated hydrocarbon group having two or more carbon atoms, two carbon atoms in the A group are each bonded to two phenyl groups.
    Type: Grant
    Filed: December 15, 2010
    Date of Patent: December 30, 2014
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventor: Tatsuya Iwai
  • Publication number: 20140378715
    Abstract: The present invention relates to the use of an antioxidant treated promoted strong acid ion exchange resin as an acid catalyst.
    Type: Application
    Filed: December 14, 2012
    Publication date: December 25, 2014
    Inventors: Robert James Olsen, Gregory C. Pierce, Alfred K. Schultz, Klaus-Dieter Topp
  • Patent number: 8889919
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 26, 2010
    Date of Patent: November 18, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Hiromi Hayashi
  • Patent number: 8846292
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: September 30, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Patent number: 8829247
    Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.
    Type: Grant
    Filed: September 27, 2010
    Date of Patent: September 9, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
  • Patent number: 8816135
    Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: August 26, 2014
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Akira Yoshitomo, Shihoko Nakano
  • Patent number: 8766016
    Abstract: Processes for producing 1,3,5-trimethyl-2,4,6-tris(3,5-dialkyl-4-hydroxybenzyl)benzene are provided, in particular such processes that utilize 2,6-di-tert-butylphenol, paraformaldehyde, a secondary amine, mesitylene, and acetic acid.
    Type: Grant
    Filed: July 6, 2010
    Date of Patent: July 1, 2014
    Assignee: Albermarle Corporation
    Inventors: Mahmood Sabahi, Thomas Robert Nicholas
  • Patent number: 8748078
    Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.
    Type: Grant
    Filed: August 30, 2010
    Date of Patent: June 10, 2014
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Hiromi Hayashi, Masatoshi Echigo, Dai Oguro
  • Patent number: 8729181
    Abstract: Aromatic polycyanate compounds which comprise cycloaliphatic moieties, a process for the production thereof and resins and thermoset products which are based on these compounds.
    Type: Grant
    Filed: March 9, 2009
    Date of Patent: May 20, 2014
    Assignee: Dow Global Technologies LLC
    Inventors: Michael J. Mullins, Robert E. Hefner, Jr., Ulrich Herold, Mark B. Wilson
  • Publication number: 20140070145
    Abstract: The present invention relates to oxocarbon-, pseudooxocarbon- and radialene compounds as well as to their use as doping agent for doping an organic semiconductive matrix material, as blocker material, as charge injection layer, as electrode material as well as organic semiconductor, as well as electronic components and organic semiconductive materials using them.
    Type: Application
    Filed: November 14, 2013
    Publication date: March 13, 2014
    Applicant: NOVALED AG
    Inventors: Horst Hartmann, Olaf Zeika, Andrea Lux, Steffen Willmann
  • Patent number: 8618321
    Abstract: New types of derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups or polyalkoxy groups modified with terminal hydrophilic groups, preparation of such compounds and their use, especially as surfactants and thickeners.
    Type: Grant
    Filed: May 19, 2011
    Date of Patent: December 31, 2013
    Assignee: BASF SE
    Inventors: Marta Reinoso Garcia, Günter Oetter, Vandana Kurkal-Siebert, Björn Heinz, Christian Bittner, Markus Hansch, Roman Benedikt Raether
  • Publication number: 20130310612
    Abstract: A liquid resol-type phenolic resin obtained by reacting a phenol (A), and a secondary and/or tertiary alkylamine compound (B) in the presence of a basic catalyst. The nitrogen content relative to the total weight of the liquid resol-type phenolic resin is preferably from 3 to 30% by weight. Further, the secondary and/or tertiary alkylamine compound (B) is preferably hexamethylenetetramine. Moreover, the molar ratio between the phenol (A) and the secondary and/or tertiary alkylamine compound (B) preferably satisfies (B)/(A)=0.13 to 0.35.
    Type: Application
    Filed: December 28, 2011
    Publication date: November 21, 2013
    Applicant: SUMITOMO BAKELITE CO., LTD.
    Inventor: Yuji Suzuki
  • Publication number: 20130307167
    Abstract: The present invention relates to techniques including a phenolic oligomer of general formula (1): wherein n is an integer of 0 to 15, Rs are allyl groups, a1 and a3 are each independently 0, 1, 2 or 3, each a2 is independently 0, 1 or 2, each R? is independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group, and proviso that at least one of a1, each a2 and a3 represents 2, and a method for producing such phenolic oligomer.
    Type: Application
    Filed: October 26, 2011
    Publication date: November 21, 2013
    Applicant: MEIWA PLASTIC INDUSTRIES, LTD.
    Inventors: Kiyoshi Oomori, Yasunori Fukuda, Yoshikazu Nakagawa, Yoshitaka Ooue, Noriyuki Mitani
  • Publication number: 20130310611
    Abstract: A process for producing a phenolic polymerizable compound represented by formula (1) or (2); wherein X1-X9 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms; Y represents a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms, or a group represented by formula (6); and Z represents a hydrogen atom or a group represented by formula (3), which is characterized by heating a 4-hydroxycinnamic acid compound in the presence of a metal salt.
    Type: Application
    Filed: October 27, 2011
    Publication date: November 21, 2013
    Applicant: UHA MIKAKUTO CO., LTD.
    Inventors: Akinobu Kishi, Satoshi Doi, Taiji Matsukawa, Takeki Matsui, Yasumasa Yamada, Ichiro Yamada
  • Publication number: 20130296613
    Abstract: A process for producing a hydroxystilbene derivative represented by formula (1) (wherein X1-X4 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms; Z1 and Z2 independently represent a hydrogen atom, or a group represented by the formula (2) (wherein X5 and X6 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms); and Z1 and Z2 may be the same as or different from each other; wherein X1-X6 may be the same as or different from one another), which is characterized by heating a 4-hydroxycinnamic acid compound and a hydroxystilbene compound in the presence of a metal salt.
    Type: Application
    Filed: November 25, 2011
    Publication date: November 7, 2013
    Applicant: UHA MIKAKUTO CO., LTD.
    Inventors: Akinobu Kishi, Satoshi Doi, Taiji Matsukawa, Takeki Matsui, Yasumasa Yamada, Ichiro Yamada
  • Patent number: 8530136
    Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.
    Type: Grant
    Filed: December 17, 2010
    Date of Patent: September 10, 2013
    Assignee: International Business Machines Corporation
    Inventors: Luisa D. Bozano, Gregory Breyta, Ekmini A. DeSilva, William D. Hinsberg, Ratnam Sooriyakumaran, Linda K. Sundberg
  • Patent number: 8507732
    Abstract: The present invention is directed to a composition comprising a tris-hydroxyaryl compound having a metal ion impurity content of less than 10 ppm and to a process for the purification of tris-hydroxyaryl compound having a metal ion impurity, comprising at least the following steps: a) conditioning a sulphonic acid group-containing active ion exchanger with a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, b) producing a solution of the tris-hydroxyaryl compounds to be purified in a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, c) contacting the tris-hydroxyaryl compound-containing solution from b) with the conditioned ion exchanger from a), d) separating the tris-hydroxyaryl compound-containing solution from c) from the conditioned ion exchanger, e) removing at least part of the solvent from the solution of the tris-hydroxyaryl compound separated in d) under low temperature stress.
    Type: Grant
    Filed: April 7, 2011
    Date of Patent: August 13, 2013
    Assignee: Bayer Intellectual Property GmbH
    Inventors: Christian Münnich, Stephan Konrad, Karl-Heinz Köhler
  • Publication number: 20130150628
    Abstract: The present invention is directed to a pharmaceutical composition comprising:
    Type: Application
    Filed: January 31, 2013
    Publication date: June 13, 2013
    Inventor: Thomas M. DiMauro
  • Patent number: 8389197
    Abstract: The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].
    Type: Grant
    Filed: June 30, 2006
    Date of Patent: March 5, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Takako Hirosaki, Daiju Shiono, Taku Hirayama, Hideo Hada
  • Patent number: 8377627
    Abstract: A compound shown by the following formula (1).
    Type: Grant
    Filed: July 30, 2008
    Date of Patent: February 19, 2013
    Assignee: JSR Corporation
    Inventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
  • Publication number: 20130030211
    Abstract: A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.
    Type: Application
    Filed: January 13, 2011
    Publication date: January 31, 2013
    Inventors: Masatoshi Echigo, Dai Oguro
  • Publication number: 20120277479
    Abstract: Provided is a polynuclear poly(phenol)family represented by general formula (1). In general formula (1), R1s are each independently C1-8 alkyl group, C1-8 alkoxy group, an aromatic hydrocarbon group, or a C1-8 saturated hydrocarbon group having an aromatic hydrocarbon group; n is 0 or an integer of 1 to 3; X is a hydroxyphenyl group represented by general formula (2); and A is a tetravalent carbon atom group or a tetravalent saturated hydrocarbon group having two or more carbon atoms, with the proviso that when A is a tetravalent saturated hydrocarbon group having two or more carbon atoms, two carbon atoms in the A group are each bonded to two phenyl groups.
    Type: Application
    Filed: December 15, 2010
    Publication date: November 1, 2012
    Applicant: HONSHU CHEMICAL INDUSTRY CO., LTD.
    Inventor: Tatsuya Iwai
  • Publication number: 20120269745
    Abstract: A hydroxytyrosol polymer formed by either C—C coupling or C—O—C coupling is provided. Preferred polymers are formed by C—C coupling and the dimer has the following structure: (Formula I) (I) Compounds of the invention have been found to have antioxidant properties and their use in antioxidant compositions forms a further aspect of the invention.
    Type: Application
    Filed: September 22, 2010
    Publication date: October 25, 2012
    Applicant: University of Cape Town
    Inventors: Stephanie Gail Burton, Lester Merlin Davids
  • Publication number: 20120264864
    Abstract: The use of a phenolic compound for producing a modified polyamide having enhanced mechanical properties is described. A polyamide composition including at least such phenolic compound and optionally reinforcing or filler loads is also described. The composition is preferably a composition for molding, for example in the form of granules or powder, that can be used for the production of articles by injection-molding.
    Type: Application
    Filed: October 18, 2010
    Publication date: October 18, 2012
    Applicants: C.N.R.S., RHODIA OPERATIONS
    Inventors: Caroll Vergelati, Olivier Andres, Vincent Schanen, Ludovic Odoni, Paul Sotta, Didier Long
  • Publication number: 20120220805
    Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.
    Type: Application
    Filed: September 9, 2010
    Publication date: August 30, 2012
    Applicant: HONSHU CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akira Yoshitomo, Shihoko Nakano
  • Publication number: 20120129963
    Abstract: Cardanol derivative comprising one or more units of the formula and a method for obtaining such cardanol derivative.
    Type: Application
    Filed: July 8, 2009
    Publication date: May 24, 2012
    Inventors: Elena Benedetti, Pietro Campaner, Daniele D'Amico, Andrea Minigher, Cristina Stifani, Antonella Tarzia
  • Patent number: 8173351
    Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.
    Type: Grant
    Filed: January 8, 2008
    Date of Patent: May 8, 2012
    Assignee: JSR Corporation
    Inventors: Daisuke Shimizu, Ken Maruyama, Toshiyuki Kai, Tsutomu Shimokawa
  • Publication number: 20120108853
    Abstract: Trisphenols of general formula (1), which are useful as starting materials for polymer, are industrially easily produced by a method using as a starting material 4-aralkylphenol derivatives expressed by general formula (2): wherein X represents a hydrogen atom or leaving group that can be substituted with a hydrogen atom.
    Type: Application
    Filed: May 19, 2010
    Publication date: May 3, 2012
    Applicant: HONSHU CHEMICAL INDUSTRY CO., LTD.
    Inventors: Akihiko Ojiri, Takafumi Tsujigami, Kouichi Tanba
  • Publication number: 20120108854
    Abstract: Processes for producing 1,3,5-trimethyl-2,4,6-tris(3,5-dialkyl-4-hydroxybenzyl)benzene are provided, in particular such processes that utilize 2,6-di-tert-butylphenol, paraformaldehyde, a secondary amine, mesitylene, and acetic acid.
    Type: Application
    Filed: July 6, 2010
    Publication date: May 3, 2012
    Applicant: Albemarle Corporation
    Inventors: Mahmood Sabahi, Thomas Robert Nicholas
  • Patent number: 8154571
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Grant
    Filed: December 25, 2008
    Date of Patent: April 10, 2012
    Assignee: Adeka Corporation
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Patent number: 8110334
    Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.
    Type: Grant
    Filed: November 1, 2007
    Date of Patent: February 7, 2012
    Assignee: Mitsubishi Gas Chemical Company, Inc.
    Inventors: Masatoshi Echigo, Dai Oguro
  • Publication number: 20120010433
    Abstract: In a device and a process for continuous solid/liquid separation (filtration) of solid-liquid suspensions on moving filters, for example on rotating drum filters or belt filters, the active filtering layer contains a woven fabric material composed of synthetic fibres, which has an enhanced filtrate permeability and also an enhanced thermal stability with improved dimensional stability, and also improved mechanical strength compared with polypropylene fibres.
    Type: Application
    Filed: July 7, 2011
    Publication date: January 12, 2012
    Applicant: Bayer MaterialScience AG
    Inventors: Christian Münnich, Karl-Heinz Köhler, Stefan Westernacher
  • Publication number: 20110288322
    Abstract: New types of derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups or polyalkoxy groups modified with terminal hydrophilic groups, preparation of such compounds and their use, especially as surfactants and thickeners.
    Type: Application
    Filed: May 19, 2011
    Publication date: November 24, 2011
    Applicant: BASF SE
    Inventors: Marta Reinoso Garcia, Günter Oetter, Vandana Kurkal-Siebert, Björn Heinz, Christian Bittner, Markus Hansch, Roman Benedikt Raether
  • Publication number: 20110251438
    Abstract: The present invention is directed to a composition comprising a tris-hydroxyaryl compound having a metal ion impurity content of less than 10 ppm and to a process for the purification of tris-hydroxyaryl compound having a metal ion impurity, comprising at least the following steps: a) conditioning a sulphonic acid group-containing active ion exchanger with a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, b) producing a solution of the tris-hydroxyaryl compounds to be purified in a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, c) contacting the tris-hydroxyaryl compound-containing solution from b) with the conditioned ion exchanger from a), d) separating the tris-hydroxyaryl compound-containing solution from c) from the conditioned ion exchanger, e) removing at least part of the solvent from the solution of the tris-hydroxyaryl compound separated in d) under low temperature stress.
    Type: Application
    Filed: April 7, 2011
    Publication date: October 13, 2011
    Applicant: Bayer MaterialScience AG
    Inventors: Christian Münnich, Stephan Konrad, Karl-Heinz Köhler
  • Publication number: 20110165516
    Abstract: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.
    Type: Application
    Filed: March 18, 2011
    Publication date: July 7, 2011
    Inventors: Masatoshi ECHIGO, Dai Oguro
  • Patent number: 7960089
    Abstract: A compound of the present invention is a compound represented by a general formula (A-1) [wherein, R? represents a hydrogen atom or an acid-dissociable, dissolution-inhibiting group, provided that at least one R? group is an acid-dissociable, dissolution-inhibiting group, R11 to R17 each represent an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each represent an integer of 1 or greater, and k and q each represent an integer of 0 or greater, provided that g+j+k+q is not greater than 5; a represents an integer from 1 to 3; b represents an integer of 1 or greater, and l and m each represent an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represent an integer of 0 or greater, provided that c+n+o is not greater than 4; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown belo
    Type: Grant
    Filed: September 13, 2006
    Date of Patent: June 14, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daiju Shiono, Takahiro Dazai, Taku Hirayama, Kohei Kasai, Hideo Hada
  • Patent number: 7943803
    Abstract: A clathrate compound containing a polymolecular host compound as a host compound and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound.
    Type: Grant
    Filed: May 4, 2010
    Date of Patent: May 17, 2011
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Natsuki Amanokura, Tetsuya Sahara, Hiroshi Suzuki, Yuichi Maekawa, Kiyoshi Katsuura, Yoshihiro Enomoto
  • Patent number: 7932014
    Abstract: A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.
    Type: Grant
    Filed: February 14, 2008
    Date of Patent: April 26, 2011
    Assignee: Canon Kabushiki Kaisha
    Inventor: Toshiki Ito
  • Patent number: 7910284
    Abstract: To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional groups which are chemically converted due to actions of an acid with the solubility in an alkaline developer reduced is used as a material for photoresist. In the mixture, two or more triphenyl methane structures are bonded to portions other than the functional group in the nonconjugated state. Furthermore, the mixture comprises polynuclear compounds with the average number of functional groups of 2.5 or below and includes the polynuclear compounds not having any functional group per molecule by 15% or less in the term of weight ratio, and the polynuclear phenol compounds having 3 or more functional groups per molecule by 40% or less.
    Type: Grant
    Filed: August 15, 2007
    Date of Patent: March 22, 2011
    Assignees: Hitachi, Ltd., Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Kyoko Kojima, Hideo Hada, Daiju Shiono
  • Publication number: 20110009562
    Abstract: Aromatic polycyanate compounds which comprise cycloaliphatic moieties, a process for the production thereof and resins and thermoset products which are based on these compounds.
    Type: Application
    Filed: March 9, 2009
    Publication date: January 13, 2011
    Applicant: Dow Global Technologies Inc.
    Inventors: Michael J. Mullins, Robert E. Hefner, JR., Ulrich Herold, Mark B. Wilson
  • Patent number: 7862981
    Abstract: A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.
    Type: Grant
    Filed: June 7, 2006
    Date of Patent: January 4, 2011
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Daiju Shiono, Taku Hirayama, Hideo Hada
  • Patent number: 7858819
    Abstract: A new tris(formylphenyl) of the following general formula and polynuclear phenol derived therefrom:
    Type: Grant
    Filed: June 11, 2007
    Date of Patent: December 28, 2010
    Assignee: Honshu Chemical Industry Co., Ltd.
    Inventors: Akira Yoshitomo, Tatsuya Iwai
  • Publication number: 20100274006
    Abstract: A clathrate compound containing a polymolecular host compound as a host compound and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound.
    Type: Application
    Filed: May 4, 2010
    Publication date: October 28, 2010
    Applicant: NIPPON SODA CO., LTD
    Inventors: Natsuki Amanokura, Tetsuya Sahara, Hiroshi Suzuki, Yuichi Maekawa, Kiyoshi Katsuura, Yoshihiro Enomoto
  • Publication number: 20100256382
    Abstract: The present invention relates to a novel class of tri-aryl compounds, compositions comprising the same and processes for the preparation thereof.
    Type: Application
    Filed: June 3, 2008
    Publication date: October 7, 2010
    Applicant: BEN-GURION UNIVERSITY OF THE NEGEV RESEARCH AND DEVELOPMENT AUTHORITKY
    Inventors: Esther Priel, Aviv Gazit, Shimon Slavin, Sara Yitzchak
  • Publication number: 20100249466
    Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.
    Type: Application
    Filed: December 25, 2008
    Publication date: September 30, 2010
    Applicant: ADEKA CORPORATION
    Inventors: Etsuo Tobita, Koichi Shigeno, Satoru Kanda, Ryozo Arata, Yamahiko Egami
  • Patent number: 7737309
    Abstract: The present invention provides a clathrate compound characterized by containing: a polymolecular host compound as a host compound; and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound. The present invention also provides a method for controlling the concentration of an aqueous agricultural chemical active ingredient solution, characterized by containings a step of including an agricultural chemical active ingredient having high saturated solubility in an interior space formed of a polymolecular host compound, thereby maintaining the saturated solubility of the agricultural chemical active ingredient in water within a predetermined concentration range. The present invention also provides an agricultural chemical formulation containing the clathrate compound. The present invention also provides an agricultural active composition containing the clathrate compound and a synthetic pyrethroid.
    Type: Grant
    Filed: July 12, 2005
    Date of Patent: June 15, 2010
    Assignee: Nippon Soda Co., Ltd.
    Inventors: Natsuki Amanokura, Tetsuya Sahara, Hiroshi Suzuki, Yuichi Maekawa, Kiyoshi Katsuura, Yoshihiro Enomoto
  • Publication number: 20100099908
    Abstract: A novel tris(formylphenyl) according to the following general formula and polynuclear phenol derived therefrom, which are useful as a material for heat resistant materials, material for photosensitive resist compositions, epoxy resin material or hardener, developer or anti-fade agent for thermosensitive recording materials, or sterilizer, fungicide, antioxidant, etc: In the formula, Y represents a hydrogen atom or —R2COOR3 group, R2 represents a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15 or an aliphatic hydrocarbon group with a carbon atom number of 1 to 8 that may have in its main chain a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15, and R3 represents a hydrogen atom or alkyl group with a carbon atom number of 1 to 6. R1s may be the same or different and respectively represent a hydrogen atom, alkyl group with a carbon atom number of 1 to 8 or alkoxyl group with a carbon atom number of 1 to 8.
    Type: Application
    Filed: June 11, 2007
    Publication date: April 22, 2010
    Applicant: Honshu Chemical Industry Co., Ltd.
    Inventors: Akira Yoshitomo, Tatsuya Iwai
  • Patent number: 7700580
    Abstract: A process for the preparation of a pharmaceutical-grade anhydrous calcipotriol comprising: (a) dissolving crude calcipotriol having a water content of X% by weight in a first solvent or in a mixture of two or more first solvents, said first solvent or said mixture of two or more first solvents forming an azeotropic system with water, to obtain a solution of crude calcipotriol; (b) obtaining an intermediate calcipotriol by (i) placing said solution of crude calcipotriol under a reduced pressure and evaporating, if X is greater than or equal to 1, or (ii) crystallizing, if X is lower than 1; and (c) re-dissolving said intermediate calcipotriol in a second solvent or a mixture of two or more second solvents, said second solvent being anhydrous, and crystallizing at least once to obtain pharmaceutical-grade anhydrous calcipotriol.
    Type: Grant
    Filed: December 29, 2005
    Date of Patent: April 20, 2010
    Assignee: Instytut Farmaceutyczny
    Inventors: Andrzej Kutner, Michal Chodyński, Teresa Ryznar, Hanna Fitak, Jerzy Winiarski, Bartlomiej Górecki, Agnieszka Burzyńska, Wieslaw Szelejewski