Abstract: 4-Aralkylphenols and derivatives thereof expressed by general formulas (6) and (7) are useful for producing trisphenols.

Abstract: The present invention provides a class of molecular glass photoresist (I and II) comprising bisphenol A as a main structure and their preparation. The molecular glass photoresist is formulated with a photoacid generator, a cross-linking agent, a photoresist solvent, and other additives into a positive or negative photoresist. A photoresist with a uniform thickness is formed on a silicon wafer by spin-coating. The photoresist formulation can be used in modern lithography, such as 248 nm photolithography, 193 nm photolithography, extreme-ultraviolet (EUV) lithography, nanoimprint lithography, electron beam lithography, and particularly in the EUV-lithography technique.

Abstract: Provided is a polynuclear poly(phenol)family represented by general formula (1). In general formula (1), R1s are each independently C1-8 alkyl group, C1-8 alkoxy group, an aromatic hydrocarbon group, or a C1-8 saturated hydrocarbon group having an aromatic hydrocarbon group; n is 0 or an integer of 1 to 3; X is a hydroxyphenyl group represented by general formula (2); and A is a tetravalent carbon atom group or a tetravalent saturated hydrocarbon group having two or more carbon atoms, with the proviso that when A is a tetravalent saturated hydrocarbon group having two or more carbon atoms, two carbon atoms in the A group are each bonded to two phenyl groups.

Abstract: The present invention relates to the use of an antioxidant treated promoted strong acid ion exchange resin as an acid catalyst.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.

Abstract: This invention addresses problems to provide a cyclic compound having a high solubility in safety solvents and a high sensitivity and being good in the shape of the resulting resist pattern, a method of producing the same, a radiation sensitive composition comprising the same, and a method of forming a resist pattern using the radiation sensitive composition. As means for solving the problem, there are provided a cyclic compound having a specific structure, a radiation sensitive composition comprising the compound, and a method of forming a resist pattern using the composition.

Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.

Abstract: Processes for producing 1,3,5-trimethyl-2,4,6-tris(3,5-dialkyl-4-hydroxybenzyl)benzene are provided, in particular such processes that utilize 2,6-di-tert-butylphenol, paraformaldehyde, a secondary amine, mesitylene, and acetic acid.

Abstract: A cyclic compound represented by formula (1): wherein L, R1, R?, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Abstract: Aromatic polycyanate compounds which comprise cycloaliphatic moieties, a process for the production thereof and resins and thermoset products which are based on these compounds.

Abstract: The present invention relates to oxocarbon-, pseudooxocarbon- and radialene compounds as well as to their use as doping agent for doping an organic semiconductive matrix material, as blocker material, as charge injection layer, as electrode material as well as organic semiconductor, as well as electronic components and organic semiconductive materials using them.

Abstract: New types of derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups or polyalkoxy groups modified with terminal hydrophilic groups, preparation of such compounds and their use, especially as surfactants and thickeners.

Abstract: A liquid resol-type phenolic resin obtained by reacting a phenol (A), and a secondary and/or tertiary alkylamine compound (B) in the presence of a basic catalyst. The nitrogen content relative to the total weight of the liquid resol-type phenolic resin is preferably from 3 to 30% by weight. Further, the secondary and/or tertiary alkylamine compound (B) is preferably hexamethylenetetramine. Moreover, the molar ratio between the phenol (A) and the secondary and/or tertiary alkylamine compound (B) preferably satisfies (B)/(A)=0.13 to 0.35.

Abstract: A process for producing a phenolic polymerizable compound represented by formula (1) or (2); wherein X1-X9 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms; Y represents a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms, or a group represented by formula (6); and Z represents a hydrogen atom or a group represented by formula (3), which is characterized by heating a 4-hydroxycinnamic acid compound in the presence of a metal salt.

Abstract: The present invention relates to techniques including a phenolic oligomer of general formula (1): wherein n is an integer of 0 to 15, Rs are allyl groups, a1 and a3 are each independently 0, 1, 2 or 3, each a2 is independently 0, 1 or 2, each R? is independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms or an aryl group, and proviso that at least one of a1, each a2 and a3 represents 2, and a method for producing such phenolic oligomer.

Abstract: A process for producing a hydroxystilbene derivative represented by formula (1) (wherein X1-X4 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms; Z1 and Z2 independently represent a hydrogen atom, or a group represented by the formula (2) (wherein X5 and X6 independently represent a hydrogen atom, a hydroxy group, a saturated or unsaturated linear or branched alkoxy group having 1-10 carbon atoms, or a saturated or unsaturated linear or branched alkyl group having 1-10 carbon atoms); and Z1 and Z2 may be the same as or different from each other; wherein X1-X6 may be the same as or different from one another), which is characterized by heating a 4-hydroxycinnamic acid compound and a hydroxystilbene compound in the presence of a metal salt.

Abstract: Phenolic molecular glasses such as calixarenes include at least one fluoroalcohol containing unit. The fluoroalcohol containing molecular glasses can be used in photoresist compositions. Also disclosed are processes for generating a resist image on a substrate using the photoresist composition.

Abstract: The present invention is directed to a composition comprising a tris-hydroxyaryl compound having a metal ion impurity content of less than 10 ppm and to a process for the purification of tris-hydroxyaryl compound having a metal ion impurity, comprising at least the following steps: a) conditioning a sulphonic acid group-containing active ion exchanger with a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, b) producing a solution of the tris-hydroxyaryl compounds to be purified in a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, c) contacting the tris-hydroxyaryl compound-containing solution from b) with the conditioned ion exchanger from a), d) separating the tris-hydroxyaryl compound-containing solution from c) from the conditioned ion exchanger, e) removing at least part of the solvent from the solution of the tris-hydroxyaryl compound separated in d) under low temperature stress.

Abstract: The present invention is directed to a pharmaceutical composition comprising:

Abstract: The present invention provides a positive resist composition and a resist pattern forming method that are capable of forming a resist pattern with a reduced level of roughness. The positive resist composition includes the compound represented by the general formula (I) below. The present invention also provides the resist pattern forming method using the positive resist composition above. [wherein, in formula (I), R11 and R12 each represents, independently, an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, and may include a hetero atom in the structure thereof; R21 to R24 each represents, independently, a hydrogen atom or an acid dissociable, dissolution inhibiting group, and two of the R21 to R24 represents a hydrogen atom and the others represents an acid dissociable, dissolution inhibiting group; X is a group represented by general formulas (Ia) or (Ib) below].

Abstract: A compound shown by the following formula (1).

Abstract: A bicyclohexane derivative compound useful in the field of photoresist, the field of intermediate of drugs and pesticides, and the like, and a manufacturing method of the same are provided. A bicyclohexane derivative compound represented by the following general formula (II) is provided. (In formula (II), Y independently represents an alkyl group of 1 to 10 carbons, a halogen atom, an acyloxy group, an alkoxycarbonyl group or a hydroxyl group, X1 represents a halogen atom, m represents an integer of 0 to 11, and m represents an integer of 0 to 10.

Abstract: Provided is a polynuclear poly(phenol)family represented by general formula (1). In general formula (1), R1s are each independently C1-8 alkyl group, C1-8 alkoxy group, an aromatic hydrocarbon group, or a C1-8 saturated hydrocarbon group having an aromatic hydrocarbon group; n is 0 or an integer of 1 to 3; X is a hydroxyphenyl group represented by general formula (2); and A is a tetravalent carbon atom group or a tetravalent saturated hydrocarbon group having two or more carbon atoms, with the proviso that when A is a tetravalent saturated hydrocarbon group having two or more carbon atoms, two carbon atoms in the A group are each bonded to two phenyl groups.

Abstract: A hydroxytyrosol polymer formed by either C—C coupling or C—O—C coupling is provided. Preferred polymers are formed by C—C coupling and the dimer has the following structure: (Formula I) (I) Compounds of the invention have been found to have antioxidant properties and their use in antioxidant compositions forms a further aspect of the invention.

Abstract: The use of a phenolic compound for producing a modified polyamide having enhanced mechanical properties is described. A polyamide composition including at least such phenolic compound and optionally reinforcing or filler loads is also described. The composition is preferably a composition for molding, for example in the form of granules or powder, that can be used for the production of articles by injection-molding.

Abstract: A trisphenol compound is expressed by formula (1), wherein R represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, phenyl group or hydroxyl group; R1 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms, or phenyl group; R2 represents an alkyl group or alkoxyl group with 1 to 8 carbon atoms; R3 represents a hydrogen atom or alkyl group with 1 to 8 carbon atoms; a represents 0, 1, 2, or 3; b represents 1 or 2; and c and d represent 0, 1, 2, 3, or 4; where the sum of b and c is 5 or less; R's may be either the same or different when a is 2 or more; R1's may be either the same or different when c is 2 or more; and R2's may be either the same or different when d is 2 or more.

Abstract: Cardanol derivative comprising one or more units of the formula and a method for obtaining such cardanol derivative.

Abstract: A compound shown by the following formula (1) can be used as a material for a radiation-sensitive composition capable of forming a resist film which effectively responds to electron beams or the like, exhibits low roughness, and can form a high precision minute pattern in a stable manner.

Abstract: Trisphenols of general formula (1), which are useful as starting materials for polymer, are industrially easily produced by a method using as a starting material 4-aralkylphenol derivatives expressed by general formula (2): wherein X represents a hydrogen atom or leaving group that can be substituted with a hydrogen atom.

Abstract: Processes for producing 1,3,5-trimethyl-2,4,6-tris(3,5-dialkyl-4-hydroxybenzyl)benzene are provided, in particular such processes that utilize 2,6-di-tert-butylphenol, paraformaldehyde, a secondary amine, mesitylene, and acetic acid.

Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.

Abstract: A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition.

Abstract: In a device and a process for continuous solid/liquid separation (filtration) of solid-liquid suspensions on moving filters, for example on rotating drum filters or belt filters, the active filtering layer contains a woven fabric material composed of synthetic fibres, which has an enhanced filtrate permeability and also an enhanced thermal stability with improved dimensional stability, and also improved mechanical strength compared with polypropylene fibres.

Abstract: New types of derivatives of tris(2-hydroxyphenyl)methanes which have, as functional groups, polyalkoxy groups or polyalkoxy groups modified with terminal hydrophilic groups, preparation of such compounds and their use, especially as surfactants and thickeners.

Abstract: The present invention is directed to a composition comprising a tris-hydroxyaryl compound having a metal ion impurity content of less than 10 ppm and to a process for the purification of tris-hydroxyaryl compound having a metal ion impurity, comprising at least the following steps: a) conditioning a sulphonic acid group-containing active ion exchanger with a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, b) producing a solution of the tris-hydroxyaryl compounds to be purified in a solvent which is suitable for the handling of the tris-hydroxyaryl compounds, c) contacting the tris-hydroxyaryl compound-containing solution from b) with the conditioned ion exchanger from a), d) separating the tris-hydroxyaryl compound-containing solution from c) from the conditioned ion exchanger, e) removing at least part of the solvent from the solution of the tris-hydroxyaryl compound separated in d) under low temperature stress.

Abstract: A radiation-sensitive composition containing 1 to 80% by weight of a solid component and 20 to 99% by weight of a solvent. The solid component contains a compound B which has (a) a structure derived from a polyphenol compound A by introducing an acid-dissociating group to at least one phenolic hydroxyl group of the polyphenol compound A which is synthesized by a condensation between a di- to tetrafunctional aromatic ketone or aromatic aldehyde each having 5 to 36 carbon atoms with a compound having 1 to 3 phenolic hydroxyl groups and 6 to 15 carbon atoms, and (b) a molecular weight of 400 to 2000. The composition containing the compound B is useful as an acid-amplified, non-polymeric resist material, because it is highly sensitive to radiation such as KrF excimer lasers, extreme ultraviolet rays, electron beams, and X-rays, and provides resist patterns with a high resolution, high heat resistance, and high etching resistance.

Abstract: A compound of the present invention is a compound represented by a general formula (A-1) [wherein, R? represents a hydrogen atom or an acid-dissociable, dissolution-inhibiting group, provided that at least one R? group is an acid-dissociable, dissolution-inhibiting group, R11 to R17 each represent an alkyl group of 1 to 10 carbon atoms or an aromatic hydrocarbon group, which may include a hetero atom within the structure; g and j each represent an integer of 1 or greater, and k and q each represent an integer of 0 or greater, provided that g+j+k+q is not greater than 5; a represents an integer from 1 to 3; b represents an integer of 1 or greater, and l and m each represent an integer of 0 or greater, provided that b+l+m is not greater than 4; c represents an integer of 1 or greater, and n and o each represent an integer of 0 or greater, provided that c+n+o is not greater than 4; and A represents a group represented by a general formula (Ia) shown below, a group represented by a general formula (Ib) shown belo

Abstract: A clathrate compound containing a polymolecular host compound as a host compound and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound.

Abstract: A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R8 are selected from the group consisting of a hydrogen atom, a halogen atom, an alkyl group, an alkoxy group, an acetoxy group, a phenyl group, a naphthyl group, and an alkyl group in which some or all of the hydrogen atoms are optionally replaced by fluorine atoms; R9 is a hydrogen atom or a hydroxyl group; X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthalene group; and Y is an oxygen atom or a single bond.

Abstract: To overcome the problem that a device performance is degraded by the edge roughness of a photoresist pattern, a mixture of polynuclear phenol compounds having, in one molecule, 0 to 6 functional groups which are chemically converted due to actions of an acid with the solubility in an alkaline developer reduced is used as a material for photoresist. In the mixture, two or more triphenyl methane structures are bonded to portions other than the functional group in the nonconjugated state. Furthermore, the mixture comprises polynuclear compounds with the average number of functional groups of 2.5 or below and includes the polynuclear compounds not having any functional group per molecule by 15% or less in the term of weight ratio, and the polynuclear phenol compounds having 3 or more functional groups per molecule by 40% or less.

Abstract: Aromatic polycyanate compounds which comprise cycloaliphatic moieties, a process for the production thereof and resins and thermoset products which are based on these compounds.

Abstract: A compound including a polyhydric phenol compound represented by general formula (I) shown below (wherein R11 to R17 each independently represents an alkyl group of 1 to 10 carbon atoms or aromatic hydrocarbon group which may contain a hetero atom in the structure thereof, and X represents an aliphatic cyclic group) and having a molecular weight of 300 to 2,500, in which some or all of the hydrogen atoms of the phenolic hydroxyl groups are substituted with acid dissociable, dissolution inhibiting groups; a positive resist composition containing the compound; and a method of forming a resist pattern using the positive resist composition.

Abstract: A new tris(formylphenyl) of the following general formula and polynuclear phenol derived therefrom:

Abstract: A clathrate compound containing a polymolecular host compound as a host compound and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound.

Abstract: The present invention relates to a novel class of tri-aryl compounds, compositions comprising the same and processes for the preparation thereof.

Abstract: A thermal recording material of the invention contains, as a storability improver, tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane trapping and containing water and/or methanol and having a crystal structure that shows a maximum X-ray diffraction peak at a diffraction angle 2? of 6.58° according to X-ray diffraction measurement using an X ray having a wavelength of a Cu—K? line. The recording material has improved heat resistance in non-printing sections while maintaining the moisture-and-heat resistance in printing sections. The thermal recording material of the invention has a thermal-recording layer that contains the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane in an amount of preferably 0.1 to 15% by mass with respect to the thermal-recording layer. The amount of the water and/or methanol trapped and contained in the tris(2-methyl-4-hydroxy-5-t-butylphenyl)butane is preferably 0.1 to 10% by mass in total.

Abstract: The present invention provides a clathrate compound characterized by containing: a polymolecular host compound as a host compound; and an agricultural chemical active ingredient having a saturated solubility in water at 25° C. of not less than 500 ppm as a guest compound. The present invention also provides a method for controlling the concentration of an aqueous agricultural chemical active ingredient solution, characterized by containings a step of including an agricultural chemical active ingredient having high saturated solubility in an interior space formed of a polymolecular host compound, thereby maintaining the saturated solubility of the agricultural chemical active ingredient in water within a predetermined concentration range. The present invention also provides an agricultural chemical formulation containing the clathrate compound. The present invention also provides an agricultural active composition containing the clathrate compound and a synthetic pyrethroid.

Abstract: A novel tris(formylphenyl) according to the following general formula and polynuclear phenol derived therefrom, which are useful as a material for heat resistant materials, material for photosensitive resist compositions, epoxy resin material or hardener, developer or anti-fade agent for thermosensitive recording materials, or sterilizer, fungicide, antioxidant, etc: In the formula, Y represents a hydrogen atom or —R2COOR3 group, R2 represents a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15 or an aliphatic hydrocarbon group with a carbon atom number of 1 to 8 that may have in its main chain a monocyclic or condensed cyclic aromatic hydrocarbon group with a carbon atom number of 6 to 15, and R3 represents a hydrogen atom or alkyl group with a carbon atom number of 1 to 6. R1s may be the same or different and respectively represent a hydrogen atom, alkyl group with a carbon atom number of 1 to 8 or alkoxyl group with a carbon atom number of 1 to 8.

Abstract: A process for the preparation of a pharmaceutical-grade anhydrous calcipotriol comprising: (a) dissolving crude calcipotriol having a water content of X% by weight in a first solvent or in a mixture of two or more first solvents, said first solvent or said mixture of two or more first solvents forming an azeotropic system with water, to obtain a solution of crude calcipotriol; (b) obtaining an intermediate calcipotriol by (i) placing said solution of crude calcipotriol under a reduced pressure and evaporating, if X is greater than or equal to 1, or (ii) crystallizing, if X is lower than 1; and (c) re-dissolving said intermediate calcipotriol in a second solvent or a mixture of two or more second solvents, said second solvent being anhydrous, and crystallizing at least once to obtain pharmaceutical-grade anhydrous calcipotriol.