Abstract: A method for manufacturing a photomask material includes delivering a powder containing silicon dioxide into a plasma to produce silica particles and depositing the silica particles on a deposition surface to form glass.

Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses Si—Si bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies and optical elements are described. The titania-containing fused silica bodies can be subsequently processed to make extreme ultraviolet optical elements. The methods and apparatus involve providing a sol including a titania-containing silica powder, forming the sol into a shaped gel and drying and heating the gel to a glass body.

Abstract: A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.

Abstract: An apparatus for manufacturing a glass base material which is an parent material of an optical fiber, comprising: a tank which contains a raw material of the glass base material to vaporize the raw material to generate a raw material in gas phase; a temperature control unit which controls a temperature of the raw material; and a pressure control unit which controls the pressure of the raw material in gas phase.

Abstract: A method for making extreme ultraviolet lithography tool glass substrates includes generating a plasma, delivering reactants comprising a silica precursor and a titania precursor into the plasma to produce titania and silica particles, and depositing the titania and silica particles on a deposition surface to form a homogeneous titania-doped silica. The invention provides for homogeneous glass substrates that are free of striae variations and provides for beneficial extreme ultraviolet lithography reflective optics.

Abstract: A method of forming a glass sheet includes obtaining a preform generated from a glass composition and conveying the preform through a channel having a temperature that decreases along a length of the channel to form a glass sheet having a predetermined width and thickness.

Abstract: In order to provide a quartz glass crucible distinguished by high purity, high opacity and/or low transmissibility in the IR spectrum, it is proposed on the basis of a known quartz glass crucible of opaque quartz glass with a crucible body symmetrical in relation to a rotational axis, an outer zone (3) of opaque quartz glass transitioning radially toward the inside into an inner zone (2) of transparent quartz glass and with a density of at least 2.15 g/cm3, that according to the invention, the crucible body (1) be made of a synthetic SiO2 granulate with a specific BET surface ranging from 0.5 m2/g to 40 m2/g, a tamped volume of at least 0.8 g/cm3 and produced from at least partially porous agglomerates of SiO2 primary particles.

Abstract: The present invention is directed to a method and apparatus for forming soot used in making glass, and in particular, optical waveguides. A liquid precursor (66) is first fed into orifice (52) of a liquid orifice insert (48) within an injector (44) positioned within an atomizing burner assembly, and is thereafter discharged from the injector into a pressurization chamber (56). An atomization gas (70) is also fed into the pressurization chamber (56) to mix with the liquid precursor liquid stream (68) which breaks into droplets (76). The liquid precursor and atomization gas arm forced under pressure out of an atomization orifice (32) on the face of the burner (30) assembly. Flame gas (74), reaction gas (84) and shield gas (82) are ejected from burner orifices (40, 38, 36 and 34) to produce the flame.

Abstract: Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.

Abstract: A method for producing a silica glass body having a low bubble content includes melting silica sand in a chamber (62) of a rotating furnace housing (20) to form molten silica. Helium-containing gas is fed into the chamber, both during introduction of the sand and during the heating step. The helium diffuses more readily from the molten silica than other gases, resulting in lower bubble content. The furnace is heated by establishing a gas plasma arc (60) between spaced electrodes (64, 66) within the chamber.

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies are disclosed. The titania-containing fused silica bodies are subsequently processed to make extreme ultraviolet soft x-ray masks. The methods and apparatus involve providing powders external to a furnace cavity and depositing the powders in the furnace cavity to form a titania-containing fused silica body.

Abstract: A method for forming EUV Lithography straie-free glass structures is disclosed which includes forming a mixture of silica soot. The homogenized mixture is extruded into a flat planar pre-form, and the extruded pre-form is then consolidated by, heating into a substantially full density, substantially striae-free lithography glass substrate structure.

Abstract: A photolithography apparatus has an exposure light source for emitting exposure light with a wavelength of 400 nm or less, a reticle with a pattern original image formed therein, an illumination optical system for illuminating the reticle with exposure light, a projection optical system for projecting the pattern image from the reticle onto a photosensitive plate and an alignment system for aligning the reticle and the photosensitive plate. At least some of the synthetic silica glass members composing the illumination optical system, the projection optical system and the reticle consist of synthetic silica glass members which, upon 1×104 pulse irradiation with an ArF excimer laser at an energy density from 0.1 &mgr;J/cm2·p to 200 mJ/cm2·p, have a loss factor no greater than 0.0050 cm−1 at 193.4 nm measured after irradiation, a hydrogen molecule concentration from 1×1016 molecules/cm3 to 2×1018 molecules/cm3 and a loss factor no greater than 0.

Abstract: An optical member made of silica glass manufactured by the direct method where a material gas comprising an organosilicon compound is allowed to react in an oxidizing flame, said optical member having a 2×1014 molecules/cm3 or less concentration of formyl radical generated by X-ray irradiation whose dose is 0.01 Mrad or more and 1 Mrad or less.

Abstract: The present invention is directed to the preparation of in-situ formation of a series of glass-ceramic composites by the Self-propagating High temperature Synthesis (SHS) technique with advantages of processing simplicity as well as the potential of cost savings. The materials produced by the technique contain crystalline TiB2 phase and have either a pure glassy matrix or a glass matrix with partial devitrification based on the Al2O3—CaO system. The materials can potentially be used for infrared light transmission and for other high temperature applications. These materials can also be produced with relatively high porosity.

Abstract: Methods and apparatus for adding metals such as aluminum to fused silica glass articles are disclosed. The methods and apparatus allow for controlled, low level addition of metals into fused silica glass articles. The fused silica glass articles containing added aluminum exhibit improved internal transmission and decreased absorption change when irradiated with a laser.

Abstract: Natural or synthetic silica is deposited on a preform set into rotation in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of natural or synthetic silica while a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas. Any sodium or lithium contained in the grains of natural or synthetic silica react with the fluorine or chlorine of the fluorine or chlorine compound, thereby making it possible to improve the optical quality of fibers drawn from a preform built up with natural or synthetic silica, and to do so at reduced cost.

Abstract: The present invention provides a two stage process of thermal separation of CFCs and HCFCs followed by vitrification of the waste into a commercially viable glass. In the first stage, the hydrogenated compounds are reacted at elevated temperature with water and a metal oxide such as calcium oxide to form a halide salt and carbon dioxide. In the second stage of the process, the brine slag is reacted at elevated temperature with the carbon dioxide from stage one and glass-forming raw materials such as silicon dioxide to produce a glass. The final glass product incorporates the halide into the glass.

Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.

Abstract: A optic is produced for operation at the fundamental Nd:YAG laser wavelength of 1.06 micrometers through the tripled Nd:YAG laser wavelength of 355 nanometers by the method of reducing or eliminating the growth of laser damage sites in the optics by processing the optics to stop damage in the optics from growing to a predetermined critical size. A system is provided of mitigating the growth of laser-induced damage in optics by virtue of very localized removal of glass and absorbing material.

Abstract: A burner and a method for producing an inorganic soot such as silica comprising a plurality of substantially planar layers having multiple openings therethrough formed by a micromachining process. The openings are in fluid communication with a precursor inlet and a gas inlet to permit the gas and the precursor to flow through and exit the burner. The burner produces a flame from a combustible gas in which the precursor undergoes a chemical reaction to form the soot.

Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.

Abstract: A method and apparatus for manufacturing optical components. A burner generates soot, and a surface area collector collects the soot. The burner is disposed such that the soot collected within the surface area collector is substantially not reheated by subsequently deposited soot. Magnetic forces direct the soot to desired location(s) within the surface area collector. The surface area collector operates at relatively low temperatures sufficient to retain rather volatile substances, such as fluorine, in the soot.

Abstract: For improving the refractive index homogeneity of quartz glass bodies, at least one burner is disposed movably in a melting device with respect to the quartz glass object which is to be produced. The burner has three essentially concentrically disposed groups of nozzles for metering the raw material, supplying the hydrogen and supplying the oxygen. Corresponding to the changes in the distribution of OH and H2 between the center and the edge of the quartz glass object, the volumes of hydrogen and/or oxygen of the burner gases flowing change as a function of the burner position with respect to the quartz glass object in order to bury the mixing ratio in the burner gas.

Abstract: A synthetic quartz glass to be used for light with a wavelength of from 150 to 200 nm, wherein the OH group concentration is at most 100 ppm, the hydrogen molecule concentration is at most 1×1017 molecules/cm3, reduction type defects are at most 1×1015 defects/cm3, and the relation between &Dgr;k163 and &Dgr;k190, as between before and after irradiation of ultraviolet rays, satisfies 0<&Dgr;k163<&Dgr;k190, and a process for its production.

Abstract: A method and furnace are described for producing a fused oxide body by decomposing a precursor compound of the oxide in a flame to form molten oxide particles and collecting those particles in a furnace constructed of a refractory material to form a fused oxide body, the improvement in the method comprising treating the refractory material with a strong acid in liquid form to react with, and thereby remove, contaminants from at least the surface of the refractory material.

Abstract: Present invention suppresses undesirable effects of the bubbles trapped in a silica glass crucible on single crystallization during the pulling process under a high-temperature load. When raw material powder is melted in a mold 1, graphite components of electrodes and impurities contained in the raw material are removed by introducing hydrogen gas and/or oxygen gas immediately after the start of arc discharge. Graphite and impurities are prevented from entering the product crucible, thereby suppressing the volume increase rate of the bubbles and reducing the inner pressure of the bubbles. Gases remaining in voids of an accumulated layer of silica powder formed inside the mold 1 can be replaced with helium gas, by supplying helium gas to the accumulated layer from the mold 1.

Abstract: Problems the invention is to solve: An object of the present invention is to provide a method for producing a quartz glass crucible capable of pulling up a silicon single crystal at a highly improved yield, yet without generating oscillation at the surface of the melt on pulling up silicon single crystal, and free from generating dislocations due to the peeling off of quartz glass fractions.

Abstract: The invention concerns a quartz glass body for an optical component for the transmission of UV radiation with a wavelength of 250 nm and less, especially for a wavelength of 157 nm, as well as a process for the manufacture of the quartz glass body where fine quartz glass particles are formed by flame hydrolysis of a silicon compound, deposited and vitrified. Suitability of a quartz glass as represented by high base transmission and radiation resistance depends on structural properties caused by local stoichiometric deviations, and on the chemical composition. The quartz glass body according to the inventions is distinguished by a uniform base transmission (relative change of base transmission ≦1%) in the wavelength range from 155 nm to 250 nm (radiation penetration depth of 10 mm) of at least 80%, a low OH content (less than 10 ppm by weight) and a glass structure substantially free from oxygen defect centers.

Abstract: The present invention is directed to the preparation of in-situ formation of a series of glass-ceramic composites by the Self-propagating High temperature Synthesis (SHS) technique with advantages of processing simplicity as well as the potential of cost savings. The materials produced by the technique contain crystalline TiB2 phase and have either a pure glassy matrix or a glass matrix with partial devitrification based on the Al2O3—CaO system. The materials can potentially be used for infrared light transmission and for other high temperature applications. These materials can also be produced with relatively high porosity.

Abstract: Burners and methods for producing fused silica members. The burner includes seven gas-emitting regions, including four regions for emitting a mixture of oxygen and combustible gas.

Abstract: Methods for producing high purity fused silica (HPFS) glass having desired levels of dissolved hydrogen are provided. The methods involve measuring the level of hydrogen in the cavity of the furnace used to produce the glass and controlling the pressure within the furnace and/or gas flows to the furnace's burners so that the measured concentration has a desired value. In this way, the level of dissolved hydrogen in the glass can be controlled since, as shown in FIG. 3, there is a direct correlation between the hydrogen concentration in the cavity atmosphere and level of dissolved hydrogen in the glass.

Abstract: The invention relates to fluorine-containing silica glasses, and methods of their production. The silica glass may be used for an ultraviolet light optical system in which light in a wavelength region of 200 mn or less, such as an ArF (193 nm) excimer laser, is used The invention also relates to a projection exposure apparatus containing fluorine-containing glass of the invention.

Abstract: A method and an apparatus for producing a quartz glass crucible for pulling up a silicon single crystal capable of effectively reducing the content of bubbles by reducing the bubble diameters of the outer layer of the crucible are proposed. The method comprises the method step that during heat-melting of a porous outer molding a processing gas is supplied for flowing through the porous molding, whereby the processing gas preferably contains less nitrogen than air or less oxygen than air.

Abstract: Pyrogenically produced oxides of metals and/or metalloids doped with erbium oxide, in which the base component is a pyrogenically produced oxide doped with erbium oxide in an amount of 0.000001 to 40 wt %, in which the BET surface of the doped oxide lies between 1 and 1000 m2/g, are produced by feeding an aerosol into a flame, as used for production of pyrogenic oxide, in which an erbium salt solution is used as the starting product for the aerosol, the aerosol being produced by atomization with an aerosol generator, this aerosol is mixed homogeneously before reaction with a gas mixture for flame oxidation or flame hydrolysis, the aerosol-gas mixture is then allowed to react in a flame, and the formed pyrogenic oxides doped with erbium oxide are separated from the gas stream in a known fashion. The pyrogenic oxide of metals and/or metalloids doped with erbium oxide can be used as glass raw material.

Abstract: The crosstalk characteristics of an arrayed waveguide grating or the like are improved. One or more of substrates are placed at a circumferential position centering the table rotational center C on a turntable that rotates at a constant angular speed of rotation &ohgr; and the turntable is rotated. A burner is moved to and fro in the radial direction of the turntable between positions r1 and r2 in the radial direction of the turntable and is reciprocated across the substrates. A material gas of glass, an oxygen gas and a hydrogen gas are passed through the burner to generate a hydrolysis reaction of the material gas in a hydrogen oxygen flame and an under cladding glass particle, a core glass particle and an over cladding particle are sequentially deposited on the substrates to form an optical waveguide part.

Abstract: The present invention relates to a synthetic quartz glass, which is a material for producing an optical member having an excellent excimer laser resistance, and a production method thereof with a good productivity. That is, the synthetic quartz glass produced by vitrifying glass fine particles obtained by flame hydrolysis of an organodisilazane compound directly on a substrate having a birefringence index of 5 nm/cm or less, a refractive index difference (&Dgr;n) of 2×10−6/cm or less, and an ArF saturated absorbance of 0.05/cm or less at a pulse energy density of 100 mJ/cm2/pulse.

Abstract: The invention relates to optical glass having improved initial transmittance, formed by subjecting the glass to a hydrogen and/or deuterium treatment at a temperature, and for a duration of time sufficient to diffuse the hydrogen and/or deuterium into the glass.

Abstract: In furnaces for producing high purity fused silica glass boules, the refractory in the area of the burner holes reaches such elevated temperatures that cause impurities to leach out and the dissociation of the refractory, causing contamination of the silica glass. In order to reduce the temperature of the burner hole refractory, a porous insert or liner is positioned within the burner hole and a suitable gas is supplied thereto. The gas diffuses through the porous liner and not only cools the liner and refractory, but also forms a boundary layer along an inside surface of the insert that prevents particle buildup. The cooling of the insert and surrounding burner hole refractory prevents contamination of the silica glass from the refractory.

Abstract: The invention provides optical projection lithography methods, photolithography photomasks, and optical photolithography mask blanks for use in optical photolithography systems utilizing deep ultraviolet light (DUV) wavelengths below 300 nm, such as DUV projection lithography systems utilizing wavelengths in the 248 nm region and the 193 nm region. The invention provides improved production of lithography patterns by inhibiting polarization mode dispersion of lithography light utilizing low birefringence mask blanks and photomasks.

Abstract: A furnace for the deposition and collection of molten silica particles to form a solid body, the furnace comprising a collection vessel, the base of which is lined with a purified refractory material, and a method of forming the solid body which comprises lining the base of the collection cup with crushed particles of purified refractory material.

Abstract: Silica crucibles containing an inner layer which is substantially pure and substantially bubble-free and methods for making such crucibles. The inner layer is also substantially stable against roughening and spot devitrification. The inner layer is formed by making a web structure which is then converted to a continuous layer, thereby minimizing or eliminating bubble formation. The inner layer is also formed using a gettering agent which getters alkaline and alkaline-earth elements while the inner layer is formed. The alkaline and alkaline-earth elements are gettered on an innermost portion of the inner layer which is later removed, leaving an inner layer with relatively few impurities. When used in a CZ-crystal growing process, the inner surface of the crucible remains smooth and substantially no bubbles grow in the inner layer.

Abstract: Natural or synthetic silica is deposited on a preform set into rotation in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of natural or synthetic silica while a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas. Any sodium or lithium contained in the grains of natural or synthetic silica react with the fluorine or chlorine of the fluorine or chlorine compound, thereby making it possible to improve the optical quality of fibers drawn from a preform built up with natural or synthetic silica, and to do so at reduced cost.

Abstract: A method for making silica includes delivering a silica precursor comprising a perfluorinated group to a conversion site and passing the silica precursor through a conversion flame to produce silica soot.

Abstract: The method comprises a preheating step to heat a metal base 10 entirely, a pre-spraying step to for a glass pre-coating 13 by pre-spraying a glass material onto the surface of the preheated base, a main-spraying step to form a glass coating 14 by additionally heating the glass pre-coating formed in the previous step and main-spraying a like glass material onto the surface.

Abstract: A method for forming a fused silica glass includes delivering a silica precursor to a burner and passing the silica precursor through the flame of the burner to form silica particles, depositing the silica particles on a planar surface to form a flat, porous preform, dehydrating the porous preform, and consolidating the porous preform into a flat, dense glass.

Abstract: The invention relates to a method and apparatus for a glass manufacturing facility. The apparatus includes a glass production system providing an exhaust stream entrained with particulate material including germanium—containing particulate. The apparatus further includes an exhaust filtration system including a PTFE fabric material. The exhaust filtration system is connected to the production system to receive the exhaust stream an capture the particulate material. A collection system is connected to the exhaust system to collect the captured particulate material from the exhaust system. The particulate material collected contains at least about 2% by weight germanium. The invention further includes incorporating the aforementioned apparatus into the operation of a glass manufacturing facility.

Abstract: Fused silica boules (19) having improved radial homogeneity are produced by controlling the air flow around the boule (19) during its formation. The boule is formed in a cup-like containment vessel (13) which collects silica particles from a plurality of burners (14). The containment vessel (13) rotates and oscillates relative to the burners (14) as the boule (19) is formed. The containment vessel (13) is bounded by a cup-like containment wall (22), and a shadow or air flow wall (130) is spaced apart from and surrounds the containment wall (22) forming a gap or air flow passage (175) therebetween. A radially-outwardly extending deflecting wedge portion (23) is formed at the upper extent of the containment wall (22) and at an outlet end of flow passage (175).

Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of emitting an oxygen containing gas and a hydrogen containing gas from a burner; emitting a mixture of an organic silicon compound and a halogen compound from the burner; and reacting the mixture with the oxygen containing gas and the hydrogen containing gas to synthesize the silica glass.