Abstract: The invention provides a method for producing a quartz glass jig for use in semiconductor industries, which enables increasing the surface layer cleanliness simply and surely at low cost; it also provides a quartz glass jig improved in surface layer cleanliness. The inventive means for resolution are a method comprising processing a quartz glass raw material into a desired shape by a treatment inclusive of fire working, annealing for stress removal, and cleaning treatment to obtain the final product, the method is characterized by that it comprises performing gas phase etching step and gas phase purification step on the surface layer of the quartz glass jig after applying the annealing treatment for stress removal but before the cleaning treatment, wherein the gas phase purification step is carried out continuously after the gas phase etching step.

Abstract: Multi-flame burner wherein each flame is separated with respect to the neighboring flame by at least one separating tube made of a heat resistant material, for example, quartz glass or ceramic material. The burner also has a plurality of co-axial pipes, preferably made of a metallic material. The cross section of the upper end of the separating tube can be modified in order to increase the deposition rate of the burner. Methods for manufacturing optical fibre preforms by vapour deposition using the multi-flame deposition burners.

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C. A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract: In order to avoid haloing when burning in a decoration on a glass ceramic substrate, the invention provides a method for producing a decorated glass ceramic substrate, in which a glass substrate is produced or provided, a layer containing silicon oxide is deposited on the substrate, decorative ink is applied on the layer containing silicon oxide and the decorative ink is burned in, wherein the layer containing silicon oxide is flame-pyrolytically deposited by sweeping over at least one region of the surface of a substrate with a flame and hydrolyzing a silicon compound added to the flame.

Abstract: A burner for use in the manufacture of quartz glass is provided, which comprises a triple-tube assembly of a center tube for feeding a silane or siloxane compound, an intermediate tube for feeding oxygen, and an outer tube for feeding hydrogen, a first tubular shell surrounding the triple-tube assembly for feeding hydrogen, a plurality of first nozzles disposed within the first tubular shell for feeding oxygen, a second tubular shell surrounding the first tubular shell for feeding hydrogen, and a plurality of second nozzles disposed within the second tubular shell for feeding oxygen. Synthetic quartz glass ingots having high optical homogeneity are produced.

Abstract: A synthetic quartz glass ingot is prepared by vapor phase hydrolyzing or oxidatively decomposing a silica feedstock in a flame to form fine particles of silica, depositing the silica particles on a target and melting and vitrifying the particles to form a synthetic quartz glass ingot on the target while the target is moved back and forth. The method further comprises: (i) continuously feeding the silica feedstock at a predetermined rate, (ii) keeping the flame in constant contact with an overall growing face, (iii) cyclically repeating the back and forth movement of the target at a predetermined speed, and (iv) maintaining the shape of the growing ingot unchanged.

Abstract: In film-forming devices and plasma-processing devices, filmy matter adheres to the surfaces of the inner parts and it peels to cause dust and particles in the devices. In the devices, the dust and particles contaminate the objects for film formation thereon or the objects to be processed with plasma. For preventing the objects from being contaminated with them, the inner parts of the devices must be frequently exchanged every time when they have received any minor filmy matter thereon, and this lowers the productivity in the devices. When a modified glass part of which the surface is modified with spherical or bell-like island projections having a width and a height of from a few ?m to a few hundreds ?m is used in a film-forming device and in a plasma-processing device, then its ability to hold the filmy substance having adhered thereto is good and its resistance to plasma is also good.

Abstract: A process for making inorganic, metal oxide spheres that includes exposing solidified, molded microparticles that include a glass precursor composition to a temperature sufficient to transform the molded microparticles into molten glass and cooling the molten glass to form inorganic, metal oxide spheres.

Abstract: The invention provides a method for manufacturing a large scale quartz glass slab ingot in a flame hydrolysis reaction in a furnace, including the steps of rotating the furnace, depositing a fused silica on a furnace bed, and extending the deposit outwardly by heating and rotation of the furnace, thereby a quartz glass slab ingot is obtained. A quartz glass burner is installed at the ceiling of the furnace, hydrogen gas supplied to the burner flows down along the tapered wall of the oxygen chamber and is ejected into the outer casing. Part of the hydrogen gas is deflected to the center of the burner and mixed with the oxygen just after the ejection from the oxygen gas nozzles. Thereby, the flame is formed smoothly and the thermal efficiency is improved. The flame becomes wide enough and the silica powder transported by the hydrogen gas is uniformly fused by the flame and heat capacity of the fused silica.

Abstract: Method and burner for increasing the deposition rate of porous glass deposit in the manufacture of optical preforms, by modifying the cross-sectional shape of the flow of glass particles impacting onto a target preform. In particular, the cross-section of the flow of glass particles is modified by increasing the dimension of the flow from a circular cross-section to one having a major and minor axis in a direction substantially perpendicular to the longitudinal axis of the target preform.

Abstract: A known method for producing synthetic quartz glass with a predetermined hydroxyl group content comprises the following steps: a porous SiO2 soot body is produced by flame hydrolysis or oxidation of a silicon-containing start compound and by layerwise deposition of SiO2 particles on a rotating support; the soot body is subjected to a dehydration treatment in a reaction gas-containing drying atmosphere at a drying temperature for removing hydroxyl groups; and the SiO2 soot body is vitrified into a body consisting of the synthetic quartz glass. Starting from this, and in order to permit a reproducible and reliable manufacture of synthetic, UV-radiation resistant quartz glass with predetermined hydroxyl group content and low chlorine content, it is suggested according to the invention that the dehydration treatment according to method step (b) comprises a drying phase during which ozone is used as the reaction gas, whereby the ozone content of the drying atmosphere is between 0.5% by vol. and 10% by vol.

Abstract: In a synthetic quartz glass ingot which is produced by vapor phase hydrolyzing or oxidatively decomposing a silica-forming starting compound in an oxyhydrogen flame such that silica growth in a direction occurs at a silica particle deposition and melting face, striae visible when viewed from a direction perpendicular to the silica growth direction are distributed periodically over the silica growth direction. The ingot can be used in the production of optical-grade high-homogeneity synthetic quartz glass elements for excimer laser applications, particularly ArF excimer laser applications, in the production of laser damage-resistant optical elements used with light sources such as excimer lasers, and in the production of UV optical fiber.

Abstract: Methods for making glasses and glass-ceramics comprising Al2O3 and SiO2. Glasses made according to the present invention can be made, formed as, or converted into glass beads, articles (e.g., plates), fibers, particles, and thin coatings. Some embodiments of glass-ceramic particles made according to the present invention can be are particularly useful as abrasive particles.

Abstract: The invention discloses an SiO2—TiO2 glass, which is preferably made by flame-hydrolysis and which distinguishes itself by increased resistance to radiation, especially in connection with EUV lithography. By purposefully reducing the hydrogen content, clearly improved resistance to radiation and reduced shrinking is achieved.

Abstract: A multi-tube burner is provided which includes a cylindrical outermost nozzle and at least one cylindrical inner nozzle provided coaxially with the outermost nozzle to form annular jet openings for gases used to manufacture a glass preform. The angle between a center axis of an outer circumference of the outermost nozzle and a distal end portion of each of the inner nozzles is 90°± not more than 3°. Furthermore, the distance between the center axis of the outer circumference of the outermost nozzle and each of center axes of inner circumferences and outer circumferences of the inner nozzles is not more than 0.20 mm.

Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90–120° so that the porous silica matrix has a density of 0.1–1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.

Abstract: A concentric multi-tubular burner for synthesizing glass particles having a center port group constituted by a combination of jet ports of raw material gas, combustible gas and oxygen gas, wherein an outer wall of the oxygen gas jet port in the center port group protrudes more toward a burner head than an inner wall of the oxygen gas jet port. The flow rate of oxygen gas jetted from the oxygen gas jet port of the center port group is controlled to be in a proper range.

Abstract: A silica glass member for semiconductor in which each concentration of Fe, Cu, Cr and Ni is 5 ppb or less and the concentration of an OH group is 30 ppm or less and which has a viscosity of 1013.0 poise or more at 1200° C. is provided as a silica glass member for semiconductor having high heat-resistance and higher purity.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, ?n, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.

Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, ?n, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.

Abstract: Dental glass powders, methods for producing the powders and dental compositions including the glass powders. The powders preferably have a well-controlled particle size, narrow size distribution and a spherical morphology. The method includes forming the particles by a spray pyrolysis technique. The invention also includes dental filler and restorative compositions that include the glass powders.

Abstract: Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.

Abstract: Radiation-induced damage to a lens material in a projection exposure system is reduced by selection of maximum design fluence values HD for lenses and at least one lens made of a material having a characteristic transition point TRC after exposure to a given amount of radiation, wherein, for instance, TRC<0.8. HD among other relationships and/or characteristics of the lenses.

Abstract: These glass bodies are light weight porous structures such as a boules of high purity fused silica (HPFS). More specifically, the porous structures are supports for HPFS mirror blanks. Porous glass is made utilizing flame deposition of pure silica or doped silica in a manner similar to the production of high purity fused silica. Bubbles or seeds are formed in the glass during laydown. Finely divided silicon carbide (SiC) particles are used to form the bubbles. At least one layer of porous glass is formed in the boule.

Abstract: A fused silica production furnace and methods of producing fused silica are disclosed. The furnace and the methods involve using a foamed refractory having a network of interconnected pores.

Abstract: The invention provides an ultraviolet lithography method/system. The lithography method and system include providing a below 200 nm radiation source, providing a photolytically improved transmitting fused silica glass lithography optical element, transmitting below 200 nm photons through said photolytically improved transmitting fused silica glass lithography optical element to form a lithography pattern which is reduced and projected onto a radiation sensitive lithography printing medium to form a printed lithography pattern. Providing the photolytically improved transmitting fused silica glass lithography optical element includes providing a photolytically improved transmitting fused silica glass lithography optical element preform body and forming the photolytically improved transmitting fused silica glass lithography optical element preform into said lithography optical element.

Abstract: A evaluation process of a vibration level at the surface of silicon melt held in a silica glass crucible is provided by setting in the vacuum furnace, the test piece of the silica glass cut out from a silica glass crucible, melting a little amount of silicon put on said piece of the glass, and measuring a vibration cycle of the silicon melt. Moreover, a silica glass crucible not causing the vibration at the surface of the silicon melt held in the silica glass crucible is also provided, wherein the vibration cycle of a silica glass of a side wall of the crucible is controlled at more than ? seconds.

Abstract: Problems the invention is to solve: An object of the present invention is to provide a method for producing a quartz glass crucible capable of pulling up a silicon single crystal at a highly improved yield, yet without generating oscillation at the surface of the melt on pulling up silicon single crystal, and free from generating dislocations due to the peeling off of quartz glass fractions.

Abstract: A burner and a method for producing an inorganic soot such as silica comprising a plurality of substantially planar layers having multiple openings therethrough formed by a micromachining process. The openings are in fluid communication with a precursor inlet and a gas inlet to permit the gas and the precursor to flow through and exit the burner. The burner produces a flame from a combustible gas in which the precursor undergoes a chemical reaction to form the soot.

Abstract: A method for producing a quartz glass material with high resistance to radiation-induced density modifications when exposed to ultraviolet radiation at about 193 nm and energy densities of the order of the working energy densities of optical systems for microlithography, in which the peroxy defect level in the quartz glass material is minimized. In this way the creation of closely neighbored hydroxyl groups can be inhibited, which have been identified as an essential cause for radiation induced density reduction of the quartz glass material.

Abstract: A process for manufacturing glass bodies of doped silicate glass is disclosed. The process involves flame hydrolysis, wherein precursors for the forming of the doped glass are fed together with fuel gases into a single burner. A first formed body is generated on a target. The doped silicate glass produced in this way offers a low density of defects and a small breadth of striae. Preferably the first formed body is subsequently formed into a second formed body having a larger breadth and a smaller length than the first formed body. Thereby, the breadth of striae and the density of defects in the doped silica glass is further reduced.

Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.

Abstract: The present invention relates to a method of making a soot particle and apparatus for making such soot particle. Preferably the method of making the soot particle is substantially free of the step of combusting a fuel and substantially free of the step of forming a plasma. Preferably, the apparatus is devoid of a heating element associated with both combustion and formation of a plasma. A preferred technique for at least one heating step for forming the soot particle is induction heating.

Abstract: A method for manufacturing a synthesized silica glass optical member, the method comprising: providing a porous silica glass body; heating the porous' silica glass body in an atmosphere containing hydrogen or oxygen, and sintering the porous silica glass body in an atmosphere containing fluorine compound. Furthermore, a synthesized silica glass optical member manufactured by the method.

Abstract: A method of producing a porous glass-particle-deposited body by effectively depositing the glass particles synthesized by a burner for synthesizing glass particles on a starting member with increased bonding strength between the deposited glass particles and decreased possibility of developing cracks and other problems, and a burner to be used for the production method. In the method of producing the deposited body by depositing the glass particles synthesized by a burner on the surface of the starting member, the glass particle deposition surface has (a) a region that is hit by the center portion of the flame issuing from the burner and (b) another region that has a temperature higher than that of the region hit by the center portion of the flame and that is located at the outside of the region hit by the center portion of the flame.

Abstract: A concentric multi-tubular burner for synthesizing glass particles having a center port group constituted by a combination of jet ports of raw material gas, combustible gas and oxygen gas, wherein an outer wall of the oxygen gas jet port in the center port group protrudes more toward a burner head than an inner wall of the oxygen gas jet port. The flow rate of oxygen gas jetted from the oxygen gas jet port of the center port group is controlled to be in a proper range.

Abstract: A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.

Abstract: Methods for making glasses and glass-ceramics comprising Al2O3 and SiO2. Glasses made according to the present invention can be made, formed as, or converted into glass beads, articles (e.g., plates), fibers, particles, and thin coatings. Some embodiments of glass-ceramic particles made according to the present invention can be are particularly useful as abrasive particles.

Abstract: A method and apparatus for the manufacture of synthetic vitreous silica ingots involves the production of a melt of synthetic vitreous silica in a crucible (35) within a refractory furnace (31), and the continuous withdrawal of an ingot (43) through an orifice (40) in the wall of the crucible. The silica may be deposited in the crucible by a synthesis burner (33), which may also serve to maintain the silica above its sintering temperature. The emerging ingot is supported by an arrangement of moveable clamps (44).

Abstract: The present invention relates to a method of making a glass tube. In the method, a diameter expanding member is inserted through a hole in a tubular glass blank so as to expand the diameter of the hole while the temperature of the glass blank is controlled to be more than or equal to the softening point. The tubular glass blank may be a purchased product or a self-made product. In the above-mentioned method of making a glass tube, the diameter of the hole in the glass blank may be expanded while at least the rear end of the diameter expanding member is supported. The diameter of the hole in the glass blank may be expanded while both ends of the diameter-expanding member are supported. The present invention also relates to an apparatus for manufacturing a glass tube.

Abstract: The present invention is directed to a method of making an ultra dry high purity, Cl-free, F doped fused silica glass. Silica powder or soot preforms are used to form a glass under conditions to provide a desired level of F doping while reducing the Cl and −OH concentrations to trace levels. The method includes providing a glass precursor in the from of a silica powder or soot preform. The powder is heated in a furnace. The powder is exposed to a F-species at a predetermined temperature and time sufficient to melt the powder and form a high purity fused silica glass in the bottom of said furnace.

Abstract: Burners (14) are used to make glass bodies (19) from OMCTS. The burners have six concentric regions. Putting certain gases through the regions results in thicker bodies than can be achieved with existing techniques and with improved efficiency.

Abstract: Highly durable silica glass containing 0.01% to 2% by weight of at least one element selected from magnesium, calcium, strontium, barium, yttrium, hafnium and zirconium. The silica glass is produced by melting a powdery material comprising a finely divided silica powder and a finely divided zirconium-containing substance by oxyhydrogen flame or plasma are to form an accumulated molten material layer, and extending the molten material layer outwardly in radial directions.

Abstract: Multi-flame burner wherein each flame is separated with respect to the neighboring flame by at least one separating tube made of a heat resistant material, for example, quartz glass or ceramic material. The burner also has a plurality of co-axial pipes, preferably made of a metallic material. The cross section of the upper end of the separating tube can be modified in order to increase the deposition rate of the burner. Methods for manufacturing optical fibre preforms by vapour deposition using the multi-flame deposition burners.

Abstract: The present invention is directed to a system and method for delivering liquid reactants through a burner assembly to form soot used in the manufacture of glass, and in particular, optical waveguides. Due to the tendency of liquid reactants to react to form solids when exposed to water in the air, an evaporative liquid is first delivered through the burner assembly to the combustion zone. Once steady state liquid flow has been achieved in the system, the evaporative liquid is transitioned to the liquid reactant. The liquid reactant is delivered along the same path to the burner assembly, which discharges the liquid reactant into the combustion zone as an atomized liquid to form soot used in the manufacture of glass. Once the desired quantity of soot has been formed, the liquid reactant is transitioned back to the evaporative liquid while maintaining steady state flow. After the liquid reactant has cleared the system, flow of the evaporative liquid is terminated and the burner assembly flame turned off.

Abstract: Burners and methods for producing fused silica members. The burner includes seven gas-emitting regions, including four regions for emitting a mixture of oxygen and combustible gas.

Abstract: A production method of synthetic silica glass according to the present invention comprises a first step of ejecting a silicon compound and a combustion gas containing oxygen and hydrogen from a burner to effect hydrolysis of the silicon compound in oxyhydrogen flame to produce fine particles of silica glass, and thereafter depositing and vitrifying the fine particles of silica glass on a target opposed to the burner to obtain a synthetic silica glass ingot; a second step of heating the synthetic silica glass ingot or the like obtained in the first step up to a first retention temperature of not less than 900° C., retaining the ingot or the like at the first retention temperature, and cooling the ingot or the like at a temperature decrease rate of not more than 10° C./h down to a temperature of not more than 500° C.; and a third step of heating the synthetic silica glass ingot or the like obtained in the second step up to a second retention temperature of not less than 500° C.

Abstract: A method for making silica includes delivering a silica precursor comprising a pseudohalogen to a conversion site and passing the silica precursor through a flame to produce silica soot.

Abstract: A concentric multi-tubular burner for synthesizing glass particles having a center port group constituted by a combination of jet ports of raw material gas, combustible gas and oxygen gas, wherein an outer wall of the oxygen gas jet port in the center port group protrudes more toward a burner head than an inner wall of the oxygen gas jet port. The flow rate of oxygen gas jetted from the oxygen gas jet port of the center port group is controlled to be in a proper range.

Abstract: This invention relates to the production of high purity fused silica glass through oxidation or flame hydrolysis of a vaporizable silicon-containing compound. More particularly, this invention is directed to the use of vaporizable, halide-free compounds in said production. In the preferred practice, a polymethylsiloxane comprises said vaporizable, halide-free compound.