Including Flame Or Gas Contact Patents (Class 65/17.4)
  • Patent number: 6442973
    Abstract: A method is provided for manufacturing a synthetic silica glass. The method includes the steps of maintaining a silica glass member, which is formed using a flame hydrolysis method and having an OH group concentration of about 500 ppm to about 1300 ppm, at a predetermined holding temperature for a predetermined period of time so as to substantially relax the structure of the silica glass member. The method further includes the step of subsequently cooling the silica glass member to a first predetermined temperature at a cooling rate of about 10 K/hour or less, and thereafter, cooling the silica glass member to a second predetermined temperature at a cooling rate of about 1 K/hour or less. The method further includes the step of further cooling the silica glass member to a third predetermined temperature at a cooling rate of about 10 K/hour or less.
    Type: Grant
    Filed: January 22, 1999
    Date of Patent: September 3, 2002
    Assignee: Nikon Corporation
    Inventors: Norio Komine, Seishi Fujiwara, Akiko Yoshida, Hiroki Jinbo
  • Publication number: 20020083740
    Abstract: Silica grain of desired properties and size is created in a vacuum chamber. Fine silica powder is injected in the chamber or silica powder is formed in situ by combusting precursors. A plasma is formed centrally in the chamber to soften the silica powders so that they stick together and form larger grains of desired size. The grains are collected, doped, fused and flowed into tubes or rods. A puller pulls the tube or rod through a chamber seal into a lower connected vacuum chamber. The tube or rod is converted to rods and fibers or plates and bars in the connected chamber. Fused silica in a crucible tray is subjected to ultrasound or other oscillations for outgassing. Gases are removed by closely positioned vacuum ports.
    Type: Application
    Filed: June 15, 2001
    Publication date: July 4, 2002
    Inventor: Kiril A. Pandelisev
  • Publication number: 20020073734
    Abstract: A method for doping silica soot with fluorine during laydown, including providing a bait rod, and providing a burner, wherein the burner emits a reactant flame. The method also including providing at least one first gas-feed separate from the burner, wherein the gas-feed supplies a first jet of fluorine-based gases, and depositing a layer of silica soot on the bait rod by vaporizing a silica producing gas within the reactant flame of the burner. The method further including supplying the first jet of fluorine-based gases to the silica soot deposited on to the bait rod via the first gas-feed subsequent to vaporizing at least a portion of the silica producing gas within the reactant flame of the burner.
    Type: Application
    Filed: October 26, 2001
    Publication date: June 20, 2002
    Inventors: Michael J. Lehman, V. Srikant, Jeffery S. Stone
  • Publication number: 20020062659
    Abstract: A concentric multi-tubular burner for synthesizing glass particles having a center port group constituted by a combination of jet ports of raw material gas, combustible gas and oxygen gas, wherein an outer wall of the oxygen gas jet port in the center port group protrudes more toward a burner head than an inner wall of the oxygen gas jet port. The flow rate of oxygen gas jetted from the oxygen gas jet port of the center port group is controlled to be in a proper range.
    Type: Application
    Filed: September 14, 2001
    Publication date: May 30, 2002
    Inventors: Tadashi Enomoto, Yuichi Ohga, Nobuya Akaike, Haruhiko Aikawa, Takashi Matsuo, Motonori Nakamura
  • Patent number: 6378340
    Abstract: A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degassed, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
    Type: Grant
    Filed: March 14, 2000
    Date of Patent: April 30, 2002
    Assignee: Nikon Corporation
    Inventors: Seishi Fujiwara, Norio Komine, Hiroki Jinbo
  • Patent number: 6378337
    Abstract: A method for preparing high-purity, bulk fused silica includes supplying silane gas, a gaseous fuel, and oxygen gas to a combustion burner. Silica particles are formed by passing the silane gas into a flame formed by the combustion reaction of the gaseous fuel with the oxygen gas while maintaining the ratio of the flow rate of the gaseous fuel to the flow rate of the silane gas no less than twelve and the ratio of the flow rate of the gaseous fuel to the flow rate of the oxygen gas no less than three. The silica particles formed are immediately deposited onto a hot bait to form a boule.
    Type: Grant
    Filed: September 15, 2000
    Date of Patent: April 30, 2002
    Assignee: Corning Incorporated
    Inventors: John T. Brown, Michael S. Dobbins, Christine E. Heckle, Robert E. McLay, Mahendra K. Misra, Dale R. Powers, Michael H. Wasilewski
  • Patent number: 6374639
    Abstract: A method is provided for manufacturing a silica glass that is substantially free of chlorine. The method includes the step of separately expelling a silicon tetrafluoride gas, a combustion gas, and a combustible gas from a burner made of silica glass, the flow velocity of the silicon tetrafluoride gas being within the range of about 9 slm/cm2 to about 20 slm/cm2. The method further includes the steps of producing minute silica glass particles by reacting the silicon tetrafluoride gas with water produced by a reaction of the combustion gas with the combustible gas, depositing the minute silica glass particles on a target, and producing the silica glass by fusing and vitrifying the minute silica glass particles deposited on the target.
    Type: Grant
    Filed: August 22, 2001
    Date of Patent: April 23, 2002
    Assignee: Nikon Corporation
    Inventors: Norio Komine, Seishi Fujiwara, Hiroki Jinbo
  • Patent number: 6374642
    Abstract: An apparatus for producing a glass soot includes a first a burner having a droplet-emitting first region, a gas-emitting second region surrounding the first region, and a gas-emitting third region surrounding the second region. The first region emits a glass-forming mixture, the second region emits an inert gas, and the third region emits a combination of oxygen and a combustible gas. The apparatus further includes a combustion area having a first section proximate the first burner and a second section distal from the first burner. A glass-forming mixture is at least partially vaporized in the first section of the combustion area. The apparatus further includes at least one secondary burner having gas-emitting fourth and fifth regions. The fourth region of the secondary burner emits oxygen and the fifth region of the secondary burner emits a combustible gas.
    Type: Grant
    Filed: March 15, 2000
    Date of Patent: April 23, 2002
    Assignee: Corning Incorporated
    Inventors: Jeffrey L. Blackwell, Lisa A. Moore, Huailiang Wei, Daniel W. Hawtof
  • Patent number: 6376401
    Abstract: A synthetic silica glass having a high transmittance for vacuum ultraviolet rays, for example F2 excimer laser beam with a wavelength of 157 nm, a high uniformity and a high durability and useful for ultraviolet ray-transparent optical glass materials is produced from a high-purity silicon compound, for example silicon tetrachloride, by heat treating an accumulated porous silica material at a temperature not high enough to convert the porous silica material to a transparent silica glass in an inert gas atmosphere for a time sufficient to cause the OH groups to be condensed and removed from the glass, and exhibits substantially no content of impurities other than OH group a difference between highest and lowest fictional temperatures of 50° C.
    Type: Grant
    Filed: September 1, 1999
    Date of Patent: April 23, 2002
    Assignees: Tosoh Corporation, Nippon Silica Glass Co., Ltd., Yamaguchi Nippon Silica Glass Co., Ltd.
    Inventors: Shinichi Kondo, Takayuki Nakamura, Kazuhiko Fukuda, Naoyoshi Kamisugi, Nobu Kuzuu, Yoshinao Ihara, Hidetoshi Wakamatsu
  • Publication number: 20020043079
    Abstract: An apparatus for fabricating a soot preform for an optical fiber. The soot preform is fabricated by depositing glass particles on a starting rod capable of being rotated and pulled up. The apparatus comprises elements as follows. A reaction chamber is used for depositing the glass particles on the starting rod. An upper room is located above the reaction chamber for receiving the soot preform formed in the upper portion of the reaction chamber. At least one core burner is installed in the reaction chamber. A gas-supplying inlet is located in the top part of the sidewall of the reaction chamber closest to burner(s), and a gas-exhausting outlet is located in the top part of another sidewall opposite to the gas-supplying inlet. In addition, at least one cladding burner is installed in the reaction chamber.
    Type: Application
    Filed: October 10, 2001
    Publication date: April 18, 2002
    Inventors: Dai Inoue, Go Ogino, Tetsuya Otosaka, Tadakatsu Shimada, Hideo Hirasawa
  • Publication number: 20020043080
    Abstract: A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.
    Type: Application
    Filed: August 30, 2001
    Publication date: April 18, 2002
    Inventors: Michael E. Best, Claude L. Davis, Mary J. Edwards, Thomas W. Hobbs, Gregory L. Murray
  • Publication number: 20020038557
    Abstract: Fluorine-containing synthetic quartz glass is produced by feeding silica-forming material, hydrogen, and oxygen gases from a burner to a reaction zone, flame hydrolyzing the silica-forming material in the reaction zone to form particles of silica, depositing the silica particles on a rotatable substrate in the reaction zone to form a porous silica matrix, and heating and vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. During formation of the porous silica matrix, the angle between the center axes of the silica matrix and the silica-forming reactant flame from the burner is adjusted to 90-120° so that the porous silica matrix has a density of 0.1-1.0 g/cm3 with a narrow distribution within 0.1 g/cm3. The resulting quartz glass has a high transmittance to light in the vacuum ultraviolet region below 200 nm.
    Type: Application
    Filed: August 17, 2001
    Publication date: April 4, 2002
    Applicant: Shin-Etsu Chemical Co., Ltd.
    Inventors: Koji Matsuo, Hisatoshi Otsuka, Kazuo Shirota, Shigeru Maida
  • Patent number: 6363746
    Abstract: An apparatus for producing the glass soot used in the formation of optical fiber includes a burner with an internal atomizer. The atomizer includes an outer tube having a nozzle at an end thereof, and an inner tube located within the outer tube and having a closed end restricting fluid flow therethrough and defining a cylindrical sidewall having radially extending apertures spaced there along. The outer tube receives the glass-forming mixture in liquid form and the inner tube receives an atomizing gas which flows through the apertures in the sidewall of the inner tube and atomizes the glass-forming mixture as the glass-forming mixture travels through the outer tube.
    Type: Grant
    Filed: March 15, 2000
    Date of Patent: April 2, 2002
    Assignee: Corning Incorporated
    Inventors: Huailiang Wei, Lisa A. Moore, Jeffery L. Blackwell, Daniel W. Hawtof
  • Patent number: 6351972
    Abstract: There is disclosed a method for producing a synthetic fused silica member comprising vaporizing a raw material silane compound, hydrolyzing or oxidizing by combustion the vaporized silane compound in oxyhydrogen flame to form silica microparticles so that the silica microparticles should deposit on a rotating refractory carrier, and melting the silica microparticles during the deposition to form the synthetic fused silica member, wherein sulfur impurities are preliminarily removed from the raw material.
    Type: Grant
    Filed: July 8, 1999
    Date of Patent: March 5, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventor: Hisatoshi Ohtsuka
  • Publication number: 20020018942
    Abstract: High purity direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrates for photolithography applications in the VUV wavelength region below 190 nm is disclosed. The inventive direct deposit vitrified silicon oxyfluoride glass is transmissive at wavelengths around 157 nm, making it particularly useful as a photomask substrate at the 157 nm wavelength region. The inventive photomask substrate is a dry direct deposit vitrified silicon oxyfluoride glass which exhibits very high transmittance in the vacuum ultraviolet (VUV) wavelength region while maintaining the excellent thermal and physical properties generally associated with high purity fused silica. In addition to containing fluorine and having little or no OH content, the inventive direct deposit vitrified silicon oxyfluoride glass suitable for use as a photomask substrate at 157 nm is also characterized by having less than 1×1017 molecules/cm3 of molecular hydrogen and low chlorine levels.
    Type: Application
    Filed: April 24, 2001
    Publication date: February 14, 2002
    Inventors: John T. Brown, Stephen C. Currie, Lisa A. Moore, Susan L. Schiefelbein, Robert S. Pavlik
  • Publication number: 20020017115
    Abstract: A method that provides a new way to embed rare earth fluorides into silicate (or germania-doped silica) glasses by means of solution chemistry. Embedding rare earth fluorides into a silicate (or germania-doped silica) glass comprises the following steps. First, form a porous silicate core preform. Second, submerge the preform into an aqueous solution of rare earth ions. Third, remove the preform from the solution and wash the outside surfaces of the preform. Fourth, submerge the preform into an aqueous solution of a fluorinating agent to precipitate rare earth trifluorides from the solution and deposit in the pores or on the wall of the preform. This is followed by drying.
    Type: Application
    Filed: July 26, 2001
    Publication date: February 14, 2002
    Inventor: Huailiang Wei
  • Publication number: 20020014091
    Abstract: Fused silica boules (19) having improved radial homogeneity are produced by controlling the air flow around the boule (19) during its formation. The boule is formed in a cup-like containment vessel (13) which collects silica particles from a plurality of burners (14). The containment vessel (13) rotates and oscillates relative to the burners (14) as the boule (19) is formed. The containment vessel (13) is bounded by a cup-like containment wall (22), and a shadow or air flow wall (130) is spaced apart from and surrounds the containment wall (22) forming a gap or air flow passage (175) therebetween. A radially-outwardly extending deflecting wedge portion (23) is formed at the upper extent of the containment wall (22) and at an outlet end of flow passage (175).
    Type: Application
    Filed: October 3, 2001
    Publication date: February 7, 2002
    Inventors: Floyd E. Marley, Mahendra K. Misra, Merrill F. Sproul
  • Publication number: 20020007649
    Abstract: A method of manufacturing synthetic silica glass includes the steps of pressurizing a liquid storage tank including a liquid silicon compound therein, generating bubbles in the liquid silicon compound using a foamer, removing the bubbles using a degasser, displacing the liquid silicon compound into a vaporizer while controlling an amount of the liquid silicon compound displaced by a liquid mass flow meter, mixing the displaced liquid silicon compound with a carrier gas to generate a gaseous silicon compound, injecting the gaseous silicon compound into a synthesis furnace, and forming synthetic silica glass by hydrolyzing the gaseous silicon compound in the synthesis furnace.
    Type: Application
    Filed: March 14, 2000
    Publication date: January 24, 2002
    Inventors: Seishi Fujiwara, Norio Komine, Hiroki Jinbo
  • Patent number: 6339940
    Abstract: A process for manufacturing synthetic quartz glass involves feeding a quartz glass-forming raw material to a high-temperature gas zone within a chamber, converting the quartz glass-forming raw material into quartz soot, and forming synthetic quartz glass from the soot. A suspended soot-discharging gas which has been flow-straightened in a suspended soot discharging direction flows through the chamber in the vicinity of the high-temperature gas zone. This process keeps free suspended soot from settling onto the surface of the quartz ingot where fusion and growth take place, thereby preventing the formation of bubbles within the quartz glass under growth.
    Type: Grant
    Filed: April 20, 2000
    Date of Patent: January 22, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Motoyuki Yamada, Hisatoshi Otsuka, Koji Matsuo
  • Publication number: 20020002843
    Abstract: The invention provides a method for manufacturing quartz glass large scale slab ingot in a flame hydrolysis reaction in a furnace, including the steps of rotating the furnace, depositing a fused silica on a furnace bed, and extending the deposit outwardly by heating and rotation of the furnace, thereby a quartz glass slab ingot is obtained. A quartz glass burner is installed at the ceiling of the furnace, hydrogen gas supplied to the burner is flowing down along the tapered wall of the oxygen chamber and being ejected into the outer casing part of the hydrogen gas is deflected to the center of the burner, and mixed with the oxygen just after the ejecton from the oxygen gas nozzles thereby the flame is formed smoothly and the thermal efficiency is improved, The flame becomes wide enough and the silica powder transported by the hydrogen gas is uniformly fused by the flame and heat capacity of the fused silica.
    Type: Application
    Filed: May 23, 2001
    Publication date: January 10, 2002
    Inventors: Yoshihiko Gotoh, Shinichi Satoh, Masakazu Kudoh
  • Patent number: 6324871
    Abstract: In a process for producing an optical fiber preform, a starting member and a glass synthesizing burner are reciprocated relative to each other so that fine glass particles synthesized with the burner are deposited layer by layer on the starting member, and a heating power of the glass synthesizing burner in a nonsteady outside diameter portion at either end of the soot preform is adjusted to control the temperature of the nonsteady outside diameter portion at either end against local elevation. The starting member is formed of a transparent glass rod that is held within a vessel and rotatable about its own axis, the burner is fitted on a lateral side of the vessel at right angles to the rotating axis of the starting member and is movable towards or away from the starting member.
    Type: Grant
    Filed: November 13, 2000
    Date of Patent: December 4, 2001
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Motonori Nakamura, Yuichi Ohga, Toshio Danzuka
  • Publication number: 20010045106
    Abstract: The present invention provides a two stage process of thermal separation of CFCs and HCFCs followed by vitrification of the waste into a commercially viable glass. In the first stage, the hydrogenated compounds are reacted at elevated temperature with water and a metal oxide such as calcium oxide to form a halide salt and carbon dioxide. In the second stage of the process, the brine slag is reacted at elevated temperature with the carbon dioxide from stage one and glass-forming raw materials such as silicon dioxide to produce a glass. The final glass product incorporates the halide into the glass.
    Type: Application
    Filed: March 20, 2001
    Publication date: November 29, 2001
    Inventors: Christopher J. Ludwig, Frederic M. Schwartz
  • Patent number: 6314766
    Abstract: Fused silica boules (19) having improved radial homogeneity are produced by controlling the air flow around the boule (19) during its formation. The boule is formed in a cup-like containment vessel (13) which collects silica particles from a plurality of burners (14). The containment vessel (13) rotates and oscillates relative to the burners (14) as the boule (19) is formed. The containment vessel (13) is bounded by a cup-like containment wall (22), and a shadow or air flow wall (130) is spaced apart from and surrounds the containment wall (22) forming a gap or air flow passage (175) therebetween. A radially-outwardly extending deflecting wedge portion (23) is formed at the upper extent of the containment wall (22) and at an outlet end of flow passage (175).
    Type: Grant
    Filed: January 19, 2000
    Date of Patent: November 13, 2001
    Assignee: Corning Incorporated
    Inventors: Floyd E. Marley, Mahendra K. Misra, Merrill F. Sproul
  • Patent number: 6311521
    Abstract: A raw material mixture, which has a glass composition containing a salt or an oxide of a flame reaction metal, is heated, and an intermediate base material, in which the salt of the flame reaction metal, or the like, has been thermally decomposed and which is in a temporary sintered state or a fused glass state, is thereby formed. The intermediate base material is ground, and a ground material is thereby obtained. The ground material is mixed together with a liquid and, optionally, a binder, and a viscous flame reaction material is thereby formed. The viscous flame reaction material is supported on a substrate and heated to a temperature, which is not lower than a vitrification melting temperature of the viscous flame reaction material. In this manner, the flame reaction material is fusion bonded to the substrate. Generation of a thermal decomposition gas in the baking step is thus restricted, and the carrying of the flame reaction material on the substrate is carried out appropriately.
    Type: Grant
    Filed: July 7, 1998
    Date of Patent: November 6, 2001
    Assignee: Tokai Corporation
    Inventors: Hideo Mifune, Masato Seki
  • Patent number: 6312656
    Abstract: The present invention is directed to a method for making silica. A liquid, preferably halide-free, silicon-containing compound capable of being converted by thermal oxidative decomposition to SiO2 is provided and introduced directly into the flame of a combustion burner, which converts the compound to silica, thereby forming finely divided amorphous soot. The soot is vaporized at the site where the liquid is converted into silica by pneumatically atomizing the liquid with a stream of oxygen gas, or a mixture of oxygen gas and nitrogen gas. The amorphous soot is deposited on a receptor surface where, either substantially simultaneously with or subsequently to its deposition, the soot is consolidated into a body of fused silica glass.
    Type: Grant
    Filed: July 30, 1997
    Date of Patent: November 6, 2001
    Assignee: Corning Incorporated
    Inventors: Jeffery Lynn Blackwell, Xiaodong Fu, Daniel Warren Hawtof, Dale Robert Powers
  • Publication number: 20010032482
    Abstract: A method for producing an optical waveguide component includes providing a glass producing soot, providing a soot delivery device adapted to provide an electrostatic charge to the soot, and providing a substrate material adapted to receive the glass producing soot thereon. The method also includes delivering the soot to the delivery device, and accelerating the soot as it passes through the delivery device. The method further includes charging the soot as the soot is passed through the delivery device with a sufficient charge to attract the soot to the substrate material, and depositing the soot on the substrate material by spraying the soot onto the substrate material via the delivery device.
    Type: Application
    Filed: May 18, 2001
    Publication date: October 25, 2001
    Inventor: Daniel W. Hawtof
  • Publication number: 20010018834
    Abstract: A process for producing synthetic quartz glass using a burner composed of a plurality of concentric nozzles involves the steps of feeding a silica-forming raw material gas and a fluorine compound gas to a reaction zone from a center nozzle, feeding oxygen gas from a second nozzle outside the center nozzle, and feeding oxygen gas and/or hydrogen gas from a third nozzle. The silica-forming raw material gas is hydrolyzed to form fine particles of silica, which particles are deposited on a rotatable substrate so as to form a porous silica matrix, which is then fused to give the quartz glass. The flow rate of the oxygen gas fed from the second nozzle and the flow rate of the raw material gas are controlled so as to provide a 1.1- to 3.5-fold stoichiometric excess of oxygen. The excess oxygen suppresses Si—Si bond formation in the quartz glass, enabling the production of synthetic quartz glass having a high transmittance in the vacuum ultraviolet region.
    Type: Application
    Filed: December 27, 2000
    Publication date: September 6, 2001
    Inventors: Koji Matsuo, Hisatoshi Otsuka, Kazuo Shirota
  • Publication number: 20010018835
    Abstract: A method for manufacturing a synthesized silica glass optical member, the method comprising: providing a porous silica glass body; heating the porous silica glass body in an atmosphere containing hydrogen or oxygen, and sintering the porous silica glass body in an atmosphere containing fluorine compound. Furthermore, a synthesized silica glass optical member manufactured by the method.
    Type: Application
    Filed: March 3, 2001
    Publication date: September 6, 2001
    Inventors: Jun Abe, Nobuyasu Mantoku, Shinji Makikawa, Seiki Ejima
  • Publication number: 20010017042
    Abstract: Synthetic quartz glass is produced by feeding a silica-forming raw material gas, hydrogen gas, oxygen gas and a fluorine compound gas from a burner to a reaction zone, flame hydrolyzing the silica-forming raw material gas in the reaction zone to form fine particles of fluorine-containing silica, depositing the silica fine particles on a rotatable substrate in the reaction zone so as to create a fluorine-containing porous silica matrix, and heat vitrifying the porous silica matrix in a fluorine compound gas-containing atmosphere. This process enables the low-cost manufacture of a synthetic quartz glass having a higher and more uniform transmittance to light in the vacuum ultraviolet region than has hitherto been achieved.
    Type: Application
    Filed: February 22, 2001
    Publication date: August 30, 2001
    Inventors: Shigeru Maida, Motoyuki Yamada, Hisatoshi Otsuka, Kazuo Shirota, Koji Matsuo
  • Publication number: 20010015080
    Abstract: The invention relates to a method of manufacturing a cylindrical preform for use in making an optical fiber of substantially smaller diameter. The method consists in increasing the diameter of a primary preform by injecting grains onto the surface of the primary preform and in fixing the grains on the surface by means of a heat flow obtained by a plasma torch comprising a tube made of refractory material, and an inductor surrounding the tube. The distance between the inductor and the end of the tube is reduced when the diameter of the preform increases. The temperature of the outside surface is thus increased, thereby enabling preforms to be obtained of larger diameter or with improved efficiency.
    Type: Application
    Filed: November 30, 2000
    Publication date: August 23, 2001
    Inventors: Pierre Ripoche, Alain Drouart, Patrick Humbert
  • Patent number: 6269663
    Abstract: The deposit of natural or synthetic silica comprises a preform (1) set into rotation (7) in front of a plasma torch (3) which moves back and forth substantially parallel to a longitudinal direction (L) of the preform (1), a feed duct (9) for feeding the plasma with grains of natural or synthetic silica (11), characterized in that the same feed duct (9) feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas (15). Sodium or lithium contained in the grains of natural or synthetic silica reacts with the fluorine or chlorine of the fluorine or chlorine compound, making it possible to improve the optical quality of fibers built up with the natural or synthetic silica at reduced cost.
    Type: Grant
    Filed: August 20, 1998
    Date of Patent: August 7, 2001
    Assignee: Alcatel
    Inventors: Alain Drouart, Benoit Gouez, Yves Lumineau, Pierre Ripoche, Jean-Florent Campion
  • Patent number: 6260385
    Abstract: A method and a burner for manufacturing silica-containing soot is disclosed. The method includes providing a liquid silicon-containing feedstock and a gas mixture and ejecting the liquid-gas mixture from an orifice into a combustion site to convert the silica-containing feedstock into silica containing soot. The burner includes a plurality of channels for delivering a gas to provide a flame, an effervescent atomizer for atomizing a liquid, silicon-containing feedstock and a rail for guiding the atomized liquid, silicon-containing feedstock into the burner flame. The method and burner can be used to produce silica-containing articles such as high purity fused silica optical members and waveguides.
    Type: Grant
    Filed: April 15, 1999
    Date of Patent: July 17, 2001
    Assignee: Corning Incorporated
    Inventors: Daniel R. Sempolinski, Michael H. Wasilewski, C. Charles Yu
  • Publication number: 20010001366
    Abstract: Natural or synthetic silica is deposited on a preform set into rotation in front of a plasma torch which moves back and forth substantially parallel to a longitudinal direction of the preform, a first feed duct feeds the plasma with grains of natural or synthetic silica while a second feed duct feeds the plasma with a fluorine or chlorine compound, preferably a fluorine compound, mixed with a carrier gas Any sodium or lithium contained in the grains of natural or synthetic silica react with the fluorine or chlorine of the fluorine or chlorine compound, thereby making it possible to improve the optical quality of fibers drawn from a preform built up with natural or synthetic silica, and to do so at reduced cost.
    Type: Application
    Filed: March 5, 1998
    Publication date: May 24, 2001
    Inventors: ALAIN DROUART, BENOIT GOUEZ, YVES LUMINEAU, PIERRE RIPOCHE, JEAN-FLORENT CAMPION
  • Patent number: 6202447
    Abstract: The invention relates to manufacturing glass fiber preforms. It relates to a method comprising rotating preform about its own axis, and displacing a plasma torch in translation relative to the preform in a direction parallel to the axis of the preform, the axes of the flame and of the preform and being offset by a certain distance, and then inserting glass powder into the plasma flame under gravity. According to the invention, the glass powder is accelerated before penetrating into the plasma flame by means of an accelerator gas, and the offset distance between the axes is reduced with increasing acceleration of the powder. The invention is applicable to manufacturing glass fibers, and in particular optical fibers.
    Type: Grant
    Filed: May 1, 1998
    Date of Patent: March 20, 2001
    Assignee: Alcatel
    Inventors: Alain Drouart, BenoƮt Gouez, Pierre Ripoche
  • Patent number: 6189339
    Abstract: A method for producing a silica glass for photolithography, which comprises the following steps: jetting a starting material gas, an oxygen gas and a hydrogen gas from a burner and depositing and consolidating silica glass powder on a target to form an ingot having a growing direction, where the ingot is grown in such a manner that at least a part of glass synthesis face on the ingot having the silica glass powder deposited and consolidated is a plane substantially perpendicular to the growing direction of the ingot, thereby to obtain the ingot having a portion in which striae are substantially perpendicular to the growing direction of the ingot; and cutting out of the ingot the portion in which the striae are substantially perpendicular to the growing direction of the ingot, thereby to obtain a silica glass having striae which are substantially parallel to each other and are planar.
    Type: Grant
    Filed: March 28, 1996
    Date of Patent: February 20, 2001
    Assignee: Nikon Corporation
    Inventor: Hiroyuki Hiraiwa